CN112964655B - A test system device and test method for absorption spectrum of a micron-scale sample on a transparent substrate - Google Patents
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- 229910052736 halogen Inorganic materials 0.000 claims description 5
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Abstract
Description
技术领域technical field
本发明属于光谱测试技术领域,涉及一种吸收光谱的测试系统装置及测试方法,尤其涉及一种透明衬底上微米级样品吸收光谱的测试系统装置及测试方法。The invention belongs to the technical field of spectrum testing, and relates to a test system device and a test method for absorption spectrum, in particular to a test system device and test method for the absorption spectrum of a micron-scale sample on a transparent substrate.
背景技术Background technique
近年来,随着微纳加工技术的迅猛发展,微电子器件的尺寸日益减小,在纳米材料上设计精细的特征结构成为当今微纳电子器件的研究热点。对纳米材料及构建的微纳结构基本光学性质的表征(如吸收光谱)则是理解纳米材料各种物理现象的基础,同时也能对纳米材料构建的微纳器件的性能进行表征。In recent years, with the rapid development of micro-nano processing technology, the size of microelectronic devices has been reduced day by day, and the design of fine feature structures on nanomaterials has become a research hotspot in today's micro-nano electronic devices. The characterization of the basic optical properties of nanomaterials and micro-nano structures (such as absorption spectra) is the basis for understanding various physical phenomena of nanomaterials, and it can also characterize the performance of micro-nano devices constructed of nanomaterials.
CN210803269U公开了一种原位高压吸收光谱测量系统,其包括:光源单元,至少用于提供对待测样品进行照射的入射光束;扩束准直单元,至少用于对所述入射光束进行扩束准直以形成平行光束;第一显微物镜单元,至少用于将经扩束准直后的光束导入高压样品容置单元的高压腔内;高压样品容置单元,至少用于为待测样品提供高压测量环境;第二显微物镜单元,至少用于将所述高压样品容置单元的高压腔内的待测样品出射的出射光束导入光谱处理单元;光谱处理单元,至少用于对所述的出射光束进行光谱检测并对获得的光谱进行分析处理。CN210803269U discloses a kind of in-situ high-pressure absorption spectrometry system, which includes: a light source unit, at least used to provide an incident beam for irradiating a sample to be measured; a beam expanding and collimating unit, at least used for expanding and collimating the incident beam straight to form a parallel light beam; the first microscope objective lens unit is at least used to guide the beam expanded and collimated into the high-pressure chamber of the high-pressure sample holding unit; the high-pressure sample holding unit is at least used to provide the sample to be tested High-voltage measurement environment; the second microscope objective unit is at least used to guide the outgoing light beam emitted by the sample to be measured in the high-pressure chamber of the high-pressure sample holding unit into the spectrum processing unit; the spectrum processing unit is at least used to process the described The outgoing beam is subjected to spectral detection and the obtained spectrum is analyzed and processed.
CN110940640A公开了一种强光吸收光谱测试系统及方法,涉及光谱测试技术领域,该系统包括激光发生单元;吸收单元,其设置于激光发生单元的激光束射出方向,吸收单元用于提供激光束需要经过的测试用大气,并对大气参数进行调整;辅助测试单元,其包括两个分光测试组件,两个分光测试组件分别用于测量经过吸收单元前后的激光束的功率;衰减聚焦单元,其用于衰减经第二分光测试组件透射的激光束,并将衰减后的激光束进行聚焦;测量分析单元,其用于对聚焦后的激光束进行测量分析。CN110940640A discloses a strong light absorption spectrum testing system and method, which relates to the technical field of spectrum testing. The system includes a laser generating unit; The passed test uses the atmosphere, and the atmospheric parameters are adjusted; the auxiliary test unit includes two spectroscopic test components, and the two spectroscopic test components are used to measure the power of the laser beam before and after the absorption unit; the attenuation focusing unit, which uses for attenuating the laser beam transmitted by the second spectroscopic testing component, and focusing the attenuated laser beam; the measurement and analysis unit is used for measuring and analyzing the focused laser beam.
由于纳米材料的边界效应,当探测光束尺寸大于纳米材料时,纳米材料的边缘将对光束产生明显的散射,宏观测量方法受散射效应影响较小,但仅适用于样品为单一材料且对光有足够吸收时,对异质结或具有特征结构的样品等,宏观测量方法不再适用。而一般的微区测量方法光束尺寸大于样品尺寸,无法避免散射效应的影响。因此,如何获得透明衬底上微小样品或精细结构器件的精确吸收光谱是纳米结构吸收光谱测量技术中亟待解决的问题。Due to the boundary effect of nanomaterials, when the size of the probe beam is larger than the nanomaterial, the edge of the nanomaterial will scatter the beam significantly. The macroscopic measurement method is less affected by the scattering effect, but it is only suitable for samples that are a single material and sensitive to light. When the absorption is sufficient, macroscopic measurement methods are no longer applicable to heterojunction or samples with characteristic structures. However, the beam size of the general micro-area measurement method is larger than the sample size, which cannot avoid the influence of the scattering effect. Therefore, how to obtain accurate absorption spectra of tiny samples or devices with fine structures on transparent substrates is an urgent problem to be solved in the measurement technology of nanostructure absorption spectroscopy.
发明内容Contents of the invention
针对现有技术存在的不足,本发明的目的在于提供一种透明衬底上微米级样品吸收光谱的测试系统装置及测试方法,本发明提供的测试方法有利于消除微米级样品边缘散射效应的影响,与现有的测量吸收光谱的分光光度计相比,可以获取更加准确的吸收光谱。In view of the deficiencies in the prior art, the purpose of the present invention is to provide a test system device and test method for the absorption spectrum of micron-scale samples on a transparent substrate. The test method provided by the present invention is conducive to eliminating the influence of the edge scattering effect of micron-scale samples , compared with existing spectrophotometers that measure absorption spectra, more accurate absorption spectra can be obtained.
为达此目的,本发明采用以下技术方案:For reaching this purpose, the present invention adopts following technical scheme:
第一方面,本发明提供了一种透明衬底上微米级样品吸收光谱的测试方法,所述的测试方法包括:In a first aspect, the present invention provides a method for testing the absorption spectrum of a micron-scale sample on a transparent substrate, the test method comprising:
对透明衬底、待测样品和空气分别进行成像并采谱,得到三类测样的透射光强度,根据三类测样的透射光强度计算待测样品的吸收率和吸光度;The transparent substrate, the sample to be tested and the air are respectively imaged and collected to obtain the transmitted light intensities of the three types of samples, and the absorptivity and absorbance of the samples to be tested are calculated according to the transmitted light intensities of the three types of samples;
所述的成像过程包括:开启成像光源和探测光源,探测光源发出的探测光依次穿过透镜、小孔和缩束物镜照射至测样上形成光斑,成像光源发出的成像光照射至测样表面发生反射,反射光经成像物镜收集后送入感光元件对光斑进行成像,通过调整透镜和小孔间的距离,使得成像的光斑直径≤4μm,光斑直径可以是2.0μm、2.2μm、2.4μm、2.6μm、2.8μm、3.0μm、3.2μm、3.4μm、3.6μm、3.8μm或4.0μm,但并不仅限于所列举的数值,该数值范围内其他未列举的数值同样适用。The imaging process includes: turning on the imaging light source and the detection light source, the detection light emitted by the detection light source sequentially passes through the lens, the pinhole and the narrowing objective lens to irradiate the sample to form a spot, and the imaging light emitted by the imaging light source is irradiated to the surface of the sample Reflection occurs, and the reflected light is collected by the imaging objective lens and sent to the photosensitive element to image the spot. By adjusting the distance between the lens and the small hole, the diameter of the imaging spot is ≤4μm, and the spot diameter can be 2.0μm, 2.2μm, 2.4μm, 2.6 μm, 2.8 μm, 3.0 μm, 3.2 μm, 3.4 μm, 3.6 μm, 3.8 μm or 4.0 μm, but not limited to the listed values, other unlisted values within this range are also applicable.
所述的采谱过程包括:开启探测光源,探测光源发出的探测光依次穿过透镜、小孔和缩束物镜照射至测样表面发生透射,透射光经成像物镜送入光谱仪进行采谱。The spectrum acquisition process includes: turning on the detection light source, and the detection light emitted by the detection light source sequentially passes through the lens, pinhole and narrowing objective lens to irradiate the surface of the sample for transmission, and the transmitted light is sent to the spectrometer through the imaging objective lens for spectrum acquisition.
本发明采用透射式的吸收光谱测试方法,对具有一定透过率的衬底,能测量到较为准确的吸收光谱,通过透镜、小孔和缩束物镜的配合,调整小孔孔径、缩束物镜的倍数以及透镜和小孔的间距将光斑缩小至≤4μm,对于微米级样品,光斑直径越小越有利于消除样品边缘散射效应的影响,与现有的测量吸收光谱的分光光度计相比,可以获取更加准确的吸收光谱。The present invention adopts the transmission absorption spectrum testing method, and can measure the relatively accurate absorption spectrum for the substrate with a certain transmittance, and adjust the aperture of the small aperture and the narrowing objective lens through the cooperation of the lens, the small hole and the narrowing objective lens. The multiple of the lens and the distance between the lens and the pinhole narrow the spot to ≤4μm. For micron-sized samples, the smaller the spot diameter is, the better it is to eliminate the influence of the scattering effect at the edge of the sample. Compared with the existing spectrophotometer for measuring absorption spectra, A more accurate absorption spectrum can be obtained.
作为本发明一种优选的技术方案,透明衬底的透射光强度记为Tsub,待测样品的透射光强度记为Tsample,空气的透射光强度记为Tair,待测样品的吸收率记为I,待测样品的吸光度记为A。As a preferred technical solution of the present invention, the transmitted light intensity of the transparent substrate is denoted as T sub , the transmitted light intensity of the sample to be tested is denoted as T sample , the transmitted light intensity of air is denoted as T air , and the absorptivity of the sample to be measured Denoted as I, the absorbance of the sample to be tested is denoted as A.
通过Tsub、Tsample和Tair计算待测样品的吸收率I和吸光度A,其中,吸收率I的计算公式如式(1)所示:Calculate the absorbance I and absorbance A of the sample to be tested through T sub , T sample and Tai air , where the formula for calculating the absorbance I is shown in formula (1):
I=(Tsub-Tsample)/Tair 式(1);I=(T sub -T sample )/T air formula (1);
吸光度A的计算公式如式(2)所示:The calculation formula of absorbance A is shown in formula (2):
A=lg[Tair/(Tair-Tsub+Tsample)] 式(2)。A=lg[T air /(T air -T sub +T sample )] Formula (2).
若透明衬底几乎无吸收而有较弱反射,例如普通玻璃,可直接将经过样品后的出射光作为样品吸收入射光后的出射光,无须减去衬底吸收。采用以下公式计算吸收率I和吸光度A:If the transparent substrate has almost no absorption but weak reflection, such as ordinary glass, the outgoing light after passing through the sample can be directly used as the outgoing light after the sample absorbs the incident light, without subtracting the substrate absorption. Absorbance I and absorbance A were calculated using the following formulas:
I=(Tair-Tsample)/Tair;A=lg(Tair/Tsample)。I=(T air −T sample )/T air ; A=lg(T air /T sample ).
作为本发明一种优选的技术方案,所述的测试方法还包括:根据待测样品的吸收率和吸光度,绘制不同波长下待测样品的吸收率谱图和吸光度谱图。As a preferred technical solution of the present invention, the test method further includes: drawing the absorbance spectrum and absorbance spectrum of the sample to be tested at different wavelengths according to the absorbance and absorbance of the sample to be tested.
作为本发明一种优选的技术方案,所述的探测光源为宽谱白光光源,进一步优选为卤钨灯源。As a preferred technical solution of the present invention, the detection light source is a broad-spectrum white light source, more preferably a tungsten halogen light source.
在本发明中,探测光源是发出所需波长范围内的连续光谱,要求具备足够的光强度,能量分布均匀且稳定输出。优选采用宽谱白光光源,可以实现较宽光谱范围吸收光谱的测量,适用的样品范围更广。In the present invention, the detection light source emits a continuous spectrum within the required wavelength range, which requires sufficient light intensity, uniform energy distribution and stable output. It is preferable to use a wide-spectrum white light source, which can realize the measurement of the absorption spectrum in a wider spectral range, and is applicable to a wider range of samples.
优选地,所述的小孔直径为100~200μm,例如可以是100μm、110μm、120μm、130μm、140μm、150μm、160μm、170μm、180μm、190μm或200μm,但并不仅限于所列举的数值,该数值范围内其他未列举的数值同样适用。Preferably, the pore diameter is 100-200 μm, such as 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm or 200 μm, but not limited to the listed values, the values Other unrecited values within the range also apply.
作为本发明一种优选的技术方案,所述的缩束物镜的放大倍数为50倍或60倍。As a preferred technical solution of the present invention, the magnification of the narrowing objective lens is 50 times or 60 times.
优选地,所述的成像物镜的放大倍数为20倍。Preferably, the magnification of the imaging objective lens is 20 times.
作为本发明一种优选的技术方案,所述的待测样品包括透明衬底和生长于透明衬底上的待测材料。As a preferred technical solution of the present invention, the sample to be tested includes a transparent substrate and a material to be tested grown on the transparent substrate.
优选地,所述的透明衬底为蓝宝石衬底。Preferably, the transparent substrate is a sapphire substrate.
作为本发明一种优选的技术方案,在成像过程中,成像物镜收集的反射光再次反射后送入感光元件,感光元件将反射光信息传输至显示设备得到光斑图像。As a preferred technical solution of the present invention, during the imaging process, the reflected light collected by the imaging objective lens is reflected again and sent to the photosensitive element, and the photosensitive element transmits the reflected light information to the display device to obtain a spot image.
优选地,在采谱过程中,所述的成像物镜收集的透射光不经反射直接送入光谱仪进行采谱。Preferably, during the spectrum collection process, the transmitted light collected by the imaging objective lens is directly sent to the spectrometer for spectrum collection without being reflected.
第二方面,本发明提供了一种透明衬底上微米级样品吸收光谱的测试系统装置,所述的测试系统装置用于进行第一方面所述的测试方法。In the second aspect, the present invention provides a test system device for the absorption spectrum of a micron-scale sample on a transparent substrate, and the test system device is used to perform the test method described in the first aspect.
所述的系统装置包括沿光路依次设置的探测光源、透镜、小孔、缩束物镜、测样、成像物镜和光谱仪,探测光源发出的探测光依次穿过透镜和小孔后经缩束物镜将光束直径缩小至≤4μm,探测光穿过待测样品后的透射光由成像物镜收集送入光谱仪进行采谱;The system device includes a detection light source, a lens, a pinhole, a narrowing objective lens, a measuring sample, an imaging objective lens and a spectrometer arranged in sequence along the optical path. The diameter of the beam is reduced to ≤4μm, and the transmitted light after the probe light passes through the sample to be measured is collected by the imaging objective lens and sent to the spectrometer for spectrum acquisition;
所述的测试系统装置还包括成像光源、感光元件和显示设备,所述的成像光源和感光光源用于对探测光形成的光斑进行成像;所述的成像光源发出的成像光照射至测样表面发生反射,反射光由成像物镜收集后送入感光元件进行成像并将图像传输至显示设备。The test system device also includes an imaging light source, a photosensitive element and a display device, the imaging light source and the photosensitive light source are used to image the light spot formed by the probe light; the imaging light emitted by the imaging light source is irradiated onto the sample surface Reflection occurs, and the reflected light is collected by the imaging objective lens and then sent to the photosensitive element for imaging and the image is transmitted to the display device.
本发明通过透镜、小孔、缩束物镜和感光元件的组合构建了用于测试微米级样品的吸收光谱的成像系统,可实现微区操作,可将光斑缩小至≤4μm,对于微米级样品,光斑直径越小越有利于消除样品边缘散射效应的影响,与现有的测量吸收光谱的分光光度计相比,可以获取更加准确的吸收光谱。The present invention builds an imaging system for testing the absorption spectrum of micron-scale samples through the combination of lenses, pinholes, beam-shrinking objective lenses and photosensitive elements, which can realize micro-area operation and reduce the spot to ≤4μm. For micron-scale samples, The smaller the diameter of the spot, the better it is to eliminate the influence of the scattering effect at the edge of the sample. Compared with the existing spectrophotometer for measuring the absorption spectrum, a more accurate absorption spectrum can be obtained.
作为本发明一种优选的技术方案,所述的测试系统装置还包括位于成像物镜和感光元件之间的反射镜,成像物镜收集的发射光经反射镜反射后进入感光元件。As a preferred technical solution of the present invention, the test system device further includes a reflective mirror located between the imaging objective lens and the photosensitive element, and the emitted light collected by the imaging objective lens enters the photosensitive element after being reflected by the reflective mirror.
作为本发明一种优选的技术方案,所述的探测光源为宽谱白光光源,进一步优选为卤钨灯源。As a preferred technical solution of the present invention, the detection light source is a broad-spectrum white light source, more preferably a tungsten halogen light source.
优选地,所述的小孔直径为100~200μm。Preferably, the diameter of the small holes is 100-200 μm.
优选地,所述的缩束物镜的放大倍数为50倍或60倍。Preferably, the magnification of the narrowing objective lens is 50 times or 60 times.
优选地,所述的成像物镜的放大倍数为20倍。Preferably, the magnification of the imaging objective lens is 20 times.
示例性地,本发明提供了一种透明衬底上微米级样品吸收光谱的测试方法,所述的测试方法具体包括如下步骤:Exemplarily, the present invention provides a method for testing the absorption spectrum of a micron-scale sample on a transparent substrate. The test method specifically includes the following steps:
(1)安装探测光源、成像光源、透镜、小孔、缩束物镜、成像物镜、感光元件和光谱仪,将透明衬底固定于缩束物镜和成像物镜之间,开启光源,调整透镜和小孔的间距,确认光路是否聚焦于透明衬底上;(1) Install the detection light source, imaging light source, lens, aperture, beam reduction objective, imaging objective, photosensitive element and spectrometer, fix the transparent substrate between the beam reduction objective and imaging objective, turn on the light source, adjust the lens and aperture to confirm whether the optical path is focused on the transparent substrate;
(2)开启成像光源和探测光源,探测光源发出的探测光依次穿过透镜、小孔和缩束物镜照射至透明衬底表面形成光斑,成像光源发出的成像光照射至透明衬底表面发生反射,反射光经成像物镜收集后送入感光元件对光斑进行成像,并将图像传输至显示设备,通过调整透镜和小孔间的距离,使得成像的光斑直径≤4μm;(2) Turn on the imaging light source and the detection light source, the detection light emitted by the detection light source passes through the lens, pinhole and narrowing objective lens in turn and irradiates to the surface of the transparent substrate to form a spot, and the imaging light emitted by the imaging light source is reflected on the surface of the transparent substrate , the reflected light is collected by the imaging objective lens and sent to the photosensitive element to image the spot, and the image is transmitted to the display device. By adjusting the distance between the lens and the small hole, the diameter of the imaging spot is ≤4μm;
(3)撤掉反射镜,关闭成像光源,开启探测光源,探测光源发出的探测光依次穿过透镜、小孔和缩束物镜照射至透明衬底表面发生透射,透射光经成像物镜送入光谱仪进行采谱,得到透明衬底的透射光强度,记为Tsub;(3) The reflector is removed, the imaging light source is turned off, and the detection light source is turned on. The detection light emitted by the detection light source passes through the lens, pinhole and narrowing objective lens in turn and irradiates to the surface of the transparent substrate for transmission. The transmitted light is sent to the spectrometer through the imaging objective lens Perform spectrum acquisition to obtain the transmitted light intensity of the transparent substrate, which is denoted as T sub ;
(4)卸下透明衬底,更换待测样品,重复步骤(1)-(3),得到待测样品的透射光强度,记为Tsample;卸下待测样品,重复步骤(1)-(3),得到空气的透射光强度,记为Tair;(4) Unload the transparent substrate, replace the sample to be tested, repeat steps (1)-(3), obtain the transmitted light intensity of the sample to be tested, and record it as T sample ; unload the sample to be tested, and repeat steps (1)-(3) (3), obtain the transmitted light intensity of air, be recorded as T air ;
通过Tsub、Tsample和Tair计算待测样品的吸收率I和吸光度A,其中,吸收率I的计算公式如式(1)所示:Calculate the absorbance I and absorbance A of the sample to be tested through T sub , T sample and Tai air , where the formula for calculating the absorbance I is shown in formula (1):
I=(Tsub-Tsample)/Tair 式(1);I=(T sub -T sample )/T air formula (1);
吸光度A的计算公式如式(2)所示:The calculation formula of absorbance A is shown in formula (2):
A=lg[Tair/(Tair-Tsub+Tsample)] 式(2);A=lg[T air /(T air -T sub +T sample )] formula (2);
(5)根据待测样品的吸收率和吸光度,绘制不同波长下待测样品的吸收率谱图和吸光度谱图。(5) According to the absorbance and absorbance of the sample to be tested, the absorbance spectrum and the absorbance spectrum of the sample to be tested at different wavelengths are drawn.
与现有技术相比,本发明的有益效果为:Compared with prior art, the beneficial effect of the present invention is:
本发明采用透射式的吸收光谱测试方法,对具有一定透过率的衬底,能测量到较为准确的吸收光谱,通过透镜、小孔和缩束物镜的配合,调整小孔孔径、缩束物镜的倍数以及透镜和小孔的间距将光斑缩小至≤4μm,对于微米级样品,光斑直径越小越有利于消除样品边缘散射效应的影响,与现有的测量吸收光谱的分光光度计相比,可以获取更加准确的吸收光谱。The present invention adopts the transmission absorption spectrum testing method, and can measure the relatively accurate absorption spectrum for the substrate with a certain transmittance, and adjust the aperture of the small aperture and the narrowing objective lens through the cooperation of the lens, the small hole and the narrowing objective lens. The multiple of the lens and the spacing between the lens and the pinhole narrow the spot to ≤4μm. For micron-sized samples, the smaller the spot diameter is, the better it is to eliminate the influence of the scattering effect at the edge of the sample. Compared with the existing spectrophotometer for measuring absorption spectra, A more accurate absorption spectrum can be obtained.
附图说明Description of drawings
图1为本发明一个具体实施方式提供的测量系统装置在成像阶段的结构示意图;Fig. 1 is a schematic structural diagram of a measurement system device provided in an embodiment of the present invention at the imaging stage;
图2为本发明一个具体实施方式提供的测量系统装置在采谱阶段的结构示意图;Fig. 2 is a schematic structural diagram of a measurement system device provided in a specific embodiment of the present invention in the spectrum acquisition stage;
图3为本发明应用例提供的光斑照片;Fig. 3 is the light spot photograph that the application example of the present invention provides;
图4为本发明应用例提供的透明衬底、待测样品和空气的透射光强度图;Fig. 4 is the transmitted light intensity diagram of the transparent substrate, the sample to be tested and the air provided by the application example of the present invention;
图5为本发明应用例提供的待测样品的吸收率谱图和吸光度谱图;Fig. 5 is the absorbance spectrogram and the absorbance spectrogram of the sample to be tested provided by the application example of the present invention;
其中,1-探测光源;2-透镜;3-小孔;4-缩束物镜;5-待测样品;6-成像物镜;7-反射镜;8-感光元件;9-显示设备;10-光谱仪。Among them, 1-detection light source; 2-lens; 3-aperture; 4-beam reduction objective lens; 5-sample to be tested; 6-imaging objective lens; 7-mirror; 8-photosensitive element; spectrometer.
具体实施方式Detailed ways
需要理解的是,在本发明的描述中,术语“中心”、“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”等仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”等的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明的描述中,除非另有说明,“多个”的含义是两个或两个以上。It should be understood that in the description of the present invention, the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientations or positional relationships indicated by "vertical", "horizontal", "top", "bottom", "inner" and "outer" are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and Simplified descriptions, rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention. In addition, the terms "first", "second", etc. are used for descriptive purposes only, and should not be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, a feature defined as "first", "second", etc. may expressly or implicitly include one or more of that feature. In the description of the present invention, unless otherwise specified, "plurality" means two or more.
需要说明的是,在本发明的描述中,除非另有明确的规定和限定,术语“设置”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以通过具体情况理解上述术语在本发明中的具体含义。It should be noted that, in the description of the present invention, unless otherwise clearly stipulated and limited, the terms "set", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connection, or integral connection; it can be mechanical connection or electrical connection; it can be direct connection or indirect connection through an intermediary, and it can be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention based on specific situations.
下面结合附图并通过具体实施方式来进一步说明本发明的技术方案。The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods.
在一个具体实施方式中,本发明提供了一种透明衬底上微米级样品吸收光谱的测试系统装置,所述的系统装置如图1和图2所示,系统装置包括沿光路依次设置的探测光源1、透镜2、小孔3、缩束物镜4、测样、成像物镜6和光谱仪10,探测光源1发出的探测光依次穿过透镜2和小孔3后经缩束物镜4将光束直径缩小至≤4μm,探测光穿过待测样品5后形成的透射光由成像物镜6收集送入光谱仪10进行采谱;In a specific embodiment, the present invention provides a system device for testing the absorption spectrum of a micron-scale sample on a transparent substrate. The system device is shown in Figure 1 and Figure 2. Light source 1, lens 2, small hole 3, narrowing objective lens 4, sample measuring, imaging objective lens 6 and spectrometer 10, the detection light emitted by detection light source 1 passes through lens 2 and small hole 3 in sequence, and then the beam diameter is reduced by narrowing objective lens 4 Narrowed down to ≤4 μm, the transmitted light formed after the probe light passes through the sample 5 to be tested is collected by the imaging objective lens 6 and sent to the spectrometer 10 for spectrum collection;
测试系统装置还包括成像光源、感光元件8和显示设备9,成像光源和感光光源用于对探测光形成的光斑进行成像;成像光源发出的成像光照射至测样表面发生反射,反射光由成像物镜6收集后送入感光元件8进行成像并将图像传输至显示设备9。The test system device also includes an imaging light source, a photosensitive element 8 and a display device 9. The imaging light source and the photosensitive light source are used to image the spot formed by the probe light; After being collected by the objective lens 6 , it is sent to the photosensitive element 8 for imaging and the image is transmitted to the display device 9 .
测试系统装置还包括位于成像物镜6和感光元件8之间的反射镜7,成像物镜6收集的发射光经反射镜7反射后进入感光元件8。The test system device also includes a reflective mirror 7 located between the imaging objective lens 6 and the photosensitive element 8 , and the emitted light collected by the imaging objective lens 6 enters the photosensitive element 8 after being reflected by the reflective mirror 7 .
在本具体实施方式中,探测光源1为宽谱白光光源,小孔3直径为100~200μm,缩束物镜4的放大倍数为50倍或60倍,成像物镜6的放大倍数为20倍。In this specific embodiment, the detection light source 1 is a broad-spectrum white light source, the diameter of the pinhole 3 is 100-200 μm, the magnification of the narrowing objective lens 4 is 50 times or 60 times, and the magnification factor of the imaging objective lens 6 is 20 times.
在另一个具体实施方式中,本发明提供了一种透明衬底上微米级样品吸收光谱的测试方法,所述的测试方法具体包括如下步骤:In another specific embodiment, the present invention provides a method for testing the absorption spectrum of a micron-scale sample on a transparent substrate. The test method specifically includes the following steps:
(1)如图1所示,安装探测光源1、成像光源、透镜2、小孔3、缩束物镜4、成像物镜6、感光元件8和光谱仪10,将透明衬底固定于缩束物镜4和成像物镜6之间,开启光源,调整透镜2和小孔3的间距,确认光路是否聚焦于透明衬底上;(1) As shown in Figure 1, install the detection light source 1, the imaging light source, the lens 2, the pinhole 3, the beam reduction objective lens 4, the imaging objective lens 6, the photosensitive element 8 and the spectrometer 10, and fix the transparent substrate on the beam reduction objective lens 4 Between the imaging objective lens 6, turn on the light source, adjust the distance between the lens 2 and the small hole 3, and confirm whether the optical path is focused on the transparent substrate;
(2)开启成像光源和探测光源1,探测光源1发出的探测光依次穿过透镜2、小孔3和缩束物镜4照射至透明衬底表面形成光斑,成像光源发出的成像光照射至透明衬底表面发生反射,反射光经成像物镜6收集后送入感光元件8对光斑进行成像,并将图像传输至显示设备9,通过调整透镜2和小孔3间的距离,使得成像的光斑直径≤4μm;(2) Turn on the imaging light source and the detection light source 1, the detection light emitted by the detection light source 1 sequentially passes through the lens 2, the pinhole 3 and the narrowing objective lens 4 and irradiates to the surface of the transparent substrate to form a spot, and the imaging light emitted by the imaging light source irradiates to the transparent surface The surface of the substrate is reflected, and the reflected light is collected by the imaging objective lens 6 and sent to the photosensitive element 8 to image the spot, and the image is transmitted to the display device 9. By adjusting the distance between the lens 2 and the small hole 3, the diameter of the spot for imaging ≤4μm;
(3)如图2所示,撤掉反射镜7,关闭成像光源,开启探测光源1,探测光源1发出的探测光依次穿过透镜2、小孔3和缩束物镜4照射至透明衬底表面发生透射,透射光经成像物镜6送入光谱仪10进行采谱,得到透明衬底的透射光强度,记为Tsub;(3) As shown in Figure 2, the reflector 7 is removed, the imaging light source is turned off, the detection light source 1 is turned on, and the detection light emitted by the detection light source 1 sequentially passes through the lens 2, the small hole 3 and the narrowing objective lens 4 to irradiate the transparent substrate The surface is transmitted, and the transmitted light is sent to the spectrometer 10 through the imaging objective lens 6 for spectrum collection, and the transmitted light intensity of the transparent substrate is obtained, which is denoted as T sub ;
(4)卸下透明衬底,更换待测样品5,重复步骤(1)-(3),得到待测样品5的透射光强度,记为Tsample;卸下待测样品5,重复步骤(1)-(3),得到空气的透射光强度,记为Tair;(4) Unload the transparent substrate, replace the sample 5 to be tested, repeat steps (1)-(3), obtain the transmitted light intensity of the sample 5 to be tested, be denoted as T sample ; unload the sample 5 to be tested, repeat the steps ( 1)-(3), obtain the transmitted light intensity of air, be recorded as T air ;
通过Tsub、Tsample和Tair计算待测样品5的吸收率I和吸光度A,其中,吸收率I的计算公式如式(1)所示:Calculate the absorbance I and absorbance A of the sample 5 to be tested by T sub , T sample and Tai air , wherein the calculation formula of the absorbance I is shown in formula (1):
I=(Tsub-Tsample)/Tair 式(1);I=(T sub -T sample )/T air formula (1);
吸光度A的计算公式如式(2)所示:The calculation formula of absorbance A is shown in formula (2):
A=lg[Tair/(Tair-Tsub+Tsample)] 式(2);A=lg[T air /(T air -T sub +T sample )] formula (2);
(5)根据待测样品5的吸收率和吸光度,绘制不同波长下待测样品5的吸收率谱图和吸光度谱图。(5) According to the absorptivity and absorbance of the sample 5 to be tested, draw the absorbance spectrum and the absorbance spectrum of the sample 5 to be tested at different wavelengths.
应用例Application example
本应用例提供了一种针对具体材料的测试方法,以测试蓝宝石衬底上的单层MoS2的吸收光谱为例,测试方法具体包括如下步骤:This application example provides a test method for specific materials. Taking the absorption spectrum of a single layer of MoS2 on a sapphire substrate as an example, the test method specifically includes the following steps:
(1)安装探测光源1、成像光源、透镜2、200μm的小孔3、50倍的缩束物镜4、20倍的成像物镜6、感光元件8和光谱仪10,其中,探测光源1采用Thorlabs的卤钨灯源;将透明衬底固定于缩束物镜4和成像物镜6之间,开启光源,调整透镜2和小孔3的间距,确认光路是否聚焦于透明衬底上;(1) Install detection light source 1, imaging light source, lens 2, 200 μm pinhole 3, 50 times narrower objective lens 4, 20 times imaging objective lens 6, photosensitive element 8 and spectrometer 10, wherein, detection light source 1 adopts Thorlabs Tungsten halogen lamp source; fix the transparent substrate between the beam reduction objective lens 4 and the imaging objective lens 6, turn on the light source, adjust the distance between the lens 2 and the small hole 3, and confirm whether the optical path is focused on the transparent substrate;
(2)开启成像光源和探测光源1,探测光源1发出的探测光依次穿过透镜2、200μm的小孔3和缩束物镜4照射至透明衬底表面形成光斑,成像光源发出的成像光照射至透明衬底表面发生反射,反射光经成像物镜6收集后送入感光元件8对光斑进行成像,并将图像传输至显示设备9,通过调整透镜2和小孔3间的距离,使得成像的光斑直径达到4μm(如图3所示,图3中标尺长度为10μm);(2) Turn on the imaging light source and the detection light source 1, the detection light emitted by the detection light source 1 sequentially passes through the lens 2, the 200 μm small hole 3 and the narrowing objective lens 4 to irradiate to the surface of the transparent substrate to form a spot, and the imaging light emitted by the imaging light source irradiates Reflected on the surface of the transparent substrate, the reflected light is collected by the imaging objective lens 6 and sent to the photosensitive element 8 to image the spot, and the image is transmitted to the display device 9. By adjusting the distance between the lens 2 and the small hole 3, the imaging The diameter of the spot reaches 4 μm (as shown in Figure 3, the length of the scale in Figure 3 is 10 μm);
(3)撤掉反射镜7,关闭成像光源,开启探测光源1,探测光源1发出的探测光依次穿过透镜2、小孔3和缩束物镜4照射至透明衬底表面发生透射,透射光经成像物镜6送入光谱仪10进行采谱,得到透明衬底的透射光强度,记为Tsub;(3) The reflector 7 is removed, the imaging light source is turned off, and the detection light source 1 is turned on. The detection light emitted by the detection light source 1 sequentially passes through the lens 2, the small hole 3 and the narrowing objective lens 4 and irradiates to the surface of the transparent substrate for transmission, and the transmitted light The imaging objective lens 6 is sent to the spectrometer 10 for spectrum collection to obtain the transmitted light intensity of the transparent substrate, which is denoted as T sub ;
(4)卸下透明衬底,更换待测样品5,重复步骤(1)-(3),得到待测样品5的透射光强度,记为Tsample;卸下待测样品5,重复步骤(1)-(3),得到空气的透射光强度,记为Tair;(4) Unload the transparent substrate, replace the sample 5 to be tested, repeat steps (1)-(3), obtain the transmitted light intensity of the sample 5 to be tested, be denoted as T sample ; unload the sample 5 to be tested, repeat the steps ( 1)-(3), obtain the transmitted light intensity of air, be recorded as T air ;
通过Tsub、Tsample和Tair计算待测样品5的吸收率I和吸光度A,其中,吸收率I的计算公式如式(1)所示:Calculate the absorbance I and absorbance A of the sample 5 to be tested by T sub , T sample and Tai air , wherein the calculation formula of the absorbance I is shown in formula (1):
I=(Tsub-Tsample)/Tair 式(1);I=(T sub -T sample )/T air formula (1);
吸光度A的计算公式如式(2)所示:The calculation formula of absorbance A is shown in formula (2):
A=lg[Tair/(Tair-Tsub+Tsample)] 式(2);A=lg[T air /(T air -T sub +T sample )] formula (2);
(5)根据待测样品5的吸收率和吸光度(计算结果见图4),绘制不同波长下待测样品5的吸收率谱图和吸光度谱图(如图5所示)。(5) According to the absorptivity and absorbance of the sample to be tested 5 (calculation results are shown in Figure 4), draw the absorptivity spectrum and the absorbance spectrum of the sample to be tested 5 at different wavelengths (as shown in Figure 5).
申请人声明,以上所述仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,所属技术领域的技术人员应该明了,任何属于本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到的变化或替换,均落在本发明的保护范围和公开范围之内。The applicant declares that the above description is only a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto, and those skilled in the art should understand that any person skilled in the art should be aware of any disclosures disclosed in the present invention. Within the technical scope, easily conceivable changes or substitutions all fall within the scope of protection and disclosure of the present invention.
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