CN112902736A - Sediment cleaning system for thermal equipment after chemical cleaning and using method - Google Patents

Abstract

The invention discloses a sediment cleaning system after chemical cleaning of thermal equipment and a use method thereof, wherein the system has the functions of water drainage and sediment cleaning; the positioning pipe in the system enters the interior of a thermal equipment header through a connecting pipe of the header under the guidance of a flow guide pipe, the positioning pipe is connected into a sediment cleaning system by using a movable joint, and residual water in the header after chemical cleaning is filtered and then discharged by using a self-priming pump; after the residual water in the header is discharged, observing the sediments after chemical cleaning by using an endoscope, and moving the positioning pipe to the position of the sediments after determining the position of the sediments; the system is provided with a gas-solid separator, a filter, a buffer tank, a dryer and a vacuum pump, wherein the sediments in the header after chemical cleaning are sucked into the gas-solid separator through the suction force provided by the vacuum pump, and are discharged after being separated by the separator. The system is reliable and easy to realize, and solves the problem that sediment in the header is difficult to clean after the thermal equipment is chemically cleaned.

Description

Sediment cleaning system for thermal equipment after chemical cleaning and using method

Technical Field

The invention belongs to the technical field of chemical cleaning, and particularly relates to a sediment cleaning system for a thermal device after chemical cleaning and a using method thereof.

Background

Chemical cleaning is a common method for removing scaling inside heat exchange tubes of thermal equipment. The chemical cleaning is to remove the scaling and corrosion products from the heat exchange tube by using the chemical reaction between the effective components of the cleaning agent and the scaling in the heat exchange tube, and the scaling mechanism of the chemical cleaning consists of dissolution and stripping. The scale layer is difficult to dissolve again by the cleaning agent, and the scale layer is generally stripped to be powder. When the system velocity of flow was enough high, the dirt layer of peeling off during chemical cleaning will be taken away cleaning system, but chemical cleaning system can have the blind area, and cleaning solution is close to the state of stewing in the blind area position, and the dirt layer of peeling off piles up easily and forms the washing residue in the blind area position, and the thermal equipment header end position that often washs is exactly great blind area, and the header end can have a large amount of washing residues. If the cleaned residues cannot be effectively cleaned, the water quality of the equipment is unqualified easily after the equipment is started if the residues are not cleaned effectively, and the heat exchange pipe is blocked due to the cleaning residues if the residues are not cleaned effectively, so that the pipe explosion accident is caused. The following difficulties exist in cleaning the residues after chemical cleaning: after chemical cleaning, residual water exists in the header due to the fact that a special structure of the header or a drain pipe of the header is not located at the lowest point, the residue is difficult to observe and clean due to the existence of water in the header, the residual water in the header is generally drained by a siphon method through cutting a connecting pipe or a hand hole of the header, but the water drainage speed of the siphon method is low, and the water in the header cannot be completely drained; residue clearance in the header usually needs to cut off the header head and clear up, because header head wall thickness, need weld and heat treatment when the head resumes, thick-walled pipe welding and the heat treatment degree of difficulty are big, the risk is high, and improper easy the head that causes of heat treatment damages.

Therefore, it is very necessary to develop a technology for cleaning sediments after chemical cleaning of thermal equipment, which is convenient to operate, can quickly drain residual water of the header and does not need to cut the header seal head.

Disclosure of Invention

In order to solve the problems existing in the prior art, the invention aims to provide a system for cleaning sediments after chemical cleaning of thermal equipment and a using method thereof.

The invention adopts the following technical scheme:

a thermal equipment chemical cleaning back sediment clearance system, this system includes drainage subsystem and sediment remove subsystem, the orientation tube 2 enters the header from the thermal equipment header connecting pipe under the guide of honeycomb duct 3, use union 4 to position the tube 2 exit and divide two routes to connect drainage subsystem and sediment remove subsystem respectively, the said drainage subsystem includes setting up the first filter 6 on the drain pipe, the first filter 6 sets up leading isolating valve 5 and postposition isolating valve 7, postposition isolating valve 7 connects to the entry of the self priming pump 8; the sediment removal subsystem comprises a first gas-solid separator 11 and a second gas-solid separator 16 which are arranged on a sediment removal pipe in parallel, the first gas-solid separator 11 is provided with a first preposed isolation valve 9 and a first postposition isolation valve 13, the top and the bottom of the first gas-solid separator 11 are respectively provided with a first gas valve 10 and a first solid valve 12, the second gas-solid separator 16 is provided with a second preposed isolation valve 14 and a second postposition isolation valve 18, the top and the bottom of the second gas-solid separator 16 are respectively provided with a second gas valve 15 and a second solid valve 17, the outlets of the first postposition isolation valve 13 and the second postposition isolation valve 18 are both connected with a second filter 19, the rear part of the second filter 19 is connected with a post-filter isolation valve 20, the rear part of the post-filter isolation valve 20 is connected with a dryer 21, the rear part of the dryer 21 is connected with a post-dryer isolation valve 22, the rear part of the post-dryer isolation valve 22 is connected with a vacuum, the rear of the vacuum buffer tank 23 is connected with a rear vacuum buffer tank isolation valve 24, and the rear of the rear vacuum buffer tank isolation valve 24 is connected with an inlet of a vacuum pump 25.

Preferably, the positioning pipe 2 is a metal hose, the flow guide pipe 3, the drain pipe and the sediment removal pipe are made of plastic or metal materials, the positioning pipe is the metal hose, and can be bent from the inside of the flow guide pipe to penetrate into the header, certain strength can be kept, and the positioning pipe is easy to advance to a sediment position during use. The honeycomb duct 3 guides the direction of the positioning tube 2, and prevents the positioning tube from bending or locally rotating when entering the header.

Preferably, the first filter 6 and the second filter 19 are filter element type filters, and the aperture of the filter element is smaller than 2mm, so that the powder sediment with smaller diameter can be prevented from entering the self-priming pump or the vacuum pump. Preferably, the first gas-solid separator 11 and the second gas-solid separator 16 are provided with observation holes, so that the condition of the sediments in the gas-solid separators can be conveniently observed. The gas-solid mixture enters from the middle of the separator, and the gas after gas-solid separation is discharged from the top.

Preferably, the self-sucking pump 8 is made of plastic, the sucking distance of the self-sucking pump 8 is not less than 3 meters, the vacuum pump 25 is a single vacuum pump or a vacuum pump group, and the air suction speed of the vacuum pump 25 is 50L/s-1500L/s, so that enough power can be provided for removing residual water and residues in the header, and the residual water and the sediments can be discharged quickly.

The using method of the sediment cleaning system after the chemical cleaning of the thermal equipment comprises the steps of firstly discharging residual water in a header after the chemical cleaning of the thermal equipment, extending a positioning pipe 2 into the header of the thermal equipment through a guide pipe 3, connecting the positioning pipe 2 and a movable joint 4, closing a first preposed isolation valve 9 and a second preposed isolation valve 14, opening a preposed isolation valve 5 and a postpositive isolation valve 7, and starting a self-sucking pump 8; after residual water in the header is completely drained, the self-priming pump 8 is stopped, the preposed isolation valve 5 is closed, the endoscope extends into the header to observe the position of the cleaned sediment 1, after the position is determined, the positioning pipe is moved to the position above the cleaned sediment 1, the second preposed isolation valve 14, the second postposed isolation valve 18, the first gas valve 10, the first solid valve 12, the second gas valve 15, the second solid valve 17 and the vacuum buffer tank rear isolation valve 24 are closed, the first preposed isolation valve 9, the first postposed isolation valve 13, the filter rear isolation valve 20 and the dryer rear isolation valve 22 are opened, and after the vacuum pump 25 is started, the opening degree of the vacuum buffer tank rear isolation valve 24 is adjusted to enable the sediment to be sucked into the first gas-solid separator 11; when sediment needs to be discharged, a deslagging loop needs to be switched: opening a second preposed isolation valve 14 and a second postpositive isolation valve 18, closing a first preposed isolation valve 9 and a first postpositive isolation valve 13, and opening a first gas valve 10 and a first solid valve 12; after the deslagging is completed, the vacuum buffer tank is closed, and the isolation valve 24 stops the vacuum pump 25.

Compared with the prior art, the invention has the following advantages:

1) the system is simple, convenient to install and easy to realize.

2) The self-priming pump is used for draining power, so that the drainage efficiency is high.

3) The hand hole of the thermal equipment collection box is not required to be cut off, only the small-caliber connecting pipe on the thermal equipment collection box is required to be cut off, and the recovery period of the thermal equipment system is short after sediment is cleaned.

Drawings

FIG. 1 is a schematic diagram of the system of the present invention.

Detailed Description

The invention is further described with reference to the following figures and specific embodiments.

As shown in fig. 1, a thermal equipment chemical cleaning sediment cleaning system and a using method thereof, the system has the functions of water drainage and sediment cleaning; firstly, cutting off the connecting pipe at the proper position of the cleaned thermal equipment header; placing the draft tube 3 into the header from the connecting tube; the positioning pipe 2 extends into a thermal equipment header through a guide pipe 3, the positioning pipe 2 and a movable joint 4 are connected, a first preposed isolation valve 9 and a second preposed isolation valve 14 are closed, a preposed isolation valve 5 and a postpositive isolation valve 7 are opened, and a self-priming pump 8 is started; after residual water in the header is completely drained, the self-priming pump 8 is stopped, the preposed isolation valve 5 is closed, the endoscope extends into the header to observe the position of the cleaned sediment 1, after the position is determined, the positioning pipe is moved to the position above the cleaned sediment 1, the second preposed isolation valve 14, the second postposed isolation valve 18, the first gas valve 10, the first solid valve 12, the second gas valve 15, the second solid valve 17 and the vacuum buffer tank rear isolation valve 24 are closed, the first preposed isolation valve 9, the first postposed isolation valve 13, the filter rear isolation valve 20 and the dryer rear isolation valve 22 are opened, and after the vacuum pump 25 is started, the opening degree of the vacuum buffer tank rear isolation valve 24 is adjusted to enable the sediment to be sucked into the first gas-solid separator 11; when sediment needs to be discharged, a deslagging loop needs to be switched: opening a second preposed isolation valve 14 and a second postpositive isolation valve 18, closing a first preposed isolation valve 9 and a first postpositive isolation valve 13, and opening a first gas valve 10 and a first solid valve 12; and after deslagging is finished, closing the vacuum buffer tank, then stopping the vacuum pump 25 by the isolating valve 24, and cleaning sediments after chemical cleaning of the thermal equipment is finished.

The above examples are illustrative of the present invention, but are not intended to limit the present invention, and any simple modification, equivalent change and modification made to the above examples by those skilled in the art without inventive labor are within the scope of the present invention.

Claims (6)

1. A thermal equipment chemical cleaning back sediment cleaning system is characterized in that: this system comprises a drainage subsystem and a sediment removal subsystem, and the positioning pipe (2) is connected from the thermal equipment header under the guidance of the guide pipe (3). The pipe enters the header, and the outlet of the positioning pipe (2) is connected to the drainage subsystem and the sediment removal subsystem in two ways using the union (4), and the drainage subsystem includes a first filter ( 6), the first filter (6) is provided with a front isolation valve (5) and a rear isolation valve (7), and the rear isolation valve (7) is connected to the inlet of the self-priming pump (8); The system includes a first gas-solid separator (11) and a second gas-solid separator (16) that are arranged on the sediment removal pipe in parallel, and the first gas-solid separator (11) is provided with a first pre-isolation valve (9) and the first rear isolation valve (13), the top and bottom of the first gas-solid separator (11) are respectively provided with a first gas valve (10), a first solid valve (12), and a second gas-solid separator (16) A second front isolation valve (14) and a second rear isolation valve (18) are provided, and the top and bottom of the second gas-solid separator (16) are respectively provided with a second gas valve (15) and a second solid valve (17) , the outlet of the first rear isolation valve (13) and the second rear isolation valve (18) are connected to the second filter (19), and the second filter (19) is connected to the rear filter isolation valve (20), The isolation valve (20) after the filter is connected to the dryer (21), the isolation valve (22) after the dryer is connected to the isolation valve (22) after the dryer, and the isolation valve (22) after the dryer is connected to the vacuum buffer tank (23). The buffer tank (23) is connected to the rear isolation valve (24) of the vacuum buffer tank, and the rear isolation valve (24) of the vacuum buffer tank is connected to the inlet of the vacuum pump (25). 2. The system for cleaning sediment after chemical cleaning of thermal equipment according to claim 1, characterized in that: the positioning pipe (2) is a metal hose, and the guide pipe (3), the drain pipe and the sediment removal pipe are Made of plastic or metal, the guide tube (3) guides the positioning tube (2) in the direction to prevent the positioning tube from being bent or partially rotated when it enters the header. 3. The sediment cleaning system after chemical cleaning of a thermal equipment according to claim 1, characterized in that: the first filter (6) and the second filter (19) are filter element filters, and filter element The aperture is less than 2mm. 4. A system for cleaning sediment after chemical cleaning of thermal equipment according to claim 1, characterized in that: the first gas-solid separator (11) and the second gas-solid separator (16) are provided with observation holes , the gas-solid mixture enters from the middle of the separator, and the gas after gas-solid separation is discharged from the top. 5. The sediment cleaning system after chemical cleaning of a thermal equipment according to claim 1, characterized in that: the self-priming pump (8) is made of plastic material, and the suction stroke of the self-priming pump (8) is not less than 3 meters, The vacuum pump (25) is a single vacuum pump or a vacuum pump group, and the pumping rate of the vacuum pump (25) is 50L/s-1500L/s. 6. the using method of the sediment cleaning system after the chemical cleaning of a thermal equipment according to any one of claims 1 to 5, it is characterized in that: first discharge the residual water in the header after the chemical cleaning of the thermal equipment, and the positioning pipe (2) Extend the guide pipe (3) into the header of the thermal equipment, connect the positioning pipe (2) and the union (4), close the first pre-isolation valve (9) and the second pre-isolation valve (14), Open the front isolation valve (5) and the rear isolation valve (7), and start the self-priming pump (8). After the residual water in the header is completely drained, stop the self-priming pump (8) and close the front isolation valve ( 5) Extend the endoscope into the header to observe the position of the cleaned sediment (1), after determining the position, move the positioning tube to the top of the cleaned sediment (1), close the second front isolation valve (14), the first Two rear isolation valve (18), first gas valve (10), first solid valve (12), second gas valve (15), second solid valve (17) and vacuum buffer tank rear isolation valve (24) , open the first front isolation valve (9), the first rear isolation valve (13), the isolation valve after the filter (20) and the isolation valve after the dryer (22), start the vacuum pump (25), adjust the vacuum buffer The opening of the isolation valve (24) behind the tank allows the sediment to be sucked into the first gas-solid separator (11); when the sediment needs to be discharged, it is necessary to switch the deslagging circuit: open the second front isolation valve (14) and the second rear isolation valve valve (18), close the first front isolation valve (9) and the first rear isolation valve (13), open the first gas valve (10) and the first solid valve (12); after the slag removal is completed, close the vacuum The isolation valve (24) behind the buffer tank stops the vacuum pump (25).

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