CN112859213A - Micro-nano optical element and design method thereof - Google Patents
Micro-nano optical element and design method thereof Download PDFInfo
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Abstract
The invention provides a micro-nano optical element, which comprises: the surface topography of the main body is provided with one or more microstructure pattern units which are configured to project a preset light field; and a preset pattern part applied on the microstructure pattern unit. The invention also provides a design method of the micro-nano optical element. According to the embodiment of the invention, in order to facilitate identification and tracing in the aspect of anti-counterfeiting and avoid malicious copying and embezzling, anti-counterfeiting marks are made on the microstructure on the basis of not substantially damaging the microstructure design, for example, microstructure marks are added on original structures of DOE and MLA. The designed microstructure mark also belongs to a part of the microstructure, and if malicious reprinting exists, the microstructure mark can be reprinted together, so that the subsequent identification is easier. In addition, the size of the microstructure mark is smaller, and the size of the microstructure mark is smaller than that of the original microstructure, so that the microstructure mark does not have great influence on a light field or the function of the element. The mark can be recognized by using a conventional microscope, and is easy to find and recognize.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a micro-nano optical element with an anti-counterfeiting function and a design method of the micro-nano optical element.
Background
Compared with the traditional optical element (such as a lens), the micro-nano optical element such as the Diffractive Optical Element (DOE) and the micro-lens array (MLA) has the advantages of small size, thin thickness, light weight and the like, can replace the traditional optical element to be beneficial to the miniaturization and integration of an optical system, can modulate a more complex target light field compared with the traditional optical element, and has wide application prospect in the emerging technical fields of three-dimensional imaging, three-dimensional vision, augmented reality and the like. Compared with the traditional optical element, the design difficulty of the micro-nano optical element is high, the processing difficulty of the surface micro-nano topographic structure is high, and a template with a specific micro-nano topographic structure is required to be prepared on the surface of a semiconductor wafer or glass by using methods such as a semiconductor photoetching process, laser direct writing or two-photon photoetching, so that the cost investment in research and development and template preparation links is high, but the micro-nano imprinting technology can be used for carrying out batch imprinting after the template is prepared, the research and development and template preparation cost in the early stage can be continuously reduced along with the increase of the imprinting number, and the cost is reduced. However, the micro-nano optical elements produced in batch by the micro-nano imprinting technology and the template have the same (or complementary) micro-nano surface topography structure, so that illegal competitors can easily use the micro-nano optical elements circulating in the market to directly copy, thereby seriously invading the benefits of original factories. Because the surface micro-nano topography structure of the micro-nano optical element is a nano-scale or micro-scale microstructure, the overall topography morphology is difficult to distinguish, which brings great difficulty in the aspect of researching infringement reproduction.
The statements in this background section merely represent techniques known to the public and are not, of course, representative of the prior art.
Disclosure of Invention
In view of at least one of the drawbacks of the prior art, the present invention provides a micro-nano optical element, comprising:
a body having a surface topography with one or more microstructure pattern units configured to project a predetermined light field; and
and the preset pattern part is applied on the microstructure pattern unit.
According to one aspect of the invention, the micro-nano optical element comprises a micro-lens array.
According to an aspect of the invention, the micro-nano optical element comprises a diffractive optical element.
According to an aspect of the present invention, the predetermined pattern part has a uniform height or depth.
According to an aspect of the invention, the preset pattern part corresponds to a character, letter or graphic mark.
According to an aspect of the present invention, the microstructure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern portion is selected to correspond to the height of one of the steps.
According to an aspect of the present invention, the step heights are selected such that the diffractive optical element has a ratio of the number of 0 phase steps to the number of pi phase steps of between 0.9:1 and 1.1:1, preferably a ratio of the number of 0 phase steps to the number of pi phase steps of between 0.95:1 and 1.05:1, within one unit period of the microstructure pattern.
According to an aspect of the present invention, an area ratio of the predetermined pattern portion in the microstructure pattern unit is less than 2%, wherein preferably the area ratio of the predetermined pattern portion in the microstructure pattern unit is less than 0.2%.
The invention also provides a design method of the micro-nano optical element, which comprises the following steps:
s101: calculating the surface topography of the micro-nano optical element according to a preset light field, wherein the surface topography is provided with one or more microstructure pattern units which are configured to project the preset light field;
s102: applying a preset pattern part on the microstructure pattern unit of the micro-nano optical element; and
s103: and simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result.
According to one aspect of the invention, the micro-nano optical element comprises a micro-lens array or a diffractive optical element.
According to an aspect of the present invention, the predetermined pattern part has a uniform height or depth.
According to an aspect of the invention, the preset pattern part corresponds to a character, letter or graphic mark.
According to an aspect of the present invention, the micro-nano optical element includes a diffractive optical element, the micro-structure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern part is selected to correspond to the height of one of the steps.
According to an aspect of the present invention, the step heights are selected such that the diffractive optical element has a ratio of the number of 0 phase steps to the number of pi phase steps of between 0.9:1 and 1.1:1, preferably a ratio of the number of 0 phase steps to the number of pi phase steps of between 0.95:1 and 1.05:1, within one unit period of the microstructure pattern.
According to an aspect of the present invention, the step S102 includes: and enabling the area proportion of the preset pattern part in the microstructure pattern unit to be less than 2%, wherein the area proportion of the preset pattern part in the microstructure pattern unit is preferably less than 0.2%.
According to an aspect of the invention, the step S103 comprises adjusting the preset pattern part by: when the light field obtained through simulation is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-structure pattern unit of the micro-nano optical element until the light field obtained through simulation is matched with the preset light field.
According to the embodiment of the invention, in order to facilitate identification and tracing in the aspect of anti-counterfeiting and avoid malicious copying and embezzling, anti-counterfeiting marks are made on the microstructure on the basis of not destroying the microstructure design, for example, microstructure marks such as 'UPHoton' are added on original structures of DOE and MLA. Through the mode, the designed microstructure mark also belongs to one part of the microstructure, and if malicious reproduction exists, the microstructure mark can be reproduced together, so that the subsequent identification is easier. In addition, the size of the microstructure mark is smaller, and the proportion is smaller than the original microstructure size, so that the proportion cannot influence a light field or the function of the element. Easy to find and identify. Can be identified by using a conventional microscope.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 shows a schematic diagram of a diffractive optical element according to one embodiment of the present invention;
FIG. 2 shows a local phase profile of a diffractive optical element;
FIG. 3 shows the application of the letter "UPHoton" to the microstructure pattern unit of the diffractive optical element;
4A-4C illustrate simulation results for light field effects when different scales of preset pattern portions are applied;
FIG. 5 illustrates a target gray scale map for a microlens array according to one embodiment of the present invention;
FIG. 6 shows a partial enlarged view of the target gray scale map of FIG. 5; and
fig. 7 shows a design method of a micro-nano optical element according to an embodiment of the invention.
Detailed Description
In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection, either mechanically, electrically, or in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly above and obliquely above the second feature, or simply meaning that the first feature is at a lesser level than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the invention. To simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize applications of other processes and/or uses of other materials.
The embodiments of the present invention will be described in conjunction with the accompanying drawings, and it should be understood that the embodiments described herein are only for the purpose of illustrating and explaining the present invention, and are not intended to limit the present invention.
For the micro-nano optical structure, micro-nano optical elements circulating on the market can be directly used for directly copying through a micro-nano imprinting technology, and the sizes of the micro-nano topographic structures on the surface of the micro-nano optical element are all nano-scale or micron-scale microstructures, so that the overall topographic forms are difficult to distinguish, and the copied micro-nano optical element and the micro-nano optical element manufactured through a template are basically indistinguishable and difficult to distinguish. The invention provides a technical scheme for anti-counterfeiting a micro-nano optical element. If a third party does not authorize the copying of the micro-nano optical structure, the preset pattern part is copied together, so that the discovery is convenient, and the malicious copying can be avoided. Various embodiments of the present invention are described in detail below with reference to the accompanying drawings.
Fig. 1 shows a schematic view of a diffractive optical element 10 according to an embodiment of the present invention. As shown in fig. 1, the diffractive optical element 10 includes a main body 101, and a micro-nano structure (may also be referred to as a "step") is formed on a surface of the main body 101, and a plurality of micro-nano structures may constitute a micro-structure pattern unit. The microstructure pattern units have a period, and the surface of the main body 101 may have one or more periodic microstructure pattern units. The heights of the micro-nano structures correspond to different phase delay amounts, so that when incident light is incident on the diffractive optical element 10, the micro-nano structures with different heights can generate a certain phase delay amount to the incident light and modulate the incident light, thereby integrally projecting a preset light field, wherein the preset light field includes but is not limited to a uniform light field, lines, characters, specific patterns and the like.
The distribution and height of the micro-nano structure of the diffractive optical element 10 can be designed according to the light source parameters, the target light field, the size parameters and the like in the design stage. Fig. 2 shows a local phase distribution diagram of a general diffractive optical element.
According to the present invention, in addition to the conventional diffractive optical element, a predetermined pattern portion is provided on the microstructure pattern unit. As shown in fig. 3, the letter "uphon" is applied to the microstructure pattern unit of the diffractive optical element 10. Additionally or alternatively, the predetermined pattern portion may also include a text or graphic mark as long as it can be recognized.
As shown in fig. 3, the micro-nano structures of the diffractive optical element 10 have different heights (or phase distributions) around the predetermined pattern portion, and the predetermined pattern portion has a uniform height (in terms of a distance from the surface of the main body 101 of the diffractive optical element 10) or depth (in terms of a distance from the surface of the highest micro-nano structure). The predetermined pattern portion may also have a varying height as long as it can be distinguished from the micro-nano structure around the predetermined pattern portion, for example, in the letter "UPhoton", different letters may have different heights (or depths).
For diffractive optical elements, it is theoretically optimal to use a continuously changing surface topography, but a continuous surface topography is difficult to manufacture in practice, so that the continuous surface topography is usually simulated in a step-by-step manner, and steps of different heights correspond to different phases. As shown in fig. 1, the microstructure pattern unit of the diffractive optical element 10 includes micro-nano structures (i.e., steps) having different heights corresponding to different phases. For the diffractive optical element, a 2-step, 4-step, 8-step or 16-step design (i.e., the diffractive optical element includes 2-height steps, 4-height steps, 8-height steps or 16-height steps on the surface), and generally the greater the number of steps, the higher the diffraction efficiency. For a general pattern, a 2-step diffractive optical element can be used.
The microstructure pattern of the predetermined pattern portion may be set to have a continuous morphology with the same phase step height, that is, different phase step heights of the original design in the region of the predetermined pattern portion are modified to the same phase step height. The height of the preset pattern portion may preferably be selected to correspond to the height of one of the steps when the preset pattern portion is applied. Taking the diffractive optical element implemented by the 2-step design as an example, which includes a 0-phase step and a pi-phase step, for example, the height of the predetermined pattern portion may be selected to be a height corresponding to the 0-phase step or a height corresponding to the pi-phase step. It is easily understood by those skilled in the art that the present invention is not limited thereto, and the height of the preset pattern portion may be selected to be different from the height of the existing step, which are within the scope of the present invention.
According to a preferred embodiment of the present invention, when the predetermined pattern portion is applied, there is no significant difference between the light field projected through the diffractive optical element and the predetermined light field by controlling the area ratio of the predetermined pattern portion in the microstructure pattern unit. The applicant of the present invention found that when the area ratio of the preset pattern portion in the microstructure pattern unit is less than 2%, preferably less than 0.2%, the application of the preset pattern portion does not have a significant influence on the projected light field.
Fig. 4A-4C show simulation results for the effect of the light field when different scales of preset pattern portions are applied. Where fig. 4A is a light field simulation diagram of an original design, such as a light field obtained by simulation of the diffractive optical element of fig. 2. Fig. 4B shows a simulation of the light field after adding the predetermined pattern portion with an area ratio of 0.18%, and comparing fig. 4B with fig. 4A, it can be seen that there is no significant difference therebetween. Fig. 4C shows a light field simulation diagram in which a preset pattern portion having an area ratio of 2% is added. The light field simulation of fig. 4C has changed somewhat from that of fig. 4A, for example, a line of lower brightness is produced between two lines, the zero-order brightness becomes stronger, and the noise increases. However, in some application scenarios, the light field variation of fig. 4C may still be acceptable. Therefore, according to the present embodiment, it is confirmed by the target light field simulation that the addition of the pattern microstructure to the original phase diagram is still acceptable, because the size of the pattern microstructure is smaller than that of the original light field, and the final light field is not greatly affected.
In addition, the influence of the preset pattern part on the final light field can be reduced by adjusting the position of the preset pattern part on the microstructure pattern unit. Preferably, the predetermined pattern portion is disposed at a non-central position of the microstructure pattern, for example, at an edge or a corner. Therefore, although the predetermined pattern portion may affect the original light field to some extent, the light field generated finally does not change significantly because it is located in the edge or corner region or the size ratio is relatively small.
In addition, the inventors of the present invention found through practical experience accumulation that if the ratio of the number of pixels of two phase step heights of 0 and pi is controlled to be around 1:1 within the period range of one microstructure pattern unit of the diffractive optical element, for example, the zero order energy is suppressed. Therefore, according to a preferred embodiment of the present invention, the size, position and/or height of the steps are selected to be as large as possible such that the ratio of the number of 0 phase steps to the number of pi phase steps of the diffractive optical element is between 0.9:1 and 1.1:1, preferably between 0.95:1 and 1.05:1, within one period of the unit of the microstructure pattern, when the predetermined pattern portion is applied.
The micro-nano optical element according to an embodiment of the present invention is described above by taking the diffractive optical element 10 as an example. According to another embodiment of the invention, the micro-nano optical element may further comprise a micro-lens array. The following description refers to the accompanying drawings.
Fig. 5 illustrates a target gray scale map of a microlens array according to an embodiment of the present invention, and fig. 6 illustrates a partially enlarged view of the target gray scale map of fig. 5.
The target gray scale map of fig. 5 is a gray scale map with depth information obtained by converting a lens file with three-dimensional appearance according to a lens surface equation during design, and the target gray scale map of fig. 5 can be used for processing a micro-lens array, wherein different gray scales correspond to different depths. The target gray scale map of fig. 5 includes an upper half and a lower half, the gray scale lines of the two halves are perpendicular to each other, and two sets of cylindrical microlens arrays with mutually perpendicular extending directions are used for projecting a cross-hair target light field. For example, the top half of the corresponding microlens array can project vertical lines, and the bottom half of the corresponding microlens array can project horizontal lines.
As shown in fig. 6, a corresponding preset pattern part, such as an anti-counterfeit mark 'uphon', is added to the micro-nano structure region of the target grayscale map. The microlens array is processed according to the target gray scale pattern of fig. 5 and 6, and the obtained microlens array will also have the predetermined pattern portion, i.e., the forgery prevention mark 'uphon'.
Unless otherwise indicated, the technical features and solutions described above with reference to the embodiments of fig. 1-4C may equally be applied to the embodiments of fig. 5 and 6, and are not described in further detail herein.
After the simulation confirmation of the target light field is carried out, compared with the original light field, the size of the micro-structure of the anti-counterfeiting mark is smaller, and the final light field is not greatly influenced.
The diffractive optical element and the microlens array according to the embodiment of the invention are described above, wherein in order to facilitate identification and tracing in the aspect of anti-counterfeiting and avoid malicious copying and embezzling, anti-counterfeiting marks are made on microstructures without substantially damaging the microstructure design per se, for example, microstructure marks such as 'UPhoton' are added on the original structures of the DOE and the MLA. Through the mode, the designed microstructure mark also belongs to one part of the microstructure, and if malicious reproduction exists, the microstructure mark can be reproduced together, so that the subsequent identification is easier. In addition, the size of the microstructure mark is smaller, compared with the size of the original microstructure, the size of the microstructure mark is smaller, the proportion of the microstructure mark does not have larger influence on a light field or the function of the element, and the microstructure mark can be identified by using a conventional microscope, so that the microstructure mark is easy to find and identify.
The invention also relates to a design method 100 of the micro-nano optical element, as shown in fig. 7. Described in detail below with reference to fig. 7.
In step S101: and calculating the surface topography of the micro-nano optical element according to a preset light field, wherein the surface topography is provided with one or more microstructure pattern units which are configured to project the preset light field.
The micro-nano optical element may be, for example, a micro-lens array or a diffractive optical element. The predetermined light field includes, but is not limited to, a uniform light field, a straight line, a dotted line, a cross line, a LOGO or text, etc.
In step S102: and applying a preset pattern part on the microstructure pattern unit of the micro-nano optical element. As shown in fig. 3 or fig. 6, a preset pattern part, such as a character, a letter, a graphic mark, or the like, is applied on the microstructure pattern unit designed in step S101.
In step S103: and simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result.
The preset pattern portion may be adjusted, for example, in the following manner. When the light field obtained through simulation is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-structure pattern unit of the micro-nano optical element until the light field obtained through simulation is matched with the preset light field. If there is no obvious difference between the simulated light field and the preset light field, or the difference is acceptable for the current application scene, it indicates that the application of the preset pattern part is successful or acceptable, and the micro-nano optical element can be manufactured according to the micro-structure pattern unit. If there is a significant difference between the simulated light field and the preset light field, or if the difference is not acceptable for the current application scenario, it indicates that the preset pattern portion needs to be adjusted, for example, the size of the preset pattern portion may be reduced, and/or the preset pattern portion is brought closer to the edge or corner of the microstructure pattern unit, and the simulation is performed again until a receivable simulated light field is obtained. And then generating a processing diagram with a preset pattern part microstructure, and manufacturing the micro-nano optical element.
According to a preferred embodiment of the present invention, the predetermined pattern part has a uniform height or depth.
According to a preferred embodiment of the present invention, the micro-nano optical element includes a diffractive optical element, the micro-structure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern part is selected to correspond to the height of one of the steps.
According to a preferred embodiment of the present invention, the step heights are selected such that the diffractive optical element has a ratio of the number of 0 phase steps to the number of pi phase steps of between 0.9:1 and 1.1:1, wherein preferably the ratio of the number of 0 phase steps to the number of pi phase steps of between 0.95:1 and 1.05:1, within one unit period of the microstructure pattern.
According to a preferred embodiment of the present invention, the step S102 includes: and enabling the area proportion of the preset pattern part in the microstructure pattern unit to be less than 2%, wherein the area proportion of the preset pattern part in the microstructure pattern unit is preferably less than 0.2%.
The embodiment of the invention provides a technical scheme for anti-counterfeiting the micro-nano optical element, which can effectively avoid the infringement problem caused by malicious copying and piracy and is convenient for proving the right to maintain. The anti-counterfeiting mode is that an anti-counterfeiting micro-nano structure is added on a designed processing drawing (GDS), so that the whole anti-counterfeiting mark is a part of the micro-nano structure and cannot be removed and eliminated. The technical scheme of the invention can be used for all micro-structural designs including DOE and MLA which are micro-nano optical elements with smaller characteristic dimension.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (16)
1. A micro-nano optical element comprising:
a body having a surface topography with one or more microstructure pattern units configured to project a predetermined light field; and
and the preset pattern part is applied on the microstructure pattern unit.
2. The micro-nano optical element of claim 1, wherein the micro-nano optical element comprises a microlens array.
3. The micro-nano optical element according to claim 1, wherein the micro-nano optical element comprises a diffractive optical element.
4. The micro-nano optical element according to any one of claims 1 to 3, wherein the predetermined pattern portion has a uniform height or depth.
5. The micro-nano optical element according to any one of claims 1 to 3, wherein the predetermined pattern part corresponds to a character, letter or graphic mark.
6. The micro-nano optical element according to claim 3, wherein the micro-structure pattern unit of the diffractive optical element includes steps having different heights corresponding to different phases, and the height of the preset pattern part is selected to correspond to the height of one of the steps.
7. The micro-nano optical element according to claim 6, wherein the height of the steps is selected such that the diffractive optical element has a ratio of the number of 0 phase steps to the number of pi phase steps in one unit period of the micro-structured pattern of between 0.9:1 and 1.1:1, wherein preferably the ratio of the number of 0 phase steps to the number of pi phase steps is between 0.95:1 and 1.05: 1.
8. The micro-nano optical element according to any one of claims 1 to 3, wherein the predetermined pattern portion occupies less than 2% of the area of the microstructure pattern unit, and preferably the predetermined pattern portion occupies less than 0.2% of the area of the microstructure pattern unit.
9. A design method of a micro-nano optical element comprises the following steps:
s101: calculating the surface topography of the micro-nano optical element according to a preset light field, wherein the surface topography is provided with one or more microstructure pattern units which are configured to project the preset light field;
s102: applying a preset pattern part on the microstructure pattern unit of the micro-nano optical element; and
s103: and simulating the micro-nano optical element applied with the preset pattern part, and adjusting the preset pattern part according to a simulation result.
10. The design method according to claim 9, wherein the micro-nano optical element comprises a micro-lens array or a diffractive optical element.
11. The design method as set forth in claim 9 or 10, wherein the predetermined pattern portion has a uniform height or depth.
12. The design method according to claim 9 or 10, wherein the preset pattern portion corresponds to a letter, or graphic mark.
13. The design method of claim 9, wherein the micro-nano optical element comprises a diffractive optical element, the micro-structure pattern unit of the diffractive optical element comprises steps having different heights corresponding to different phases, and the height of the preset pattern part is selected to correspond to the height of one of the steps.
14. The design method according to claim 13, wherein the step heights are selected such that the diffractive optical element has a ratio of the number of 0 phase steps to the number of pi phase steps in one unit period of the microstructure pattern between 0.9:1 and 1.1:1, wherein preferably the ratio of the number of 0 phase steps to the number of pi phase steps is between 0.95:1 and 1.05: 1.
15. The design method according to claim 9 or 10, wherein the step S102 includes: and enabling the area proportion of the preset pattern part in the microstructure pattern unit to be less than 2%, wherein the area proportion of the preset pattern part in the microstructure pattern unit is preferably less than 0.2%.
16. The design method according to claim 9 or 10, wherein the step S103 includes adjusting the preset pattern portion by: when the light field obtained through simulation is not matched with the preset light field, adjusting the size of the preset pattern part and/or the position of the preset pattern part on the micro-structure pattern unit of the micro-nano optical element until the light field obtained through simulation is matched with the preset light field.
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