1241415 九、發明說明： 【發明所屬之技術領域】 本發明係關於具有高聚焦效率之微透鏡陣 亦關於製造該陣列之方法。 』尽毛月 本發明適有效地將雷射親聚焦 擴散，以及控制同調或不同調光線之散射 傳送顯示，以及其他應用中。 ’’、、又、 【先前技術】 在許多應用例如將光線由雷射I禺合光纖 巧條 )必需精確地加以製造，該G度I，常支距函數 ，其中;I賴明歧之波長度通以於或優於例如又/4 使用整 ==== = 人射光線能夠藉由陣列加以㈣#敕況下，所有 被使用來作為聚焦，陣列即稱有 鄰微其係指相 陣列。其他排列;如為方形陣 數小=====發:填充係 44%。 虛線13顯示。該陣列之填充係數為 存在數種方法以製造分離之微透鏡單元，其邊緣清 ^分離使得其邊界避免緊密的接觸。由於相鄰透鏡間内 0邊界間存在微小的距離，陣列的填充係數必定小於丨（或 %)。 使用先前技術之製造方法以達成有效緊密排列透鏡 列之困難伽於該方法無法精確地保持微透鏡邊界 是小的以及強烈聚焦透鏡。 ’ 土使用熱變形之方法例如美國第5324623號專利主要依 靠體積浮凸以及目而無法在微透鏡間之内部邊界處控制材 料的融合三ΐ在融合扭曲將使聚焦能力減小。實施熱變形 之方法為簡單的，但是無法控制各別微透鏡之結構。 —其他方法例如美國第5300623號專利所說明之方法包 ^產生機械鑄模，其界定出可固化液體之容器。液體注入 容器内以及自絲面張力產生f㈣表面，其作為微透鏡 。具有各種谷态之鑄模界定出陣列之排列。由於該方法 控制微透，單元之形狀受麻制，.—般細情況，其效 率無法為最佳的。依靠直接控制各別微透鏡之其他機械方 法例如鑽石旋轉法為較適合於製造出各別之微 造出陣列。 衣 一依靠離子擴散處理法將產生梯度折射率陣列，例如揭 ，於美國第5867321號專利無法提供麵填充係數，兩個相 部微透鏡間之區域通常為微透鏡重複間距之施。梯 射率陣列對於大量製造存在嚴重的限制，其由於本質性緩 慢的擴散處理過程所致。 、、 在抗光層上使用直接雷射劃記以製造出微透鏡陣列之 處理過程為已知的技術。可參閱在1999年12月16日 PCT第W099/64929號專利，Gale等人之美國第4464030號專1241415 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a microlens array with high focusing efficiency and a method of manufacturing the array. The present invention is suitable for effectively focusing and spreading laser light, and controlling the scattering of coherent or different tones of light, transmission display, and other applications. ",,,, [Previous technology] In many applications, such as laser light combined with optical fiber I) must be accurately manufactured, the G degree I, constant pitch function, where; I Lai Mingqi wavelength The degree of pass is better or better than, for example, / 4 uses integer ==== = human light can be applied by the array. # 敕 In the case, all are used as focus, the array is called adjacent micro, which refers to the phase array. . Other permutations; if the number of square arrays is small ===== hair: the filling system is 44%. Dashed line 13 is shown. There are several methods to fill the array with several methods to make separated microlens units, and the edges are separated so that the borders avoid close contact. Because there is a small distance between the 0 boundaries between adjacent lenses, the fill factor of the array must be less than 丨 (or%). The difficulty of using the prior art manufacturing method to achieve an effective close array of lens rows is due to the inability of this method to accurately keep the microlens boundaries small and strongly focused lenses. The method of using thermal deformation of the soil, for example, U.S. Patent No. 5,324,623, mainly relies on volume relief and mesh, and cannot control the fusion of materials at the inner boundary between the microlenses. The fusion distortion will reduce the focusing ability. The method of performing thermal deformation is simple, but the structure of individual microlenses cannot be controlled. -Other methods such as the method package described in US Patent No. 5300623 ^ Generate a mechanical mold that defines a container for a curable liquid. The liquid is injected into the container and the f㈣ surface is generated from the silk surface tension, which acts as a microlens. Molds with various valley states define the arrangement of the array. Because the method controls the micro penetration, the shape of the unit is subject to hemp, so fine, its efficiency cannot be optimal. Other mechanical methods that rely on direct control of individual microlenses, such as the diamond rotation method, are more suitable for making individual microfabricated arrays. Yiyi relies on the ion diffusion treatment method to generate a gradient index array. For example, U.S. Patent No. 5,876,321 cannot provide a surface filling coefficient. The area between two phase microlenses is usually a repeated distance of microlenses. Ladder arrays have severe limitations for mass manufacturing, which are caused by a slow diffusion process that is inherently slow. The process of using a direct laser marking on the light-resistant layer to make a microlens array is a known technique. See PCT Patent No. W099 / 64929 of December 16, 1999, U.S. Patent No. 4,464,030 to Gale et al.
Micro-Optics Elements, systems and applications ans P. Herzig, ed. Taylor & Francis, Bristol, PA 1241415 南丨ra f3—152。該處理過程所選擇之光阻劑為正抗光 ^編，契負版光阻劑比較，正光阻劑可更廣泛地被利用，抗 造商作更廣泛的研究以及發展之工作，以及通常具 Ϊίί之解析度。不過，如底下職明，在本發明之前並不 =衣造出正微透鏡陣列，其在使用正光為 數情況下具有高聚焦效率。 本發明藉由提供製造具有高聚焦效率之微透鏡陣列的 =解J先前技術之困難，高聚焦效率經由在高填充係數 〜下精確地製造出微透鏡而達成。陣列能夠以任意方式 列，例如為方形，六邊形，或不規則形狀。除此，該方 押月同的方向製造出任意形狀以及可變化聚焦率之 锨透鏡（變形透鏡）。 【發明内容】 由於先前之說明，本發明目標包含至少一此 地所有下列情況： 反认 焦if提供製造方法以形成凹下微透鏡陣列，其具有高聚 7R。/ 配製凸出及’或凹下微透鏡陣列，其聚焦效率大於 =，德效率優先地大於85%，以及聚焦效率最優先地大於 9b% \ (3) 提供精確地製造凸出微透鏡陣列之方 鬲填充係數;及/或 (4) 提供精確地製造凸出及/或凹下微透鏡陣列苴填 m’優先地大於95%，以及最優先地約為^%， 1正Sli胃有用的表面能夠使用作為聚焦，或散射照明 光束。 Μ SΞ這些目標，本發明另外一項目標為使微透鏡陣列 二有壬思形狀（支距函數)，其能夠在陣列範圍内隨機地 化0 7 本發明另外一項目標在於提供改良方法以使用正抗 光劑以產生高填充係數之凸出微透鏡陣列。 為了達成先前以及其他目標，本發明提供一種製造凸 出微透鏡陣列之方法，其中使用導引雷射劃記以在^抗 光劑中產生最初成品（最初鑄模），其中最初成品之表面構 造，凸出微透鏡所需要陣列之負版(互補）的輪廓。即最初成 為凹下的而非凸出表面輪廓。在該情況下，如同底下所 說明，由雷射光束有限尺寸以及該光束與凹下微透鏡所需 要^布之捲旋所產生的問題能夠加以克服。藉由克服這些 問題，具有高聚焦效率之凸出微透鏡陣列能夠完成。一 了般，高聚焦效率之微透鏡陣列依靠兩項因素：（1)言 填充係數，以及(2)精確地複製所需要透鏡分佈。兩個因同 為必需的以及單獨一項因素為充份的。 ” 因而，高填充係數能夠藉由一種處理過程達成苴改 所有光阻劑薄膜部份，但是假如改變無法相對於所’需要之 透鏡分佈，陣列之聚焦效率仍會受損，因為部份具有不正 分佈之光阻劑薄膜無法適當地將入射光線聚焦了另外一方 ，，利用各別分開之微透鏡精確複製所t要_鏡分佈 =3焦效率，在該情況下係由於光線通過微透鏡ί: 空問所致。 們發現兩個因素藉由使用凹下形式初始地在正抗光 :l:i:己ΐ凸出透鏡而加以解決。在該情況下，經由精確 也要❺填充係數之透鏡分佈能夠達成高聚焦效率。 之美中’本發明藉由使用玻璃所構成 招土二支料—”貝以產生减的成品(初始鑄模）而實 現，而後以_的方式精確地複製所需要微透鏡陣列、 ^地，光敏性正光___在基f上 】 f 顺需要之厚度—致。在暴露於光 先阻秦先地為低對比之種類，能夠產生平滑地變化之浮 1241415 凸分佈。 ★在沉積於基質後，正光阻劑暴露於具有良好地分佈之 Z射光束。預先決定取樣速率，光阻_膜區域暴露 於辑射光束。藉由改變光束之強度，陣列中每一微透鏡之 f補形狀靖於級射。制地，f射照射處理過程藉 =改變其物舰及化學特性在級㈣财產生潛變的影 像。Micro-Optics Elements, systems and applications ans P. Herzig, ed. Taylor & Francis, Bristol, PA 1241415 South f3-152. The photoresist selected in this process is positive photoresistance. Compared with negative photoresistors, positive photoresist can be used more widely. Anti-makers make more extensive research and development work, and usually have The resolution of 之 ίί. However, as described below, before the present invention, a positive microlens array was not manufactured, and it has high focusing efficiency under the condition of using positive light. The present invention solves the difficulties of the prior art by providing a microlens array with high focusing efficiency. The high focusing efficiency is achieved by accurately manufacturing a microlens with a high fill factor ~. Arrays can be arranged in any way, such as square, hexagonal, or irregular shapes. In addition, the side produces a pseudo-lens (anamorphic lens) of any shape and variable focus ratio in the same direction. [Summary of the Invention] As a result of the foregoing description, the object of the present invention includes at least one of the following situations here: Recognition Focus if provides a manufacturing method to form a concave microlens array, which has a high poly 7R. / Preparation of convex and 'or concave microlens arrays, the focusing efficiency is greater than =, the German efficiency is preferentially greater than 85%, and the focusing efficiency is most preferentially greater than 9b% \ (3) Provide accurate manufacturing of convex microlens arrays The square fill factor; and / or (4) provides accurate fabrication of convex and / or concave microlens arrays. The fill m 'is preferably greater than 95%, and most preferably about ^%, 1 positive Sli stomach is useful The surface can be used as a focused, or scattered illumination beam. Μ 目标 These objectives, another object of the present invention is to make the micro lens array have a shape (pitch function), which can be randomized within the array range. Another object of the present invention is to provide an improved method for using Positive photoresist to produce a convex microlens array with a high fill factor. In order to achieve the previous and other objectives, the present invention provides a method for manufacturing a convex microlens array, in which a guided laser marking is used to produce an initial finished product (original mold) in a photoresist, wherein the surface structure of the initial finished product, Convex the negative (complementary) outline of the array required by the microlenses. That is, it is initially concave rather than convex. In this case, as explained below, the problems caused by the limited size of the laser beam and the convolution of the beam and the concave microlenses required can be overcome. By overcoming these problems, a convex microlens array with high focusing efficiency can be completed. In general, microlens arrays with high focusing efficiency rely on two factors: (1) the fill factor, and (2) the exact lens distribution required. Both factors are necessary and a single factor is sufficient. ”Therefore, a high fill factor can be used to modify all photoresist film parts in a single process, but if the change cannot be relative to the required lens distribution, the focusing efficiency of the array will still be impaired, because some parts are not correct. The distributed photoresist film cannot properly focus the incident light on the other side, and uses separate microlenses to accurately replicate the required mirror distribution = 3 focal efficiency. In this case, the light passes through the microlens: We found that two factors were solved by using a concave form to initially project the lens in positive anti-light: l: i: ΐ. In this case, the lens, which also requires the fill factor, is accurate. The distribution can achieve high focusing efficiency. The beauty of the United States and China 'The present invention is achieved by using glass made of two materials— "Bei to produce a reduced product (initial mold), and then accurately reproduce the required microlenses in a way Array, ground, photosensitivity ___ on the substrate f] f is as thick as needed. The Qin Xian ground is a low-contrast species that can produce a smoothly varying convex distribution when exposed to light. After being deposited on the substrate, the positive photoresist is exposed to a well-distributed Z-ray beam. The sampling rate is determined in advance, and the photoresist film area is exposed to the trapped beam. By changing the intensity of the light beam, the f-complement shape of each microlens in the array is in the order. Land control, f-ray irradiation treatment process by changing its object ship and chemical characteristics to produce latent images in the level of wealth.
其次，薄膜進行卿以產生表面浮凸結構。對於正種 f之光阻綱膜，顯影棘將去除所騎之區域而遺留下 域。上述結合表面浮凸結果以及初始成品之 為本發_鍵項目，因為只有經由合併所指出 “高ΐ=ί微小雷射光束之捲旋效應減為最低而能夠 儘管應實質地為相同的， 。士代叫"射先束々射疋否產生凸出或凹下浮凸結構 雕ii 造凸出微透鏡陣列初始產品為凹下浮 及;達成而填充係數(例如填充係數等於1 〇〇%)以 如聚焦效率至少高於75%)。底下詳細說 月棱出如何結合以解決捲旋之問題。Secondly, the thin film is subjected to a surface relief structure. For the photoresist film of the positive type f, the developing spin will remove the riding area and leave the area behind. The above combination of surface relief results and the original finished product are the key items, because only the "High ΐ = ί micro laser beam's convolution effect can be minimized and should be substantially the same," The shidai called "shooting first beam, shooting, whether to produce a convex or concave embossed structure. Ii. To create a convex microlens array, the initial product is concave and floating; and the filling factor (for example, the filling factor is equal to 100%) to If the focusing efficiency is at least higher than 75%), the following details how to combine the moon edge to solve the problem of convolution.
需要之_，帽難步驟通常為 出形式。製中間產品（中間鑄模)，其為凸 (最線鑄模）曰目產二1此夠再加以多次地複製以提供最終產品 大量為凹下形^。因而對最終凹下產品進行 扣出形式以及提供 或六要限制為規則的週期性排列，例如為方形 格二匕二而可假設為任何-般任意形式，如設計； σ S疋。示此，透鏡形狀並不需要相同的，實際上可對陣 9 1241415 列中每-微透鏡可加以變化。例如，本發明能夠使 造微結構之輪廓以及分佈，其揭示於先前所提及相同$ 人之美國專利申請案中，該專利名稱為” Structured &二耶 for Controlled Spreading of Light” 。 本發明重要一項為形成於正光阻劑薄膜中凹下浮凸 結構的凹腔頂部優先地加以對準或相對相鄰元件為緩慢地 變化。假如導引線並不令人滿意，在部份陣列範圍内能^句 產生精確的分佈，其將減小陣列之填充係數與聚焦效率。 【定義】 微透鏡陣列為一個陣列之微透鏡以及相關單位小格之 陣列，一個微透鏡與每一單元小格結合。本發明之微透鏡 能夠具有任何所需要輪廓以及能夠形成於例如支撐於，，活 ： 塞”形式上，其揭示於G· Michael Morris以及Tass〇R M 如les之美國第60/222· 033號專利申請案中，該專利名稱為 Structured Screens For Controlled Spreading of Light”，該專利之說明在此加入作為參考。因而在此所使 用被透鏡係指能夠將光線聚焦之微結構。 微透鏡陣列”填充係數，，為單位小格内由微透鏡所佔據 面積總和與單位小格面積總和之比值。 微透鏡陣列之"聚焦效率”為微透鏡焦點處量測光線強 度總和除以投射於單位小格陣列光線強度總和，該陣列為 鲁 沿著光軸藉由準直空間不關光源例如準直白色光源加以 知、射之陣列。熟知此技術者了解此為聚焦效率之"^ 形式π定義。 /一些凹下微透鏡通常具有虛焦點（例如空氣中平面—凹 面微透鏡具有負版值放大率以及為準直光線之虛焦點），在該 情況了需要使用辅助光學系統以產生實焦點，其強度能夠Λ 加以量測三辅助光學系統至少能夠減小實焦點處之強度， 以及在決疋虛焦點之強度大小時應該考慮這些減小情況。 10 1241415 士變，微透鏡情況中，在微透鏡每一焦點處之光線強 度〇 §於置測光線強度之總和中。 【實施方式】 參考^圖，圖2顯示出沉積於基質22上低對比之光敏性 基質通常由玻璃製造出。薄膜厚度應該 f於或大於透鏡陣列界定出之總深度。光阻劑需要預先之 處理，如硬化，其決定於陣列之總厚度。 、 J初，阻9健行處理後，雷射光束聚焦於光阻劑薄膜 ίϋίΐί面掃描以照射整個光阻劑表面，如圖3所示。 度隨著每—點變化使得所需要凹下微透鏡負版潛 义衫像以光賴材料化學轉變形式印記於紐劑上。、 了 ΐ成表面浮凸結構，化學性變化之光阻劑薄膜進 仃顯影之處理過程，包含暴露於一種溶液例如 ^ 屬歷時—段時間，該時間隨著陣列整個厚度而^化 需要越長的顯影時間。對於正抵抗劑，顯影 處理過，去除照射之區域，遺留下未被照射之區域。 鏡需要所說明之處料程，陣列中每一微透 t要以凹下喊在正恤射形成。在該情況下，當微 2^凹2式製造出時有可能顯著地減小觀察到圓形化 ΐϋΛ製造處理過程本身將外形表面加入表面浮凸 刀佈，其為並不想要的情況。 束需丄要表面浮凸結構之數學描述以及劃記雷射光 Hflf;阻劑薄膜得到之浮凸結構通常描述為所需 _下列1式==束之函數作捲旋處理。捲旋效果能 外’少)=——咖命，⑴ 數，其描述出所需要之表面浮凸，g表示書1 ;之數學函數，s表示所製造之表面區域，（X，y)代 义/、 4膜表面上之點，以及F表示最終表面形狀。 11 1241415 公式（1)之妥當性依靠假設雷射光束與光敏性薄膜之 相互作用域性的，其表示表面之反應直接地與雷射照射 成正比以及數個光束之重疊具有簡單相加之效應。對於良 好的近似，5亥假设為正確的以及能夠在以凹下形式掣迭出 之表面浮凸結構中觀察到，該結構凸級光阻面㈣ 4A及4R所彔。 預期的捲旋效應能夠立即地在凸出結構中觀察到哕 情況產生一般的想像:相同形式之行為發生於凹下形狀Γ 實際亡，假如並不使用公式⑴，以及為了達成凹下形狀，人 們只單純地需要將凸出形狀乘以―丨以及加上常數，因而對 凸出形狀兩種情況，所呈現出最終形狀應該為 相同的，除了符號改變。 、不過，其產生雷射光束與光敏性薄膜間之相互作用並 非為線性的以及因而捲旋關係能夠近似地說明製造處理過 耘。、實際上我們發現雷射劃記處理過程更類似於藉由堅 機械裝置例如為鑽石器具進行裝置之製造。 在該製造中，捲旋效應仍然存在，但是其為不同性質显 於利用雷射光柄觀察狀情況，因為潛變影像形成並不’、 存在以及重疊效應並不會發生。機械器具與被處理之表面 接觸將產生表面浮凸。_在凸&與凹下結構之機^ 中存在本質性之不對稱。由於器具之有限尺寸，不可铲: 過兩個相鄰結構間之狹窄區域，但是產生兩個凹下結 尖銳接觸點並不困難。此顯示於圖5人及邪中。口 依據本發明，我們發現當考慮凸出及凹下形狀時雷射 劃記處理過程依據相同的原理操作以及呈現出類似的田不 稱性。此令人驚奇的結果能夠製造出完全緊密的排列之Π 出微透鏡陣列，異於先前技術，先前技術只確保在部份陣 孔徑範圍内之精確分佈，該陣列為完全地塞滿之排列。 重要地，雷射劃記處理過程當使用來製造凹下表面浮 12 1241415 達，為凹下結構之機械劃_置，同時提 力，魏力超越機械舰方法之優點。例如並 =在關於糊雷射劃記處理過程製造出⑧域鏡的尺寸或 :機械$具本身之尺寸蚊出相鄰微透鏡間之 。利用雷射劃記，該區域能夠任意地減小。 保持由、、、。構之頂點至相鄰邊界凹下邊界處邊緣之凹下 ^面夺凸雜的能力能_造㈣聚紐 車列。由於能夠使最終凸出微透鏡具有完全塞滿=鏡If necessary, the difficult steps are usually in the form. Production of intermediate products (intermediate molds), which are convex (most linear molds), which are produced by the eyes, can be copied many times to provide the final product. Therefore, the final recessed product withdrawn form and provision or six should be limited to a regular periodic arrangement, such as a square grid two daggers and can be assumed to be any-like any form, such as design; σ S 疋. As shown here, the lens shapes do not need to be the same, and in fact, each microlens in the array of 9 1241415 can be changed. For example, the present invention enables the profile and distribution of microstructures, which are disclosed in the previously mentioned US patent application for the same person, the patent name is "Structured & Controlled Spreading of Light". An important aspect of the present invention is to preferentially align the tops of the concave cavities formed in the positive photoresist film or to change slowly with respect to adjacent elements. If the guide line is not satisfactory, an accurate distribution can be generated within a part of the array, which will reduce the fill factor and focus efficiency of the array. [Definition] A microlens array is an array of microlenses and an array of related unit cells. A microlens is combined with each unit cell. The microlenses of the present invention can have any desired profile and can be formed, for example, in the form of a support, plug, etc., which is disclosed in G. Michael Morris and Tassor RM such as Les No. 60/222 · 033 In the application, the name of the patent is Structured Screens For Controlled Spreading of Light, and the description of the patent is incorporated herein by reference. Therefore, the lens used herein refers to a microstructure capable of focusing light. The "filling factor of a microlens array" is the ratio of the sum of the area occupied by the microlenses in the unit cell to the sum of the unit cell area. The "focusing efficiency" of the microlens array is the sum of the measured light intensity at the focal point of the microlens divided by The sum of the light intensities projected onto the unit cell array, which is an array that is known and emitted along the optical axis by collimating the light source, such as a collimated white light source. Those skilled in the art understand this is the definition of the "^ form π of focusing efficiency". / Some concave microlenses usually have a virtual focus (for example, a plane-concave microlens in the air has a negative magnification and a virtual focus for collimated light). In this case, an auxiliary optical system is needed to generate a real focus. Intensity can be measured. The three auxiliary optical systems can at least reduce the intensity at the real focus, and these reductions should be considered when determining the intensity of the virtual focus. 10 1241415 In the case of a micro-lens, the light intensity at each focal point of the micro-lens is 0 in the sum of the measured light intensities. [Embodiment] Referring to FIG. 2, FIG. 2 shows that a low-contrast photosensitive substrate deposited on a substrate 22 is usually made of glass. The film thickness should be f or greater than the total depth defined by the lens array. The photoresist requires prior treatment, such as hardening, which depends on the total thickness of the array. At the beginning of J, after the resistance 9 was processed, the laser beam was focused on the photoresist film and scanned to illuminate the entire photoresist surface, as shown in Figure 3. The degree of change with each point makes the required negative microlens negative shirt image printed on the button in the form of chemical conversion of the light material. In order to form a surface relief structure, the chemical change of the photoresist film into the development process, including exposure to a solution such as ^ belongs to a period of time, this time as the entire thickness of the array needs to be longer Development time. In the case of the positive resist, the developing process is performed, and the irradiated area is removed, leaving the unirradiated area. The mirror needs to explain the material range, and each micro-transmittance in the array should be formed in a positive shirt with a concave shout. In this case, it is possible to significantly reduce the observation of the circularity when the micro 2 凹 concave 2 type is manufactured. The manufacturing process itself adds the contour surface to the surface relief knife cloth, which is an unwanted situation. The beam needs a mathematical description of the surface relief structure and the laser light Hflf is marked; the relief structure obtained by the resist film is usually described as required. The scrolling effect can be 'less') = --- fate, number, which describes the required surface relief, g represents the mathematical function of Book 1,; s represents the surface area produced, (X, y) synonym /, 4 dots on the film surface, and F represents the final surface shape. 11 1241415 The validity of formula (1) relies on the assumption of the domain of interaction between the laser beam and the photosensitive film, which indicates that the response of the surface is directly proportional to the laser irradiation and the overlap of several beams has the effect of simple addition . For a good approximation, the Hai Hai hypothesis is correct and can be observed in a surface relief structure that is pulled out in a recessed form, the structure of the convex photoresist surfaces (4A and 4R). The expected convolution effect can be immediately observed in the protruding structure. The situation of 哕 produces the general imagination: the same form of behavior occurs in the concave shape Γ. Actually, if the formula 并不 is not used, and in order to achieve the concave shape, people It is simply necessary to multiply the convex shape by 丨 and add a constant, so for both cases of the convex shape, the final shape presented should be the same, except for the sign change. However, the interaction between the laser beam and the photosensitive film that it generates is not linear, and therefore the spiral relationship can approximate the manufacturing process. In fact, we find that the laser marking process is more similar to the manufacture of a device by a mechanical device such as a diamond appliance. In this manufacturing, the scroll effect still exists, but it is different in nature, which is obviously observed with a laser beam handle, because the latent image formation does not occur, and the existence and overlap effects do not occur. Surface contact of mechanical appliances with the surface being treated will cause surface relief. _ There is an essential asymmetry in the mechanism of convex & and concave structures ^. Due to the limited size of the appliance, it is not possible to shovel: through the narrow area between two adjacent structures, but it is not difficult to create sharp contact points with two concave nodes. This is shown in Figure 5 and Evil. According to the present invention, we have found that when considering convex and concave shapes, the laser marking process operates according to the same principle and exhibits similar field disproportion. This surprising result can produce a completely tight array of microlens arrays, which is different from the prior art, which only ensures an accurate distribution within a part of the array aperture range, and the array is a completely packed array. Importantly, the laser marking process should be used to make the concave surface float 12 1241415, which is the mechanical design of the concave structure, and at the same time, it improves the strength. For example, and = the size of the field lens manufactured in the process of marking laser paste or the size of the mechanical tool with the size of the adjacent micro lens. With laser marking, this area can be arbitrarily reduced. Keep by ,,,,. The ability of the apex of the structure to the concave edge of the concave boundary of the adjacent boundary to capture convexity can be achieved. Due to the ability to make the final convex microlens fully packed = mirror
Si比;列直接地以凸出形式製造出，與所使用機 ίϋ，Λ，或其他處理過程無關，兩個相鄰微透鏡 之邊界無法作為聚焦似__之聚紐率減小。 以^械或雷射n具方式以凸出形式產生_顯示於圖 。在该圖中，所需要的微透鏡形狀以曲線61表示，可作 為聚焦之面積由參數Α表示。不過，由於製 微 變結果㈣線62表示以及可作為聚焦^面積^由鏡參 f t表不。在錢鏡邊界處峨察咖形化效應使入射光 、、、轉向至異於微透鏡焦點之位置。因而，只有面積β 作，聚焦。在該情況下，估計微透鏡之聚焦效率樣夠表 不為： ：!00%. (2)The Si ratio; the column is directly produced in a convex form, and has nothing to do with the machine ίϋ, Λ, or other processing processes. The boundary between two adjacent microlenses cannot be reduced as a focus-like convergence rate. It is produced in a convex form by means of laser or laser, and is shown in the figure. In this figure, the required shape of the microlens is represented by the curve 61, and the area that can be used as a focus is represented by the parameter A. However, due to the microfabrication results, the ㈣ line 62 is represented and can be expressed by the mirror parameter f t as the focal area. At the boundary of the money mirror, the Ecaca-shaped effect turns the incident light to a position different from the focal point of the microlens. Therefore, only the area β operates and focuses. In this case, the estimation of the focusing efficiency of the microlenses is not enough::! 00%. (2)
先前技術中B永遠小料，因而聚焦效率小於刪。利 用^發明處理過程，最初表面浮凸結構以凹下形式劃記出 使知透鏡間的尖銳邊界良好地再形成於最終微透鏡陣列中 。當凹下產品被複製時，可以得到凸出陣列使得B等於A。 因而聚焦效率實質上等於100%。 、 實驗研究已經確認上述之分析，特別是高數值孔徑凸 出微透鏡一(快速透鏡 > 情況，其中光線以大角度加以聚焦。 圖7A顯不出直徑等於50微米之微透鏡陣列以凸出方式製造 13 1241415 清楚地圓形化以及無法有效地使用作 為水焦陣列中母一微透鏡之效率為50%。 非常 列聚焦效率估計約為_。除了凹 ΐ=:=;:直接劃 劑中:ίΞΐί理過程另外—項重要的部份，在正抗光 圖8所顯示光使其最高值對準於 犬、似ν況開始喪失。對於一此銀幕 、^ ^ ^ 能夠=所r他情況下r聚以失為=。 定…入不，凹下表面浮凸結構凹腔之頂部間對準之藉 相=己特性隨機地變化之陣列的規定 。類似的並不對準，只有其頂部對準 第·4ί 3 情得到之表面浮凸結構提供 製=== :凸=如被:凹=:製=== ΐ:::不適合大量複製，因而魏優二= 圖!ίί=ί;，序地由請至㈣顯示出。 例如為破璃^;=表==: 14 1241415 ϋ〇3’塑膠樹脂1〇4沉積於該基質上。該樹脂比光阻劑 2，用/乍為中間複製器具，1〇c顯示出圖1〇β中間複 衣為^之複製結果以產生所需要凸出微透鏡1〇5陣列。 月匕夠使用類似於圖10之順序以製造高效率高填充係數 =下微透鏡陣列，再度使初始表面浮凸結構·下形式 形成於正光阻劑中。 妒々ίΐ本發明特定實施例已加以說明，熟知此技術者了 、艾化及改變並不會脫離本發明之精神與範圍。下列 申广專利範圍含蓋所有變化，變化及其對等情況。 【圖式簡單說明】 第一，(一圖1)為填充係數小於1〇〇%之透鏡陣列頂視圖。 圖（圖2)顯示出玻璃基質，其具有光阻劑沉積 於具表面上。 第三圖（圖3)顯示出雷射光束掃描於光敏性薄膜上，其 產生=同化學特性之區域（潛變影像）。 ^ ▲第四圖Α&Β(圖4Α及4Β)顯示出製造凸出結構中之捲方」 效應。 五圖Α及β(圖5Α及5β)分別地顯示出呈現為凸出以 凹下，列關係之堅硬製造器具的相互作用。 抑第/、圖（圖6)顯示出一種技術以估計一個陣列之微透 、兄早=的聚焦效率，其以凸出形式製造出。 料八及6(圖7A&7B)分別地顯示出以凸出以及凹一 々八衣w出之相同微透鏡分佈的實驗圖。 成凹及f九圖（圖8及圖9)顯示出在正光阻劑中所形 浮凸結構，其中凹腔邊緣之邊界對準於 ，十圖A，B，C(圖10A，10B及10C)顯示出具有凹下凹炉 初ϋ鱗模的複製以得到最終之凹下微透鏡。 【主要元件符號說明】 15 1241415 基質區域11;微透鏡12;單位小格13;光阻劑薄膜 21;基質22;曲線61，62;凹下表面浮凸圖案101;基質 102;基質103;塑膠樹脂104;凸出微透鏡105。In the prior art, B is always small, so the focusing efficiency is less than deletion. Using the invention process, the initial surface relief structure is marked in a concave form so that the sharp boundaries between the known lenses are well formed in the final microlens array. When the recessed product is copied, a convex array can be obtained such that B is equal to A. The focusing efficiency is therefore substantially equal to 100%. Experimental studies have confirmed the above analysis, especially the high numerical aperture convex microlens 1 (fast lens> case where the light is focused at a large angle. Figure 7A does not show a microlens array with a diameter equal to 50 microns to project The method of manufacturing 13 1241415 is clearly rounded and cannot be effectively used as the mother-micro lens in the hydrofocus array. The efficiency is 50%. The focusing efficiency of the non-linear array is estimated to be about _. : ίΞΐί The other important part of the process is that the light shown in Figure 8 shows the highest value aligned with the dog, and it seems to start to lose. For this screen, ^ ^ ^ can = other conditions The lower r is equal to the loss =. If you do not enter, the alignment between the tops of the concave surface of the concave structure of the concave structure is equal to the rule that the characteristics are randomly changed. The similar misalignment, only the top is opposite The standard embossing structure provided by Zhundi · 4ί 3 ====: convex = such as: concave =: 制 === ΐ ::: is not suitable for mass copying, so Wei Youer = Picture! Ίί = ί ;, sequence The ground is displayed by please to 。. For example, it is broken glass ^; = 表 ==: 14 1241415 ϋ〇3 '塑Resin 104 was deposited on the substrate. The resin was photoresist 2 and was used as an intermediate replication device, and 10c showed the replication result of FIG. 10β with an intermediate coating of ^ to produce the required protruding micro Lens 105 array. A sequence similar to that shown in Figure 10 can be used to produce a high efficiency and high fill factor = lower microlens array. Once again, the initial surface relief structure and lower form are formed in the positive photoresist. The specific embodiments of the invention have been described, and those skilled in the art, and other modifications and changes will not depart from the spirit and scope of the present invention. The scope of the following patent application covers all changes, changes and their equivalents. [Simple diagram Explanation] First, (Figure 1) is a top view of a lens array with a fill factor of less than 100%. Figure (Figure 2) shows a glass substrate with a photoresist deposited on the surface. Figure 3 (Figure 3) It is shown that the laser beam is scanned on the photosensitive film, and it produces a region with the same chemical properties (latent image). ^ ▲ The fourth figure A & B (Figures 4A and 4B) shows that The effect of "rolling the square." Figures A and β (Figures 5A and 5β) The ground shows the interaction of the hard manufacturing apparatus that appears as convex to concave, and the column relationship. The diagram (Figure 6) shows a technique to estimate the focusing efficiency of an array, which is slightly penetrating, and the earliest = Manufactured in a convex form. Materials 8 and 6 (Figures 7A & 7B) respectively show experimental diagrams of the same microlens distribution with protrusions and depressions. Figures 8 and 9 Fig. 9) shows the embossed structure formed in the positive photoresist, in which the boundary of the cavity edge is aligned, and Figs. A, B, and C (Figs. 10A, 10B, and 10C) show the beginning of the cavity Scale molds were copied to obtain the final concave microlenses. [Description of main component symbols] 15 1241415 Matrix area 11; Micro lens 12; Unit cell 13; Photoresist film 21; Matrix 22; Curves 61, 62; Embossed pattern 101 on the concave surface; Matrix 102; Matrix 103; Plastic Resin 104; convex microlens 105.
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