[go: up one dir, main page]

CN112687648B - 一种集成电路长跨度键合引线防注塑变形的键合方法 - Google Patents

一种集成电路长跨度键合引线防注塑变形的键合方法 Download PDF

Info

Publication number
CN112687648B
CN112687648B CN202011516205.7A CN202011516205A CN112687648B CN 112687648 B CN112687648 B CN 112687648B CN 202011516205 A CN202011516205 A CN 202011516205A CN 112687648 B CN112687648 B CN 112687648B
Authority
CN
China
Prior art keywords
bonding
point
wire
port
span
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202011516205.7A
Other languages
English (en)
Other versions
CN112687648A (zh
Inventor
李阳
周恒�
谌帅业
聂平健
商登辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GUIZHOU ZHENHUA FENGGUANG SEMICONDUCTOR CO Ltd
Original Assignee
GUIZHOU ZHENHUA FENGGUANG SEMICONDUCTOR CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GUIZHOU ZHENHUA FENGGUANG SEMICONDUCTOR CO Ltd filed Critical GUIZHOU ZHENHUA FENGGUANG SEMICONDUCTOR CO Ltd
Priority to CN202011516205.7A priority Critical patent/CN112687648B/zh
Publication of CN112687648A publication Critical patent/CN112687648A/zh
Application granted granted Critical
Publication of CN112687648B publication Critical patent/CN112687648B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512Aligning
    • H01L2224/85148Aligning involving movement of a part of the bonding apparatus
    • H01L2224/85169Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
    • H01L2224/8518Translational movements
    • H01L2224/85181Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch

Landscapes

  • Wire Bonding (AREA)

Abstract

一种集成电路长跨度键合引线防注塑变形的键合方法,所述方法包括如下步骤:将设定的金丝从劈刀顶部孔中穿入,从劈刀底部端口穿出;将劈刀端口带动键合引线在第一键合点A点键合;将劈刀端口向后按设定的倾斜角上升到设定的高度B点;将劈刀端口向后平移到设定的距离C点;将劈刀端口垂直上升到设定的高度D点;将劈刀端口向前上方按设定的高度和距离移动到E点;将劈刀端口向前下方移动到第二键合点F点完成键合完成第一键合点A点到第二键合点F点之间的引线键合。解决了现有塑料封装技术中,在引脚多、间距小、金丝细、长跨度的情况下,长跨度键合引线线弧注塑变形的问题。可以根据金丝的线径,推广到类似的长跨度引线键的产品中。

Description

一种集成电路长跨度键合引线防注塑变形的键合方法
技术领域
本发明涉及半导体芯片封装领域,进一步来说,涉及半导体芯片塑封领域,具体来说,涉及塑封芯片引线键合技术领域。
背景技术
在半导体行业中,为了实现芯片电路与外壳引线之间的电气连接,需要用键合丝(通常为金丝、硅铝丝或铜丝)将芯片上的电极输出点(芯片键合点)与封装外壳相应的引脚键合点键合的方式连接起来。特别是塑封半导体集成电路,综合考虑封装可靠性、封装成本、大批量规模化及自动化生产的要求,通常采用较细的金丝作为键合丝来进行电极键合点之间的引线连接。当引线从一个键合点向另一个键合点键合连接时,为了防止与两点之间的导电体发生接触短路,必须将键合丝拱起一定高度和形状的引线拱弧(以下简称线弧)。线弧强度决定于键合丝的类别、丝径及键合跨度(键合点之间的距离),丝径越小或跨度越大,则线弧强度越低,越容易发生变形,当受到迭落、震动、碰撞、塑封等外力的作用时,尤其如此,如坍塌、歪斜等现象,从而导致与其他引线或导体碰撞短路等不良隐患。特别是本发明所要解决的QFP塑封问题,涉及的引脚多、间距小、金丝细(丝径为φ15µm~φ30µm),塑封时,受塑脂流动、注塑压力等外力的影响,容易产生引线的线弧变形,产生如坍塌、歪斜等现象,从而导致与其他引线或导体碰撞短路等不良隐患。如LQFP100型塑封,采用φ20µm的金丝,当键合距离大于3mm时,注塑后,使用X光检验设备透视,可以清晰的看到,键合引线偏移倾斜后触碰短路,芯片1、正投影引线2、正投影拱弧变形引线3、正投影引线变形碰线处4之间的X光检验示意图如图1所示。
有鉴于此,特提出本发明。
发明内容
本发明的目的是:解决现有塑料封装技术中,在引脚多、间距小、金丝细、长跨度的情况下,如何防止长跨度键合引线线弧注塑变形的问题。
引线从第一键合点向第二键合点进行键合时,键合引线是顺着键合劈刀的端口不断送出,键合引线线弧的形成过程,是由键合劈刀端口按如下运行轨迹形成的。如图2~图5所示:
A、B、C、D、E、F分别依次代表劈刀端口的路径点,其中劈刀端口从A到D的高度决定了线弧的高度,其值越大,线弧高度越大;劈刀第一键合点5的折线高度AB和劈刀在到第二键合点6的偏转角度(∠CDE)决定线弧与第一键合点5焊盘的夹角,其值越大,线弧与焊盘的夹角(即现有技术引线起始角8)越小,线弧中间跨度距离DE决定线弧中间段结构,其值越大,线弧中间段越平直。这几个参数之间相互制约,跨度过大,键合引线会直接坍塌在焊接区域,跨度过小,则键合引线被直接拉断。
其中:
线段AB:表示劈刀端口从第一键合点5(A点)上升到B点的高度;
线段BC:表示劈刀端口从B向后移动到C点的距离;
线段CD:表示劈刀端口从C点上升D点的高度;
线段DE:表示劈刀端口从D点向前移动到E点的距离,即线弧中间跨度距离;
线段EF:表示劈刀端口从E点向第二键合点6(F点)键合的距离;
角∠CDE:表示劈刀在到第二焊点的偏转角度
线弧高度(AE):键合线弧的最高点到管脚水平面上的距离
通常的键合过程如图2所示:劈刀在第一键合点5(A点)键合后,垂直上升到B点,再向后平移到C点,再垂直上升到D点,再向前平移到E点,最后向前下方移动到第二键合点6(F点)完成键合完成第一键合点5(A点)到第二键合点6(F点)之间的引线键合。
由此得到的引线线弧形状如图3所示:引线起始角8大于45°,拱弧中间段9的长度小于AF距离的一半,拱弧中间段9的形状呈抛物线拱弧,拱弧高度10相对较高。是标准GJB548中法2011.1规定的标准线弧形状。当线弧为长跨度线弧时,就出现本发明所要解决的技术问题。
当线弧为长跨度线弧时,通过分析键合引线的受力模式,其受到冲力与塑封料的黏度、注塑速度、引线与冲力夹角的大小成正比。在塑封料黏度、注塑速度处于合理区间时,通过改变线弧的形状提高键合引线长跨度时中间段的结构强度,改变塑封料冲力与引线的夹角,从而降低键合引线在注塑过程中受到的冲力,避免了引线中间段偏移短路,提高产品质量可靠性。
为此,本发明的总体构思是:从以下三个方面进行改进:(1)降低线弧高度10;(2)将线弧中间圆弧结构改为接近水平的形状12;(3)减小线弧与焊盘的夹角11。示意图如图5所示。
为此,本发明提供一种集成电路长跨度键合引线防注塑变形的键合方法,如图4所示,包括如下步骤:
(1)将设定的金丝从劈刀顶部孔中穿入,从劈刀底部端口穿出;
(2)将劈刀端口带动键合引线在第一键合点A点键合;
(3)将劈刀端口按∠ABC大于90°的倾斜角从A点上升到50µm -70µm的高度B点;
(4)将劈刀端口从B点向后平移到设定的距离C点;
(5)将劈刀端口按∠BCD等于90°从C点垂直上升到设定的高度D点;
(6)将劈刀端口按∠CDE大于90°从D点按100µm -120µm的高度和设定的距离移动到E点;
(7)将劈刀端口按∠DEF从D点向前下方移动到第二键合点F点完成F点键合,F点键合后键合引线与其承受的塑封料的冲击力夹角为10°~30°;
所述长跨度键合的键合距离为3mm~5mm。
根据本所述的键合方法,即可得到如图5所示的键合引线线弧形状。
与原来的线弧形状相比,新的线弧形状其折线高度降低,倾斜角度减小,线弧跨度距离超过键合距离的一半以上的比例,得到的线弧形状结构表现为线弧高度低,中间段平直。注塑后X光机检验,可以清晰看到键合引线摆动幅度下降,经过多批次验证,新的线弧结均注塑后引线无偏移短路的情况发生。
本发明所述的键合方法实现了长键合距离的线弧构成的主要影响因素,提供了长跨度键合引线线弧结构设计思路,并提供了一组设计线弧的参数。由于金丝键合机线弧形成过程基本一致,只是不同厂商的设备有不同的参数名称和窗口,本发明所述的键合方法可以根据金丝的线径,推广到类似的长跨度引线键的产品中。
附图说明
图1为现有技术键合引线偏移短路示意图。
图2为现有技术键合劈刀拱丝路径示意图。
图3为现有技术键合引线拱弧形状示意图。
图4为本发明键合劈刀拱丝路径示意图。
图5为本发明键合引线拱弧形状示意图。
图中:1为芯片、2为正投影引线、3为正投影拱弧变形引线、4为正投影引线变形碰线处、5为第一键合点、6为第二键合点、7为现有技术拱弧引线、8为现有技术引线起始角、9为现有技术拱弧中间段、10为现有技术拱弧高度、11为本发明引线起始角、12为本发明拱弧引线
具体实施方式
以LQFP100型塑封产品为例,采用φ20µm的金丝,键合距离在3mm~5mm之间。采用的键合设备为ASM的iHawk Xtreme GoCu,常规的键合引线线弧高度一般设置在150µm~200µm,倾斜角度一般设置在90°,在键合距离(AF)大于3mm后,使用原有的线弧参数形状是无法避免键合引线在中间部位偏移的问题,其常规线弧路径示意图如图2、图3所示。
根据本发明所述的键合方法,为避免键合引线在注塑过程中偏移偏移,设计了新的键合引线线弧结构。如表1所示:
表1 长距离键合线弧参数试验因素水平表
水平 折线高度(AB)/µm 倾斜角度(∠CDE)/° 线弧中间跨度(DE)与原跨度的百分比/% 线弧高度(AE)/µm
1 50 90 75% 100
2 60 120 80% 110
3 70 150 85% 120
其中:
1、折线高度(AB):劈刀从第一键合点上升的第一点距离。
2、倾斜角度(∠CDE):劈刀在到第二焊点的偏转角度。
3、线弧高度(AE):键合线弧的最高点到管脚水平面上的距离。
4、线弧中间跨度距离(DE):劈刀在最高点水平移动的距离。
经过从新设计不同的线弧形状,折线高度(AB)选择50µm,倾角角度(∠CDE)选择150°,线弧中间跨度(DE)与原跨度的百分比选择85%,线弧高度选择100µm时,键合引线的中间部位更加平整,键合引线与其承受的塑封料的冲击力夹角从原来的45°~70°降低到现在的10°~30°。
与原来的线弧形成相比,新的线弧形状其折线高度降低,倾斜角度调到设备极限,线弧跨度距离超过键合距离的一半比例,线弧高度采用设备最低极限值,实际的线弧形状结构表现为线弧高度低,中间段平直,注塑后X光机检验,可以清晰看到键合引线摆动幅度下降,经过多批次验证,新的线弧结均注塑后引线无偏移短路的情况发生。
以上内容是结合最佳实施方案对本发明说做的进一步详细说明,不能认定本发明的具体实施只限于这些说明。本领域的技术人员应该理解,在不脱离由所附权利要求书限定的情况下,可以在细节上进行各种修改,都应当视为属于本发明的保护范围。

Claims (6)

1.一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,所述方法包括如下步骤:
(1)将设定的金丝从劈刀顶部孔中穿入,从劈刀底部端口穿出;
(2)将劈刀端口带动键合引线在第一键合点A点键合;
(3)将劈刀端口按∠ABC大于90°的倾斜角从A点上升到50µm -70µm的高度B点;
(4)将劈刀端口从B点向后平移到设定的距离C点;
(5)将劈刀端口按∠BCD等于90°从C点垂直上升到设定的高度D点;
(6)将劈刀端口按∠CDE大于90°从D点按100µm -120µm的高度和设定的距离移动到E点;
(7)将劈刀端口按∠DEF从D点向前下方移动到第二键合点F点完成F点键合,F点键合后键合引线与其承受的塑封料的冲击力夹角为10°~30°;
所述长跨度键合的键合距离为3mm~5mm。
2.如权利要求1所述的一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,∠CDE 为150°。
3.如权利要求1所述的一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,所述键合引线的线径为φ15µm~φ30µm。
4.如权利要求3所述的一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,所述键合引线的线径为φ20µm。
5.如权利要求1所述的一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,B点的高度为50µm,线弧高度为100µm。
6.如权利要求1所述的一种集成电路长跨度键合引线防注塑变形的键合方法,其特征在于,采用的键合设备为ASM公司的iHawk Xtreme GoCu。
CN202011516205.7A 2020-12-21 2020-12-21 一种集成电路长跨度键合引线防注塑变形的键合方法 Active CN112687648B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011516205.7A CN112687648B (zh) 2020-12-21 2020-12-21 一种集成电路长跨度键合引线防注塑变形的键合方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011516205.7A CN112687648B (zh) 2020-12-21 2020-12-21 一种集成电路长跨度键合引线防注塑变形的键合方法

Publications (2)

Publication Number Publication Date
CN112687648A CN112687648A (zh) 2021-04-20
CN112687648B true CN112687648B (zh) 2024-06-11

Family

ID=75449572

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011516205.7A Active CN112687648B (zh) 2020-12-21 2020-12-21 一种集成电路长跨度键合引线防注塑变形的键合方法

Country Status (1)

Country Link
CN (1) CN112687648B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116564837B (zh) * 2023-07-07 2023-09-26 赛晶亚太半导体科技(北京)有限公司 一种基于镀镍焊盘的铝包铜线的键合方法及键合结构

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110854094A (zh) * 2019-11-27 2020-02-28 中国兵器工业集团第二一四研究所苏州研发中心 大尺寸芯片的键合线低弧键合方法
CN111668182A (zh) * 2020-07-03 2020-09-15 浙江佳博科技股份有限公司 一种键合丝及基于键合丝的半导体键合工艺

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7078792B2 (en) * 2004-04-30 2006-07-18 Atmel Corporation Universal interconnect die
JP4361593B1 (ja) * 2008-10-21 2009-11-11 株式会社新川 ワイヤボンディング方法
EP3166142B1 (en) * 2015-11-06 2021-07-21 Nxp B.V. Bond wire connection and method of manufacturing the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110854094A (zh) * 2019-11-27 2020-02-28 中国兵器工业集团第二一四研究所苏州研发中心 大尺寸芯片的键合线低弧键合方法
CN111668182A (zh) * 2020-07-03 2020-09-15 浙江佳博科技股份有限公司 一种键合丝及基于键合丝的半导体键合工艺

Also Published As

Publication number Publication date
CN112687648A (zh) 2021-04-20

Similar Documents

Publication Publication Date Title
US7934634B2 (en) Wire bonding method
US5299729A (en) Method of forming a bump electrode and manufacturing a resin-encapsulated semiconductor device
US7661576B2 (en) Wire bonding method
US9165842B2 (en) Short tail recovery techniques in wire bonding operations
KR950009619B1 (ko) 반도체장치의 와이어 본딩방법
CN112687648B (zh) 一种集成电路长跨度键合引线防注塑变形的键合方法
US9543267B2 (en) Ultra fine pitch wedge for thicker wire
US9314869B2 (en) Method of recovering a bonding apparatus from a bonding failure
US8384229B2 (en) Semiconductor device and method for manufacturing the same
WO2014014643A1 (en) Methods of forming wire interconnect structures
US8152046B2 (en) Conductive bumps, wire loops, and methods of forming the same
US7427009B2 (en) Capillary for wire bonding
US20010004991A1 (en) Wire bonding method and apparatus
US10643966B2 (en) Electrical interconnections for semiconductor devices and methods for forming the same
US20050167473A1 (en) Method for producing wedge-wedge wire connection
US6230569B1 (en) Use of a stream of compressed gas to detect semiconductor interconnect problems
KR102525683B1 (ko) 클립 구조체 및 그 클립 구조체를 포함하는 반도체 패키지
US7080771B2 (en) Method for checking the quality of a wedge bond
EP3166142B1 (en) Bond wire connection and method of manufacturing the same
JP3595386B2 (ja) 半導体装置
Tuazon et al. Modified M-Loop wire formation: An innovative solution in wire bond process to relieve stress on ball neck causing broken wire
US20250201765A1 (en) Methods of operating wire bonding systems, including methods of detecting and/or preventing wire fly-out on such systems
Chenjun et al. Experimental Analysis for Bump Shear Method of BSOB Wire Bonding Process
CN116564837B (zh) 一种基于镀镍焊盘的铝包铜线的键合方法及键合结构
US20240250063A1 (en) Methods of automatic recovery for process errors in operating wire bonding machines

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: 550018 no.238, north section of Xintian Avenue, Wudang District, Guiyang City, Guizhou Province

Applicant after: Guizhou Zhenhua Fengguang Semiconductor Co.,Ltd.

Address before: 550018 no.238, north section of Xintian Avenue, Wudang District, Guiyang City, Guizhou Province

Applicant before: GUIZHOU ZHENHUA FENGGUANG SEMICONDUCTOR Co.,Ltd.

CB02 Change of applicant information
GR01 Patent grant
GR01 Patent grant