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CN112331729A - Light absorbing layer of CIGS thin film solar cell and method for forming the same - Google Patents

Light absorbing layer of CIGS thin film solar cell and method for forming the same Download PDF

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CN112331729A
CN112331729A CN202011216644.6A CN202011216644A CN112331729A CN 112331729 A CN112331729 A CN 112331729A CN 202011216644 A CN202011216644 A CN 202011216644A CN 112331729 A CN112331729 A CN 112331729A
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layer
solar cell
film solar
cigs thin
thin film
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蒋卓睿
刘小雨
蒋继文
王云飞
徐根保
彭寿
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Triumph Photovoltaic Material Co ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/126Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • H10F77/1265Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS] characterised by the dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • H10F10/146Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/128Annealing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

本发明涉及太阳能电池技术领域,具体涉及一种CIGS薄膜太阳能电池的光吸收层及其形成方法;所述光吸收层的预制结构包括依次连接的玻璃衬底、背电极、吸收中层、Se层,所述吸收中层包括自背电极向Se层方向依次沉积的Cu‑Na合金层、Cu‑Ga合金层和In层。本发明具有下述有益技术效果:本发明在光吸收层中镀膜多层Na元素,在热处理下,Na元素在光吸收层中有效迁移,因此实现光吸收层中Na含量的精准控制和均匀分布,通过多层Na元素掺杂,促进CIGS吸收层结晶,优化Ga元素在吸收层中的分布。The invention relates to the technical field of solar cells, in particular to a light absorption layer of a CIGS thin film solar cell and a method for forming the same; the prefabricated structure of the light absorption layer comprises a glass substrate, a back electrode, an absorption middle layer, and an Se layer that are connected in sequence, The absorption middle layer includes a Cu-Na alloy layer, a Cu-Ga alloy layer and an In layer sequentially deposited from the back electrode toward the Se layer. The present invention has the following beneficial technical effects: the present invention coats a multi-layer Na element in the light absorbing layer, and under heat treatment, the Na element migrates effectively in the light absorbing layer, thus realizing precise control and uniform distribution of the Na content in the light absorbing layer , Through the multi-layer Na element doping, the crystallization of the CIGS absorber layer is promoted, and the distribution of Ga element in the absorber layer is optimized.

Description

Light absorption layer of CIGS thin-film solar cell and forming method thereof
Technical Field
The invention relates to the technical field of solar cells, in particular to a light absorption layer of a CIGS thin-film solar cell and a forming method thereof.
Background
Thin film solar cells, such as amorphous silicon solar cells and compound thin film solar cells, can significantly reduce material costs and manufacturing costs compared to conventional crystalline silicon solar cells, and are one of the important fields of research and development in recent years. Among them, compound thin-film solar cells using elements of groups i, iii, and vi as constituent materials, particularly CIGS solar cells using a CIGS film formed of an alloy of copper (Cu), indium (In), gallium (Ga), and selenium (Se) as a light absorbing layer have attracted attention because they do not use silicon at all and have excellent solar light conversion efficiency.
The light absorbing layer is the core of the CIGS solar cell. Research shows that trace Na doping can promote crystallization of the light absorption layer, optimize electrical performance of the CIGS solar cell and improve conversion efficiency and yield. Research on a Na element doping technology with active properties is one of important directions for improving the efficiency of a CIGS solar cell. In the prior art, a doping method for transferring Na in a soda-lime glass substrate to a light absorption layer by using heat treatment cannot ensure the distribution uniformity of Na elements in the light absorption layer, and a Na element doping technology with more stability, uniformity and controllability still needs to be further researched.
Disclosure of Invention
The primary object of the present invention is to provide a prefabricated structure of a CIGS thin-film solar cell light absorption layer to achieve uniform distribution of Na elements in the light absorption layer.
A prefabricated structure of a light absorption layer of a CIGS thin-film solar cell comprises a glass substrate, a back electrode, an absorption middle layer and an Se layer which are sequentially connected, wherein the absorption middle layer comprises a Cu-Na alloy layer, a Cu-Ga alloy layer and an In layer which are sequentially deposited from the back electrode to the Se layer.
In a preferred embodiment of the present invention, the glass substrate is selected from any one of soda lime glass, medium alumina glass, and high alumina glass.
The preferable scheme of the invention is that the back electrode comprises two double-layer Mo films and an SiN layer positioned between the two double-layer Mo films, the thickness of the back electrode is 100-500nm, and the thickness of the SiN layer is 10-200 nm.
In a preferred embodiment of the present invention, at least 2 absorbing intermediate layers are included between the back electrode and the Se layer.
Another object of the present invention is to provide a method for forming a prefabricated structure of a light absorbing layer of a CIGS thin-film solar cell as described above, comprising the steps of:
s1: depositing a Mo film, a SiN layer and a Mo film on a glass substrate in sequence by adopting magnetron sputtering to form a back electrode;
s2: depositing a Cu-Na alloy layer, a Cu-Ga alloy layer and an In layer on the back electrode In sequence by adopting magnetron sputtering to form an absorption middle layer;
s3: forming a Se layer by sputtering Se vapor onto the absorbing middle layer by a sputtering method;
the number of operations of step S2 is at least 2.
The preferred scheme of the invention is that the magnetron sputtering method comprises the following steps: evacuating the operating cavity to (0.5-2) × 10- 6mbar, carrying out sputtering on the Mo target material or the SiN target material or the CuNa target material or the CuGa target material or the In target material, wherein the sputtering temperature is 20-30 ℃, the sputtering power is 3-8kW, the Ar flow is 400-plus-10 sccm, and the sputtering pressure is (2-4) × 10-3mbar。
In a preferred embodiment of the present invention, in the absorption intermediate layer, the Na content in the Cu-Na alloy layer is 30 to 150ng/cm2
In a preferable embodiment of the present invention, in the absorbing intermediate layer, the Cu content in the Cu-Ga alloy layer is 30 to 140 μ g/cm2
In a preferred embodiment of the present invention, in the absorbing intermediate layer, the Ga content in the Cu-Ga alloy layer is 10 to 60 μ g/cm2
In the preferable scheme of the invention, In content In the In layer In the absorption intermediate layer is 40-180 mug/cm2
The preferable scheme of the invention is that the Se content in the Se layer is 550-2
A further object of the present invention is to provide a method for forming a CIGS thin-film solar cell light absorbing layer, comprising heat-treating the prefabricated structure as described above or the prefabricated structure formed by any one of the above methods to obtain a CIGS thin-film solar cell light absorbing layer; the heat treatment temperature is 400-650 ℃, and the heat treatment time is 5-30 minutes.
It is still another object of the present invention to provide a CIGS thin-film solar cell light absorbing layer formed by the above method.
It is a further object of the present invention to provide a CIGS thin-film solar cell including a CIGS thin-film solar cell light absorbing layer formed according to the method as described above or a CIGS thin-film solar cell light absorbing layer as described above.
Unless otherwise indicated, when the present invention relates to percentages between liquids, said percentages are volume/volume percentages; the invention relates to the percentage between liquid and solid, said percentage being volume/weight percentage; the invention relates to the percentages between solid and liquid, said percentages being weight/volume percentages; the balance being weight/weight percent.
Compared with the prior art, the invention has the following beneficial technical effects: according to the invention, the Na element is coated in the light absorption layer, and under the heat treatment, the Na element effectively migrates in the light absorption layer, so that the accurate control and uniform distribution of the Na content in the light absorption layer are realized.
Drawings
Fig. 1 is a schematic structural view of example 1 of the present invention (the number of layers of the absorbing layer 30 is 2);
FIG. 2 is a schematic diagram of a technical implementation process of embodiment 5 of the present invention;
fig. 3 is a schematic diagram of a technical implementation process of embodiment 6 of the present invention.
Detailed Description
The present invention will be described below with reference to examples, but the present invention is not limited to the examples.
Example 1 prefabricated Structure of light absorbing layer of CIGS thin-film solar cell
Referring to fig. 1, a prefabricated structure of a light absorbing layer of a CIGS thin-film solar cell includes a glass substrate 10, a back electrode 20, an absorbing intermediate layer 30, and a Se layer 40, which are sequentially connected.
The glass substrate 10 is soda-lime glass.
The back electrode 20 comprises two double-layer Mo films 21 and an SiN layer 22 located between the two double-layer Mo films 21, the thickness of the back electrode 20 is 400nm, the thickness of the SiN layer 22 is 50nm, and the thicknesses of the upper Mo film 21 and the lower Mo film 21 are respectively 200nm and 150 nm.
The absorption intermediate layer 30 includes a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32, and an In layer 33 sequentially deposited from the back electrode 20 toward the Se layer 40;
the number of layers of the absorbing middle layer 30 is 2.
In the absorbing middle layer 30, the Cu content in the Cu-Na alloy layer 31 is 7 mug/cm2Na content of 280ng/cm2(ii) a The total Cu content in the Cu-Ga alloy layer 32 is 170 [ mu ] g/cm2The total content of Ga is 50 mu g/cm2(ii) a The total In content In the In layer 33 was 220. mu.g/cm2
The total content of Se in the Se layer 40 is 600 mu g/cm2
Example 2 method for Forming prefabricated Structure of light absorbing layer of CIGS thin film solar cell
A method for forming a prefabricated structure of a CIGS thin-film solar cell light absorption layer comprises the following steps:
s1: respectively taking a metal Mo target and a metal SiN target as targets, and sequentially depositing a Mo film 21, a SiN layer 22 and the Mo film 21 on the glass substrate 10 by adopting magnetron sputtering to form a back electrode 20;
s2: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the back electrode 20 by magnetron sputtering to form a first absorption middle layer 30;
s3: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the first absorption middle layer 30 by magnetron sputtering to form a second absorption middle layer 30;
s4: se vapor is formed by heating the Se source to a temperature of 800 ℃ or higher, and the Se layer 40 is formed by sputtering Se vapor onto the second absorbing intermediate layer 30 by a sputtering method.
In the above step, the magnetron sputtering method comprises: evacuating the operating cavity of the magnetron sputtering system to 1 x 10- 6mbar, carrying out sputtering on a Mo target material, a SiN target material, a CuNa target material, a CuGa target material or an In target material, wherein the sputtering power is 8kW, the Ar flow is introduced into the target material at 400sccm, and the sputtering pressure is 3 x 10-3mbar。
The thickness of the back electrode 20 is 400nm, the thickness of the SiN layer 22 is 50nm, and the thicknesses of the upper Mo film 21 and the lower Mo film 21 are respectively 200nm and 150 nm.
The Cu content in the total Cu-Na alloy layer 31 in the first absorbing intermediate layer 30 and the second absorbing intermediate layer 30 is 7 [ mu ] g/cm2Na content of 280ng/cm2(ii) a The total Cu content in the total Cu-Ga alloy layer 32 is 170 [ mu ] g/cm2The total content of Ga is 50 mu g/cm2(ii) a The total In content In the total In layer 33 was 220. mu.g/cm2
The total content of Se in the Se layer 40 is 600 mu g/cm2
Example 3 method for Forming prefabricated Structure of light absorbing layer of CIGS thin film solar cell
A method for forming a prefabricated structure of a CIGS thin-film solar cell light absorption layer comprises the following steps:
s1: respectively taking a metal Mo target and a metal SiN target as targets, and sequentially depositing a Mo film 21, a SiN layer 22 and the Mo film 21 on the glass substrate 10 by adopting magnetron sputtering to form a back electrode 20;
s2: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the back electrode 20 by magnetron sputtering to form a first absorption middle layer 30;
s3: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the first absorption middle layer 30 by magnetron sputtering to form a second absorption middle layer 30;
s4: se vapor is formed by heating the Se source to a temperature of 800 ℃ or higher, and the Se layer 40 is formed by sputtering Se vapor onto the second absorbing intermediate layer 30 by a sputtering method.
In the above step, the magnetron sputtering method comprises: evacuating the operating cavity of the magnetron sputtering system to 1.8 x 10-6mbar for Mo target, SiN target, CuNa target or CuGa targetSputtering the target material or the In target material, wherein the sputtering power is 9kW, the Ar flow is 400sccm, and the sputtering pressure is 3.8 x 10-3mbar。
The thickness of the back electrode 20 is 418nm, the thickness of the SiN layer 22 is 48nm, and the thicknesses of the upper Mo film 21 and the lower Mo film 21 are respectively 200nm and 170 nm.
The Cu content in the total Cu-Na alloy layer 31 in the first absorbing intermediate layer 30 and the second absorbing intermediate layer 30 is 7 [ mu ] g/cm2Na content of 310ng/cm2(ii) a The total Cu content in the total Cu-Ga alloy layer 32 is 165. mu.g/cm2The total content of Ga is 50 mu g/cm2(ii) a The total In content In the total In layer 33 was 215. mu.g/cm2
The total content of Se in the Se layer 40 is 615 mu g/cm2
Example 4 method for Forming prefabricated Structure of light absorbing layer of CIGS thin film solar cell
A method for forming a prefabricated structure of a CIGS thin-film solar cell light absorption layer comprises the following steps:
s1: respectively taking a metal Mo target and a metal SiN target as targets, and sequentially depositing a Mo film 21, a SiN layer 22 and the Mo film 21 on the glass substrate 10 by adopting magnetron sputtering to form a back electrode 20;
s2: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the back electrode 20 by magnetron sputtering to form a first absorption middle layer 30;
s3: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the first absorption middle layer 30 by magnetron sputtering to form a second absorption middle layer 30;
s4: respectively taking a metal CuNa target, a CuGa target and an In target as target materials, and sequentially depositing a Cu-Na alloy layer 31, a Cu-Ga alloy layer 32 and an In layer 33 on the second absorption middle layer 30 by magnetron sputtering to form a third absorption middle layer 30;
s5: se vapor is formed by heating the Se source to a temperature of 800 ℃ or higher, and the Se layer 40 is formed by sputtering Se vapor onto the third absorbing intermediate layer 30 by a sputtering method.
In the above step, the magnetron sputtering method comprises: evacuating the operating cavity of the magnetron sputtering system to 2 x 10- 6mbar, carrying out sputtering on Mo target material, SiN target material, CuNa target material, CuGa target material or In target material, wherein the sputtering power is 8.5kW, the Ar flow is introduced into the target material at 400sccm, and the sputtering pressure is 3.2 x 10-3mbar。
The thickness of the back electrode 20 is 500nm, the thickness of the SiN layer 22 is 60nm, and the thicknesses of the upper Mo film 21 and the lower Mo film 21 are 250nm and 190nm respectively.
The Cu content in the total Cu-Na alloy layer 31 of the first, second and third absorbing middle layers 30, 30 is 7.5 [ mu ] g/cm2Na content of 320ng/cm2(ii) a The total Cu content in the total Cu-Ga alloy layer 32 is 175 μ g/cm2The total content of Ga is 55 mu g/cm2(ii) a The total In content In the total In layer 33 was 230. mu.g/cm2
The total content of Se in the Se layer 40 is 680 mu g/cm2
Example 5 method for forming CIGS thin film solar cell light absorbing layer
A prefabricated structure formed in the embodiment 2 is placed in a 570 ℃ temperature environment to be subjected to heat treatment for 10 minutes, and the CIGS thin-film solar cell light absorption layer is obtained.
Example 6 method for forming CIGS thin film solar cell light absorbing layer
A prefabricated structure formed in the embodiment 3 is placed in a temperature environment of 580 ℃ for heat treatment for 10 minutes to obtain the CIGS thin-film solar cell light absorbing layer.
Example 7 method for forming CIGS thin film solar cell light absorbing layer
A prefabricated structure formed in the embodiment 4 is placed in an environment with the temperature of 565 ℃ for heat treatment for 10 minutes to obtain the CIGS thin-film solar cell light absorbing layer.
Performance test
Based on the light-absorbing layers obtained in examples 5, 6, and 7, solar cell modules A, B and C were obtained, and parameters such as Power (module Power), Voc (open circuit voltage), Isc (short circuit current), Rs (series resistance), Rsh (parallel resistance), and the like of the solar cell modules A, B and C were measured at 25 ℃ and 60% humidity using a Halm Power tester to evaluate photoelectric conversion efficiency of the products. The results are shown in table 1 below.
TABLE 1
Figure BDA0002760622050000091

Claims (10)

1.一种CIGS薄膜太阳能电池光吸收层的预制结构,其特征在于:包括依次连接的玻璃衬底(10)、背电极(20)、吸收中层(30)、Se层(40),所述吸收中层(30)包括自背电极(20)向Se层(40)方向依次沉积的Cu-Na合金层(31)、Cu-Ga合金层(32)和In层(33)。1. a prefabricated structure of a CIGS thin-film solar cell light absorbing layer, characterized in that: comprising a glass substrate (10), a back electrode (20), an absorbing middle layer (30), a Se layer (40) connected in sequence, the described The absorption middle layer (30) includes a Cu-Na alloy layer (31), a Cu-Ga alloy layer (32) and an In layer (33) sequentially deposited from the back electrode (20) toward the Se layer (40). 2.根据权利要求1所述的CIGS薄膜太阳能电池光吸收层的预制结构,其特征在于:所述玻璃衬底(10)选自钠钙玻璃、中铝玻璃、高铝玻璃中的任意一种。2. The prefabricated structure of the light absorption layer of the CIGS thin film solar cell according to claim 1, wherein the glass substrate (10) is selected from any one of soda lime glass, medium aluminum glass, and high aluminum glass . 3.根据权利要求1所述的CIGS薄膜太阳能电池光吸收层的预制结构,其特征在于:所述背电极(20)包括两层Mo薄膜(21)和位于两层Mo薄膜(21)之间的SiN层(22),背电极(20)的厚度为100-500nm,SiN层(22)的厚度为10-200nm。3. The prefabricated structure of the light absorbing layer of a CIGS thin film solar cell according to claim 1, wherein the back electrode (20) comprises two layers of Mo thin films (21) and is located between the two layers of Mo thin films (21). The thickness of the SiN layer (22) is 100-500 nm of the back electrode (20), and the thickness of the SiN layer (22) is 10-200 nm. 4.根据权利要求1所述的CIGS薄膜太阳能电池光吸收层的预制结构,其特征在于:所述背电极(20)和Se层(40)之间至少包括2层吸收中层(30)。4. The prefabricated structure of the light absorbing layer of the CIGS thin film solar cell according to claim 1, wherein at least two absorbing middle layers (30) are included between the back electrode (20) and the Se layer (40). 5.一种根据权利要求1-4任一项所述的CIGS薄膜太阳能电池光吸收层的预制结构的形成方法,其特征在于,包括如下步骤:5. a method for forming a prefabricated structure of a CIGS thin film solar cell light absorbing layer according to any one of claims 1-4, characterized in that, comprising the steps: S1:采用磁控溅射在玻璃衬底(10)上依次沉积Mo薄膜(21)、SiN层(22)和Mo薄膜(21),形成背电极(20);S1: using magnetron sputtering to sequentially deposit a Mo film (21), a SiN layer (22) and a Mo film (21) on the glass substrate (10) to form a back electrode (20); S2:采用磁控溅射在背电极(20)上依次沉积Cu-Na合金层(31)、Cu-Ga合金层(32)和In层(33),形成吸收中层(30);S2: using magnetron sputtering to sequentially deposit a Cu-Na alloy layer (31), a Cu-Ga alloy layer (32) and an In layer (33) on the back electrode (20) to form an absorption middle layer (30); S3:采用喷镀法将Se蒸汽喷镀至吸收中层(30)上形成Se层(40);S3: adopting the spraying method to spray the Se vapor onto the absorption middle layer (30) to form the Se layer (40); 所述步骤S2的操作次数为至少2次。The number of operations in step S2 is at least 2 times. 6.根据权利要求5所述的方法,其特征在于:所述磁控溅射的方法为:将操作空腔抽真空至(0.5-2)*10-6mbar,对Mo靶材或SiN靶材或CuNa靶材或CuGa靶材或In靶材进行溅射,溅射温度为20-30℃,溅射功率为3-8kW,通入Ar流量为400-800sccm,溅射气压为(2-4)*10- 3mbar。6 . The method according to claim 5 , wherein the magnetron sputtering method is as follows: evacuating the operating cavity to (0.5-2)*10 -6 mbar, and evacuating the Mo target or SiN target. 7 . The sputtering temperature is 20-30℃, the sputtering power is 3-8kW, the flow rate of Ar is 400-800sccm, and the sputtering pressure is (2- 4)*10 - 3 mbar. 7.根据权利要求5所述的方法,其特征在于:所述吸收中层(30)中,Cu-Na合金层(31)中Na含量为30-150ng/cm2;Cu-Ga合金层(32)中Cu含量为30-140μg/cm2,Ga含量为10-60μg/cm2;In层(33)中In含量为40-180μg/cm27. The method according to claim 5, characterized in that: in the absorption middle layer (30), the Na content in the Cu-Na alloy layer (31) is 30-150ng/cm 2 ; the Cu-Ga alloy layer (32) ), the content of Cu is 30-140 μg/cm 2 , the content of Ga is 10-60 μg/cm 2 ; the content of In in the In layer (33) is 40-180 μg/cm 2 . 8.一种CIGS薄膜太阳能电池光吸收层的形成方法,其特征在于:包括对权利要求1-4任一项所述的预制结构或权利要求5-7任一项所述方法形成的预制结构进行热处理,获得CIGS薄膜太阳能电池光吸收层;所述热处理温度为400℃-650℃,热处理时间为5-30分钟。8. A method for forming a light absorbing layer of a CIGS thin film solar cell, characterized in that: comprising the prefabricated structure formed by the method of any one of claims 1-4 or the method of any one of claims 5-7 Heat treatment is performed to obtain the light absorption layer of the CIGS thin film solar cell; the heat treatment temperature is 400° C.-650° C., and the heat treatment time is 5-30 minutes. 9.一种根据权利要求8所述方法形成的CIGS薄膜太阳能电池光吸收层。9. A CIGS thin film solar cell light absorption layer formed according to the method of claim 8. 10.一种CIGS薄膜太阳能电池,其特征在于:包括根据权利要求8所述的方法形成的CIGS薄膜太阳能电池光吸收层或权利要求9所述的CIGS薄膜太阳能电池光吸收层。10 . A CIGS thin film solar cell, characterized in that it comprises a CIGS thin film solar cell light absorption layer formed according to the method of claim 8 or the CIGS thin film solar cell light absorption layer of claim 9 . 11 .
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