CN112022737A - Cleaning and moisturizing facial mask capable of removing heavy metal residues and preparation method thereof - Google Patents

Abstract

The invention relates to the technical field of cosmetics, in particular to a cleaning and moisturizing facial mask capable of removing heavy metal residues and an equipment method thereof, comprising a facial mask matrix and a facial mask essence. 8-10 parts of sodium acrylate/sepiolite hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of niacinamide, sodium hyaluronate 1-3 parts, 3-8 parts of propylene glycol, and the rest are deionized water. The present invention contains sodium alginate-sodium polyacrylate/sepiolite hydrogel, which can effectively remove copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions and barium ions remaining on the face such as air and cosmetics. , tungsten ions and other heavy metal ions, which can better clean the skin and are safe and reliable; at the same time, the main component of the mask is hydrogel, and there are also butanediol, niacinamide, propylene glycol and other ingredients to better lock in moisture and achieve moisturizing. purpose of hydration.

Description

A cleaning and moisturizing facial mask capable of removing heavy metal residues and preparation method thereof

technical field

The invention relates to the technical field of cosmetics, in particular to a cleaning and moisturizing facial mask capable of removing heavy metal residues and an equipment method thereof.

Background technique

With the development of the times, many girls now love beauty very much, and they must wear makeup when they go out. Makeup is the most important thing that many women must do before going out. Recently, the Korean food and drug department publicly stated, Cosmetics of 8 well-known brands including South Korea's Amore have detected heavy metals exceeding the standard, including 13 products such as concealer and lip liner.

The skin can absorb a variety of heavy metals (such as mercury, lead, arsenic, copper, etc.) and their salts. Most heavy metal poisoning is chronic poisoning caused by long-term exposure. Fatigue, depression, abdominal pain, kidney deficiency, high blood pressure, heart failure, joint pain, reproductive disorders, and anemia are common symptoms of adult poisoning. Lead poisoning in pregnant women can lead to serious consequences such as miscarriage, low birth weight, stillbirth, and stunted infant growth. Symptoms of lead poisoning in children include loss of appetite, stomach pain, constipation, nausea, diarrhea, fatigue, low IQ, insomnia, learning disabilities, and anemia.

With the rapid improvement of modern life quality, skin care has become an increasingly common way of life, and the most common skin care products are facial masks. Traditional masks cannot achieve the cleaning effect of removing heavy metals, and are generally limited to moisturizing and whitening, and the effect is not good.

SUMMARY OF THE INVENTION

The purpose of the present invention is to overcome the defects existing in the prior art, and to provide a moisturizing facial mask that can effectively remove heavy metal residues such as air and cosmetics.

The technical scheme for realizing the object of the present invention is: a moisturizing facial mask that can remove heavy metal residues; comprising a facial mask matrix and a facial mask essence, the facial mask essence, by weight, comprises: sodium alginate-sodium polyacrylate/sepiolite 8-10 parts of hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of niacinamide, 1-3 parts of sodium hyaluronate, propylene glycol 3-8 parts, the rest are deionized water.

In the above technical solution, the facial mask substrate is facial mask paper, and the material of the facial mask paper is silk, polyester, cotton, blended and biological fibers.

In the above technical solution, the heavy metal ions that can be removed by the moisturizing facial mask include: copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions, and tungsten ions.

In the above technical solution, the removal rate of residual heavy metals on the face of the moisturizing facial mask is greater than or equal to 95%.

A preparation method of a moisturizing type facial mask capable of removing heavy metal residues, comprising the following steps:

Step 1: In deionized water, add egg white essence and cucumber essence, stir evenly at room temperature;

Step 2: Add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and continue to stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: Vacuum defoaming the obtained mixed solution, and then filter to obtain the facial mask essence;

Step 5: After soaking the discharged mask essence into the sterile mask matrix, perform aseptic packaging to complete the mask production.

Above-mentioned technical scheme, in described step 3, gained mixed solution pH is 6.5.

After adopting above-mentioned technical scheme, the present invention has following positive effect:

(1) The present invention contains sodium alginate-sodium polyacrylate/sepiolite hydrogel, which can effectively remove copper ions, lead ions, chromium ions, manganese ions, zinc ions remaining on the face such as air and cosmetics through chemical adsorption. Ion, nickel ion, barium ion, tungsten ion and other heavy metal ions can better clean the skin, safe and reliable; at the same time, the main component of the mask is hydrogel, and there are also butanediol, nicotinamide, propylene glycol and other ingredients can be better It locks in moisture and achieves the purpose of moisturizing and hydrating.

(2) The pH of the facial mask essence of the present invention is 6.5, which is a weak acid close to neutral, and is similar to the weak acid pH of human skin. This type of facial mask is used for ultra-gentle skin care, and it is not easy to cause adverse effects such as sensitivity;

(3) The preparation process of the present invention is simple, the preparation conditions are mild, the manufacturing cost is low, and the components used are mild and non-irritating, have no adverse side effects on the skin, and are safer and more reliable.

Description of drawings

In order to make the content of the present invention easier to understand clearly, the present invention will be described in further detail below according to specific embodiments and in conjunction with the accompanying drawings, wherein

Figure 1. The removal rate of various metal ions by the product of the present invention.

Detailed ways

Example 1

The present invention has a cleansing and moisturizing type mask that can remove heavy metal residues, and the total amount is 100 parts, including: 8-10 parts of sodium alginate-sodium polyacrylate/sepiolite hydrogel, 3-5 parts of egg white essence 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of niacinamide, 1-3 parts of sodium hyaluronate, 3-8 parts of propylene glycol, the rest are deionized water and the rest are deionized water .

Include the following steps:

Step 1: In deionized water, add egg white essence and cucumber essence, stir evenly at room temperature;

Step 2: Add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and continue to stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly, and keep PH=6.5;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

A kind of moisturizing type facial mask that can remove heavy metal residues proposed in the present invention is as follows first with regard to specific embodiments:

Table 1 Effects of different component contents (parts by weight) in the facial mask essence on the adsorption rate of copper ions in the experimental skin

Program Sodium alginate-sodium polyacrylate/sepiolite hydrogel (%) Egg white essence (%) Cucumber Essence (%) Butanediol (%) Nicotinamide(%) Sodium hyaluronate(%) Propylene glycol (%) Deionized water(%) Copper ion removal rate (%) Invention Example 1 8 3 7 5 4 1 8 64 95.3 Invention Example 2 8 4 6 7 3 3 7 62 95.4 Invention Example 3 9 5 8 3 5 2 5 63 95.6 Invention Example 4 9 3 7 6 3 3 6 63 95.5 Invention Example 5 10 4 6 4 4 2 3 67 95.9 Invention Example 6 10 5 8 8 5 1 6 57 96.0 Comparative example 0 5 8 7 5 3 8 64 80

As can be seen from the above table, when the comparative example does not contain sodium alginate-sodium polyacrylate/sepiolite hydrogel, the removal rate of residual copper ions is significantly lower than that of other invention examples containing 8-10 parts of sodium alginate-sodium polyacrylate The copper ion removal rate of the /sepiolite hydrogel shows that the sodium alginate-sodium polyacrylate/sepiolite hydrogel has a good removal effect on the heavy metal ions remaining in the skin, which can better clean the skin.

Example 2

The removal rate of copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions, and tungsten ions in the experimental skin was tested by using the facial mask essence of the invention example 5 in Example 1. The specific plan is as follows

Scheme 1: Copper ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing residual copper ions, and the copper ion removal rate was tested, and the copper ion removal rate was measured to be 96%.

Option 2: Lead ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing lead ion residues, and the lead ion removal rate was tested, and the lead ion removal rate was measured to be 98%.

Scheme 3: Chromium ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The obtained mask was applied on the experimental skin containing residual chromium ions, and the chromium ion removal rate was tested, and the chromium ion removal rate was measured to be 96.5%.

Scheme 4: Manganese ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The obtained mask was applied on the experimental skin containing residual manganese ions, and the manganese ion removal rate was tested, and the manganese ion removal rate was measured to be 97%.

Scheme 5: Zinc ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence, cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing residual zinc ions, and the zinc ion removal rate was tested, and the zinc ion removal rate was measured to be 97%.

Scheme 6: Nickel ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing residual nickel ions, and the nickel ion removal rate was tested, and the nickel ion removal rate was measured to be 97.5%.

Scheme 7: Barium ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence, cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing residual barium ions, and the barium ion removal rate was tested, and the barium ion removal rate was measured to be 96%.

Scheme 8: Tungsten ion removal rate test

Follow the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir well;

Step 2: add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and stir evenly;

Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly;

Step 4: The obtained mixed solution is vacuum defoamed, and then filtered to obtain the facial mask essence.

Step 5: After soaking the discharged mask essence into the non-woven sterile cloth mask cloth, perform aseptic packaging to complete the mask production.

The prepared mask was applied on the experimental skin containing tungsten ion residues, and the removal rate of tungsten ions was tested, and the removal rate of tungsten ions was measured to be 96.5%.

The removal rate of each heavy metal ion is tested by using the cleaning and moisturizing facial mask that can remove heavy metal residues of the present invention. The test results are shown in Figure 1. 98% ion, 96.5% chromium ion, 97% manganese ion, 97% zinc ion, 97.5% nickel ion, 96% barium ion, 96.5% tungsten ion.

The specific embodiments described above further describe the purpose, technical solutions and beneficial effects of the present invention in further detail. It should be understood that the above descriptions are only specific embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (6)

1. a moisturizing type facial mask that can remove heavy metal residues; comprise facial mask matrix and facial mask essence, it is characterized in that: described facial mask essence, by weight, comprises: sodium alginate-sodium polyacrylate/sepiolite hydrogel 8-10 parts, egg white essence 3-5 parts, cucumber essence 6-8 parts, butanediol 3-8 parts, niacinamide 3-5 parts, sodium hyaluronate 1-3 parts, propylene glycol 3-8 parts part, the rest is deionized water. 2. The moisturizing type facial mask capable of removing heavy metal residues as claimed in claim 1, wherein the facial mask substrate is facial mask paper, and the material of the facial mask paper is silk, polyester, cotton, blended and biological fibers. 3. The moisturizing facial mask that can remove heavy metal residues according to claim 1, wherein the heavy metal ions that can be removed by the moisturizing facial mask include: copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions ions, barium ions, tungsten ions. 4. The moisturizing type facial mask that can remove heavy metal residues as claimed in claim 1, is characterized in that: described moisturizing type facial mask facial residual heavy metal removal rate≥95%. 5. the preparation method of the moisturizing type facial mask that can remove heavy metal residue as described in any one of claim 1～4, it is characterized in that: comprise the steps: Step 1: In deionized water, add egg white essence and cucumber essence, stir evenly at room temperature; Step 2: Add sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate to the liquid obtained in step 1, and continue to stir evenly; Step 3: Add propylene glycol, nicotinamide and butanediol to the liquid obtained in step 2, fully mix and stir evenly; Step 4: Vacuum defoaming the obtained mixed solution, and then filter to obtain the facial mask essence; Step 5: After soaking the discharged mask essence into the sterile mask matrix, perform aseptic packaging to complete the mask production. 6. The preparation method of the moisturizing type facial mask that can remove heavy metal residues as claimed in claim 5, it is characterized in that: in described step 3, gained mixed solution pH is 6.5.

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