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CN111946897A - A thin film deformation microfluidic device - Google Patents

A thin film deformation microfluidic device Download PDF

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CN111946897A
CN111946897A CN202010489188.6A CN202010489188A CN111946897A CN 111946897 A CN111946897 A CN 111946897A CN 202010489188 A CN202010489188 A CN 202010489188A CN 111946897 A CN111946897 A CN 111946897A
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flow resistance
thin film
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CN111946897B (en
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倪中华
项楠
蒋丰韬
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Southeast University
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00Subject matter not provided for in other groups of this subclass
    • F16K99/0001Microvalves
    • F16K99/0003Constructional types of microvalves; Details of the cutting-off member
    • F16K99/0015Diaphragm or membrane valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00Construction of housing; Use of materials therefor
    • F16K27/02Construction of housing; Use of materials therefor of lift valves
    • F16K27/0236Diaphragm cut-off apparatus
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00Subject matter not provided for in other groups of this subclass
    • F16K99/0001Microvalves
    • F16K99/0034Operating means specially adapted for microvalves
    • F16K99/0055Operating means specially adapted for microvalves actuated by fluids

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Abstract

本发明公开了一种薄膜变形微流控器件,包括上夹具、下夹具,上夹具、下夹具之间安装有薄膜变形单元,薄膜变形单元由流体控制层、薄膜变形层、流体流阻层和流体出口层堆叠而成,流体控制层上设有第一流体通道和中心流体挤压腔室,薄膜变形层上设有第二流体通道,流体流阻层设有第三流体通道和中心流阻调节腔室,流体出口层上设有流体出口通道,第一流体通道经第二流体通道贯通至第三流体通道,上夹具上设置有流体进样接口和流体进样通道,下夹具底部中心设有流体出口。该器件能够通过薄膜变形,进行流量自调节,实现不稳定流体输入,稳定流速输出,器件结构精准,应对不同的精准样品输出需求,成本低、操作简单、易集成微型化。

Figure 202010489188

The invention discloses a thin film deformation microfluidic device, comprising an upper clamp and a lower clamp, a film deformation unit is installed between the upper clamp and the lower clamp, and the film deformation unit is composed of a fluid control layer, a film deformation layer, a fluid flow resistance layer and a The fluid outlet layer is stacked, the fluid control layer is provided with a first fluid channel and a central fluid extrusion chamber, the film deformation layer is provided with a second fluid channel, and the fluid flow resistance layer is provided with a third fluid channel and a central flow resistance The adjustment chamber, the fluid outlet layer is provided with a fluid outlet channel, the first fluid channel is connected to the third fluid channel through the second fluid channel, the upper fixture is provided with a fluid sampling interface and a fluid sampling channel, and the center of the bottom of the lower fixture is provided with There is a fluid outlet. The device can self-regulate the flow rate through film deformation, realize unstable fluid input, stable flow rate output, precise device structure, and can meet different precise sample output requirements, with low cost, simple operation, and easy integration and miniaturization.

Figure 202010489188

Description

一种薄膜变形微流控器件A thin film deformation microfluidic device

技术领域technical field

本发明涉及一种微流控器件,更具体地,涉及一种薄膜变形微流控器件。The present invention relates to a microfluidic device, more particularly, to a thin film deformation microfluidic device.

背景技术Background technique

微阀在微流控应用中有着至关重要,许多具有不同结构和功能的微流控阀被开发应用于芯片上器件,根据微阀的工作原理,微阀可分为主动型和被动型两种。主动阀通常使用外部执行机构,能够精确控制液体,因此在微流体器件的大规模集成中,主动阀具有高度的兼容性,但外部的执行器件同时也增加了阀门控制系统的复杂性,不适合复杂系统的真正微型化。而被动阀在微流控系统中能够有效控制流量,其不需要复杂的执行器,因此被动阀能够用于低成本和便携式微流控应用。被动阀包括毛细管被动阀和薄膜变形阀,由于毛细力依赖于液体分子的粘聚力和液体与微通道之间的粘附力,因此通过调节微流体结构的表面疏水性,可以调节液体流速,但由于毛细力而引起的流量相对较低,只能在有限的时间内应用,此外,毛细管力通常不稳定,这也限制了其在生化分析中的应用;而薄膜变形阀主要通过改变微通道的流动阻力来调节流量。薄膜阀通常由两个通道组成,其中包括流路通道和控制通道,这两个通道由一个弹性薄膜隔开。当液体同时进入流路通道和控制通道时,控制通道施加压力使膜变形,从而改变流路通道的流阻来调节流量,但其依然存在微阀的重复使用性较差,流量波动较大的问题。Microvalves are very important in microfluidic applications. Many microfluidic valves with different structures and functions have been developed and applied to on-chip devices. According to the working principle of microvalves, microvalves can be divided into two types: active and passive. kind. Active valves usually use external actuators, which can precisely control liquids. Therefore, in the large-scale integration of microfluidic devices, active valves have a high degree of compatibility, but external actuators also increase the complexity of the valve control system and are not suitable for True miniaturization of complex systems. While passive valves can effectively control flow in microfluidic systems, which do not require complex actuators, passive valves can be used in low-cost and portable microfluidic applications. Passive valves include capillary passive valves and membrane deformation valves. Since the capillary force depends on the cohesion of liquid molecules and the adhesion between the liquid and the microchannel, the liquid flow rate can be adjusted by adjusting the surface hydrophobicity of the microfluidic structure, However, the flow rate due to capillary force is relatively low and can only be applied for a limited time. In addition, capillary force is usually unstable, which also limits its application in biochemical analysis; while the membrane deformation valve mainly works by changing the microchannel flow resistance to adjust the flow. A membrane valve usually consists of two channels, including a flow channel and a control channel, separated by an elastic membrane. When the liquid enters the flow channel and the control channel at the same time, the control channel exerts pressure to deform the membrane, thereby changing the flow resistance of the flow channel to adjust the flow rate, but it still has the problem of poor reusability of the micro valve and large flow fluctuation. question.

发明内容SUMMARY OF THE INVENTION

发明目的:本发明的目的是提供一种能够实现不稳定流体输入、稳定流速输出、流量自调节的薄膜变形微流控器件。Purpose of the invention: The purpose of the present invention is to provide a thin-film deformation microfluidic device capable of realizing unstable fluid input, stable flow rate output, and flow self-regulation.

技术方案:本发明所述一种薄膜变形微流控器件,包括上夹具、下夹具,上夹具、下夹具之间安装有薄膜变形单元,薄膜变形单元由流体控制层、薄膜变形层、流体流阻层和流体出口层堆叠而成,流体控制层上设有第一流体通道和中心流体挤压腔室,薄膜变形层上设有第二流体通道,流体流阻层设有第三流体通道和中心流阻调节腔室,流体出口层上设有流体出口通道,第一流体通道经第二流体通道贯通至第三流体通道,上夹具上设置有流体进样接口和流体进样通道,下夹具底部中心设有流体出口。Technical scheme: The thin film deformation microfluidic device described in the present invention includes an upper clamp and a lower clamp, and a film deformation unit is installed between the upper clamp and the lower clamp, and the film deformation unit is composed of a fluid control layer, a film deformation layer, a fluid flow The resistance layer and the fluid outlet layer are stacked, the fluid control layer is provided with a first fluid channel and a central fluid extrusion chamber, the film deformation layer is provided with a second fluid channel, and the fluid flow resistance layer is provided with a third fluid channel and The central flow resistance adjustment chamber, the fluid outlet layer is provided with a fluid outlet channel, the first fluid channel passes through the second fluid channel to the third fluid channel, the upper fixture is provided with a fluid sampling interface and a fluid sampling channel, and the lower fixture is provided with There is a fluid outlet in the center of the bottom.

其中,薄膜变形层厚度为10~50μm,流体控制层厚度为200±50μm,所述流体流阻层厚度为125±25μm;上夹具与薄膜变形单元顶层之间设置有高度为 200-500μm的流体挤压腔室;第一流体通道、第二流体通道和第三流体通道呈环形阵列排布,第三流体通道通向中心流阻调节腔室,中心流阻调节腔室为直径为 0.5~1.7mm、高度为25~200μm的圆柱体空腔,流体出口通道直径为0.1-1mm,注入液体后,在薄膜变形层的挤压下,与出口之间的体积减小,从而增加整体器件流阻,流体出口通道小于中心流阻调节腔室,其与中心流阻调节腔室和薄膜变形层互相配合,形成流阻的变化负反馈体系;流体进样接口与注射器之间进行过盈配合,实现快速安装以及流体快速进样;上夹具上设置有环形阻隔块,环形阻隔块与下夹具上设置的环形密封块将流体控制层进行固定、密封;流体控制层和流体流阻层为硅胶或任意一种能与PDMS或PEGDA键合的材料,薄膜变形层为 PDMS或PEGDA,流体出口层材料为硅胶或任意一种能与硅胶键合的薄膜材料,流体控制层、薄膜变形层、流体流阻层和流体出口层通过等离子清洗方法键合成为一个整体,通过等离子清洗机,将流体控制层、薄膜变形层、流体流阻层和流体出口层表面暴露在氧等离子体中,并使其表面CH3和CH2官能团耗尽,同时使其表面硅醇Si-OH基团富集,当两个键合表面相互接触时,相对表面上的硅醇基团发生缩合反应,在这些表面之间形成永久键合;流体控制层、薄膜变形层、流体流阻层和流体出口层通过激光加工出所需结构;上夹具、下夹具为工程塑料、光敏树脂、橡胶材料、金属材料、陶瓷材料通过3D打印制得,材料能够承受薄膜夹紧所需夹紧力。The thickness of the film deformation layer is 10-50 μm, the thickness of the fluid control layer is 200±50 μm, and the thickness of the fluid flow resistance layer is 125±25 μm; a fluid with a height of 200-500 μm is arranged between the upper clamp and the top layer of the film deformation unit The extrusion chamber; the first fluid channel, the second fluid channel and the third fluid channel are arranged in an annular array, the third fluid channel leads to the central flow resistance adjustment chamber, and the central flow resistance adjustment chamber is 0.5-1.7 in diameter mm, a cylindrical cavity with a height of 25-200 μm, and the diameter of the fluid outlet channel is 0.1-1 mm. After the liquid is injected, under the extrusion of the film deformation layer, the volume between the outlet and the outlet decreases, thereby increasing the overall device flow resistance. , the fluid outlet channel is smaller than the central flow resistance adjustment chamber, which cooperates with the central flow resistance adjustment chamber and the film deformation layer to form a negative feedback system for the change of flow resistance; Fast installation and fast fluid injection; an annular blocking block is set on the upper fixture, and the annular blocking block and the annular sealing block set on the lower fixture fix and seal the fluid control layer; the fluid control layer and the fluid flow resistance layer are silica gel or any A material that can bond with PDMS or PEGDA, the film deformation layer is PDMS or PEGDA, the fluid outlet layer material is silica gel or any film material that can bond with silica gel, fluid control layer, film deformation layer, fluid flow resistance The layer and the fluid outlet layer are bonded into a whole by a plasma cleaning method, and the surfaces of the fluid control layer, the thin film deformation layer, the fluid flow resistance layer and the fluid outlet layer are exposed to the oxygen plasma by a plasma cleaning machine, and their surfaces are CH 3 and CH2 functional groups are depleted while enriching their surfaces with silanol Si-OH groups, and when the two bonding surfaces contact each other, the silanol groups on the opposite surfaces undergo a condensation reaction, forming between these surfaces Permanent bonding; the fluid control layer, film deformation layer, fluid flow resistance layer and fluid outlet layer are processed by laser to obtain the required structure; the upper and lower fixtures are engineering plastics, photosensitive resins, rubber materials, metal materials, and ceramic materials through 3D The printed material is able to withstand the clamping force required for film clamping.

工作原理:通过注射器将流体输入器件,流体经流体进样接口和流体进样通道进入上夹具与薄膜变形层之间的流体挤压腔室,此时,薄膜变形单元上表面存在压力,命名为Pt;当流体经薄膜变形单元的第二流体通道进入中心流阻调节腔室时,由伯努利方程可知,此时薄膜变形单元的薄膜变形层下方压力Pd小于Pt,由于薄膜变形层上下压力差,导致薄膜变形层向下凹陷;由于薄膜变形层下方的中心流阻调节腔室空腔体积减小,其流阻同时相应增大,从而导致该处流速减小,薄膜变形层下方压力Pd增大,形成流体压力与器件流阻之间的负反馈体系,并且该体系将导致流速控制在极小的波动范围,因此实现流量稳定的输出。Working principle: The fluid is input into the device through a syringe, and the fluid enters the fluid extrusion chamber between the upper fixture and the film deformation layer through the fluid injection interface and the fluid injection channel. At this time, there is pressure on the upper surface of the film deformation unit, which is named as P t ; when the fluid enters the central flow resistance adjustment chamber through the second fluid channel of the membrane deformation unit, it can be known from Bernoulli’s equation that the pressure P d under the membrane deformation layer of the membrane deformation unit is smaller than P t , because the membrane deformation The pressure difference between the upper and lower layers of the film causes the film deformation layer to sag downward; because the volume of the central flow resistance adjustment chamber below the film deformation layer decreases, its flow resistance increases correspondingly, resulting in a decrease in the flow velocity there, and the film deformation layer The lower pressure P d increases, forming a negative feedback system between the fluid pressure and the flow resistance of the device, and this system will cause the flow rate to be controlled within a very small fluctuation range, thus achieving a stable flow output.

有益效果:本发明与现有技术相比,其显著优点是:1、能够通过薄膜变形,动态改变器件整体流阻,进行流量自调节,实现不稳定流体输入,稳定流速输出; 2、利用激光加工、键合工艺和3D打印方法,使得到的器件结构精准,能够应对不同的精准样品输出需求;3、成本低、操作简单、易集成微型化。Beneficial effects: Compared with the prior art, the present invention has the following significant advantages: 1. It can dynamically change the overall flow resistance of the device through the deformation of the film, carry out self-regulation of the flow, and realize the input of unstable fluid and the output of stable flow rate; 2. The use of laser The processing, bonding process and 3D printing method make the obtained device structure accurate and can meet different precise sample output requirements; 3. Low cost, simple operation, easy integration and miniaturization.

附图说明Description of drawings

图1是本发明立体图;Fig. 1 is the perspective view of the present invention;

图2是本发明半剖结构示意图;Fig. 2 is the half-section structure schematic diagram of the present invention;

图3是上夹具结构示意图;Fig. 3 is a schematic diagram of the structure of the upper clamp;

图4是薄膜变形单元结构示意图;Fig. 4 is a schematic diagram of the structure of the film deformation unit;

图5是下夹具结构示意图;Fig. 5 is the structural representation of lower clamp;

图6是流体实体分布图;Fig. 6 is the distribution diagram of fluid entity;

图7是流场仿真结果;Figure 7 is the flow field simulation result;

图8是流场仿真流量输出与压力输入之间关系图。Figure 8 is a diagram showing the relationship between flow field simulation flow output and pressure input.

具体实施方式Detailed ways

实施例1Example 1

如图1、图2所示,薄膜变形微流控器件包括上夹具9、下夹具10,所述上夹具9、下夹具10之间安装有薄膜变形单元5,如图4所示,薄膜变形单元5 由厚度为200μm的流体控制层11、厚度为30μm的薄膜变形层12、厚度为150μm 的流体流阻层13和厚度为150μm的流体出口层14堆叠而成,流体控制层11上设有8个环形阵列排布的第一流体通道15和中心流体挤压腔室,薄膜变形层12 上设有8个环形阵列排布的第二流体通道16,流体流阻层13设有8个环形阵列排布的第三流体通道17,并通入中心流阻调节腔室7,流体出口层14上设有流体出口通道18,中心流阻调节腔室7为一直径为1.5mm的圆柱体空腔,高度为 120μm,流体出口通道18直径为0.5mm,第一流体通道15经第二流体通道16 贯通至第三流体通道17,如图3所示,上夹具9上设置有流体进样接口1和流体进样通道2,流体进样接口1内径为1.2mm,与20mL注射器外径相近,流体进样接口1与注射器过盈配合,下夹具10底部中心设有流体出口8,上夹具9 与薄膜变形单元5顶层之间设置有高度为300μm的流体挤压腔室3,如图3、图 5所示,上夹具9上设置有环形阻隔块4,环形阻隔块4与下夹具10上设置的环形密封块6将流体控制层11进行固定、密封,如图6所示,流体通过注射器注射入流体进样接口1,流体经流体进样接口1和流体进样通道2进入上夹具9与薄膜变形层12之间的流体挤压腔室3,部分液体经过环形阵列的8个第二流体通道16和第三流体通道17并进入薄膜变形层12下方的中心流阻调节腔室7,部分流体与薄膜变形层12相接触,此时,薄膜变形单元12上表面存在压力,命名为Pt;当流体经薄膜变形单元12的第二流体通道16进入中心流阻调节腔室时,由伯努利方程可知,此时薄膜变形单元5的薄膜变形层12下方压力Pd小于Pt,由于薄膜变形层12上下压力差,导致薄膜变形层12向下凹陷;由于薄膜变形层 12下方的中心流阻调节腔室7空腔体积减小,其流阻同时相应增大,从而导致该处流速减小,薄膜变形层12下方压力Pd增大,形成流体压力与器件流阻之间的负反馈体系,并且该体系将导致流速控制在极小的波动范围,因此实现流量稳定的输出,流场仿真结果如图7所示,流体挤压腔室3和流阻调节腔室7的压力差将导致薄膜变形层12发生向下的凹陷;流量自调节过程。如图8所示,通过 comsol仿真得到该尺寸下流量输出Q与压力输入P之间关系,从图中可知,当输入压力在300-500Pa之间时,其流量稳定在2.22±0.04×10-6 m2/s;流量调节微阀的尺寸设计参数通过以下公式定性描述:As shown in FIG. 1 and FIG. 2 , the thin film deformation microfluidic device includes an upper clamp 9 and a lower clamp 10, and a film deformation unit 5 is installed between the upper clamp 9 and the lower clamp 10. As shown in FIG. 4, the film deforms Unit 5 is formed by stacking a fluid control layer 11 with a thickness of 200 μm, a thin film deformation layer 12 with a thickness of 30 μm, a fluid flow resistance layer 13 with a thickness of 150 μm, and a fluid outlet layer 14 with a thickness of 150 μm. 8 first fluid channels 15 arranged in an annular array and a central fluid extrusion chamber, 8 second fluid channels 16 arranged in an annular array are arranged on the film deformation layer 12, and 8 annular arrays are arranged on the fluid flow resistance layer 13. The third fluid channel 17 arranged in an array leads to the central flow resistance adjustment chamber 7, the fluid outlet layer 14 is provided with a fluid outlet channel 18, and the central flow resistance adjustment chamber 7 is a cylindrical hollow with a diameter of 1.5mm. The cavity, the height is 120 μm, the diameter of the fluid outlet channel 18 is 0.5 mm, the first fluid channel 15 is connected to the third fluid channel 17 through the second fluid channel 16, as shown in FIG. 3, the upper fixture 9 is provided with a fluid sampling interface 1 and fluid injection channel 2, the inner diameter of the fluid injection interface 1 is 1.2mm, which is similar to the outer diameter of a 20mL syringe, the fluid injection interface 1 is an interference fit with the syringe, the bottom center of the lower fixture 10 is provided with a fluid outlet 8, and the upper fixture 9 A fluid extrusion chamber 3 with a height of 300 μm is arranged between it and the top layer of the film deformation unit 5. As shown in FIG. 3 and FIG. The set annular sealing block 6 fixes and seals the fluid control layer 11. As shown in FIG. 6, the fluid is injected into the fluid sampling interface 1 through a syringe, and the fluid enters the upper fixture 9 through the fluid sampling interface 1 and the fluid sampling channel 2. The fluid between the film deformation layer 12 squeezes the chamber 3, and part of the liquid passes through the eight second fluid channels 16 and the third fluid channel 17 in the annular array and enters the central flow resistance adjustment chamber 7 under the film deformation layer 12, Part of the fluid is in contact with the film deformation layer 12. At this time, there is pressure on the upper surface of the film deformation unit 12, which is named P t ; when the fluid enters the central flow resistance adjustment chamber through the second fluid channel 16 of the film deformation unit 12, it is Bernoulli equation shows that the pressure P d under the film deformation layer 12 of the film deformation unit 5 is smaller than P t at this time. Due to the pressure difference between the upper and lower layers of the film deformation layer 12 , the film deformation layer 12 is dented downward; The volume of the cavity of the central flow resistance adjustment chamber 7 decreases, and its flow resistance increases correspondingly at the same time, resulting in a decrease in the flow velocity there, and an increase in the pressure P d under the film deformation layer 12, forming a gap between the fluid pressure and the flow resistance of the device. Negative feedback system, and this system will cause the flow rate to be controlled in a very small fluctuation range, thus achieving a stable output of the flow. The flow field simulation results are shown in Figure 7. The fluid squeezes the pressure of the chamber 3 and the flow resistance adjustment chamber 7. The difference will result in the downward depression of the film deformation layer 12; the flow rate self-regulating process. As shown in Figure 8, the relationship between the flow output Q and the pressure input P under this size is obtained through comsol simulation. It can be seen from the figure that when the input pressure is between 300-500Pa , the flow rate is stable at 2.22±0.04×10- 6 m 2 /s; the dimensional design parameters of the flow regulating microvalve are qualitatively described by the following formula:

Figure RE-GDA0002703032610000041
Figure RE-GDA0002703032610000041

其中,R为微阀整体流阻,dcontrol为中心流阻调节腔室7的圆柱体直径;h 为中心流阻调节腔室7高度;t为薄膜变形层12厚度;dout为流体出口通道18 直径;本实施例的输入压力范围在300-500Pa。Among them, R is the overall flow resistance of the micro-valve, d control is the cylinder diameter of the central flow resistance adjustment chamber 7; h is the height of the central flow resistance adjustment chamber 7; t is the thickness of the thin film deformation layer 12; d out is the fluid outlet channel 18 diameter; the input pressure range of this embodiment is 300-500Pa.

实施例2Example 2

本实施例与实施例1不同的是:中心流阻调节腔室7的圆柱体直径为300μm、高度为50μm,薄膜变形层12厚度为20μm,流体出口通道18直径为100μm,其输入压力范围为100kPa±20kPa,其流量输出为6.6629×10-8 m2/s。The difference between this embodiment and Embodiment 1 is that the diameter of the cylinder of the central flow resistance adjusting chamber 7 is 300 μm and the height is 50 μm, the thickness of the film deformation layer 12 is 20 μm, the diameter of the fluid outlet channel 18 is 100 μm, and the input pressure range is 100kPa±20kPa, its flow output is 6.6629×10 -8 m 2 /s.

Claims (9)

1. The film deformation microfluidic device is characterized by comprising an upper clamp (9) and a lower clamp (10), wherein a film deformation unit (5) is installed between the upper clamp (9) and the lower clamp (10), the film deformation unit (5) is formed by stacking a fluid control layer (11), a film deformation layer (12), a fluid flow resistance layer (13) and a fluid outlet layer (14), a first fluid channel (15) and a central fluid extrusion chamber are arranged on the fluid control layer (11), a second fluid channel (16) is arranged on the film deformation layer (12), the fluid flow resistance layer (13) is provided with a third fluid channel (17) and a central fluid resistance regulation chamber (7), a fluid outlet channel (18) is arranged on the fluid outlet layer (14), the first fluid channel (15) is communicated to the third fluid channel (17) through the second fluid channel (16), the upper clamp (9) is provided with a fluid sample inlet interface (1) and a fluid sample inlet channel (2), and the center of the bottom of the lower clamp (10) is provided with a fluid outlet (8).
2. The thin film deforming microfluidic device of claim 1, wherein the thin film deforming layer (12) has a thickness of 10 to 50 μm, the fluid control layer (11) has a thickness of 200 ± 50 μm, and the fluid flow resistance layer (13) and the fluid outlet layer (14) have a thickness of 125 ± 25 μm.
3. A thin film deforming microfluidic device according to claim 1 or 2, characterized in that a fluid squeezing chamber (3) with a height of 200-500 μm is provided between the upper clamp (9) and the top layer of the thin film deforming unit (5).
4. The thin film deforming microfluidic device of claim 1, wherein the first fluid channel (15), the second fluid channel (16) and the third fluid channel (17) are arranged in an annular array, the third fluid channel (17) leads to a central flow resistance adjusting chamber (7), the central flow resistance adjusting chamber (7) is a cylindrical cavity with a diameter of 0.5-1.7 mm and a height of 25-200 μm, and the fluid outlet channel (18) has a diameter of 0.1-1 mm.
5. The thin film deforming microfluidic device according to claim 1, wherein an annular blocking block (4) is disposed on the upper fixture (9), and the fluid control layer (11) is fixed and sealed by the annular blocking block (4) and an annular sealing block (6) disposed on the lower fixture (10).
6. The thin film deforming microfluidic device of claim 1, wherein the fluid sample inlet interface (1) is an interference fit with a syringe interface.
7. The thin film deformation microfluidic device according to claim 1, wherein the fluid control layer (11) and the fluid flow resistance layer (13) are silicone or any material capable of bonding with PDMS or PEGDA, the thin film deformation layer (12) is PDMS or PEGDA, the fluid outlet layer (14) is silicone or any material capable of bonding with silicone, and the fluid control layer (11), the thin film deformation layer (12), the fluid flow resistance layer (13) and the fluid outlet layer (14) are bonded into a whole by a plasma cleaning method.
8. Thin-film deforming microfluidic device according to claim 1 or 7, characterized in that the fluid control layer (11), the thin-film deforming layer (12), the fluid flow resistance layer (13) and the fluid outlet layer (14) are laser machined to the desired configuration.
9. The thin film deforming microfluidic device according to claim 1, wherein the upper and lower clamps (9, 10) are made of engineering plastics, photosensitive resins, rubber materials, metal materials, and ceramic materials by 3D printing.
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