CN111673259B - Split type electron beam deflection yoke and electron beam apparatus - Google Patents
Split type electron beam deflection yoke and electron beam apparatus Download PDFInfo
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- CN111673259B CN111673259B CN202010670316.7A CN202010670316A CN111673259B CN 111673259 B CN111673259 B CN 111673259B CN 202010670316 A CN202010670316 A CN 202010670316A CN 111673259 B CN111673259 B CN 111673259B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
- B23K15/0013—Positioning or observing workpieces, e.g. with respect to the impact; Aligning, aiming or focusing electronbeams
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
- B23K15/0046—Welding
- B23K15/0053—Seam welding
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Abstract
The application provides a split type electron beam deflection coil and electron beam equipment, and relates to the technical field of electron beam equipment. The split beam deflection yoke comprises two deflection yokes. The deflection coil comprises a coil main body, a first winding component and a second winding component, wherein the first winding component and the second winding component are arranged on the inner side of the coil main body, and are symmetrically arranged with a magnetic field area formed between the first winding component and the second winding component. A first straight line is formed between one of the first winding component and the second winding component, a second straight line is formed between the other of the first winding component and the second winding component, the two coil main bodies are fixedly arranged relatively, the first straight line and the second straight line form an included angle, and the electron beam can sequentially pass through the two magnetic field areas. The application also provides electron beam equipment, which adopts the split type electron beam deflection coil. The split type electron beam deflection coil and the electron beam equipment provided by the application can realize high-frequency large-angle deflection of the electron beam.
Description
Technical Field
The application relates to the technical field of electron beam equipment, in particular to a split type electron beam deflection coil and electron beam equipment.
Background
The electron beam welding has the advantages of high beam source energy density, large depth-to-width ratio of welding seams and the like, and plays an important role in aerospace, ship and nuclear industries. The functions of electron beam back scattering imaging, electron beam splitting, multi-beam flow welding, electron beam image scanning and the like can be realized by controlling the electron beam high-frequency deflection scanning. At present, the common electron beam deflection coil in China adopts a multipole shoe structure, and the twelve pole shoes are the main structure. The X-direction winding and the Y-direction winding are respectively wound on 6 symmetrical pole shoes, and the magnetic field can be changed along the plane direction of the coil by simultaneously changing the current direction of the X-direction and the Y-direction. The magnetic field generated by the twelve pole pieces is more uniform than by a four pole shoe and eight pole shoe structure.
Although the structure of the multiple pole shoes effectively improves the uniformity of the magnetic field in the central area of the deflection coil, the number of turns of the winding on each pole shoe is not excessive due to the fact that the winding is wound on the multiple pole shoes. Too many windings will cause an excessive inductance of the coil and the high frequency characteristics of the deflection coil will be significantly affected. Reducing the number of turns helps to increase the rate of change of the coil current at high frequencies, but results in reduced magnetic induction inside the coil. When the X-direction coil and the Y-direction coil work simultaneously, the magnetic force lines of the coils are close to the selected loop, and the magnetic force lines of the centers of the coils are reduced. When the electron beam passes through the center of the deflection yoke, the purpose of large-angle deflection cannot be achieved.
Disclosure of Invention
The object of the present application includes, for example, providing a split type electron beam deflection yoke capable of achieving the object of having a sufficiently strong magnetic field in the center of the deflection yoke while ensuring that the high frequency characteristics of the deflection yoke are not affected, thereby achieving high frequency large angle deflection of the electron beam.
The application also aims to provide an electron beam device which can realize the purpose that the center of the deflection coil has a strong enough magnetic field while ensuring that the high-frequency characteristic of the deflection coil is not affected, thereby realizing high-frequency and large-angle deflection of the electron beam.
Embodiments of the application may be implemented as follows:
embodiments of the present application provide a split type electron beam deflection yoke for deflection of an electron beam, the split type electron beam deflection yoke comprising at least two deflection yokes.
The deflection coil comprises a coil main body, a first winding component and a second winding component, wherein the coil main body is annular, the first winding component and the second winding component are both arranged on the inner side of the coil main body, the first winding component and the second winding component are symmetrically arranged, and a magnetic field region is formed between the first winding component and the second winding component.
The connecting line between the first winding component and the second winding component on one coil main body forms a first straight line, the connecting line between the first winding component and the second winding component on the other coil main body forms a second straight line, the two coil main bodies are relatively fixedly arranged, the first straight line and the second straight line are arranged in an included angle mode, and the electron beam can sequentially pass through the two magnetic field areas.
Compared with the prior art, the split type electron beam deflection coil provided by the application has the beneficial effects that: through the coil main bodies of the two deflection coils are relatively fixedly arranged, and the electron beam can sequentially pass through the magnetic field areas in the two coil main bodies, the acting force direction acting on the electron beam in the magnetic field areas is related to the connecting line direction of the first winding component and the second winding component in the coil main bodies, and the first straight line and the second straight line are arranged at an included angle, so that the directions of acting force on the electron beam in the two magnetic field areas are different, and deflection in multiple directions of the electron beam can be realized. In addition, since the two deflection coils are independent of each other, the influence of the high frequency characteristic of the deflection coils due to the excessive inductance of the coils can be avoided. In addition, the magnetic field area in each deflection coil can provide enough magnetic field intensity, so that the deflection of the electron beam with a large angle is completed. The purpose that the center of the deflection coil has a strong enough magnetic field is achieved while the high-frequency characteristic of the deflection coil is not affected is achieved, and therefore high-frequency and large-angle deflection of the electron beam is achieved.
Optionally, both coil bodies are annular.
Alternatively, two of the coil bodies are coaxially disposed.
Optionally, the first straight line and the second straight line are perpendicular to each other. The first straight line and the second straight line are arranged to be perpendicular to each other, so that acting forces of the two magnetic field areas on the electron beam are perpendicular to each other, the electron beam can be deflected from two perpendicular directions, and the realization of deflection of the electron beam in multiple directions can be facilitated through the combined action of the acting forces in the two directions.
Optionally, the first winding assembly includes a first deflection pole and two first constraint poles, the first deflection pole and the two first constraint poles are disposed inside the coil body at intervals, and the first deflection pole is located between the two first constraint poles.
The second winding assembly comprises a second deflection pole and two second constraint poles, the second deflection pole and the two second constraint poles are arranged on the inner side of the coil main body at intervals, and the second deflection pole is located between the two second constraint poles.
The first deflection pole and the second deflection pole are symmetrical, and the two first constraint poles and the two second constraint poles are symmetrical.
The constraint poles are arranged on two sides of the deflection pole, and can constrain the magnetic field edges generated by the deflection pole, so that magnetic force lines in the magnetic field area are more uniformly transited, and stable deflection acting force on the electron beam is ensured.
Optionally, the first winding component and the second winding component share a wire, and the wire is sequentially wound on the second constraint pole, the second deflection pole, the second constraint pole, the first deflection pole and the first constraint pole.
The wire winding direction of the wire on the first deflection pole and the two first constraint poles is the same.
The wire winding direction of the wire on the second deflection pole and the two second constraint poles is the same.
The wire is wound on the first deflection electrode and the second deflection electrode in opposite directions.
Optionally, the number of turns of the wire on the first deflection electrode is greater than the number of turns of the wire on the first confinement electrode.
The number of turns of the wire on the second deflection electrode is greater than the number of turns of the wire on the second confinement electrode.
The number of winding turns of the wire on the first constraint electrode is equal to the number of winding turns of the wire on the second constraint electrode, and the number of winding turns of the wire on the first deflection electrode is equal to the number of winding turns of the wire on the second deflection electrode.
Optionally, the first deflection pole extends toward a center of the coil body, and an extending direction of the first confinement pole is parallel to an extending direction of the first deflection pole.
The second deflection pole extends toward the center of the coil body, and the extending direction of the second confinement pole is parallel to the extending direction of the second deflection pole.
Optionally, the cross-sectional area of the first deflection pole is greater than the cross-sectional area of the first confinement pole.
The cross-sectional area of the second deflection pole is greater than the cross-sectional area of the second confinement pole.
The cross-sectional area of the first deflection pole is equal to the cross-sectional area of the second deflection pole.
The cross-sectional area of the first confinement pole is equal to the cross-sectional area of the second confinement pole.
An electron beam apparatus includes a split type electron beam deflection coil. The split electron beam deflection yoke includes at least two deflection yokes.
The deflection coil comprises a coil main body, a first winding component and a second winding component, wherein the coil main body is annular, the first winding component and the second winding component are both arranged on the inner side of the coil main body, the first winding component and the second winding component are symmetrically arranged, and a magnetic field region is formed between the first winding component and the second winding component.
The connecting line between the first winding component and the second winding component on one coil main body forms a first straight line, the connecting line between the first winding component and the second winding component on the other coil main body forms a second straight line, the two coil main bodies are relatively fixedly arranged, the first straight line and the second straight line are arranged in an included angle mode, and the electron beam can sequentially pass through the two magnetic field areas.
The application also provides an electron beam device, which adopts the split type electron beam deflection coil, and the beneficial effects of the split type electron beam deflection coil relative to the prior art are the same as those of the split type electron beam deflection coil, and are not repeated here.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of an electron beam apparatus according to an embodiment of the present application;
FIG. 2 is a top view of the deflection yoke indicated at A in FIG. 1;
fig. 3 is a top view of the deflection yoke indicated by B in fig. 1.
Icon: 1-an electron beam device; 2-focusing coils; 3-a workpiece to be processed; 10-split electron beam deflection yoke; 11-electron beam; 100-deflection coils; 110-coil body; 120-a first winding assembly; 121-a first deflection pole; 122-a first confinement pole; 130-a second winding assembly; 131-a second deflection pole; 132-a second confining electrode; 141-magnetic field region; 142-wires.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present application more apparent, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application, and it is apparent that the described embodiments are some embodiments of the present application, but not all embodiments of the present application. The components of the embodiments of the present application generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the application, as presented in the figures, is not intended to limit the scope of the application, as claimed, but is merely representative of selected embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present application, it should be noted that, if the terms "upper", "lower", "inner", "outer", and the like indicate an azimuth or a positional relationship based on the azimuth or the positional relationship shown in the drawings, or the azimuth or the positional relationship in which the inventive product is conventionally put in use, it is merely for convenience of describing the present application and simplifying the description, and it is not indicated or implied that the apparatus or element referred to must have a specific azimuth, be configured and operated in a specific azimuth, and thus it should not be construed as limiting the present application.
Furthermore, the terms "first," "second," and the like, if any, are used merely for distinguishing between descriptions and not for indicating or implying a relative importance.
It should be noted that the features of the embodiments of the present application may be combined with each other without conflict.
First embodiment
Referring to fig. 1, a split type electron beam deflection yoke 10 is provided in an embodiment of the present application, which is applied to an electron beam apparatus 1 and can provide a deflection force to an electron beam 11 emitted from the electron beam apparatus 1, thereby achieving the purpose of deflection of the electron beam 11. In addition, the split type electron beam deflection coil 10 can realize the purpose that the center of the deflection coil 100 has a sufficiently strong magnetic field while ensuring that the high frequency characteristic of the deflection coil 100 is not affected, thereby realizing the high frequency and large angle deflection of the electron beam 11.
Referring to fig. 1, fig. 2, and fig. 3, the split-type electron beam deflection coil 10 includes at least two deflection coils 100, that is, the split-type electron beam deflection coil 10 may include two deflection coils 100, three deflection coils 100, four deflection coils 100, five deflection coils 100, or more deflection coils 100, and the split-type electron beam deflection coil 10 includes two deflection coils 100 in the embodiment of the present application is described as an example.
In the embodiment of the present application, the two deflection coils 100 are fixedly disposed with respect to each other, and the electron beam 11 emitted from the electron beam apparatus 1 can pass through the two deflection coils 100 in sequence. Wherein, when both deflection coils 100 are energized, deflection force can be provided to the electron beam 11 at the same time, thereby realizing deflection of the electron beam 11; of course, one of the deflection coils 100 may be energized, and deflection of the electron beam 11 may be achieved by providing a deflection force to the electron beam 11 through the one deflection coil 100; in the same way, both deflection coils 100 may not be energized, and the electron beam 11 is not subjected to a deflection force at this time, so that the purpose of directly emitting the electron beam 11 along a straight line is achieved.
It should be noted that, in the embodiment of the present application, each deflection coil 100 is configured to provide a deflection force in one direction to the electron beam 11; that is, when the deflection coil 100 is energized, the deflection coil 100 supplies a deflection force in one direction to the electron beam 11, and when the deflection coil is deenergized, the supply of the deflection force to the electron beam 11 is stopped. In order to achieve the deflection of the electron beam 11 in a plurality of directions within a certain range, the directions of the deflection forces applied by the two deflection coils 100 are different, so that the direction of the resultant force formed by the two deflection forces can be adjusted by adjusting the magnitudes of the two deflection forces, thereby achieving the purpose of deflecting the electron beam 11 to a plurality of angles.
Further, the deflection coil 100 includes a coil body 110, a first winding assembly 120, and a second winding assembly 130. Wherein the coil body 110 has a ring shape, and the first winding assembly 120 and the second winding assembly 130 are disposed inside the coil body 110. The first winding assembly 120 and the second winding assembly 130 are disposed symmetrically to each other, and a magnetic field region 141 is formed between the first winding assembly 120 and the second winding assembly 130. When the first winding assembly 120 and the second winding assembly 130 are energized, a magnetic field is formed in the magnetic field region 141, and one of the first winding assembly 120 and the second winding assembly 130 serves as an S pole and the other serves as an N pole. Wherein the magnetic field lines are directed from the N pole to the S pole. Because the first winding assembly and the second winding assembly are symmetrically arranged, the magnetic field lines in the magnetic field area 141 are approximately directed from one of the first winding assembly 120 and the second winding assembly 130 to the other, and the magnetic force lines are approximately straight lines, so that the purpose of uniform magnetic field of the magnetic field area 141 can be realized. In addition, since the two deflection coils 100 are arranged in a split type, the coil body 110 of each deflection coil 100 can be prevented from having excessive coil windings, so that the influence of excessive inductance in the coil windings on the high-frequency characteristics of the deflection coils 100 can be avoided; and on the premise of avoiding influencing the high-frequency characteristic of the deflection coil 100, the first winding assembly 120 and the second winding assembly 130 can be effectively ensured to have enough coils, so that a stronger deflection magnetic field is formed when the first winding assembly 120 and the second winding assembly 130 are electrified, and the high-frequency large-angle deflection of the electron beam 11 is realized.
In the embodiment of the present application, two coil bodies 110 are fixedly disposed with respect to each other, wherein the connection line between the first winding assembly 120 and the second winding assembly 130 on one of the coil bodies 110 forms a first straight line, and the connection line between the first winding assembly 120 and the second winding assembly 130 on the other coil body 110 forms a second straight line. It should be noted that, the relatively fixed arrangement of the two coil bodies 110 means that the two coil bodies 110 may be connected to the same carrier, so that the two coil bodies 110 are relatively fixed. In addition, the connection between the first winding assembly 120 and the second winding assembly 130 refers to a connection between the center point of the first winding assembly 120 and the center point of the second winding assembly 130; in other words, the first winding assembly 120 and the second winding assembly 130 may be regarded as being arranged at intervals along a straight line, i.e. a connection line of the first winding assembly 120 and the second winding assembly 130. In order to achieve multi-angle deflection of the electron beam 11, in an embodiment of the present application, the first straight line and the second straight line are disposed at an angle such that a deflection force provided to the electron beam 11 by a magnetic field in a magnetic field region 141 formed by the first winding assembly 120 and the second winding assembly 130 on one of the coil bodies 110 is different from a deflection force provided to the electron beam 11 by a magnetic field in a magnetic field region 141 formed by the first winding assembly 120 and the second winding assembly 130 on the other coil body 110. Based on this, when the currents supplied to the two deflection coils 100 are different, the magnetic field strengths formed by the magnetic field areas 141 in the two deflection coils 100 are different, so that the deflection forces acting on the electron beam 11 in the two deflection coils 100 are different, and the resultant direction of the two deflection forces can be adjusted, thereby realizing multi-angle deflection of the electron beam 11. In fig. 1, in the case where neither of the deflection coils 100 is energized, neither deflection coil 100 provides a deflection force to the electron beam 11.
Alternatively, in order to facilitate adjustment of the deflection direction of the electron beam 11, in some embodiments of the present application, the first straight line and the second straight line are perpendicular to each other, that is, the deflection forces provided to the electron beam 11 by the magnetic field regions 141 in the two deflection coils 100 are perpendicular to each other, so that when the magnitude of the deflection force provided to the electron beam 11 by one of the deflection coils 100 is adjusted, there is no component affecting the other deflection force, thereby facilitating control of the deflection direction of the electron beam 11 and facilitating realization of multi-angle deflection of the electron beam 11. Of course, in other embodiments of the present application, other angles may be formed between the first line and the second line, and only the included angle formed between the first line and the second line is required to be satisfied to achieve deflection of the electron beam 11 at multiple angles.
When an included angle of 90 degrees is formed between the first straight line and the second straight line, the first straight line and the second straight line are perpendicular to each other; of course, on this basis, when the angle between the first straight line and the second straight line is slightly deviated from 90 °, the first straight line and the second straight line may be considered to be perpendicular to each other. For example, when the angle between the first straight line and the second straight line deviates from 90 ° by within 5 °, in other words, when the angle between the first straight line and the second straight line is in the range of 85 ° to 95 °, the first straight line and the second straight line may be considered to be perpendicular to each other.
In addition, in the embodiment of the present application, the coil body 110 has a circular ring shape, and the inner side of the coil body 110 also forms an inner circumferential surface extending along a circular path, on which the first winding assembly 120 and the second winding assembly 130 are disposed, and the first winding assembly 120 and the second winding assembly 130 are disposed symmetrically about one of the diameters of the coil body 110 as an axis of symmetry. It should be appreciated that in other embodiments of the present application, the coil body 110 may take other shapes of structures, such as oval, square, or hexagonal.
Further, in order to facilitate the electron beam 11 to pass through the magnetic field areas 141 of the two deflection coils 100 in sequence, in the embodiment of the present application, the two coil bodies 110 are coaxially arranged, so that the electron beam 11 can enter the magnetic field area 141 inside the other coil body 110 after passing through the magnetic field area 141 inside the first coil body 110, thereby enabling the deflection of the electron beam 11.
In the embodiment of the present application, since the first winding assemblies 120 of the two deflection coils 100 are identical in structure, the second winding assemblies 130 of the two deflection coils 100 are identical in structure, the two deflection coils 100 are different in placement orientation such that an included angle is formed between the first straight line and the second straight line. The first winding assembly 120 and the second winding assembly 130 in one of the deflection coils 100 are described below as an example.
The first winding assembly 120 includes a first deflection pole 121 and two first constraint poles 122, the first deflection pole 121 and the two first constraint poles 122 being disposed at a spaced apart interval inside the coil body 110, i.e., the first deflection pole 121 and the two first constraint poles 122 are both disposed on an inner circumferential surface of the coil body 110, and the first deflection pole 121 is located between the two first constraint poles 122. In addition, the second winding assembly 130 includes a second deflection pole 131 and two second constraint poles 132, each of the second deflection pole 131 and the two second constraint poles 132 is disposed inside the coil main body 110, i.e., each of the second deflection pole 131 and the two second constraint poles 132 is disposed at an inner circumferential surface of the coil main body 110, and the second deflection pole 131 is located between the two second constraint poles 132. Further, the first deflection pole 121 and the second deflection pole 131 are symmetrical, and the two first confinement poles 122 and the two second confinement poles 132 are symmetrical.
The first winding assembly 120 and the second winding assembly 130 share a common wire 142, and the wire 142 is wound around the second constrained pole 132, the second deflection pole 131, the second constrained pole 132, the first constrained pole 122, the first deflection pole 121, and the first constrained pole 122 in this order. And, when the wire 142 is energized and current is caused to flow through the second constrained pole 132, the second deflection pole 131, the second constrained pole 132, the first constrained pole 122, the first deflection pole 121, and the first constrained pole 122 in this order, the second deflection pole 131 and the two second constrained poles 132 together form an S-pole, and the first deflection pole 121 and the two first constrained poles 122 together form an N-pole. A magnetic field region 141 is formed between the first deflection pole 121 and the second deflection pole 131 and between the two first confinement poles 122 and the two second confinement poles 132, and when the conductive wire 142 is energized, a magnetic field is formed inside the magnetic field region 141, and the magnetic field lines are directed from the sides of the first deflection pole 121 and the two first confinement poles 122 to the sides of the second deflection pole 131 and the two second confinement poles 132. Due to the arrangement of the two first constraint poles 122, the two first constraint poles 122 generate magnetic fields with the same polarity as the first deflection poles 121 on the premise that the conducting wires 142 are electrified, correspondingly, due to the arrangement of the two second constraint poles 132, the two second constraint poles 132 generate magnetic fields with the same polarity as the second deflection poles 131 on the premise that the conducting wires 142 are electrified, and according to the principle of magnetic homopolar repulsion, the two first constraint poles 122 and the two second constraint poles 132 can obstruct the divergence of the magnetic field edges between the first deflection poles 121 and the second deflection poles 131, so that a relatively uniform regional deflection magnetic field is obtained in the magnetic field area 141, and the stability of the deflection magnetic field acting on the electron beam 11 can be realized. Wherein the arrows in fig. 1 refer to the direction of the current energized in the wire 142.
Further, the wire 142 is wound in the same direction on the first deflection pole 121 and the two first confinement poles 122, so as to ensure that the first deflection pole 121 and the two first confinement poles 122 can generate a magnetic field with the same polarity when the wire 142 is energized. Similarly, the wire 142 is wound in the same direction on the second deflection pole 131 and the two second confinement poles 132 to ensure that the second deflection pole 131 and the two second confinement poles 132 can generate a magnetic field of the same polarity when the wire 142 is energized. In addition, the winding directions of the first deflection pole 121 and the second deflection pole 131 are opposite, so that the first deflection pole 121 and the second deflection pole 131 can form magnetic fields with different polarities when the conducting wire 142 is electrified, and the magnetic fields can be formed through the first deflection pole 121 and the second deflection pole 131; accordingly, the wires 142 on the first and second constraint poles 122, 132 are wound in opposite directions.
In addition, to ensure that first deflection pole 121 and second deflection pole 131 produce a sufficiently strong magnetic field and to avoid first confinement pole 122 and second confinement pole 132 producing an excessively strong magnetic field, in embodiments of the application, the number of turns of wire 142 on first deflection pole 121 is greater than the number of turns of wire 142 on first confinement pole 122; accordingly, the number of turns of wire 142 on second deflection pole 131 is greater than the number of turns of wire 142 on second confinement pole 132. Also, to ensure that a uniform magnetic field is formed between the first deflection pole 121 and the second deflection pole 131, the number of turns of wire 142 on the first deflection pole 121 is equal to the number of turns of wire 142 on the second deflection pole 131; and, the number of turns of wire 142 on first constraint pole 122 is equal to the number of turns of wire 142 on second constraint pole 132. Alternatively, the number of turns on first constraint pole 122 may be set to one fifth of the number of turns on first deflection pole 121, and correspondingly, the number of turns on second constraint pole 132 is set to one fifth of the number of turns on second deflection pole 131; at this time, the first and second confinement poles 122 and 132 can be prevented from generating an excessively strong magnetic field, and at the same time, the first and second confinement poles 122 and 132 can be ensured to generate a magnetic field to confine the edges of the magnetic field generated by the first and second deflection poles 121 and 131, thereby ensuring that the magnetic field region 141 forms a uniform and stable magnetic field.
It should be understood that, in other embodiments, the ratio of the number of windings on the first confining electrode 122 to the number of windings on the first deflection electrode 121 may be set to other values, and similarly, the ratio of the number of windings on the second confining electrode 132 to the number of windings on the second deflection electrode 131 may be set to other values, so long as it is ensured that a sufficiently strong magnetic field is formed between the first deflection electrode 121 and the second deflection electrode 131, and that the magnetic field generated by the first confining electrode 122 and the second confining electrode 132 can realize confining the edge of the magnetic field without affecting the stability of the magnetic field generated between the first deflection electrode 121 and the second deflection electrode 131, so as to realize uniform and stable magnetic field.
In addition, in the embodiment of the present application, the first deflection electrode 121 extends toward the center of the coil body 110, and the extending direction of the first constraint electrode 122 is parallel to the extending direction of the first deflection electrode 121, so that the first constraint electrode 122 can be prevented from affecting the first deflection electrode 121. In addition, the second deflection pole 131 extends toward the center of the coil main body 110, and the extending direction of the second constraint pole 132 is parallel to the extending direction of the second deflection pole 131, so that the second constraint pole 132 can be prevented from affecting the second deflection pole 131.
Alternatively, in an embodiment of the present application, the cross-sectional area of first deflection pole 121 is greater than the cross-sectional area of first confinement pole 122. The cross-sectional area of the first deflection electrode 121 refers to the area of the cross-section of the first deflection electrode 121 taken along a plane perpendicular to the extending direction of the first deflection electrode 121; the cross-sectional area of first constraint pole 122 refers to the area of the cross-section of first constraint pole 122 taken along a plane perpendicular to the direction of extension of first constraint pole 122. The cross-sectional area of second deflection pole 131 is greater than the cross-sectional area of second confinement pole 132. The cross-sectional area of the second deflection electrode 131 refers to the area of the cross-section of the second deflection electrode 131 taken along a plane perpendicular to the extending direction of the second deflection electrode 131; the cross-sectional area of the second constrained pole 132 refers to the area of the cross-section of the second constrained pole 132 taken along a plane perpendicular to the extending direction of the second constrained pole 132. The cross-sectional area of first deflection pole 121 is equal to the cross-sectional area of second deflection pole 131 and the cross-sectional area of first confinement pole 122 is equal to the cross-sectional area of second confinement pole 132. Through the arrangement mode, the first deflection pole 121 and the second deflection pole 131 can be ensured to generate a strong enough magnetic field, so that the magnetic field region 141 can be ensured to have a strong enough magnetic field to realize the deflection of the electron beam 11 at a large angle, the first constraint pole 122 and the second constraint pole 132 are prevented from generating a strong enough magnetic field, and the constraint effect of the first constraint pole 122 and the second constraint pole 132 is ensured, meanwhile, the magnetic field generated by the first deflection pole 121 and the second deflection pole 131 is prevented from being influenced excessively, and the magnetic field in the magnetic field region 141 is ensured to be uniform and stable.
After the wire 142 is wound around the first deflection pole 121, the second deflection pole 131, the first confinement pole 122, and the second confinement pole 132, the wire 142 is led out from the coil main body 110, the wound deflection coil 100 is put into a mold, and an epoxy resin is cast for encapsulation, however, other materials may be used for encapsulation, such as polyurethane potting adhesive or silicone potting adhesive, for example.
In summary, in the split type electron beam deflection yoke 10 provided in the embodiment of the present application, the coil main bodies 110 of the two deflection coils 100 are relatively and fixedly arranged, and the electron beam 11 can sequentially pass through the magnetic field areas 141 in the two coil main bodies 110, and because the acting force direction of the electron beam 11 in the magnetic field areas 141 is related to the connecting line direction of the first winding assembly and the second winding assembly in the coil main body 110, the first straight line and the second straight line form an included angle, the acting force directions of the electron beam 11 in the two magnetic field areas 141 are different, so that the deflection of the electron beam 11 in multiple directions can be realized. In addition, since the two deflection coils 100 are independent of each other, the influence of the high frequency characteristics of the deflection coils 100 due to an excessive coil inductance can be avoided. In addition, it is ensured that the magnetic field region 141 in each deflection yoke 100 provides sufficient magnetic field strength to accomplish a large angle deflection of the electron beam 11. The purpose of realizing a sufficiently strong magnetic field in the center of the deflection coil 100 while ensuring that the high frequency characteristics of the deflection coil 100 are not affected is achieved, thereby realizing high frequency large angle deflection of the electron beam 11.
Second embodiment
Referring to fig. 1, an electron beam apparatus 1 is provided in this embodiment, the electron beam apparatus 1 is used for emitting an electron beam 11 and processing a workpiece 3 to be processed by the electron beam 11, the electron beam apparatus 1 employs a split type electron beam deflection coil 10 provided in the first embodiment, and the electron beam apparatus 1 can achieve the purpose of having a sufficiently strong magnetic field in the center of the deflection coil 100 while ensuring that the high frequency characteristics of the deflection coil 100 are not affected, thereby achieving high frequency and large angle deflection of the electron beam 11.
Further, in the embodiment of the present application, a focusing coil 2 is further provided near the split type electron beam deflection coil 10 for focusing of the electron beam, the focusing coil 2 being coaxially provided with the deflection coil 100 in the split type electron beam deflection coil 10.
The foregoing is merely illustrative of the present application, and the present application is not limited thereto, and any changes or substitutions easily contemplated by those skilled in the art within the scope of the present application should be included in the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (9)
1. A split electron beam deflection yoke for deflection of an electron beam, the split electron beam deflection yoke comprising at least two deflection yokes;
the deflection coil comprises a coil main body, a first winding component and a second winding component, wherein the coil main body is annular, the first winding component and the second winding component are both arranged on the inner side of the coil main body, the first winding component and the second winding component are symmetrically arranged, and a magnetic field region is formed between the first winding component and the second winding component;
the connecting line between the first winding component and the second winding component on one coil main body forms a first straight line, the connecting line between the first winding component and the second winding component on the other coil main body forms a second straight line, the two coil main bodies are coaxially arranged, the first straight line and the second straight line are arranged at an included angle, and the electron beam can sequentially pass through the two magnetic field areas.
2. The split beam deflection coil of claim 1 wherein both coil bodies are annular in shape.
3. The split beam deflection coil of claim 1 wherein the first line and the second line are perpendicular to each other.
4. The split electron beam deflection coil of claim 1 wherein the first winding assembly comprises a first deflection pole and two first confinement poles, the first deflection pole and two first confinement poles being spaced apart inside the coil body with the first deflection pole being located between the two first confinement poles;
the second winding assembly comprises a second deflection pole and two second constraint poles, the second deflection pole and the two second constraint poles are arranged on the inner side of the coil main body at intervals, and the second deflection pole is positioned between the two second constraint poles;
the first deflection pole and the second deflection pole are symmetrical, and the two first constraint poles and the two second constraint poles are symmetrical.
5. The split beam deflection coil of claim 4 wherein the first winding assembly and the second winding assembly share a wire, the wire being wound around the second confining pole, the second deflection pole, the second confining pole, the first deflection pole, and the first confining pole in that order;
the wire winding directions of the wire on the first deflection pole and the two first constraint poles are the same;
the winding directions of the wires on the second deflection electrode and the two second constraint electrodes are the same;
the wire is wound on the first deflection electrode and the second deflection electrode in opposite directions.
6. The split beam deflection coil of claim 5 wherein the wire has a greater number of turns on the first deflection electrode than the wire has on the first constraint electrode;
the number of winding turns of the wire on the second deflection electrode is larger than the number of winding turns of the wire on the second constraint electrode;
the number of winding turns of the wire on the first constraint electrode is equal to the number of winding turns of the wire on the second constraint electrode, and the number of winding turns of the wire on the first deflection electrode is equal to the number of winding turns of the wire on the second deflection electrode.
7. The split electron beam deflection coil of claim 4 wherein the first deflection pole extends toward a center of the coil body, the direction of extension of the first confinement pole being parallel to the direction of extension of the first deflection pole;
the second deflection pole extends toward the center of the coil body, and the extending direction of the second confinement pole is parallel to the extending direction of the second deflection pole.
8. The split electron beam deflection coil of claim 4 wherein a cross-sectional area of the first deflection pole is greater than a cross-sectional area of the first confinement pole;
the cross-sectional area of the second deflection pole is greater than the cross-sectional area of the second confinement pole;
the cross-sectional area of the first deflection pole is equal to the cross-sectional area of the second deflection pole;
the cross-sectional area of the first confinement pole is equal to the cross-sectional area of the second confinement pole.
9. An electron beam apparatus comprising a split beam deflection coil according to any of claims 1-8.
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| CN202010670316.7A CN111673259B (en) | 2020-07-13 | 2020-07-13 | Split type electron beam deflection yoke and electron beam apparatus |
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| CN202010670316.7A CN111673259B (en) | 2020-07-13 | 2020-07-13 | Split type electron beam deflection yoke and electron beam apparatus |
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| CN111673259B true CN111673259B (en) | 2023-10-31 |
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| CN112222592B (en) * | 2020-09-25 | 2022-04-12 | 中国航空制造技术研究院 | Material increase manufacturing method for controlling metal droplet transition by pulse electron beam |
| CN117733305B (en) * | 2024-02-20 | 2024-04-26 | 四川华束科技有限公司 | Sealed-off type electron gun and non-vacuum electron beam welding robot |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6433834A (en) * | 1987-07-28 | 1989-02-03 | Mitsubishi Electric Corp | Electron beam device |
| JPH0389440A (en) * | 1989-08-31 | 1991-04-15 | Nec Corp | Electron beam device having linear source |
| JPH09155565A (en) * | 1995-12-11 | 1997-06-17 | Kanayama Mach Kk | Electron beam welding method and its welding machine |
| CN201207372Y (en) * | 2008-04-28 | 2009-03-11 | 彩虹集团电子股份有限公司 | Annular vertical deflector coil of color kinescope |
| JP2014053113A (en) * | 2012-09-06 | 2014-03-20 | Mitsubishi Electric Corp | Electron beam processing machine, and method of adjusting the same |
| CN105328187A (en) * | 2015-11-21 | 2016-02-17 | 天津清研智束科技有限公司 | Control device and method for achieving wide-range scanning of electron beam and additive manufacturing device |
| CN106825567A (en) * | 2017-01-22 | 2017-06-13 | 清华大学 | The electron beam selective melting increasing material manufacturing equipment compound with electron beam cutting |
| CN206789520U (en) * | 2017-05-03 | 2017-12-22 | 桂林实创真空数控设备有限公司 | High-power wide cut deflection of a beam of electrons scanning means |
| CN212311142U (en) * | 2020-07-13 | 2021-01-08 | 广东省焊接技术研究所（广东省中乌研究院） | Split type electron beam deflection coil and electron beam equipment |
-
2020
- 2020-07-13 CN CN202010670316.7A patent/CN111673259B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6433834A (en) * | 1987-07-28 | 1989-02-03 | Mitsubishi Electric Corp | Electron beam device |
| JPH0389440A (en) * | 1989-08-31 | 1991-04-15 | Nec Corp | Electron beam device having linear source |
| JPH09155565A (en) * | 1995-12-11 | 1997-06-17 | Kanayama Mach Kk | Electron beam welding method and its welding machine |
| CN201207372Y (en) * | 2008-04-28 | 2009-03-11 | 彩虹集团电子股份有限公司 | Annular vertical deflector coil of color kinescope |
| JP2014053113A (en) * | 2012-09-06 | 2014-03-20 | Mitsubishi Electric Corp | Electron beam processing machine, and method of adjusting the same |
| CN105328187A (en) * | 2015-11-21 | 2016-02-17 | 天津清研智束科技有限公司 | Control device and method for achieving wide-range scanning of electron beam and additive manufacturing device |
| CN106825567A (en) * | 2017-01-22 | 2017-06-13 | 清华大学 | The electron beam selective melting increasing material manufacturing equipment compound with electron beam cutting |
| CN206789520U (en) * | 2017-05-03 | 2017-12-22 | 桂林实创真空数控设备有限公司 | High-power wide cut deflection of a beam of electrons scanning means |
| CN212311142U (en) * | 2020-07-13 | 2021-01-08 | 广东省焊接技术研究所（广东省中乌研究院） | Split type electron beam deflection coil and electron beam equipment |
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