CN111504008A - Mask processing device - Google Patents

Abstract

The invention relates to the technical field of mask treatment, in particular to a mask treatment device, which comprises a shell, wherein a mask treatment area is arranged in the shell; the pulse strong light irradiation component comprises a pulse xenon flash tube and a light guide component, and the light guide component enables light rays emitted by the pulse xenon flash tube to emit to the mask processing area; a thermal radiation heating assembly comprising a radiant heat source and a thermal retroreflector to direct heat generated by the radiant heat source to the mask treatment area; the mask processing area is positioned between the electret corona electric field emitting electrode and the electret electric field grounding electrode, and the electret corona electric field emitting electrode comprises a glow plasma discharge needle and an induction electrode which are arranged in a matched mode. The mask treatment device can rapidly dehydrate, disinfect, remove odor and regenerate efficiency of the mask, so that the mask can be safely regenerated and used.

Description

A mask processing device

technical field

The invention relates to the technical field of mask processing, in particular to a mask processing device.

Background technique

The outbreak of new coronary pneumonia has caused a surge in the use of masks, and there is a global shortage of masks. During the effective use period of masks, how to improve their safety, wear comfort, and maintain the effectiveness of masks is of practical significance.

General protective masks are composed of three layers of materials:

1. Surface layer: made of hydrophobically modified PP and PET materials, the main function is to prevent the passage of large-sized water droplets and attach them.

2. Inner layer: that is, the filter layer, which is made of electrostatic electret fiber material. The electrostatic electret modified material (mainly PP material) is melted, assisted by hot air spray, and high-voltage electrostatic electret to form a diameter of 2-5um. Filament-like materials are stacked into non-woven fabrics, and then subjected to secondary electrostatic electret to form a filter material with an inter-filament structure containing an electrostatic field. When the particles pass through, under the action of electrostatic force, they are adsorbed on the surface and then trapped. .

3. Fitting layer: It is made of hydrophilic spunbond non-woven fabric, which is soft and non-irritating, and is used for comfortable facial fit.

The main function of the filter efficiency of the mask is the inner layer, that is, the filter layer.

The main factors that reduce the filtration performance of masks are: external factors: particulate matter, microorganisms, etc. are trapped and adhered, resulting in a decrease in filtration efficiency; internal factors: water vapor contained in exhaled air, droplets generated by coughing and sneezing, adhere to the filter layer, causing static electricity As the field strength decreases, the filtration efficiency decreases, while the resistance increases.

Research by some institutions has shown that the survival period of the COVID-19 virus of the new coronary pneumonia spread by droplets in the air is more than 3 hours, and the half-life of adhering to the plastic surface is 6 hours and 49 minutes. Masks are typical plastic materials (most of their raw materials are PP, PET). When the layers of the mask are enriched with infectious bacteria and viruses, especially as the water content of the inner layer increases, the resistance increases and the breathing depth increases, which will lead to an increase in the probability of filtration infection or contact infection. Therefore, it is currently recommended not to reuse masks many times, which is the main reason for the shortage of masks.

Soaking and washing with disinfectant and surfactant can remove the enriched particulate matter, but at the same time, the electret charge of the inner layer of fibers will disappear and the filtering effect will be lost; steam steaming, hot water boiling, oven drying, etc. It will lead to the disappearance of electrostatic electret characteristics and greatly reduce the bottom filtration performance.

If the masks can be quickly dehydrated, disinfected, deodorized, and regenerated efficiently, and the performance of the masks can be maintained while ensuring the safety and wearing comfort of the masks, so that they can be recycled, which will greatly reduce the current shortage of masks. Meet the usage requirements of the following application scenarios:

1. Family: wear for a short time, go out for shopping, entertainment, etc.;

2. Office: the meeting and meeting with guests are over; after short-term contact in crowded places; the centralized office space is regularly regenerated;

3. Services: supermarket cashiers, restaurant services, entertainment services, regular regeneration;

4. Medical: regular regeneration on general occasions;

5. Hotel: After dining in the restaurant, meeting guests temporarily, going out, etc.

However, in the prior art, there is still no device capable of rapidly dehydrating, sterilizing, deodorizing, and efficiently regenerating masks, so it is difficult to regenerate masks safely.

UVC band ultraviolet rays have the ability to kill microorganisms, and have been experimentally verified to kill different viruses, bacteria and other microorganisms and the irradiation dose. Since the mask is a multi-layer fiber accumulation structure, quickly killing deep microorganisms requires strong penetrating power. UVC ultraviolet rays. Reasonably designed and equipped with a suitable driving circuit, the pulsed xenon lamp can emit strong ultraviolet light with an instantaneous power of several kilowatts. It has strong penetration and is suitable for killing deep microorganisms in a short time. At the same time, the research literature has confirmed that the thermal effect and shock effect generated by the visible and infrared wavelengths contained in the pulsed light also have the effect of destroying and killing microorganisms. Under the synergistic effect, the sterilization and disinfection efficiency is further improved.

The infrared absorption peaks of water and polypropylene materials are concentrated at the wavelength of 2-4um. The use of fast-starting electric heating devices with emission capabilities in this band, combined with thermal radiation back reflection and convergence guide structure, can make water and PP materials quickly heat up , the moisture contained in the surface evaporates, and the air and metal enclosure members in the treatment area are less heated. Quartz halogen heating tubes and carbon fiber heating tubes have this feature.

Ozone and negative ions have the ability to eliminate odors and kill microorganisms, and the textiles treated with a small amount of ozone have an intuitive feeling of fresh smell.

The electrostatic electret process is the process of ordering the dipoles inside the polymer material, which is completed with the assistance of an external electric field. After the PP fiber material is heated, an external electric field is applied, which is easier to restore the electrostatic field lost on the electret surface. After cooling, the surface electrostatic electret electric field strength is restored, thereby restoring the ability to capture fine particles.

The exhaust structure composed of the exhaust fan and the filter can form a negative pressure chamber structure in the treatment area, similar to the negative pressure isolation chamber in the medical environment, so that the water vapor, odor, trace ozone, fiber shedding and even microorganisms generated during the treatment process are blocked. Centralized collection and treatment, no secondary pollution.

The above components, combined with appropriate drive control circuits, enclosure structures, and safety measures, can quickly dehydrate, disinfect, deodorize, and regenerate efficiency of masks in use, and are suitable for effective and comfortable use of masks in non-specific environments. However, there is no such device in the prior art.

SUMMARY OF THE INVENTION

The object of the present invention is to provide a mask processing device, which can quickly dehydrate, disinfect, deodorize, and efficiently regenerate the mask, so that the mask can be safely regenerated and used.

In order to achieve the above-mentioned purpose, the present invention provides a mask processing device, comprising a casing, a mask processing area is arranged in the casing, and a pulsed strong light irradiation component, which includes a pulsed xenon flash tube and a light guide component , the light guide component makes the light emitted by the pulsed xenon flash tube to the mask processing area; the thermal radiation heating component includes a radiant heat source and a thermal back reflector, and the thermal back reflector The heat generated by the radiant heat source is directed to the mouth mask treatment area; the electrostatic electret regeneration electric field assembly includes an electret corona electric field emitter and an electret electric field grounding electrode that are relatively arranged, and the mouth mask treatment area is located in the electret Between the corona electric field emitter and the electret electric field ground electrode, the electret corona electric field emitter includes a paired glow plasma discharge needle and an induction electrode.

Further, the light guide assembly includes a parabolic reflector, a back reflector and a front reflector disposed in the parabolic reflector; the pulsed xenon flash tube is located on the symmetry plane of the parabolic reflector, so The distance between the axis of the glass bulb of the pulsed xenon flash tube and the focus of the parabolic reflector is 0 to 2r, where r is the glass bulb radius of the pulsed xenon flash tube; the light outlet of the parabolic reflector The facing direction is downward, the back reflection mirror is located above the pulsed xenon flash tube, and the front reflection mirror is located below the pulsed xenon flash tube.

Further, the back reflection mirror includes two symmetrically arranged downward reflection surfaces, and the included angle between the mirror surfaces of the two downward reflection surfaces is greater than 90°; the front reflection mirror includes two symmetrically arranged upward reflection surfaces surface, and the included angle between the mirror surfaces of the two upward reflective surfaces is greater than 90°.

Further, the heat back reflector includes a heat radiation reflector, the heat radiation reflector is arranged in the parabolic reflector and is located below the front reflector, and the radiant heat source is located in the heat radiation Below the reflector; the heat radiation reflector includes two symmetrically arranged downward reflecting surfaces, and the included angle between the mirror surfaces of the two downward reflecting surfaces is greater than 90°.

Further, the electret electric field grounding electrode has a metal mesh structure, the electret electric field grounding electrode is arranged at the light outlet of the parabolic reflector, and the metal part of the electret electric field grounding electrode is opposite to the light outlet of the light outlet. The area ratio is less than 10%.

Further, one end of the glow plasma discharge needle is a pointed structure, the induction electrode is in the shape of a circular hole, and the glow plasma discharge needle points to the middle of the induction electrode.

Further, the housing is provided with an exhaust port that communicates with the mask processing area, and a fan and a filter assembly are arranged in the exhaust port.

Further, it also includes a conveyor chain, the conveyor chain is provided with a plurality of mask hangers, the conveyor chain passes through the housing and can transport the masks to the mask processing area.

Further, taking the mask treatment area as a boundary, the pulsed strong light irradiation assembly, the thermal radiation heating assembly and the electret electric field grounding electrode are located on the same side and constitute the first side assembly, and the electret corona electric field emitter is located on the same side. It is located on the other side and constitutes a second side assembly; on both sides of the conveying path of the conveyor chain, the first side assembly and the second side assembly are arranged in multiple groups and are arranged in a cross.

Further, on both sides of the conveying path of the conveying chain, the high voltage polarities of all the glow plasma discharge needles on the same side are opposite to those of all the glow plasma discharge needles on the other side.

In the mask processing device provided by the present invention, when in use, the pulsed strong light irradiation component is used to quickly kill microorganisms such as viruses and bacteria attached to the mask, and the thermal radiation heating component is used to quickly remove the moisture adsorbed on the surface of the fiber. The electret regenerative electric field component is used to supplement and enhance the electret electrostatic field strength, and restore or improve the filtration efficiency of the mask. Therefore, compared with the prior art, this mask processing device can quickly dehydrate, disinfect, deodorize, remove Efficient regeneration, so that the mask can be safely recycled.

Description of drawings

Fig. 1 is the structural schematic diagram of the mask processing device of the present invention;

Fig. 2 is a schematic diagram of the structure of the mask processing device of the present invention at another angle;

3 is a schematic diagram of the pulsed strong light and infrared radiation paths, wherein the dotted line is the pulsed strong light path, and the double-dotted line is the infrared radiation path;

4 is a schematic diagram of a cross-sectional structure of an electret corona electric field emitter;

5 is a schematic diagram of the structure of an electret corona electric field emitter at another angle;

6 is a schematic diagram of the structure of an electret electric field ground electrode;

7 is a schematic diagram of the structure when the mask processing device of the present invention is provided with a conveyor chain and two groups of pulsed strong light irradiation components, thermal radiation heating components and electrostatic electret regeneration electric field components.

[Description of reference numerals]

01-mask;

1-shell, 11-mask processing area;

2- Pulse strong light irradiation component, 21- pulse xenon flash tube, 22- parabolic reflector, 23- back reflector, 24- front reflector;

3-heat radiation heating assembly, 31-radiant heat source, 32-heat radiation reflector;

4-electrostatic electret regeneration electric field assembly, 41-electret corona electric field emitter, 411-glow plasma discharge needle, 412-inducing electrode, 42-electret electric field grounding electrode;

51-exhaust port, 52-fan, 53-filter assembly;

6- Conveyor chain.

Detailed ways

The present invention will be described in detail below with reference to specific embodiments.

In the present invention, when an orientation word appears, the orientation word is for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and cannot It is construed as limiting the specific protection scope of the present invention.

In the present invention, unless otherwise expressly specified and limited, when terms such as "arranged on", "connected" and "connected" appear, these terms should be understood in a broad sense, for example, it may be a fixed connection or a Removal connection, or integral connection; mechanical connection; direct connection, connection through an intermediate medium, or internal communication between two components. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

The present invention provides a mask processing device, as shown in FIG. 1 to FIG. 7 , comprising a housing 1, and a mask processing area 11 is arranged in the housing 1.

It also includes a pulsed strong light irradiation assembly 2, which includes a pulsed xenon flash tube 21 and a light guide assembly, and the light guide assembly makes the light emitted by the pulsed xenon flash tube 21 radiate to the mask treatment area 11.

The heat radiation heating assembly 3 includes a radiation heat source 31 and a heat back reflector, and the heat back reflector guides the heat generated by the radiation heat source 31 to the mask processing area 11 .

The electrostatic electret regenerative electric field assembly 4 includes an electret corona electric field emitter 41 and an electret electric field grounding electrode 42 arranged oppositely, and the mask treatment area 11 is located between the electret corona electric field emitter 41 and the electret electric field grounding electrode 42 , the electret corona electric field emitter 41 includes a paired glow plasma discharge needle 411 and an induction electrode 412 .

Based on the above settings, when in use, the pulsed strong light irradiation component 2 is used to quickly kill microorganisms such as viruses and bacteria attached to the mask 01, and the thermal radiation heating component 3 is used to quickly remove the moisture adsorbed on the fiber surface, and the electrostatic electret is used for regeneration. The electric field assembly 4 is used to supplement and enhance the electret electrostatic field strength, and restore or improve the filtration efficiency of the mask 01. Therefore, compared with the prior art, this mask processing device can quickly dehydrate, disinfect, and deodorize the mask 01. , Efficiency regeneration, so that the mask 01 can be safely regenerated and used.

The mask 01 to be treated can be sent to the mask processing area 11 by directly placing or conveying, and the housing 1 is set to prevent the emitted ultraviolet rays from leaking, and the exhaust fan forms a negative pressure in the mask processing area 11 simultaneously, and avoids. Viruses, bacteria, odors, surface exfoliation leaks.

Next, each functional component in this mask processing apparatus is demonstrated in detail.

Pulsed Light Irradiation Components

The number of pulsed strong light irradiation components 2 is at least one group, which is used to quickly kill microorganisms such as viruses and bacteria attached to the mask 01 .

In this embodiment, the pulsed xenon flash tube 21 can emit wavelengths including vacuum ultraviolet (VUV), ultraviolet (UVC, UVB, UVA), visible light and infrared light, wherein the UVC band emitted by the pulsed xenon flash tube 21 has a rapid The effect of killing viruses and bacteria.

In this embodiment, the light guide assembly includes a parabolic reflector 22, a back reflector 23 and a front reflector 24 disposed in the parabolic reflector 22; the pulsed xenon flash tube 21 is located on the symmetry plane of the parabolic reflector, and the pulse The distance between the axis of the glass bulb of the xenon flash tube 21 and the focus of the parabolic reflector is 0 to 2r, where r is the glass bulb radius of the pulsed xenon flash tube 21; the direction of the light outlet of the parabolic reflector 22 is Below, the back reflection mirror 23 is positioned above the pulsed xenon flash tube 21 , and the front reflection mirror 24 is positioned below the pulsed xenon flash tube 21 . The back reflection mirror 23 includes two symmetrically arranged downward reflection surfaces, and the mirror surface angle between the two downward reflection surfaces is greater than 90°; the front reflection mirror 24 includes two symmetrically arranged upward reflection surfaces, the two The mirror angle of the upward reflecting surface is greater than 90°.

Through the above-mentioned light guide assembly, the light emitted by the pulsed xenon flash tube 21 is directed to the mask processing area 11, and through the arrangement of the shape and position of the light guide assembly, all the light emitted by the pulsed xenon flash tube 21 is The light outlet of the parabolic reflector 22 emits light without being obstructed by other components in the parabolic reflector 22 .

Preferably, the parabolic reflector 22, the back reflector 23 and the front reflector 24 are made of aluminum alloy by polishing and are coated with aluminum oxide or silicon dioxide on the surface.

Radiant heating components

The number of the thermal radiation heating elements 3 is at least one set, which is used to quickly remove the moisture adsorbed on the surface of the fibers.

In this implementation, the radiant heat source 31 can be a carbon fiber heating tube or a halogen lamp tube, the main wavelength is in the near-infrared region, the wavelength is 1.6-4.2um, and the start-up time is less than 3S. Most preferably, a quartz halogen lamp is used as a heat source, with a peak wavelength of 2-4um near-infrared distribution; at the same time, the back surface of the quartz halogen lamp is plated with gold to reflect near-infrared infrared rays and increase the irradiation power.

In this embodiment, the thermal back reflector includes a thermal radiation mirror 32 . The thermal radiation mirror 32 is disposed in the parabolic reflector 22 and is located below the front reflector 24 . The thermal radiation mirror 32 is connected to the parabolic reflector 22 . Constitutes a thermal back reflector. The radiant heat source 31 is located below the heat radiation reflector 32; the heat radiation reflector 32 includes two symmetrically arranged downward reflecting surfaces, and the mirror surface angle between the two downward reflecting surfaces is greater than 90°. If the thermal radiation reflector 32 and the radiant heat source 31 are all arranged in the parabolic reflector 22, the parabolic reflector 22 can simultaneously realize the effect of reflecting pulsed strong light and infrared radiation, and simultaneously makes the mask processing device compact in structure. The heat radiation reflecting mirror 32 can be a reflecting mirror whose surface is coated with one or more synthetic reflective coatings of alumina, titania, and zirconia. Most preferably it is coated with a rutile-type titanium dioxide nanocoating.

Based on the above structure, the pulsed strong light and the infrared radiation form a path as shown in FIG. 3 , and the parabolic reflector 22 is used for two purposes.

Electrostatic electret regeneration electric field assembly

The number of electrostatic electret regenerative electric field components 4 is at least one set, which is used to supplement and enhance the electrostatic field strength of the electret, restore or improve the filtering efficiency of the mask 01, and also have the effect of assisting sterilization and deodorization. For the electrostatic electret regenerative electric field component 4, a higher voltage can be provided at the initial stage of use to generate a high-current glow plasma discharge, thereby generating ion wind, a large amount of negative oxygen ions, and a small amount of ozone to achieve auxiliary sterilization, removal of In the later period of use, the discharge current is lowered to provide a stable DC electric field, so as to achieve the effect of enhancing the electrostatic electret effect of the inner fiber. Of course, through control, the electrostatic electret regeneration electric field component 4 can also always only achieve the effect of enhancing the electrostatic electret effect of the inner layer fibers.

In this embodiment, the electret electric field grounding electrode 42 is a metal mesh structure, the electret electric field grounding electrode 42 is disposed at the light outlet of the parabolic reflector 22, and the area of the metal part of the electret electric field grounding electrode 42 relative to the light outlet If the ratio is less than 10%, preferably, the electret electric field ground electrode 42 adopts a stainless steel parallel fence structure. After the electret electric field grounding electrode 42 is set to a metal mesh structure and is located at the light outlet of the parabolic reflector 22, it can also play a role in preventing the mask 01 from contacting the radiant heat source 31 in the parabolic reflector 22, and simultaneously make the entire mask processing device. The structure is more compact.

In this embodiment, one end of the glow plasma discharge needle 411 is a pointed structure, the induction electrode 412 is in the shape of a circular hole, and the glow plasma discharge needle 411 is located in the middle of the induction electrode 412 . Among them, the glow plasma discharge needle 411 can be made of corrosion-resistant stainless steel, tungsten wire, or carbon fiber rod, and most preferably, a rod-shaped material bonded by multiple strands of carbon fiber is used.

Preferably, the glow plasma discharge needle 411 is connected to a high-voltage power supply after being connected to a high-voltage power supply in series with a resistor, so as to avoid abnormal discharge caused by structural errors, balance the electric field, and the resistance value of the resistor is 1-100MΩ.

Control drive components

The control drive assembly is used to control the pulsed xenon flash tube 21, the radiant heat source 31, the high-voltage power supply (which can be external or an interface built into the mask processing device), the fan 52 and the conveyor chain 6 described below. It also includes a working sequence controller for general surgical masks and high-efficiency special port 1. As for the specific model and control method of the control drive assembly, those skilled in the art can select it according to the disclosure of the prior art, so it will not be described in detail in this application.

Safety Control Components

The safety control component includes a temperature detection sensor or thermal fuse for detecting the temperature of the mask processing area 11 or the surface of the mask 01, so as to ensure emergency shutdown and alarm in a specific state.

Safety control components include abnormal discharge monitoring and alarm of high-voltage power supply to ensure emergency shutdown and alarm under specific conditions.

Exhaust filter assembly

In this embodiment, the housing 1 is provided with an exhaust port 51 that communicates with the mask treatment area 11 , and the exhaust port 51 is provided with a fan 52 and a filter assembly 53 , and the above components are used to generate negative pressure in the mask treatment area 11 . , Remove the shedding, volatilized odor, residual ozone, etc. generated during the processing of the mask while preventing leakage. Preferably, the filter assembly 53 can be obtained by a combination of one or more of a particulate filter, an organic volatile matter adsorption filter, and a catalytic purification filter.

conveyor chain

In this embodiment, a conveyor chain 6 is also included. The conveyor chain 6 is provided with a plurality of mask hangers. The conveyor chain 6 passes through the housing 1 and can transport the mask 01 to the mask processing area 11 . By arranging the conveyor chain 6, the multiple masks 01 can be processed in sequence to improve the efficiency. At the same time, in order to avoid leakage of ultraviolet rays or viruses and bacteria, both ends of the housing 1 are provided with entrance doors and exit doors.

When the conveyor chain 6 is used, in order to improve the processing efficiency of the mask 01, multiple groups of pulsed strong light irradiation components 2, thermal radiation heating components 3 and electrostatic electret regeneration electric field components 4 can be arranged in the housing 1. The path conveyed by the conveyor chain 6 is processed by a plurality of sets of the above-mentioned components.

Preferably, the mask treatment area 11 is a boundary, the pulsed strong light irradiation component 2, the thermal radiation heating component 3 and the electret electric field grounding electrode 42 are located on the same side and constitute the first side component, and the electret corona electric field emitter 41 is located on the other side. One side constitutes a second side component; on both sides of the conveying path of the conveyor chain 6, the first side component and the second side component are provided in multiple groups and are arranged crosswise. That is, as shown in FIG. 7, each group of first side components is opposite to a group of second side components (ie electret corona electric field emitters 41), and in order to make the front and back sides of the mask 01 be processed evenly, in the conveyor chain 6. On both sides of the conveying path, the first side assembly and the second side assembly are arranged in multiple groups and distributed in a cross.

Further preferably, on both sides of the conveying path of the conveying chain 6, the high voltage polarities of all the glow plasma discharge needles 411 on the same side are opposite to those of all the glow plasma discharge needles 411 on the other side. That is, as shown in FIG. 7 , the glow plasma discharge needle 411 at the top is connected to a positive high voltage, and the glow plasma discharge needle 411 at the bottom is connected to a negative high voltage, in order to ensure that the electric fields are in the same direction.

Method of manufacture and use

Using metal aluminum material, a reflector including a parabolic structure and a rectangular structure is made, with an opening width of 80-160 mm and a length of 150-200 mm.

A straight-tube pulsed xenon flash tube with a diameter of 5 mm and a luminous length of 180 mm is used, and the central axis of the pulsed xenon flash tube coincides with the focus of the parabolic reflector.

The back reflection mirror is installed above the pulsed xenon flash tube, and the front reflection mirror is installed below. The vertex line of the back reflection mirror and the front reflection mirror is parallel to the central axis of the pulse xenon flash tube and placed on the same plane. And the front reflector is 2 to 5r away from the central axis of the pulsed xenon flash tube. The reflecting surfaces of the back reflector and front reflector are polished and coated with alumina or silica.

After the single luminescence of the pulsed xenon flash tube is reflected, the average UVC radiation intensity at the light outlet is >0.5mJ/cm ² .

The radiant heat source is a near-infrared straight-tube heat source, with a diameter of 6-12mm, a heating radiation length of 180mm, a peak near-infrared wavelength of 2-5um, a power of 500-2000W, and a startup speed of <3S. The outer surface of the near-infrared straight-tube heating source has a gold-plated reflective layer on the back surface.

The thermal radiation mirror is made of aluminum material, the surface is coated and sintered with titanium dioxide coating, and the thickness of the coating is 1-10um.

There is a thermal insulation layer between the front reflection mirror and the heat radiation reflection mirror, and the aluminum silicate fiber material is used, and the thickness is 1-5mm.

The electret electric field grounding electrode is made of 0.3-1.0mm stainless steel wire, and is arranged in parallel on the light outlet with an equal spacing of 5-20mm.

The above part constitutes the first side assembly.

The electret corona electric field emitter part, the glow plasma discharge needle is made of a rod-shaped material with a diameter of 0.5mm and is bonded by a plurality of carbon fibers. On the material board, connect to the high-voltage power supply through a 10MΩ resistor. The induction electrode is made of stainless steel sheet, with a thickness of 0.1 to 1 mm. A hole is opened on the stainless steel sheet at the position corresponding to the glow plasma discharge needle, with an aperture of 10 to 60 mm. The glow plasma discharge needle is perpendicular to the induction electrode and points to the center of the opening. The distance from the edge of the opening is 10-30mm.

The induction electrode plane is installed parallel to the low-potential electret electric field electrode, and the projection is centered.

The above part constitutes the second side assembly.

The shell is made of stainless steel sheet, which is a rectangular box-shaped structure with a length of 120-200 mm, a thickness of 80-120 mm, and a height of 200-300 mm, forming a processing chamber structure. The upper part and the lower part are opened to form an upper opening and a lower opening, and a frame-shaped stainless steel sheet with the same area as the opening is used to make a mask hanger, and the mask hanger is located in the mask processing area.

The upper opening of the housing accommodates the first side assembly, and the lower opening accommodates the second side assembly.

The side or bottom area is provided with an exhaust port, and a fan and an activated carbon filter assembly are installed. Specifically, a DC fan with a blade diameter of 60mm is used, and an activated carbon honeycomb material with a thickness of 10mm and a hole diameter of 1mm is installed on one side.

Inside the housing, a thermal temperature fuse is installed outside the projection area of the light outlet, with a melting temperature of 150-200°C, and is connected to the power input of the control drive assembly, and a PT100 temperature sensor is installed to connect with the control drive assembly.

The overall enclosure structure is made, and the control and drive components are installed inside. The panel is equipped with a power switch, a mask type gear selector switch, a start switch and corresponding indicator lights. The types of masks are divided into ordinary masks and medical protective masks.

Fix the mask to be processed on the mask hanger, put it into the processing chamber, and start the processing.

When dealing with ordinary masks, the total UVC irradiation dose is >20mJ/cm ² , the electret electric field is applied for 5-20S, the temperature in the cavity is <100 degrees, and the duration is <30S.

When dealing with medical protective masks, the total UVC irradiation dose is >50mJ/cm ² , the electret electric field is applied for 10-30S, the temperature in the cavity is <120 degrees, and the duration is <60S.

During the treatment process, start the exhaust fan in the low-speed gear, and after the processing timing ends, start the exhaust fan at the high-speed gear, and work for 5 to 20 seconds.

The above structure is suitable for low frequency processing use.

Based on the above-mentioned first side assembly and the second side assembly, the first side assembly and the second side assembly that are arranged opposite to each other form a group, and two or more groups are arranged on both sides of the chamber, and a controllable device is installed in the middle. A conveyor belt or mask hanger moving device with a high speed and a hook, and closed doors that automatically open and close are installed on the left and right sides to form the device shown in Figure 7. The ear strap of the mask is fixed on the conveyor belt or the mask hanger. After starting, the automatic sequence control device sends the mask into the processing chamber, and starts each processing unit in sequence to complete rapid dehydration, disinfection, deodorization, and electret regeneration. It is easy and quick to use after taking it off.

The above structure is suitable for high frequency or batch processing use.

Through the above-mentioned structural arrangement, this kind of mask processing device meets the mask processing requirements of the following application scenarios:

1. Family: wear for a short time, go out for shopping, entertainment, etc.;

2. Office: the meeting and meeting with guests are over; after short-term contact in crowded places; the centralized office space is regularly regenerated;

3. Services: supermarket cashiers, restaurant services, entertainment services, regular regeneration;

4. Medical treatment: regular regeneration on general occasions;

5. Hotel: After dining in the restaurant, meeting guests temporarily, going out, etc.

To sum up, this kind of mask processing device can quickly dehydrate, disinfect, deodorize, and regenerate the mask efficiently, so it is difficult to make the mask can be regenerated safely.

The above-described embodiments and features in the embodiments may be combined with each other without conflict.

Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, not to limit the protection scope of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that , the technical solutions of the present invention may be modified or equivalently replaced without departing from the spirit and scope of the technical solutions of the present invention.

Claims (10)

1. a mask processing device, comprising a housing, and being provided with a mask processing area in the housing, it is characterized in that: also comprising A pulsed strong light irradiation assembly, comprising a pulsed xenon flash tube and a light guide assembly, the light guide assembly enables the light emitted by the pulsed xenon flash tube to be directed towards the mask processing area; a thermal radiation heating assembly, comprising a radiant heat source and a thermal back reflector, the thermal back reflector directing the heat generated by the radiant heat source to the mask treatment area; The electrostatic electret regenerative electric field assembly includes an electret corona electric field emitter and an electret electric field grounding electrode that are oppositely arranged, and the mask treatment area is located between the electret corona electric field emitter and the electret electric field grounding electrode, so The electret corona electric field emitter includes a paired glow plasma discharge needle and an induction electrode. 2. mask processing device according to claim 1, is characterized in that: The light guide assembly includes a parabolic reflector, a back reflector and a front reflector disposed in the parabolic reflector; The pulsed xenon flash tube is located on the symmetry plane of the parabolic reflector, and the distance between the glass bulb axis of the pulsed xenon flash tube and the focus of the parabolic reflector is 0 to 2r, where r is the The bulb radius of the pulsed xenon flash tube; Taking the direction facing the light outlet of the parabolic reflector as the downward direction, the back reflection mirror is located above the pulsed xenon flash tube, and the front reflection mirror is located below the pulsed xenon flash tube. 3. mask processing device according to claim 2, is characterized in that: The back reflection mirror includes two symmetrically arranged downward reflecting surfaces, and the included angle between the mirror surfaces of the two downward reflecting surfaces is greater than 90°; The front reflection mirror includes two symmetrically arranged upward reflection surfaces, and the included angle between the mirror surfaces of the two upward reflection surfaces is greater than 90°. 4. mask processing device according to claim 2, is characterized in that: The thermal back reflector includes a thermal radiation mirror, the thermal radiation mirror is arranged in the parabolic reflector and is located below the front reflection mirror, and the radiant heat source is located on the side of the thermal radiation mirror. below; The heat radiation reflecting mirror includes two symmetrically arranged downward reflecting surfaces, and the included angle between the mirror surfaces of the two downward reflecting surfaces is greater than 90°. 5. The mask processing device according to claim 2, characterized in that: the electret electric field grounding electrode has a metal mesh structure, the electret electric field grounding electrode is arranged at the light outlet of the parabolic reflector, and the The area ratio of the metal part of the polar electric field grounding electrode to the light outlet is less than 10%. 6 . The mask processing device according to claim 1 , wherein one end of the glow plasma discharge needle is a pointed structure, the inductive electrode is in the shape of a circular hole, and the glow plasma discharge needle points to the the middle of the induction electrode. 7. The mask processing device according to any one of claims 1 to 6, wherein the housing is provided with an exhaust port connected to the mask processing area, and a fan and a fan are provided in the exhaust port. filter assembly. 8. The mask processing device according to any one of claims 1 to 6, characterized in that: it further comprises a conveyor chain, the conveyor chain is provided with a plurality of mask hangers, and the conveyor chain passes through the housing And the mask can be transported to the mask processing area. 9. mask processing device according to claim 8, is characterized in that: with described mask processing area as demarcation, described pulse strong light irradiation assembly, thermal radiation heating assembly and electret electric field grounding electrode are located on the same side and constitute a first side assembly, the electret corona electric field emitter is located on the other side and constitutes a second side assembly; On both sides of the conveying path of the conveying chain, the first side assemblies and the second side assemblies are arranged in multiple groups and are arranged crosswise. 10. The mask processing device according to claim 9, characterized in that: on both sides of the conveying and conveying path of the conveyor chain, all the glow plasma discharge needles on the same side and all the glow plasma discharge needles on the other side. The high voltage polarity of the glow plasma discharge needle is reversed.

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