CN111393038A - Medium-transmittance low-reflection gray double-silver low-emissivity coated glass and preparation method thereof - Google Patents

Abstract

The invention provides a medium-transmittance low-reflection gray double-silver low-radiation coated glass and a preparation method, which belong to the technical field of magnetron sputtering coating; At the same time, the oxidation resistance of the product is improved; a medium-transmittance low-reflection gray double-silver low-emissivity coated glass is characterized in that the coated glass includes a glass substrate layer and a coating layer, and the coating layer extends from the glass substrate layer to the There are nine film layers in sequence, of which the first layer and the second layer are the first dielectric composite layer, the third layer is the low radiation functional layer, the fourth layer is the first barrier protection layer, the fifth layer and the sixth layer is the second dielectric combination layer, the seventh layer is the low radiation functional layer, the eighth layer is the second blocking protection layer, and the ninth layer is the third dielectric layer. The glass of the invention has the advantages of low reflectivity, strong oxidation resistance and the like.

Description

A kind of medium transmittance low reflection gray double silver low radiation coated glass and preparation method thereof

technical field

The invention belongs to the technical field of magnetron sputtering coating, in particular to a medium-transmittance low-reflection gray double-silver low-radiation coated glass and a preparation method.

Background technique

As an excellent building material, glass is widely used in buildings due to its good permeability and the function of light transmission and wind and snow protection. With the development of modern technology, glass has been endowed with various new connotations. Among them, low-E glass has been widely used in the field of building curtain wall due to its beautiful color, good texture and excellent energy-saving characteristics. Low-E glass, also known as low-emissivity glass, often uses magnetron sputtering to deposit a nano-film layer on the surface of the glass substrate, thereby changing the optical, electrical, mechanical and chemical properties of the glass to achieve decoration, energy saving and environmental protection. and other purposes.

As an energy-saving building material, the energy-saving properties of low-E glass are compared with ordinary glass and heat-reflective coated glass. Low-E glass has a very high reflectivity for far-infrared radiation. It can keep the indoor temperature stable, reduce the energy consumption of building heating or cooling, and play a very good role in energy saving and consumption reduction. The medium-transmittance, low-reflection, and low-emissivity coated glass has an overall gray color, which is more acceptable to the human eye. The overall emissivity is close to that of white glass, and the oxidation resistance is higher.

SUMMARY OF THE INVENTION

The object of the present invention is to provide a medium-transmittance low-reflection gray double-silver low-emissivity coated glass and a preparation method for the above-mentioned problems existing in the prior art. The technical problem to be solved by the present invention is how to optimize the film layer of the coated glass. Designed to reduce the reflectivity of the product while improving the oxidation resistance of the product.

The object of the present invention can be achieved by the following technical solutions: a medium-transmittance low-reflection gray double-silver low-emissivity coated glass, characterized in that the coated glass includes a glass substrate layer and a coating layer, and the coating layer is formed from the glass The substrate layer is sequentially compounded with nine film layers, wherein the first layer and the second layer are the first dielectric composite layer, the third layer is the low radiation functional layer, the fourth layer is the first barrier protection layer, and the fifth layer is and the sixth layer is a second dielectric combined layer, the seventh layer is a low radiation functional layer, the eighth layer is a second blocking protection layer, and the ninth layer is a third dielectric layer.

In the above-mentioned medium-transmittance low-reflection gray double-silver low-emissivity coated glass, the first layer is a SiN _x layer, the second layer is a ZnAl layer, the third layer is an Ag layer, and the fourth layer is The NiCr layer, the fifth layer is a _SiNx layer, the sixth layer is a ZnAl layer, the seventh layer is an Ag layer, the eighth layer is a NiCr layer, and the ninth layer is a SiNx layer.

Due to the low reflectivity of the film layer of this medium-transmittance low-reflection gray double-silver low-emissivity coated glass, the product is generally gray for outdoor viewing when using the original white glass.

A method for preparing medium-transmittance low-reflection gray double-silver low-emission coated glass, characterized in that the method comprises the following steps:

1), magnetron sputtering coating layer;

A. The first layer of magnetron sputtering:

Number of targets: 3-4 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3-5× 10 ^-3 mbar; coating thickness is 20～30nm;

B. The second layer of magnetron sputtering:

Number of targets: 1-2 AC rotating targets; target configuration is zinc-aluminum (ZnAl); process gas ratio: pure argon and oxygen, the ratio of argon and oxygen is 1:2, and the sputtering pressure is 3-5 ×10 ^-3 mbar; coating thickness is 20～25nm;

C. The third layer of magnetron sputtering:

Number of targets: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon, sputtering pressure is 2 ~ 3 × 10 ^-3 mbar; coating thickness is 7 ~ 7.5nm;

D. The fourth layer of magnetron sputtering:

Number of targets: 1 AC rotating target; the target configuration is nickel-chromium (NiCr); the ratio of process gas: pure argon, the sputtering pressure is 2~3×10 ^-3 mbar; the coating thickness is 0.2~0.4nm;

E. The fifth layer of magnetron sputtering:

Number of targets: 3 to 5 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3 to 5× 10 ^-3 mbar; coating thickness is 40～45nm;

F. The sixth layer of magnetron sputtering:

Number of targets: 2 to 3 AC rotating targets; target configuration is zinc aluminum (ZnAl); process gas ratio: pure argon and oxygen, the ratio of argon and oxygen is 1:2, and the sputtering pressure is 3 to 5 ×10 ^-3 mbar; coating thickness is 20～25nm;

G. The seventh layer of magnetron sputtering:

Number of targets: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon, sputtering pressure is 2 ~ 3 × 10 ^-3 mbar; coating thickness is 7 ~ 7.5nm;

H. The eighth layer of magnetron sputtering:

Number of targets: 1 AC rotating target; the target configuration is nickel-chromium (NiCr); the ratio of process gas: pure argon, the sputtering pressure is 2~3×10 ^-3 mbar; the coating thickness is 0.2~0.4nm;

1. The ninth layer of magnetron sputtering:

Number of targets: 4-6 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3-5× 10 ^-3 mbar; coating thickness is 40～45nm;

2) The total film thickness is controlled at 154-186nm, and the transmission speed of the general sputtering chamber is controlled at 4.0-5.0m/min.

Advantages of the present invention:

1. The transmittance of 6mm monolithic product of this patented technology is 50%-58%.

2. 6mm single-piece outdoor reflection Y[5, 8], indoor reflection Y[2, 10]

3. The appearance color is gray, in which the transparent color a*∈[-1.5,-1], b*∈[-1.5,-1]; the film surface color a*∈[-8,-7], b*∈ [-8.5, -7.5]; glass surface color a*∈[-0.1,--0.5], b*∈[-3,-2.5]; glass surface small angle color a*∈[-2.5,-2], b*∈[-4.5,-3.5].

4. Good oxidation resistance, the workshop is placed in the experiment for more than 70 hours (humidity ≥ 70%, temperature ≥ 20 ℃).

Description of drawings

Figure 1 is a schematic diagram of the layered structure of the low-radiation sunlight control coated glass.

In the figure, G, glass substrate layer; 1, first layer; 2, second layer; 3, third layer; 4, fourth layer; 5, fifth layer, 6, sixth layer; 7, seventh layer; 8, eighth layer; 9, ninth layer.

Detailed ways

The following are specific embodiments of the present invention and the accompanying drawings to further describe the technical solutions of the present invention, but the present invention is not limited to these embodiments.

As shown in Figure 1, a medium-transmittance low-reflection gray double-silver low-emissivity coated glass includes a glass substrate layer G and a coating layer, and the coating layer is sequentially compounded with nine films from the glass substrate layer G outwards layer, wherein the first layer 1 and the second layer 2 are the first dielectric composite layers, the third layer 3 is the low-emissivity functional layer, the fourth layer 4 is the first blocking protection layer, and the fifth layer 5 and the sixth layer 6 are The second dielectric composite layer, the seventh layer 7 is a low-emissivity functional layer, the eighth layer 8 is the second blocking protection layer, and the ninth layer 9 is the third dielectric layer; the first layer 1 is a SiNx layer, and the second layer 2 is ZnAl layer, third layer 3Ag layer, fourth layer 4 is NiCr layer, fifth layer 5 is SiNx layer, sixth layer 6 is ZnAl layer, seventh layer 7Ag layer, eighth layer 8 is NiCr layer, ninth layer 9 is the SiNx layer; due to the low reflectivity of the film layer of this medium-transmissive low-reflection gray double-silver low-emissivity coated glass, the product is generally gray when it is produced by using the original white glass.

A method for preparing medium-transmittance low-reflection gray double-silver low-emissivity coated glass, comprising the following steps:

1), magnetron sputtering coating layer;

A. The first layer 1 of magnetron sputtering:

Number of targets: 3-4 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3-5× 10-3mbar; coating thickness is 20～30nm;

B. Magnetron sputtering second layer 2:

Number of targets: 1-2 AC rotating targets; target configuration is zinc-aluminum (ZnAl); process gas ratio: pure argon and oxygen, the ratio of argon and oxygen is 1:2, and the sputtering pressure is 3-5 ×10-3mbar; coating thickness is 20～25nm;

C, magnetron sputtering third layer 3:

Number of targets: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 7~7.5nm;

D. Magnetron sputtering fourth layer 4:

Number of targets: 1 AC rotating target; target configuration is nickel-chromium (NiCr); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 0.2~0.4nm;

E. Magnetron sputtering fifth layer 5:

Number of targets: 3 to 5 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3 to 5× 10-3mbar; coating thickness is 40～45nm;

F. Magnetron sputtering sixth layer 6:

Number of targets: 2 to 3 AC rotating targets; target configuration is zinc aluminum (ZnAl); process gas ratio: pure argon and oxygen, the ratio of argon and oxygen is 1:2, and the sputtering pressure is 3 to 5 ×10-3mbar; coating thickness is 20～25nm;

G. Magnetron sputtering seventh layer 7:

Number of targets: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 7~7.5nm;

H, magnetron sputtering eighth layer 8:

Number of targets: 1 AC rotating target; target configuration is nickel-chromium (NiCr); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 0.2~0.4nm;

1. The ninth layer 9 of magnetron sputtering:

Number of targets: 4-6 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:0.8, and the sputtering pressure is 3-5× 10-3mbar; coating thickness is 40～45nm;

2) The total film thickness is controlled at 154-186nm, and the transmission speed of the general sputtering chamber is controlled at 4.0-5.0m/min.

The specific embodiments described herein are merely illustrative of the spirit of the invention. Those skilled in the art to which the present invention pertains can make various modifications or additions to the described specific embodiments or substitute in similar manners, but will not deviate from the spirit of the present invention or go beyond the definitions of the appended claims range.

Claims (2)

1. a medium-transmitting low-reflection gray double-silver low-radiation coated glass, is characterized in that, this coated glass comprises glass substrate layer and coating layer, and described coating layer is compounded with nine successively outwards from described glass substrate layer. The film layer, wherein the first layer and the second layer are the first dielectric composite layer, the third layer is the low-emissivity functional layer, the fourth layer is the first blocking protective layer, and the fifth layer and the sixth layer are the second dielectric composite layer , the seventh layer is the low radiation functional layer, the eighth layer is the second blocking protection layer, the ninth layer is the third dielectric layer; the first layer is the SiN _x layer, the second layer is the ZnAl layer, the The third layer is Ag layer, the fourth layer is NiCr layer, the fifth layer is SiN _x layer, the sixth layer is ZnAl layer, the seventh layer is Ag layer, and the eighth layer is NiCr layer , the ninth layer is a SiN _x layer. 2. a preparation method of low-radiation sunlight control coated glass, is characterized in that, this method comprises the steps: 1), magnetron sputtering coating layer; A. The first layer (1) of magnetron sputtering: Number of targets: 3 to 4 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.14, and the sputtering pressure is 3 to 5× 10-3mbar; coating thickness is 20～100nm; B, magnetron sputtering second layer (2): Number of targets: 1 AC rotating target; target configuration is nickel-chromium (NiCr); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 1~5nm; C, magnetron sputtering third layer (3): Number of targets: 1 AC rotating target; target configuration is niobium (Nb); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 5~20nm; D. The fourth layer (4) of magnetron sputtering: Number of targets: 1 AC rotating target; target configuration is nickel-chromium (NiCr); process gas ratio: pure argon, sputtering pressure is 2~3×10-3mbar; coating thickness is 1~5nm; E, magnetron sputtering fifth layer (5): Number of targets: 4-6 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.14, and the sputtering pressure is 3-5× 10-3mbar; coating thickness is 20～100nm; 2) The total thickness of the coating layer is controlled between 47-230nm, and the transmission speed of the sputtering chamber is controlled at 4.0-5.0m/min.

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