[go: up one dir, main page]

CN111239863B - Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment - Google Patents

Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment Download PDF

Info

Publication number
CN111239863B
CN111239863B CN202010088941.0A CN202010088941A CN111239863B CN 111239863 B CN111239863 B CN 111239863B CN 202010088941 A CN202010088941 A CN 202010088941A CN 111239863 B CN111239863 B CN 111239863B
Authority
CN
China
Prior art keywords
light
homogenizer
random
light homogenizer
polygon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202010088941.0A
Other languages
Chinese (zh)
Other versions
CN111239863A (en
Inventor
冯坤亮
李宗政
陈冠宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oufei Microelectronics Nanchang Co ltd
Original Assignee
Jiangxi OMS Microelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangxi OMS Microelectronics Co Ltd filed Critical Jiangxi OMS Microelectronics Co Ltd
Priority to CN202010088941.0A priority Critical patent/CN111239863B/en
Publication of CN111239863A publication Critical patent/CN111239863A/en
Application granted granted Critical
Publication of CN111239863B publication Critical patent/CN111239863B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/095Refractive optical elements
    • G02B27/0955Lenses
    • G02B27/0961Lens arrays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention discloses a light homogenizer, a manufacturing method thereof, a light emitting module and electronic equipment. The manufacturing method of the light homogenizer comprises the following steps: randomly offsetting vertices of each of a plurality of base polygons within a reference plane to form a plurality of random polygons corresponding to the plurality of base polygons; generating a dodging device model according to the random polygons, the microlens centers and a basic surface type formula; and manufacturing the light homogenizer according to the light homogenizer model. Because the shapes of the micro lenses in the light homogenizer are randomly distributed, the randomness disturbs the interference, and the problem of uneven light spot ripple caused by the interference effect can be effectively eliminated.

Description

匀光器及其制作方法、光发射模组、电子设备Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment

技术领域technical field

本发明涉及电子设备领域,特别是涉及匀光器及其制作方法、光发射模组、电子设备。The invention relates to the field of electronic equipment, in particular to a light homogenizer and a manufacturing method thereof, a light emission module and electronic equipment.

背景技术Background technique

匀光器是一类能将输入光束变换成特定输出光束的微光学元件,能生成特定需求的光斑形状和能量分布。如图1所示,目前市场上的匀光器大多为规则的微透镜阵列元件,以实现均匀光斑照明,这种规则阵列元件中每个子透镜单元都是一样的形状大小,其特点是排布结构简单,易于设计和加工检测,但周期重复的结构在相干光源通过时干涉效应明显,如图2所示,在实际应用中往往会产生波纹状的光斑不均效果,对实际应用产生不良影响。A diffuser is a type of micro-optical element that can transform an input beam into a specific output beam, and can generate a specific required spot shape and energy distribution. As shown in Figure 1, most of the light homogenizers on the market are regular micro-lens array elements to achieve uniform spot illumination. Each sub-lens unit in this regular array element has the same shape and size, which is characterized by the arrangement of The structure is simple, easy to design and process inspection, but the periodic structure has obvious interference effect when the coherent light source passes through, as shown in Figure 2, in practical applications, it often produces a ripple-like uneven spot effect, which has adverse effects on practical applications. .

发明内容SUMMARY OF THE INVENTION

本发明提供一种匀光器的制作方法以及电子设备,旨在解决现有的匀光器在实际应用中往往会产生波纹状的光斑不均效果的问题。The invention provides a method for manufacturing a light homogenizer and an electronic device, aiming at solving the problem that the existing light homogenizer often produces a corrugated uneven spot effect in practical applications.

第一方面,本发明提供了一种匀光器的制作方法,所述匀光器包括基底和设置于所述基底的出光面上的多个微透镜,所述匀光器的制作方法包括步骤:In a first aspect, the present invention provides a method for manufacturing a light homogenizer, wherein the light homogenizer includes a base and a plurality of microlenses disposed on a light exit surface of the base, and the manufacturing method for the light homogenizer includes steps :

将多个基础多边形中每一个的顶点在基准面内随机偏移,以形成与所述多个基础多边形对应的多个随机多边形,其中,所述基准面用于表征所述基底的出光面,所述基准面上阵列分布有多个基础多边形区域,每一个基础多边形区域具有相应的基础多边形以及对应基础多边形的顶点,所述随机偏移用于表征顶点偏移的方向、次数和距离中的至少一个为随机,随机偏移后的任意一个基础多边形的顶点用于限定出与所述任意一个基础多边形对应的随机多边形,任意一个随机多边形用于表征对应的所述微透镜于所述基底上投影的边界;Randomly shifting the vertices of each of the plurality of base polygons within a reference plane to form a plurality of random polygons corresponding to the plurality of basic polygons, wherein the reference plane is used to characterize the light-emitting surface of the substrate, There are a plurality of basic polygon areas distributed in the array on the reference plane, each basic polygon area has a corresponding basic polygon and a vertex corresponding to the basic polygon, and the random offset is used to represent the direction, number of times and distance of the vertex offset. At least one is random, and the vertices of any one of the basic polygons after the random offset are used to define a random polygon corresponding to the any one of the basic polygons, and any one of the random polygons is used to represent the corresponding microlens on the substrate. the boundary of the projection;

根据所述多个随机多边形、多个微透镜中心和基础面型公式,生成匀光器模型,其中,任意一个微透镜中心用于表征对应的所述微透镜于所述基底上投影的中心;generating a diffuser model according to the plurality of random polygons, a plurality of microlens centers and a basic surface shape formula, wherein any one of the microlens centers is used to represent the corresponding center of the projection of the microlens on the substrate;

根据所述匀光器模型制作所述匀光器。The homogenizer is fabricated according to the homogenizer model.

本申请通过随机偏移的方式形成了微透镜在基底上的不规则边界,由于匀光器中的多个微透镜的形状是随机分布的,随机性将打乱其干涉性,故能够有效消除干涉效应造成的光斑波纹不均问题。并且,本申请是通过少量参数控制所有微透镜的随机效果,有利于匀光器的整体设计优化。In the present application, the irregular boundaries of the microlenses on the substrate are formed by random offset. Since the shapes of the plurality of microlenses in the light homogenizer are randomly distributed, the randomness will disrupt their interference, so it can effectively eliminate the The problem of uneven spot ripple caused by interference effect. In addition, the present application controls the random effects of all microlenses through a small number of parameters, which is beneficial to the overall design optimization of the diffuser.

在一个实施例中,所述根据所述匀光器模型制作所述匀光器的步骤,具体为:模拟检测所述匀光器模型的光学效果;若所述匀光器模型的光学效果满足预设条件,则根据所述匀光器模型制作所述匀光器;In one embodiment, the step of making the light homogenizer according to the light homogenizer model is specifically: simulating and detecting the optical effect of the light homogenizer model; if the optical effect of the light homogenizer model satisfies If the preset conditions are met, the homogenizer is manufactured according to the homogenizer model;

其中,在所述模拟检测所述匀光器模型的光学效果的步骤之后,所述匀光器的制作方法还包括步骤:若所述匀光器模型的光学效果不满足所述预设条件,则调整所述多个随机多边形、所述多个微透镜中心和所述基础面型公式中的至少一项,以生成调整后的匀光器模型;模拟检测所述调整后的匀光器模型的光学效果;若所述调整后的匀光器模型的光学效果满足所述预设条件,则根据所述调整后的匀光器模型制作所述匀光器。Wherein, after the step of simulating and detecting the optical effect of the light homogenizer model, the manufacturing method of the light homogenizer further includes the step of: if the optical effect of the light homogenizer model does not meet the preset condition, then adjust at least one of the plurality of random polygons, the centers of the plurality of microlenses and the basic surface shape formula to generate an adjusted diffuser model; simulate and detect the adjusted diffuser model If the optical effect of the adjusted light diffuser model satisfies the preset condition, the light diffuser is manufactured according to the adjusted light diffuser model.

在一个实施例中,所述顶点随机偏移的距离为0.05a-0.2a,其中,a为所述基础多边形的边长的平均值。In one embodiment, the vertices are randomly offset by a distance of 0.05a-0.2a, where a is the average value of the side lengths of the basic polygon.

在一个实施例中,在所述根据所述多个随机多边形、多个微透镜中心和基础面型公式,生成匀光器模型的步骤之前,所述匀光器的制作方法还包括步骤:在每一个所述随机多边形内随机确定一个微透镜中心,以得到所述多个微透镜中心。In one embodiment, before the step of generating the light diffuser model according to the plurality of random polygons, the plurality of microlens centers and the basic surface formula, the method for making the light diffuser further includes the step of: A microlens center is randomly determined within each of the random polygons to obtain the plurality of microlens centers.

在一个实施例中,任意一个所述随机多边形内的微透镜中心与所述任意一个所述随机多边形对应的基础多边形的中心之间的距离为b,且b<0.1a,其中,a为所述基础多边形的边长的平均值。In one embodiment, the distance between the center of the microlens in any one of the random polygons and the center of the basic polygon corresponding to the any one of the random polygons is b, and b<0.1a, where a is the The average of the side lengths of the underlying polygon.

第二方面,本发明还提供一种匀光器,所述匀光器为采用第一方面各种实施例中任一项所述的匀光器的制作方法制成的匀光器。In a second aspect, the present invention further provides a light homogenizer, which is a light homogenizer manufactured by using the method for manufacturing a light homogenizer according to any one of the various embodiments of the first aspect.

本申请的匀光器中的多个微透镜的形状是随机分布的,随机性将打乱其干涉性,故能够有效消除干涉效应造成的光斑波纹不均问题。The shapes of the plurality of microlenses in the homogenizer of the present application are randomly distributed, and the randomness will disrupt the interference, so the problem of uneven light spot ripple caused by the interference effect can be effectively eliminated.

在一个实施例中,所述匀光器中的每一个微透镜于所述匀光器的基底上投影的边界的平均边长为s,且s为10μm-50μm。In one embodiment, the average side length of the boundary projected by each microlens in the homogenizer on the base of the homogenizer is s, and s is 10 μm-50 μm.

在一个实施例中,s为30μm-40μm。In one embodiment, s is 30 μm-40 μm.

在一个实施例中,所述匀光器中的微透镜均包括远离所述匀光器的基底的顶面,每一个所述微透镜的顶面的顶点处的曲率半径为R,且R为5μm-100μm。In one embodiment, the microlenses in the light homogenizer all include a top surface away from the base of the light homogenizer, and the radius of curvature at the vertex of the top surface of each of the microlenses is R, and R is 5μm-100μm.

在一个实施例中,R为20μm-60μm。In one embodiment, R is 20 μm-60 μm.

第三方面,本发明还提供一种光发射模组,包括第二方面各种实施例中任一项所述的匀光器。In a third aspect, the present invention further provides a light emission module, including the light homogenizer according to any one of the various embodiments of the second aspect.

第四方面,本发明还提供一种电子设备,包括第三方面各种实施例中任一项所述的光发射模组。In a fourth aspect, the present invention further provides an electronic device, including the light emitting module according to any one of the various embodiments of the third aspect.

附图说明Description of drawings

为了更清楚地说明本发明实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.

图1为现有的匀光器的结构示意图;Fig. 1 is the structural representation of the existing light homogenizer;

图2为图1中的匀光器的远场出射光场分布示例;FIG. 2 is an example of the far-field outgoing light field distribution of the light homogenizer in FIG. 1;

图3为本发明的一实施例提供的匀光器的制作方法的流程示意图;3 is a schematic flowchart of a method for manufacturing a light homogenizer according to an embodiment of the present invention;

图4为本发明的又一实施例提供的匀光器的制作方法中多个随机多边形的分布示意图;4 is a schematic diagram of the distribution of a plurality of random polygons in a method for manufacturing a light homogenizer provided by another embodiment of the present invention;

图5为本发明的又一实施例提供的匀光器的制作方法中多个随机多边形的分布示意图;5 is a schematic diagram of the distribution of a plurality of random polygons in a method for manufacturing a light homogenizer provided by another embodiment of the present invention;

图6为本发明的一实施例提供的匀光器的结构示意图;6 is a schematic structural diagram of a light homogenizer provided by an embodiment of the present invention;

图7为图6中的匀光器的远场出射光场分布示例。FIG. 7 is an example of the far-field outgoing light field distribution of the light homogenizer in FIG. 6 .

具体实施方式Detailed ways

下面将结合本发明的具体实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the specific embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. . Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

匀光器是一类能将输入光束变换成特定输出光束的微光学元件,能生成特定需求的光斑形状和能量分布。如图1所示,目前市场上的匀光器大多为规则的微透镜阵列元件,以实现均匀光斑照明,这种规则阵列元件中每个子透镜单元都是一样的形状大小,其特点是排布结构简单,易于设计和加工检测,但周期重复的结构在相干光源通过时干涉效应明显,如图2所示,在实际应用中往往会产生波纹状的光斑不均效果,对实际应用产生不良影响。A diffuser is a type of micro-optical element that can transform an input beam into a specific output beam, and can generate a specific required spot shape and energy distribution. As shown in Figure 1, most of the light homogenizers on the market are regular micro-lens array elements to achieve uniform spot illumination. Each sub-lens unit in this regular array element has the same shape and size, which is characterized by the arrangement of The structure is simple, easy to design and process inspection, but the periodic structure has obvious interference effect when the coherent light source passes through, as shown in Figure 2, in practical applications, it often produces a ripple-like uneven spot effect, which has adverse effects on practical applications. .

针对上述问题,如图3所示,本申请提供了一种匀光器的制作方法,所述匀光器的制作方法包括但不限于如下步骤:In view of the above problems, as shown in FIG. 3 , the present application provides a method for making a light homogenizer, and the method for making the light homogenizer includes but is not limited to the following steps:

步骤S310:将多个基础多边形中每一个的顶点在基准面内随机偏移,以形成与所述多个基础多边形对应的多个随机多边形。Step S310: Randomly offset the vertices of each of the plurality of basic polygons within the reference plane to form a plurality of random polygons corresponding to the plurality of basic polygons.

具体的说,匀光器包括基底和设置于基底上的多个微透镜,基底包括相对的入光面和出光面,多个微透镜设置于基底的出光面上。在通过软件对匀光器进行仿真设计时,会预先设置用于表征基底的出光面的基准面,即该基准面相当于是基底的出光面。如图4和图5,基准面上阵列分布有多个基础多边形区域,每一个基础多边形区域具有相应的基础多边形以及对应基础多边形的顶点。其中,基础多边形区域一般为三角形、四变形、五边形等规则的多边形区域,例如,基础多边形区域为矩形区域,该矩形区域具有矩形边界以及四个顶点。Specifically, the homogenizer includes a base and a plurality of microlenses disposed on the base, the base includes opposite light incident surfaces and a light exit surface, and the multiple microlenses are disposed on the light exit surface of the base. When simulating the design of the light homogenizer through software, a reference plane for characterizing the light-emitting surface of the substrate is preset, that is, the reference plane is equivalent to the light-emitting surface of the substrate. As shown in FIG. 4 and FIG. 5 , a plurality of basic polygon areas are distributed in an array on the reference plane, and each basic polygon area has a corresponding basic polygon and vertices corresponding to the basic polygon. The basic polygonal area is generally a regular polygonal area such as a triangle, a quadrilateral, and a pentagon. For example, the basic polygonal area is a rectangular area, and the rectangular area has a rectangular boundary and four vertices.

将每一个基础多边形的顶点在基准面内做一定的随机偏移,随机偏移是指顶点在基准面内偏移的方向、次数和距离中的至少一个为随机。可选的,在一具体的实施例中,任意一个基础多边形的任意一个顶点随机偏移的距离为0.05a-0.2a,其中,a为基础多边形的边长的平均值。The vertices of each basic polygon are randomly offset in the reference plane, and the random offset means that at least one of the direction, times and distance of the vertices offset in the reference plane is random. Optionally, in a specific embodiment, the distance by which any vertex of any basic polygon is randomly offset is 0.05a-0.2a, where a is the average value of the side lengths of the basic polygon.

随机偏移后的任意一个基础多边形的顶点用于限定出与任意一个基础多边形对应的随机多边形,即将一个基础多边形随机偏移后的顶点连接,则能够形成一个随机多边形,那么将多个基础多边形随机偏移后的顶点分别连接,则能够对应形成多个随机多边形,其中,任意一个随机多边形用于表征对应的微透镜于基底上投影的边界,即一个随机多边形代表一个微透镜于基底上投影的边界。例如,如图4所示,基础多边形为四边形,将一个基础多边形A1的四个顶点D1、D2、D3和D4随机偏移一次(图4中箭头为顶点偏移的方向),即可得到偏移后的顶点d1、d2、d3和d4,将偏移后的顶点d1、d2、d3和d4依次连接,就能得到基础多边形A1对应的随机多边形S1。The randomly offset vertices of any basic polygon are used to define a random polygon corresponding to any basic polygon, that is, by connecting the randomly offset vertices of a basic polygon, a random polygon can be formed, then a plurality of basic polygons can be formed. If the randomly shifted vertices are connected respectively, a plurality of random polygons can be formed correspondingly, wherein any random polygon is used to represent the boundary of the projection of the corresponding microlens on the substrate, that is, a random polygon represents the projection of a microlens on the substrate. border. For example, as shown in Figure 4, the basic polygon is a quadrilateral, and the four vertices D1, D2, D3 and D4 of a basic polygon A1 are randomly offset once (the arrow in Figure 4 is the direction of the vertex offset), and the partial By connecting the shifted vertices d1, d2, d3, and d4 in sequence, the random polygon S1 corresponding to the basic polygon A1 can be obtained by connecting the shifted vertices d1, d2, d3, and d4 in sequence.

由于一个基础多边形的每一个顶点偏移的方向、次数和距离中的至少一个为随机的,那么由该基础多边形形成的随机多边形的边数、边长以及相邻两个边之间的夹角也都会随机的,故由多个基础多边形能够形成多个形状各异的随机多边形。例如,当基础多边形为四边形时,若随机将四边形的每个顶点随机变为1到2个顶点,则可以随机产生4-8边形,例如,如图5所示,将基础多边形A2为四边形,将基础多边形A2的一个顶点D5进行两次随机偏移(图5中箭头为顶点偏移的方向),那么由一个顶点D5就能得到两个偏移后的顶点d51和d52。再如,当基础多边形为八边形时,若随机将八边形中任意四个顶点中的每个顶点都随机偏移一次,那么每个顶点会产生0到1个顶点(顶点变成0个是指八边形中偏移后的两个顶点重合,进而两个顶点变成一个顶点,相当于消除了一个顶点),则也可以随机产生4-8边形。Since at least one of the direction, number of times and distance of offset of each vertex of a basic polygon is random, then the number of sides, the length of sides and the angle between two adjacent sides of the random polygon formed by the basic polygon are random. are also random, so multiple random polygons of different shapes can be formed from multiple basic polygons. For example, when the basic polygon is a quadrilateral, if each vertex of the quadrilateral is randomly changed to 1 to 2 vertices, 4-8 polygons can be randomly generated. For example, as shown in Figure 5, the basic polygon A2 is a quadrilateral , a vertex D5 of the basic polygon A2 is randomly offset twice (the arrow in Figure 5 is the direction of vertex offset), then two offset vertices d51 and d52 can be obtained from one vertex D5. For another example, when the basic polygon is an octagon, if each vertex of any four vertices in the octagon is randomly offset once, then each vertex will generate 0 to 1 vertex (the vertex becomes 0). One refers to the coincidence of the two offset vertices in the octagon, and then the two vertices become one vertex, which is equivalent to eliminating one vertex), then 4-8 polygons can also be randomly generated.

步骤S320:根据所述多个随机多边形、多个微透镜中心和基础面型公式,生成匀光器模型。Step S320: Generate a diffuser model according to the plurality of random polygons, the plurality of microlens centers and the basic surface shape formula.

具体的说,任意一个微透镜中心用于表征对应的微透镜于基底上投影的中心。其中,多个微透镜中心可以是预先选定的。当然,多个微透镜中心也可以是随机选择的,例如,在一具体的实施例中,在所述根据所述多个随机多边形、多个微透镜中心和基础面型公式,生成匀光器模型的步骤之前,所述匀光器的制作方法还包括步骤:在每一个所述随机多边形内随机确定一个微透镜中心,以得到所述多个微透镜中心。这样在每一个随机多边形内的一个随机位置设置该随机多边形内的微透镜中心,这样多个微透镜的形状和中心均是随机分布的,有利于有效消除干涉效应造成的光斑波纹不均问题。可选的,在一具体的实施例中,任意一个随机多边形内的微透镜中心与任意一个随机多边形对应的基础多边形的中心之间的距离为b,且b<0.1a,其中,a为基础多边形的边长的平均值。Specifically, the center of any microlens is used to represent the center of the projection of the corresponding microlens on the substrate. The plurality of microlens centers may be preselected. Of course, the centers of the plurality of microlenses may also be randomly selected. For example, in a specific embodiment, according to the plurality of random polygons, the centers of the plurality of microlenses, and the formula for the basic surface shape, the homogenizer is generated Before the step of modeling, the manufacturing method of the light homogenizer further includes the step of randomly determining a microlens center in each of the random polygons to obtain the plurality of microlens centers. In this way, the center of the microlenses in each random polygon is set at a random position in the random polygon, so that the shapes and centers of the plurality of microlenses are randomly distributed, which is beneficial to effectively eliminate the uneven spot ripple caused by the interference effect. Optionally, in a specific embodiment, the distance between the center of the microlens in any random polygon and the center of the basic polygon corresponding to any random polygon is b, and b<0.1a, where a is the basis The average of the side lengths of the polygons.

确定了多个随机多边形和多个微透镜中心,也相当于确定了多个微透镜于基底上投影的边界和中心,再结合预先选定的微透镜的基础面型公式,就可以唯一确定多个微透镜的形貌。其中,基础面型公式可以根据实际情况进行选定。例如,基础面型公式可以为偶次非球面公式1-1。Determining multiple random polygons and multiple microlens centers is equivalent to determining the boundary and center of the projection of multiple microlenses on the substrate. Combined with the pre-selected basic surface formula of the microlens, the multiple microlenses can be uniquely determined. Morphology of a microlens. Among them, the basic surface formula can be selected according to the actual situation. For example, the base surface formula may be the even-order aspheric formula 1-1.

Figure BDA0002383060050000051
Figure BDA0002383060050000051

其中,r2=x2+y2,c=1/R,R为曲面顶点曲率半径,k为圆锥系数,α1、α2、α3、α4、α5、α6为高次项系数。可选的,公式1-1可以采用如下两组参数。Among them, r 2 =x 2 +y 2 , c=1/R, R is the curvature radius of the vertex of the surface, k is the conic coefficient, α 1 , α 2 , α 3 , α 4 , α 5 , α 6 are higher-order terms coefficient. Optionally, Formula 1-1 may adopt the following two sets of parameters.

RR kk α<sub>1</sub>α<sub>1</sub> α<sub>2</sub>α<sub>2</sub> α<sub>3</sub>α<sub>3</sub> α<sub>4</sub>α<sub>4</sub> α<sub>5</sub>α<sub>5</sub> 参数组1parameter group 1 0.0138880.013888 -1.16301-1.16301 00 5684.6188965684.618896 -1.256212237e<sup>7</sup>-1.256212237e<sup>7</sup> 6.481978431e<sup>9</sup>6.481978431e<sup>9</sup> 00 参数组2parameter group 2 0.0210810.021081 -0.7528-0.7528 00 00 00 00 00

再如,基础面型公式可以为双锥面公式1-2。For another example, the basic surface type formula may be the biconical surface formula 1-2.

Figure BDA0002383060050000061
Figure BDA0002383060050000061

其中,cx,cy,kx,ky分别为x,y截面的顶点曲率和圆锥系数。Among them, c x , cy , k x , and ky are the vertex curvature and conic coefficient of the x and y sections, respectively.

步骤S330:根据所述匀光器模型制作所述匀光器。Step S330: Manufacture the light homogenizer according to the light homogenizer model.

具体地说,在得到匀光器模型之后,可以根据匀光器模型的设计参数来制作匀光器。可选的,根据匀光器模型制作匀光器可以通过如下步骤来实现。Specifically, after the homogenizer model is obtained, the homogenizer can be fabricated according to the design parameters of the homogenizer model. Optionally, making a light homogenizer according to the light homogenizer model can be achieved by the following steps.

首先,模拟检测所述匀光器模型的光学效果。First, the optical effects of the diffuser model are simulated and tested.

然后,若所述匀光器模型的光学效果满足预设条件,则根据所述匀光器模型制作所述匀光器。Then, if the optical effect of the homogenizer model satisfies a preset condition, the homogenizer is fabricated according to the homogenizer model.

具体的说,在根据多个随机多边形、多个微透镜中心和基础面型公式等设计参数生成匀光器模型之后,可以使用软件模拟匀光器模型的整体光学效果。若匀光器模型的光学效果满足预设条件,则根据匀光器模型制作匀光器。若匀光器模型的光学效果不满足预设条件,调整各项设计参数,直至根据调整后的设计参数生成的匀光器模型的光学效果满足预设条件。其中,调整各项设计参数的方法有多种,可以是调整基础面型公式中的面型对应的曲率系数、圆锥系数、高次项系数等,例如,当基础面型公式为球面公式时,通过调整球面公式的R值,可以明显调整整体元件的聚焦效果;也可以是调整允许的随机偏移数据,每次的随机偏移数据效果是不一样的,需要多次生成随机数据,找到最佳随机数据。Specifically, after generating the diffuser model according to design parameters such as multiple random polygons, multiple microlens centers, and basic surface formula, software can be used to simulate the overall optical effect of the diffuser model. If the optical effect of the diffuser model meets the preset conditions, the diffuser is fabricated according to the diffuser model. If the optical effect of the diffuser model does not meet the preset conditions, adjust various design parameters until the optical effect of the diffuser model generated according to the adjusted design parameters satisfies the preset conditions. Among them, there are many ways to adjust various design parameters, which can be to adjust the curvature coefficient, conic coefficient, high-order coefficient, etc. corresponding to the surface shape in the basic surface shape formula. For example, when the basic surface shape formula is a spherical formula, By adjusting the R value of the spherical formula, the focusing effect of the overall component can be significantly adjusted; it can also be adjusted to allow random offset data. The effect of each random offset data is different. It is necessary to generate random data multiple times to find the most random offset data. best random data.

可选的,若匀光器模型的光学效果不满足预设条件,则调整多个随机多边形、多个微透镜中心和基础面型公式中的至少一项,以生成调整后的匀光器模型;模拟检测调整后的匀光器模型的光学效果;若调整后的匀光器模型的光学效果满足预设条件,则根据调整后的匀光器模型制作匀光器。Optionally, if the optical effect of the diffuser model does not meet the preset conditions, adjust at least one of the multiple random polygons, the multiple microlens centers, and the basic surface formula to generate an adjusted diffuser model. ; Simulate and detect the optical effect of the adjusted diffuser model; if the optical effect of the adjusted diffuser model satisfies the preset conditions, make a diffuser according to the adjusted diffuser model.

本申请通过随机偏移的方式形成了微透镜在基底上的不规则边界,由于匀光器中的多个微透镜的形状是随机分布的,随机性将打乱其干涉性,故能够有效消除干涉效应造成的光斑波纹不均问题。并且,本申请是通过少量参数控制所有微透镜的随机效果,有利于匀光器的整体设计优化。In the present application, the irregular boundaries of the microlenses on the substrate are formed by random offset. Since the shapes of the plurality of microlenses in the light homogenizer are randomly distributed, the randomness will disrupt their interference, so it can effectively eliminate the The problem of uneven spot ripple caused by interference effect. In addition, the present application controls the random effects of all microlenses through a small number of parameters, which is beneficial to the overall design optimization of the diffuser.

本申请还提供了一种匀光器,该匀光器为采用如上所述的匀光器的制作方法制成的匀光器。The present application also provides a light homogenizer, which is a light homogenizer manufactured by using the above-mentioned manufacturing method of a light homogenizer.

如图6所示,该匀光器100包括基底(未在图中示出)和多个微透镜1。基底包括相对的入光面和出光面,多个微透镜1设置于基底的出光面上。并且,每一个微透镜1包括靠近基底的底面、以及远离基底的顶面。As shown in FIG. 6 , the diffuser 100 includes a substrate (not shown in the figure) and a plurality of microlenses 1 . The substrate includes opposite light incident surfaces and light outgoing surfaces, and a plurality of microlenses 1 are disposed on the light outgoing surfaces of the substrate. Also, each microlens 1 includes a bottom surface close to the substrate and a top surface away from the substrate.

在一具体的实施例中,每一个微透镜1于基底上投影的边界的平均边长为s,且s为10μm-50μm。通过优化s的范围,不但避免了微透镜1太大或太小不利于加工成型的问题,还能避免微透镜1太小导致衍射效应变强,反射光难以控制的问题。进一步的,s为30μm-40μm。In a specific embodiment, the average side length of the boundary projected by each microlens 1 on the substrate is s, and s is 10 μm-50 μm. By optimizing the range of s, not only the problem that the microlens 1 is too large or too small is not conducive to processing and molding, but also the problem that the microlens 1 is too small to cause the diffraction effect to become stronger and the reflected light to be difficult to control. Further, s is 30 μm-40 μm.

在一具体的实施例中,每一个微透镜1的顶面的顶点(每一个微透镜1的顶点即该微透镜1的顶面与光轴之间的交点)处的曲率半径为R,且R为5μm-100μm。R值通常是与s值相关的,实际设计时最佳R值就在s值的0.5-2倍之间,通过优化R值范围,有利于实现产品设计。进一步的,R为20μm-60μm。In a specific embodiment, the radius of curvature at the vertex of the top surface of each microlens 1 (the vertex of each microlens 1 is the intersection between the top surface of the microlens 1 and the optical axis) is R, and R is 5 μm-100 μm. The R value is usually related to the s value. In actual design, the optimal R value is between 0.5-2 times the s value. By optimizing the R value range, it is beneficial to realize product design. Further, R is 20 μm-60 μm.

本申请的匀光器100中的多个微透镜1的形状是随机分布的,随机性将打乱其干涉性,故能够有效消除干涉效应造成的光斑波纹不均问题(请对比图2和图7,现有的匀光器有波纹问题,而本申请的匀光器100没有波纹问题)。The shapes of the plurality of microlenses 1 in the homogenizer 100 of the present application are randomly distributed, and the randomness will disrupt the interference, so the problem of uneven spot ripple caused by the interference effect can be effectively eliminated (please compare FIG. 2 and FIG. 2 ). 7. The existing light homogenizer has a ripple problem, while the light homogenizer 100 of the present application has no ripple problem).

本申请还提供了一种光发射模组,该光发射模组包括如上所述的匀光器。The present application also provides a light emitting module, the light emitting module comprising the above-mentioned light homogenizer.

本申请还提供了一种电子设备,该电子设备可以为平板电脑、手机、笔记本电脑、车载设备、可穿戴设备、手电筒、台灯或投影灯等设备。具体的,该电子设备包括如上所述的光发射模组。The present application also provides an electronic device, which can be a tablet computer, a mobile phone, a notebook computer, a vehicle-mounted device, a wearable device, a flashlight, a desk lamp, or a projection lamp and other devices. Specifically, the electronic device includes the above-mentioned light emitting module.

以上对本申请实施例进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的一般技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The embodiments of the present application have been introduced in detail above, and the principles and implementations of the present application are described in this paper by using specific examples. The descriptions of the above embodiments are only used to help understand the methods and core ideas of the present application; at the same time, for Persons of ordinary skill in the art, based on the idea of the present application, will have changes in the specific implementation manner and application scope. In summary, the contents of this specification should not be construed as limitations on the present application.

Claims (10)

1. A method for manufacturing a light homogenizer comprises a substrate and a plurality of micro-lenses arranged on a light-emitting surface of the substrate, and is characterized in that the method comprises the following steps:
randomly offsetting vertexes of each base polygon in a reference plane to form a plurality of random polygons corresponding to the base polygons, wherein the reference plane is used for representing a light emergent surface of the substrate, a plurality of base polygon areas are distributed on the reference plane in an array manner, each base polygon area is provided with a corresponding base polygon and vertexes of the corresponding base polygon, at least one of the direction, the number and the distance of the vertex offsetting is random, the vertexes of any base polygon after random offsetting are used for defining a random polygon corresponding to the any base polygon, and any random polygon is used for representing the projection boundary of the corresponding microlens on the substrate;
generating a light evener model according to the plurality of random polygons, the centers of the plurality of microlenses and a basic surface type formula, wherein the center of any one microlens is used for representing the center of the projection of the corresponding microlens on the substrate;
Manufacturing the light homogenizer according to the light homogenizer model;
the random offset distance of the vertex is 0.05a-0.2a, wherein a is the average value of the side length of the basic polygon;
the step of manufacturing the light homogenizer according to the light homogenizer model specifically comprises the following steps:
simulating and detecting the optical effect of the dodging device model;
if the optical effect of the light homogenizer model meets a preset condition, manufacturing the light homogenizer according to the light homogenizer model;
after the step of simulating and detecting the optical effect of the light homogenizer model, the method for manufacturing the light homogenizer further comprises the following steps:
if the optical effect of the dodging device model does not meet the preset condition, adjusting at least one of the plurality of random polygons, the plurality of micro-lens centers and the basic surface type formula to generate an adjusted dodging device model;
simulating and detecting the optical effect of the adjusted dodging device model;
and if the optical effect of the adjusted light homogenizer model meets the preset condition, manufacturing the light homogenizer according to the adjusted light homogenizer model.
2. The method of fabricating a light homogenizer according to claim 1, wherein prior to the step of generating a model of the light homogenizer based on the plurality of random polygons, the plurality of microlens centers, and a base surface type formula, the method of fabricating the light homogenizer further comprises the steps of:
And randomly determining a microlens center in each random polygon to obtain the plurality of microlens centers.
3. The method according to claim 2, wherein a distance between a center of the microlens in any one of the random polygons and a center of a base polygon corresponding to the any one of the random polygons is b, and b < 0.1a, where a is an average of side lengths of the base polygons.
4. A light homogenizer characterized by being manufactured by the method of manufacturing a light homogenizer according to any one of claims 1 to 3.
5. The light integrator of claim 4, wherein each microlens in the light integrator has a boundary projected on a substrate of the light integrator with an average side length s, and s is from 10 μm to 50 μm.
6. The homogenizer of claim 5, wherein s is from 30 μm to 40 μm.
7. The light integrator of claim 4, wherein the microlenses in the light integrator each comprise a top surface remote from a base of the light integrator, the top surface of each of the microlenses having a radius of curvature at a vertex of R, and R is from 5 μm to 100 μm.
8. The light homogenizer of claim 7, wherein R is from 20 μm to 60 μm.
9. A light emitting module comprising the light homogenizer as claimed in any one of claims 4 to 8.
10. An electronic device comprising the light emission module of claim 9.
CN202010088941.0A 2020-02-12 2020-02-12 Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment Active CN111239863B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010088941.0A CN111239863B (en) 2020-02-12 2020-02-12 Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010088941.0A CN111239863B (en) 2020-02-12 2020-02-12 Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment

Publications (2)

Publication Number Publication Date
CN111239863A CN111239863A (en) 2020-06-05
CN111239863B true CN111239863B (en) 2022-06-28

Family

ID=70873185

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010088941.0A Active CN111239863B (en) 2020-02-12 2020-02-12 Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment

Country Status (1)

Country Link
CN (1) CN111239863B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112666639A (en) * 2021-01-05 2021-04-16 江西欧迈斯微电子有限公司 Micro lens array and manufacturing method thereof, light homogenizing element and imaging module
CN113406735B (en) * 2021-06-15 2022-08-16 苏州燃腾光电科技有限公司 Random micro-lens array structure, design method and application thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1688907A (en) * 2002-09-20 2005-10-26 康宁股份有限公司 Random microlens array for optical beam shaping and homogenization
CN102132175A (en) * 2008-09-18 2011-07-20 第一毛织株式会社 Diffusing film having micro lens pattern and embossed pattern
CN109541810A (en) * 2018-12-20 2019-03-29 珠海迈时光电科技有限公司 A kind of light uniforming device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015169804A (en) * 2014-03-07 2015-09-28 株式会社リコー Lens array, image display device, and moving body

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1688907A (en) * 2002-09-20 2005-10-26 康宁股份有限公司 Random microlens array for optical beam shaping and homogenization
CN102132175A (en) * 2008-09-18 2011-07-20 第一毛织株式会社 Diffusing film having micro lens pattern and embossed pattern
CN109541810A (en) * 2018-12-20 2019-03-29 珠海迈时光电科技有限公司 A kind of light uniforming device

Also Published As

Publication number Publication date
CN111239863A (en) 2020-06-05

Similar Documents

Publication Publication Date Title
CN107850697B (en) Diffusion plate, display device, projection device, and illumination device
CN105221974B (en) Method for designing based on the polynomial LED free form surfaces illuminators of XY
CN111239863B (en) Light homogenizer and manufacturing method thereof, light emission module, and electronic equipment
CN107942520B (en) Dodging element for DMD digital lithography system and its design method
CN119805639A (en) Optical body, diffusion plate, display device, projection device, and illumination device
US12169064B2 (en) Microstructures for transforming light having Lambertian distribution into batwing distributions
CN104864278B (en) LED Freeform Surface Lighting System
CN106932853B (en) Light guide plate design method, light guide plate, mesh point distribution method and lighting device
US20240230959A1 (en) Micro-lens array, projection type image display device, method for designing micro-lens array, and method for manufacturing micro-lens array
CN104864279A (en) LED free-form surface lighting system design
CN208847938U (en) A kind of projection lens system and projective module group
CN207908819U (en) Lens system, structured light projection module and depth camera
CN110632684A (en) Metasurface Sparse Aperture Lens
JP7142817B2 (en) Method for designing anisotropic optical lenses
JP2022019243A (en) Microlens array and microlens array fabrication method
CN207408730U (en) A kind of efficient, even light shaping lighting system of high uniformity passive beam
TWI642976B (en) Free-form surface lighting system
CN216449885U (en) Light distribution element and projection device
CN111123532A (en) Planar light source beam shaping method and device based on holographic transfer
KR102159203B1 (en) Microlenses Array For Beam Shaping And Homogenization
CN217543430U (en) Microlens array substrate, microlens array projection device and vehicle
CN104749664B (en) Camera lens module and eyeglass, wafer scale lens array and preparation method thereof
CN101334493B (en) Composite lens structure and method for forming same
CN118550019A (en) A free-form surface microlens array diffuser based on equal-area random grid
JP2024012499A (en) Microlens array and projection type image display device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information
CB02 Change of applicant information

Address after: 330096 No.699 Tianxiang North Avenue, Nanchang hi tech Industrial Development Zone, Nanchang City, Jiangxi Province

Applicant after: Jiangxi OMS Microelectronics Co.,Ltd.

Address before: 330096 Jiangxi Nanchang Nanchang hi tech Industrial Development Zone, east of six road, south of Tianxiang Avenue.

Applicant before: OFilm Microelectronics Technology Co.,Ltd.

Address after: 330096 Jiangxi Nanchang Nanchang hi tech Industrial Development Zone, east of six road, south of Tianxiang Avenue.

Applicant after: OFilm Microelectronics Technology Co.,Ltd.

Address before: 330013 No.698 Tianxiang Avenue, high tech Zone, Nanchang City, Jiangxi Province

Applicant before: NANCHANG OFILM BIO-IDENTIFICATION TECHNOLOGY Co.,Ltd.

GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: 330096 No.699 Tianxiang North Avenue, Nanchang hi tech Industrial Development Zone, Jiangxi Province

Patentee after: Oufei Microelectronics (Nanchang) Co.,Ltd.

Country or region after: China

Address before: No. 699 Tianxiang North Avenue, Nanchang High tech Industrial Development Zone, Nanchang City, Jiangxi Province

Patentee before: Jiangxi OMS Microelectronics Co.,Ltd.

Country or region before: China