CN111072691A - 一种光阻材料及其制备方法、彩膜基板 - Google Patents
一种光阻材料及其制备方法、彩膜基板 Download PDFInfo
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Abstract
Description
技术领域
本申请涉及光阻领域,具体涉及一种光阻材料及其制备方法、彩膜基板。
背景技术
液晶显示依靠色阻材料复现色彩,显示领域的色阻材料由不同显色颜料制作。由于颜料在工业用溶剂PGMEA中溶解性不好,通常在制作过程中将其稳定分散在溶剂中。之前颜料颗粒分散手法涉及步骤太多,如分子结晶度的控制,颜料颗粒物理研磨以及尺寸控制,颗粒的稳定化处理等,每一步都会对色阻膜层穿透造成影响,使不可控因素增多。并且以物理研磨的方式制备的晶体颗粒约50纳米,由于颗粒尺寸较大,在光通路上往往对其造成明显的散射作用,引起光的损耗。
为解决这一问题,通常研究者把工作聚焦于色阻材料分子结构的改良上,目前通用方法为将颜料分子增溶,在主体分子上加上空间位阻大的取代侧基,阻碍分子间聚集,使其以分子态存在于光阻液中,这使得光散射引起的光损耗大大降低。
发明内容
本申请实施例提供了一种光阻材料,包括低聚物链段,其化学结构式为:
本发明还提供了一种光阻材料的制备方法,包括将化合物1溶于四氢呋喃搅拌形成第一溶液,在所述第一溶液中加入氢化钠形成第二溶液,在所述第二溶液中加入化合物2,在60℃的条件下搅拌6小时后纯化分离得到化合物3;其中,所述化合物1的化学结构为:
所述化合物2的化学结构式为:
所述化合物3的化学结构式为:
进一步的,所述化合物1和所述氢化钠的摩尔比为4:1;所述化合物1和所述化合物2的摩尔比为4:1.5。
进一步的,还包括将所述化合物3和所述低聚物链段溶于甲苯中形成第一溶液,在所述第一溶液中加入催化剂,在室温下反应30分钟后通过纯化处理得到所述光阻材料;
其中,所述光阻材料的化学结构式为:
进一步的,所述化合物3和所述低聚物链段的摩尔比为1:1。
进一步的,所述低聚物链段中的R包括:非共轭结构的直链烷烃、有支链的烷烃、有烷氧基的烷烃、卤取代烷烃衍生物、通过烷氧基以及酯基相连接的共轭结构或含有杂环的化合物中的至少一种;其中,所述杂环化合物包括五元杂环、六元杂环或苯并杂环化合物中的至少一种;所述五元杂环化合物包括呋喃、噻吩、吡咯、噻唑、咪唑中的至少一种;所述六元杂环化合物包括吡啶、吡嗪、嘧啶、哒嗪中的至少一种。
进一步的,R结构中的碳链长度为1~3。
进一步的,所述催化剂为五甲基环戊二烯氯化钌。
进一步的,所述化合物3的化学结构式还包括
本发明还提供了一种彩膜基板,包括色阻层,所述色阻层的材料包括所述光阻材料。
有益效果:本发明的光阻材料及其制备方法、墨水将染料与低聚物链段相连形成具有耐热性的光阻材料,同时通过低聚物链段的间隔可以分散染料分子,提高光阻材料的溶解性,达到进一步增溶的效果,采用光阻材料作为原材料的墨水能够制备具有高对比度和高穿透率的彩色滤光片。
附图说明
下面结合附图,通过对本申请的具体实施方式详细描述,将使本申请的技术方案及其它有益效果显而易见。
图1是实施例中的遮光层制备步骤图;
图2是实施例中的色阻层制备步骤图;
图3是实施例中的彩膜基板示意图。
具体实施方式
实施例
本实施例中,本发明的光阻材料通过链接化学(cl ick)反应将现有色阻材料与低聚物链段相连形成所述光阻材料。
所述低聚物链段的化学结构式为:
n的取值为1~2。
所述低聚物链段中的R包括非共轭结构的直链烷烃、有支链的烷烃、有烷氧基的烷烃、卤取代烷烃衍生物、通过烷氧基以及酯基相连接的共轭结构或含有杂环的化合物中的至少一种;其中,所述杂环化合物包括五元杂环、六元杂环或苯并杂环化合物中的至少一种。
所述五元杂环化合物包括呋喃、噻吩、吡咯、噻唑、咪唑中的至少一种。
所述六元杂环化合物包括吡啶、吡嗪、嘧啶、哒嗪中的至少一种。
本实施例中,本发明的采用酞菁分子与所述低聚物链段相连形成光阻材料,所述光阻材料的化学结构式为:
所述光阻材料的具体制备步骤包括
将化合物1溶于四氢呋喃搅拌形成第一溶液,在所述第一溶液中加入氢化钠形成第二溶液,在所述第二溶液中加入化合物2,在60℃的条件下搅拌6小时后纯化分离得到化合物3;
将所述化合物3和低聚物链段溶于甲苯中形成第一溶液,在所述第一溶液中加入五甲基环戊二烯氯化钌作为催化剂,在室温下反应30分钟后通过纯化处理得到所述光阻材料;
其中,所述化合物1和所述氢化钠的摩尔比为4:1;所述化合物1和所述化合物2的摩尔比为4:1.5。
所述化合物1的化学结构为:
反应合成路线为:
在本发明的其他优选实施例中,所述光阻材料中的所述低聚物链段可以连接其他不同颜色的材料,即所述化合物3的化学结构式还包括:
为了更好的解释本发明,本实施例中还提供了一种彩膜基板1,包括色阻层10,分布于所述彩膜基板1上,用以实现彩膜基板1的彩色显示。
所述色阻层10的材料包括所述光阻材料,其具体制备方法如下:
如图3所示,将所述光阻材料溶于有机溶剂中配制成墨水,利用喷墨打印方式制备成所述色阻层10,其中,所述有机溶剂包括烷烃、饱和环烷烃、双环烷烃、多环烷烃、醚、单个或多个苯环烷烃中的至少一种。
所述有机溶剂占所述墨水的质量数范围是40wt%-99.9wt%;所述光阻材料占所述墨水的质量数范围是0.1wt%-60wt%。
具体步骤包括:
如图1所示,玻璃基板上制备遮光层101,在所述遮光层101上制备若干透光孔;
如图2所示,在所述透光孔内通过喷墨打印技术制备色阻单元102,所述色阻单元包括红色色阻单元、绿色色阻单元和蓝色色阻单元,相邻两个所述透光孔内的所述色组单元颜色不同。
以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想;本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。
Claims (10)
3.根据权利要求2所述的光阻材料的制备方法,其特征在于,
所述化合物1和所述氢化钠的摩尔比为4:1;
所述化合物1和所述化合物2的摩尔比为4:1.5。
5.根据权利要求4所述的光阻材料的制备方法,其特征在于,
所述化合物3和所述低聚物链段的摩尔比为1:1。
6.根据权利要求4所述的光阻材料的制备方法,其特征在于,所述低聚物链段中的R包括:
非共轭结构的直链烷烃、有支链的烷烃、有烷氧基的烷烃、卤取代烷烃衍生物、通过烷氧基以及酯基相连接的共轭结构或含有杂环的化合物中的至少一种;其中,所述杂环化合物包括五元杂环、六元杂环或苯并杂环化合物中的至少一种;
所述五元杂环化合物包括呋喃、噻吩、吡咯、噻唑、咪唑中的至少一种;
所述六元杂环化合物包括吡啶、吡嗪、嘧啶、哒嗪中的至少一种。
7.根据权利要求6所述的光阻材料的制备方法,其特征在于,
R结构中的碳链长度为1~3。
8.根据权利要求4所述的光阻材料的制备方法,其特征在于,
所述催化剂为五甲基环戊二烯氯化钌。
10.一种彩膜基板,其特征在于,包括色阻层,所述色阻层的材料包括权利要求1所述的光阻材料。
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