CN111063458B - Device and method for accurately calibrating plasma injection impurities - Google Patents

Abstract

The invention discloses a device and method for accurately calibrating plasma injection impurities, comprising a vacuum chamber, an electronic balance, a plug-in valve, a guide pipe, an electrode flange, an air extraction valve, an air extraction unit and a joystick. The device simulates the vacuum environment during plasma discharge and uses an electronic balance to directly read the amount of impurities injected under different excitation conditions, which not only greatly reduces the impact of impurities caused by contamination, but also eliminates errors caused by human factors. Improve the accuracy of calibration data. The present invention can fully protect and collect the impurity particles (powder) falling when the impurity is injected into the distribution system for testing, so as to realize the reuse. The invention has strong visibility, high accuracy and strong economy, and provides effective data support and technical guarantee for accurately controlling impurity injection in fusion devices.

Description

A device and method for accurately calibrating plasma implanted impurities

technical field

The invention relates to the technical field of fusion reactor vacuum, in particular to a device and method for accurately calibrating plasma injection impurities.

Background technique

With the continuous advancement of fusion research, scientific researchers have tried to inject impurities by using the method of impurity particles falling by their own gravity. A large number of experiments such as divertor injection of lithium powder and boron powder have been carried out on many tokamak fusion devices at home and abroad. Obtained fruitful experimental results. The study found that a certain amount of impurity implantation can effectively suppress the boundary localized mode of the highly confined mode plasma. However, excessive impurity implantation may cause the plasma to rupture, which requires precise impurity implantation. control. In the bench calibration experiment of the impurity injection system, the traditional method is usually carried out in the atmospheric environment, which is very different from the plasma discharge environment, especially for powdery impurities, the drop flow difference between vacuum conditions and atmospheric conditions obvious. In addition, the impurity particles of active metals (such as lithium balls and lithium powder) are very easy to react with O ₂ , N ₂ , CO, H ₂ O, CO ₂ , etc. in the air to be polluted, which will affect the calibration results. Although there is also a method of calibration under vacuum conditions, which is to measure the volume of impurities with a sealable plexiglass graduated cylinder, and then convert it into the mass of impurities, but because it cannot directly measure the mass of falling impurities. On the one hand, individual differences in readings will introduce errors; on the other hand, affected by the regularity of the impurities themselves, the gaps between the impurity particles falling and deposited in the measuring cylinder are not uniform, and there will be large errors in simply converting the volume into mass. In addition, due to the scarcity of plasma-implanted impurity materials, the procurement cost is relatively high. If the impurity particles can be protected from contamination, reuse can save a lot of scientific research funds. Therefore, there is an urgent need for a device that can accurately calibrate the plasma implanted impurities and protect them from contamination.

SUMMARY OF THE INVENTION

The purpose of the present invention is to make up for the defects of the prior art, and to provide a device and method for accurately calibrating the impurity injected into the plasma, so as to realize the precise control of the impurity injection amount in the fusion experiment.

The present invention is achieved through the following technical solutions:

A device for accurately calibrating plasma injection impurities, including a vacuum chamber, an electronic balance, a flapper valve, a guide tube, an electrode flange, an air extraction valve, an air extraction unit, an inflation valve and a joystick; the vacuum chamber is A vacuum chamber with a glass panel, the vacuum chamber is used to fix the glass panel by welding a grooved fixing seat at one end of the cuboid tube as the front of the vacuum chamber; the other end of the cuboid tube is welded with a flat plate as a vacuum chamber Back; two holes are opened on the back of the vacuum chamber, and the exhaust pipe and the first pipe are welded respectively; one side of the cuboid pipe is selected as the top surface of the vacuum chamber, and three holes are opened on the top surface, and the third pipe is welded on the outside of the first hole. The second hole is located in the middle of the top surface, the outside and inside of the second hole are welded with the second pipe and the guide pipe respectively, and the third hole is welded with the fourth pipe; the electronic balance is placed in the vacuum chamber to keep the electronic balance in place. The tray is directly below the guide tube, and the display faces the glass panel.

Further, the rectangular parallelepiped tube is a SUS316 tube, and the flat plate is a SUS316 plate.

Further, the fixed seat with grooves is a SUS316 plate, the middle is hollowed out, and screw holes are evenly opened around.

Further, the groove is a "racetrack-shaped" groove, which is used to limit the sealing ring; the sealing ring is a "racetrack-shaped" fluororubber ring, which is used for vacuum sealing of the glass panel.

Further, the glass panel is made of pressure-resistant plexiglass, with screw holes evenly opening around it, corresponding to the screw holes of the front fixing seat of the vacuum chamber, for observing the inside of the vacuum chamber and directly reading the reading of the electronic balance.

Further, the air extraction pipeline is a SUS316 seamless pipe, one end is welded at one of the openings on the back of the vacuum chamber, and the other end is welded with a CF35 flange to connect the air extraction valve.

Further, the air extraction valve is a manual flapper valve from CF35 to KF40, the CF35 flange is butted with the CF35 flange on the air extraction pipeline, and the KF40 flange is connected to the air extraction unit through a bellows.

Further, the air extraction unit includes a JTFB-300F molecular pump, a TRP-12 mechanical pump and a ZDF-5227AX vacuum gauge, and the ultimate vacuum is 2.0×10 ^-5 Pa.

Further, the first pipe is a SUS316 seamless pipe, one end is welded at a hole on the back of the vacuum chamber, and the other end is welded with a CF35 flange to connect the electrode flange.

Further, the electrode flange is a 2-core M3 electrode CF35 flange, with a withstand voltage of 1000V and a vacuum leak rate of less than 5.0E-11Pam ³ /s; the non-vacuum side electrode of the electrode flange is connected to the output end of the voltage converter, and the other is One electrode is connected to the power input terminal of the electronic balance.

Further, after the electronic balance is powered by a voltage converter, the weight of impurities falling into the tray can be accurately measured.

Further, the voltage converter is that the input is AC 220V/0.6A, 50Hz, and the output is DC 12V/1.5A; the voltage converter continues to supply power to the electronic balance after being switched by the electrode flange.

Further, the second pipe is a SUS316 seamless pipe, one end is welded on the outside of the second hole on the top surface of the vacuum chamber, and the other end is welded with a CF50 flange to connect the plug-in valve.

Further, the plug-in valve is an ultra-high vacuum CF50 manual plug-in valve, with CF50 flange interfaces on both sides, and the vacuum leak rate is less than 1.3E-10Pam ³ /s; the vacuum-sealed side of the plug-in valve is on the second pipeline. CF50 flange connection, and the other side is connected to the impurity injection distribution system.

Further, the guide tube is a trumpet-shaped variable diameter SUS316 tube, with a large mouth of φ35 and a small mouth of φ26, and a SUS316 seamless tube welded below the small mouth.

Further, the third pipe is a SUS316 seamless pipe, one end is welded at the first hole on the top surface of the vacuum chamber, and the other end is welded with a CF35 flange to connect the joystick; the first hole is located near the top surface of the vacuum chamber. front side.

Further, the joystick is a magnetic control transmission structure, and the start/calibration key of the electronic balance is operated by rotating the joystick outside the vacuum chamber.

Further, the fourth pipe is a SUS316 seamless pipe, one end is welded at the third hole on the top surface of the vacuum chamber, and the other end is welded with a CF35 flange to connect the inflation valve; the third hole can be located on the top surface of the vacuum chamber Close to the back side or the left side or the right side.

Further, the inflation valve is a CF35 to KF40 ultra-high vacuum manual flapper valve, the CF35 flange is connected to the CF35 flange on the fourth pipeline, and the KF40 flange is connected to the inert gas.

Further, the inert gas is argon.

According to another aspect of the present invention, a method for accurately calibrating plasma implanted impurities is provided, comprising the steps of:

Step 1: Open the front glass panel of the vacuum chamber, put the electronic balance into the vacuum chamber, keep the tray of the electronic balance directly under the guide tube, and the display screen facing the glass panel; after the voltage converter is transferred by the electrode flange, it is the electronic balance powered by;

Step 2, put the sealing ring into the groove of the vacuum chamber fixing seat, close the glass panel, tighten the seal with screws, close the inflation valve and the plug valve, open the air extraction valve, and start the air extraction unit; when the vacuum degree of the vacuum chamber reaches At 5.0×10 ^-5 Pa, open the flapper valve, and the impurity injection distribution system is connected to the vacuum chamber;

Step 3, use the joystick to press the electronic balance calibration key to complete the calibration of the electronic balance; inject the impurities into the distribution system to trigger the specific voltage V1 signal, the triggering time is continuous _t1 , and the spilled impurities fall into the tray _of the electronic balance through the guide tube, After the electronic balance reading is stable, use the joystick to press the electronic balance start button to record Data1;

Step 4, use the joystick to press the electronic balance calibration key to complete the calibration of the electronic balance. The specific voltage V ₁ signal is injected into the impurity distribution system, and the trigger time is continuous t _2. The spilled impurities fall into the tray of the electronic balance through the guide tube. After the electronic balance reading is stable, use the joystick to press the electronic balance start button to record Data2 ;

Step 5, use the joystick to press the electronic balance calibration button to complete the calibration of the electronic balance _; inject the impurities into the distribution system to trigger the specific voltage V1 signal, the triggering time is continuous _t3 , the spilled impurities fall into the tray of the electronic balance through the guide tube, After the electronic balance reading is stable, use the joystick to press the electronic balance start button to record Data3;

Step 6: Calculate, under the condition of a specific voltage V ₁ , the accurate calibration data of the impurity injection amount in the impurity injection distribution system in the time period t _n ; n is a natural number;

Step 7, repeating steps 3, 4, 5 and 6 to obtain, under the condition of a specific voltage V _n , the accurate calibration data of the impurity injection amount of a certain impurity in the impurity injection distribution system in the time period t _n ;

Step 8, close the flapper valve and the air extraction valve, stop the air extraction unit, open the inflation valve, fill the vacuum chamber with inert gas to 0.2MPa, open the glass panel, and recover the impurities on the tray under the protection of the inert gas atmosphere;

Step 9, repeat steps 2-8; the calibration impurities are injected into other impurities in the distribution system.

beneficial effect

The advantages of the present invention are as follows: a device and method for accurately calibrating plasma injection impurities are provided. By simulating the vacuum environment during plasma discharge, an electronic balance can be used to directly read the amount of impurities injected under different excitation conditions, which not only maximizes It reduces the impact of impurities caused by contamination, eliminates errors caused by human factors, and improves the accuracy of calibration data. In addition, it can fully protect and collect the impurity particles (powder) that fall when the impurities are injected into the distribution system for testing, so as to realize the reuse. The invention has strong visibility, high accuracy and strong economy, and provides effective data support and technical guarantee for accurately controlling impurity injection in fusion devices.

Description of drawings

Fig. 1 is the schematic diagram of the calibration system;

Fig. 2 is the schematic diagram of the fixed seat;

Figure 3 is a schematic diagram of the glass panel and the sealing ring.

Description of reference numerals: 1 vacuum chamber, 2 suction pipe, 3 suction valve, 4 suction unit, 5 first pipe, 6 electrode flange, 7 second pipe, 8 guide pipe, 9 flapper valve, 10 electronic Balance, 11 Tray, 12 Voltage Converter, 13 Third Pipe, 14 Joystick, 15 Fourth Pipe, 16 Gas Fill Valve, 17 Inert Gas, 18 Impurity Injection Distribution System, 19 Fixture, 20 Groove, 21 Glass Panel, 22 seals.

Detailed ways

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. The components of the embodiments of the invention generally described and illustrated in the drawings herein may be arranged and designed in a variety of different configurations. Thus, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present invention.

As shown in Figure 1 (the Figure 1 is a schematic diagram, not a front view of the device of the present invention), a device for accurately calibrating plasma injection impurities includes a vacuum chamber 1, an electronic balance 10, a plug valve 9, a guide Pipe 8 , electrode flange 6 , air extraction valve 3 , air extraction unit 4 , inflation valve 16 and joystick 14 .

The vacuum chamber 1 is a vacuum chamber with a glass panel 21, with a length of 450mm, a width of 400mm, a height of 500mm, a cuboid SUS316 tube wall thickness of 2mm, and a fixed seat 19 with a groove 20 welded at one end to fix the glass panel 21. It is used as the front side of the vacuum chamber 1; the other end is welded with a 500mm×400mm×2mm SUS316 board, which is used as the back side of the vacuum chamber 1 . There are two φ38 holes on the left and right sides of the back of the vacuum chamber 1, and the exhaust pipe 2 and the first pipe 5 are welded respectively. One side of the rectangular SUS316 tube with a size of 450mm×400mm is selected as the top surface of the vacuum chamber 1. There are three holes on the midline of the short side of the top surface, the first hole is a φ38 hole, and the third pipe 13 is welded on the outside of the first hole; The second hole is located in the middle of the top surface, which is a φ55 hole. The outside and inside of the second hole are welded with the second pipe 7 and the guide pipe 8 respectively; the third hole is a φ38 hole, and the fourth pipe 15 is welded on the outside of the third hole. The third hole can be located on the top surface of the vacuum chamber close to the back side, or on the left side or the right side of the vacuum chamber; the electronic balance 10 is placed in the vacuum chamber 1, and the tray 11 of the electronic balance 10 is kept in the guide tube. 8, the display screen faces the glass panel 21.

The fixing seat 19 with the groove 20 is a SUS316 plate with a length of 530mm, a width of 430mm and a wall thickness of 10mm, with a hole of 500mm×400mm in the middle and 10 φ10 screw holes evenly around.

The groove 20 is a "racetrack-shaped" groove with a width of 5 mm and a depth of 3 mm, and the size of the center line is 510 mm×410 mm, which is used to limit the sealing ring 22 .

The sealing ring 22 is a φ5 "racetrack-shaped" fluororubber ring with a circumference of 1835 mm, which is used for vacuum sealing of the glass panel 21 .

The glass panel 21 is pressure-resistant plexiglass with a length of 530 mm, a width of 430 mm and a wall thickness of 20 mm, with φ10 screw holes evenly opened around, corresponding to the screw holes of the front fixing seat 19 of the vacuum chamber 1 . It is used to observe the inside of the vacuum chamber 1 and directly read the reading of the electronic balance 10 .

The air extraction pipe 2 is a SUS316 seamless pipe with φ38×50 mm and a wall thickness of 2 mm.

The air extraction valve 3 is an ultra-high vacuum manual flapper valve from CF35 to KF40. The CF35 flange is connected to the CF35 flange on the air extraction pipeline 2, and the KF40 flange is connected to the air extraction unit 4 through a bellows.

The air extraction unit 4 includes a JTFB-300F molecular pump, a TRP-12 mechanical pump, a ZDF-5227AX vacuum gauge, etc., and the ultimate vacuum is 2.0×10 ⁻⁵ Pa.

The first pipe 5 is a SUS316 seamless pipe with a diameter of 38×50mm and a wall thickness of 2mm.

The electrode flange 6 is a 2-core M3 electrode CF35 flange with a withstand voltage of 1000V and a vacuum leak rate of less than 5.0E-11Pam ³ /s. The non-vacuum side electrode of the electrode flange 6 is connected to the output terminal of the voltage converter 12 , and the other side electrode is connected to the power input terminal of the electronic balance 10 .

The electronic balance 10 is an AP225WD type electronic balance with a range of 102g, an accuracy of 0.01mg, an average response time of 8s, and a tray size of 91mm. After the power is supplied through the voltage converter 12, the weight of impurities falling into the tray 11 is accurately measured.

The voltage converter 12 is an NBS18C120150HC type power adapter, the input is AC 220V/0.6A, 50Hz, and the output is DC 12V/1.5A. The voltage converter 12 is easy to "explode" in a vacuum environment and cannot supply power normally. After being switched by the electrode flange 6, it can continue to supply power to the electronic balance 10.

The second pipe 7 is a SUS316 seamless pipe with a diameter of 55×80mm and a wall thickness of 2mm.

The plug-in valve 9 is an ultra-high vacuum CF50 manual plug-in valve, the valve diameter is 50mm, the two sides are CF50 flange interfaces, and the vacuum leak rate is less than 1.3E-10Pam ³ /s. The vacuum sealing side of the plug-in valve 9 is connected with the CF50 flange on the second pipeline 7 , and the other side is connected with the impurity injection and distribution system 18 .

The guide tube 8 is a horn-shaped variable diameter SUS316 tube, large mouth φ35, small mouth φ26, vertical height 20mm, wall thickness 2mm, SUS316 seamless pipe with φ26×30mm and wall thickness 2mm welded below the small mouth.

The third pipe 13 is a SUS316 seamless pipe with a diameter of 38×40 mm and a wall thickness of 2 mm. One end is welded at the first hole on the top surface of the vacuum chamber 1 , and the other end is welded with a CF35 flange to connect the joystick 14 . The first hole is located on the top side of the vacuum chamber near the front side.

The joystick 14 is a magnetic control transmission structure. By rotating the joystick 14 outside the vacuum chamber 1 , the start/calibration key of the electronic balance 10 can be operated.

The fourth pipe 15 is a SUS316 seamless pipe with a diameter of 38×40 mm and a wall thickness of 2 mm. One end is welded at the third hole on the top surface of the vacuum chamber, and the other end is welded with a CF35 flange to connect the inflation valve 16 . The third hole may be located on the top side of the vacuum chamber near the back side or on the left side or the right side.

The inflatable valve 16 is a CF35-to-KF40 ultra-high vacuum manual flapper valve, the CF35 flange is connected to the CF35 flange on the fourth pipeline 15 , and the KF40 flange is connected to the inert gas 17 .

The inert gas 17 is argon.

The present invention also provides a method for accurately calibrating plasma implanted impurities, comprising the following steps:

①Open the front glass panel 21 of the vacuum chamber 1, put the electronic balance 10 into the vacuum chamber 1, keep the tray 11 of the electronic balance 10 directly below the guide tube 8, and the display screen faces the glass panel 21. The voltage converter 12 supplies power to the electronic balance 10 after being connected by the electrode flange 6 .

② Put the sealing ring 22 into the groove 20 of the fixing seat 19 of the vacuum chamber 1, close the glass panel 21, and tighten the sealing with screws. Close the inflation valve 16 and the flap valve 9, open the air extraction valve 3, and start the air extraction unit 4. When the vacuum degree of the vacuum chamber 1 reaches 5.0×10 ⁻⁵ Pa ^, the flapper valve 9 is opened, and the impurity injection and distribution system 18 is communicated with the vacuum chamber 1 .

③ Use the joystick 14 to press the calibration key of the electronic balance 10 to complete the calibration of the electronic balance 10 . The impurity injection distribution system 18 is triggered by a specific voltage V ₁ signal, and the trigger time is continuous t ₁ . The spilled impurities fall into the tray 11 of the electronic balance 10 through the guide tube 8. After the reading of the electronic balance 10 is stable, use the joystick 14 to press the electronic Balance 10 start key, record Data1.

④ Use the joystick 14 to press the calibration key of the electronic balance 10 to complete the calibration of the electronic balance 10 . The impurity injection distribution system 18 is triggered by _a specific voltage V1 signal, and the trigger time is continuous _t2 . The spilled impurities fall into the tray 11 of the electronic balance 10 through the guide tube 8. After the reading of the electronic balance 10 is stable, use the joystick 14 to press the electronic Balance 10 start key, record Data2.

⑤ Use the joystick 14 to press the calibration key of the electronic balance 10 to complete the calibration of the electronic balance 10 . The specific voltage V1 signal _of the impurity injection distribution system 18 is triggered, and the trigger time is continuous _t3 . The spilled impurities fall into the tray 11 of the electronic balance 10 through the guide tube 8. After the reading of the electronic balance 10 is stable, use the joystick 14 to press the electronic Balance 10 start key, record Data3.

⑥ Calculated, under the condition of a specific voltage V ₁ , the accurate calibration data of the impurity injection amount of the impurity injection distribution system 18 in the time period t _n ; n is a natural number.

⑦ Repeating ③, ④, ⑤ and ⑥, can obtain accurate calibration data of the impurity implantation amount of the impurity implantation distribution system 18 in the time period _tn under the condition of a specific voltage _Vn .

⑧Close the flap valve 9 and the air extraction valve 3, stop the air extraction unit 4, open the inflation valve 16, fill the vacuum chamber 1 with an inert gas of 17 to 0.2 MPa, open the glass panel 21, and under the protection of the inert gas 17 atmosphere, The impurities on the tray 11 are recovered.

⑨ Repeat ②-⑧ to accurately calibrate other impurities in the impurity injection distribution system 18 .

The above embodiments are only used to illustrate rather than limit the technical solutions of the present invention. Although the above embodiments describe the present invention in detail, those skilled in the art should understand that the present invention can be modified or equivalently replaced without departing from the present invention. Any modifications and partial substitutions of the spirit and scope should be included within the scope of the claims of the present invention.

Claims (21)

1. The utility model provides a device of accurate calibration plasma injection impurity which characterized in that: comprises a vacuum chamber, an electronic balance, a gate valve, a guide tube, an electrode flange, an air extraction valve, an air extractor set, an inflation valve and an operating lever; the vacuum chamber is a vacuum cavity with a glass panel, and the vacuum cavity is used for fixing the glass panel as the front of the vacuum chamber by welding a fixing seat with a groove at one end of a rectangular tube; the other end of the rectangular pipe is welded with a flat plate as the back of the vacuum chamber; two holes are formed in the back of the vacuum chamber, and an air exhaust pipeline and a first pipeline are welded respectively; selecting one surface of a rectangular pipe as the top surface of a vacuum chamber, wherein the top surface is provided with three holes, a third pipeline is welded on the outer side of a first hole, a second hole is positioned in the middle of the top surface, a second pipeline and a guide pipe are respectively welded on the outer side and the inner side of the second hole, and a fourth pipeline is welded on the outer side of the third hole; the electronic balance is horizontally placed in the vacuum chamber, the tray of the electronic balance is kept right below the guide tube, and the display screen faces the glass panel.

2. The apparatus of claim 1, wherein: the rectangular tube is an SUS316 tube, and the flat plate is an SUS316 plate.

3. The apparatus of claim 1, wherein: the fixing seat with the groove is an SUS316 plate, the middle of the fixing seat is hollowed, and screw holes are uniformly formed in the periphery of the fixing seat.

4. The apparatus for precisely calibrating plasma implanted impurities as claimed in claim 1, wherein: the groove is a runway-shaped groove and is used for limiting the sealing ring; the sealing ring is a runway-shaped fluororubber ring and is used for vacuum sealing of the glass panel.

5. The apparatus of claim 1, wherein: the glass panel is made of pressure-resistant organic glass, screw holes are uniformly formed in the periphery of the glass panel and correspond to the screw holes of the fixed seat on the front side of the vacuum chamber, and the glass panel is used for observing the inside of the vacuum chamber and directly reading the reading of the electronic balance.

6. The apparatus of claim 1, wherein: the air exhaust pipeline is an SUS316 seamless pipe, one end of the air exhaust pipeline is welded at one opening on the back of the vacuum chamber, and the other end of the air exhaust pipeline is welded with a CF35 flange connected with an air exhaust valve.

7. The apparatus of claim 6, wherein: the air extraction valve is a manual baffle valve of CF 35-KF 40, a CF35 flange is butted with a CF35 flange on an air extraction pipeline, and the KF40 flange is connected with an air extractor set through a corrugated pipe.

8. The apparatus of claim 7, wherein: the air extractor set comprises a JTFB-300F type molecular pump, a TRP-12 type mechanical pump and a ZDF-5227AX type vacuum gauge, and the ultimate vacuum is 2.0 x 10 ^-5 Pa。

9. The apparatus of claim 1, wherein: the first pipeline is an SUS316 seamless pipe, one end of the first pipeline is welded at one hole on the back of the vacuum chamber, and the other end of the first pipeline is welded with a CF35 flange connected with an electrode flange.

10. The apparatus of claim 9, wherein: the electrode flange is a 2-core M3 electrode CF35 flange, the pressure resistance is 1000V, and the vacuum leakage rate is less than 5.0E-11Pam ³ S; the non-vacuum side electrode of the electrode flange is connected with the output end of the voltage converter, and the other side electrode of the electrode flange is connected with the power supply input end of the electronic balance.

11. The apparatus of claim 1, wherein: after the electronic balance is powered by the voltage converter, the weight of the impurities falling into the tray is accurately measured.

12. The apparatus of claim 11, wherein: the input of the voltage converter is AC 220V/0.6A and 50Hz, and the output is DC 12V/1.5A; the voltage converter continuously supplies power to the electronic balance after being connected through the electrode flange.

13. The apparatus of claim 1, wherein: the second pipeline is an SUS316 seamless pipe, one end of the second pipeline is welded at the outer side of the second hole on the top surface of the vacuum chamber, and the other end of the second pipeline is welded with a CF50 flange connected with a gate valve.

14. The apparatus of claim 13, wherein: the gate valve is an ultrahigh vacuum CF50 manual gate valve, CF50 flange interfaces are arranged on two sides of the gate valve, and the vacuum leakage rate is less than 1.3E-10Pam ³ S; the vacuum sealing side of the gate valve is connected with a CF50 flange on the second pipeline, and the other side of the gate valve is connected with an impurity injection distribution system.

15. The apparatus of claim 1, wherein: the guide tube is a flared reducing SUS316 tube, a large opening phi 35 and a small opening phi 26, and an SUS316 seamless tube is welded below the small opening.

16. The apparatus of claim 1, wherein: the third pipeline is an SUS316 seamless pipe, one end of the third pipeline is welded at the first hole on the top surface of the vacuum chamber, and the other end of the third pipeline is welded with a CF35 flange connected with a control lever; the first hole is positioned on the top surface of the vacuum chamber close to the front surface side.

17. The apparatus of claim 16, wherein: the operating rod is of a magnetic control transmission structure, and the electronic balance starting/calibrating key is operated by rotating the operating rod outside the vacuum chamber.

18. The apparatus of claim 1, wherein: the fourth pipeline is an SUS316 seamless pipe, one end of the fourth pipeline is welded at the third hole on the top surface of the vacuum chamber, and the other end of the fourth pipeline is welded with a CF35 flange connected with an inflation valve; the third hole may be located on the top surface of the vacuum chamber near the back side or the left or right side surface.

19. The apparatus of claim 18, wherein: the inflation valve is an ultrahigh vacuum manual baffle valve with CF35 converted into KF40, a CF35 flange is butted with a CF35 flange on the fourth pipeline, and the KF40 flange is connected with inert gas.

20. An apparatus for accurately calibrating plasma implant impurities as defined in claim 19, wherein: the inert gas is argon.

21. A method for accurately calibrating plasma implanted impurities is characterized in that: the method comprises the following steps:

step 1, opening a glass panel on the front side of a vacuum chamber, placing an electronic balance into the vacuum chamber, keeping a tray of the electronic balance under a guide pipe, and enabling a display screen to face the glass panel; the voltage converter supplies power to the electronic balance after being connected by the electrode flange;

step 2, placing a sealing ring in a groove of a vacuum chamber fixing seat, closing a glass panel, screwing down and sealing by using a screw, closing an inflation valve and a gate valve, opening an air extraction valve, and starting an air extractor set; when the vacuum degree of the vacuum chamber reaches 5.0 multiplied by 10 ^-5 When Pa is needed, the gate valve is opened, and the impurity injection distribution system is communicated with the vacuum chamber;

step 3, pressing an electronic balance calibration key by using the operating lever to finish the calibration of the electronic balance; distributing system specific voltage V for impurity implantation ₁ Signal triggering, triggering time continuous t ₁ The scattered impurities fall into a tray of the electronic balance through a guide pipe, and after the reading of the electronic balance is stable, a control lever is used for pressing an electronic balance start key to record Data 1;

step 4, pressing an electronic balance calibration key by using the operating lever to finish the calibration of the electronic balance; distributing system specific voltage V for impurity implantation ₁ Signal triggering, triggering time continuous t ₂ The scattered impurities fall into a tray of the electronic balance through a guide pipe, and the electronic balance waits for an electronic dayAfter the flat reading value is stable, pressing an electronic balance start key by using the operating lever to record Data 2;

step 5, pressing an electronic balance calibration key by using the operating lever to finish the calibration of the electronic balance; distributing system specific voltage V for impurity implantation ₁ Signal triggering, triggering time is t ₃ The scattered impurities fall into a tray of the electronic balance through a guide pipe, and after the reading of the electronic balance is stable, a control lever is used for pressing an electronic balance start key to record Data 3;

step 6, calculating to obtain the voltage V at a specific voltage ₁ Under the condition of impurity injection distribution system t _n Accurately calibrating data of impurity injection amount in a time period; n is a natural number;

step 7, repeating steps 3, 4, 5 and 6 to obtain the voltage V with the specific voltage _n Under the condition that a certain impurity injected into the distribution system is t _n Accurately calibrating data of impurity injection amount in a time period;

step 8, closing the gate valve and the air extraction valve, stopping the air extraction unit, opening the air injection valve, injecting inert gas into the vacuum chamber to 0.2MPa, opening the glass panel, and recovering impurities on the tray under the protection of the inert gas atmosphere;

step 9, repeating the steps 2-8; the impurities are calibrated to inject other impurities in the distribution system.

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