CN111061086A - Color film substrate, display panel and display device - Google Patents
Color film substrate, display panel and display device Download PDFInfo
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- CN111061086A CN111061086A CN201911419196.7A CN201911419196A CN111061086A CN 111061086 A CN111061086 A CN 111061086A CN 201911419196 A CN201911419196 A CN 201911419196A CN 111061086 A CN111061086 A CN 111061086A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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Abstract
The invention discloses a color film substrate, a display panel and a display device, wherein the color film substrate is provided with a display area and a non-display area; the color film substrate comprises a substrate and a planarization layer; and a light-shielding layer and a color-resist layer between the substrate plate and the planarization layer; the color resistance layer comprises a plurality of display color resistance patterns and a plurality of dummy color resistance patterns; the display color resistance pattern is arranged in the display area, and the dummy color resistance pattern is arranged in the non-display area; the light shielding layer positioned in the display area comprises a plurality of opening structures, and the orthographic projection of the display color resistance pattern on the substrate covers the orthographic projection of the opening structures on the substrate; the shading layer positioned in the non-display area is provided with a plurality of first grooves, and the thickness of the shading layer at each position of the non-display area is larger than 0. The thicknesses of the display area and the non-display area of the color film substrate can be consistent, so that the box thickness difference between the display area and the non-display area in the display panel is improved, and the display effect and the product yield are improved.
Description
Technical Field
The embodiment of the invention relates to the technical field of display, in particular to a color film substrate, a display panel and a display device.
Background
With the development of technology, liquid crystal display devices are widely used in mobile terminals such as car video players or tablet computers. The liquid crystal display panel realizes Color display by a Color Filter (CF) substrate.
The color film substrate mainly comprises a substrate, a shading layer arranged on the substrate, a color resistance layer and a planarization layer. At present, a large-area dummy color resistor is often required to be arranged in the peripheral area of the color film substrate, and the dummy color resistor can protect the display color resistor of the display area and simultaneously can heighten the non-display of the color film substrate; the planarization layer can fill up the display area and the non-display area to dispose the support posts. However, since the light-shielding layer of the display area is only disposed in the non-opening area of the display area, the display color resistor is disposed in the opening area, and the light-shielding layers are disposed at various positions of the non-display area, and the planarization layer is difficult to achieve remote leveling, the thickness of the display area of the color filter substrate is greatly different from that of the non-display area.
Disclosure of Invention
The invention provides a color film substrate, a display panel and a display device, and aims to solve the technical problems that in the prior art, the display panel using the color film substrate is yellow in display periphery and poor in display quality due to the fact that the thickness difference of a display area and a non-display area of the color film substrate is large.
In a first aspect, an embodiment of the present invention provides a color film substrate, including: a display area and a non-display area;
the color film substrate further comprises:
a substrate base plate and a planarization layer;
and a light-shielding layer and a color resist layer between the substrate base plate and the planarization layer; the color resistance layer comprises a plurality of display color resistance patterns and a plurality of dummy color resistance patterns; the display color resistance pattern is arranged in the display area, and the dummy color resistance pattern is arranged in the non-display area;
the light shielding layer positioned in the display area comprises a plurality of opening structures, and the orthographic projection of the display color resistance pattern on the substrate covers the orthographic projection of the opening structures on the substrate; the shading layer located in the non-display area is provided with a plurality of first grooves, and the thickness of the shading layer at each position of the non-display area is larger than 0.
In a second aspect, an embodiment of the present invention further provides a display panel, including: a display area and a non-display area surrounding the display area;
the display panel further includes:
the color film substrate;
the array substrate is arranged opposite to the color film substrate;
the supporting column is positioned between the color film substrate and the array substrate;
the orthographic projection of the supporting columns positioned in the display area on the array substrate is positioned in the orthographic projection of the shading layer on the array substrate;
and the orthographic projection of the support column positioned in the non-display area on the array substrate is overlapped with the orthographic projection of the first groove of the light shielding layer in the color film substrate on the array substrate.
In a third aspect, an embodiment of the present invention further provides a display device, including: the display panel is provided.
The embodiment of the invention provides a color film substrate, a display panel and a display device, wherein a light shielding layer and a color resistance layer are arranged between a substrate and a planarization layer of the color film substrate; the color resistance layer comprises a plurality of display color resistance patterns positioned in the display area and a plurality of dummy color resistance patterns positioned in the non-display area; because the light shielding layer of the display area is provided with the opening structure, the orthographic projection of the display color resistance pattern on the substrate covers the orthographic projection of the light shielding layer opening structure on the substrate, and the light shielding layer of the non-display area is not provided with the opening structure, namely, the dummy color resistance pattern and the light shielding layer in the non-display area are arranged in a stacking mode; the plurality of first grooves are formed in the light shielding layer of the non-display area, and the thickness of the light shielding layer at the first grooves is larger than 0 and smaller than that of the light shielding layer at other positions of the non-display area, so that on one hand, all positions of the non-display area are covered by the light shielding layer to prevent unnecessary light leakage; on the other hand, the light shielding layer of the display area is provided with the opening structure, the light shielding layer of the non-display area is provided with the plurality of first grooves, so that after the planarization layer is adopted for filling, the thicknesses of the display area and the non-display area of the color film substrate can be consistent, the box thickness difference between the display area and the non-display area can be improved, the problem of uneven display caused by the box thickness difference is solved, the display effect and the product yield can be improved, the production cost is reduced, and the production efficiency is improved.
Drawings
Fig. 1 is a schematic cross-sectional structure diagram of a color film substrate in the prior art;
fig. 2 is a schematic top view of a color filter substrate according to an embodiment of the present invention;
fig. 3 is a schematic diagram of a film structure of a color film substrate according to an embodiment of the present invention;
fig. 4 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present disclosure;
fig. 5 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present disclosure;
fig. 6 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present disclosure;
fig. 7 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present disclosure;
fig. 8 is a schematic top view of a color filter substrate according to another embodiment of the present invention;
fig. 9 is a schematic cross-sectional view of a color filter substrate along the section a-a' in fig. 8;
fig. 10 is a schematic cross-sectional view of a color filter substrate along the section B-B' in fig. 8;
fig. 11 is a schematic cross-sectional view of a color filter substrate along the section C-C' in fig. 8;
fig. 12 is a schematic diagram of a film structure of a display panel according to an embodiment of the invention;
fig. 13 is a schematic structural diagram of a display device according to an embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Fig. 1 is a schematic cross-sectional structure diagram of a color filter substrate in the prior art. As shown in fig. 1, the color filter substrate 001 includes an underlying substrate 01, a light-shielding layer 03 disposed on the underlying substrate 01, a color resist layer 04, and a planarization layer 02 disposed on a side of the color resist layer 04 away from the underlying substrate. The light shielding layer 03 can shield the wires, the thin film transistors, the fingerprint identification elements and the like arranged in the display area 010 and the non-display area 020 so as to prevent unnecessary light leakage, the light shielding layer 03 positioned in the display area 010 is provided with an opening structure, and the light shielding layer 03 positioned in the non-display area is not provided with an opening structure 302; the color resistance layer 04 includes a plurality of color resistance patterns of different colors, at least a portion of the color resistance pattern 041 located in the display region is located in the opening structure 302 of the light-shielding layer 03, and the color resistance pattern 042 located in the non-display region is located on a side of the light-shielding layer 03 away from the substrate 01. Although the planarization layer 02 on the side of the color resist layer 04 away from the substrate 01 may be used to fill and level up the depressions and protrusions caused by the film patterning between the planarization layer 02 and the substrate 01, since the planarization layer 4 is difficult to achieve filling and leveling at a longer distance, when the color resist pattern 041 of the display area 010 is located in the opening structure 302 of the light shielding layer 03, and the color resist pattern 042 of the non-display area 020 is located on the side of the light shielding layer 03 away from the substrate 01, after the filling and leveling by the planarization layer 02, there still exists a phenomenon that the height H2 'of the non-display area 010 of the color film substrate 001 is greater than the height H1' of the display area 020, and when a liquid crystal cell formed by using the color film substrate is used, there may be a difference in cell thickness, and thus when a picture is displayed, a phenomenon may occur that display is uneven, and.
In order to solve the technical problem, an embodiment of the present invention provides a color film substrate, where the color film substrate includes a display area and a non-display area; the color film substrate further comprises: a substrate base plate and a planarization layer; and a light-shielding layer and a color-resist layer between the substrate and the planarization layer; the color resistance layer comprises a plurality of display color resistance patterns and a plurality of dummy color resistance patterns; the display color resistance pattern is arranged in the display area, and the dummy color resistance pattern is arranged in the non-display area; the light shielding layer positioned in the display area comprises a plurality of opening structures, and the orthographic projection of the display color resistance pattern on the substrate covers the orthographic projection of the opening structures on the substrate; the shading layer positioned in the non-display area is provided with a plurality of first grooves, and the thickness of the shading layer at each position of the non-display area is larger than 0.
By adopting the technical scheme, the first groove is formed in the light shielding layer of the non-display area, and the thickness of the light shielding layer at each position of the non-display area is greater than 0, so that the thickness of the light shielding layer at the first groove is smaller than the thickness of the light shielding layer at other positions of the non-display area, and the thickness of the light shielding layer at the first groove is greater than 0; on the other hand, the light shielding layer of the display area is provided with an opening structure, the light shielding layer of the non-display area is provided with a first groove, so that after the planarization layer is adopted for filling, the thicknesses of the display area and the non-display area of the color film substrate can tend to be consistent, the box thickness difference between the display area and the non-display area is improved, the problem of uneven display caused by the box thickness difference is solved, the display effect and the product yield are further improved, the production cost is reduced, and the production efficiency is improved.
The above is the core idea of the present invention, and the technical solution in the embodiment of the present invention will be clearly and completely described below with reference to the drawings in the embodiment of the present invention. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present invention without any creative work belong to the protection scope of the present invention.
Fig. 2 is a schematic top-view structure diagram of a color filter substrate according to an embodiment of the present invention, and fig. 3 is a schematic film structure diagram of a color filter substrate according to an embodiment of the present invention. Referring to fig. 2 and 3, the color filter substrate 100 includes a display region 110 and a non-display region 120, the non-display region 120 may surround the display region 110, and when the color filter substrate 100 is applied to a display panel, the display region 110 of the color filter substrate 100 is a display region of the display panel.
The color filter substrate 100 further includes a substrate 10 and a planarization layer 20, and a light-shielding layer 30 and a color-resist layer 40 located between the substrate 10 and the planarization layer 20. The color resistance layer 40 includes a plurality of display color resistance patterns 41 and a plurality of dummy color resistance patterns 42, wherein the display color resistance patterns 41 are located in the display area 110, and the dummy color resistance patterns 42 are located in the non-display area 120. The light-shielding layer 30 located in the display region 110 has an opening structure 302, and at least a part of the display color-resisting pattern 42 is located in the opening structure 302 of the light-shielding layer 30; the display color resist pattern 41 may include a plurality of color resist patterns of different colors, for example, the display color resist pattern 41 may include a red display color resist pattern 411, a green display color resist pattern 412, a blue display color resist pattern 413, and the like, so that when light reaches the color filter substrate, a colorful picture can be displayed when the light reaches the display surface through the display color resist pattern 42 in the opening structure 302 of the light shielding layer 30. The light shielding layer 30 in the non-display area 120 is provided with a plurality of first grooves 301, and the thickness of the light shielding layer 30 at each position of the non-display area 120 is greater than 0, so that the light shielding layer 30 in the non-display area 120 can shield light at each position of the non-display area 120 to prevent unnecessary light leakage.
Similarly, the dummy color resist patterns 42 disposed in the non-display area 120 may include a red dummy color resist pattern 421, a green dummy color resist pattern 422, a blue dummy color resist pattern 423, and the like. Thus, the display area 110 and the non-display area 120 of the color filter substrate 100 are both provided with the color resist pattern, and the dummy color resist pattern 41 located in the non-display area 120 can protect the display color resist pattern 42 located in the display area 110, and prevent the display color resist pattern 42 from falling off due to external impact. For example, in the etching process, the dummy color resist pattern 41 in the non-display area 120 can block the developer to prevent the display color resist pattern 41 in the display area 110 from falling off due to the washing of the developer. The dummy color resist pattern 42 and the display color resist pattern 42 may be formed by the same material and the same process, so as to simplify the manufacturing process of the color film substrate 100, improve the production efficiency, and reduce the production cost.
It should be noted that fig. 2 and fig. 3 are only exemplary drawings of an embodiment of the present invention, in fig. 2, the display area 110 of the color film substrate 100 includes a plurality of display color-resistance patterns 41 arranged in an array, the non-display area 120 of the color film substrate 100 includes a plurality of dummy color-resistance patterns 42 arranged in an array, and a color type of the dummy color-resistance patterns 42 in the non-display area 120 is the same as a color type of the display color-resistance patterns 41 in the display area 110; in the embodiment of the present invention, the color types of the dummy color resist patterns 42 in the non-display area 120 and the color types of the display color resist patterns 41 in the display area 110 may be different, for example, the number of the color types of the dummy color resist patterns 42 in the non-display area 120 is smaller than the number of the color types of the display color resist patterns 41 in the display area 110; meanwhile, on the premise that the embodiment of the present invention can be implemented, the embodiment of the present invention does not specifically limit the arrangement and structure of the display color resist pattern 41 and the dummy color resist pattern 42.
As shown with continued reference to fig. 2 and 3, the light-shielding layer 30 in the display region 110 includes a plurality of opening structures 302, and the orthographic projection of the color resist pattern 41 on the base substrate 10 is shown to cover the orthographic projection of the opening structure 302 of the light-shielding layer 30 on the base substrate 10, since the thickness of the light-shielding layer 30 at the opening structure 302 is 0, the light-shielding layer 30 of the non-display area 120 is not provided with the opening structure 302, and the thickness of the light-shielding layer 30 at each position of the non-display area 120 is greater than 0, therefore, all the dummy color resist patterns 42 in the non-display area 120 are lifted by the light-shielding layer 30, and at least a portion of the display color resist pattern 41 in the display area 110 is not stepped up by the light-shielding layer 30, the thickness of the display region 110 and the non-display region 120 of the color filter substrate 100 are different, before the planarization layer 20 is not formed, the surface of the color filter substrate 100 is uneven due to patterning of the light-shielding layer 30, the color resist layer 40, and the like.
The planarization layer 20 is disposed on the sides of the light-shielding layer 30 and the color resist layer 40 away from the substrate 10, so as to fill up the surface of one side of the color filter substrate 100. The material of the planarization layer 20 may include an organic material, such as a Polyimide (PI) material, and the flowability of the organic material may enable the planarization layer 20 to fill and flatten the surface of one side of the color film substrate 100. However, since the planarization layer 20 has a poor leveling effect for a long distance, when the thicknesses of the display area 110 and the non-display area 120 are different, the difference between the thicknesses of the display area 110 and the non-display area 120 of the color filter substrate 100 still exists after the planarization layer 20 is used for leveling.
The plurality of first grooves 301 are disposed on the light-shielding layer 30 in the non-display region 120, and the thickness T1 of the light-shielding layer 30 in the first grooves 301 is greater than 0 and smaller than the thickness T2 of the light-shielding layer 30 at other positions of the non-display region 120 and the thickness T2 of the light-shielding layer 30 in the non-open structure of the display region 110. The non-opening structure is an area of the display region 110 covered by the light-shielding layer 30. At this time, the thickness of the non-display area 120 at the position where the first groove 301 is disposed may be smaller than the thickness at other positions. Since the material of the planarization layer 20 flows from the convex position to the concave position during the formation of the planarization layer 20, the thickness of the planarization layer 20 at the convex position is thinner, and the thickness of the planarization layer at the concave position is thicker. Therefore, in the process of forming the planarization layer 20, the material of the planarization layer 20 in the non-display area 120 flows into the first groove 301 to fill up the height difference between the first groove 301 and other positions, and the material of the planarization layer 20 at the position of the dummy color-resist pattern 42 where the first groove 301 is not located is relatively reduced, so that after the planarization layer 20 is formed, the height at the position of the display color-resist pattern 41 can be kept consistent with the height at the position of the dummy color-resist pattern 42, so that the overall height H1 of the display area 110 in the color filter substrate 100 can be approximately consistent with the overall height H2 of the non-display area 120; when the color film substrate 100 is applied to a display panel, the phenomenon that the display periphery is yellow due to a large box thickness difference between the display area 110 and the non-display area 120, so that the display of the display panel is uneven can be improved, the display effect and the product yield can be further improved, the production cost is reduced, and the production efficiency is improved.
It should be noted that, the film layer relationship between the light shielding layer and the color resistance layer between the substrate and the planarization layer may be as shown in fig. 3, and the dummy color resistance pattern 42 in the non-display area is located on the side of the light shielding layer 30 away from the substrate 10; the color resistance layer may also be located on a side of the light shielding layer close to the substrate, which is not specifically limited in this embodiment of the present invention. Meanwhile, the first groove may be located between two adjacent dummy color resist patterns, or an orthogonal projection of the first groove on the substrate and an orthogonal projection of the dummy color resist pattern on the substrate may overlap, which is not specifically limited in the embodiment of the present invention.
For example, fig. 4 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present invention. The same points in fig. 4 as in fig. 3 can refer to the above description of fig. 3, and are not repeated herein, and only the differences in fig. 4 from fig. 3 are exemplarily described below. As shown in fig. 4, the dummy color resist pattern 42 in the non-display area 120 is located on a side of the light-shielding layer 30 close to the base substrate 10.
For convenience of description, in the embodiments of the present invention, the film layer relationship between the light-shielding layer and the color-resist layer shown in fig. 3 is taken as an example to explain the technical solution of the embodiments of the present invention.
Optionally, as shown in fig. 2 and fig. 3 with continued reference, in the first direction X, the width of the first groove 301 is a first width W1, and the width of the opening structure 302 is a third width W3; wherein the first width W1 is less than the third width W3.
Specifically, the light-shielding layer 30 is patterned, so that the light-shielding layer 30 in the display region 110 forms the opening structure 302, and the light-shielding layer 30 in the non-display region 120 forms the first groove 301. When the first groove 301 and the opening structure 302 are formed in the same patterning process, the process steps are simplified, the production cost is reduced, and the production efficiency is improved. In the first direction X, by setting the width W1 of the first groove 301 to be smaller than the width W3 of the open structure 302, the light-shielding layer 30 at the open structure 302 can be removed during patterning, and a part of the light-shielding layer 30 at the first groove 301 is remained, so that the thickness of the light-shielding layer 30 at each position of the non-display region 120 is greater than 0, and thus the light-shielding layer of the non-display region 120 can have a light-shielding effect on each position of the display region 120 to prevent unnecessary light leakage.
Optionally, with continued reference to fig. 3, in the first direction X, the first width W1 of the first groove 301 may have a value range as follows: w1 < 3 μm.
For example, when the patterning process of the light shielding layer 30 includes the processes of exposure, development, and the like, since the current exposure apparatus has a certain exposure accuracy, when the width W1 of the first groove 301 is set to be less than 3 μm, the exposure apparatus cannot separate the light shielding layer 30 at the position of the first groove 301, and only the first groove 301 having a groove bottom thickness T1 of more than 0 can be formed. Thus, when the first groove 301 and the opening structure 302 are formed in the same patterning process, the light-shielding layer 30 at the position of the first groove 301 can still have the light-shielding effect on the premise of ensuring that the light-shielding layer 30 at the position of the opening structure 302 is removed.
Optionally, with continuing to refer to fig. 2 and fig. 3, the plurality of first grooves 301 in the light shielding layer 30 of the non-display area 120 are strip-shaped structures extending along the first direction X and arranged along the second direction Y; wherein the first direction X intersects the second direction Y. As such, in the first direction X, the width W1 of the first groove 301 is smaller than the width of the opening structure 302, and in the second direction Y, the length of the first groove 301 may be larger than the length of the opening structure 302, so as to enable the thicknesses of the display region 110 and the non-display region 120 to be consistent after the planarization layer 20 is formed.
It should be noted that, when the opening structures 302 of the light-shielding layer 30 in the color filter substrate 100 are arranged in an array, the first direction X may be a row direction or a column direction of the opening structures 302, which is not specifically limited in this embodiment of the present invention. When the color film substrate 100 is applied to a display panel, the display panel may include a plurality of scan lines and a plurality of data lines, the scan lines and the data lines intersect to define positions of pixels, a region where the opening structure 302 of the light shielding layer 30 is located is a position of a pixel defined by a scan line and a data line, a row direction may be an extending direction of the scan lines, and a column direction may be an extending direction of the data lines. For convenience of description, in the embodiments of the present invention, the first direction X is taken as a row direction, and the second direction Y is taken as a column direction.
Optionally, with continued reference to fig. 3, an orthogonal projection of the first groove 301 disposed in the light shielding layer 30 in the non-display area 120 on the substrate 10 is a first projection; at least part of the first projection is located between the orthographic projections of the adjacent two dummy color-resist patterns 42 on the substrate base plate 10.
Specifically, after patterning the color resist layer 40, the dummy color resist patterns 42 and the display color resist patterns 41 may be formed, and the color resist layer 40 between two adjacent dummy color resist patterns 42 and the color resist layer 40 between two adjacent display color resist patterns 41 are removed, so that a pit is formed between two adjacent dummy color resist patterns 42 and two adjacent display color resist patterns 41. Since the material of the planarization layer 20 flows from a high position to a low position during the formation of the planarization layer 20, when at least a portion of the first groove 301 is located between two adjacent dummy color resist patterns 42, the depth of the pit between two adjacent dummy color resist patterns 42 is greater than the depth of the pit between two adjacent display color resist patterns 41, so that more material of the planarization layer 20 flows into the pit between two adjacent dummy color resist patterns 42 during the formation of the planarization layer 20, and the material of the planarization layer 20 on the side of the dummy color resist patterns 42 away from the substrate 10 is relatively reduced. In this way, after the planarization layer 20 is formed, the planarization layer 20 is thinner at the position where the dummy color resist pattern 42 is provided, and the planarization layer 20 is thicker at the position where the display color resist pattern 41 is provided. In this way, the difference in thickness between the display region 110 and the non-display region 120 can be further reduced, so that the thicknesses of the display region 110 and the non-display region 120 tend to be uniform.
It should be noted that fig. 3 is only an exemplary diagram of an embodiment of the present invention, and the first groove disposed on the light shielding layer in the non-display area in fig. 3 is located between two adjacent dummy color resist patterns, and in an embodiment of the present invention, the first groove of the light shielding layer in the non-display area may also be disposed at a position overlapping the dummy color resist patterns. On the premise that the thicknesses of the non-display area and the display area of the color film substrate can be kept consistent, the position of the first groove is not specifically limited in the embodiment of the invention.
Optionally, fig. 5 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present invention. As shown in fig. 5, a second groove 401 is disposed on a surface of the dummy color resist pattern 42 in the non-display area 120, which is opposite to the substrate 10.
Specifically, the second groove 401 is disposed on the surface of the dummy color resist pattern 42 on the side away from the substrate base plate 10, so that the thickness T3 of the dummy color resist pattern 42 in which the second groove 401 is disposed is smaller than the thickness T4 of the display color resist pattern 41. In the process of forming the planarization layer 20, the material of a portion of the planarization layer 20 is used to fill the first and second grooves 301 and 401 of the non-display region 120, while the material of the planarization layer 20 at other positions of the non-display region 120 is relatively reduced; the display color resist pattern 41 of the display area 110 is not provided with a groove, and the planarization layer 20 disposed in the display area 110 does not need to fill the groove. Thus, when the region where the dummy color resist pattern 42 is located is raised by the light-shielding layer 30 and the region where at least part of the display color resist pattern 41 is located is not raised by the light-shielding layer 30, the thicknesses of the display region 110 and the non-display region 120 of the color filter substrate 100 after the planarization layer 20 is formed can further approach to be the same. Meanwhile, when the size of the second groove 401 disposed on the dummy color resist pattern 42 is equal to the size of the open structure 302 in the light shielding layer 30, for example, the width W2 of the second groove 401 in the first direction X may be the same as the width W3 of the open structure 302, the thickness of the non-display area 120 of the color filter substrate 100 can be kept the same as the thickness of the display area 110, and when the color filter substrate 100 is applied to a display panel, the display efficiency and the product yield of the display panel can be further improved.
Optionally, the same dummy color-resist pattern includes at least one second groove; in the first direction, the width W2 of the second groove has a value range of: w2 < 3 μm.
For example, as shown in fig. 5, a second groove 401 is disposed on one dummy color resist pattern 42, and during the formation of the planarization layer 20, the material of the planarization layer 20 can fill the second groove 401, so that after the formation of the planarization layer 20, the thicknesses of the non-display area 120 and the display area 110 of the color filter substrate 100 can be approximately the same. In addition, since the color resist layer 40 can be patterned to form the display color resist pattern 41 and the dummy color resist pattern 42 respectively, when the second groove 401 needs to be formed on the dummy color resist pattern 42, the second groove 401 on the display color resist pattern 41, the dummy color resist pattern 42 and the dummy color resist pattern 42 can be formed simultaneously after the color resist layer 40 is patterned, which is beneficial to simplifying the process steps, reducing the production cost and improving the production efficiency.
The process of patterning the resist layer 40 may include, for example, exposure, development, and the like. Since the present exposure apparatus has a certain exposure accuracy, by setting the width W2 of the second groove 401 to be less than 3 μm in the first direction X, the second groove 401 can be formed on the dummy color resist pattern 42 while the dummy color resist patterns 42 on both sides of the second groove 401 remain connected, that is, the groove bottom thickness T3 of the second groove 401 can be greater than 0, to ensure a sufficiently large contact area between the dummy color resist pattern 42 and the film layer adjacent to the color resist layer 40 and located on the side of the color resist layer 40 close to the substrate 10. For example, when the film layer adjacent to the color resist layer 40 and located on the side of the color resist layer 40 close to the substrate 10 is the light shielding layer 30, there will be a large contact area between the dummy color resist pattern 42 and the light shielding layer 30, so that when the developer washes over the color resist layer 40 in the developing process, a large friction force will be generated between the dummy color resist pattern 42 and the light shielding layer 30, and the developer can be prevented from washing off the dummy color resist pattern 42, thereby playing a role of blocking the developer, and playing a role of protecting the display color resist pattern 42 of the display area 110.
It should be noted that fig. 5 is only an exemplary diagram of the embodiment of the present invention, and in fig. 5, a second groove 401 is disposed on one dummy color resist pattern 42; in the embodiment of the present invention, the same dummy color resistance pattern may further include two or more second grooves, and on the premise that the thicknesses of the display area and the non-display area of the color film substrate are consistent, the number of the second grooves provided in the same dummy color resistance pattern is not specifically limited in the embodiment of the present invention.
For example, fig. 6 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present invention. The same points in fig. 6 as in fig. 5 can refer to the description of fig. 5, and are not repeated here, and only the differences in fig. 6 from fig. 5 are exemplarily described here. As shown in fig. 5, two second grooves 401 may be disposed on each dummy color resist pattern 42, and the width W2 of each second groove 401 may be less than 3 μm to prevent the dummy color resist pattern 42 from being washed away by the developer. Meanwhile, the sum of the sizes of the plurality of second grooves 401 disposed on the same dummy color-resist pattern 42 may be equal to the size of the opening structure 302 of the light-shielding layer 30, so that the second grooves 401 on the dummy color-resist pattern 42 can form a complementary structure with the light-shielding layer 30 that is higher up the dummy color-resist pattern 42, and thus the thicknesses of the display area 110 and the non-display area 120 of the color filter substrate 100 can be approximately the same after the planarization layer 20 is formed.
Optionally, an orthogonal projection of the second groove disposed on the dummy color resist pattern on the substrate overlaps an orthogonal projection of the first groove disposed on the light shielding layer on the substrate.
For example, fig. 7 is a schematic diagram of a film structure of another color film substrate according to an embodiment of the present invention. As shown in fig. 7, the thickness T3 of the dummy color-resist pattern disposed in the second groove 401 is smaller than the thickness T4 of the display color-resist pattern 41, and the thickness of the light-shielding layer 30 disposed in the first groove 301 is smaller than the thickness of the light-shielding layer 30 in other portions. When the second groove 401 on the dummy color resist pattern 42 overlaps the first groove 301 on the light-shielding layer 30, in the process of forming the planarization layer 20, the material of the planarization layer 20 flows to the overlapping position of the first groove 301 and the second groove 401 to fill and level the pit at the overlapping position of the first groove 301 and the second groove 401, so that after the planarization layer 20 is formed, the thickness of the display area 110 and the non-display area 120 of the color filter substrate 100 can be made to be consistent.
In addition, when the sum of the thicknesses of the dummy color resist pattern 42 and the light shield layer 30 at the overlapping position is equal to the thickness of the display color resist pattern 41, after the planarization layer 20 is formed, the thicknesses of the display area 110 and the non-display area 120 of the color filter substrate 100 can be kept consistent, so that when the color filter substrate 100 is applied to a display panel, the thicknesses of the display area 110 and the non-display area 120 can be kept consistent, the phenomenon that the display periphery is yellowed and the display of the display panel is uneven can be improved, the display effect and the product yield can be further improved, the production cost can be reduced, and the production efficiency can be improved.
Optionally, fig. 8 is a schematic top-view structure diagram of another color film substrate according to an embodiment of the present invention. As shown in fig. 8, the dummy color resist patterns 42 in the non-display area 120 are block color resist patterns arranged in an array; the display color-resisting patterns 41 in the display area 110 are strip-shaped color-resisting patterns arranged along the first direction X and extending along the second direction Y; the first direction X may be a row direction of the block color-resist pattern 42, and the second direction Y may be a column direction of the block color-resist pattern 42.
Fig. 9 is a schematic cross-sectional structure of a color filter substrate along a section a-a ' in fig. 8, fig. 10 is a schematic cross-sectional structure of a color filter substrate along a section B-B ' in fig. 8, and fig. 11 is a schematic cross-sectional structure of a color filter substrate along a section C-C ' in fig. 8. With combined reference to fig. 8 to 11, the dummy color resist pattern 42 in the non-display area 120 is located on a side of the light shielding layer 30 away from the substrate 10, and a portion of the display color resist pattern 41 in the display area 110 is located in the opening structure. By arranging the display color resist patterns 41 in the display area 110 as stripe-shaped color resist patterns extending along the second direction Y and arranging the dummy color resist patterns 42 in the non-display area 120 as block-shaped color resist patterns, before the planarization layer 20 is formed, the higher position in the non-display area 120 is the position where the dummy color resist patterns 42 are overlapped with the light shielding layer 30, and the higher position in the display area 110 is the position where the display color resist patterns 41 are overlapped with the light shielding layer 30, so that in the process of forming the planarization layer 20, a part of the material of the planarization layer 20 coated on the non-display area 120 flows to the recessed position between two adjacent rows of the dummy color resist patterns 42 and the recessed position between two adjacent columns of the dummy color resist patterns 42; a portion of the material applied to the planarization layer 20 in the display region 110 flows to the recessed portion between two adjacent rows of the display color resist patterns 41 and flows to the area where the opening structure 302 is located. Thus, after the planarization layer 20 is formed, the thickness of the display region 110 of the color film substrate 100 is approximately equal to that of the non-display region 120, and the yield of the product is further improved.
The embodiment of the invention also provides a display panel, which comprises the color film substrate provided by the embodiment of the invention; the array substrate is arranged opposite to the color film substrate; the supporting column is positioned between the array substrate and the color film substrate; the orthographic projection of the support columns positioned in the display area on the array substrate is positioned in the orthographic projection of the shading layer in the color film substrate on the array substrate; the orthographic projection of the support column positioned in the non-display area on the array substrate is overlapped with the orthographic projection of the first groove of the shading layer in the color film substrate on the array substrate. Since the display panel provided by the embodiment of the present invention includes the color film substrate provided by the embodiment of the present invention, the display panel provided by the embodiment of the present invention also has the beneficial effects of the color film substrate provided by the embodiment of the present invention, and reference may be made to the description of the color film substrate described above for the same points.
It should be noted that the color film substrate includes a display area and a non-display area, and since the display panel includes the color film substrate, the display area of the color film substrate is the display area of the display panel, and the non-display area of the color film substrate is the non-display area of the display panel.
Fig. 12 is a schematic diagram illustrating a film structure of a display panel according to an embodiment of the present invention. As shown in fig. 12, the display panel 500 includes a color film substrate 100, an array substrate 200 disposed opposite to the color film substrate 100, a liquid crystal layer 300 located between the color film substrate 100 and the array substrate 200, and a supporting pillar 400, where the liquid crystal layer 300 includes liquid crystal molecules 310. The orthographic projection of the supporting column 400 positioned in the display area 110 on the array substrate 200 is positioned in the orthographic projection of the light shielding layer 30 in the color film substrate 100 on the array substrate 200, namely, the orthographic projection of the supporting column 400 positioned in the display area 110 on the array substrate 200 and the orthographic projection of the opening structure 302 of the light shielding layer 30 on the array substrate 200 are not overlapped with each other, so as to prevent the display effect of the display panel 01 from being influenced by the arrangement of the supporting column 400; the orthographic projection of the support pillars 014 in the non-display area 200 on the array substrate 200 overlaps with the first groove 301 of the light-shielding layer 30 in the color filter substrate 100. Thus, when the distance between the surface of the support pillar 400 located on the side of the display area 110 close to the array substrate 200 and the substrate 10 in the color filter substrate 100 is a first distance, and the distance between the surface of the support pillar 400 located on the side of the non-display area 120 close to the array substrate 200 and the substrate 10 in the color filter substrate 100 is a second distance, the first distance and the second distance can tend to be consistent, so that the thicknesses of the liquid crystal layer 300 of the display area 110 and the non-display area 120 of the display panel 500 are kept consistent, the phenomenon of yellowing of the display periphery due to the difference of box thicknesses is improved, the display effect of the display panel 500 is further improved, the yield of the display panel 500 is improved, and the production cost is reduced.
The embodiment of the present invention further provides a display device, where the display device includes the display panel provided in the embodiment of the present invention, so that the display device has the beneficial effects of the display panel provided in the embodiment of the present invention, and in the same place, reference may be made to the description of the display panel, and details are not repeated herein.
Exemplarily, fig. 13 is a schematic structural diagram of a display device according to an embodiment of the present invention. As shown in fig. 13, a display device 600 includes the display panel 500 provided in the embodiment of the present invention. The display device 600 may be, for example, a portable display device, a computer display, a wearable display device, a vehicle-mounted display center control screen, and the like, which is not particularly limited in this embodiment of the present invention.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (12)
1. A color film substrate is characterized by comprising: a display area and a non-display area;
the color film substrate further comprises:
a substrate base plate and a planarization layer;
and a light-shielding layer and a color resist layer between the substrate base plate and the planarization layer; the color resistance layer comprises a plurality of display color resistance patterns and a plurality of dummy color resistance patterns; the display color resistance pattern is arranged in the display area, and the dummy color resistance pattern is arranged in the non-display area;
the light shielding layer positioned in the display area comprises a plurality of opening structures, and the orthographic projection of the display color resistance pattern on the substrate covers the orthographic projection of the opening structures on the substrate; the shading layer located in the non-display area is provided with a plurality of first grooves, and the thickness of the shading layer at each position of the non-display area is larger than 0.
2. The color film substrate according to claim 1, wherein an orthographic projection of the first groove on the substrate is a first projection;
at least part of the first projection is positioned between the orthographic projections of the two adjacent dummy color resistance patterns on the substrate base plate.
3. The color filter substrate according to claim 1, wherein a second groove is formed in a surface of one side of the dummy color resist pattern, which is away from the substrate.
4. The color filter substrate according to claim 3, wherein an orthographic projection of the second groove on the substrate overlaps with an orthographic projection of the first groove on the substrate.
5. The color filter substrate according to claim 3, wherein the same dummy color resist pattern comprises at least one second groove;
in the first direction, the value range of the width W2 of the second groove is: w2 < 3 μm.
6. The color filter substrate according to claim 1, wherein in a first direction, the width of the first groove is a first width, and the width of the opening structure is a third width; wherein the first width is less than the third width.
7. The color filter substrate according to claim 6, wherein the plurality of first grooves are stripe structures extending along a first direction and arranged along a second direction; wherein the first direction intersects the second direction.
8. The color filter substrate of claim 6, wherein a value range of the first width W1 is as follows: w1 < 3 μm.
9. The color film substrate according to any one of claims 1 to 8, wherein the dummy color resist patterns are block color resist patterns arranged in an array; the display color resistance patterns are strip-shaped color resistance patterns which are arranged along a first direction and extend along a second direction; the first direction is the row direction of the block-shaped color resistance patterns, and the second direction is the column direction of the block-shaped color resistance patterns.
10. A color filter substrate according to any one of claims 1 to 8, wherein the dummy color resist pattern is located on a side of the light-shielding layer away from the substrate.
11. A display panel, comprising: a display area and a non-display area surrounding the display area;
the display panel further includes:
a color filter substrate according to any one of claims 1 to 10;
the array substrate is arranged opposite to the color film substrate;
the supporting column is positioned between the color film substrate and the array substrate;
the orthographic projection of the supporting columns positioned in the display area on the array substrate is positioned in the orthographic projection of the shading layer on the array substrate;
and the orthographic projection of the support column positioned in the non-display area on the array substrate is overlapped with the orthographic projection of the first groove of the light shielding layer in the color film substrate on the array substrate.
12. A display device, comprising: the display panel according to any one of claims 1 to 11.
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| CN201911419196.7A CN111061086A (en) | 2019-12-31 | 2019-12-31 | Color film substrate, display panel and display device |
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| CN201911419196.7A CN111061086A (en) | 2019-12-31 | 2019-12-31 | Color film substrate, display panel and display device |
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Application publication date: 20200424 |