CN110453188A - A magnetic steel swing type end assembly built in a vacuum chamber - Google Patents
A magnetic steel swing type end assembly built in a vacuum chamber Download PDFInfo
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- CN110453188A CN110453188A CN201910814429.7A CN201910814429A CN110453188A CN 110453188 A CN110453188 A CN 110453188A CN 201910814429 A CN201910814429 A CN 201910814429A CN 110453188 A CN110453188 A CN 110453188A
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- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 71
- 239000010959 steel Substances 0.000 title claims abstract description 71
- 230000005540 biological transmission Effects 0.000 claims abstract description 52
- 230000007246 mechanism Effects 0.000 claims abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract description 6
- 230000008021 deposition Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000009434 installation Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
一种内置于真空腔体的磁钢摆动式端头组件,包括装置本体、磁钢、靶管、磁钢芯轴、轴承、盖板、端头、第一传动部件、第二传动部件、靶管旋转传动件和磁钢摆动传动件;磁钢与靶管均转动设置在装置本体内部;装置本体设置在端头的上方;磁钢的底部与磁钢芯轴连接;磁钢芯轴转动安装在端头内部,磁钢芯轴外周设置有轴承;磁钢芯轴下部与第一传动部件传动连接;靶管设置在磁钢的外周,靶管的下部与第二传动部件传动连接;磁钢摆动传动件一端与第一传动部件传动连接,另一端与马达动力连接;靶管旋转传动件的一端与第二传动部件传动连接,另一端连接动力机构。本发明中,具有更好的靶材溅射沉积速率,以及更小的安装空间和更加优化的产线布局。
A magnetic steel swing-type end head assembly built in a vacuum chamber, including a device body, magnetic steel, a target tube, a magnetic steel mandrel, a bearing, a cover plate, a head, a first transmission part, a second transmission part, a target The tube rotation transmission part and the magnetic steel swing transmission part; the magnetic steel and the target tube are both rotated and installed inside the device body; the device body is arranged above the end; the bottom of the magnetic steel is connected with the magnetic steel mandrel; the magnetic steel mandrel is rotated and installed Inside the end, bearings are arranged on the outer periphery of the magnetic steel mandrel; the lower part of the magnetic steel mandrel is connected to the first transmission part; the target tube is arranged on the outer periphery of the magnetic steel, and the lower part of the target tube is connected to the second transmission part; the magnetic steel One end of the oscillating transmission part is in transmission connection with the first transmission part, and the other end is in power connection with the motor; one end of the target tube rotation transmission part is in transmission connection with the second transmission part, and the other end is connected with the power mechanism. In the present invention, it has better target sputtering deposition rate, smaller installation space and more optimized production line layout.
Description
技术领域technical field
本发明涉及磁控溅射镀膜的端头设备领域,尤其涉及一种内置于真空腔体的磁钢摆动式端头组件。The invention relates to the field of end equipment for magnetron sputtering coating, in particular to a magnetic steel swing type end assembly built in a vacuum cavity.
背景技术Background technique
在旋转阴极连续镀膜生产线上,端头带动靶材旋转,在满足一定的工艺环境要求下,将靶材溅射到玻璃基片上,以获得符合产品要求的膜层。On the rotary cathode continuous coating production line, the end drives the target to rotate, and the target is sputtered onto the glass substrate under certain process environment requirements to obtain a film layer that meets the product requirements.
现有设备中,包括以下三种结构:1、端头内置于真空腔体且磁钢静止不动式;2、端头外置于真空腔体且磁钢静止不动式;3、端头外置于真空腔体且磁钢摆动式。The existing equipment includes the following three structures: 1. The terminal is built into the vacuum chamber and the magnet steel is stationary; 2. The terminal is placed outside the vacuum chamber and the magnet is stationary; 3. The terminal is It is placed outside the vacuum chamber and the magnetic steel swings.
如图1所示,为端头内置于真空腔体且磁钢静止不动式的结构,此端头结构主要缺点是:磁钢无法摆动,影响靶材溅射速率及成膜均一性。As shown in Figure 1, it is a structure in which the end is built into the vacuum chamber and the magnet steel is stationary. The main disadvantage of this end structure is that the magnet cannot swing, which affects the sputtering rate of the target and the uniformity of film formation.
如图2所示,为端头外置于真空腔体且磁钢静止不动式的结构,此端头结构主要缺点是:磁钢无法摆动,端头外形尺寸稍大,占用较大空间。As shown in Figure 2, it is a structure in which the end is placed outside the vacuum chamber and the magnetic steel is stationary. The main disadvantages of this end structure are: the magnetic steel cannot swing, and the outer dimension of the end is slightly larger, which takes up a lot of space.
如图3所示,端头外置于真空腔体且磁钢摆动式的结构,此端头结构主要缺点是:端头外形尺寸较大,占用更多空间,不利于整线布局,使用较为不便。As shown in Figure 3, the terminal is placed outside the vacuum chamber and has a magnetic steel swing structure. The main disadvantages of this terminal structure are: the external dimensions of the terminal are large, occupying more space, which is not conducive to the layout of the entire line, and it is relatively difficult to use. inconvenient.
因此,如何获得更好的靶材溅射沉积速率以及更小的安装空间,以及如何优化产线布局,是需要解决的问题。Therefore, how to obtain better target sputtering deposition rate and smaller installation space, and how to optimize the layout of the production line are problems that need to be solved.
发明内容Contents of the invention
(一)发明目的(1) Purpose of the invention
为解决背景技术中存在的技术问题,本发明提出一种内置于真空腔体的磁钢摆动式端头组件,具有更好的靶材溅射沉积速率,以及更小的安装空间和更加优化的产线布局。In order to solve the technical problems existing in the background technology, the present invention proposes a magnetic steel swing-type head assembly built in a vacuum chamber, which has better target sputtering deposition rate, smaller installation space and more optimized Production line layout.
(二)技术方案(2) Technical solutions
为解决上述问题,本发明提供了一种内置于真空腔体的磁钢摆动式端头组件,包括装置本体、磁钢、靶管、磁钢芯轴、轴承、盖板、端头、第一传动部件、第二传动部件、靶管旋转传动件和磁钢摆动传动件;In order to solve the above problems, the present invention provides a magnetic steel swing-type end head assembly built in a vacuum chamber, including a device body, a magnetic steel, a target tube, a magnetic steel mandrel, a bearing, a cover plate, a head, a first The transmission part, the second transmission part, the target tube rotation transmission part and the magnetic steel swing transmission part;
磁钢与靶管均转动设置在装置本体内部;装置本体设置在端头的上方;盖板设置在端头的一侧;其中,盖板朝向装置本体与端头的一侧为真空环境,盖板另一侧为大气环境;Both the magnetic steel and the target tube are rotated and arranged inside the device body; the device body is arranged above the end; the cover is arranged on one side of the end; the side of the cover facing the device body and the end is a vacuum environment, The other side of the board is the atmospheric environment;
磁钢的底部与磁钢芯轴连接;磁钢芯轴转动安装在端头内部,其中,磁钢芯轴顶部和中部的外周均设置有轴承,轴承设置在端头内部;磁钢芯轴下部与第一传动部件传动连接;The bottom of the magnetic steel is connected with the magnetic steel mandrel; the magnetic steel mandrel is rotatably installed inside the end, wherein, the outer circumference of the top and middle part of the magnetic steel mandrel is provided with bearings, and the bearings are arranged inside the end; the lower part of the magnetic steel mandrel Driven connection with the first transmission part;
靶管与端头通过卡箍连接,磁钢设置在靶管内部;靶管的下部与第二传动部件传动连接;The target tube and the end are connected by a clamp, and the magnetic steel is arranged inside the target tube; the lower part of the target tube is connected with the second transmission part;
磁钢摆动传动件的一端穿过盖板伸入端头内部并与第一传动部件传动连接,其另一端与马达动力连接;One end of the magnetic steel oscillating transmission part extends into the interior of the end through the cover plate and is connected to the first transmission part, and the other end is connected to the motor power;
靶管旋转传动件的一端穿过盖板伸入端头内部并与第二传动部件传动连接,其另一端连接动力机构。One end of the target tube rotating transmission member extends through the cover plate into the interior of the end head and is connected in transmission with the second transmission part, and the other end is connected with the power mechanism.
优选的,马达上设有用于控制马达转动角度的控制器和控制系统。Preferably, the motor is provided with a controller and a control system for controlling the rotation angle of the motor.
本发明的上述技术方案具有如下有益的技术效果:The technical solution of the present invention has the following beneficial technical effects:
本发明中,靶管溅射沉积速率更高,膜层均一性更好,相比于磁钢静止不动时的效果更好,具有更小的安装空间和更加优化的产线布局。In the present invention, the sputtering deposition rate of the target tube is higher, the uniformity of the film layer is better, and the effect is better than that of the magnetic steel when it is stationary, and it has a smaller installation space and a more optimized production line layout.
本发明中,实现磁钢在靶管内部旋转的过程,马达通过磁钢摆动传动件、第一传动部件而带动磁钢的摆动,控制器和控制系统用于控制马达旋转角度,从而实现对磁钢的摆动的角度的控制。In the present invention, the process of rotating the magnet inside the target tube is realized. The motor drives the swing of the magnet through the magnet swing transmission part and the first transmission part. The controller and the control system are used to control the rotation angle of the motor, thereby realizing the magnet Control of the swinging angle of the steel.
附图说明Description of drawings
图1为现有技术中,端头内置且磁钢静止不动式的结构示意图。Fig. 1 is a schematic structural diagram of a type in which the terminal is built in and the magnetic steel is stationary in the prior art.
图2为现有技术中,端头外置且磁钢静止不动式的结构示意图。Fig. 2 is a schematic structural view of the prior art with external terminals and static magnetic steel.
图3为现有技术中,端头外置且磁钢摆动式的结构示意图。Fig. 3 is a schematic structural diagram of the prior art with external terminals and swinging magnets.
图4为本发明提出的内置于真空腔体的磁钢摆动式端头组件的结构示意图。FIG. 4 is a schematic structural view of the magnetic steel swing-type end assembly built in the vacuum cavity proposed by the present invention.
图5为本发明提出的内置于真空腔体的磁钢摆动式端头组件的侧视图。Fig. 5 is a side view of the magnetic steel swing-type end assembly built in the vacuum chamber proposed by the present invention.
具体实施方式Detailed ways
为使本发明的目的、技术方案和优点更加清楚明了,下面结合具体实施方式并参照附图,对本发明进一步详细说明。应该理解,这些描述只是示例性的,而并非要限制本发明的范围。此外,在以下说明中,省略了对公知结构和技术的描述,以避免不必要地混淆本发明的概念。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in combination with specific embodiments and with reference to the accompanying drawings. It should be understood that these descriptions are exemplary only, and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.
如图4-5所示,本发明提出的一种内置于真空腔体的磁钢摆动式端头组件,包括装置本体3、磁钢1、靶管2、磁钢芯轴6、轴承7、盖板4、端头5、第一传动部件8、第二传动部件、靶管旋转传动件9和磁钢摆动传动件10;As shown in Figures 4-5, a magnetic steel swing type end assembly built in a vacuum chamber proposed by the present invention includes a device body 3, a magnetic steel 1, a target tube 2, a magnetic steel mandrel 6, a bearing 7, Cover plate 4, end head 5, first transmission part 8, second transmission part, target tube rotation transmission part 9 and magnetic steel swing transmission part 10;
磁钢1与靶管2均转动设置在装置本体3内部;装置本体3设置在端头5的上方;盖板4设置在端头5的一侧;其中,盖板4朝向装置本体3与端头5的一侧为真空环境,盖板4另一侧为大气环境;The magnetic steel 1 and the target tube 2 are both rotated and arranged inside the device body 3; the device body 3 is arranged above the end 5; the cover plate 4 is arranged on one side of the end 5; wherein, the cover plate 4 faces the device body 3 and the end One side of the head 5 is a vacuum environment, and the other side of the cover plate 4 is an atmospheric environment;
磁钢1的底部与磁钢芯轴6连接;磁钢芯轴6转动安装在端头5内部,其中,磁钢芯轴6顶部和中部的外周均设置有轴承7,轴承7设置在端头5内部;磁钢芯轴6下部与第一传动部件8传动连接;The bottom of the magnetic steel 1 is connected to the magnetic steel mandrel 6; the magnetic steel mandrel 6 is rotatably installed inside the end 5, wherein the outer circumference of the top and middle part of the magnetic steel mandrel 6 is provided with a bearing 7, and the bearing 7 is arranged at the end 5 inside; the lower part of the magnetic steel mandrel 6 is connected with the first transmission part 8;
靶管2与端头5通过卡箍连接,磁钢1设置在靶管2内部;靶管2的下部与第二传动部件传动连接;The target tube 2 and the end 5 are connected by a clamp, and the magnetic steel 1 is arranged inside the target tube 2; the lower part of the target tube 2 is connected to the second transmission part by transmission;
磁钢摆动传动件10的一端穿过盖板4伸入端头5内部并与第一传动部件8传动连接,其另一端与马达动力连接;One end of the magnetic steel swing transmission part 10 extends through the cover plate 4 into the interior of the end head 5 and is connected to the first transmission part 8, and the other end is connected to the motor power;
靶管旋转传动件9的一端穿过盖板4伸入端头5内部并与第二传动部件传动连接,其另一端连接动力机构。One end of the target tube rotation transmission part 9 passes through the cover plate 4 and extends into the interior of the end head 5 and is connected in transmission with the second transmission part, and the other end is connected with the power mechanism.
本发明中,采用端头内置且磁钢摆动是结构;在靶管2旋转的过程中,磁钢1同时能够在一定的角度范围内匀速摆动,使得靶管2溅射沉积速率更高,膜层均一性更好,相比于磁钢静止不动时的效果更好;即,本设备具有更好的靶材溅射沉积速率,以及更小的安装空间和更加优化的产线布局。In the present invention, the built-in structure of the end and the swing of the magnetic steel are adopted; during the rotation of the target tube 2, the magnetic steel 1 can swing at a constant speed within a certain angle range at the same time, so that the sputtering deposition rate of the target tube 2 is higher, and the film The layer uniformity is better, which is better than when the magnetic steel is stationary; that is, the equipment has a better sputtering deposition rate of the target, as well as a smaller installation space and a more optimized production line layout.
本发明中,磁钢芯轴6为自转动结构,磁钢芯轴6顶部和中部的外周均设置有轴承7,轴承7设置在端头5内部,以实现磁钢1在靶管2内部旋转的过程。其中,马达通过磁钢摆动传动件10、第一传动部件8而带动磁钢1的摆动。In the present invention, the magnetic steel mandrel 6 is a self-rotating structure, and the outer circumference of the top and middle part of the magnetic steel mandrel 6 is provided with a bearing 7, and the bearing 7 is arranged inside the end 5 to realize the rotation of the magnetic steel 1 inside the target tube 2 the process of. Wherein, the motor drives the magnet steel 1 to swing through the magnet steel swing transmission part 10 and the first transmission part 8 .
在一个可选的实施例中,马达上设有用于控制马达转动角度的控制器和控制系统。In an optional embodiment, the motor is provided with a controller and a control system for controlling the rotation angle of the motor.
本发明中,控制器和控制系统用于控制马达旋转角度,从而实现对磁钢1的摆动的角度的控制。In the present invention, the controller and the control system are used to control the rotation angle of the motor, so as to control the swing angle of the magnetic steel 1 .
应当理解的是,本发明的上述具体实施方式仅仅用于示例性说明或解释本发明的原理,而不构成对本发明的限制。因此,在不偏离本发明的精神和范围的情况下所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。此外,本发明所附权利要求旨在涵盖落入所附权利要求范围和边界、或者这种范围和边界的等同形式内的全部变化和修改例。It should be understood that the above specific embodiments of the present invention are only used to illustrate or explain the principles of the present invention, and not to limit the present invention. Therefore, any modification, equivalent replacement, improvement, etc. made without departing from the spirit and scope of the present invention shall fall within the protection scope of the present invention. Furthermore, it is intended that the appended claims of the present invention embrace all changes and modifications that come within the scope and metesques of the appended claims, or equivalents of such scope and metes and bounds.
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2656432Y (en) * | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | Rotary type magnetic controlled sputtering target |
CN2873800Y (en) * | 2005-09-13 | 2007-02-28 | 北京实力源科技开发有限责任公司 | Target device |
CN103147056A (en) * | 2013-03-26 | 2013-06-12 | 长春科纳光电技术有限公司 | Moving field vacuum coating magnetron sputtering source |
CN103409725A (en) * | 2013-05-22 | 2013-11-27 | 东莞宏威数码机械有限公司 | Rotating special-shaped target cathode mechanism and magnetron sputtering coating device |
CN103938171A (en) * | 2014-04-12 | 2014-07-23 | 合肥工业大学 | Device and method for improving sputtering cathode target utilization rate and coating uniformity |
CN206157219U (en) * | 2016-10-21 | 2017-05-10 | 斡兹真空科技(上海)有限公司 | Rotating cathode with adjustable target surface magnetic field intensity |
CN206157215U (en) * | 2016-10-21 | 2017-05-10 | 斡兹真空科技(上海)有限公司 | Novel rotating cathode |
CN107058965A (en) * | 2017-06-28 | 2017-08-18 | 武汉科瑞达真空科技有限公司 | A kind of built-in rotating cathode structure |
CN210394510U (en) * | 2019-08-30 | 2020-04-24 | 深圳市金耀玻璃机械有限公司 | Magnetic steel swinging end assembly arranged in vacuum cavity |
-
2019
- 2019-08-30 CN CN201910814429.7A patent/CN110453188A/en active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2656432Y (en) * | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | Rotary type magnetic controlled sputtering target |
CN2873800Y (en) * | 2005-09-13 | 2007-02-28 | 北京实力源科技开发有限责任公司 | Target device |
CN103147056A (en) * | 2013-03-26 | 2013-06-12 | 长春科纳光电技术有限公司 | Moving field vacuum coating magnetron sputtering source |
CN103409725A (en) * | 2013-05-22 | 2013-11-27 | 东莞宏威数码机械有限公司 | Rotating special-shaped target cathode mechanism and magnetron sputtering coating device |
CN103938171A (en) * | 2014-04-12 | 2014-07-23 | 合肥工业大学 | Device and method for improving sputtering cathode target utilization rate and coating uniformity |
CN206157219U (en) * | 2016-10-21 | 2017-05-10 | 斡兹真空科技(上海)有限公司 | Rotating cathode with adjustable target surface magnetic field intensity |
CN206157215U (en) * | 2016-10-21 | 2017-05-10 | 斡兹真空科技(上海)有限公司 | Novel rotating cathode |
CN107058965A (en) * | 2017-06-28 | 2017-08-18 | 武汉科瑞达真空科技有限公司 | A kind of built-in rotating cathode structure |
CN210394510U (en) * | 2019-08-30 | 2020-04-24 | 深圳市金耀玻璃机械有限公司 | Magnetic steel swinging end assembly arranged in vacuum cavity |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113802097A (en) * | 2021-09-17 | 2021-12-17 | 北京航空航天大学 | Tool for preparing thermal barrier coating of blade |
CN113802097B (en) * | 2021-09-17 | 2022-05-20 | 北京航空航天大学 | A tool for preparing blade thermal barrier coating |
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