CN110196362A - The test macro and method of electron gun emitting performance - Google Patents
The test macro and method of electron gun emitting performance Download PDFInfo
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- CN110196362A CN110196362A CN201910369692.XA CN201910369692A CN110196362A CN 110196362 A CN110196362 A CN 110196362A CN 201910369692 A CN201910369692 A CN 201910369692A CN 110196362 A CN110196362 A CN 110196362A
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Abstract
一种电子枪发射性能测试系统及方法,系统包括:第一真空室、第二真空室、真空系统、电极系统及电气控制系统;第一真空室及第二真空室用于放置电子枪,其中第一真空室设有阳极;真空系统用于对第一真空室及第二真空室抽真空;电极系统用于为电子枪提供电流和电压;电气控制系统用于控制真空系统及所述电极系统的动作,以测试电子的枪发射性能。该系统具有结构紧凑、可靠性高、测量参数全等优点,可有效缩短电子枪及微波管的研制周期,便于生产批量化应用。
An electron gun emission performance testing system and method, the system includes: a first vacuum chamber, a second vacuum chamber, a vacuum system, an electrode system and an electrical control system; the first vacuum chamber and the second vacuum chamber are used for placing electron guns, wherein the first vacuum chamber and the second vacuum chamber The vacuum chamber is provided with an anode; the vacuum system is used to evacuate the first vacuum chamber and the second vacuum chamber; the electrode system is used to provide current and voltage for the electron gun; the electrical control system is used to control the action of the vacuum system and the electrode system, To test the gun firing performance of electrons. The system has the advantages of compact structure, high reliability, and complete measurement parameters, which can effectively shorten the development cycle of electron guns and microwave tubes, and is convenient for mass production applications.
Description
技术领域technical field
本发明涉及真空电子学技术领域,尤其涉及一种电子枪发射性能的测试系统及方法。The invention relates to the technical field of vacuum electronics, in particular to a system and method for testing the emission performance of an electron gun.
背景技术Background technique
电子枪是微波管的心脏,由阴极-热子组件、阴极支撑筒、控制极和热子引线组件等部分组成,其功能是产生和形成一定形状的电子注。在微波管研制过程中,电子枪组件的装配和焊接精度可以用接触式或非接触式的测量方法进行检验,判断电子枪几何尺寸是否合格;但是电子枪的发射性能和导流系数等电性能的检测只能待形成整管后在热测环节进行验证。若电子枪的电性能指标不合格,则只能对整管进行返工,调整工艺参数重新制备电子枪组件。微波管的研制过程中电子枪主要面临两个问题:一是电子枪聚束极膨胀量的大小决定了阴极-阳极之间的距离,距离的大或小都会影响电子枪的发射性能和整管的电气性能。目前是根据膨胀量计算距离,无法模拟阴极-阳极的工作状态;二是形成整管前电子枪阴极发射性能测试和导流系数测定尚无相关手段,而电子枪阴极发射电流大或小均会影响整管中电子枪打火。为确保微波管的可靠性及稳定性,需对电子枪发射性能进行测试。The electron gun is the heart of the microwave tube, which is composed of the cathode-thermal subassembly, the cathode support cylinder, the control electrode and the hot sub-lead assembly, etc. Its function is to generate and form a certain shape of electron injection. In the process of microwave tube development, the assembly and welding accuracy of electron gun components can be tested by contact or non-contact measurement methods to determine whether the geometry of the electron gun is qualified; It can be verified in the thermal measurement link after the whole tube is formed. If the electrical performance index of the electron gun is unqualified, the whole tube can only be reworked, and the process parameters are adjusted to prepare the electron gun assembly again. There are two main problems faced by the electron gun during the development of the microwave tube: First, the expansion of the electron gun's focusing pole determines the distance between the cathode and the anode. The larger or smaller distance will affect the emission performance of the electron gun and the electrical performance of the entire tube. . At present, the distance is calculated based on the amount of expansion, and the working state of the cathode and anode cannot be simulated. Second, there is no relevant means to test the cathode emission performance and conductance coefficient of the electron gun before forming the whole tube, and the emission current of the electron gun cathode is large or small. The electron gun in the tube fires. In order to ensure the reliability and stability of the microwave tube, it is necessary to test the emission performance of the electron gun.
发明内容SUMMARY OF THE INVENTION
(一)要解决的技术问题(1) Technical problems to be solved
针对于现有的技术问题,本发明提出一种电子枪发射性能的测试系统及方法,用于解决现有技术中模拟阴极-阳极的工作状态及形成整管前电子枪阴极发射性能测试和导流系数无法测定的问题。In view of the existing technical problems, the present invention provides a system and method for testing the emission performance of an electron gun, which are used to solve the problem of simulating the working state of the cathode-anode in the prior art and testing the emission performance of the electron gun and the conductivity coefficient before forming the whole tube. Unmeasured problem.
(二)技术方案(2) Technical solutions
本发明提供一种电子枪发射性能测试系统,包括:第一真空室、第二真空室、真空系统、电极系统及电气控制系统;第一真空室及第二真空室用于放置电子枪,其中第一真空室设有阳极;真空系统用于对第一真空室及第二真空室抽真空;电极系统用于为电子枪提供电流和电压;电气控制系统用于控制真空系统及电极系统的动作,以测试电子的枪发射性能。The invention provides an electron gun emission performance testing system, comprising: a first vacuum chamber, a second vacuum chamber, a vacuum system, an electrode system and an electrical control system; the first vacuum chamber and the second vacuum chamber are used for placing the electron gun, wherein the first vacuum chamber and the second vacuum chamber are used for placing the electron gun. The vacuum chamber is provided with an anode; the vacuum system is used to evacuate the first vacuum chamber and the second vacuum chamber; the electrode system is used to provide current and voltage for the electron gun; the electrical control system is used to control the action of the vacuum system and the electrode system to test The gun firing performance of electrons.
可选地,真空系统包括离子泵1、机械泵59、分子泵60及真空管道3;离子泵1的进气口连接第一真空室;机械泵59的进气口连接分子泵60的出气口,分子泵60的进气口连接第二真空室;分子泵60的进气口与离子泵1的进气口通过真空管道3连接。Optionally, the vacuum system includes an ion pump 1, a mechanical pump 59, a molecular pump 60 and a vacuum pipeline 3; the air inlet of the ion pump 1 is connected to the first vacuum chamber; the air inlet of the mechanical pump 59 is connected to the air outlet of the molecular pump 60 , the air inlet of the molecular pump 60 is connected to the second vacuum chamber; the air inlet of the molecular pump 60 is connected with the air inlet of the ion pump 1 through the vacuum pipe 3 .
可选地,真空管道3包括第一端口、第二端口、第三端口及第四端口;离子泵1的进气口连接第一端口,第二端口连接第一真空室;分子泵60 的进气口连接第四端口,第三端口连接第二真空室。Optionally, the vacuum pipeline 3 includes a first port, a second port, a third port and a fourth port; the air inlet of the ion pump 1 is connected to the first port, and the second port is connected to the first vacuum chamber; The gas port is connected to the fourth port, and the third port is connected to the second vacuum chamber.
可选地,电极系统包括第一电极8、第二电极10及第三电极22,三电极的一端连接真空系统,另一端连接电气控制系统。Optionally, the electrode system includes a first electrode 8 , a second electrode 10 and a third electrode 22 , one end of the three electrodes is connected to the vacuum system, and the other end is connected to the electrical control system.
可选地,第一端口与第二端口处于同一垂线上,第三端口与第四端口处于同一垂线上。Optionally, the first port and the second port are on the same vertical line, and the third port and the fourth port are on the same vertical line.
可选地,真空系统还包括第一气动高真空挡板阀4、第二气动高真空挡板阀9、第三气动高真空挡板阀23,第四气动高真空挡板阀30、第五气动高真空挡板阀35、三通连接管36、盲板法兰37、第六气动高真空挡板阀38、第七气动高真空挡板阀39、真空连接管40及第三波纹管41;机械泵59的进气口通过第五气动高真空挡板阀35、三通连接管36、第三波纹管41与分子泵60的出气口连接;机械泵59进气口通过第五气动高真空挡板阀35、真空连接管40与第六气动高真空挡板阀38、第七气动高真空挡板阀39连接;盲板法兰37设于第四端口旁。Optionally, the vacuum system further includes a first pneumatic high vacuum baffle valve 4, a second pneumatic high vacuum baffle valve 9, a third pneumatic high vacuum baffle valve 23, a fourth pneumatic high vacuum baffle valve 30, a fifth pneumatic high vacuum baffle valve 30, and a fifth pneumatic high vacuum baffle valve. Pneumatic high vacuum flapper valve 35, three-way connecting pipe 36, blind flange 37, sixth pneumatic high vacuum flapper valve 38, seventh pneumatic high vacuum flapper valve 39, vacuum connection pipe 40 and third bellows 41 The air inlet of the mechanical pump 59 is connected with the air outlet of the molecular pump 60 through the fifth pneumatic high vacuum baffle valve 35, the three-way connecting pipe 36 and the third bellows 41; The vacuum baffle valve 35 and the vacuum connecting pipe 40 are connected with the sixth pneumatic high vacuum baffle valve 38 and the seventh pneumatic high vacuum baffle valve 39; the blind flange 37 is arranged beside the fourth port.
可选地,离子泵1的进气口与第一端口之间设有第一插板阀2,第二端口与第一真空室之间设有第二插板阀7;分子泵60的进气口与第四端口之间设有第四插板阀31,第三端口与第二真空室之间设有第三插板阀24。Optionally, a first flapper valve 2 is arranged between the air inlet of the ion pump 1 and the first port, and a second flapper valve 7 is arranged between the second port and the first vacuum chamber; A fourth plug valve 31 is provided between the air port and the fourth port, and a third plug valve 24 is provided between the third port and the second vacuum chamber.
可选地,电子枪发射性能测试系统还包括真空计42、第一电阻规34、第二电阻规61及电离规62;第一电阻规34与真空计42连接,用于测量机械泵59进气口的真空度;第二电阻规61与真空计42连接,用于测量第一真空室及第二真空室的低真空度;电离规62与真空计42连接,用于测量第一真空室及第二真空室的高真空度。Optionally, the electron gun emission performance testing system also includes a vacuum gauge 42, a first resistance gauge 34, a second resistance gauge 61 and an ionization gauge 62; the first resistance gauge 34 is connected to the vacuum gauge 42 for measuring the intake air of the mechanical pump 59. The vacuum degree of the mouth; the second resistance gauge 61 is connected to the vacuum gauge 42 for measuring the low vacuum degree of the first vacuum chamber and the second vacuum chamber; the ionization gauge 62 is connected to the vacuum gauge 42 for measuring the first vacuum chamber and the second vacuum chamber. High vacuum of the second vacuum chamber.
可选地,离子泵的启动条件为进气口真空度优于5×10-4Pa,分子泵的启动条件为进气口真空度不低于10Pa。Optionally, the starting condition of the ion pump is that the vacuum degree of the air inlet is better than 5×10 -4 Pa, and the starting condition of the molecular pump is that the vacuum degree of the air inlet is not lower than 10 Pa.
本发明另一方面提供一种电子枪发射性能的测试方法,包括:S1,关闭所有插板阀,并开启第一气动高真空挡板阀;S2,将电子枪置于第一真空室或第二真空室中,使得电子枪的电极与系统的电极连接;S3,启动机械泵,开启第二、第三、第四气动高真空挡板阀,待机械泵进气口真空度优于第一预设值,启动分子泵,开启分子泵连接的第二、第三、第四插板阀;S4,待分子泵进气口真空度优于第二预设值时,打开第一插板阀;S5,对电子枪进行加热,测试电子枪的发射电流、导流系数及表面温度。Another aspect of the present invention provides a method for testing the emission performance of an electron gun. In the chamber, the electrode of the electron gun is connected with the electrode of the system; S3, start the mechanical pump, open the second, third and fourth pneumatic high-vacuum flapper valves, and wait until the vacuum degree of the air inlet of the mechanical pump is better than the first preset value , start the molecular pump, and open the second, third, and fourth plug-in valves connected to the molecular pump; S4, when the vacuum degree of the air inlet of the molecular pump is better than the second preset value, open the first plug-in valve; S5, The electron gun is heated, and the emission current, conductivity coefficient and surface temperature of the electron gun are tested.
(三)有益效果(3) Beneficial effects
本发明提出一种电子枪发射性能的测试系统及方法,有益效果为:The present invention provides a system and method for testing the emission performance of an electron gun, and the beneficial effects are as follows:
(1)该性能测试系统及方法通过真空系统和电气系统获得超高真空,极限真空度优于2×10-7Pa。(1) The performance testing system and method obtain ultra-high vacuum through a vacuum system and an electrical system, and the ultimate vacuum degree is better than 2×10 -7 Pa.
(2)该性能测试系统及方法能够方便快捷的测试电子枪发射性能,有效缩短了电子枪及微波管的研制周期,提高了电子枪的可靠性及稳定性;(2) The performance testing system and method can conveniently and quickly test the emission performance of the electron gun, effectively shorten the development cycle of the electron gun and the microwave tube, and improve the reliability and stability of the electron gun;
(3)该性能测试系统及方法能够测试电子枪在不同电流和时间下的温度、电压等实验数据为微波管后续工序提供依据;(3) The performance testing system and method can test the temperature, voltage and other experimental data of the electron gun under different currents and times to provide a basis for the subsequent procedures of the microwave tube;
(4)双工位测试系统结构紧凑,占用空间小,操作方便,便于生产批量化应用。(4) The double-station test system has a compact structure, small footprint, convenient operation, and is convenient for mass production applications.
附图说明Description of drawings
图1示意性示出了本发明实施例微波管电子枪发射性能测试系统的示意图。FIG. 1 schematically shows a schematic diagram of a system for testing the emission performance of a microwave tube electron gun according to an embodiment of the present invention.
图2示意性示出了本发明实施例微波管电子枪发射性能测试系统的右视图。FIG. 2 schematically shows a right side view of a microwave tube electron gun emission performance testing system according to an embodiment of the present invention.
图3示意性示出了本发明实施例微波管电子枪发射性能测试系统中电气控制系统的示意图。FIG. 3 schematically shows a schematic diagram of an electrical control system in a microwave tube electron gun emission performance testing system according to an embodiment of the present invention.
图4示意性示出了本发明实施例微波管电子枪发射性能测试方法的流程图。FIG. 4 schematically shows a flow chart of a method for testing the emission performance of a microwave tube electron gun according to an embodiment of the present invention.
【附图标记】[reference number]
1-离子泵; 2-第一插板阀; 3-真空管道;1-Ion pump; 2-The first flapper valve; 3-Vacuum pipeline;
4-第一气动高真空挡板阀; 5-第一卡箍; 6-第一三通;4-The first pneumatic high vacuum flapper valve; 5-The first clamp; 6-The first three-way;
7--第二插板阀; 8-第一电极; 9-第二气动高真空挡板阀;7--the second flapper valve; 8--the first electrode; 9--the second pneumatic high-vacuum flapper valve;
10-第二电极; 11-水冷阳极; 12-升降机构;10-Second electrode; 11-Water-cooled anode; 12-Lifting mechanism;
13-第一观察窗CF63; 14-不锈钢钟罩; 15-第二观察窗CF63;13-The first observation window CF63; 14-Stainless steel bell jar; 15-The second observation window CF63;
16-支架; 17-刀口法兰CF150; 18-石英钟罩;16-bracket; 17-knife flange CF150; 18-quartz bell;
19-物料盘; 20-橡胶密封圈; 21-台架;19-material tray; 20-rubber sealing ring; 21-bench;
22-第三电极; 23-第三气动高真空挡板阀; 24-第三插板阀;22-The third electrode; 23-The third pneumatic high vacuum flapper valve; 24-The third flapper valve;
25-变径管; 26-第二三通; 27-第一波纹管; 28-第二卡箍;25-reducer pipe; 26-second tee; 27-first corrugated pipe; 28-second clamp;
29-第三卡箍; 30-第四气动高真空挡板阀;29-The third clamp; 30-The fourth pneumatic high vacuum flapper valve;
31-第四插板阀; 32-弯管; 33-第二波纹管;31- the fourth plug valve; 32- elbow; 33- the second bellows;
34-第一电阻规; 35-第五气动高真空挡板阀; 36-三通连接管;34- The first resistance gauge; 35- The fifth pneumatic high vacuum flapper valve; 36- Three-way connecting pipe;
37-盲板法兰; 38-第六气动高真空挡板阀;37-blind flange; 38-sixth pneumatic high vacuum flapper valve;
39-第七气动高真空挡板阀;40-真空连接管; 41-第三波纹管;39-the seventh pneumatic high vacuum flapper valve; 40-vacuum connecting pipe; 41-the third bellows;
42-真空计; 43-机柜; 44-显示屏; 45-钟罩升按钮;42-vacuum gauge; 43-cabinet; 44-display; 45-bell rise button;
46-钟罩降按钮; 47-钟罩脱开按钮; 48-压缩空气异常按钮;46-bell jar down button; 47-bell jar release button; 48-compressed air abnormal button;
49-真空异常按钮; 50-缺水按钮; 51-分子泵异常按钮;49- Vacuum abnormal button; 50- Water shortage button; 51- Molecular pump abnormal button;
52-机械泵异常按钮; 53-报警复位按钮; 54-第一灯丝电源;52-Mechanical pump abnormal button; 53-Alarm reset button; 54-First filament power supply;
55-第二灯丝电源; 56-高压电源; 57离子泵电源;55-second filament power supply; 56-high voltage power supply; 57-ion pump power supply;
58-UPS电源; 59-机械泵; 60-分子泵; 61-第二电阻规; 62-电离规。58-UPS power supply; 59-Mechanical pump; 60-Molecular pump; 61-Second resistance gauge; 62-Ionization gauge.
具体实施方式Detailed ways
本发明提供了一种微波管电子枪发射性能测试系统及方法,其具有结构紧凑、可靠性高、测量参数全等优点,可有效缩短电子枪及微波管的研制周期。The invention provides a microwave tube electron gun emission performance testing system and method, which has the advantages of compact structure, high reliability, and complete measurement parameters, and can effectively shorten the development cycle of the electron gun and the microwave tube.
为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明进一步详细说明。In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to specific embodiments and accompanying drawings.
本发明一实施例提出一种电子枪发射性能测试系统,包括:An embodiment of the present invention provides an electron gun emission performance testing system, including:
第一真空室、第二真空室、真空系统、电极系统及电气控制系统。The first vacuum chamber, the second vacuum chamber, the vacuum system, the electrode system and the electrical control system.
第一真空室及第二真空室用于放置电子枪,其中第一真空室设有阳极;真空系统用于对第一真空室及第二真空室抽真空;电极系统用于为电子枪提供电流和电压;电气控制系统用于控制真空系统及电极系统的动作,以实现对置于两真空室中电子的枪发射性能的测试。具体结构示意图如图1 及图2所示。The first vacuum chamber and the second vacuum chamber are used to place the electron gun, wherein the first vacuum chamber is provided with an anode; the vacuum system is used to evacuate the first vacuum chamber and the second vacuum chamber; the electrode system is used to provide current and voltage for the electron gun ; The electrical control system is used to control the action of the vacuum system and the electrode system, so as to realize the test of the gun emission performance of the electrons placed in the two vacuum chambers. The schematic diagram of the specific structure is shown in Figure 1 and Figure 2 .
请参照图1及图2,在台架21不锈钢工作台面上对称设置第一真空室 (不锈钢钟罩14)及第二真空室(石英钟罩18)。不锈钢钟罩14与升降机构12连接,实现钟罩的升降;电子枪与水冷阳极11组成电子枪性能测试结构,实现模拟阴极-阳极的工作状态;通过第一观察窗13及第二观察窗15实现内部观察;通过支架16对不锈钢钟罩14进行安装和拆卸维修;通过刀口法兰17实现真空密封。1 and FIG. 2, a first vacuum chamber (stainless steel bell 14) and a second vacuum chamber (quartz bell 18) are symmetrically arranged on the stainless steel work surface of the stand 21. The stainless steel bell 14 is connected with the lifting mechanism 12 to realize the lifting of the bell; the electron gun and the water-cooled anode 11 form an electron gun performance test structure to simulate the working state of the cathode-anode; the first observation window 13 and the second observation window 15 realize the internal Observation; the stainless steel bell 14 is installed and removed for maintenance through the bracket 16 ; vacuum sealing is achieved through the knife-edge flange 17 .
石英钟罩18与下方的工作台面采用L型氟橡胶密封圈20密封连接,构成密封的工作台。在工作台的下方设置有真空管道3和电极接线柱,用于工作台和真空系统之间的真空连接,以及和电极系统的电性连接。石英钟罩18要求承受一定压力和温度,因此主体是直立的圆筒形回转体,底部端口形状为圆形平面,顶部为半球形。物料盘19置于石英钟罩内部,用于电子枪的安装和固定。The quartz bell 18 is sealed and connected with the lower worktable by an L-shaped fluororubber sealing ring 20 to form a sealed worktable. A vacuum pipe 3 and an electrode terminal are arranged below the workbench, which are used for vacuum connection between the workbench and the vacuum system, and electrical connection with the electrode system. The quartz bell 18 is required to withstand a certain pressure and temperature, so the main body is an upright cylindrical revolving body, the bottom port is a circular plane, and the top is a hemisphere. The material tray 19 is placed inside the quartz bell for installation and fixation of the electron gun.
真空系统包括:离子泵1、机械泵59、分子泵60、阀门和真空管道3。其中,离子泵1位于不锈钢钟罩14工作台的下部,分子泵60位于石英钟罩18工作台的下部。The vacuum system includes: an ion pump 1 , a mechanical pump 59 , a molecular pump 60 , a valve and a vacuum pipeline 3 . The ion pump 1 is located at the lower part of the workbench of the stainless steel bell 14 , and the molecular pump 60 is located at the lower part of the workbench of the quartz bell 18 .
机械泵59的进气口连接至与分子泵60的出气口;分子泵60的进气口连接到石英钟罩18工作台。离子泵1的进气口连接至不锈钢钟罩14工作台。分子泵60的进气口和离子泵1的进气口通过真空管道3连接。在实际工作中,可以根据需要开启相应的真空泵,对不锈钢钟罩14和石英钟罩18抽真空。The air inlet of the mechanical pump 59 is connected to the air outlet of the molecular pump 60 ; the air inlet of the molecular pump 60 is connected to the workbench of the quartz bell 18 . The air inlet of the ion pump 1 is connected to the stainless steel bell 14 table. The air inlet of the molecular pump 60 and the air inlet of the ion pump 1 are connected through the vacuum pipe 3 . In actual work, the corresponding vacuum pump can be turned on as required to evacuate the stainless steel bell 14 and the quartz bell 18 .
真空管道3为“H”型的真空管道。离子泵1的进气口通过第一插板阀2连接至真空管道3的第一端口,真空管道3的第二端口通过第二插板阀7和不锈钢钟罩14工作台连接。其中,第一端口和第二端口为处于同一垂线的端口。The vacuum pipe 3 is an "H" type vacuum pipe. The air inlet of the ion pump 1 is connected to the first port of the vacuum pipeline 3 through the first flapper valve 2 , and the second port of the vacuum pipeline 3 is connected to the stainless steel bell 14 workbench via the second flapper valve 7 . Wherein, the first port and the second port are ports on the same vertical line.
分子泵60的进气口通过第四插板阀31与真空管道3的第四端口连接。真空管道3的第三端口通过第三插板阀24与石英钟罩18工作台连接。其中,第三端口和第四端口为处于同一垂线的端口。The air inlet of the molecular pump 60 is connected to the fourth port of the vacuum pipe 3 through the fourth plug valve 31 . The third port of the vacuum pipe 3 is connected to the workbench of the quartz bell 18 through the third plug valve 24 . Wherein, the third port and the fourth port are ports on the same vertical line.
其中,第一插板阀2、第二插板阀7、第三插板阀24和第四插板阀31 均为气动超高真空插板阀。不锈钢钟罩工作台独立工作时,开启第一插板阀2、第二插板阀7和第四插板阀31;石英钟罩工作台独立工作时,开启第一插板阀2、第三插板阀24和第四插板阀31;两工作台同时工作时,开启第一插板阀2、第二插板阀7、第三插板阀24和第四插板阀31。The first plug valve 2, the second plug valve 7, the third plug valve 24 and the fourth plug valve 31 are all pneumatic ultra-high vacuum plug valve. When the stainless steel bell workbench works independently, open the first plug valve 2, the second plug valve 7 and the fourth plug valve 31; when the quartz bell workbench works independently, open the first plug valve 2 and the third plug valve 31. Plate valve 24 and fourth plate valve 31; when the two workbenches work at the same time, open the first plate valve 2, the second plate valve 7, the third plate valve 24 and the fourth plate valve 31.
进一步的,真空系统还包括:第一气动高真空挡板阀4、第二气动高真空挡板阀9、第三气动高真空挡板阀23,第四气动高真空挡板阀30、第五气动高真空挡板阀35、三通连接管36、盲板法兰37、第六气动高真空挡板阀38、第七气动高真空挡板阀39、真空连接管40及第三波纹管41。机械泵59的进气口通过第五气动高真空挡板阀35、三通连接管36、第三波纹管41与分子泵60的出气口连接;机械泵59进气口通过第五气动高真空挡板阀35、真空连接管40与第六气动高真空挡板阀38、第七气动高真空挡板阀39连接。盲板法兰37设于真空管道3的第四端口附近,实现真空密封,可用于扩展接口使用。Further, the vacuum system also includes: a first pneumatic high vacuum baffle valve 4, a second pneumatic high vacuum baffle valve 9, a third pneumatic high vacuum baffle valve 23, a fourth pneumatic high vacuum baffle valve 30, a fifth pneumatic high vacuum baffle valve 30, and a fifth pneumatic high vacuum baffle valve 30. Pneumatic high vacuum flapper valve 35, three-way connecting pipe 36, blind flange 37, sixth pneumatic high vacuum flapper valve 38, seventh pneumatic high vacuum flapper valve 39, vacuum connection pipe 40 and third bellows 41 . The air inlet of the mechanical pump 59 is connected to the air outlet of the molecular pump 60 through the fifth pneumatic high vacuum baffle valve 35, the three-way connecting pipe 36 and the third bellows 41; the air inlet of the mechanical pump 59 is connected to the air outlet of the molecular pump 60 through the fifth pneumatic high vacuum The flapper valve 35 and the vacuum connection pipe 40 are connected to the sixth pneumatic high vacuum flapper valve 38 and the seventh pneumatic high vacuum flapper valve 39 . The blind flange 37 is arranged near the fourth port of the vacuum pipeline 3 to achieve vacuum sealing and can be used for expanding the interface.
机械泵59、第二波纹管33、第一电阻规34、三通连接管36、第一波纹管27,第一三通6,第二三通26,卡箍5、28、29,弯管32,变径管 25,第一气动高真空挡板阀4,第五气动高真空挡板阀35、第六气动高真空挡板阀38、第七气动高真空挡板阀39、真空连接管40,第二气动高真空挡板阀9和第三气动高真空挡板阀23,第四气动高真空挡板阀30分别与两个工作台连接,组成真空系统的旁路系统,通过气动高真空挡板阀的开启和关闭实现两个工作台的预抽真空和真空放气。Mechanical pump 59, second bellows 33, first resistance gauge 34, tee connecting pipe 36, first bellows 27, first tee 6, second tee 26, clamps 5, 28, 29, elbow 32, reducing pipe 25, first pneumatic high vacuum flapper valve 4, fifth pneumatic high vacuum flapper valve 35, sixth pneumatic high vacuum flapper valve 38, seventh pneumatic high vacuum flapper valve 39, vacuum connecting pipe 40. The second pneumatic high vacuum baffle valve 9, the third pneumatic high vacuum baffle valve 23, and the fourth pneumatic high vacuum baffle valve 30 are respectively connected with the two workbenches to form the bypass system of the vacuum system. The opening and closing of the vacuum baffle valve realizes the pre-evacuation and vacuum release of the two workbenches.
电极系统设置于台架21下方,对应工作台电极的第一电极8、第二电极10及第三电极22。工作台上放置的微波管电子枪的电性连接于工作台架下方相应的电极上。三个电极的前端连入真空系统内,后端与电气控制系统连接,为处于真空状态的微波管电子枪提供电流和电压。The electrode system is arranged under the stage 21 and corresponds to the first electrode 8 , the second electrode 10 and the third electrode 22 of the stage electrodes. The microwave tube electron gun placed on the workbench is electrically connected to the corresponding electrodes under the workbench. The front end of the three electrodes is connected to the vacuum system, and the back end is connected to the electrical control system to provide current and voltage for the microwave tube electron gun in a vacuum state.
电子枪发射性能测试系统还设置有电离规62和第二电阻规61,通过 4个插板阀的转换对真空系统的真空度进行测量。两工作台可以单独工作或同时工作,且其中一工作台放大气后,另一位的真空度不低于6×10-6Pa。The electron gun emission performance testing system is also provided with an ionization gauge 62 and a second resistance gauge 61, and the degree of vacuum of the vacuum system is measured through the conversion of the four plug-in valves. The two workbenches can work independently or at the same time, and after one workbench is aerated, the vacuum degree of the other is not less than 6×10 -6 Pa.
请参见图3,电气控制系统是PLC控制系统,其机柜43上设有复合真空计42、显示屏44、钟罩升按钮45、钟罩降按钮47、第一灯丝电源54、第二灯丝电源55、高压电源56、离子泵电源57、UPS电源58,为防止误操作,机柜43上配有故障提示按钮,包括压缩空气异常按钮48,真空异常按钮49,缺水按钮50,分子泵异常按钮51,机械泵异常按钮52,和报警复位按钮53。机械泵59,分子泵60,气动高真空挡板阀,插板阀,离子泵电源57,电子枪灯丝电源54和55,高压电源55,UPS电源58,复合真空计42,钟罩升按钮45,钟罩降按钮46,钟罩脱开按钮47,压缩空气异常按钮48,真空异常按钮49,缺水按钮50,分子泵异常按钮51,机械泵异常按钮52,和报警复位按钮53均通过控制线路与电气控制系统连接。3, the electrical control system is a PLC control system, and the cabinet 43 is provided with a composite vacuum gauge 42, a display screen 44, a bell up button 45, a bell down button 47, a first filament power supply 54, and a second filament power supply 55. High voltage power supply 56, ion pump power supply 57, UPS power supply 58, in order to prevent misoperation, the cabinet 43 is equipped with fault prompt buttons, including compressed air abnormal button 48, vacuum abnormal button 49, water shortage button 50, molecular pump abnormal button 51, the mechanical pump abnormal button 52, and the alarm reset button 53. Mechanical pump 59, molecular pump 60, pneumatic high vacuum flapper valve, flapper valve, ion pump power supply 57, electron gun filament power supply 54 and 55, high voltage power supply 55, UPS power supply 58, compound vacuum gauge 42, bell lift button 45, Bell down button 46, bell release button 47, compressed air abnormal button 48, vacuum abnormal button 49, water shortage button 50, molecular pump abnormal button 51, mechanical pump abnormal button 52, and alarm reset button 53 all pass through the control circuit Connect with the electrical control system.
分子泵电源和分子泵60与电气控制系统连接,用于控制分子泵60的启动和关闭;离子泵电源57与离子泵1连接,用于控制离子泵1的启动和关闭,其中离子泵的启动条件是真空度优于5×10-4Pa,且真空管道及真空腔室经过充分烘烤去气;两套灯丝电源54,55和高压电源56分别与电极连接,分别控制两个工作台上电子枪的电流和电压。The molecular pump power supply and the molecular pump 60 are connected to the electrical control system for controlling the startup and shutdown of the molecular pump 60; the ion pump power supply 57 is connected to the ion pump 1 for controlling the startup and shutdown of the ion pump 1, wherein the startup of the ion pump The conditions are that the degree of vacuum is better than 5×10 -4 Pa, and the vacuum pipes and vacuum chambers are fully baked and degassed; two sets of filament power sources 54, 55 and high-voltage power sources 56 are respectively connected to the electrodes, and control the two workbenches respectively. The current and voltage of the electron gun.
复合真空计42与第一电阻规34、第二电阻规61及电离规62连接,用于监测真空系统的真空度。为了同时测量低真空和高真空,该真空计采用复合真空计。第一电阻规34用于测量机械泵59进气口的真空度,满足分子泵60的启动要求。The composite vacuum gauge 42 is connected to the first resistance gauge 34 , the second resistance gauge 61 and the ionization gauge 62 for monitoring the vacuum degree of the vacuum system. In order to measure low vacuum and high vacuum at the same time, the vacuum gauge adopts a composite vacuum gauge. The first resistance gauge 34 is used to measure the vacuum degree of the air inlet of the mechanical pump 59 to meet the start-up requirements of the molecular pump 60 .
第二电阻规61和电离规62分别连接至真空管道3。其中,第二电阻规61与真空计42连接,用于测量两工作台低真空时的真空度 (105Pa~1×10-1Pa)。电离规62与真空计42连接,用于测量两工作台高真空时的真空度(1×10-1Pa~2×10-7Pa)。The second resistance gauge 61 and the ionization gauge 62 are respectively connected to the vacuum line 3 . Wherein, the second resistance gauge 61 is connected to the vacuum gauge 42, and is used to measure the vacuum degree (10 5 Pa to 1×10 -1 Pa) of the two workbenches when the vacuum is low. The ionization gauge 62 is connected to the vacuum gauge 42, and is used for measuring the vacuum degree (1×10 -1 Pa to 2×10 -7 Pa) of the two workbenches under high vacuum.
两工作台共用一套数显真空计42、一个机械泵59及其电源,一个分子泵60及其电源和一个离子泵1及其电源57。The two workbenches share a set of digital vacuum gauge 42 , a mechanical pump 59 and its power supply, a molecular pump 60 and its power supply, and an ion pump 1 and its power supply 57 .
分子泵异常51与真空度关联,真空度低于10Pa时,分子泵电源不允许分子泵60启动。The abnormality 51 of the molecular pump is related to the vacuum degree. When the vacuum degree is lower than 10 Pa, the molecular pump power supply does not allow the molecular pump 60 to start.
灯丝电源关联真空度,真空度低于3.0×10-4Pa时,灯丝电流维持恒定;待真空度优于3.0×10-4Pa时,灯丝电流值逐渐增加。The filament power supply is related to the vacuum degree. When the vacuum degree is lower than 3.0×10 -4 Pa, the filament current remains constant; when the vacuum degree is higher than 3.0×10 -4 Pa, the filament current value gradually increases.
通过上述离子泵1、分子泵60等真空度启动条件的设置,使得微波管电子枪发射性能测试系统通过真空系统和电气系统获得超高真空,极限真空度优于2×10-7Pa,测量可靠性高。通过设计两个工位,不仅能测试电子枪的发射性能及导流系数,还可测量电子枪的不同电流和时间下的温度。测量参数全。通过两工位对称结构的设计方式及各器件之间的连接方式的设计,使得系统结构紧凑,占用空间小,操作方便,便于生产批量化应用。Through the setting of the vacuum degree startup conditions such as the above-mentioned ion pump 1 and molecular pump 60, the microwave tube electron gun emission performance test system can obtain ultra-high vacuum through the vacuum system and electrical system, and the ultimate vacuum degree is better than 2 × 10 -7 Pa, and the measurement is reliable. Sex is high. By designing two stations, not only the emission performance and conductivity of the electron gun can be tested, but also the temperature of the electron gun under different currents and times. All measurement parameters. Through the design of the two-station symmetrical structure and the design of the connection between each device, the system has a compact structure, small footprint, convenient operation, and is convenient for mass production.
基于上述微波管电子枪发射性能测试系统,本发明另一实施例提出一种电子枪发射性能的测试方法,该方法是基于两个工位同时工作的情况下,其流程如图4所示,包括:Based on the above-mentioned microwave tube electron gun emission performance testing system, another embodiment of the present invention proposes a method for testing the emission performance of an electron gun. The method is based on the simultaneous operation of two stations. The process is shown in Figure 4, including:
S1,关闭所有插板阀,并开启第一气动高真空挡板阀。S1, close all flapper valves, and open the first pneumatic high vacuum flapper valve.
在进行性能检测之前,需要检测系统的水路、电路是否正常,若正常关闭所有插板阀(2、7、24、31),并开启第一气动高真空挡板阀4,真空系统进行放气,打开工位上的钟罩。Before performing the performance test, it is necessary to check whether the water circuit and circuit of the system are normal. If all the flapper valves (2, 7, 24, 31) are normally closed, and the first pneumatic high vacuum flapper valve 4 is opened, the vacuum system will be vented. , open the bell jar on the station.
S2,将电子枪放置到钟罩内,电子枪灯丝两极分别与电极连接,注意接线要紧固,罩上钟罩,并关闭第一气动高真空挡板阀4。S2, place the electron gun in the bell jar, connect the two poles of the electron gun filament to the electrodes respectively, pay attention to tighten the wiring, cover the bell jar, and close the first pneumatic high vacuum baffle valve 4.
S3,启动机械泵59,打开第二气动高真空挡板阀9、第三气动高真空挡板阀23及第四气动高真空挡板阀30。待机械泵59进气口真空度优于第一预设值(例如10Pa),开分子泵60电源并启动,打开分子泵60连接的第四插板阀31、第二插板阀7和第三插板阀24。S3 , start the mechanical pump 59 , and open the second pneumatic high vacuum flapper valve 9 , the third pneumatic high vacuum flapper valve 23 and the fourth pneumatic high vacuum flapper valve 30 . When the vacuum degree of the air inlet of the mechanical pump 59 is better than the first preset value (for example, 10Pa), turn on the power supply of the molecular pump 60 and start it, and open the fourth plug valve 31, the second plug valve 7 and the first plug valve 31 connected to the molecular pump 60. Three-plate valve 24.
S4,分子泵2正常工作,待分子泵60进气口真空度优于第二预设值 (例如2.0×10- 3Pa)时,打开离子泵连接的第一插板阀2,启动离子泵1。S4, the molecular pump 2 works normally, and when the vacuum degree of the air inlet of the molecular pump 60 is better than the second preset value (for example, 2.0× 10 −3 Pa ), open the first plug valve 2 connected to the ion pump, and start the ion pump 1.
S5,对电子枪进行加热,测试所述电子枪的发射电流、导流系数及表面温度。S5, heating the electron gun, and testing the emission current, conductivity coefficient and surface temperature of the electron gun.
待真空室中真空度优于3.0×10-4Pa时,按下加热电源“开”按钮开始对两工位上的电子枪进行加热,电子枪缓慢加热,真空度优于1×10-4Pa 时逐步加电流1A~2A,在组件加热过程中真空计显示系统真空度优于2 ×10-4Pa。在电子枪加热过程中,可进行电子枪发射电流,导流系数,表面温度等性能测试。同时,电子枪可进行真空除气,以充分去除两工位电子枪表面及内部吸附的气体、易挥发的物质;待电子枪加热完毕后,将灯丝电流旋钮至“0”,测试过程结束。When the vacuum degree in the vacuum chamber is better than 3.0×10 -4 Pa, press the "ON" button of the heating power to start heating the electron guns on the two stations, the electron guns are heated slowly, and the vacuum degree is better than 1×10 -4 Pa The current is gradually applied to 1A-2A, and the vacuum gauge shows that the vacuum degree of the system is better than 2 × 10 -4 Pa during the heating process of the component. During the heating process of the electron gun, performance tests such as electron gun emission current, conductivity coefficient and surface temperature can be carried out. At the same time, the electron gun can be degassed by vacuum to fully remove the gas and volatile substances adsorbed on the surface and inside of the two-station electron gun; after the electron gun is heated, turn the filament current knob to "0", and the test process is over.
测试结束后,关闭离子泵、分子泵连接的插板阀,然后按下离子泵、分子泵“停止”钮,待分子泵转速为零后,关闭分子泵电源、机械泵电源、冷却水及相应阀门。After the test, close the plug valve connected to the ion pump and molecular pump, and then press the "stop" button of the ion pump and molecular pump. valve.
另外,需要说明的是,在附图或说明书正文中,未绘示或描述的实现方式,均为所属技术领域中普通技术人员所知的形式,并未进行详细说明。此外,上述对各元件和方法的定义并不仅限于实施例中提到的各种具体结构、形状或方式,本领域普通技术人员可对其进行简单地更改或替换,例如:In addition, it should be noted that, in the accompanying drawings or the text of the description, the implementations that are not shown or described are in the form known to those of ordinary skill in the art, and are not described in detail. In addition, the above definitions of each element and method are not limited to various specific structures, shapes or manners mentioned in the embodiments, and those of ordinary skill in the art can simply modify or replace them, for example:
(1)机械泵是可以用干泵来代替;(1) The mechanical pump can be replaced by a dry pump;
(2)气动高真空挡板阀可以用手动高真空金属角阀来代替;(2) The pneumatic high vacuum flapper valve can be replaced by a manual high vacuum metal angle valve;
(3)插板阀可以用手打超高真空插板阀代替;(3) The plug-in valve can be replaced by the ultra-high vacuum plug-in valve by hand;
(4)实施例中提到的方向用语,例如“上”、“下”、“前”等,仅是参考附图的方向,并非用来限制本发明的保护范围。(4) Directional terms mentioned in the embodiments, such as "up", "down", "front", etc., only refer to the directions of the drawings, and are not used to limit the protection scope of the present invention.
综上所述,本发明提供一种具有双工位工作台的微波管电子枪发射性能测试系统及方法,其具有结构紧凑、可靠性高、测量参数全等优点,可有效缩短电子枪的研制周期,具有较好的推广应用价值。In summary, the present invention provides a system and method for testing the emission performance of a microwave tube electron gun with a dual-station worktable, which has the advantages of compact structure, high reliability, and complete measurement parameters, and can effectively shorten the development cycle of the electron gun. It has good promotion and application value.
以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above further describe the purpose, technical solutions and beneficial effects of the present invention in further detail. It should be understood that the above descriptions are only specific embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.
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