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CN110132184B - Nano-indentation area measuring device - Google Patents

Nano-indentation area measuring device Download PDF

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Publication number
CN110132184B
CN110132184B CN201910494551.0A CN201910494551A CN110132184B CN 110132184 B CN110132184 B CN 110132184B CN 201910494551 A CN201910494551 A CN 201910494551A CN 110132184 B CN110132184 B CN 110132184B
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measurement
module
system module
area
nanometer
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CN110132184A (en
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朱振宇
王霁
段小艳
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Beijing Changcheng Institute of Metrology and Measurement AVIC
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Beijing Changcheng Institute of Metrology and Measurement AVIC
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/28Measuring arrangements characterised by the use of optical techniques for measuring areas

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention discloses a nano indentation area measuring device, and belongs to the technical field of optical and mechanical precision measurement. The invention mainly comprises a control system module, an optical system module, a signal demodulation module and a data processing module. The optical system module mainly comprises a light source, a scattering measurement optical component and a scattering measurement receiving device. The invention adopts laser with stable power output as a measuring light source; the light beam enters a polymer mirror after passing through a beam splitter prism and is gathered on a nanometer pressing-in pressure head; the power of a laser light source is regulated and controlled, scattered light passes through a converging objective lens and a beam splitter prism to obtain a measurement photoelectric signal in a measurement receiving device, the distance and the area between a nanometer press-in pressure head and a measured object are processed according to the signal, the nanometer press-in area is determined through the scattered light power and the light spot range, the measurement accuracy of the nanometer press-in area is improved, and the adaptability of the measured object is high.

Description

Nano-indentation area measuring device
Technical Field
The invention relates to a nano indentation area measuring device, and belongs to the technical field of optical and mechanical precision measurement.
Background
The nano-indentation method for measuring the mechanical properties of materials is widely applied to the technical fields of physics, material science, chemistry and the like, and the related measurement technology is continuously improved according to the increasingly developed requirements. As an important means for high-precision measurement of mechanical properties of materials, the improvement of a measuring method and accuracy of nano-indentation has very important significance. In the nanoimprinting method, since the depth dimension of the nanoimprinting is small and the structure is complicated, the error in the measurement result of the nanoimprinting area is large, and randomness, systematicness, and gross error are difficult to determine and separate. The measurement error seriously restricts the measurement capability of the nano-indentation method, the evaluation of the mechanical property of related materials is limited, and the accuracy of the nano-indentation area becomes a key influence factor. The currently applied method of nano pressed area mainly uses principles such as optical microscopic amplification, contact probe scanning and the like to measure the structure size, and the inaccuracy of the measurement result is caused by the error of the measurement principle and the complexity of the measured structure, especially when elastic and brittle materials are measured. Therefore, how to improve the accuracy of the nanoimprint area measurement is one of the key technologies for improving the measurement level.
Disclosure of Invention
In order to avoid the influence of the measurement error of the existing nanometer indentation area on the precision of the nanometer indentation measurement and solve the problem that the calibration verification needs to adopt an actual auxiliary precision displacement measurement device for auxiliary work, the nanometer indentation area measurement device disclosed by the invention aims to solve the technical problems that: the synchronous in-situ measurement of the nano indentation area in the indentation process is realized, the accuracy of the nano indentation area measurement is improved, and the adaptability of a measurement object is high. The purpose of the invention is realized by the following technical scheme.
The invention discloses a nano indentation area measuring device which mainly comprises a control system module, an optical system module, a signal demodulation module and a data processing module. The principle of laser scattering is adopted, the nano indentation area is determined by utilizing the displacement in the nano indentation measuring process and the change value of the scattering area, and the optical system module mainly comprises a light source, a scattering measurement optical component and a scattering measurement receiving device.
The control system module is used for controlling the optical system module, the signal demodulation module and the data processing module and setting preset parameters, and the control system module selects corresponding types of nano-imprinting according to the set parameters to realize automatic measurement of the nano-imprinting process. The optical system module comprises an optical scattering component consisting of a light source and various optical elements, and a photoelectric conversion and data acquisition circuit, and the nanometer indentation area variation is converted into an electrical signal for digital processing through the components. The signal demodulation module classifies and organizes the photoelectric signals obtained by the optical system module to obtain basic used data used for operation and correction processing of the data processing module, and the signal demodulation module works according to a pre-selected set mode. The data processing module is used for processing and calculating the information after measurement and demodulation in the nanometer indentation area measuring device, and finally outputting a measuring result after interacting the general result after calculation with the control system module.
The optical measurement module comprises a light source, a beam splitter prism, a convergent objective, a pressure head and a laser scattering measurement receiver. The pressure head has light transmission and hardness meeting the use requirement. Adopting laser with stable power output as a measuring light source; the light beam enters a converging objective lens after passing through a beam splitter prism and is converged on a nanometer pressing-in pressure head; the power of a laser light source is regulated, scattered light passes through a converging objective lens and a beam splitting prism to obtain a measurement photoelectric signal in a measurement receiving device, the distance and the area between a nanometer press-in pressure head and a measured object are processed according to the signal, and the nanometer press-in area is determined through the scattered light power and the light spot range.
Preferably, the pressure head is a diamond triangular pressure head.
The working method of the nano indentation area measuring device disclosed by the invention comprises the following steps: the control system module sets preset parameters and selects the working flow of nano pressing in corresponding types according to the set parameters; the optical system module adopts laser with stable power output as a measurement light source; the light beam enters a converging objective lens after passing through a beam splitter prism and is converged on a nanometer pressing-in pressure head; the power of a laser light source is regulated and controlled, and scattered light passes through a converging objective lens and a beam splitting prism to obtain a measurement photoelectric signal in a measurement receiving device; the signal demodulation module classifies and organizes the photoelectric signals obtained by the optical system module to obtain basic used data used for operation and correction processing of the data processing module, and the signal demodulation module works according to a pre-selected set mode. The data processing module is used for processing and calculating the information after measurement and demodulation in the nanometer indentation area measuring device, and outputting a final measuring result after interacting the general result after calculation with the control system module.
Has the advantages that:
1. in order to overcome the problem that the indirect measurement is not accurate after the nanometer is pressed in, the nanometer pressed-in area measuring device disclosed by the invention adopts the principle of laser scattering, and utilizes the displacement in the nanometer pressing-in process and the change value of a scattering region to determine the nanometer pressed-in area.
2. In order to solve the problem of large measurement error of the existing optical microscopy method and scanning probe method, the nano indentation area measuring device disclosed by the invention adopts the principle of laser scattering, determines the nano indentation area through the change of the scattered light flux of the contact area, can realize synchronous in-situ measurement of the indentation process of the nano indentation area, can reduce the influence of elastic deformation on the measured indentation area in the nano indentation process, and improves the accuracy of nano indentation measurement.
2. The nano indentation area measuring device disclosed by the invention is relatively compact in structure and good in integration level.
Drawings
FIG. 1 is a schematic diagram of the operation of the nanoimprint area measuring apparatus of the present invention.
FIG. 2 is a schematic view of the optical principle of the nanoimprint area measuring apparatus of the present invention.
The system comprises a control system module, an optical system module, a signal demodulation module, a data processing module, a measurement light source, a beam splitter prism, a converging objective, a diamond pressure head, a nano indentation measurement object, a laser scattering measurement receiver and a nano indentation structure body, wherein the control system module is 1, the optical system module is 2, the signal demodulation module is 3, the data processing module is 4, the measurement light source is 5, the beam splitter prism is 6, the converging objective is 7, the diamond pressure head is 8, the;
Detailed Description
The invention is further illustrated with reference to the following figures and examples.
Example 1
As shown in fig. 1, the apparatus for measuring nano indentation area disclosed in this embodiment is mainly composed of a control system module 1, an optical system module 2, a signal demodulation module 3, and a data processing module 4. The principle of laser scattering is adopted, the nano indentation area is determined by utilizing the displacement in the nano indentation measuring process and the change value of the scattering area, and the optical system module 2 mainly comprises a light source, a scattering measurement optical component and a scattering measurement receiving device.
The control system module 1 is used for controlling the optical system module 2, the signal demodulation module 3 and the data processing module 4 and setting preset parameters, and the control system module 1 selects the corresponding type of nano-indentation work flow according to the set parameters. The optical system module 2 comprises an optical scattering component consisting of a light source and various optical elements, and a photoelectric conversion and data acquisition circuit, and the nanometer indentation area variation is converted into an electrical signal for digital processing through the components. The signal demodulation module 3 classifies and organizes the photoelectric signals obtained by the optical system module 2 to obtain basic used data used for operation and correction processing of the data processing module 4, and the signal demodulation module 3 works according to a pre-selected set mode. The data processing module 4 is used for processing and calculating the information after measurement and demodulation in the nanometer press-in area measuring device, and finally outputting a measuring result after interaction of the general result after calculation and the control system module 1.
As shown in fig. 2, the optical measurement module includes a light source, a beam splitter prism 6, a converging objective lens 7, a pressure head 8, and a laser scattering measurement receiver 10. And the pressure head 8 has light transmission and hardness meeting the use requirement. Adopting laser with stable power output as a measuring light source 5; the light beam enters a converging objective 7 after passing through a beam splitter prism 6 and is converged on a nanometer pressing-in pressure head 8; the power of a laser light source is regulated, scattered light passes through a converging objective lens 7 and a beam splitter prism 6 to obtain a measurement photoelectric signal on a measurement receiving device, the distance and the area between a nanometer press-in pressure head 8 and a measured object are processed according to the signal, and the nanometer press-in area is determined according to the scattered light power and the light spot range. The pressure head 8 is a diamond triangular pressure head 8.
As shown in fig. 1 and 2, the working method of the nano indentation area measurement apparatus disclosed in this embodiment is as follows: the control system module 1 sets preset parameters, and the control system module 1 selects the corresponding type of nano-indentation work flow according to the set parameters; the optical system module 2 adopts laser with the wavelength of 633nm and stable power output as a measuring light source 5; the light beam enters a converging objective 7 after passing through a beam splitter prism 6 and is converged on a nanometer pressing-in pressure head 8, and the pressure head is a diamond (120 degrees) pressure head; the power of a laser light source is regulated, and scattered light passes through a 40-time converging objective lens 7 and a beam splitter prism 6 to obtain a measurement photoelectric signal in a measurement receiving device; the signal demodulation module 3 classifies and organizes the photoelectric signals obtained by the optical system module 2 to obtain basic used data used for operation and correction processing of the data processing module 4, and the signal demodulation module 3 works according to a pre-selected set mode. The data processing module 4 is used for processing and calculating the information after measurement and demodulation in the nanometer press-in area measuring device, and outputting a final measuring result after interacting the calculated general result with the control system module 1.
While the foregoing is directed to the preferred embodiment of the present invention, it is not intended that the invention be limited to the embodiment and the drawings disclosed herein. Equivalents and modifications may be made without departing from the spirit of the disclosure, which is to be considered as within the scope of the invention.

Claims (3)

1. Nanometer area measuring device that impresses, its characterized in that: the device mainly comprises a control system module (1), an optical system module (2), a signal demodulation module (3) and a data processing module (4); the principle of laser scattering is adopted, the nano indentation area is determined by utilizing the displacement in the nano indentation measuring process and the change value of a scattering area, and an optical system module (2) mainly comprises a light source, a scattering measurement optical component and a scattering measurement receiving device;
the control system module (1) is used for controlling the optical system module (2), the signal demodulation module (3) and the data processing module (4) and setting preset parameters, and the control system module (1) selects corresponding types of nano-imprinting according to the set parameters to realize automatic measurement of a nano-imprinting process; the optical system module (2) comprises an optical scattering component consisting of a light source and various optical elements, and a photoelectric conversion and data acquisition circuit, and the nanometer indentation area variation is converted into an electrical signal for digital processing through the components; the signal demodulation module (3) classifies and organizes the photoelectric signals obtained by the optical system module (2) to obtain basic use data used for operation and correction processing of the data processing module (4), and the signal demodulation module (3) works according to a pre-selected set mode; the data processing module (4) is used for processing and calculating the information after measurement and demodulation in the nanometer indentation area measuring device, and finally outputting a measuring result after interaction of the general result after calculation and the control system module (1);
the optical measurement module comprises a light source, a beam splitter prism (6), a converging objective lens (7), a pressure head (8) and a laser scattering measurement receiver (10); the pressure head (8) is a pressure head (8) which has light transmission and hardness meeting the use requirement; adopting laser with stable power output as a measuring light source (5); the light beams enter a converging objective (7) to be converged on a nanometer pressing-in pressure head (8) after passing through a beam splitting prism (6); the power of a laser light source is regulated, scattered light passes through a converging objective lens (7) and a beam splitter prism (6) to obtain a measurement photoelectric signal in a measurement receiving device, the distance and the area between a nanometer press-in pressure head (8) and a measured object are processed according to the signal, and the nanometer press-in area is determined through the scattered light power and the light spot range.
2. The nanoindentation area measurement apparatus as defined in claim 1, wherein: the pressure head (8) is a diamond triangular pressure head (8).
3. The nanoindentation area measurement apparatus as defined in claim 1, wherein: the working method is that the control system module (1) sets preset parameters, and the control system module (1) selects the working process of nano pressing in of corresponding type according to the set parameters; the optical system module (2) adopts laser with stable power output as a measuring light source (5); the light beams enter a converging objective (7) to be converged on a nanometer pressing-in pressure head (8) after passing through a beam splitting prism (6); the power of a laser light source is regulated, and scattered light passes through a converging objective lens (7) and a beam splitter prism (6) to obtain a measurement photoelectric signal in a measurement receiving device; the signal demodulation module (3) classifies and organizes the photoelectric signals obtained by the optical system module (2) to obtain basic use data used for operation and correction processing of the data processing module (4), and the signal demodulation module (3) works according to a pre-selected set mode; the data processing module (4) is used for processing and calculating the information after measurement and demodulation in the nanometer press-in area measuring device, and outputting a final measuring result after interaction of the general result after calculation and the control system module (1).
CN201910494551.0A 2019-06-10 2019-06-10 Nano-indentation area measuring device Active CN110132184B (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200914823A (en) * 2007-09-29 2009-04-01 Kainan High School Of Commerce And Industry Improved device for nanoindentation system
CN101532970A (en) * 2008-03-11 2009-09-16 宝山钢铁股份有限公司 Crystal orientation and micromechanics performance measurement method of each composition crystal grain in polycrystal
CN102589984A (en) * 2012-02-14 2012-07-18 北京大学 Multi-field coupled loading micro nanometer press-in testing system and method
CN105371770A (en) * 2015-12-01 2016-03-02 中国航空工业集团公司北京长城计量测试技术研究所 Measurement device of displacement and load of pressure head of nanoindentor
CN106501111A (en) * 2016-10-20 2017-03-15 吉林大学 The calibration steps of MEMS microbridge indentation load depth curve
GB2559198A (en) * 2017-01-31 2018-08-01 Univ Central Lancashire Measuring properties of a test of a sample of material using depth-sensing indentation
CN108918308A (en) * 2018-05-16 2018-11-30 太原理工大学 A kind of quantitatively characterizing method of titanium alloy surface gradient modified layer Elastoplastic Performances in Simulation parameter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140223612A1 (en) * 2013-02-05 2014-08-07 Asylum Corporation Modular Atomic Force Microscope
CN108254253A (en) * 2018-01-29 2018-07-06 成都微力特斯科技有限公司 Material or component equivalent stress-strain relation assay method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200914823A (en) * 2007-09-29 2009-04-01 Kainan High School Of Commerce And Industry Improved device for nanoindentation system
CN101532970A (en) * 2008-03-11 2009-09-16 宝山钢铁股份有限公司 Crystal orientation and micromechanics performance measurement method of each composition crystal grain in polycrystal
CN102589984A (en) * 2012-02-14 2012-07-18 北京大学 Multi-field coupled loading micro nanometer press-in testing system and method
CN105371770A (en) * 2015-12-01 2016-03-02 中国航空工业集团公司北京长城计量测试技术研究所 Measurement device of displacement and load of pressure head of nanoindentor
CN106501111A (en) * 2016-10-20 2017-03-15 吉林大学 The calibration steps of MEMS microbridge indentation load depth curve
GB2559198A (en) * 2017-01-31 2018-08-01 Univ Central Lancashire Measuring properties of a test of a sample of material using depth-sensing indentation
CN108918308A (en) * 2018-05-16 2018-11-30 太原理工大学 A kind of quantitatively characterizing method of titanium alloy surface gradient modified layer Elastoplastic Performances in Simulation parameter

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
纳米力学测试系统位移传感器校准装置;任冬梅 等;《计测技术》;20110531;第3-5、26页 *

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