CN110128912A - 形成多层涂膜的方法 - Google Patents
形成多层涂膜的方法 Download PDFInfo
- Publication number
- CN110128912A CN110128912A CN201910418428.0A CN201910418428A CN110128912A CN 110128912 A CN110128912 A CN 110128912A CN 201910418428 A CN201910418428 A CN 201910418428A CN 110128912 A CN110128912 A CN 110128912A
- Authority
- CN
- China
- Prior art keywords
- chemical conversion
- conversion treatment
- mass
- coated article
- treatment solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 71
- 238000006243 chemical reaction Methods 0.000 claims abstract description 123
- 239000000126 substance Substances 0.000 claims abstract description 121
- 238000004070 electrodeposition Methods 0.000 claims abstract description 58
- 239000000203 mixture Substances 0.000 claims abstract description 57
- 238000000576 coating method Methods 0.000 claims abstract description 50
- 239000011248 coating agent Substances 0.000 claims abstract description 49
- 229910052751 metal Inorganic materials 0.000 claims abstract description 49
- 239000002184 metal Substances 0.000 claims abstract description 48
- 150000001768 cations Chemical class 0.000 claims abstract description 33
- 239000003973 paint Substances 0.000 claims abstract description 29
- 238000000151 deposition Methods 0.000 claims abstract description 27
- 230000008021 deposition Effects 0.000 claims abstract description 27
- 229910001415 sodium ion Inorganic materials 0.000 claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 88
- 150000001875 compounds Chemical class 0.000 claims description 54
- 229920000647 polyepoxide Polymers 0.000 claims description 49
- 239000003822 epoxy resin Substances 0.000 claims description 48
- 238000004140 cleaning Methods 0.000 claims description 45
- -1 lanthanide metals Chemical class 0.000 claims description 44
- 229920005989 resin Polymers 0.000 claims description 34
- 239000011347 resin Substances 0.000 claims description 34
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 29
- 239000005056 polyisocyanate Substances 0.000 claims description 22
- 229920001228 polyisocyanate Polymers 0.000 claims description 22
- 239000007787 solid Substances 0.000 claims description 22
- 150000002736 metal compounds Chemical class 0.000 claims description 16
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 229910001414 potassium ion Inorganic materials 0.000 claims description 11
- 239000004411 aluminium Substances 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 9
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052797 bismuth Inorganic materials 0.000 claims description 7
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 7
- 229910001424 calcium ion Inorganic materials 0.000 claims description 7
- 239000008235 industrial water Substances 0.000 claims description 7
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910001425 magnesium ion Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910000765 intermetallic Inorganic materials 0.000 claims description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 1
- 238000005406 washing Methods 0.000 abstract description 39
- 230000007797 corrosion Effects 0.000 abstract description 22
- 238000005260 corrosion Methods 0.000 abstract description 22
- 239000000243 solution Substances 0.000 description 56
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 39
- 238000002360 preparation method Methods 0.000 description 25
- 239000000049 pigment Substances 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 18
- 150000001412 amines Chemical class 0.000 description 13
- 239000006185 dispersion Substances 0.000 description 12
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 11
- 239000008199 coating composition Substances 0.000 description 11
- 239000008367 deionised water Substances 0.000 description 11
- 229910021641 deionized water Inorganic materials 0.000 description 11
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 229910000831 Steel Inorganic materials 0.000 description 9
- 235000019441 ethanol Nutrition 0.000 description 9
- 239000010959 steel Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 239000000805 composite resin Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000007921 spray Substances 0.000 description 8
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 7
- 229920000768 polyamine Polymers 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000012948 isocyanate Substances 0.000 description 6
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 5
- 150000002513 isocyanates Chemical class 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 150000003755 zirconium compounds Chemical class 0.000 description 5
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 4
- PFCHFHIRKBAQGU-UHFFFAOYSA-N 3-hexanone Chemical compound CCCC(=O)CC PFCHFHIRKBAQGU-UHFFFAOYSA-N 0.000 description 4
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 4
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000005238 degreasing Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 230000014759 maintenance of location Effects 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 150000003335 secondary amines Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 239000002981 blocking agent Substances 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004310 lactic acid Substances 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- 239000006210 lotion Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 150000003141 primary amines Chemical class 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 235000014692 zinc oxide Nutrition 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical class NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004606 Fillers/Extenders Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- GEIAQOFPUVMAGM-UHFFFAOYSA-N Oxozirconium Chemical compound [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 2
- FRHOZLBTKXGMDH-UHFFFAOYSA-N [Zr].[F] Chemical compound [Zr].[F] FRHOZLBTKXGMDH-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 2
- OXAUNDBQHKIUSD-UHFFFAOYSA-N azanium;titanium;fluoride Chemical compound [NH4+].[F-].[Ti] OXAUNDBQHKIUSD-UHFFFAOYSA-N 0.000 description 2
- GOZLPQZIQDBYMO-UHFFFAOYSA-N azanium;zirconium;fluoride Chemical compound [NH4+].[F-].[Zr] GOZLPQZIQDBYMO-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- ZDHGGOUPMGSLBR-UHFFFAOYSA-K bis(2-hydroxypropanoyloxy)bismuthanyl 2-hydroxypropanoate Chemical compound [Bi+3].CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O ZDHGGOUPMGSLBR-UHFFFAOYSA-K 0.000 description 2
- 150000001622 bismuth compounds Chemical class 0.000 description 2
- 229940049676 bismuth hydroxide Drugs 0.000 description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 description 2
- TZSXPYWRDWEXHG-UHFFFAOYSA-K bismuth;trihydroxide Chemical compound [OH-].[OH-].[OH-].[Bi+3] TZSXPYWRDWEXHG-UHFFFAOYSA-K 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 2
- 239000010960 cold rolled steel Substances 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- 239000013527 degreasing agent Substances 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- DQUIAMCJEJUUJC-UHFFFAOYSA-N dibismuth;dioxido(oxo)silane Chemical compound [Bi+3].[Bi+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O DQUIAMCJEJUUJC-UHFFFAOYSA-N 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 229940043237 diethanolamine Drugs 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N dimethylmethane Natural products CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 2
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 2
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 229940071125 manganese acetate Drugs 0.000 description 2
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 2
- 229940005654 nitrite ion Drugs 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- JHHZLHWJQPUNKB-UHFFFAOYSA-N pyrrolidin-3-ol Chemical compound OC1CCNC1 JHHZLHWJQPUNKB-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 2
- UODZHRGDSPLRMD-UHFFFAOYSA-N sym-homospermidine Chemical compound NCCCCNCCCCN UODZHRGDSPLRMD-UHFFFAOYSA-N 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- DCXXMTOCNZCJGO-UHFFFAOYSA-N tristearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 description 2
- KTMBZDQOFPBYBL-FVCCEPFGSA-N (2r,3s,4r,5r)-2,3,4,5,6-pentahydroxy-n-octylhexanamide Chemical compound CCCCCCCCNC(=O)[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO KTMBZDQOFPBYBL-FVCCEPFGSA-N 0.000 description 1
- OBSLWIKITOYASJ-AZEWMMITSA-N (2r,3s,4s,5r,6s)-6-(hydroxymethyl)-3-(methylamino)oxane-2,4,5-triol Chemical compound CN[C@@H]1[C@H](O)O[C@@H](CO)[C@H](O)[C@H]1O OBSLWIKITOYASJ-AZEWMMITSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- NKJOXAZJBOMXID-UHFFFAOYSA-N 1,1'-Oxybisoctane Chemical compound CCCCCCCCOCCCCCCCC NKJOXAZJBOMXID-UHFFFAOYSA-N 0.000 description 1
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- CWKVFRNCODQPDB-UHFFFAOYSA-N 1-(2-aminoethylamino)propan-2-ol Chemical compound CC(O)CNCCN CWKVFRNCODQPDB-UHFFFAOYSA-N 0.000 description 1
- QYIGOGBGVKONDY-UHFFFAOYSA-N 1-(2-bromo-5-chlorophenyl)-3-methylpyrazole Chemical compound N1=C(C)C=CN1C1=CC(Cl)=CC=C1Br QYIGOGBGVKONDY-UHFFFAOYSA-N 0.000 description 1
- PVOAHINGSUIXLS-UHFFFAOYSA-N 1-Methylpiperazine Chemical compound CN1CCNCC1 PVOAHINGSUIXLS-UHFFFAOYSA-N 0.000 description 1
- JIABEENURMZTTI-UHFFFAOYSA-N 1-isocyanato-2-[(2-isocyanatophenyl)methyl]benzene Chemical compound O=C=NC1=CC=CC=C1CC1=CC=CC=C1N=C=O JIABEENURMZTTI-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- GZCWLCBFPRFLKL-UHFFFAOYSA-N 1-prop-2-ynoxypropan-2-ol Chemical compound CC(O)COCC#C GZCWLCBFPRFLKL-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- WKCZSFRAGKIIKN-UHFFFAOYSA-N 2-(4-tert-butylphenyl)ethanamine Chemical compound CC(C)(C)C1=CC=C(CCN)C=C1 WKCZSFRAGKIIKN-UHFFFAOYSA-N 0.000 description 1
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- PAJMKGZZBBTTOY-UHFFFAOYSA-N 2-[[2-hydroxy-1-(3-hydroxyoctyl)-2,3,3a,4,9,9a-hexahydro-1h-cyclopenta[g]naphthalen-5-yl]oxy]acetic acid Chemical compound C1=CC=C(OCC(O)=O)C2=C1CC1C(CCC(O)CCCCC)C(O)CC1C2 PAJMKGZZBBTTOY-UHFFFAOYSA-N 0.000 description 1
- KKMOSYLWYLMHAL-UHFFFAOYSA-N 2-bromo-6-nitroaniline Chemical compound NC1=C(Br)C=CC=C1[N+]([O-])=O KKMOSYLWYLMHAL-UHFFFAOYSA-N 0.000 description 1
- VAIVGJYVKZVQAA-UHFFFAOYSA-N 2-hydroxypropane-1,2,3-tricarboxylic acid;nickel Chemical compound [Ni].OC(=O)CC(O)(C(O)=O)CC(O)=O VAIVGJYVKZVQAA-UHFFFAOYSA-N 0.000 description 1
- KAVCCPAAFBTKDY-UHFFFAOYSA-N 2-hydroxypropanoic acid;yttrium Chemical compound [Y].CC(O)C(O)=O KAVCCPAAFBTKDY-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- WDGCBNTXZHJTHJ-UHFFFAOYSA-N 2h-1,3-oxazol-2-id-4-one Chemical group O=C1CO[C-]=N1 WDGCBNTXZHJTHJ-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- JWBMVCAZXJMSOX-UHFFFAOYSA-N 3-(tert-butylamino)propane-1,2-diol Chemical compound CC(C)(C)NCC(O)CO JWBMVCAZXJMSOX-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- VVXLFFIFNVKFBD-UHFFFAOYSA-N 4,4,4-trifluoro-1-phenylbutane-1,3-dione Chemical compound FC(F)(F)C(=O)CC(=O)C1=CC=CC=C1 VVXLFFIFNVKFBD-UHFFFAOYSA-N 0.000 description 1
- KOGSPLLRMRSADR-UHFFFAOYSA-N 4-(2-aminopropan-2-yl)-1-methylcyclohexan-1-amine Chemical compound CC(C)(N)C1CCC(C)(N)CC1 KOGSPLLRMRSADR-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- WXQZLPFNTPKVJM-UHFFFAOYSA-N 4-[(4-hydroxycyclohexyl)methyl]cyclohexan-1-ol Chemical compound C1CC(O)CCC1CC1CCC(O)CC1 WXQZLPFNTPKVJM-UHFFFAOYSA-N 0.000 description 1
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 102000013563 Acid Phosphatase Human genes 0.000 description 1
- 108010051457 Acid Phosphatase Proteins 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229910000014 Bismuth subcarbonate Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 229910021584 Cobalt(II) iodide Inorganic materials 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229920003656 Daiamid® Chemical class 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- JZDMNWBZPLJKBT-UHFFFAOYSA-N F.[Zr] Chemical compound F.[Zr] JZDMNWBZPLJKBT-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910001335 Galvanized steel Inorganic materials 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229910017569 La2(CO3)3 Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920000538 Poly[(phenyl isocyanate)-co-formaldehyde] Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- YFPYMDBLXVCTBO-UHFFFAOYSA-N [Bi].N(=O)O Chemical compound [Bi].N(=O)O YFPYMDBLXVCTBO-UHFFFAOYSA-N 0.000 description 1
- LZQHZOIDAMYHSS-UHFFFAOYSA-N [F].[Ti] Chemical compound [F].[Ti] LZQHZOIDAMYHSS-UHFFFAOYSA-N 0.000 description 1
- WXWFERPFIRZYJG-UHFFFAOYSA-O [NH4+].[In].[O-][N+]([O-])=O Chemical compound [NH4+].[In].[O-][N+]([O-])=O WXWFERPFIRZYJG-UHFFFAOYSA-O 0.000 description 1
- NEAUSPBTMCDZTL-UHFFFAOYSA-N [Y].S(N)(O)(=O)=O Chemical compound [Y].S(N)(O)(=O)=O NEAUSPBTMCDZTL-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- SVMCDCBHSKARBQ-UHFFFAOYSA-N acetic acid;cobalt Chemical compound [Co].CC(O)=O SVMCDCBHSKARBQ-UHFFFAOYSA-N 0.000 description 1
- OPLYJBURBHOMOC-UHFFFAOYSA-N acetic acid;lanthanum Chemical compound [La].CC(O)=O OPLYJBURBHOMOC-UHFFFAOYSA-N 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- QGAVSDVURUSLQK-UHFFFAOYSA-N ammonium heptamolybdate Chemical compound N.N.N.N.N.N.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.[Mo].[Mo].[Mo].[Mo].[Mo].[Mo].[Mo] QGAVSDVURUSLQK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-N anhydrous cyanic acid Natural products OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- RCMWGBKVFBTLCW-UHFFFAOYSA-N barium(2+);dioxido(dioxo)molybdenum Chemical compound [Ba+2].[O-][Mo]([O-])(=O)=O RCMWGBKVFBTLCW-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 229960004217 benzyl alcohol Drugs 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 229940036348 bismuth carbonate Drugs 0.000 description 1
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 description 1
- 229910001451 bismuth ion Inorganic materials 0.000 description 1
- 229940073609 bismuth oxychloride Drugs 0.000 description 1
- REKWPXFKNZERAA-UHFFFAOYSA-K bismuth;2-carboxyphenolate Chemical compound [Bi+3].OC1=CC=CC=C1C([O-])=O.OC1=CC=CC=C1C([O-])=O.OC1=CC=CC=C1C([O-])=O REKWPXFKNZERAA-UHFFFAOYSA-K 0.000 description 1
- PMPOYGJUYDKGPU-UHFFFAOYSA-N bismuth;2-methoxyacetic acid Chemical compound [Bi].COCC(O)=O PMPOYGJUYDKGPU-UHFFFAOYSA-N 0.000 description 1
- AYSTWLLPTAGSJQ-UHFFFAOYSA-N bismuth;formic acid Chemical compound [Bi].OC=O AYSTWLLPTAGSJQ-UHFFFAOYSA-N 0.000 description 1
- OYDUVCKHBASGOB-UHFFFAOYSA-N bismuth;propanoic acid Chemical compound [Bi].CCC(O)=O OYDUVCKHBASGOB-UHFFFAOYSA-N 0.000 description 1
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical compound NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- QVYARBLCAHCSFJ-UHFFFAOYSA-N butane-1,1-diamine Chemical compound CCCC(N)N QVYARBLCAHCSFJ-UHFFFAOYSA-N 0.000 description 1
- ZPFKRQXYKULZKP-UHFFFAOYSA-N butylidene Chemical group [CH2+]CC[CH-] ZPFKRQXYKULZKP-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- BIOOACNPATUQFW-UHFFFAOYSA-N calcium;dioxido(dioxo)molybdenum Chemical compound [Ca+2].[O-][Mo]([O-])(=O)=O BIOOACNPATUQFW-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229960001759 cerium oxalate Drugs 0.000 description 1
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 1
- ZMZNLKYXLARXFY-UHFFFAOYSA-H cerium(3+);oxalate Chemical compound [Ce+3].[Ce+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZMZNLKYXLARXFY-UHFFFAOYSA-H 0.000 description 1
- VGBWDOLBWVJTRZ-UHFFFAOYSA-K cerium(3+);triacetate Chemical compound [Ce+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VGBWDOLBWVJTRZ-UHFFFAOYSA-K 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 229910001429 cobalt ion Inorganic materials 0.000 description 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- AVWLPUQJODERGA-UHFFFAOYSA-L cobalt(2+);diiodide Chemical compound [Co+2].[I-].[I-] AVWLPUQJODERGA-UHFFFAOYSA-L 0.000 description 1
- BZRRQSJJPUGBAA-UHFFFAOYSA-L cobalt(ii) bromide Chemical compound Br[Co]Br BZRRQSJJPUGBAA-UHFFFAOYSA-L 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000007739 conversion coating Methods 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- GQDHEYWVLBJKBA-UHFFFAOYSA-H copper(ii) phosphate Chemical compound [Cu+2].[Cu+2].[Cu+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GQDHEYWVLBJKBA-UHFFFAOYSA-H 0.000 description 1
- SXTLQDJHRPXDSB-UHFFFAOYSA-N copper;dinitrate;trihydrate Chemical compound O.O.O.[Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O SXTLQDJHRPXDSB-UHFFFAOYSA-N 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- WCOATMADISNSBV-UHFFFAOYSA-K diacetyloxyalumanyl acetate Chemical compound [Al+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WCOATMADISNSBV-UHFFFAOYSA-K 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- NUHXWPRATKOXDB-UHFFFAOYSA-L diazanium;cobalt(2+);disulfate Chemical compound [NH4+].[NH4+].[Co+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O NUHXWPRATKOXDB-UHFFFAOYSA-L 0.000 description 1
- IZRTVYMPRPTBAI-UHFFFAOYSA-K dibenzoyloxybismuthanyl benzoate Chemical compound [Bi+3].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 IZRTVYMPRPTBAI-UHFFFAOYSA-K 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- GMZOPRQQINFLPQ-UHFFFAOYSA-H dibismuth;tricarbonate Chemical compound [Bi+3].[Bi+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GMZOPRQQINFLPQ-UHFFFAOYSA-H 0.000 description 1
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- KIQKWYUGPPFMBV-UHFFFAOYSA-N diisocyanatomethane Chemical compound O=C=NCN=C=O KIQKWYUGPPFMBV-UHFFFAOYSA-N 0.000 description 1
- JXCHMDATRWUOAP-UHFFFAOYSA-N diisocyanatomethylbenzene Chemical compound O=C=NC(N=C=O)C1=CC=CC=C1 JXCHMDATRWUOAP-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- LQRUPWUPINJLMU-UHFFFAOYSA-N dioctyl(oxo)tin Chemical compound CCCCCCCC[Sn](=O)CCCCCCCC LQRUPWUPINJLMU-UHFFFAOYSA-N 0.000 description 1
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 1
- AAQNGTNRWPXMPB-UHFFFAOYSA-N dipotassium;dioxido(dioxo)tungsten Chemical compound [K+].[K+].[O-][W]([O-])(=O)=O AAQNGTNRWPXMPB-UHFFFAOYSA-N 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- VEPSWGHMGZQCIN-UHFFFAOYSA-H ferric oxalate Chemical compound [Fe+3].[Fe+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O VEPSWGHMGZQCIN-UHFFFAOYSA-H 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- ZCJGPLOQDMFGAR-UHFFFAOYSA-N formaldehyde;1,2-xylene Chemical compound O=C.CC1=CC=CC=C1C ZCJGPLOQDMFGAR-UHFFFAOYSA-N 0.000 description 1
- OIAUFEASXQPCFE-UHFFFAOYSA-N formaldehyde;1,3-xylene Chemical compound O=C.CC1=CC=CC(C)=C1 OIAUFEASXQPCFE-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- KLMCZVJOEAUDNE-UHFFFAOYSA-N francium atom Chemical compound [Fr] KLMCZVJOEAUDNE-UHFFFAOYSA-N 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 229940044658 gallium nitrate Drugs 0.000 description 1
- CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 description 1
- 239000008397 galvanized steel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 239000001866 hydroxypropyl methyl cellulose Substances 0.000 description 1
- 229920003088 hydroxypropyl methyl cellulose Polymers 0.000 description 1
- 235000010979 hydroxypropyl methyl cellulose Nutrition 0.000 description 1
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Inorganic materials Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 1
- 229960003943 hypromellose Drugs 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910001449 indium ion Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 235000013847 iso-butane Nutrition 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- NZPIUJUFIFZSPW-UHFFFAOYSA-H lanthanum carbonate Chemical compound [La+3].[La+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O NZPIUJUFIFZSPW-UHFFFAOYSA-H 0.000 description 1
- 229960001633 lanthanum carbonate Drugs 0.000 description 1
- CZMAIROVPAYCMU-UHFFFAOYSA-N lanthanum(3+) Chemical compound [La+3] CZMAIROVPAYCMU-UHFFFAOYSA-N 0.000 description 1
- LQFNMFDUAPEJRY-UHFFFAOYSA-K lanthanum(3+);phosphate Chemical compound [La+3].[O-]P([O-])([O-])=O LQFNMFDUAPEJRY-UHFFFAOYSA-K 0.000 description 1
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 description 1
- NMHMDUCCVHOJQI-UHFFFAOYSA-N lithium molybdate Chemical compound [Li+].[Li+].[O-][Mo]([O-])(=O)=O NMHMDUCCVHOJQI-UHFFFAOYSA-N 0.000 description 1
- UWTJALAXUKLZON-UHFFFAOYSA-I lithium titanium(4+) pentafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[Ti+4] UWTJALAXUKLZON-UHFFFAOYSA-I 0.000 description 1
- QLKUHEGYKZOAEP-UHFFFAOYSA-I lithium;zirconium(4+);pentafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[Zr+4] QLKUHEGYKZOAEP-UHFFFAOYSA-I 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- 229910001437 manganese ion Inorganic materials 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- RGVLTEMOWXGQOS-UHFFFAOYSA-L manganese(2+);oxalate Chemical compound [Mn+2].[O-]C(=O)C([O-])=O RGVLTEMOWXGQOS-UHFFFAOYSA-L 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- ALTWGIIQPLQAAM-UHFFFAOYSA-N metavanadate Chemical compound [O-][V](=O)=O ALTWGIIQPLQAAM-UHFFFAOYSA-N 0.000 description 1
- RTWNYYOXLSILQN-UHFFFAOYSA-N methanediamine Chemical compound NCN RTWNYYOXLSILQN-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- NFSAPTWLWWYADB-UHFFFAOYSA-N n,n-dimethyl-1-phenylethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=CC=C1 NFSAPTWLWWYADB-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- PXSXRABJBXYMFT-UHFFFAOYSA-N n-hexylhexan-1-amine Chemical compound CCCCCCNCCCCCC PXSXRABJBXYMFT-UHFFFAOYSA-N 0.000 description 1
- CFYGEIAZMVFFDE-UHFFFAOYSA-N neodymium(3+);trinitrate Chemical compound [Nd+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CFYGEIAZMVFFDE-UHFFFAOYSA-N 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- DOLZKNFSRCEOFV-UHFFFAOYSA-L nickel(2+);oxalate Chemical compound [Ni+2].[O-]C(=O)C([O-])=O DOLZKNFSRCEOFV-UHFFFAOYSA-L 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- UHTYDNCIXKPJDA-UHFFFAOYSA-H oxalate;praseodymium(3+) Chemical compound [Pr+3].[Pr+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O UHTYDNCIXKPJDA-UHFFFAOYSA-H 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- BWOROQSFKKODDR-UHFFFAOYSA-N oxobismuth;hydrochloride Chemical compound Cl.[Bi]=O BWOROQSFKKODDR-UHFFFAOYSA-N 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- LYTNHSCLZRMKON-UHFFFAOYSA-L oxygen(2-);zirconium(4+);diacetate Chemical compound [O-2].[Zr+4].CC([O-])=O.CC([O-])=O LYTNHSCLZRMKON-UHFFFAOYSA-L 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000032696 parturition Effects 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229940085991 phosphate ion Drugs 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920000333 poly(propyleneimine) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005906 polyester polyol Chemical class 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- SQTLECAKIMBJGK-UHFFFAOYSA-I potassium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[K+].[Ti+4] SQTLECAKIMBJGK-UHFFFAOYSA-I 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- WCWKKSOQLQEJTE-UHFFFAOYSA-N praseodymium(3+) Chemical compound [Pr+3] WCWKKSOQLQEJTE-UHFFFAOYSA-N 0.000 description 1
- YWECOPREQNXXBZ-UHFFFAOYSA-N praseodymium(3+);trinitrate Chemical compound [Pr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YWECOPREQNXXBZ-UHFFFAOYSA-N 0.000 description 1
- HWZAHTVZMSRSJE-UHFFFAOYSA-H praseodymium(iii) sulfate Chemical compound [Pr+3].[Pr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HWZAHTVZMSRSJE-UHFFFAOYSA-H 0.000 description 1
- GGHDAUPFEBTORZ-UHFFFAOYSA-N propane-1,1-diamine Chemical compound CCC(N)N GGHDAUPFEBTORZ-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 description 1
- 229940071536 silver acetate Drugs 0.000 description 1
- SDLBJIZEEMKQKY-UHFFFAOYSA-M silver chlorate Chemical compound [Ag+].[O-]Cl(=O)=O SDLBJIZEEMKQKY-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 1
- OWEZKDSVCUYVNT-UHFFFAOYSA-I sodium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[Na+].[Ti+4] OWEZKDSVCUYVNT-UHFFFAOYSA-I 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N trans-stilbene Chemical group C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- NNPPMTNAJDCUHE-UHFFFAOYSA-N trimethylmethane Natural products CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 1
- CENHPXAQKISCGD-UHFFFAOYSA-N trioxathietane 4,4-dioxide Chemical compound O=S1(=O)OOO1 CENHPXAQKISCGD-UHFFFAOYSA-N 0.000 description 1
- ZHXAZZQXWJJBHA-UHFFFAOYSA-N triphenylbismuthane Chemical compound C1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 ZHXAZZQXWJJBHA-UHFFFAOYSA-N 0.000 description 1
- IHIXIJGXTJIKRB-UHFFFAOYSA-N trisodium vanadate Chemical compound [Na+].[Na+].[Na+].[O-][V]([O-])([O-])=O IHIXIJGXTJIKRB-UHFFFAOYSA-N 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 229910001456 vanadium ion Inorganic materials 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 235000013904 zinc acetate Nutrition 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- HHIMNFJHTNVXBJ-UHFFFAOYSA-L zinc;dinitrite Chemical compound [Zn+2].[O-]N=O.[O-]N=O HHIMNFJHTNVXBJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
- C23C22/36—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates
- C23C22/367—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates containing alkaline earth metal cations
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4419—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications with polymers obtained otherwise than by polymerisation reactions only involving carbon-to-carbon unsaturated bonds
- C09D5/443—Polyepoxides
- C09D5/4434—Polyepoxides characterised by the nature of the epoxy binder
- C09D5/4438—Binder based on epoxy/amine adducts, i.e. reaction products of polyepoxides with compounds containing amino groups only
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4419—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications with polymers obtained otherwise than by polymerisation reactions only involving carbon-to-carbon unsaturated bonds
- C09D5/443—Polyepoxides
- C09D5/4453—Polyepoxides characterised by the nature of the curing agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4488—Cathodic paints
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
- C23C22/36—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/82—After-treatment
- C23C22/83—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/20—Pretreatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Electrochemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Treatment Of Metals (AREA)
- Paints Or Removers (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
本发明解决了下述问题:提供形成多层涂膜的方法,由此即使在化学转化处理后省略部分或全部水洗步骤时也不会影响电沉积涂装性能并能够实现优异的成品外观和优异的耐腐蚀性;提供涂装物品。本发明提供了形成多层涂膜的方法,所述方法包括在金属被涂物上形成化学转化涂膜和电沉积涂膜的步骤,即,通过将金属被涂物浸入化学转化处理液以形成化学转化涂膜的步骤1以及省略部分或全部所述水洗步骤并使用阳离子电沉积涂料组合物在所述金属被涂物上进行电沉积涂装以形成电沉积涂膜的步骤2。在所述方法中,化学转化处理液中钠离子含量以质量计少于500ppm。
Description
技术领域
相关申请的交叉引用
本申请要求2013年8月1日提交的JP2013-160799A;2013年8月12日提交的JP2013-167905A;以及2014年4月28日提交的JP2014-092911A的优先权,其公开内容通过引用整体并入本文。
本发明涉及形成多层涂膜的方法,该方法即使在化学转化处理后省略部分或全部水洗步骤时也能够进行电沉积涂装而不受化学转化处理液的影响,并且能够由此提供具有优异的成品外观和优异的耐腐蚀性的涂装物品。本发明还涉及使用这种形成多层涂膜的方法获得的涂装物品。
背景技术
迄今为止,已使用于工业用途的金属被涂物经历化学转化处理,从而处理基材表面以改善耐腐蚀性和附着性。然而,化学转化处理液包含大量的各种离子组分以及大量的重金属组分如锌、镍和锰以改善所得的化学转化涂膜的性能。
当在化学转化处理后直接使用阳离子电沉积涂料组合物进行电沉积涂装时,已知的是,附着到或沉积在金属被涂物上的过量的化学转化处理液不利地影响电沉积涂装性能、成品外观、耐腐蚀性等。
因此,典型的涂装线包括水洗步骤,所述水洗步骤需要大量工时和时间用于脱脂处理、化学转化处理、第一次水洗、第二次水洗、纯净水清洗、电沉积涂装、第一次水洗、第二次水洗、纯净水清洗和烘干,如图1所示。此外,来自水洗步骤的废水的收集、过滤、处理、废弃等也需要大量的设备和成本。
专利文献(PTL)1公开了能够简化流程并节约空间的形成多层涂膜的方法。在该方法中,在化学转化处理后不进行水洗的情况下进行电沉积涂装。PTL 1公开了即使在后续步骤中化学转化处理液以污染物形式被带入电沉积涂料组合物中时,也有可能获得具有优异的成品外观和优异的耐腐蚀性而不影响电沉积涂装性能和涂膜性能的涂装物品。然而,当不进行水洗时,如果大于特定量的钠离子和钾离子附着于被涂物和/或被带入电沉积涂料组合物中,则可能不能实现足够的耐腐蚀性和成品外观。
专利文献(PTL)2公开了预涂装方法。在该方法中,使被涂物经历脱脂、清洗,然后不进行表面调整,应用化学转化涂料液。之后,在未用工业用水清洗或干燥所得被涂物的情况下进行电沉积涂装。在该方法中,也可能不能实现足够的耐腐蚀性和成品外观,如在上述PTL 1中。PTL 2也公开了当化学转化处理液具有低的pH时,在化学转化步骤与电沉积涂装步骤之间需要水洗步骤以防止生锈。
专利文献(PTL)3限定了电沉积涂料组合物浴中疏水溶剂量和钠离子浓度以降低形成电沉积涂料组合物涂膜的最低温度并由此防止在窄隙部分中出现桥接现象。然而,PTL3未提及降低化学转化处理液中钠离子和钾离子的浓度,以及未提及通过省略水洗步骤实现简化流程或节约空间。因此,如果省略水洗步骤,则化学转化处理期间附着于被涂物的钠离子和钾离子可损害电沉积涂装性能、以及耐腐蚀性和成品外观。
专利文献(PTL)4公开了通过使用酸性磷酸锌水溶液的浸渍处理进行化学转化处理的方法。与此相关,PTL 4限定了用作促进剂的亚硝酸锌水溶液中的钠离子浓度。PTL 4在第[0016]段中公开了当化学转化处理槽中钠离子浓度以重量计为10,000ppm时,获得优异的化学转化涂膜。然而,当包含如上所述高浓度的钠离子时,水洗步骤不可省略,因此难以实现简化流程和节约空间。
引用列表
专利文献
PTL 1:JP2009-149974A
PTL 2:JP2006-28543A
PTL 3:JP2007-313420A
PTL 4:JP2001-323384A
发明概述
技术问题
本发明的目的是提供形成多层涂膜的方法,该方法能够简化流程和节约空间。本发明的另一目的是提供涂装物品,所述涂装物品在即使省略化学转化处理后的部分或全部水洗步骤时也具有优异的成品外观和优异的耐腐蚀性而不会影响电沉积涂装性能。
问题的解决方案
本发明人进行了广泛的研究并发现可通过在形成多层涂膜的方法中使用特定的化学转化处理液来实现上述目的,该方法包括在金属被涂物上形成化学转化涂膜,随后进行电沉积涂装。基于该发现已完成本发明。
更具体地,本发明提供了形成多层涂膜和涂装物品的下列方法。
项1.一种形成多层涂膜的方法,所述方法包括通过下列步骤在金属被涂物上形成化学转化涂膜和电沉积涂膜:
步骤1:将金属被涂物浸入化学转化处理液中以形成化学转化涂膜;以及
步骤2:通过使用阳离子电沉积涂料组合物在所述金属被涂物上进行电沉积涂装以形成电沉积涂膜,
其中所述化学转化处理液以质量计包含少于500ppm的钠离子。
项2.如项1所述的形成多层涂膜的方法,
其中在步骤2中,在电沉积涂装之前省略部分或全部的水洗步骤。
项3.如项1或2所述的形成多层涂膜的方法,
其中所述化学转化处理液以质量计包含少于500ppm的钾离子。
项4.如项1至3中任一项所述的形成多层涂膜的方法,
其中所述化学转化处理液以质量计包含总金属量为30ppm至20,000ppm的至少一种金属化合物组分(M),所述金属化合物组分(M)包括选自锆、钛、钴、铝、钒、钨、钼、铜、锌、铟、铋、钇、铁、镍、锰、镓、银以及镧系元素金属的至少一种金属化合物。
项5.如项1至4中任一项所述的形成多层涂膜的方法,
其中所述化学转化处理液包含0.01质量%至40质量%的量的水分散性或水溶性树脂组合物(P)。
项6.如项1至5中任一项所述的形成多层涂膜的方法,其中所述阳离子电沉积涂料组合物包含含氨基的环氧树脂(A)和封端聚异氰酸酯(B),
基于总树脂固体成分,以40质量%至90质量%的量包含所述含氨基的环氧树脂(A),并且以10质量%至60质量%的量包含所述封端聚异氰酸酯(B)。
项7.如项1至6中任一项所述的形成多层涂膜的方法,
其中在进行步骤2的电沉积涂装之前,使所述金属被涂物经历鼓风、摇动和旋转中的至少一种。
项8.一种涂装物品,其具有通过使用项1至7中任一项所述的形成多层涂膜的方法形成的多层涂膜。
发明的有益效果
在本发明的形成多层涂膜的方法中,化学转化处理后部分或全部水洗步骤的省略不会影响电沉积涂装性能,并且获得了具有优异的成品外观和优异的耐腐蚀性的涂装物品。本发明的形成多层涂膜的方法使用特定的化学转化处理液。这使省略部分或全部水洗步骤成为可能,从而能够简化流程和节约空间以及减小用于流出物处理的各种设备的尺寸并减少废品量。
在本发明中,可省略水洗步骤。(省略部分或全部步骤以实现简化流程和节约空间)。与此一起,本发明可实现优异的成品外观和优异的耐腐蚀性。对此的原因尚不确定。下列是可能的原因。主要原因为当省略部分或全部水洗步骤且在处于化学转化处理液中包含的阳离子(诸如钠离子和钾离子)附着于金属被涂物表面的状态中的金属被涂物上使用阳离子电沉积涂料组合物进行电沉积涂装时,电沉积涂料组合物的涂装和涂膜形成可能受到抑制,从而导致成品外观和/或耐腐蚀性变差。
因此,在本发明的形成多层涂膜的方法中,当省略部分或全部水洗步骤时,在特定范围内调节化学转化处理液中钠离子和钾离子的浓度被认为是重要的(在特定范围内调节化学转化处理液中钙离子和镁离子的浓度也是优选的),以便不允许过量的化学转化处理液附着于或沉积在被涂物上。此外,部分或全部水洗步骤的省略大幅减小了清洗所需的水量。
附图简述
图1示出已知的形成多层涂膜的方法的示意流程图。
实施方案详述
本发明的优选实施方案的形成多层涂膜的方法使用多层涂膜形成设备,所述多层涂膜形成设备包括化学转化处理槽和电沉积涂料组合物槽。将金属被涂物浸入装有特定化学转化处理液的化学转化处理槽中以在施加电流或不施加电流的情况下于金属被涂物上形成化学转化涂膜。然后,省略部分或全部水洗步骤,并将具有化学转化涂膜的金属被涂物浸入装有阳离子电沉积涂料组合物的电沉积涂料组合物槽中以进行电沉积涂装。
下文提供具体描述。
被涂物
在本发明的形成多层涂膜的方法中使用的金属被涂物不受限制,只要可在被涂物上进行电沉积涂装即可。被涂物的实例包括冷轧钢板、合金热浸镀锌钢板、电镀锌钢板、电解锌铁双面镀钢板、有机复合物电镀钢板、铝材、镁材和类似的金属被涂物。这些可以单独地、以两种以上金属的合金形式、或以包含两种以上金属的组合的被涂物形式而适当地使用。可以使这些金属被涂物任选地经历脱脂、表面调整、水洗及其它处理。
化学转化处理液
在本发明的形成多层涂膜的方法(步骤1)中使用的化学转化处理液的特征在于它以质量计包含浓度少于500ppm的钠离子。
如果钠离子浓度高于500ppm且省略部分或全部水洗步骤,则电沉积涂装的涂装性能将是不足的,并且所得涂膜的成品外观和耐腐蚀性将是不令人满意的。化学转化处理液中的钠离子浓度以质量计优选为少于500ppm,更优选少于200ppm,还更优选少于100ppm,又更优选少于50ppm,并且特别优选少于10ppm。
钠离子可能从例如起始材料如水、促进剂(例如亚硝酸钠)、随后提及的金属化合物组分(M)和中和剂以及从前述步骤中使用的脱脂液和清洗水掺入化学转化处理液中。例如,生产线等中化学转化处理液的连续使用逐渐降低化学转化处理组分的浓度;因此,通常根据需要加入补给液以调节浓度。然而,补给液中痕量的杂质组分(例如钠离子)或先前步骤携带的组分逐渐在化学转化处理液中积累,从而对性能产生不利影响。在本发明中,化学转化处理液中特定的离子浓度被调节至特定水平以下,从而即使在连续进行生产时也能实现优异的性能。
鉴于与上述相同的原因,化学转化处理液中钾离子浓度以质量计优选为少于500ppm,更优选少于200ppm,还更优选少于100ppm,并且又更优选少于50ppm。
此外,化学转化处理液中钙离子和镁离子的浓度以质量计通常也各自优选少于500ppm,更优选少于200ppm且还更优选少于90ppm。
化学转化处理液中钠离子、钾离子、钙离子和镁离子的浓度可以使用原子吸收光谱仪(商品名,Hitachi生产,Zeeman原子吸收光度计)通过原子吸收分析法测定。
在本发明的形成多层涂膜的方法中使用的化学转化处理液的组成包括下列金属化合物组分(M)以及任选的水分散性或水溶性树脂组合物(P)等。
金属化合物组分(M)
在本发明的形成多层涂膜的方法中使用的化学转化处理液优选地包含总金属量(以质量计)为30ppm至20,000ppm的金属化合物组分(M)。
金属化合物组分(M)不受限制,只要化学转化处理液中钠离子浓度不超过上述提及的浓度即可。其实例包括锆化合物、钛、钴、铝、钒、钨、钼、铜、锌、铟、铋、钇、铁、镍、锰、镓、银、镧系元素金属(镧、铈、镨、钕、钐、铕、钆、铽、镝、钬、铒、铥、镱和镥)等。金属化合物组分(M)优选地包含锆化合物。这些可以单独使用或两种以上组合使用。
在金属化合物组分(M)中可用的锆化合物包括生成含锆的离子如锆离子、氧锆离子和氟锆离子的化合物。生成氧锆离子的化合物的实例包括硝酸氧锆、乙酸氧锆、硫酸氧锆等。生成氟锆离子的化合物的实例包括锆氢氟酸、氟化锆钠、氟化锆钾、氟化锆锂、氟化锆铵等。在这些之中,硝酸氧锆和氟化锆铵为特别优选的。
生成钛离子的化合物的实例包括氯化钛和硫酸钛。生成氟钛离子的化合物的实例包括钛氢氟酸、氟化钛钠、氟化钛钾、氟化钛锂、氟化钛铵等。在这些之中,氟化钛铵为特别优选的。
生成钴离子的化合物的实例包括氯化钴、溴化钴、碘化钴、硝酸钴、硫酸钴、乙酸钴、硫酸钴铵等。在这些之中,硝酸钴为特别优选的。
生成铝离子的化合物的实例包括磷酸铝、硝酸铝、碳酸铝、硫酸铝、乙酸铝、甲酸铝、草酸铝、乳酸铝、丙二酸铝、酒石酸铝、抗坏血酸铝等。在这些之中,硫酸铝为特别优选的。
生成钒离子的化合物的实例包括原钒酸锂、原钒酸钠、偏钒酸锂、偏钒酸钾、偏钒酸钠、偏钒酸铵、焦钒酸钠、氯化氧钒、硫酸氧钒等。在这些之中,偏钒酸铵为特别优选的。
生成钨离子的化合物的实例包括钨酸锂、钨酸钠、钨酸钾、钨酸铵、偏钨酸钠、仲钨酸钠、五钨酸铵、七钨酸铵、磷钨酸钠、硼钨酸钡等。在这些之中,钨酸铵等为特别优选的。
生成钼离子的化合物的实例包括钼酸锂、钼酸钠、钼酸钾、七钼酸铵、钼酸钙、钼酸镁、钼酸锶、钼酸钡、磷钼酸、磷钼酸钠、磷钼酸锌等。
生成铜离子的化合物的实例包括硫酸铜、三水合硝酸铜(II)、六水合硫酸铜(II)铵、氧化铜II、磷酸铜等。生成锌离子的化合物的实例包括乙酸锌、乳酸锌、氧化锌等。
生成铟离子的化合物的实例包括硝酸铟铵等。
生成铋离子的化合物的实例包括含铋的无机化合物,诸如氯化铋、氧氯化铋、溴化铋、硅酸铋、氢氧化铋、三氧化二铋、硝酸铋、亚硝酸铋和碳酸氧铋;以及乳酸铋、三苯基铋、没食子酸铋、苯甲酸铋、柠檬酸铋、甲氧基乙酸铋、乙酸铋、甲酸铋、2,2-二羟甲基丙酸铋等。
生成钇离子的化合物的实例包括硝酸钇、乙酸钇、氯化钇、氨基磺酸钇、乳酸钇、甲酸钇等。
生成铁离子的化合物的实例包括氯化亚铁(II)、氯化铁(III)、柠檬酸铁(III)铵、草酸铁(III)铵、硝酸铁(III)、氟化铁(III)、硫酸铁(III)、硫酸铁(III)铵等。
生成镍离子的化合物的实例包括氯化镍(II)、乙酸镍(II)、柠檬酸镍(II)、草酸镍(II)、硝酸镍(II)、氨基磺酸镍(II)、碳酸镍(II)、硫酸镍(II)、氟化镍(II)等。生成锰离子的化合物的实例包括乙酸锰(II)、乙酸锰(III)、草酸锰(II)、硝酸锰(II)、碳酸锰(II)、硫酸锰(II)、硫酸锰(II)铵等。
生成镓离子的化合物的实例包括硝酸镓。
生成银离子的化合物的实例包括乙酸银(I)、氯化银(I)、硝酸银(I)和硫酸银(I)。
对于镧系元素金属化合物,生成镧离子的化合物的实例包括硝酸镧、氟化镧、乙酸镧、硼化镧、磷酸镧、碳酸镧等;生成铈离子的化合物的实例包括硝酸铈(III)、氯化铈(III)、乙酸铈(III)、草酸铈(III)、硝酸铈(III)铵、硝酸铈(IV)二铵等;生成镨离子的化合物的实例包括硝酸镨、硫酸镨、草酸镨等;以及生成钕离子的化合物的实例包括硝酸钕、氧化钕等。
金属化合物组分(M)可以进一步任选地包含选自碱金属(锂、钠、钾、铷、铯和钫)和碱土金属(铍、镁、钙、锶、钡和镭)的至少一种金属化合物。
本发明中使用的金属化合物组分(M)优选地包含至少一种锆化合物和硝酸铝。金属化合物组分(M)更优选地包含至少一种锆化合物。
水分散性或水溶性树脂组合物(P)
在本发明的形成多层涂膜的方法中使用的化学转化处理液可以任选地包含0.01质量%至40质量%的量的水分散性或水溶性树脂组合物(P)。
水分散性或水溶性树脂组合物(P)的实例包括在分子中含有可在水性介质中被转化成阳离子的基团(诸如氨基、铵盐基团、锍盐基团和鏻盐基团)的阳离子树脂组合物。
实例也包括在分子中含有可在水性介质中被转化成阴离子的基团(诸如羧基、磺酸基团和磷酸基团)的阴离子树脂组合物。树脂类型的实例包括环氧树脂、丙烯酸树脂、聚丁二烯树脂、醇酸树脂和聚酯树脂。
在这些官能团中,分子中包含氨基的阳离子树脂组合物为优选的,因为此类阳离子树脂组合物即使在作为污染物与阳离子电沉积涂料组合物混合时也不会引起不利的影响,因为在涂有化学转化处理液的金属被涂物运送至阳离子电沉积涂料组合物槽期间防止生锈,以及因为所得的涂装物品的耐腐蚀性得以改善。含氨基的阳离子树脂组合物不受特别的受限。优选的实例包括含氨基的环氧树脂、聚烯丙胺、Mannich改性氨基化酚醛树脂等。这些可以单独使用或两种以上组合使用。基于树脂固体成分,树脂的胺值优选为30mg KOH/g至150mg KOH/g,更优选为60mg KOH/g至130mg KOH/g。
使水分散性或水溶性树脂组合物(P)适当地与中和剂混合并分散在去离子水中以获得乳液,该乳液可以用于制备化学转化处理液。
除上述树脂之外,化学转化处理液的组分还可以包含在分子中含有非离子且高极性官能团(诸如羟基和氧乙烯链)并在水性介质中为水分散性或水溶性的树脂或化合物。该树脂或化合物的具体实例包括聚乙烯醇、聚氧乙烯、聚乙烯吡咯烷酮、聚氧丙烯、羟乙基纤维素、羟丙甲基纤维素等。这些可以单独使用或以两种以上组合使用。
当被涂物被转移至电沉积涂料组合物槽时,化学转化处理液中包含的树脂组合物(P)防止被涂物生锈。
化学转化处理液的制备
在本发明的形成多层涂膜的方法中使用的化学转化处理液可以通过使用任何方法制备而不受限制。例如,可以使用下列方法(1)至(3):
(1)一种方法,其包括将金属化合物组分(M)加入去离子水和/或水分散性或水溶性树脂组合物(P)中,任选地加入中和剂,以及再加入去离子水;
(2)一种方法,其包括将去离子水和/或水分散性或水溶性树脂组合物(P)加入金属化合物组分(M)中。
(3)一种方法,其包括将金属化合物组分(M)和/或水分散性或水溶性树脂组合物(P)加入先前已经制备的化学转化处理液中,以及再加入去离子水。
化学转化处理液(以质量计)包含作为总金属成分的浓度通常为30ppm至20,000ppm、优选50ppm至10,000ppm、更优选100ppm至5,000ppm、特别优选150ppm至2,000ppm的金属化合物组分(M),以及基于化学转化处理液的质量任选地还包含通常为0.01质量%至40质量%、优选0.02质量%至10质量%、还更优选为0.03质量%至1质量%的量的水分散性或水溶性树脂组合物(P)。pH优选为1.0至8.0,更优选为3.0至7.0。
形成化学转化涂膜的方法
形成化学转化涂膜的方法的实例包括但不限于:1)一种方法,其中将金属被涂物浸入装有化学转化处理液的化学转化处理槽中,保持通常10秒至360秒,优选50秒至300秒,更优选70秒至240秒,从而在金属被涂物上形成化学转化涂膜;2)一种方法,其中将金属被涂物浸入装有化学转化处理液的化学转化处理槽中,并使用金属被涂物作为阴极通常在1V至50V下施加电流保持10秒至360秒,优选在2V至30V下保持30秒至180秒;3)一种方法,其中将金属被涂物浸入装有化学转化处理液的化学转化处理槽中,保持特定时间段,随后施加电流,浸入通常进行10秒至180秒,优选5秒至120秒,在1V至100V下施加电流保持10秒至360秒,优选在2V至60V下保持30秒至180秒;等。根据本发明的方法,即使当使用其中不进行电流施加的以上方法(1)时,也获得了具有降低的不均匀和高的耐腐蚀性的多层涂膜。
化学转化涂膜沉积的机理是:浸入或电流施加增加了金属被涂物附近的pH并引起水解反应,从而使化学转化处理液中的金属离子物质沉积在金属被涂物上成为不良溶解的化学转化涂膜(金属氧化物和/或一部分树脂组合物(P)),从而形成包含金属化合物组分(M)和/或树脂组合物(P)的化学转化涂膜。
可以将具有其上形成的化学转化涂膜的金属被涂物在经历电沉积涂装之前进行适当地放置,然后浸入装有阳离子电沉积涂料组合物的阳离子电沉积涂料组合物槽中进行电沉积涂装。以这种方式,在化学转化涂膜上形成电沉积涂膜。此时,在本发明中,可省略迄今为止在电沉积涂装之前进行的部分或全部水洗步骤。
如本文所用,短语诸如“省略(omitting)(省略(omission of))部分或全部水洗步骤”以及“部分或全部水洗步骤被省略”意指根据所需的涂膜性能,可省略选自工业用水清洗和/或清水清洗以及纯净水清洗的至少一个水洗步骤。例如,省略工业用水清洗和清水清洗而仅进行纯净水清洗对应于“省略部分或全部水洗步骤”。因此,“省略(省略)部分或全部水洗步骤”或“部分或全部水洗步骤被省略”表明,例如,进行(i)工业用水清洗和/或清水清洗或(ii)纯净水清洗,或既不进行(i)也不进行(ii)。其中进行上述的清洗(i)和(ii)但在每个清洗中使用减少的水量以使得所用的总水量等于在其中(i)或(ii)的至少一个被省略的方法中所用的总水量,在所用的水量方面,基本上等同于其中(i)或(ii)的至少一个被省略的方法。因此,在本发明中,该方法也包括在其中“部分或全部水洗步骤被省略”的方法中。
以上描述的清洗方法可以为浸渍清洗或喷雾清洗(雾化喷雾清洗,喷淋喷雾清洗)。在本发明中,适当地使用任何方法。为了实现简化流程和节约空间、简化流出物处理和减少废品,仅使用喷雾清洗为优选的。喷雾清洗通过将水喷射通常1秒至120秒、优选2秒至60秒而从化学转化处理的被涂物表面去除过量的化学转化处理液。在喷雾清洗中,当被涂物具有复杂的形状(如,车架)时,直接喷射整个表面是不可能的;因此,可以仅在外表面上进行喷射,所述外表面的成品外观被认为是最重要的问题。因此,其中省略部分或全部水洗步骤的方法的实例包括一种方法,所述方法包括将水喷射120秒以下、优选60秒以下的步骤。此类方法的实例还包括其中不进行水清洗的方法。
为了进一步实现简化流程和节约空间,为了进一步简化流出物处理以及为了进一步减少废品,更特别优选的是省略所有水洗步骤,诸如工业用水清洗、清水清洗和纯净水清洗,包括浸渍清洗和喷雾清洗。
电沉积涂装前的放置在温度通常为0℃至80℃、优选5℃至50℃、更优选10℃至40℃的条件下进行通常10秒至30分钟、优选20秒至20分钟、更优选30秒至15分钟。以这种方式,去除附着于金属被涂物的过量的化学转化处理液,从而可以实现优异的电沉积涂装性能并获得具有优异的成品外观和/或优异的耐腐蚀性的多层涂膜。
在放置期间,可以使金属被涂物适当地经历鼓风、摇动和旋转中的至少一种。以这种方式,最大程度的去除附着于金属被涂物的过量的化学转化处理液。
在通常0.01MPa至1.0MPa、优选0.05MPa至0.5MPa的气压下,在通常0℃至80℃、优选10℃至60℃的温度下,可以在被涂物表面进行鼓风,通常保持1秒至10分钟、优选2秒至3分钟。以这种方式,从被涂物中去除过量的化学转化处理液。
接下来,将具有在其上形成的化学转化涂膜的金属被涂物浸入装有阳离子电沉积涂料组合物的阳离子电沉积槽中,随后施加电流,从而在化学转化涂膜上形成电沉积涂膜。
阳离子电沉积涂料组合物
在本发明的形成多层涂膜的方法(步骤2)中使用的阳离子电沉积涂料组合物并不受限制,并且可以使用任何已知的组合物。特别优选地使用包含含氨基的环氧树脂(A)和封端聚异氰酸酯(B)的组合物。在本发明中使用的阳离子电沉积涂料组合物优选地包含基于总树脂固体成分的通常40质量%至90质量%、优选55质量%至85质量%、更优选60质量%至80质量%的量的含氨基的环氧树脂(A),以及基于总树脂固体成分的通常10质量%至60质量%、优选15质量%至45质量%、更优选20质量%至40质量%的量的封端聚异氰酸酯(B)。
含氨基的环氧树脂(A)
含氨基的环氧树脂(A)可以通过使环氧树脂(a1)和胺化合物(a2)以及任选的改性剂反应来获得。含氨基的环氧树脂的实例包括(1)环氧树脂与伯胺化合物、仲胺化合物或伯胺和仲胺的混合物的化合物的加合物(参见,例如第3,984,299号美国专利申请);(2)环氧树脂与酮亚胺化的胺化合物的加合物(参见,例如,第4,017,438号美国专利申请);(3)通过环氧树脂与具有酮亚胺化的伯氨基基团的羟基化合物的醚化而获得的反应产物(参见,例如,JP59-43013A);等。
环氧树脂(a1)
在含氨基的环氧树脂(A)的生产中可用的环氧树脂(a1)包括每分子含有至少一种、优选两种以上的环氧基并且数均分子量通常为至少300、优选400至4,000、更优选800至2,500并且环氧当量为至少160、优选180至2,500、更优选400至1,500的化合物。特别地,通过使多酚化合物与表卤代醇反应获得的环氧树脂为优选的。
可用于形成环氧树脂(a1)的多酚化合物的实例包括双(4-羟基苯基)-2,2-丙烷[双酚A]、双(4-羟基苯基)甲烷[双酚F]、双(4-羟基环己基)甲烷[氢化双酚F]、2,2-双(4-羟基环己基)丙烷[氢化双酚A]、4,4'-二羟基二苯甲酮、双(4-羟基苯基)-1,1-乙烷、双(4-羟基苯基)-1,1-异丁烷、双(4-羟基-3-叔丁基-苯基)-2,2-丙烷、双(2-羟基萘基)甲烷、四(4-羟基苯基)-1,1,2,2-乙烷、4,4'-二羟基二苯基砜、苯酚酚醛清漆(novolak)、甲酚酚醛清漆等。这些可以单独使用或两种以上组合使用。
通过使多酚化合物与表氯醇反应获得的作为环氧树脂(a1)的优选的树脂优选为来源于双酚A并且通过下式表示的那些:
其中n优选为0至8。
环氧树脂(a1)的可商购的产品的实例包括Mitsubishi Chemical Corporation的以商品名jER828EL、jER1002、jER1004和jER1007销售的产品。
双酚型环氧树脂可以是任选地在催化剂如碱性催化剂的存在下通过使例如表氯醇与双酚缩合成高分子量树脂而获得的树脂,或任选地在催化剂如碱性催化剂的存在下通过使表氯醇与双酚缩合成低分子量环氧树脂并使该低分子量环氧树脂经历与双酚的加聚反应而获得的树脂。
在本说明书中,数均分子量为聚苯乙烯当量分子量,基于具有在相同条件下测量的已知分子量的标准聚苯乙烯的保留时间(保留体积),所述聚苯乙烯当量分子量由通过凝胶渗透色谱法(GPC)测量的保留时间(保留体积)而测定的。更具体地说,在下列条件下使用凝胶渗透色谱设备(由Tosoh Corporation生产的HLC8120GPC(商品名))连同四个柱(TSKgel G-4000HXL、TSKgel G-3000HXL、TSKgel G-2500HXL和TSKgel G-2000XL,商品名,均由Tosoh Corporation生产)一起进行测量:流动相:四氢呋喃;测量温度:40℃;流速:1mL/min;以及检测器:RI。
胺化合物(a2)
用作含氨基的环氧树脂(A)的起始材料的胺化合物(a2)并不受限制,只要其具有与环氧树脂(a1)的反应性即可。实例包括单烷基胺或二烷基胺,诸如单甲胺、二甲胺、单乙胺、二乙胺、二丙胺、二丁胺、二己胺、二辛胺、单异丙胺、二异丙胺、单丁胺、单辛胺、甲基丁胺和二丁胺;烷醇胺,诸如单乙醇胺、N-甲基乙醇胺、N-乙基乙醇胺、二乙醇胺、单(2-羟丙基)胺、二(2-羟丙基)胺、N-丁基乙醇胺、二丙醇胺、单甲基氨基乙醇、N-(2-羟丙基)乙二胺、3-甲胺-1,2-丙二醇、3-叔丁基氨基-1,2-丙二醇、N-甲基葡糖胺和N-辛基葡糖胺;亚烷基聚胺,诸如聚亚甲基二胺、聚醚二胺、乙二胺、丙二胺、丁二胺、六亚甲基二胺、三甲基六亚甲基二胺、二甲基氨基丙胺、二亚乙基三胺、二乙基氨基丙胺、二亚丙基三胺、二亚丁基三胺、双(六亚甲基)三胺、双(4-氨基丁基)胺、三亚乙基四胺、四亚乙基五胺、五亚乙基六胺;芳族或脂环族聚胺,诸如甲二胺(menthanediamine)、异佛尔酮二胺、双(4-氨基-3-甲基环己基)甲烷、间苯二甲胺(metaxylylenediamine)、间苯二胺、萘二胺和二甲基氨基甲基苯;杂环聚胺,诸如哌嗪、1-甲基哌嗪、3-吡咯烷醇、3-哌啶醇和4-吡咯烷醇;通过向每摩尔聚胺加入1mol至30mol含环氧基的化合物而获得的环氧加成(epoxy-added)的聚胺;聚酰胺聚胺,其在聚酰胺树脂分子中包含一个或多个伯胺或仲胺并且通过使聚胺与芳族酸酐、脂环族酸酐、脂肪族酸酐、卤代酸酐和/或二聚酸缩合而产生;通过使聚胺的一个或多个伯胺或仲胺与酮化合物反应获得的酮亚胺化的胺;等。这些可以单独使用或两种以上组合使用。用于生产酮亚胺化的胺的酮化合物并不受限制,只要它们与聚胺的伯胺或仲胺反应以形成酮亚胺化合物且只要它们在水性涂料组合物中水解即可。实例包括甲基异丙基酮(MIPK)、二异丁基酮(DIBK)、甲基异丁基酮(MIBK)、二乙基酮(DEK)、乙基丁基酮(EBK)、乙基丙基酮(EPK)、二丙基酮(DPK)、甲基乙基酮(MEK)等。在这些之中,甲基异丁基酮(MIBK)为优选的。这些酮可以单独使用或两种以上组合使用。
含氨基的环氧树脂(A)的胺值优选为40mg KOH/g至80mg KOH/g,更优选为45mgKOH/g至65mg KOH/g,从而实现所得的涂膜的优异耐腐蚀性并防止涂膜在干燥时的不均匀。
改性剂
含氨基的环氧树脂(A)可以任选地用改性剂进行改性。改性剂并不受限制,只要其为与环氧树脂(a1)反应的树脂或化合物即可。实例包括酸性化合物,诸如乙酸、丙酸、丁酸、戊酸、丙烯酸、油酸、乙醇酸、乳酸、苯甲酸、没食子酸、脂肪酸和二元酸;一元醇,诸如甲醇、乙醇、正丙醇、异丙醇、正丁醇、2-丁醇、戊醇、己醇、正辛醇、2-乙基己醇、十二烷基醇、硬脂醇和苄醇;多元醇;聚醚多元醇;聚酯多元醇;聚酰胺胺;聚异氰酸酯化合物;内酯,诸如γ-丁内酯和ε-己内酯;通过使聚异氰酸酯化合物与内酯如ε-己内酯反应而获得的化合物;丙烯酸单体;通过一种或多种丙烯酸单体的聚合反应而获得的化合物;二甲苯甲醛化合物;等。这些可以单独使用或两种以上组合使用。
环氧树脂(a1)与胺化合物(a2)以及任选地与改性剂的反应可以在约80℃至170℃、优选约90℃至150℃的反应温度下通常于适当的有机溶剂中进行约1小时至6小时、优选约1小时至5小时。
有机溶剂的实例包括基于烃的溶剂,诸如甲苯、二甲苯、环己烷和正己烷;基于酯的溶剂,诸如乙酸甲酯、乙酸乙酯和乙酸丁酯;基于酮的溶剂,诸如丙酮、甲基乙基酮、甲基异丁基酮和甲基戊基酮;基于酰胺的溶剂,诸如二甲基甲酰胺和二甲基乙酰胺;基于醇的溶剂,诸如甲醇、乙醇、正丙醇和异丙醇;基于醚醇的化合物,诸如乙二醇单丁醚、二乙二醇单乙醚;这些有机溶剂的混合物;等。
使用的改性剂的量并不严格地受限制并且可以根据阳离子电沉积涂料组合物的使用等而适当地调节。为了改善成品外观和耐腐蚀性,基于含氨基的环氧树脂(A)的固体质量,适当地使用3质量%至50质量%,优选5质量%至30质量%的量的改性剂。
在本发明中使用的含氨基的环氧树脂(A)并不特别地受限制。除上述之外,可以任选地使用下列树脂:使含有噁唑烷酮环的环氧树脂与含有氨基的化合物反应而获得的含氨基的环氧树脂(如,JPH05-306327A);通过使具有氧化烯结构的环氧树脂与含有氨基的化合物反应而获得的含氨基的改性环氧树脂(如,JP2011-847723A);通过使环氧树脂与二甲苯甲醛树脂和含氨基的化合物反应而获得的二甲苯甲醛树脂改性的含氨基的环氧树脂(如,JP2003-221547A);等。这些可以单独使用或两种以上组合使用。
封端聚异氰酸酯(B)
封端聚异氰酸酯(B)为通过聚异氰酸酯化合物和异氰酸酯封闭剂的加成反应而获得的反应产物。在封端聚异氰酸酯(B)中使用的聚异氰酸酯化合物并不受限制,并且可以使用任何已知的化合物。实例包括芳族聚异氰酸酯化合物,诸如甲代亚苯基二异氰酸酯、亚二甲苯基二异氰酸酯、亚苯基二异氰酸酯、二苯基甲烷-2,2'-二异氰酸酯、二苯基甲烷-2,4'-二异氰酸酯、二苯基甲烷-4,4'-二异氰酸酯以及粗制MDI[聚亚甲基聚苯基异氰酸酯];脂环族聚异氰酸酯化合物,诸如双(异氰酸酯甲基)环己烷和异佛尔酮二异氰酸酯;脂肪族聚异氰酸酯化合物,诸如四亚甲基二异氰酸酯、六亚甲基二异氰酸酯和亚甲基二异氰酸酯;这些聚异氰酸酯化合物的环化聚合物或缩二脲;以及这些化合物的组合。
为了改善耐腐蚀性,特别优选地使用芳族聚异氰酸酯化合物,诸如甲代亚苯基二异氰酸酯、亚二甲苯基二异氰酸酯、亚苯基二异氰酸酯、二苯基甲烷-2,4'-二异氰酸酯、二苯基甲烷-4,4'-二异氰酸酯以及粗制MDI。
异氰酸酯封闭剂通过向异氰酸酯基的加成而封闭聚异氰酸酯化合物的异氰酸酯基。通过加成制备的封端聚异氰酸酯化合物在室温为稳定的。然而,当加热至烘膜温度(通常为约100℃至200℃)时,封闭剂离解,从而再生游离的异氰酸酯基。
在封端聚异氰酸酯(B)中使用的异氰酸酯封闭剂并不受限制,并且可以使用任何已知的试剂。实例包括甲基乙基酮肟、环己酮肟以及类似的基于肟的化合物;苯酚、对叔丁基苯酚、甲酚以及类似的基于苯酚的化合物;正丁醇、2-乙基己醇、苯甲醇、甲基苯甲醇、乙二醇单丁醚、二乙二醇单乙醚、乙二醇、丙二醇以及类似的基于醇的化合物;ε-己内酰胺、γ-丁内酰胺以及类似的基于内酰胺的化合物;丙二酸二甲酯、丙二酸二乙酯、乙酰乙酸乙酯、乙酰乙酸甲酯、乙酰丙酮以及类似活性的基于亚甲基的化合物;等。这些可以单独使用或两种以上组合使用。
阳离子电沉积涂料组合物的其它组分
除上述组分(A)和(B)之外,阳离子电沉积涂料组合物可以任选地包含例如基本上不含氨基并且通过使环氧树脂与多元醇反应而获得的改性环氧树脂、和通过使多元酸与多元醇反应而获得的聚酯树脂。当包含在阳离子电沉积涂料组合物中时,基于组分(A)和(B)的100质量份的总固体成分,改性环氧树脂和/或聚酯树脂的量通常为3质量份至50质量份,优选10质量%至45质量%。
阳离子电沉积涂料组合物还可以任选地包含各种添加剂,诸如可以任选地使用表面活性剂、表面控制剂、颜料分散糊、水、有机溶剂、中和剂等。可以将这些组分充分地混合并溶解或分散在水中以制备阳离子电沉积涂料组合物。
作为中和剂,可以使用已知的有机酸和无机酸,而没有限制。特别优选地使用甲酸、乳酸、乙酸或其混合物。
颜料分散糊包含颜料如着色颜料、防锈颜料和体质颜料的细颗粒的分散体。可以例如通过将用于颜料分散体的树脂、中和剂和颜料混合并使混合物在分散混合器如球磨机、砂磨机或砾磨机中经历分散处理来制备颜料分散糊。
可以将已知树脂用作用于颜料分散体的树脂。实例包括具有羟基和阳离子基团的树脂,诸如环氧树脂、丙烯酸树脂;表面活性剂;叔胺型环氧树脂;季铵盐型环氧树脂;叔锍盐型环氧树脂;等。这些可以单独使用或两种以上组合使用。
对于上述颜料不存在特别的限制。实例包括着色颜料,诸如二氧化钛、炭黑和铁丹;体质颜料,诸如粘土、云母、重土、碳酸钙和二氧化硅;和防锈颜料,诸如磷钼酸铝、三聚磷酸铝和氧化锌(锌白)等。
为了防止腐蚀,也可以掺入铋化合物。铋化合物的实例包括有机酸铋,诸如氧化铋、氢氧化铋、碱式碳酸铋、硝酸铋、硅酸铋、乳酸铋和水杨酸铋。
为了改善涂膜固化性,可以使用有机锡化合物,诸如二苯甲酸二丁基锡、二辛基氧化锡和二丁基氧化锡。
电沉积涂装
在本发明的形成多层涂膜的方法(步骤2)中使用的阳离子电沉积涂料组合物可以用于在金属被涂物上进行电沉积涂装,化学转化涂膜已在该金属被涂物上形成而不进行部分或全部水洗步骤。电沉积涂装通常通过以下进行:将电沉积浴的温度调节至15℃至35℃,并使用被涂物作为阴极在100V至400V的负载电压下施加电流。涂料组合物浴包含用去离子水等稀释至约5质量%至40质量%、优选8质量%至25质量%的固体含量且1.0至9.0、优选3.0至7.0的pH的阳离子电沉积涂料组合物。
通常,在电沉积涂装之后,将涂装的被涂物用超滤液(UF滤液)、反渗透水(RO水)、工业用水、纯净水等充分清洗以去除过量附着于被涂物的阳离子电沉积涂料组合物。
通过使用阳离子电沉积涂料组合物获得的电沉积涂膜的厚度并不特别地受限制,但基于干燥涂膜的厚度,通常为5μm至40μm、优选为10μm至30μm。涂膜的烘干通过在110℃至200℃、优选140℃至180℃的涂装物品的表面温度下,用烘干机如电热风烘干机或气热风烘干机加热电沉积涂膜10分钟至180分钟、优选20分钟至60分钟而进行。通过此类烘干,获得固化的涂膜。
实施例
参考制备例、实施例和比较例,下文将详细地解释本发明;然而,本发明并不受限于此。在实施例中,“份”、“%”和“ppm”是以质量计的。
化学转化处理液的制备
制备例1
使用分散器,将已经用去离子水稀释的硝酸铝、硝酸钙和硝酸钾、以及六氟锆酸与去离子水在剧烈搅拌下混合。将所得混合物用清水和/或去离子水进一步稀释。然后,向其加入硝酸、硝酸钠、硝酸铵、氢氟酸、氨和/或氢氧化钠使得所得混合物的pH为3.8并且包含500ppm的锆离子、100ppm的铝离子、80ppm的钠离子、80ppm的钾离子以及80ppm的钙离子作为金属元素。以这种方式,获得了化学转化处理液X-1。
制备例2至27
除了使用下表1中显示的组成之外,如制备例1那样获得化学转化处理液X-2至X-27。使用硝酸镁调节镁离子的量。
表1
表1(续)
表格中显示的量均基于以质量计的固体浓度(ppm)。
注释1:P-1:PAA-01(商品名,由Nitto Boseki Co.,Ltd.生产,聚丙烯胺,重均分子量:1,600)。
注释2:P-2:Mannich改性氨基化的酚醛树脂。[将120份的Maruka Lyncur S-2(商品名,由Maruzen Petrochemical Co.,Ltd.生产,聚-4-乙烯基苯酚)和120份的乙二醇单丁醚置于配备有搅拌器、温度计、滴液漏斗和回流冷凝器的烧瓶中,并将混合物加热至90℃以溶解聚-4-乙烯基苯酚。随后,向其加入35份的单甲基乙醇胺、40份的37%的福尔马林、10份的乙二醇单丁醚,并使混合物在90℃反应4小时,随后再加入乙二醇单丁醚以将固体含量调节至40%。]
制备例28
锌离子:1,500ppm
镍离子:500ppm
磷酸离子:13,500ppm
氟离子:500ppm
硝酸根离子:6,000ppm
亚硝酸根离子:100ppm
钠离子:80ppm
钙离子:80ppm
钾离子:80ppm
制备具有以上组成的化学转化处理液X-28。
制备例29
锌离子:1,500ppm
镍离子:500ppm
磷酸根离子:13,500ppm
氟离子:500ppm
硝酸根离子:6,000ppm
亚硝酸根离子:100ppm
钠离子:600ppm
钙离子:600ppm
钾离子:600ppm
制备具有以上组成的化学转化处理液X-29。
含氨基的环氧树脂(A)的制备
制备例30
将1,200份的jER828EL(商品名,由Japan Epoxy Resin Co.,Ltd.生产的环氧树脂,环氧当量:190;数均分子量:350)、500份的双酚A以及0.2份的二甲基苄胺置于配备有搅拌器、温度计、氮气入口管和回流冷凝器的烧瓶中并使混合物在130℃反应,直至环氧当量为850。
此后,加入160份的二乙醇胺和65份的二亚乙基三胺和甲基异丁基酮的酮亚胺化产物,并使混合物在120℃反应4小时,随后加入480g乙二醇单丁醚以获得固体含量为80%的含氨基的环氧树脂A-1。该含氨基的环氧树脂A-1的胺值为59mg KOH/g并且数均分子量为2,100。
封端聚异氰酸酯(B)的制备
制备例31
将270份的Cosmonate M-200(商品名,由Mitsui Chemicals,Inc.生产,粗制MDI,NCO基含量:31.3%)和127份的甲基异丁基酮置于反应器中,并将混合物加热至70℃。然后,历时1小时向其逐滴加入236份的乙二醇单丁醚,然后将混合物加热至100℃。维持该温度的同时,随着时间的推移对该混合物取样,并进行红外吸收光谱测量以确认没有未反应的异氰酸酯基的吸收。以这种方式,获得树脂固体含量为80%的封端聚异氰酸酯B-1。
用于颜料分散体的树脂的生产
制备例32
将450份的壬基酚和960份的CNE195LB(商品名,由Chang Chun Japan Co.,Ltd.生产,甲酚酚醛清漆环氧树脂,酚醛清漆型酚醛树脂的缩水甘油基醚)置于配备有搅拌器、温度计、滴液漏斗和回流冷凝器的烧瓶中。将混合物逐渐加热的同时混合并搅拌,并在160℃反应。在加入430份的ε-己内酯后,将混合物加热至170℃并反应。此后,使105份的二乙醇胺、147份的二甲基乙醇胺以及164份的浓度为90%的乳酸水溶液反应,并确认消除了几乎全部环氧基。然后,向其加入乙二醇单丁醚,从而获得固体含量为60%的用于颜料分散体的树脂。该用于颜料分散体的树脂的胺值为70mg KOH/g并且数均分子量为约2,200。
颜料分散糊的制备
制备例33
将8.3份(固体成分:5份)的在制备例32中获得的固体含量为60%的用于颜料分散体的树脂、14.5份的二氧化钛、7.0份的细粘土、0.3份的炭黑、1份的二辛基氧化锡、1份的氢氧化铋以及20.3份的去离子水在球磨机中分散20小时,从而获得固体含量为55%的颜料分散糊。
阳离子电沉积涂料组合物的制备
制备例34
将87.5份(固体成分:70份)的在制备例30中获得的含氨基的环氧树脂A-1和37.5份(固体成分:30份)的在制备例31中获得的封端聚异氰酸酯B-1混合,并向混合物进一步加入13份的10%乙酸。在将混合物均匀地搅拌后,历时约15分钟逐滴加入去离子水的同时剧烈搅拌,以获得固体含量为34%的乳液。
此后,将294份(固体成分:100份)的以上获得的乳液、52.4份(固体成分:28.8份)的在制备例33中获得的55%颜料分散糊以及350份的去离子水混合以获得固体含量为20%的阳离子电沉积涂料组合物Y-1。
测试板的制备
实施例1
根据下列步骤1-1至2-3制备测试板Z-1。
步骤1(脱脂、表面调整和化学转化处理)
步骤1-1:通过浸入已调节至43℃的2.0质量%的Fine Cleaner L4460(由NihonParkerizing Co.,Ltd.生产,碱性-脱脂剂)中120秒使冷轧钢板(70mm×150mm×0.8mm)脱脂。
步骤1-2:在常温下,通过浸入0.15%的Preparen 4040N(由Nihon ParkerizingCo.,Ltd生产,表面控制剂)水溶液中30秒使上述钢板经历表面调整,并将所得的产品通过喷射纯净水清洗30秒。
步骤1-3:通过浸入制备例1中获得的已调节至43℃的化学转化处理液X-1中120秒使上述钢板经历化学转化处理。
步骤2(清洗、电沉积涂装和烘干)
步骤2-1:通过浸入纯净水中120秒(等同于随后提及的水清洗步骤II)使钢板经历清洗,在步骤1中化学转化涂膜在所述钢板上形成。
步骤2-2:通过浸入已调节至28℃的阳离子电沉积涂料组合物Y-1(制备例34)的浴中使上述钢板在250V下经历电沉积涂装180秒(电压上升时段:30s)。
步骤2-3:通过浸入清水中一次并保持120秒以及浸入纯净水中一次并保持120秒使上述钢板经历清洗,并在电干燥机中于170℃下烘干20分钟,从而获得具有在干燥时膜厚度为20μm的多层涂膜的测试板Z-1。
实施例2至31以及比较例1至8
除了使用下表2中示出的化学转化处理液和/或水洗步骤之外,如实施例1那样获得测试板Z-2至Z-39。对于获得的测试板,进行测试以评价成品外观如不均匀以及耐腐蚀性。下表2也示出评价结果。在实施例和比较例中使用的水洗步骤以及评价不均匀和耐腐蚀性的方法描述于下文中。
水清洗步骤
下文描述了实施例或比较例中使用的水洗步骤。从简化步骤的角度,较短的步骤为优选的。还从经济和环境的角度,更优选的是所述步骤使用较少的清洗水。基于已知的水清洗步骤I,在下列水清洗步骤II至V中,省略部分或全部步骤。
水清洗步骤I:在化学转化处理后,通过浸入清水中一次并保持120秒使被涂物经历清洗,随后通过浸入纯净水中一次并保持120秒使被涂物经历清洗。这为已知的水清洗步骤(通过浸入两次以上的水清洗)并且为最长的步骤。
水清洗步骤II:在化学转化处理后,通过浸入纯净水中一次并保持120秒使被涂物经历清洗。与已知的水清洗步骤(通过浸入两次以上的水清洗)相比,该步骤省略了部分清洗步骤。
水清洗步骤III:在化学转化处理后,通过雾化喷射纯净水30秒使被涂物经历清洗。与已知的水清洗步骤(通过浸入两次以上的水清洗)相比,该步骤省略了部分清洗步骤,并且略微短于水清洗步骤II,所述水清洗步骤II包括通过浸入一次进行清洗。
水清洗步骤IV:在化学转化处理后,不进行水清洗步骤,而使被涂物经历鼓风10秒(在室温下并且被涂物表面上的气压为0.2MPa)。该步骤为短的,并且不产生废水。
水清洗步骤V:在化学转化处理后,不进行水清洗步骤。这是最短的步骤并且不产生废水。
不均匀
观察每个获得的测试板的外观以评价作为多层涂膜的成品外观的不均匀。基于下列A(非常好)至E(差)的标准进行评价。
A:非常均匀。
B:均匀。
C:大部分为均匀的,但视觉上确认略微不均匀。
D:略微差的,视觉上确认不均匀。
E:差的,明显的不均匀。
耐腐蚀性
将每个多层涂膜用刀横切,以使切口到达测试板,然后根据JIS Z-2371使所述测试板在35℃经历盐雾测试840小时。根据下列标准基于来自切口的生锈和起泡的宽度评价耐腐蚀性。基于下列A(非常好)至E(差)的标准进行评价。
A:来自切口的生锈和起泡的最大宽度为2.0mm以下(在一侧)。
B:来自切口的生锈和起泡的最大宽度为大于2.0mm至2.5mm以下(在一侧)。
C:来自切口的生锈和起泡的最大宽度为大于2.5mm至3.0mm以下(在一侧)。
D:来自切口的生锈和起泡的最大宽度为大于3.0mm至3.5mm以下(在一侧)。
E:来自切口的生锈和起泡的最大宽度为大于3.5mm(在一侧)。
表2
表2(续)
表2(续)
表2(续)
Claims (4)
1.一种形成多层涂膜的方法,所述方法包括通过下列步骤在金属被涂物上形成化学转化涂膜和电沉积涂膜:
步骤1:在不施加电流的情况下,将金属被涂物浸入化学转化处理液中以形成化学转化涂膜;以及
步骤2:通过使用阳离子电沉积涂料组合物在所述金属被涂物上进行电沉积涂装以形成电沉积涂膜,
其中所述化学转化处理液以质量计包含少于100ppm的钠离子,
所述化学转化处理液以质量计包含少于90ppm的钙离子,
所述化学转化处理液以质量计包含少于100ppm的钾离子,
所述化学转化处理液以质量计包含少于90ppm的镁离子,
所述化学转化处理液是连续使用的,并且
在化学转化处理之后和在将具有在其上形成的化学转化涂膜的金属被涂物浸入阳离子电沉积浴之前,进行(i)工业用水清洗和/或清水清洗或者(ii)纯净水清洗,或者不进行(i)和(ii),其中所述阳离子电沉积涂料组合物包含含氨基的环氧树脂(A)和封端聚异氰酸酯(B),基于总树脂固体成分,以40质量%至90质量%的量包含所述含氨基的环氧树脂(A),并且以10质量%至60质量%的量包含所述封端聚异氰酸酯(B)。
2.如权利要求1所述的形成多层涂膜的方法,
其中所述化学转化处理液以质量计包含总金属量为30ppm至20,000ppm的至少一种金属化合物组分(M),所述金属化合物组分(M)包括选自锆、钛、钴、铝、钒、钨、钼、铜、锌、铟、铋、钇、铁、镍、锰、镓、银以及镧系元素金属的至少一种金属化合物。
3.如权利要求1或2所述的形成多层涂膜的方法,
其中所述化学转化处理液包含0.01质量%至40质量%的量的水分散性或水溶性树脂组合物(P)。
4.如权利要求1至3中任一项所述的形成多层涂膜的方法,
其中在进行步骤2的电沉积涂装之前,使所述金属被涂物经历鼓风、摇动和旋转中的至少一种。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-160799 | 2013-08-01 | ||
JP2013160799 | 2013-08-01 | ||
JP2013167905 | 2013-08-12 | ||
JP2013-167905 | 2013-08-12 | ||
JP2014-092911 | 2014-04-28 | ||
JP2014092911A JP5657157B1 (ja) | 2013-08-01 | 2014-04-28 | 複層皮膜形成方法 |
CN201480004672.8A CN104919092A (zh) | 2013-08-01 | 2014-07-30 | 形成多层涂膜的方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201480004672.8A Division CN104919092A (zh) | 2013-08-01 | 2014-07-30 | 形成多层涂膜的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110128912A true CN110128912A (zh) | 2019-08-16 |
CN110128912B CN110128912B (zh) | 2021-05-14 |
Family
ID=52431803
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910418428.0A Active CN110128912B (zh) | 2013-08-01 | 2014-07-30 | 形成多层涂膜的方法 |
CN201480004672.8A Pending CN104919092A (zh) | 2013-08-01 | 2014-07-30 | 形成多层涂膜的方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201480004672.8A Pending CN104919092A (zh) | 2013-08-01 | 2014-07-30 | 形成多层涂膜的方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US10697066B2 (zh) |
EP (1) | EP3029179B1 (zh) |
JP (1) | JP5657157B1 (zh) |
CN (2) | CN110128912B (zh) |
BR (1) | BR112016001864A2 (zh) |
CA (1) | CA2917213C (zh) |
MX (1) | MX369015B (zh) |
WO (1) | WO2015016273A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110760916A (zh) * | 2019-11-18 | 2020-02-07 | 和县科嘉阀门铸造有限公司 | 一种提高镁合金阀门耐蚀性的方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5828929B2 (ja) * | 2013-08-13 | 2015-12-09 | 関西ペイント株式会社 | 複層皮膜形成方法 |
DE102016206418A1 (de) * | 2016-04-15 | 2017-10-19 | Henkel Ag & Co. Kgaa | Unterdrückung anlagenbedingter phosphatüberschleppung in einer prozessfolge zur tauchlackierung |
JP6850604B2 (ja) * | 2016-12-26 | 2021-03-31 | 日本ペイント・サーフケミカルズ株式会社 | 金属表面処理用組成物および金属表面処理方法 |
JP7191078B2 (ja) * | 2017-07-12 | 2022-12-16 | ヒル・アンド・ミユラー・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 界面接触抵抗が低い材料、その使用、及び該材料の製造方法 |
CN107815701B (zh) * | 2017-10-26 | 2019-09-27 | 太原理工大学 | 一种纳米片状氟化铋薄膜的电化学制备方法及其应用 |
JP6779245B2 (ja) * | 2018-02-26 | 2020-11-04 | 株式会社大気社 | 電着塗装設備 |
KR20220115588A (ko) * | 2019-12-12 | 2022-08-17 | 네럼보 인코포레이티드 | 기능화된 텍스타일 재료의 조립체 및 이의 사용 방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1151793A (zh) * | 1994-04-13 | 1997-06-11 | 纽约市哥伦比亚大学信托人 | 用标记编码的复杂组合化学文库 |
CN1510165A (zh) * | 2002-12-24 | 2004-07-07 | �ձ�������ʽ���� | 用于涂覆的预处理方法 |
CN1510166A (zh) * | 2002-12-24 | 2004-07-07 | �ձ�������ʽ���� | 化学转化涂层剂及经表面处理的金属 |
US20090218228A1 (en) * | 2006-03-01 | 2009-09-03 | Nippon Paint Co., Ltd. | Composition for Metal Surface Treatment, Metal Surface Treatment Method And Metal Material |
CN102020907A (zh) * | 2009-09-15 | 2011-04-20 | 关西涂料株式会社 | 阳离子电沉积涂料组合物 |
US20120219735A1 (en) * | 2011-02-27 | 2012-08-30 | The Board Of Trustees Of The University Of Alabama | Methods for preparing and using metal and/or metal oxide porous materials |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3984299A (en) | 1970-06-19 | 1976-10-05 | Ppg Industries, Inc. | Process for electrodepositing cationic compositions |
US4017438A (en) | 1974-12-16 | 1977-04-12 | Ppg Industries, Inc. | Ketimine-blocked primary amine group-containing cationic electrodepositable resins |
JPS5943013A (ja) | 1982-09-03 | 1984-03-09 | Kansai Paint Co Ltd | エポキシ樹脂誘導体及びその製造方法 |
JP3345687B2 (ja) | 1991-12-06 | 2002-11-18 | 日本ペイント株式会社 | オキサゾリドン環含有水性樹脂および塗料 |
JP2879186B2 (ja) * | 1993-04-20 | 1999-04-05 | 日本ペイント株式会社 | エポキシ樹脂系カチオン電着塗料 |
US5380374A (en) * | 1993-10-15 | 1995-01-10 | Circle-Prosco, Inc. | Conversion coatings for metal surfaces |
US6758916B1 (en) * | 1999-10-29 | 2004-07-06 | Henkel Corporation | Composition and process for treating metals |
JP4429474B2 (ja) * | 2000-05-15 | 2010-03-10 | 日本ペイント株式会社 | 金属表面処理方法 |
CA2345929C (en) | 2000-05-15 | 2008-08-26 | Nippon Paint Co., Ltd. | Metal surface-treating method |
CA2379505A1 (en) * | 2001-04-02 | 2002-10-02 | Hidenori Tanaka | Coating composition containing benzoxazine compound |
JP3843250B2 (ja) | 2001-11-22 | 2006-11-08 | 関西ペイント株式会社 | カチオン性塗料組成物 |
EP1371756A2 (en) * | 2002-06-12 | 2003-12-17 | Nissan Motor Co., Ltd. | Equipment and method of pretreatment before painting |
JP4096922B2 (ja) * | 2004-07-13 | 2008-06-04 | 日産自動車株式会社 | 塗装前処理方法及び塗装前処理装置 |
JP5010806B2 (ja) * | 2005-02-01 | 2012-08-29 | 日本ペイント株式会社 | 粉体塗料組成物及びアルミホイールの塗装方法 |
JP2007313420A (ja) | 2006-05-25 | 2007-12-06 | Nippon Paint Co Ltd | カチオン電着塗装方法 |
JP2008037888A (ja) * | 2006-08-01 | 2008-02-21 | Nippon Paint Co Ltd | カチオン電着塗料への消泡剤の添加方法およびそれに用いる添加剤 |
US7749368B2 (en) | 2006-12-13 | 2010-07-06 | Ppg Industries Ohio, Inc. | Methods for coating a metal substrate and related coated substrates |
JP2008202122A (ja) * | 2007-02-22 | 2008-09-04 | Nippon Paint Co Ltd | 硬化電着塗膜形成方法および複層塗膜形成方法 |
JP5721307B2 (ja) * | 2007-10-17 | 2015-05-20 | 関西ペイント株式会社 | 複層皮膜形成方法及び塗装物品 |
JP2010013677A (ja) | 2008-07-01 | 2010-01-21 | Nippon Parkerizing Co Ltd | 金属構造物用化成処理液および表面処理方法 |
JP5637722B2 (ja) * | 2009-04-24 | 2014-12-10 | 関西ペイント株式会社 | カチオン電着塗料組成物 |
US8273190B2 (en) * | 2009-05-29 | 2012-09-25 | Bulk Chemicals, Inc. | Method for making and using chromium III salts |
JP5634145B2 (ja) | 2009-07-31 | 2014-12-03 | 関西ペイント株式会社 | カチオン電着塗料組成物 |
-
2014
- 2014-04-28 JP JP2014092911A patent/JP5657157B1/ja active Active
- 2014-07-30 CN CN201910418428.0A patent/CN110128912B/zh active Active
- 2014-07-30 MX MX2016001230A patent/MX369015B/es active IP Right Grant
- 2014-07-30 US US14/438,992 patent/US10697066B2/en active Active
- 2014-07-30 WO PCT/JP2014/070098 patent/WO2015016273A1/ja active Application Filing
- 2014-07-30 BR BR112016001864A patent/BR112016001864A2/pt not_active Application Discontinuation
- 2014-07-30 CA CA2917213A patent/CA2917213C/en active Active
- 2014-07-30 CN CN201480004672.8A patent/CN104919092A/zh active Pending
- 2014-07-30 EP EP14832983.2A patent/EP3029179B1/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1151793A (zh) * | 1994-04-13 | 1997-06-11 | 纽约市哥伦比亚大学信托人 | 用标记编码的复杂组合化学文库 |
CN1510165A (zh) * | 2002-12-24 | 2004-07-07 | �ձ�������ʽ���� | 用于涂覆的预处理方法 |
CN1510166A (zh) * | 2002-12-24 | 2004-07-07 | �ձ�������ʽ���� | 化学转化涂层剂及经表面处理的金属 |
US20090218228A1 (en) * | 2006-03-01 | 2009-09-03 | Nippon Paint Co., Ltd. | Composition for Metal Surface Treatment, Metal Surface Treatment Method And Metal Material |
CN102020907A (zh) * | 2009-09-15 | 2011-04-20 | 关西涂料株式会社 | 阳离子电沉积涂料组合物 |
US20120219735A1 (en) * | 2011-02-27 | 2012-08-30 | The Board Of Trustees Of The University Of Alabama | Methods for preparing and using metal and/or metal oxide porous materials |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110760916A (zh) * | 2019-11-18 | 2020-02-07 | 和县科嘉阀门铸造有限公司 | 一种提高镁合金阀门耐蚀性的方法 |
CN110760916B (zh) * | 2019-11-18 | 2022-04-05 | 和县科嘉阀门铸造有限公司 | 一种提高镁合金阀门耐蚀性的方法 |
Also Published As
Publication number | Publication date |
---|---|
US20150292103A1 (en) | 2015-10-15 |
JP2015057508A (ja) | 2015-03-26 |
US10697066B2 (en) | 2020-06-30 |
EP3029179A4 (en) | 2017-05-17 |
BR112016001864A2 (pt) | 2017-08-01 |
CN110128912B (zh) | 2021-05-14 |
CA2917213A1 (en) | 2015-02-05 |
MX2016001230A (es) | 2016-05-24 |
EP3029179A1 (en) | 2016-06-08 |
EP3029179B1 (en) | 2019-09-11 |
CA2917213C (en) | 2017-06-27 |
CN104919092A (zh) | 2015-09-16 |
WO2015016273A1 (ja) | 2015-02-05 |
MX369015B (es) | 2019-10-24 |
JP5657157B1 (ja) | 2015-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110128912A (zh) | 形成多层涂膜的方法 | |
CN102020907B (zh) | 阳离子电沉积涂料组合物 | |
CN101987938B (zh) | 阳离子电沉积涂料组合物 | |
CN105802443B (zh) | 阳离子电沉积涂料组合物 | |
CN105452540B (zh) | 多层涂膜形成方法 | |
JP2010261011A (ja) | カチオン電着塗料組成物 | |
EP3071656B1 (de) | Wässrige beschichtungszusammensetzung zur tauchlack-beschichtung elektrisch leitfähiger substrate enthaltend bismut sowohl in gelöst als auch ungelöst vorliegender form | |
WO2015029757A1 (ja) | 複層皮膜形成方法 | |
CN1408802A (zh) | 阳离子树脂组合物 | |
JP6416688B2 (ja) | 複層皮膜形成方法 | |
WO2016167147A1 (ja) | 電着塗料組成物、電着塗料組成物用触媒 | |
JP2012057035A (ja) | カチオン性電着塗料組成物の塗装方法 | |
JP2000234077A (ja) | 電着塗料用樹脂組成物 | |
JPS63259100A (ja) | 電着塗装方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |