CN109940524A - A kind of preparation method of ultrathin workpieces planar support device and movable electrostatic chuck - Google Patents
A kind of preparation method of ultrathin workpieces planar support device and movable electrostatic chuck Download PDFInfo
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- CN109940524A CN109940524A CN201910265405.0A CN201910265405A CN109940524A CN 109940524 A CN109940524 A CN 109940524A CN 201910265405 A CN201910265405 A CN 201910265405A CN 109940524 A CN109940524 A CN 109940524A
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- machine frame
- electrostatic chuck
- main machine
- movable electrostatic
- ultrathin workpieces
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- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000012545 processing Methods 0.000 claims abstract description 14
- 230000009977 dual effect Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 230000002708 enhancing effect Effects 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000004642 Polyimide Substances 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 4
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000004917 carbon fiber Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000011889 copper foil Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 238000007731 hot pressing Methods 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 3
- 229910000838 Al alloy Inorganic materials 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims description 2
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 2
- 230000005611 electricity Effects 0.000 claims 1
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- 238000010521 absorption reaction Methods 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 238000005452 bending Methods 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 4
- 238000003825 pressing Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical group [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- 239000007787 solid Substances 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
Abstract
The present invention relates to the preparation methods of a kind of ultrathin workpieces planar support device and movable electrostatic chuck, including lower main machine frame and upper main machine frame used in conjunction with, Pneumatic power elevator apparatus is equipped with above upper main machine frame, Pneumatic power elevator apparatus is connected with support plate, the gas source controller for being equipped with central processing unit inside lower main machine frame and being connect with central processing unit, dual pressure controller, gas source controller is connected with external air source and the gas source controller is connected with Pneumatic power elevator apparatus, the top of lower main machine frame is provided with groove one, several gas passages are equipped with below groove one, quartz glass is from top to bottom successively arranged in groove one, ultrathin workpieces, movable electrostatic chuck.The present invention can be realized to softness, bending, fold, the plane correction of ventilative ultrathin workpieces and the fixed support function of plane, and can provide and stablize absorption, not injured surface, not residual stains trace.
Description
Technical field
The present invention relates to support device field, it particularly relates to a kind of ultrathin workpieces planar support device and movable
The preparation method of electrostatic chuck.
Background technique
In order to be thinned, be ground in automated manufacturing to softness, bending, fold, ventilative ultrathin workpieces, polished, clearly
It washes, expose, etching, the processing such as plated film, vision-based detection needs in carrying out these automated process to the ultra-thin work processed
Part carries out plane correction and the fixed support of plane, for example is fixed ultrathin workpieces using gluing, mechanical grip, vacuum suction mode
On planar substrates, plane correction and the fixed support of plane are realized.
However, often along with brings such as soda acid, high temperature and vacuum atmospheres in ultrathin workpieces automation process
Potential risk.
According to adhesive means, then need to automate working process knot using adhesives such as acidproof aqueous slkali, high temperature resistants
Beam, easy residual impurity, or increase damage, pollution caused by secondary operation, type change risk.
Using mechanical grip reinforcement, will not only generate clamping dead angle, ultrathin workpieces can not all be contacted with planar substrates, be risen
To plane correction and the effect of the fixed support of plane, and it cannot keep type at high operating temperatures and become fixed function, while will make
Dead angle is clamped at ultrathin workpieces fringe region, efficiently uses the problems such as area reduces and damages.
Using vacuum suction mode, ultrathin workpieces fringe region can not realize effective Contact-sorption with planar substrates, according to
Can so there are edge warping and buckling phenomena；In addition, vacuum suction mode can not realize that absorption is fixed under vacuum atmosphere, absorption
Ultrathin workpieces damage is easily led in the process and residual inhales trace.
For the problems in the relevant technologies, currently no effective solution has been proposed.
Summary of the invention
For above-mentioned technical problem in the related technology, the present invention proposes a kind of ultrathin workpieces planar support device and removable
The preparation method of formula electrostatic chuck can be realized solid to softness, bending, fold, the plane correction of ventilative ultrathin workpieces and plane
Determine support function, and can provide and stablize absorption, not injured surface, not residual stains trace.
To realize the above-mentioned technical purpose, the technical scheme of the present invention is realized as follows:
A kind of ultrathin workpieces planar support device, including lower main machine frame and upper main machine frame used in conjunction with are designed, it is described
Pneumatic power elevator apparatus is equipped with above upper main machine frame, the Pneumatic power elevator apparatus is connected with support plate, and the support plate is located at upper master
In the groove two that mechanism lower part is provided with, equipped with central processing unit and the gas being connect with central processing unit inside the lower main machine frame
Source controller, dual pressure controller, the gas source controller is connected with external air source and the gas source controller and Pneumatic elevation fill
Set connected, the top of the lower main machine frame is provided with groove one, and several gas passages are equipped with below the groove one, and the gas is logical
Road is connected with gas source controller, and quartz glass, ultrathin workpieces, movable electrostatic are from top to bottom successively arranged in the groove one and is inhaled
Disk, the movable electrostatic chuck include lower part enhancing substrate and top flexible contact face, the flexible contact face by
Several electrode groups are constituted, and the electrode group is connected with the HV Terminal of dual pressure controller.
Preferably, the upper main machine frame and lower main machine frame material are aluminium alloy.
Preferably, the contact point of the electrode group and the positive and negative anodes of HV Terminal are separately connected.
Preferably, the dual pressure controller output voltage is high direct voltage.
A kind of preparation method of movable electrostatic chuck, comprising the following steps:
S1: it obtains contacting in movable electrostatic chuck with ultrathin workpieces by polyimides-copper-polyimide manufacturing method
Flexible contact face；
S2: selecting several metals, semiconductor, insulating material, and by adhesive coated, vacuum abutted, vacuum hotpressing is a variety of heavy
Specified thickness is obtained after multiple processing, is fabricated to enhancing substrate；
S3: flexible contact face is formed into movable electrostatic chuck in conjunction with enhancing substrate.
Preferably, the flexible contact face is bipolar structure, and the flexible contact face thickness is 0.1mm ~ 0.3mm.
Preferably, it is described enhancing substrate in metal be copper goldleaf, silver foil, copper foil material it is one or more, semiconductor is
Monocrystalline silicon, grapheme material it is one or more, insulator be polyimides, glass, carbon fiber, PET material one kind or more
Kind.
Preferably, the vacuum atmosphere pressure when enhancing substrate manufacture is within the scope of -0.08 ~ -0.8 Mpa, intracavitary temperature
Degree is within the scope of 200 ~ 280 DEG C, and pressing pressure is within the scope of 3 ~ 8 tons.
Beneficial effects of the present invention:
1, equipment volume is small, low energy consumption, automation fitness is high.
2, plane correction and the fixed support of plane are provided to softness, bending, fold, ventilative ultrathin workpieces.
3, it can be used under vacuum and atmospheric environment.
4, it is detached from power supply and keeps semipermanent absorption, semipermanent absorption can be kept in the solution.
5, acidproof aqueous slkali, high temperature resistant.
6, product surface and semiconductor circuit are not damaged.
7, it does not pollute and disfiguring workpiece.
Detailed description of the invention
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the invention
Example, for those of ordinary skill in the art, without creative efforts, can also obtain according to these attached drawings
Obtain other attached drawings.
Fig. 1 is a kind of ultrathin workpieces planar support apparatus structure schematic diagram described according to embodiments of the present invention.
Fig. 2 is the movable electrostatic chuck top view described according to embodiments of the present invention.
Fig. 3 is the movable electrostatic suction cup structure schematic diagram described according to embodiments of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art's every other embodiment obtained belong to what the present invention protected
Range.
As shown in Figure 1, a kind of ultrathin workpieces planar support device described according to embodiments of the present invention, specifically used
When, movable electrostatic chuck 9, ultrathin workpieces 8, quartz glass 7 are successively mounted in lower 11 setting position of main machine frame, it is movable quiet
14 contact point of electrode group in electric sucker 9 is separately connected with 10 positive and negative anodes of HV Terminal, and it is high to apply direct current by dual pressure controller 3
Pressure.
The gas passage 12 for being equipped with several horizontal perforations on lower main machine frame 11 and linking up up and down, the gas passage 12 and gas
Source controller 1 connects, and gas source controller 1 is connected with the external air source 16 equipped with nitrogen；Pneumatic rise is equipped on upper main machine frame 5
Falling unit 4,4 end of Pneumatic power elevator apparatus are equipped with support plate 6, and Pneumatic power elevator apparatus 4 connects with gas source controller 1.
It is finished wait charge, upper main machine frame 5 is closed with lower main machine frame 11, opens power supply, and central processing unit 2 is instructed according to setting
It opens gas source controller 1 and gas passage 12 keeps vacuum atmosphere, movable electrostatic chuck 9 is adjacent on lower main machine frame 11；Together
When, gas source controller 1 injects air pressure to Pneumatic power elevator apparatus 4, and Pneumatic power elevator apparatus 4 drops to setting together with end support plate 6
Position is contacted with quartz glass 7, and provides pushing retentivity.
The some time is waited, central processing unit 2 provides by HV Terminal 10 to movable electrostatic chuck 9 opposite polarity
High direct voltage.According to known Coulomb's law, movable 9 adsorbed close of electrostatic chuck lives ultrathin workpieces 8.
8 plane correction of ultrathin workpieces and the fixed support of plane terminate, and central processing unit 2 controls 1 He of gas source controller simultaneously
Dual pressure controller 3 and its associated connecting member terminate conveying gas source and voltage.
Quartz glass 7 is taken out, ultrathin workpieces 8 and movable electrostatic chuck 9 can integrally be sent to automating together with lower and be processed
Processing.
Next, illustrating the manufacturing method of movable electrostatic chuck 9.
Electrostatic chuck flexible contact face 13 is obtained with known methods such as polyimides, which is
Bipolar structure or be Coulomb force electrostatic chuck.
According to shown in Fig. 2, by polyimides-copper-polyimide, will obtain in movable 9 surface of electrostatic chuck with it is ultra-thin
The flexible contact face 13 that workpiece 8 contacts, is processed as designated surface roughness, flatness and thickness.
Referring to Fig. 2, in above-mentioned 9 flexible contact face 13 of electrostatic chuck, thickness 0.1mm ~ 0.3mm after press process, like this
Flexible material, no supporting plane cannot keep horizontality.In addition, applying high direct voltage, flexible contact to electrode group 14
Face 13 and ultrathin workpieces 8 generate potential difference, mutually adsorb；The high direct voltage for being applied to electrode group 14 is released, electrode group 14 remains
Charge will discharge rapidly, that is, cannot achieve and continue to keep the adsorbed state to ultrathin workpieces 8 after being detached from power supply.Therefore, make merely
With the electrostatic chuck of 9 form of flexible contact face, semipermanent absorption after being detached from power supply cannot achieve.
Therefore, in the present embodiment, reinforcement compression process, selection several metals appropriate, semiconductor, insulation have been carried out to it
The materials such as body production enhancing substrate 15, thus come enhance the electrostatic field duration of electrostatic chuck 9, surface roughness, flatness,
Thickness and horizontal stiffness.
According to shown in Fig. 3, movable electrostatic chuck 9 is made of flexible contact face 13, enhancing substrate 15.Flexible contact face 13
It is made of several electrode groups 14.
The material that enhancing substrate 15 uses is that metal, semiconductor, one layer of insulator or multilayer are constituted, such as copper goldleaf, silver
The materials such as foil, copper foil it is one or more, the materials such as monocrystalline silicon, graphene are one or more, polyimides, glass, carbon fiber,
The materials such as PET are one or more, obtain by a variety of reprocessings such as adhesive coated, vacuum abutted, vacuum hotpressing specified
Thickness, the conditions such as material, adhesive, compacting sequence, thickness do not meet setting value, will occur be detached from power supply after adsorption capacity decline,
The problems such as deformation, surface flatness deteriorate；Also, the processing preferred vacuum atmosphere pressure of above-mentioned operation is -0.08 ~ -0.8 Mpa model
Interior setting is enclosed, is set within the scope of 200 ~ 280 DEG C of cavity temperature, pressing pressure is to set within the scope of 3 ~ 8 tons.Vacuum atmosphere pressure,
Temperature, pressing pressure are lower than above-mentioned setting value, the problems such as degumming under bubble, vacuum atmosphere, surface flatness deterioration will occur.
The movable electrostatic chuck 9 of suitable material and production technology manufacture is selected by the present embodiment, controller 3 can be to
14 positive and negative anodes of electrode group of movable electrostatic chuck 9 apply voltage, fix ultra-thin work with specified electrostatic adsorption force to adsorb
Part 8, after out-off voltage, movable electrostatic chuck 9 can still adsorb ultrathin workpieces 8 very well, and realize that ultrathin workpieces 8 are automatic
Change the function of the median-plane correction of working process process and the fixed support of plane.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (8)
1. a kind of ultrathin workpieces planar support device, including lower main machine frame (11) and upper main machine frame used in conjunction with (5),
It is characterized in that, being equipped with Pneumatic power elevator apparatus (4) above the upper main machine frame (5), the Pneumatic power elevator apparatus (4) is connected with branch
Fagging (6), the support plate (6) are located in the groove two (501) that upper main machine frame (5) lower part is provided with, the lower main machine frame (11)
Gas source controller (1), the dual pressure controller (3) that inside is equipped with central processing unit (2) and connect with central processing unit (2), institute
State that gas source controller (1) is connected with external air source (16) and the gas source controller (1) is connected with Pneumatic power elevator apparatus (4), institute
The top for stating lower main machine frame (11) is provided with groove one (1101), is equipped with several gas passages below the groove one (1101)
(12), the gas passage (12) is connected with gas source controller (1), is from top to bottom successively arranged stone in the groove one (1101)
English glass (7), ultrathin workpieces (8), movable electrostatic chuck (9), the movable electrostatic chuck (9) include the enhancing base of lower part
The flexible contact face (13) on plate (15) and top, the flexible contact face (13) are made of several electrode groups (14), the electricity
Pole group (14) is connected with the HV Terminal (10) of dual pressure controller (3).
2. a kind of ultrathin workpieces planar support device according to claim 1, which is characterized in that the upper main machine frame (5)
It is aluminium alloy with lower main machine frame (11) material.
3. a kind of ultrathin workpieces planar support device according to claim 1, which is characterized in that the electrode group (14)
The positive and negative anodes of contact point and HV Terminal (10) are separately connected.
4. a kind of ultrathin workpieces planar support device according to claim 1, which is characterized in that the dual pressure controller
(3) output voltage is high direct voltage.
5. a kind of preparation method of movable electrostatic chuck, which comprises the following steps:
S1: by polyimides-copper-polyimide manufacturing method obtain in movable electrostatic chuck (9) with ultrathin workpieces (8)
The flexible contact face (13) of contact；
S2: selecting several metals, semiconductor, insulating material, and by adhesive coated, vacuum abutted, vacuum hotpressing is a variety of heavy
Specified thickness is obtained after multiple processing, is fabricated to enhancing substrate (15)；
S3: flexible contact face (13) and enhancing substrate (15) are combined and form movable electrostatic chuck (9).
6. a kind of preparation method of movable electrostatic chuck according to claim 5, which is characterized in that the flexible contact
Face (13) is bipolar structure, and the flexible contact face (13) is with a thickness of 0.1mm ~ 0.3mm.
7. a kind of preparation method of movable electrostatic chuck according to claim 5, which is characterized in that the enhancing substrate
(15) in metal be copper goldleaf, silver foil, copper foil material it is one or more, semiconductor be monocrystalline silicon, grapheme material one kind
Or it is a variety of, insulator be polyimides, glass, carbon fiber, PET material it is one or more.
8. a kind of preparation method of movable electrostatic chuck according to claim 8, which is characterized in that the enhancing substrate
(15) vacuum atmosphere pressure when making is within the scope of -0.08 ~ -0.8 Mpa, and cavity temperature is within the scope of 200 ~ 280 DEG C, compacting
Pressure is within the scope of 3 ~ 8 tons.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910265405.0A CN109940524B (en) | 2019-04-03 | 2019-04-03 | Ultrathin workpiece plane supporting device and preparation method of movable electrostatic chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910265405.0A CN109940524B (en) | 2019-04-03 | 2019-04-03 | Ultrathin workpiece plane supporting device and preparation method of movable electrostatic chuck |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109940524A true CN109940524A (en) | 2019-06-28 |
| CN109940524B CN109940524B (en) | 2024-09-20 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113957748A (en) * | 2021-10-28 | 2022-01-21 | 山东天和纸业有限公司 | Fiber and fluorescence anti-counterfeiting paper and preparation method thereof |
| CN115976463A (en) * | 2022-12-13 | 2023-04-18 | 苏州思萃热控材料科技有限公司 | Diamond high heat conduction material coating equipment |
| CN117901432A (en) * | 2024-03-19 | 2024-04-19 | 成都骏创科技有限公司 | Electrostatic chuck system capable of monitoring laminating pressure and flatness in real time |
| US20250041963A1 (en) * | 2023-08-03 | 2025-02-06 | Blue Origin, Llc | Friction stir additive manufacturing formed parts and structures with integrated passages |
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| CN209986832U (en) * | 2019-04-03 | 2020-01-24 | 广东海拓创新精密设备科技有限公司 | Ultra-thin workpiece plane supporting device |
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| CN109940524B (en) | 2024-09-20 |
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