CN109809709A - A kind of method of decoating liquid and 2D sapphire glass stripping NCVM - Google Patents
A kind of method of decoating liquid and 2D sapphire glass stripping NCVM Download PDFInfo
- Publication number
- CN109809709A CN109809709A CN201711173806.0A CN201711173806A CN109809709A CN 109809709 A CN109809709 A CN 109809709A CN 201711173806 A CN201711173806 A CN 201711173806A CN 109809709 A CN109809709 A CN 109809709A
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- Prior art keywords
- decoating liquid
- strip
- ncvm
- quality
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000007788 liquid Substances 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000011521 glass Substances 0.000 title claims abstract description 19
- 229910052594 sapphire Inorganic materials 0.000 title claims abstract description 18
- 239000010980 sapphire Substances 0.000 title claims abstract description 18
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims abstract description 19
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims abstract description 17
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims abstract description 14
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000007747 plating Methods 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 6
- 150000003839 salts Chemical class 0.000 abstract description 4
- 230000006378 damage Effects 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008595 infiltration Effects 0.000 description 3
- 238000001764 infiltration Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004945 emulsification Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009990 desizing Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000008233 hard water Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009955 starching Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses a kind of decoating liquids, including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC.In addition to this, the embodiment of the invention also discloses the methods of 2D sapphire glass stripping NCVM a kind of, comprising: step 1, carries out strip to product using decoating liquid as described above；Step 2, the product after strip is cleaned.Stripping plating is carried out to NCVM sample by using the decoating liquid for including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC, since the ammonium fluoride for primarily serving strip effect, the ammonium acid fluoride in decoating liquid are strong acid weak base salt, in acidity, it is able to solve the damage caused by the ink of silk-screen of strong basicity decoating liquid, improves the quality of strip product.
Description
Technical field
The present invention relates to 3D coating technique fields, strip NCVM's more particularly to a kind of decoating liquid and 2D sapphire glass
Method.
Background technique
For electroplating technology as a kind of function finish technology, alloy layer has excellent wearability, corrosion resistance, plating thickness
Uniformity, the features such as consistency is high are spent, is widely applied in electronic product.It is right with the fast development of electronics industry
The requirement of electroplating technology is higher and higher, and new technology, new product, new process emerge one after another.
With the development of the society, 2D sapphire glass has been applied on electronic product, and becomes a kind of fashion, and
A kind of symbol of identity, 2D sapphire glass have the advantages that frivolous, transparent cleaning, acid and alkali-resistance, scratch resistant, weatherability.Product exists
The problem of will cause this or that in cleaning, electroplating process, such as: it is dirty, heterochromatic etc. bad, in order to improve the production efficiency, drop
Low production cost, spy do over again to these defective products, need to strip electroplated layer, be electroplated again.Existing decoating liquid is in highly basic
Property, during strip, the ink after silk-screen can be damaged.
NCVM is also known as discontinuous coating technique or non-conductive electroplating technology, is the high-new skill of a kind of edge conventional vacuum plating
Art refers to metal material under vacuum conditions, carries out organic conversion with limited means such as chemistry, physics, is converted into metal
Particle, the surface for depositing or being adsorbed on plastic material form film, become plated film.The non-conductive plating of vacuum, also known as NCVM are English
The abbreviation of Non conductive vacuum metalization.Its processing technology is electroplated higher than conventional vacuum, processing
Processing procedure is more more complex than common processing procedure.
Summary of the invention
The object of the present invention is to provide a kind of methods of decoating liquid and 2D sapphire glass stripping NCVM, and structure is simple, behaviour
Facilitate, can effectively solve existing 3D glass film fitting low efficiency, it is at high cost, the practicability is poor the problems such as.
In order to solve the above technical problems, the embodiment of the invention provides a kind of decoating liquid, including ammonium fluoride, ammonium acid fluoride,
DETA disodium and JFC.
Wherein, the quality of the ammonium fluoride is the 45%~65% of the quality of the decoating liquid.
Wherein, the quality of the ammonium acid fluoride is the 3%~8% of the quality of the decoating liquid.
Wherein, the quality of the DETA disodium is the 1%~3% of the quality of the decoating liquid.
Wherein, the quality of the JFC is the 0.5%~5% of the quality of the decoating liquid.
In addition to this, the embodiment of the invention also provides the methods of 2D sapphire glass stripping NCVM a kind of, comprising:
Step 1, strip is carried out to product using decoating liquid as described above；
Step 2, the product after strip is cleaned.
Wherein, the step 1 includes:
The decoating liquid is used to carry out the time of strip to product as 10min~20min.
The method of decoating liquid and 2D sapphire glass stripping NCVM provided in an embodiment of the present invention, compared with prior art,
It has the advantage that
The method that the embodiment of the present invention provides decoating liquid and 2D sapphire glass stripping NCVM, by using including fluorination
Ammonium, ammonium acid fluoride, DETA disodium and JFC decoating liquid stripping plating is carried out to NCVM sample, since main in decoating liquid rises
Ammonium fluoride, the ammonium acid fluoride acted on to strip is strong acid weak base salt, is in acidity, is able to solve strong basicity decoating liquid to the oil of silk-screen
It is damaged caused by ink, improves the quality of strip product.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is the present invention
Some embodiments for those of ordinary skill in the art without creative efforts, can also basis
These attached drawings obtain other attached drawings.
Fig. 1 is a kind of specific embodiment for the method that 2D sapphire glass provided in an embodiment of the present invention strips NCVM
Steps flow chart schematic diagram.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Referring to FIG. 1, Fig. 1 is a kind of specific of the method that 2D sapphire glass provided in an embodiment of the present invention strips NCVM
The step flow diagram of embodiment.
In a specific embodiment, the decoating liquid, including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC.
In decoating liquid of the invention, ammonium fluoride is to play main strip to be used as main ingredient, and ammonium acid fluoride is that auxiliary is used
In the strip effect for reinforcing ammonium fluoride, DETA disodium be used to be complexed display for carrying out strip process and JFC for oil removing with
Infiltration, removes the dirt of object surface.In the present invention other than above-mentioned material, remaining is deionized water.
Due to ammonium fluoride be strip also in main strip ingredient, content highest, the quality of the ammonium fluoride is generally institute
State the 45%~65% of the quality of decoating liquid.
The effect of ammonium acid fluoride is the toxic action that moves back for further strengthening ammonium fluoride, i.e., as the auxiliary for reinforcing main strip agent
Agent, the quality of the ammonium acid fluoride are generally the 3%~8% of the quality of the decoating liquid.
DETA disodium plays the role of indicator, the quality of the DETA disodium is the decoating liquid for generating complexing
Quality 1%~3%.
JFC acid and alkali-resistance, resistance to hard water, it is water-soluble good, with efficient infiltration, wettability, while also there is emulsification, divide
Scattered and washing performance, makees bleeding agent in textile and dyeing industry, can be used for starching, desizing, scouring and bleaching, wool charing, is suitable for tree
Rouge finishing auxiliaries；Make bleeding agent, degreasing agent in leather industry；Greasy dirt is set to be easy to be detached from metal as wetting agent in metal detergent
Surface, and have certain emulsification washing effect concurrently, need to play the role of oil removing and infiltration, the matter of the JFC in the present invention
Amount is generally the 0.5%~5% of the quality of the decoating liquid, and user can carry out suitable increasing according to the fact damaged situation of product
Subtract dosage.
In one embodiment of the invention, the decoating liquid includes the ammonium fluoride of 50% mass, 5% mass fluorination
Hydrogen ammonium, the DETA disodium of 1% mass, 1% mass JFC and deionized water.
In addition to this, the embodiment of the invention also provides the methods of 2D sapphire glass stripping NCVM a kind of, comprising:
Step 1, strip is carried out to product using decoating liquid as described above；
Step 2, the product after strip is cleaned.
Stripping electricity is carried out to NCVM sample by using the decoating liquid for including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC
Plating is in acidity, can solve since the ammonium fluoride for primarily serving strip effect, the ammonium acid fluoride in decoating liquid are strong acid weak base salt
Certainly strong basicity decoating liquid is damaged caused by the ink of silk-screen, improves the quality of strip product.
The present invention is not construed as limiting the strip time of decoating liquid, and the general step 1 includes:
The decoating liquid is used to carry out the time of strip to product as 10min~20min.
It is pointed out that the present invention without limitation, can be for specific cleaning process and also spray use strip
The method of product is cleaned, and is also possible to using product to be placed on to progress strip processing in above-mentioned decoating liquid, either
Other modes carry out the strip present invention without limitation, without limitation to strip temperature, use room temperature strip.
The purpose of the strip of decoating liquid in the present invention and is generally also will do it after strip to remove coating
The plated film again of product can generally clean it before plated film again, in one embodiment of the invention, the step
Rapid 2 include:
The product after strip is cleaned using alkaline cleaner.
The alkaline cleaner used in the present invention will not ink for screen printing generate destruction, the ink for screen printing be alkali resistance oil
Ink does not influence its performance within 10min in 60 DEG C~70 DEG C of temperature environment using the alkali of low concentration.
Due to only being cleaned to product, rather than strip, therefore product will not be caused to damage, the present invention is for tool
The alkaline cleaner of body is without limitation.
The plated film of strip that the method for 2D sapphire glass stripping NCVM in the present invention is mainly applicable in be niobium pentaoxide,
Titanium oxide, silica, indium oxide.
After the mode stated in use completes strip and cleaning, need to carry out appearance test, if it find that not damaging
It is bad, the plated film again of next step can be carried out.
In conclusion the method that the embodiment of the present invention provides decoating liquid and 2D sapphire glass stripping NCVM, by using
Decoating liquid including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC carries out stripping plating to NCVM sample, due in decoating liquid
Primarily serve strip effect ammonium fluoride, ammonium acid fluoride be strong acid weak base salt, in acidity, be able to solve strong basicity decoating liquid pair
It is damaged caused by the ink of silk-screen, improves the quality of strip product.
The method of decoating liquid provided by the present invention and 2D sapphire glass stripping NCVM is described in detail above.
Used herein a specific example illustrates the principle and implementation of the invention, and the explanation of above embodiments is only used
In facilitating the understanding of the method and its core concept of the invention.It should be pointed out that for those skilled in the art,
Without departing from the principle of the present invention, can be with several improvements and modifications are made to the present invention, these improvement and modification
It falls into the protection scope of the claims in the present invention.
Claims (7)
1. a kind of decoating liquid, which is characterized in that including ammonium fluoride, ammonium acid fluoride, DETA disodium and JFC.
2. decoating liquid as described in claim 1, which is characterized in that the quality of the ammonium fluoride is the quality of the decoating liquid
45%~65%.
3. decoating liquid as claimed in claim 2, which is characterized in that the quality of the ammonium acid fluoride is the quality of the decoating liquid
3%~8%.
4. decoating liquid as claimed in claim 3, which is characterized in that the quality of the DETA disodium is the quality of the decoating liquid
1%~3%.
5. decoating liquid as claimed in claim 4, which is characterized in that the quality of the JFC is the 0.5% of the quality of the decoating liquid
~5%.
6. a kind of method of 2D sapphire glass stripping NCVM characterized by comprising
Step 1, strip is carried out to product using the decoating liquid as described in claim 1-5 any one；
Step 2, the product after strip is cleaned.
7. the method for 2D sapphire glass as claimed in claim 6 stripping NCVM, which is characterized in that the step 1 includes:
The decoating liquid is used to carry out the time of strip to product as 10min~20min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711173806.0A CN109809709B (en) | 2017-11-22 | 2017-11-22 | Deplating liquid and method for removing NCVM (non-volatile memory) from 2D sapphire glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711173806.0A CN109809709B (en) | 2017-11-22 | 2017-11-22 | Deplating liquid and method for removing NCVM (non-volatile memory) from 2D sapphire glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109809709A true CN109809709A (en) | 2019-05-28 |
| CN109809709B CN109809709B (en) | 2021-11-23 |
Family
ID=66601143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711173806.0A Active CN109809709B (en) | 2017-11-22 | 2017-11-22 | Deplating liquid and method for removing NCVM (non-volatile memory) from 2D sapphire glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109809709B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060063688A1 (en) * | 2004-09-17 | 2006-03-23 | Shigeru Yokoi | Photoresist stripping solution and method of treating substrate with the same |
| EP2196858A1 (en) * | 2008-12-11 | 2010-06-16 | Shin-Etsu Chemical Co., Ltd. | Coated-type silicon-containing film stripping process |
| CN102234513A (en) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | Stripping solution for titanium-containing film and using method for stripping solution |
| CN103625141A (en) * | 2013-11-20 | 2014-03-12 | 捷荣模具工业(东莞)有限公司 | Processing method for achieving metallic feeling of integrated cell phone outer shell |
| CN104529531A (en) * | 2015-01-21 | 2015-04-22 | 浙江星星瑞金科技股份有限公司 | Method for deplating sapphire plated layer by using waste polishing solution |
| CN105002564A (en) * | 2015-08-05 | 2015-10-28 | 深圳市海风润滑技术有限公司 | Environment-friendly sapphire film deplating solution and using method thereof |
-
2017
- 2017-11-22 CN CN201711173806.0A patent/CN109809709B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060063688A1 (en) * | 2004-09-17 | 2006-03-23 | Shigeru Yokoi | Photoresist stripping solution and method of treating substrate with the same |
| EP2196858A1 (en) * | 2008-12-11 | 2010-06-16 | Shin-Etsu Chemical Co., Ltd. | Coated-type silicon-containing film stripping process |
| CN102234513A (en) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | Stripping solution for titanium-containing film and using method for stripping solution |
| CN103625141A (en) * | 2013-11-20 | 2014-03-12 | 捷荣模具工业(东莞)有限公司 | Processing method for achieving metallic feeling of integrated cell phone outer shell |
| CN104529531A (en) * | 2015-01-21 | 2015-04-22 | 浙江星星瑞金科技股份有限公司 | Method for deplating sapphire plated layer by using waste polishing solution |
| CN105002564A (en) * | 2015-08-05 | 2015-10-28 | 深圳市海风润滑技术有限公司 | Environment-friendly sapphire film deplating solution and using method thereof |
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| Publication number | Publication date |
|---|---|
| CN109809709B (en) | 2021-11-23 |
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