CN109696794A - A kind of production method of the ultrashort anti-light structure of coke - Google Patents
A kind of production method of the ultrashort anti-light structure of coke Download PDFInfo
- Publication number
- CN109696794A CN109696794A CN201811531764.8A CN201811531764A CN109696794A CN 109696794 A CN109696794 A CN 109696794A CN 201811531764 A CN201811531764 A CN 201811531764A CN 109696794 A CN109696794 A CN 109696794A
- Authority
- CN
- China
- Prior art keywords
- light
- reflecting layer
- ultrashort
- production method
- light structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000571 coke Substances 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 37
- 239000007769 metal material Substances 0.000 claims abstract description 32
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 8
- 230000008021 deposition Effects 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 3
- 239000003292 glue Substances 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 230000007547 defect Effects 0.000 abstract description 8
- 238000009826 distribution Methods 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical group CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009747 press moulding Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The present invention relates to short focus projection arts, provide a kind of production method of ultrashort anti-light structure of coke, including the uniform deposition metal material formation reflecting layer on the surface for the optical microstructures that substrate upper mold extrudes；The uniform fold photoresist on reflecting layer；Selection area is exposed；The photoresist that development removal is exposed, exposes the reflecting layer in the region；The metal material on the reflecting layer of exposing is etched away, anti-light side is formed；Remaining photoresist is removed, exposes reflecting layer, obtains the anti-light structure.Whereby, the present invention is by the uniform deposition metal material on optical microstructures, then covers photoresist on the metal material；The photoresist in selection area is exposed later, is developed, then gets rid of the metal material of exposing, forms anti-light side；It finally removes remaining photoresist and forms reflecting layer.The reflection layer structure for obtaining specific distribution avoids the defect of the prior art, has obtained the anti-light structure of high-quality.
Description
Technical field
The present invention relates to short focus projection arts, more particularly to a kind of production method of the ultrashort anti-light structure of coke.
Background technique
Currently, ultrashort coke front projection curtain has been widely used as the screen of home theater.Similar to the structure in Fig. 1, to reduce ring
Influence of the border light to using effect, the side usually on optical effects face towards projector direction is reflecting layer 3, and the other side is anti-
Light side 21, for absorbing environment light, to realize anti-light purpose.
Currently, the method for making the structure are as follows: first make one layer of optical microstructures 2 using press moulding mode on substrate 1；So
One layer of metal material is covered in the presumptive area of micro-structure again afterwards and forms reflecting layer 3, and the other side does not cover to form anti-light side 21.
Currently, covering metal material method is the modes such as printing, spraying or vapor deposition.But the existing equal existing defects of method, such as needing
It makes 3 side of reflecting layer and metal material covering occurs not exclusively, cause part projected light to be absorbed across micro-structure, lead to light
It can utilization rate reduction；Or metal material has been gone up in the anti-light covering of side 21, causes component environment light to be reflected into front of screen, to reduce
Color saturation and black white contrast.Therefore, the reflecting layer 3 of specific distribution can not be obtained using the prior art, therefore also
The anti-light structure of high-quality can not be made.
In summary, the existing technology has inconveniences and defects in actual use, so it is necessary to be improved.
Summary of the invention
For above-mentioned defect, the purpose of the present invention is to provide a kind of production methods of ultrashort anti-light structure of coke, pass through
The uniform deposition metal material on optical microstructures, then photoresist is covered on the metal material；Later in selection area
Photoresist is exposed, develops, then gets rid of the metal material of exposing, forms anti-light side；Finally remove remaining photoresist material
Material forms reflecting layer.The reflection layer structure for obtaining specific distribution by means of the present invention avoids the defect of the prior art,
The anti-light structure of high-quality is obtained.
To achieve the goals above, the present invention provides a kind of production method of ultrashort anti-light structure of coke, includes the following steps:
The first step, uniform deposition metal material forms reflecting layer on the surface for the optical microstructures that substrate upper mold extrudes；
Second step, the uniform fold photoresist on reflecting layer；
Third step is exposed selection area using irradiation light；
4th step, development remove the photoresist being exposed in selection area, expose the reflecting layer in the region；
5th step etches away the metal material on the reflecting layer of exposing, forms anti-light side；
6th step removes remaining photoresist, exposes reflecting layer, obtains the anti-light structure.
The production method of the ultrashort anti-light structure of coke according to the present invention, the method for deposited metal material is in the first step
Vapor deposition, magnetron sputtering or chemical plating.
The thickness of the production method of the ultrashort anti-light structure of coke according to the present invention, the reflecting layer is not more than 5 μm.
The production method of the ultrashort anti-light structure of coke according to the present invention, the reflecting layer with a thickness of 0.1-5 μm.
The production method of the ultrashort anti-light structure of coke according to the present invention, the metal material are silver, aluminium or nickel.
The production method of the ultrashort anti-light structure of coke according to the present invention selects irradiation light using mask plate in the third step
The transmission of selecting property is simultaneously irradiated to selection area.
The production method of the ultrashort anti-light structure of coke according to the present invention, the mask plate are equipped with the transparent area intersected and shading
Area, irradiation light expose selection area according to lower from transparent area.
The production method of the ultrashort anti-light structure of coke according to the present invention, the photoresist and irradiation light be respectively UV glue and
Ultraviolet light.
According to the ultrashort anti-light structure of coke made from the production method of the ultrashort anti-light structure of coke of invention.
A kind of production method of the ultrashort anti-light structure of coke that the present invention passed through be designed to provide, by optical microstructures
Upper uniform deposition metal material, then photoresist is covered on the metal material；The photoresist in selection area is carried out later
Exposure, development, then the metal material of exposing is got rid of, form anti-light side；It finally removes remaining photoresist and forms reflecting layer.
The reflection layer structure for obtaining specific distribution by means of the present invention avoids the defect of the prior art, has obtained high-quality
Anti-light structure.
Detailed description of the invention
Fig. 1 is the schematic diagram of the anti-light structure of the present invention；
Fig. 2 is the production method procedure chart of the anti-light structure of the present invention；
1- substrate in the figure, 2- optical microstructures, the anti-light side 21-；The reflecting layer 3-, 4- photoresist, 41- irradiation light；5-
Mask plate.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.
Referring to Fig. 1, the present invention provides a kind of ultrashort anti-light structures of coke, including substrate 1 and the light being molded out in substrate 1
Learn micro-structure 2；Presumptive area covering metal material on optical microstructures 2 forms reflecting layer 3, other regions form anti-light side
21；
Referring to fig. 2, the present invention also provides a kind of production method of ultrashort anti-light structure of coke, include the following steps:
The first step, uniform deposition metal material forms reflecting layer 3 on the surface for the optical microstructures 2 that substrate 1 is molded out；
The method of deposited metal material can be using coating process such as vapor deposition, magnetron sputtering or chemical platings.
Metal material can be silver, aluminium or nickel, and the thickness in the reflecting layer 3 of formation is not more than 5 μm, the preferred 0.1-5 μ of the present invention
m。
Second step, the uniform fold photoresist 4 on reflecting layer 3；
Third step is exposed selection area using irradiation light 41；
Make the transmission of the selectivity of irradiation light 41 present invention preferably uses mask plate 5 and is irradiated to selection area；Mask plate 5 is set
There are transparent area and the shading region of intersection, irradiation light 41 exposes selection area according to lower from transparent area, and unselected region is in shading
Under area, therefore without exposure.
Photoresist 4 and irradiation light 41 distinguish preferred UV glue and ultraviolet light.Selection area as forms anti-light structure in the future
In anti-light side 21.Photoresist 4 preferably using positive photoresist, can also select negative sense photoresist.
4th step, development remove the photoresist 4 being exposed in selection area, expose the reflecting layer 3 in the region；
Developer solution cleaning can be used, the photoresist 4 being exposed in selection area is cleaned out, and leaks out beneath reflection
Layer 3, the reflecting layer 3 in other regions is still covered by photoresist 4.
5th step etches away the metal material on the reflecting layer 3 of exposing, forms anti-light side 21；
Corrosive liquid can be used and eat away metal material on the reflecting layer 3 of exposing.Other region reflecting layer 3 in photoresist
Retained under the protection of material 4.
6th step removes remaining photoresist 4, exposes reflecting layer 3, obtains the anti-light structure.Use photoresist stripper
Remaining photoresist 4 is removed, the main component of photoresist stripper is n-butyl acetate.
The reflection layer structure for obtaining specific distribution by means of the present invention avoids the defect of the prior art, obtains
The anti-light structure of high-quality is that the anti-light curtain of further production high-quality lays the foundation.
In conclusion the present invention is covered by the uniform deposition metal material on optical microstructures, then on the metal material
Photoresist；The photoresist in selection area is exposed later, is developed, then gets rid of the metal material of exposing, is formed
Anti-light side；It finally removes remaining photoresist and forms reflecting layer.The reflection of specific distribution is obtained by means of the present invention
Layer structure, avoids the defect of the prior art, and the anti-light structure for having obtained high-quality is the anti-light curtain of further production high-quality
It lays the foundation.
Certainly, the present invention can also have other various embodiments, without deviating from the spirit and substance of the present invention, ripe
It knows those skilled in the art and makes various corresponding changes and modifications, but these corresponding changes and change in accordance with the present invention
Shape all should fall within the scope of protection of the appended claims of the present invention.
Claims (9)
1. a kind of production method of the ultrashort anti-light structure of coke, which comprises the steps of:
The first step, uniform deposition metal material forms reflecting layer on the surface for the optical microstructures that substrate upper mold extrudes；
Second step, the uniform fold photoresist on reflecting layer；
Third step is exposed selection area using irradiation light；
4th step, development remove the photoresist being exposed in selection area, expose the reflecting layer in the region；
5th step etches away the metal material on the reflecting layer of exposing, forms anti-light side；
6th step removes remaining photoresist, exposes reflecting layer, obtains the anti-light structure.
2. the production method of the ultrashort anti-light structure of coke according to claim 1, which is characterized in that deposited in the first step
The method of metal material is vapor deposition, magnetron sputtering or chemical plating.
3. the production method of the ultrashort anti-light structure of coke according to claim 1, which is characterized in that the thickness in the reflecting layer
No more than 5 μm.
4. the production method of the ultrashort anti-light structure of coke according to claim 3, which is characterized in that the thickness in the reflecting layer
It is 0.1-5 μm.
5. the production method of the ultrashort anti-light structure of coke according to claim 1, which is characterized in that the metal material is
Silver, aluminium or nickel.
6. the production method of the ultrashort anti-light structure of coke described in any one according to claim 1~5, which is characterized in that described
Make the transmission of irradiation light selectivity using mask plate in third step and is irradiated to selection area.
7. the production method of the ultrashort anti-light structure of coke according to claim 6, which is characterized in that the mask plate, which is equipped with, to be handed over
The transparent area of fork and shading region, irradiation light expose selection area according to lower from transparent area.
8. the production method of the ultrashort anti-light structure of coke according to claim 7, which is characterized in that the photoresist and photograph
Penetrating light is respectively UV glue and ultraviolet light.
9. the ultrashort anti-light structure of coke made from the production method of the ultrashort anti-light structure of coke according to claim 7 or 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811531764.8A CN109696794B (en) | 2018-12-14 | 2018-12-14 | Manufacturing method of ultra-short-focus light-resistant structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811531764.8A CN109696794B (en) | 2018-12-14 | 2018-12-14 | Manufacturing method of ultra-short-focus light-resistant structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109696794A true CN109696794A (en) | 2019-04-30 |
| CN109696794B CN109696794B (en) | 2021-04-13 |
Family
ID=66231653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811531764.8A Active CN109696794B (en) | 2018-12-14 | 2018-12-14 | Manufacturing method of ultra-short-focus light-resistant structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109696794B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112433440A (en) * | 2020-11-11 | 2021-03-02 | 成都菲斯特科技有限公司 | Method for manufacturing optical projection screen |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1906503A (en) * | 2003-12-23 | 2007-01-31 | Lg电子株式会社 | Aspherical microlens arrays and fabrication method thereof and applications using the same |
| WO2008027412A2 (en) * | 2006-08-31 | 2008-03-06 | Micron Technology, Inc. | Method and apparatus to improve filter characteristics of optical filters |
| CN102436150A (en) * | 2011-12-15 | 2012-05-02 | 深圳市华星光电技术有限公司 | Exposure apparatus and exposure method |
| CN105676589A (en) * | 2016-03-25 | 2016-06-15 | 南京京晶光电科技有限公司 | Method for processing compact disc (CD) stripe on substrate surface by applying etching process |
| CN108822325A (en) * | 2018-06-05 | 2018-11-16 | 张家港宝视特影视器材有限公司 | A kind of projection screen and preparation method thereof |
-
2018
- 2018-12-14 CN CN201811531764.8A patent/CN109696794B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1906503A (en) * | 2003-12-23 | 2007-01-31 | Lg电子株式会社 | Aspherical microlens arrays and fabrication method thereof and applications using the same |
| WO2008027412A2 (en) * | 2006-08-31 | 2008-03-06 | Micron Technology, Inc. | Method and apparatus to improve filter characteristics of optical filters |
| CN102436150A (en) * | 2011-12-15 | 2012-05-02 | 深圳市华星光电技术有限公司 | Exposure apparatus and exposure method |
| CN105676589A (en) * | 2016-03-25 | 2016-06-15 | 南京京晶光电科技有限公司 | Method for processing compact disc (CD) stripe on substrate surface by applying etching process |
| CN108822325A (en) * | 2018-06-05 | 2018-11-16 | 张家港宝视特影视器材有限公司 | A kind of projection screen and preparation method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112433440A (en) * | 2020-11-11 | 2021-03-02 | 成都菲斯特科技有限公司 | Method for manufacturing optical projection screen |
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| Publication number | Publication date |
|---|---|
| CN109696794B (en) | 2021-04-13 |
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Effective date of registration: 20220302 Address after: 423000 Room 101, building 7, industrial park, Chenzhou strategic information zone, east of Linyi Avenue, high tech Industrial Park, Chenzhou City, Hunan Province Patentee after: Hunan Diyuan Optical Technology Co.,Ltd. Address before: 264000 No. 36, No. three road, Yantai high tech Zone, Shandong Patentee before: YANTAI DIYUAN OPTICAL TECHNOLOGY Co.,Ltd. |
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