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CN109557770B - Drawing device and drawing method - Google Patents

Drawing device and drawing method Download PDF

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Publication number
CN109557770B
CN109557770B CN201811004752.XA CN201811004752A CN109557770B CN 109557770 B CN109557770 B CN 109557770B CN 201811004752 A CN201811004752 A CN 201811004752A CN 109557770 B CN109557770 B CN 109557770B
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China
Prior art keywords
time
band
divided
drawing data
substrate
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CN201811004752.XA
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Chinese (zh)
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CN109557770A (en
Inventor
古仲裕
永井妥由
山本强志
八坂智
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Screen Holdings Co Ltd
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Screen Holdings Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706835—Metrology information management or control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706845—Calibration, e.g. tool-to-tool calibration, beam alignment, spot position or focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A drawing apparatus and a drawing method. The drawing data generation unit sequentially generates a plurality of pieces of divided drawing data corresponding to a plurality of divided regions obtained by dividing one band region on the substrate in the moving direction, based on the entire pattern data, and transmits the plurality of pieces of divided drawing data to the drawing control unit. The drawing control unit controls the drawing head in parallel with the continuous movement of the stage in the moving direction, thereby drawing a pattern on the tape region. When the band drawing time is longer than the band drawing data preparation time, the delay time from the start of the generation of the plurality of divided drawing data to the start of the drawing of the first divided area is a time required for the generation and transmission of the divided drawing data corresponding to the first divided area. When the band drawing time is equal to or less than the band drawing data preparation time, the delay time is a time at which a drawing start time at which drawing of the last divided area is started becomes a completion time of generation/transfer of the plurality of divided drawing data. The yield of the drawing apparatus can be improved.

Description

Drawing device and drawing method
Technical Field
The present invention relates to a drawing apparatus and a drawing method.
Background
Conventionally, a drawing apparatus has been used for drawing a pattern on a photosensitive material on a substrate without using a mask. In a computer for generating drawing data, drawing data is generated from design data generated using CAD/CAM, and the drawing data is transferred to an apparatus main body to draw a pattern based on the drawing data. Further, the following operations are also performed: an alignment mark of a substrate to be processed is photographed to acquire deformation of the substrate, and a pattern is corrected in accordance with the deformation of the substrate to generate drawing data.
In one example of the drawing apparatus, a stage is continuously moved in a moving direction with respect to a drawing head, thereby drawing a pattern on a band region (also referred to as a stripe) on a substrate extending in the moving direction. In such a drawing apparatus, for example, a continuous movement of the stage in the moving direction and an intermittent movement of the stage in the width direction perpendicular to the moving direction are repeated to sequentially draw a pattern on a plurality of belt regions arranged in the width direction.
Further, japanese patent application laid-open No. 2015-130029 discloses a print data processing apparatus that calculates the size of a job (the number of sheets per job) as a unit of execution of processing based on the predicted data size per sheet after RIP processing and the capacity of a RAM that stores the data after RIP processing. This prevents the data transferred to the output mechanism from being lost and printing from being stopped.
In a drawing apparatus in which a plurality of band regions are set on a substrate, when drawing data is generated by correcting a pattern in accordance with the deformation of the substrate, an alignment mark of the substrate is photographed, and after drawing data for the entire one band region is generated based on a photographed image and transferred to an apparatus main body, pattern drawing of the band region is started by a drawing head. In other words, the time required for generation and transfer of the drawing data for the entire band region is a waiting time from the start of generation of the drawing data (completion of acquisition of a captured image) to the start of pattern drawing by the drawing head. In the drawing apparatus, since many substrates are processed in sequence, it is desired to shorten the waiting time and improve the throughput (the number of substrates that can be processed per unit time).
Disclosure of Invention
The invention aims to improve the yield of a drawing device for drawing a pattern on a substrate.
The drawing device of the present invention includes: an object stage for holding a substrate; a scanning head for irradiating the modulated light to the substrate on the stage; a moving mechanism that continuously moves the stage in a moving direction with respect to the scanning head; a drawing control unit that divides a drawing-possible region in the substrate on the stage in a width direction perpendicular to the moving direction to set a plurality of band regions extending in the moving direction, and controls the drawing head in parallel with continuous relative movement of the stage in the moving direction to draw a pattern for one band region; an entire pattern data storage unit that stores entire pattern data indicating an entire pattern to be drawn in the drawing-enabled area; a drawing data generation unit configured to sequentially generate a plurality of pieces of divided drawing data corresponding to the plurality of divided regions in the moving direction based on the entire pattern data for a plurality of divided regions obtained by dividing the tape region of the substrate to be processed in the moving direction after the substrate to be processed is held on the stage, and to transfer the plurality of pieces of divided drawing data to the drawing control unit; and a delay time determination unit configured to determine a delay time from start of generation of the plurality of divided drawing data to start of drawing of a first divided area in the band area based on a band drawing time required for drawing the band area and a band drawing data preparation time required for generation and transmission of the plurality of divided drawing data, wherein when the band drawing time is longer than the band drawing data preparation time, the delay time is equal to or longer than a time required for generation and transmission of divided drawing data corresponding to the first divided area and equal to or shorter than a time obtained by adding a predetermined additional time to the time, and when the band drawing time is equal to or shorter than the band drawing data preparation time, the delay time is such that a drawing start time at which drawing of a last divided area in the band area is started becomes a completion of generation and transmission of the plurality of divided drawing data The time is not less than the time of the time, and not more than the time obtained by adding a predetermined additional time to the time.
According to the present invention, the throughput of the drawing apparatus can be improved.
In a preferred embodiment of the present invention, the plurality of divided regions are obtained by equally dividing the band region in the moving direction, and when the band drawing time is equal to or less than the band drawing data preparation time, the number of the plurality of divided regions in the band region is n, and the delay time is equal to or more than a time obtained by subtracting a value obtained by multiplying the band drawing time by ((n-1)/n) from the band drawing data preparation time and equal to or less than a time obtained by adding the additional time to the time.
In another preferred embodiment of the present invention, the drawing device further includes an imaging unit that images an alignment mark formed on a substrate on the stage to obtain an imaged image, the imaging unit obtains the imaged image of the substrate to be processed, and the drawing data generation unit corrects a pattern based on a position of the alignment mark indicated by the imaged image and generates the plurality of pieces of divided drawing data.
In another preferred embodiment of the present invention, the drawing apparatus includes a plurality of drawing heads including the drawing head, the plurality of drawing heads draw patterns of different band regions, the drawing data generation unit generates the plurality of divided drawing data for each of the plurality of drawing heads, and the delay time determination unit determines the delay time by using a longest band drawing data preparation time among a plurality of band drawing data preparation times for the plurality of drawing heads.
In one embodiment of the present invention, the entire pattern data is run-length data, and the band drawing data preparation time is acquired based on the number of change points included in a portion representing the band region in the entire pattern data.
In another embodiment of the present invention, in processing of another substrate on which the same pattern as the substrate to be processed is formed, a time required for generation and transfer of the plurality of pieces of divisional drawing data is acquired and used as the tape drawing data preparation time for the substrate to be processed.
The present invention is also directed to a drawing method in a drawing apparatus. In the drawing method of the present invention, the drawing apparatus includes: an object stage for holding a substrate; a scanning head for irradiating the modulated light to the substrate on the stage; a moving mechanism that continuously moves the stage in a moving direction with respect to the scanning head; and a drawing control unit that divides a drawing-possible region in the substrate on the stage in a width direction perpendicular to the moving direction to set a plurality of band regions extending in the moving direction, respectively, and controls the drawing head in parallel with continuous relative movement of the stage in the moving direction to draw a pattern for one band region, the drawing method including: a) preparing overall pattern data representing an overall pattern to be drawn in the drawing-enabled area; b) a step of holding a substrate to be processed on the stage; c) a step of sequentially generating, for a plurality of divided regions obtained by dividing the tape region of the substrate to be processed in the moving direction, a plurality of pieces of divided drawing data corresponding to the plurality of divided regions, respectively, from the entire pattern data, and transferring the plurality of pieces of divided drawing data to the drawing control unit; d) determining a delay time from the start of the generation of the plurality of divided drawing data to the start of the drawing of the first divided area of the band areas, based on a band drawing time required for drawing the band areas and a band drawing data preparation time required for the generation and transmission of the plurality of divided drawing data; and e) a step of drawing a pattern on the band region of the substrate to be processed based on the plurality of divided drawing data, wherein when the band drawing time is longer than the band drawing data preparation time, the delay time is equal to or longer than a time required for generation and transmission of the divided drawing data corresponding to the first divided region and equal to or shorter than a time obtained by adding a predetermined additional time to the time, and when the band drawing time is equal to or shorter than the band drawing data preparation time, the delay time is equal to or longer than a time at which a drawing start time to start drawing of the last divided region in the band region is equal to or longer than a completion time of generation and transmission of the plurality of divided drawing data and equal to or shorter than a time obtained by adding a predetermined additional time to the time.
The above and other objects, features, embodiments and advantages will become apparent from the following detailed description of the invention with reference to the accompanying drawings.
Drawings
Fig. 1 is a block diagram showing the structure of a drawing system.
Fig. 2 is a perspective view showing the apparatus main body.
Fig. 3 is a diagram showing a plurality of belt regions on a substrate.
Fig. 4 is a block diagram showing a functional configuration in the drawing apparatus.
Fig. 5 is a diagram showing a flow of processing for drawing a pattern by the drawing device.
Fig. 6 is a view showing a main surface of a substrate.
Fig. 7A is a view showing a main surface of a substrate.
Fig. 7B is a view showing a main surface of the substrate.
Fig. 8 is a diagram showing a flow of processing for determining the delay time.
Fig. 9A is a diagram for explaining the meaning of the delay time.
Fig. 9B is a diagram for explaining the meaning of the delay time.
Fig. 10 is a diagram for explaining the processing of the comparative example.
Fig. 11 is a diagram for explaining another operation example in the drawing apparatus.
Wherein the reference numerals are as follows:
1 drawing device
3 drawing head
6 drawing control unit
9 base plate
41 object stage
43 objective table moving mechanism
51 imaging unit
Region of band 81
212 delay time determination unit
221 rendering data generating unit
222 whole pattern data storage unit
811 divided region
911 alignment mark
S11-S17, S121-S125
Detailed Description
Fig. 1 is a block diagram showing a configuration of a drawing system 100 according to an embodiment of the present invention. The drawing system 100 is a system that irradiates a photosensitive material on a substrate such as a printed circuit board with light and draws a pattern such as wiring on the photosensitive material.
The drawing system 100 includes a computer 101 and a drawing device 1. The computer 101 is used to generate design data representing the overall pattern to be drawn on the substrate. The design data is, for example, vector data representing the entire pattern. The drawing apparatus 1 includes two computers 21 and 22 and an apparatus main body 10. The computer 21 performs overall control of the apparatus main body 10. The computer 22 generates drawing data used in the apparatus main body 10 from the design data. The computer 101, the computer 21, the computer 22, and the apparatus main body 10 are communicably connected to each other.
Fig. 2 is a perspective view showing the apparatus main body 10. In fig. 2, three directions orthogonal to each other are indicated by arrows as an X direction, a Y direction, and a Z direction (the same applies to other figures). In the example of fig. 2, the X direction and the Y direction are horizontal directions, and the Z direction is a vertical direction. The Z direction may be a direction inclined with respect to the vertical direction or a horizontal direction depending on the design of the imaging apparatus 1.
The apparatus main body 10 includes a plurality of drawing heads 3, a stage 41, a stage elevating mechanism 42, a stage moving mechanism 43, and an imaging unit 5. The stage 41 holds the substrate 9 below (on the (-Z) side) the drawing head 3. The plurality of drawing heads 3 are arranged along the X direction (hereinafter, referred to as "width direction"). In each of the scanning heads 3, a laser beam is emitted from a light source to a light modulation unit, and the light is modulated by the light modulation unit. The modulated (spatially modulated) light is applied to the principal surface 91 of the substrate 9 on the stage 41, which faces in the (+ Z) direction. In the following description, a DMD (digital micromirror device) in which a plurality of micromirrors are arranged in two dimensions is used as the light modulation section of each of the scanning heads 3. The light modulation unit may be a modulator in which a plurality of light modulation elements are arranged in one dimension, or the like.
The stage lifting mechanism 42 moves the stage 41 in the Z direction. The stage moving mechanism 43 moves the stage 41 in the Y direction (hereinafter referred to as "moving direction") together with the stage elevating mechanism 42. The imaging unit 5 is disposed on the (-Y) side of the plurality of drawing heads 3. The imaging unit 5 has a plurality of imaging sections 51. The plurality of imaging units 51 are arranged at intervals in the width direction. Each imaging unit 51 images the substrate 9 on the stage 41 to acquire data of the captured image. The drawing apparatus 1 may be provided with a rotation mechanism that rotates the stage 41 about an axis parallel to the Z direction, without the stage lift mechanism 42.
When a pattern is drawn by the drawing heads 3 described later, the stage moving mechanism 43 continuously moves the stage 41 in the moving direction, and the position on the substrate 9 to which light is irradiated from each of the drawing heads 3 is scanned in the moving direction with respect to the substrate 9. Further, the DMD of the drawing head 3 is controlled in synchronization with the movement of the stage 41. Thereby, the tape region on the main surface 91 of the substrate 9 extending in the moving direction is subjected to pattern drawing by each of the drawing heads 3.
Fig. 3 is a diagram showing a plurality of belt regions 81 on the main surface 91 of the substrate 9. In fig. 3, each band region 81 is represented by a thick rectangle that is long in the Y direction, and a region 82 (hereinafter referred to as "irradiation region 82") irradiated with light by each of the drawing heads 3 is also abstractly represented. In this processing example, almost the entire main surface 91 is a drawing possible region in which the drawing device 1 can draw a pattern, and a photosensitive material is provided on the entire main surface 91. In the apparatus main body 10, the plurality of scanning heads 3 are closely arranged in the width direction, and the plurality of irradiation regions 82 on the substrate 9 are also arranged continuously in the width direction. Therefore, the plurality of belt regions 81 are also arranged continuously in the width direction. The plurality of band regions 81 extend over the entire main face 91 of the substrate 9, that is, over the entire drawable region. In other words, by dividing the drawing possible region in the width direction, a plurality of band regions 81 each along the moving direction are set. In the example of fig. 3, by performing continuous movement of the stage 41 in the movement direction once, the plurality of strip regions 81 are each subjected to pattern drawing by the plurality of drawing heads 3, and pattern drawing of the entire drawing-possible region is completed (that is, so-called one-time drawing).
Fig. 4 is a block diagram showing a functional configuration in the drawing apparatus 1. The drawing apparatus 1 includes an overall control unit 211, a drawing data generation unit 221, an overall pattern data storage unit 222, and a plurality of drawing control units 6. The overall control unit 211 is realized by the computer 21 of fig. 1. The overall control unit 211 includes a delay time determination unit 212 and a drawing data conversion unit 213. The drawing data generation unit 221 and the entire pattern data storage unit 222 are implemented by the computer 22. The plurality of drawing control units 6 are provided in the apparatus main body 10 in the vicinity of the plurality of drawing heads 3. The plurality of drawing control units 6 are communicably connected to the plurality of drawing heads 3, respectively. Each drawing control unit 6 includes a drawing data memory 61 and a conversion data memory 62. The functions of the overall control unit 211, the drawing data generation unit 221, the overall pattern data storage unit 222, and the drawing control units 6 will be described later in detail. Fig. 4 also shows the stage moving mechanism 43 and the imaging unit 5 in a frame.
Fig. 5 is a diagram showing a flow of processing for drawing a pattern by the drawing apparatus 1. In the drawing apparatus 1, first, overall pattern data indicating an overall pattern to be drawn on the drawing possible area of the substrate 9 is prepared (step S11). In this processing example, design data representing the entire pattern is generated by the computer 101 of fig. 1 as a preparation in advance. Further, the drawing data generation unit 221 converts the design data, which is vector data, into raster data (performs rasterization), and the converted data is stored as overall pattern data in the overall pattern data storage unit 222. In this manner, in the drawing apparatus 1, the entire pattern data as the raster data is prepared so as to be stored in the entire pattern data storage unit 222 in advance. In this processing example, the entire pattern data is Run length data (Run length data) in which a Run length (Run length) is compressed.
The delay time determination unit 212 determines a delay time (step S12). The meaning of the delay time and the details of the process of determining the delay time will be described later. Next, the substrate 9 to be processed is placed on and held by the stage 41 of fig. 2 (step S13). The substrate 9 is moved to the lower side of the imaging unit 5 by the movement of the stage 41, and the main surface 91 of the substrate 9 facing the (+ Z) direction is imaged by the plurality of imaging units 51 (step S14).
Fig. 6 is a diagram showing the main surface 91 of the substrate 9. A plurality of alignment marks 911 (refer to the alignment marks 911 indicated by solid lines) are formed on the main surface 91 of the substrate 9. The alignment mark 911 can be observed through the photosensitive material, and (data of) a captured image in which the alignment mark 911 is captured is acquired in each of the imaging units 51. In the example of fig. 6, a plurality of alignment marks 911 are provided at both end portions in the moving direction (Y direction), respectively. Therefore, the substrate 9 is moved in the moving direction by the stage moving mechanism 43, and the plurality of alignment marks 911 on both end portions of the substrate 9 are imaged by the plurality of imaging units 51. In this processing example, after the alignment mark 911 provided at the (+ Y) side end portion is imaged on the substrate 9, the stage 41 is moved in the (+ Y) direction to image the alignment mark 911 provided at the (-Y) side end portion. Then, the substrate 9 is disposed at a position (hereinafter referred to as "standby position") slightly shifted from the plurality of scanning heads 3 to the (+ Y) side.
The plurality of captured images are input to the overall control section 211. The overall control unit 211 obtains the positions of the plurality of alignment marks 911 (positions based on the predetermined position of the main surface 91) on the substrate 9 on the stage 41 from the plurality of captured images. The overall control unit 211 also stores in advance the positions of the plurality of alignment marks 911 on an ideal substrate (the substrate 9 that is not deformed), and compares the positions with the actual positions of the alignment marks 911 on the substrate 9. Thereby, deformation information indicating deformation of the substrate 9 is acquired. The deformation of the substrate 9 refers to expansion and contraction or distortion of the substrate 9 caused by the previous process performed on the substrate 9. The deformation information indicating the deformation of the substrate 9 is output to the drawing data generation unit 221. In fig. 6, a thin solid line indicates a quadrangle B1 formed by connecting the alignment marks 911 on the substrate 9. Note that the alignment marks 911 on an ideal substrate are indicated by two-dot chain lines, and the quadrangle B2 formed by connecting the alignment marks 911 is also indicated by two-dot chain lines.
Next, the drawing data generation unit 221 generates a plurality of pieces of divided drawing data used for each drawing head 3 (step S15). Here, in the drawing apparatus 1, the band regions 81 shown in fig. 3 are equally divided in the moving direction, thereby setting a plurality of divided regions 811 (which may be regarded as frames). The plurality of divided drawing data for each of the drawing heads 3 is used for drawing a pattern for the plurality of divided regions 811 by the drawing head 3, and is generated from the entire pattern data with reference to the deformation information. The reference of the deformation information when generating the plurality of pieces of divided drawing data will be described later.
In this processing example, when pattern drawing is performed by the drawing head 3 described later, the substrate 9 is continuously moved in the (-Y) direction, and among the band regions 81, pattern drawing is performed on the divided region 811 disposed on the most (-Y) side at first, and pattern drawing is performed on the divided region 811 disposed on the most (+ Y) side at last. Therefore, when a plurality of pieces of divided drawing data are generated, the divided drawing data corresponding to the most (-Y) side divided region 811 is generated first, and the divided drawing data corresponding to the most (+ Y) side divided region 811 is generated last. Each of the divided drawing data is raster data, and is sequentially transferred from the generated portion to the drawing control unit 6. As described above, the drawing data generation unit 221 sequentially generates a plurality of pieces of divided drawing data corresponding to the plurality of divided regions 811 from the entire pattern data in the order of the divided regions 811 in the moving direction, and transmits the plurality of pieces of divided drawing data to the drawing control unit 6. The divided drawing data is stored in the drawing data memory 61. In this processing example, the divided rendering data is also run-length data in which the run length is compressed, as in the case of the entire pattern data.
When generating a plurality of pieces of divided drawing data, the deformation information is referred to. The deformation information indicates a difference between the position of the alignment mark 911 on the ideal substrate (the substrate 9 on which the deformation has not occurred) and the position of the alignment mark 911 on the actual substrate 9. Further, the overall pattern data stored in the overall pattern data storage section 222 represents an overall pattern corresponding to an ideal substrate. Therefore, the drawing data generation unit 221 generates a plurality of pieces of divided drawing data by deforming (correcting) the entire pattern indicated by the entire pattern data in accordance with the deformation of the substrate 9 by referring to the deformation information.
The substrate 9 of fig. 6 having the alignment marks 911 provided near the four corners of the main surface 91 is merely an example, and the alignment marks 911 may be provided also at the center in the moving direction and the width direction on the main surface 91 as shown in fig. 7A. As shown in fig. 7B, a plurality of individual regions 910 may be set on the main surface 91, and pattern correction based on the deformation information may be performed for each individual region 910.
In actuality, when the divided drawing data corresponding to each divided region 811 is transmitted to the drawing data memory 61 in the drawing data conversion unit 213 of the overall control unit 211, the divided drawing data, which is run-length data, is immediately converted into uncompressed raster data (expanded into bitmap data), and is stored in the conversion data memory 62 as converted divided drawing data. At this time, the drawing data conversion unit 213 also performs vertical/horizontal conversion of the pixel values. Specifically, the divided drawing data sequentially indicates values of pixels arranged in a direction corresponding to the moving direction, whereas the converted divided drawing data sequentially indicates values of pixels arranged in a direction corresponding to the width direction.
On the other hand, the overall control unit 211 measures the time from the start of the generation of the plurality of divided drawing data, and repeatedly checks whether or not the measurement time has reached the delay time at every minute time. When the measurement time does not reach the delay time (step S16), the apparatus main body 10 maintains the state in which the substrate 9 is disposed at the standby position. When the measurement time reaches the delay time (step S16), the stage moving mechanism 43 is controlled to start the continuous movement of the stage 41 in the (-Y) direction. Further, while the stage 41 is continuously moving, the drawing control unit 6 controls the DMD31 of the drawing head 3 based on the plurality of pieces of divided drawing data, thereby drawing a pattern on the tape region 81 (step S17).
When each of the drawing heads 3 draws a pattern on the first divided region 811 when drawing a pattern on the band region 81, the divided drawing data corresponding to the divided region 811 is stored in the drawing data memory 61 as described later. Actually, the converted divided drawing data is also generated from the divided drawing data and stored in the conversion data memory 62. Therefore, the drawing control unit 6 can switch the postures of the plurality of mirrors included in the DMD31 at high speed by using the converted divided drawing data, thereby drawing a pattern appropriately. When the pattern drawing is started for each of the other divided areas 811, the generation and transfer of the divided drawing data corresponding to the divided area 811 are also completed, and the pattern drawing is appropriately performed for the divided area 811. Part of the pattern drawing of the plurality of divided areas 811 is performed in parallel with the generation and transmission of the plurality of divided drawing data. When the position on the substrate 9 to which the light from each of the drawing heads 3 is applied reaches the end on the (+ Y) side of the main surface 91, the drawing of the pattern by the drawing heads 3 is completed.
Next, the process of determining the delay time by the delay time determination unit 212 in step S12 will be described. Fig. 8 is a diagram illustrating a process flow of determining the delay time by the delay time determination unit 212. As described above, the delay time is a time from the start of the generation of the plurality of divided drawing data to the start of the drawing of the first divided region 811 in the band region 81.
When the delay time is determined, first, in step S15 in fig. 5, the time estimated to be required for the generation and transmission of the plurality of divided drawing data is acquired as the tape drawing data preparation time (step S121). Here, it is empirically determined that the time required for generating and transmitting the plurality of (all of) divided drawing data for each band region 81 depends on the number of change points included in the portion indicating the band region 81 in the entire pattern data as the run-length data. In the delay time determination unit 212, a table (which may be a function or the like) is prepared in advance, the table indicating the relationship between the number of change points of the band 81 and the time required for generating and transmitting the plurality of pieces of divided drawing data for the band 81. Then, the number of change points included in the portion of the entire pattern data indicating the band region 81 of each drawing head 3 is obtained, and the table is referred to by using the number of change points, whereby the band drawing data preparation time is acquired for the drawing head 3. In this manner, a plurality of band drawing data preparation times are acquired for the plurality of drawing heads 3.
In step S17, the time estimated to be required for pattern drawing of each of the divided areas 811 of the belt area 81 is acquired as the divided area drawing time (step S122). In the imaging apparatus 1, the light quantity and illuminance necessary for the photosensitive material on the substrate 9 to be exposed are set in advance, and the maximum light quantity that can be irradiated onto the substrate 9 by the imaging head 3 is obtained. Further, the overall control unit 211 obtains the moving speed of the stage 41 in the moving direction when the pattern is drawn by the drawing head 3, based on these values. Therefore, the time estimated to be required for pattern drawing of the divided regions 811, that is, the divided region drawing time is obtained from the length of each of the divided regions 811 in the moving direction and the moving speed of the stage 41 in the moving direction. Further, the sum of the divided region drawing times for all the divided regions 811 included in the band region 81, that is, the time estimated to be necessary for drawing the entire band region 81 is obtained as the band drawing time. In the plurality of drawing heads 3, the band drawing time is the same.
Fig. 9A and 9B are diagrams for explaining the meaning of the delay time, and show a period during which a part of the steps are performed in the process of drawing the pattern in fig. 5. In fig. 9A and 9B, the period during which the plurality of pieces of divided drawing data are generated and transferred in step S15 is indicated by a solid arrow labeled with the same reference sign S15, and the length of the arrow S15 is set to the longest tape drawing data preparation time T among the plurality of tape drawing data preparation times of the plurality of drawing heads 3. Note that the period during which the tape region 81 is patterned in step S17 is indicated by a set of solid arrows labeled with the same reference numeral S17. The arrows indicate the periods of time during which the pattern is drawn on the divided areas 811 of the band 81, and the length of each arrow is defined as a divided area drawing time B. When the number of the plurality of divided regions 811 in the band region 81 is n, the band drawing time is (n · B). In fig. 9A and 9B, the period required for acquiring the plurality of captured images captured by the imaging unit 5 and acquiring the deformation information indicating the deformation of the substrate 9 in step S14 is also indicated by a solid arrow labeled with the same reference numeral S14.
Next, the delay time determination unit 212 compares the longest band drawing data preparation time among the band drawing data preparation times of the plurality of drawing heads 3 with the band drawing time. As shown in fig. 9A, when the band drawing time is longer than the longest band drawing data preparation time, that is, (n · B > T) (step S123), the time required for generating and transmitting the divided drawing data corresponding to the first divided region 811 is determined as the delay time W (step S124). In this processing example, it is assumed that the lengths of the plurality of divided areas 811 included in the band area 81 in the moving direction are constant, and the time required for generating and transmitting the plurality of divided drawing data corresponding to the plurality of divided areas 811 is also approximately constant. Therefore, the delay time W is obtained by (T/n).
As described above, in the process of drawing a pattern, the delay time W is a time from the start of the generation of the plurality of divided drawing data (from the end of step S14) to the start of the drawing of the first divided region 811 in the tape region 81. Therefore, in step S16 of fig. 5, by using the delay time W determined in step S124, when pattern drawing is started for the first divided area 811 in step S17, generation and transfer of the divided drawing data corresponding to the first divided area 811 are completed. Thus, the first divided region 811 is appropriately patterned. Since the band drawing time is longer than the longest band drawing data preparation time, the divided region drawing time is longer than the time required for generating and transmitting the divided drawing data corresponding to one divided region 811. Therefore, when pattern drawing is started for each of the divided regions 811 other than the first divided region 811, generation and transfer of the divided drawing data corresponding to the divided region 811 are completed, and pattern drawing is appropriately performed for the divided region 811.
On the other hand, as shown in fig. 9B, when the band drawing data preparation time is equal to or shorter than the longest band drawing time, that is, (n · B ≦ T) (step S123), the delay time W different from the above is obtained. Specifically, first, a value (time) obtained by multiplying the band drawing time by ((n-1)/n) is obtained. In other words, the sum ((n-1) · B) of the drawing times for (n-1) divided regions 811 is obtained. Then, (T- (n-1) · B), which is a time obtained by subtracting the sum of the drawing times for (n-1) divided regions 811 from the longest band drawing data preparation time, is determined as the delay time W (step S125).
Here, when the band drawing time is shorter than the longest band drawing data preparation time, that is, when the divided region drawing time is shorter than the time required for generating and transmitting the divided drawing data corresponding to one divided region 811, it is assumed that when the delay time W is obtained by (T/n) as in the example of fig. 9A, when pattern drawing is started for each divided region 811 other than the first divided region 811, generation and transmission of the divided drawing data corresponding to the divided region 811 are not completed. At this time, since it is necessary to stop the continuous movement of the stage 41 and wait for the generation and transmission of the divided drawing data, the pattern drawing cannot be appropriately performed on the tape region 81.
In fact, in step S16 of fig. 5, by using the delay time W determined in step S125, the drawing start time at which drawing is performed on the last divided region 811 in the band region 81 in step S17 becomes the completion time of generation and transfer of the plurality of (all) divided drawing data. Therefore, the last divided region 811 is appropriately patterned. Since the divided-region drawing time is equal to or shorter than the time (B ≦ (T/n)) required for generating and transmitting the divided-drawing data corresponding to one divided region 811, when the pattern drawing is started for each divided region 811 other than the last divided region 811, the generation and transmission of the divided-drawing data corresponding to the divided region 811 are completed. Therefore, all the divided areas 811 included in the band area 81 can be appropriately pattern-drawn without stopping the continuous movement of the stage 41. When the same overall pattern is drawn on the plurality of substrates 9, the same delay time may be used in the process of fig. 5 performed on the plurality of substrates 9.
Fig. 10 is a diagram for explaining the processing of the comparative example, and shows a plurality of belt regions 81 on the main surface 91 of the substrate 9. In the process of the comparative example, the plurality of divided areas 811 are not set in each band area 81, and the delay time is not determined in step S12 in fig. 5. Therefore, as indicated by the broken-line arrows in fig. 9A and 9B, after the generation and transfer of the plurality of pieces of divided drawing data are completed in step S15 (actually, after the drawing data for the entire band region 81 of each drawing head 3 is stored in the drawing data memory 61), pattern drawing of the band region 81 is started in step S17. Therefore, the waiting time from the start of the generation of the plurality of divided drawing data to the start of the pattern drawing of the tape region 81 becomes long.
On the other hand, in the drawing apparatus 1, when the band drawing time is longer than the band drawing data preparation time, the delay time is determined as the time required for generating and transmitting the divided drawing data corresponding to the first divided region 811. When the tape drawing time is equal to or less than the tape drawing data preparation time, the delay time is determined to be a time at which the drawing start time at which the drawing is performed on the last divided region 811 in the tape region 81 becomes the completion time of the generation and transfer of the plurality of divided drawing data. This can shorten the waiting time from the start of generating the plurality of divided drawing data to the start of drawing the pattern on the tape region 81, thereby improving the throughput of the drawing apparatus 1.
In the drawing apparatus 1, the number of change points included in the portion indicating the band region 81 in the entire pattern data as stroke length data is determined. This makes it possible to easily acquire the tape drawing data preparation time based on the number of change points. Further, by determining the delay time using the longest band drawing data preparation time among the plurality of band drawing data preparation times for the plurality of drawing heads 3, the delay time can be appropriately determined in the drawing apparatus 1 having the plurality of drawing heads 3. Further, by correcting the pattern based on the position of the alignment mark 911 on the substrate 9 and generating a plurality of pieces of divided drawing data, the pattern can be appropriately drawn in accordance with the deformation of each substrate 9.
Next, another example of processing for acquiring the tape drawing data preparation time will be described. In the drawing apparatus 1 of the other processing example, it is assumed that the same overall pattern data is used to draw a pattern on the plurality of substrates 9. For example, in the processing of fig. 5 performed on the first substrate 9, no delay time is set (i.e., step S12 is skipped), and after generation and transfer of all the divisional drawing data are completed in step S15, pattern drawing of the band region 81 is started in step S17. In other words, the time required for generating and transmitting all the divided drawing data is handled as the delay time. In step S15, the overall control unit 211 measures the time required for generating and transmitting all the divided drawing data for each band region 81, and acquires this time as the band drawing data preparation time.
Next, in the processing of fig. 5 performed on the next substrate 9 (second substrate 9), in step S12, the delay time is determined using the band drawing data preparation time. The processing of steps S13 to S17 is the same as the processing example described above. If the substrate 9 to be measured with the preparation time of the drawing data is processed before the substrate 9 (the current substrate 9 to be processed) for which the delay time is determined by the preparation time of the drawing data, the substrate 9 to be measured with the preparation time of the drawing data is not limited to the first substrate 9 to be processed.
As described above, in the other processing example, in the processing performed on the other substrate 9 on which the same pattern as the substrate 9 to be processed is formed, the time required for the generation and transfer of the plurality of pieces of divided drawing data is acquired, and this time is used as the tape drawing data preparation time for the substrate 9 to be processed. This makes it possible to easily acquire the tape drawing data preparation time.
The imaging apparatus 1 described above can be modified in various ways.
In the drawing apparatus 1, the entire drawing possible region can be subjected to pattern drawing (so-called multi-pass drawing) by repeating a plurality of times the continuous movement of the stage 41 in the moving direction and the intermittent movement in the width direction perpendicular to the moving direction. In the example shown in fig. 11, in one continuous movement of the stage 41 in the moving direction (scanning of the irradiation region 82 in the moving direction), the plurality of scanning heads 3 perform pattern scanning on different belt regions 81. The band region 81 is divided into a plurality of divided regions 811 in the moving direction, and the delay time determined based on the band drawing time and the band drawing data preparation time is used for pattern drawing of the band region 81 in the same manner as the above-described processing example.
After the pattern drawing is performed on this belt region 81, the drawing head 3 is moved relative to the stage 41 in the width direction, and then the stage 41 is continuously moved in the moving direction, thereby performing the pattern drawing on the other belt region 81 adjacent to this belt region 81. The other band region 81 is also divided into a plurality of divided regions 811 in the moving direction, and a delay time determined based on the band drawing time and the band drawing data preparation time is used for pattern drawing of the other band region 81. In this way, the throughput can be improved by determining an appropriate delay time in the imaging apparatus 1 that performs multi-pass imaging.
On the other hand, in the one-time drawing described with reference to fig. 3, the data amount of the drawing data for one band region 81 is larger than that in the multi-pass drawing. Therefore, if the band area 81 is not divided into the plurality of divided areas 811, it takes a long time to generate and transmit the drawing data, and the waiting time from the start of generating the drawing data to the start of pattern drawing on the band area 81 becomes long. From this viewpoint, the above-described method of dividing the band region 81 into a plurality of divided regions 811 and determining the delay time based on the band drawing time and the band drawing data preparation time is considered to be particularly suitable for the drawing apparatus 1 that performs one drawing.
In the drawing apparatus 1, the lengths of the plurality of divided regions 811 in the moving direction may be different from each other in the band region 81. In this case, in step S124 of fig. 8, the delay time is also determined as the time required for generating and transmitting the divided rendering data corresponding to the first divided region 811. In step S125, the delay time is determined such that the drawing start time at which drawing of the last divided area 811 in the band area 81 is started becomes the time at which the generation and transfer of the plurality of (all) divided drawing data are completed. This can improve the throughput of the imaging apparatus 1.
Further, the delay time may be decided to be a time slightly longer than the time acquired by the processing of the above-described steps S124, S125. That is, when the tape drawing time is longer than the tape drawing data preparation time, the delay time may be equal to or longer than the time required for generating and transmitting the divided drawing data corresponding to the first divided region 811 and equal to or shorter than the time obtained by adding a predetermined additional time to the time. When the tape drawing time is equal to or less than the tape drawing data preparation time, the delay time may be equal to or more than a time at which the drawing start time at which drawing of the last divided region 811 in the tape region 81 is started is the completion time of the generation and transfer of the plurality of divided drawing data, and equal to or less than a time obtained by adding a predetermined additional time to the time. In view of shortening the waiting time from the start of the generation of the plurality of divided drawing data to the start of the pattern drawing of the band region 81, the additional time is, for example, a time required for drawing one divided region 811, and is preferably half of the time.
The number of the plurality of divided regions 811 in the band region 81 may be set to any number of 2 or more. However, since the overall pattern data in the above embodiment sequentially represents the values of the pixels arranged in the direction corresponding to the moving direction, if the number of the divided regions 811 is too large, the process of generating a plurality of pieces of divided drawing data becomes complicated. From this viewpoint, the number of the plurality of divided regions 811 is, for example, 20 or less, and preferably 10 or less.
The entire pattern data as the vector data may be stored in the entire pattern data storage section 222. At this time, the drawing data generation unit 221 corrects the pattern in accordance with the deformation of the substrate 9, and rasterizes the corrected pattern to generate a plurality of pieces of divided drawing data as raster data. The correction of the pattern may be performed using other than the alignment mark 911. For example, the imaging unit 51 may image a through hole or the like formed in the substrate 9, correct the pattern according to the position of the through hole or the like, and generate a plurality of pieces of divided drawing data.
In step S16 of fig. 5, when the overall controller 211 confirms that the measurement time has reached the delay time, the pattern drawing of the tape region 81 may be started in step S17 by further confirming the completion of the generation and transfer of the divided drawing data corresponding to the first divided region 811. For example, by inserting a code indicating that the divided drawing data is the last of the divided drawing data corresponding to the first divided region 811 at the last of the divided drawing data, the overall control unit 211 can easily confirm the completion of the generation and transmission of the divided drawing data of the first divided region 811.
In the above-described embodiment, the drawing data generation unit 221 is implemented by one computer 22, but for example, a plurality of computers corresponding to the plurality of drawing control units 6 may be provided, and the plurality of computers may generate the drawing data for the plurality of drawing control units 6. In this case, it is considered that the drawing data generation unit 221 is realized by the plurality of computers.
The drawing apparatus 1 may be provided with a moving mechanism for moving the drawing head 3 in a moving direction. That is, the drawing apparatus 1 is provided with a moving mechanism for continuously moving the stage 41 in the moving direction with respect to the drawing head 3.
The substrate 9 on which the pattern is drawn may be a semiconductor substrate, a glass substrate, or the like other than a printed wiring board.
The configurations in the above-described embodiment and modifications may be combined as appropriate without being inconsistent with each other.
While the invention has been described and illustrated in detail, the foregoing description is illustrative and not restrictive. Thus, it is contemplated that many variations may be made without departing from the scope of the invention.

Claims (12)

1. A drawing apparatus for drawing a pattern on a substrate, the drawing apparatus comprising:
an object stage for holding a substrate;
a scanning head for irradiating the modulated light to the substrate on the stage;
a moving mechanism that continuously moves the stage in a moving direction with respect to the scanning head;
a drawing control unit that divides a drawing-possible region in the substrate on the stage in a width direction perpendicular to the moving direction to set a plurality of band regions extending in the moving direction, and controls the drawing head in parallel with continuous relative movement of the stage in the moving direction to draw a pattern for one band region;
an entire pattern data storage unit that stores entire pattern data indicating an entire pattern to be drawn in the drawing-enabled area;
a drawing data generation unit configured to sequentially generate a plurality of pieces of divided drawing data corresponding to the plurality of divided regions in the moving direction based on the entire pattern data for a plurality of divided regions obtained by dividing the tape region of the substrate to be processed in the moving direction after the substrate to be processed is held on the stage, and to transfer the plurality of pieces of divided drawing data to the drawing control unit; and
a delay time determination unit configured to determine a delay time from a start of generation of the plurality of divided drawing data to a start of drawing of a first divided area among the band areas, based on a band drawing time required for drawing the band areas and a band drawing data preparation time required for generation and transfer of the plurality of divided drawing data,
when the band drawing time is longer than the band drawing data preparation time, the delay time is equal to or longer than a time required for generation and transmission of the divided drawing data corresponding to the first divided region and equal to or shorter than a time obtained by adding a predetermined additional time to the time, and when the band drawing time is equal to or shorter than the band drawing data preparation time, the delay time is equal to or longer than a time at which a drawing start time at which drawing is started for the last divided region in the band region is completed when the plurality of divided drawing data are generated and transmitted and equal to or shorter than a time obtained by adding a predetermined additional time to the time.
2. The drawing device according to claim 1,
equally dividing the band region in the moving direction to obtain the plurality of divided regions,
when the band drawing time is equal to or less than the band drawing data preparation time, the number of the plurality of divided regions in the band region is n, and the delay time is equal to or more than a time obtained by subtracting a value obtained by multiplying the band drawing time by ((n-1)/n) from the band drawing data preparation time and equal to or less than a time obtained by adding the additional time to the time.
3. The drawing device according to claim 1,
the drawing apparatus further includes an imaging unit that images an alignment mark formed on the substrate on the stage to obtain an image,
the imaging unit acquires the captured image of the substrate to be processed,
the drawing data generation unit corrects a pattern based on the position of the alignment mark indicated by the captured image, and generates the plurality of pieces of divided drawing data.
4. The drawing device according to claim 1,
the drawing apparatus includes a plurality of drawing heads including the drawing head,
the plurality of drawing heads draw patterns of band regions different from each other,
the drawing data generation unit generates the plurality of pieces of divided drawing data for each of the plurality of drawing heads,
the delay time determination unit determines the delay time using a longest band drawing data preparation time among a plurality of band drawing data preparation times for the plurality of drawing heads.
5. The drawing device as defined in any one of claims 1 to 4,
the overall pattern data is run length data,
the band drawing data preparation time is acquired based on the number of change points included in the portion representing the band region in the overall pattern data.
6. The drawing device as defined in any one of claims 1 to 4,
in processing for another substrate forming the same pattern as the substrate to be processed, a time required for generation and transfer of the plurality of divisional drawing data is acquired, and the time is used as the band drawing data preparation time for the substrate to be processed.
7. A drawing method in a drawing apparatus, wherein,
the drawing device includes:
an object stage for holding a substrate;
a scanning head for irradiating the modulated light to the substrate on the stage;
a moving mechanism that continuously moves the stage in a moving direction with respect to the scanning head; and
a drawing control section that divides a drawing-possible region in the substrate on the stage in a width direction perpendicular to the moving direction to set a plurality of band regions extending in the moving direction, respectively, and controls the drawing head in parallel with continuous relative movement of the stage in the moving direction to draw a pattern for one band region,
the drawing method comprises the following steps:
a) preparing overall pattern data representing an overall pattern to be drawn in the drawing-enabled area;
b) a step of holding a substrate to be processed on the stage;
c) a step of sequentially generating, for a plurality of divided regions obtained by dividing the tape region of the substrate to be processed in the moving direction, a plurality of pieces of divided drawing data corresponding to the plurality of divided regions, respectively, from the entire pattern data, and transferring the plurality of pieces of divided drawing data to the drawing control unit;
d) determining a delay time from the start of the generation of the plurality of divided drawing data to the start of the drawing of the first divided area of the band areas, based on a band drawing time required for drawing the band areas and a band drawing data preparation time required for the generation and transmission of the plurality of divided drawing data; and
e) a step of drawing a pattern on the band region of the substrate to be processed based on the plurality of divided drawing data,
when the band drawing time is longer than the band drawing data preparation time, the delay time is equal to or longer than a time required for generation and transmission of the divided drawing data corresponding to the first divided region and equal to or shorter than a time obtained by adding a predetermined additional time to the time, and when the band drawing time is equal to or shorter than the band drawing data preparation time, the delay time is equal to or longer than a time at which a drawing start time at which drawing is started for the last divided region in the band region is completed when the plurality of divided drawing data are generated and transmitted and equal to or shorter than a time obtained by adding a predetermined additional time to the time.
8. The drawing method according to claim 7, wherein,
equally dividing the band region in the moving direction to obtain the plurality of divided regions,
when the band drawing time is equal to or less than the band drawing data preparation time, the number of the plurality of divided regions in the band region is n, and the delay time is equal to or more than a time obtained by subtracting a value obtained by multiplying the band drawing time by ((n-1)/n) from the band drawing data preparation time and equal to or less than a time obtained by adding the additional time to the time.
9. The drawing method according to claim 7, wherein,
the drawing apparatus further includes an imaging unit that images an alignment mark formed on the substrate on the stage to obtain an image,
between the step b) and the step c), the drawing method further includes: a step of acquiring the captured image of the substrate to be processed by the imaging unit,
in the step c), a pattern is corrected based on the position of the alignment mark indicated by the captured image, and the plurality of pieces of divided drawing data are generated.
10. The drawing method according to claim 7, wherein,
the drawing apparatus includes a plurality of drawing heads including the drawing head,
the plurality of drawing heads draw patterns of band regions different from each other,
in the step c), the plurality of pieces of divided drawing data are generated for each of the plurality of drawing heads,
in the step d), the delay time is determined by using the longest band drawing data preparation time among the band drawing data preparation times for the plurality of drawing heads.
11. The drawing method according to any one of claims 7 to 10,
the overall pattern data is run length data,
the band drawing data preparation time is acquired based on the number of change points included in the portion representing the band region in the overall pattern data.
12. The drawing method according to any one of claims 7 to 10,
in processing for another substrate forming the same pattern as the substrate to be processed, a time required for generation and transfer of the plurality of divisional drawing data is acquired, and the time is used as the band drawing data preparation time for the substrate to be processed.
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