CN109545271B - Precision motion compensator, XYZ three-dimensional precision motion compensator and compensation system - Google Patents
Precision motion compensator, XYZ three-dimensional precision motion compensator and compensation system Download PDFInfo
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- CN109545271B CN109545271B CN201910020237.9A CN201910020237A CN109545271B CN 109545271 B CN109545271 B CN 109545271B CN 201910020237 A CN201910020237 A CN 201910020237A CN 109545271 B CN109545271 B CN 109545271B
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Abstract
The embodiment of the application discloses a precision motion compensator, which is provided with a substrate and a micro-motion stage, wherein the substrate comprises a base and a boss fixedly arranged on the base; the bottom surface of the micro-motion stage is provided with a piezoelectric side plate and a spring side plate which are oppositely arranged and vertical to the bottom surface; a pre-tightening compressed spring is arranged between the spring side plate and the first end face of the boss, and piezoelectric ceramics are clamped between the piezoelectric side plate and the second end face of the boss, which is positioned opposite to the first end face; the substrate is provided with a sliding component, and the micro-stage is connected with the sliding component and can slide along the axial direction of the spring based on the sliding component; the device also comprises a measuring component for measuring the position of the micro-motion stage; the technical problems that the error is large in the application of the structure matched with the existing piezoelectric ceramic and the flexible hinge, and the vibration cancellation during the macro-movement of the platform and the accurate positioning during the micro-movement are difficult to meet the requirements are solved. The embodiment of the application also discloses an XYZ three-dimensional precision motion compensator and a compensation system.
Description
Technical Field
The application relates to the technical field of precise motion, in particular to a precise motion compensator, an XYZ three-dimensional precise motion compensator and a compensation system.
Background
The high quality and high productivity manufacturing of microelectronic products depends on both high precision positioning and high acceleration movement of critical mechanisms. However, high-precision positioning and high-acceleration movement inevitably bring vibration problems. In macro motion, the high acceleration motion can certainly cause the vibration of the platform, and in micro motion, after the micro power is applied, the platform can not accurately stay at the target position due to inertia.
The prior scheme for eliminating the vibration of the motion platform adopts a structure of matching piezoelectric ceramics and a flexible hinge, but the nonlinearity degree of the flexible hinge is high, the calculation is complex, the error of the calculated result is large in actual action, and the accurate positioning of the platform in macro motion is difficult to meet the requirements no matter the vibration counteraction or micro motion is performed.
Disclosure of Invention
The embodiment of the application provides a precision motion compensator, which solves the technical problems that the conventional structure of matching piezoelectric ceramics and a flexible hinge has larger error in operation, and the vibration cancellation during the movement of a platform and the accurate positioning during the micro-movement are difficult to meet the requirements.
In view of the above, a first aspect of the present application provides a precision motion compensator having a base and a micro stage, the base including a base and a boss fixedly disposed on the base;
The bottom surface of the micro-motion stage is provided with a piezoelectric side plate and a spring side plate which are oppositely arranged and vertical to the bottom surface;
a pre-tightening compressed spring is arranged between the spring side plate and the first end face of the boss, and piezoelectric ceramic is clamped between the piezoelectric side plate and the second end face of the boss, which is positioned opposite to the first end face;
The substrate is provided with a sliding component, and the micro-stage is connected with the sliding component and can slide along the axial direction of the spring based on the sliding component;
and a measuring component is also provided for measuring the position of the micro-motion stage.
Preferably, a spring positioning column matched with the spring is arranged on the first end face.
Preferably, the device further comprises a pre-tightening bolt; the spring side plate is provided with a threaded hole matched with the pre-tightening bolt; the pre-tightening bolt is connected with the spring side plate through the threaded hole, and the end part of the pre-tightening bolt pre-tightens and compresses the spring on the inner side of the spring side plate.
Preferably, the sliding assembly specifically comprises a guide rail and a sliding block;
The guide rail is arranged on the substrate along the axial direction of the spring, the sliding block is sleeved on the guide rail, and the micro-motion stage is connected with the sliding block.
Preferably, the guide rail is specifically disposed on the base of the substrate.
Preferably, the measuring device is specifically a grating ruler, and a reading head of the grating ruler is arranged on the base along the axial direction of the spring.
A second aspect of the present application provides an XYZ three-dimensional precision motion compensator comprising two precision motion compensators, any one of the precision motion compensators described in the first aspect, respectively an X-axis precision motion compensator and a Y-axis precision motion compensator;
the Y-axis precise motion compensator takes a micro-stage of the X-axis precise motion compensator as a base and is arranged on the base in a lamination way;
and a Z-axis precise motion compensator is arranged on the micro-motion stage of the Y-axis precise motion compensator.
Preferably, the base of the Z-axis precise motion compensator is a micro-stage of the Y-axis precise motion compensator;
a Z-axis boss is fixedly arranged on a base of the Z-axis precise motion compensator, a downward stepped hole is formed in the Z-axis boss along the vertical direction, Z-axis piezoelectric ceramics, a Z-axis push rod and a Z-axis spring are sequentially arranged in the stepped hole from bottom to top, and the Z-axis spring is sleeved on the Z-axis push rod for positioning;
The lower hole of the stepped hole is matched with the Z-axis piezoelectric ceramic, and the inner wall of the upper hole of the stepped hole is provided with threads matched with a Z-axis pre-tightening bolt; the Z-axis pre-tightening bolt is connected with the Z-axis boss through the thread, and the end part of the Z-axis pre-tightening bolt pre-tightens and compresses the Z-axis spring;
The Z-axis pre-tightening bolt is arranged in a hollow mode, and the Z-axis micro-motion stage is connected with the Z-axis push rod;
and a Z-axis measuring component for measuring the position of the Z-axis micro-stage.
Preferably, the Z-axis measuring component is specifically a Z-axis grating ruler, and a reading head of the Z-axis grating ruler is vertically arranged on a base of the Z-axis grating ruler.
A third aspect of the present application provides an XYZ three-dimensional precision motion compensation system, comprising a host computer and any one of the XYZ three-dimensional precision motion compensators described in the second aspect above;
the upper computer is used for outputting signals to control the corresponding piezoelectric ceramics according to the position of X, Y in the XYZ three-dimensional precision motion compensator and/or the position of a micro-stage of the Z-axis precision motion compensator.
From the above technical solutions, the embodiment of the present application has the following advantages:
In the embodiment of the application, a fixed boss is arranged on a base of the precision motion compensator, the boss is positioned between a piezoelectric side plate and a spring side plate of a micro-motion stage, a spring is pre-compressed between a first end face of the boss and the spring side plate, piezoelectric ceramic is clamped between a second end face of the boss, which is positioned on the opposite side of the first end face, and the piezoelectric side plate, and the micro-motion stage at the top can axially slide along the spring; the compensator also has a measuring component for measuring the position of the micropositioner.
It can be seen that the relative position of the micro-stage and the fixing boss is firmly limited under the action of the pre-tightening compressed spring, and the piezoelectric ceramic is clamped between the first end face and the side plate of the spring under the action of the spring. Therefore, when the platform moves at high acceleration, the spring has a buffer function on the vibration of the micro-motion stage, meanwhile, the piezoelectric ceramics can be output and controlled according to the position of the micro-motion stage measured by the measuring component, and the vibration of the platform movement is counteracted by utilizing the combined action of the piezoelectric ceramics and the spring, so that the influence of the vibration is greatly reduced. In the micro-motion, when the measuring component measures that the position of the micro-motion stage deviates from the target position, the piezoelectric ceramic can be controlled by input to generate thrust, and the thrust acts between the piezoelectric side plate of the micro-motion stage and the second end face of the fixing boss, which is equivalent to acting between the spring side plate of the micro-motion stage and the first end face of the fixing boss, so as to compress the spring. The spring is in a pre-tightening compression state and has a strong limiting effect on the position of the micro-motion stage, so that the micro-motion stage can be positioned at a target position after accurate micro-motion is realized under the thrust effect generated by piezoelectric ceramics, and the micro-motion stage cannot deviate from the target position due to inertia or vibration, so that accurate positioning is realized.
Compared with the prior art, the spring is adopted to replace the existing flexible hinge, so that the original nonlinear system is changed into a linear system, the calculation is much simpler, the calculated result is reflected to the micro adjustment of the position of the micro bench to be closer to the expected, the position of the micro bench can be accurately controlled, and the error is greatly reduced.
Drawings
FIG. 1 is a perspective view of a precision motion compensator according to a first embodiment of the present application;
FIG. 2 is an exploded view of one type of precision motion compensator shown in FIG. 1;
FIG. 3 is an exploded view of an XYZ three-dimensional precision motion compensator according to a second embodiment of the present application;
FIG. 4 is a side view of an X-axis precision motion compensator of the XYZ three-dimensional precision motion compensator shown in FIG. 3;
FIG. 5 is a side view of a Y-axis precision motion compensator of the XYZ three-dimensional precision motion compensator shown in FIG. 3;
FIG. 6 is a side view of the Z-axis precision motion compensator of the XYZ three-dimensional precision motion compensator shown in FIG. 3;
FIG. 7 is a schematic structural diagram of an XYZ three-dimensional precision motion compensator according to a third embodiment of the present application;
the reference numerals are as follows: the micro-motion device comprises a base 1, a boss 2, a micro-motion stage 3, a spring side plate 31, a piezoelectric side plate 32, piezoelectric ceramics 4, a spring 5, a pre-tightening bolt 6, a guide rail 7, a sliding block 8, a sliding block connecting piece 9, a spring positioning column 10, a reading head 11 of a grating ruler, a Z-axis boss 12, an upper hole 1201, a lower hole 1202, a Z-axis piezoelectric ceramics 13, a Z-axis push rod 14, a Z-axis spring 15, a Z-axis pre-tightening bolt 16, a Z-axis micro-motion stage 17 and a reading head 18 of the Z-axis grating ruler.
Detailed Description
The following description of the embodiments of the present application will be made in detail, but not necessarily all embodiments, with reference to the accompanying drawings. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are within the scope of the embodiments of the present application.
In the description of the embodiments of the present application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," "outer," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate description of the embodiments of the present application and to simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the embodiments of the present application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In describing embodiments of the present application, it should be noted that, unless explicitly stated and limited otherwise, the terms "mounted," "connected," and "connected" should be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in embodiments of the present application will be understood in detail by those of ordinary skill in the art.
The application provides an XYZ three-dimensional precision motion compensator, which comprises an X-axis precision motion compensator, a Y-axis precision motion compensator and a Z-axis precision motion compensator. In the following, for ease of understanding, a single-axis precision motion compensator according to a first embodiment of the present application will be described with reference to fig. 1, 2 and 4.
The precise motion compensator provided by the embodiment of the application is provided with a base, wherein the base comprises a base 1 and a boss 2 fixedly arranged on the base 1. The boss 2 has at least two end faces disposed opposite to each other in shape, and may be a rectangular parallelepiped, a regular prism having an even number of faces, or the like, or may be other shapes that meet the above requirements.
The compensator further comprises a micro-motion stage 3, wherein the micro-motion stage 3 is provided with a platform structure, and the bottom surface of the micro-motion stage is further provided with two side plates, namely a piezoelectric side plate 32 and a spring side plate 31. The two side plates are perpendicular to the bottom surface, and the planes of the two side plates are parallel, namely the two side plates are oppositely arranged.
Wherein, be provided with through pretension compressed spring 5 between the first terminal surface of spring side curb plate 31 and boss 2, and be provided with piezoceramics 4 between the second terminal surface of piezoceramics side curb plate 32 and boss 2, first terminal surface and second terminal surface are opposite each other. It can be seen that the piezoelectric ceramic 4 is also clamped tightly between the piezoelectric side plate 32 and the second end face of the boss 2 under the action of the pre-compressed spring 5, and the two side plates of the micro-stage 3 are also subjected to outward forces respectively, so that the relative position of the micro-stage 3 and the boss 2 is not easy to change, similar to being clamped.
It should be noted that the spring 5 should have a sufficient stiffness to provide a sufficient pressing force and also bear a great pushing force of the piezoelectric ceramics 4.
To facilitate the fixing of the spring 5, a spring positioning post 10 matching the diameter of the spring 5 may be provided on the first end face of the boss 2. The spring positioning column 10 is perpendicular to the first end surface of the boss 2, and can be set into a cylindrical shape, so that the spring 5 can be conveniently sleeved in. It should be noted that the length of the spring positioning post 10 needs to be short so as not to hinder the compression of the spring 5, i.e. the length of the spring positioning post 10 should be smaller than the length of the spring 5 at maximum compression, which of course refers to the maximum compression that may be used in operation, not the extreme compression of the spring 5 itself.
Since the springs 5 provided between the spring side plates 31 and the first end surfaces of the bosses 2 are pre-compressed, the pre-tightening bolts 6 may be used to pre-compress the springs 5 for convenience of installation, and also for adjusting the amount of pre-tightening of the springs 5 as needed. The end of the pre-tightening bolt 6 should be matched to the spring 5 so that it can compress the spring 5 in the forward direction without being skewed.
Specifically, a threaded hole matching the pre-tightening bolt 6 may be provided in the spring-side plate 31, and the pre-tightening bolt 6 may be connected to the spring-side plate 31 through the threaded hole, and the end portion thereof may compress the spring 5 as the amount of screwing of the pre-tightening bolt 6 increases.
The micro-motion stage 3 can perform micro-motion along the axial direction of the spring 5 in a small range, and the specific implementation is realized by virtue of a sliding assembly. The sliding component is arranged on the substrate, and the micro-motion stage 3 is connected with the sliding component so as to slide along the axial direction of the spring 5 based on the sliding component.
The sliding component can be realized in various ways, such as a rail and a pulley, a steel ball sliding rail and the like, but the way of adopting the guide rail 7 and the sliding block 8 provided by the application is preferable, and the sliding stability and the reliability are higher.
The guide rail 7 should be arranged in the same direction as the axial direction of the spring 5, and is arranged on the base, in particular, on the base 1 of the base. It may of course also be provided on the boss 2 of the base, i.e. the guide rail 7 is provided on the top surface of the boss 2, so that the sliding of the micro-stage 3 can be achieved as well. But is preferably arranged on the base 1 of the substrate, so that the base 1 has larger space and is more convenient to install and maintain.
The guide rail 7 can be symmetrically arranged on two sides of the boss 2 perpendicular to the axial direction of the spring 5, and particularly can be arranged into 7 guide rails in a shape of a convex shape, and the sliding block 8 is matched with the shape of the 7 guide rails and can be sleeved on the 7 guide rails. The micro-motion stage 3 is connected with the sliding block 8, so that the micro-motion stage 3 slides along the axial direction of the spring 5. It should be noted that, for convenience of connection, a slider connector 9 may also be provided, and the slider connector 9 is used to connect the micro-motion stage 3 and the slider 8.
Further, a measuring part is also included for measuring the position of the micro-stage 3. Various components capable of measuring the position of the micro-motion stage 3, such as a laser interferometer, a capacitance sensor and the like, are available, but the most suitable for the motion working condition of the compensator is a grating ruler. The grating ruler can be arranged on the sliding block connecting piece 9, and of course, the grating ruler can also be arranged at other places where the position of the micro-motion stage can be measured, and the reading head 11 of the grating ruler can be arranged on the base 1 and along the axial direction of the spring 5.
In this embodiment, the relative position of the micro-stage 3 and the fixing boss 2 is firmly restricted by the pre-compressed spring 5, and the piezoelectric ceramic 4 is clamped between the first end face and the spring side plate 31 also under the urging force of the spring 5. Therefore, when the platform moves at high acceleration, the spring 5 has a buffer function on the vibration of the micro-motion stage 3, meanwhile, the piezoelectric ceramic 4 can be output and controlled according to the position of the micro-motion stage 3 measured by the measuring component, and the piezoelectric ceramic 4 and the spring 5 are used for jointly acting to offset the vibration of the platform, so that the influence of the vibration is greatly reduced. In the case where the measuring means measures that the position of the micro stage 3 deviates from the target position during the micro movement, the piezoelectric ceramic 4 is controlled by the input to generate a thrust force which acts between the piezoelectric side plate 32 of the micro stage 3 and the second end surface of the fixing boss 2, and which acts between the spring side plate 31 of the micro stage 3 and the first end surface of the fixing boss 2, thereby compressing the spring 5. The spring 5 is in a pre-tightening compression state and has a strong limiting effect on the position of the micro-motion stage 3, so that the micro-motion stage 3 can be positioned at a target position after accurate micro-motion is realized under the thrust effect generated by the piezoelectric ceramic 4, and the accurate positioning can not be realized due to inertia or vibration deviating from the target position.
Compared with the prior art, the spring 5 is adopted to replace the existing flexible hinge, so that the original nonlinear system is changed into a linear system, the calculation is much simpler, the calculated result is reflected to the micro adjustment of the position of the micro-motion stage 3 to be closer to the expected, the position of the micro-motion stage 3 can be accurately controlled, and the error is greatly reduced.
The foregoing is a detailed description of a single axis precision motion compensator provided in accordance with a first embodiment of the present application. The precise motion compensator provided by the embodiment of the application can be independently used for eliminating the vibration influence of the motion mechanism in the single axial direction and realizing precise positioning, but can also realize the vibration elimination and precise positioning in the multiple axial directions through the deep combination of a plurality of the precise motion compensators, so that the performance of the motion mechanism is improved.
An XYZ three-dimensional precision motion compensator according to a second embodiment of the present application will be described with reference to fig. 3 to 6.
As described above, the XYZ three-dimensional precision motion compensator includes an X-axis precision motion compensator, a Y-axis precision motion compensator, and a Z-axis precision motion compensator. Wherein the X-axis precision motion compensator and the Y-axis precision motion compensator are the same as any one of the precision motion compensators provided in the previous embodiment.
The spring axis of the X-axis precise motion compensator is perpendicular to the spring axis of the Y-axis precise motion compensator, and the X-axis precise motion compensator and the Y-axis precise motion compensator are arranged in a lamination manner, namely the Y-axis precise motion compensator is arranged on the X-axis precise motion compensator in a lamination manner. However, the lamination is not a simple one, and the Y-axis precision motion compensator is stacked on the X-axis precision motion compensator with the stage 3 as a base. The X-axis and Y-axis precise motion compensators are laminated and combined into a whole through a ring buckle.
It should be understood that the X-axis and the Y-axis herein are only two directions perpendicular to each other in a horizontal plane, and the two directions may be interchanged, that is, the X-axis precision motion compensator may be stacked on the Y-axis precision motion compensator, and the two structures are the same, which is not limited to the stacking sequence of the two structures.
The micro-motion stage 3 of the Y-axis precision motion compensator is provided with a Z-axis precision motion compensator, wherein the Z-axis precision motion compensator may have two implementations, and in the first implementation, the Z-axis precision motion compensator has the same structure as any one of the precision motion compensators provided in the previous embodiment, but is vertically arranged. That is, the base of the Z-axis precision motion compensator is vertically disposed on the micro stage 3 of the Y-axis precision motion compensator. Therefore, the micro-motion stage 3 of the Z-axis precision motion compensator is in a vertical state rather than a horizontal state, so that a horizontal micro-motion auxiliary stage vertical to the vertical micro-motion stage 3 can be arranged on the vertical micro-motion stage 3, and micro-motion control in the Z-axis is realized.
However, the above implementation is complicated and has poor stability, so this embodiment provides this second implementation that is more applicable and efficient.
Similar to the combination of the X-axis and Y-axis precision motion compensators, the base of the Z-axis precision motion compensator can be shared with the micro-stage 3 of the Y-axis precision motion compensator. A fixed Z-axis boss 12 can be arranged on the base of the Z-axis precision motion compensator, and the Z-axis boss 12 can be provided with a downward stepped hole along the vertical direction, namely a stepped hole with a large upper hole 1201 and a small lower hole 1202.
The Z-axis piezoelectric ceramic 13, the Z-axis push rod 14 and the Z-axis spring 15 can be sequentially placed in the stepped hole, wherein the lower hole 1202 of the stepped hole is matched with the Z-axis piezoelectric ceramic 13, the Z-axis push rod 14 is matched with the Z-axis spring 15, and the Z-axis spring 15 can be sleeved on the Z-axis push rod 14 to play a role in positioning the Z-axis spring 15.
In order to conveniently pre-tighten the Z-axis spring 15 and adjust the pre-tightened compression amount, the Z-axis precision motion compensator also adopts a pre-tightening bolt means. Specifically, the Z-axis pre-tightening bolt 16 may be matched with the upper hole 1201 of the stepped hole, and a thread matching with the Z-axis pre-tightening bolt 16 is provided on the inner wall of the upper hole 1201 of the stepped hole, so that the Z-axis pre-tightening bolt 16 may be connected with the Z-axis boss 12 through the thread, and the end portion thereof may pre-compress the Z-axis spring 15. It should be noted that the Z-axis pre-tightening bolt 16 should be hollow, i.e. a through hole is formed in the Z-axis pre-tightening bolt 16 along the axial direction thereof, so as to provide a space for the Z-axis micro-stage 17 to connect with the Z-axis push rod 14.
Further, a Z-axis measuring part is provided for measuring the position of the Z-axis micro stage 17. The Z-axis measuring element is also preferably a grating scale, i.e. a Z-axis grating scale, the reading head 18 of which should be arranged vertically, mounted on its base, i.e. on the micro-stage 3 of the Y-axis precision motion compensator.
In the second implementation manner, the Z-axis precision motion compensator is also arranged on the micro-stage of the Y-axis precision motion compensator as a base. Therefore, the displacement of the micro-stage of the X-axis precision motion compensator on the X-axis can be reflected on the micro-stage of the Y-axis precision motion compensator, and the micro-stage of the Y-axis precision motion compensator can also be reflected on the Z-axis micro-stage of the Z-axis precision motion compensator, that is, the Z-axis micro-stage has the micro-motion adjusting function on the XYZ three dimensions, namely, the vibration can be counteracted on the XYZ three dimensions, and the X-axis micro-stage is accurately positioned on the XYZ three dimensions.
The above is a detailed description of an XYZ three-dimensional precision motion compensator provided in a second embodiment of the present application. It can be appreciated that the precise motion compensator and the XYZ three-dimensional precise motion compensator provided by the embodiments of the present application can be applied to any motion platform or motion assembly requiring vibration reduction and precise motion.
Referring to fig. 7, fig. 7 is a schematic structural diagram of an XYZ three-dimensional precision motion compensation system according to a third embodiment of the present application.
The application also provides an XYZ three-dimensional precision motion compensation system, which comprises an industrial personal computer and any XYZ three-dimensional precision motion compensator provided in the previous embodiment;
the industrial personal computer is used for outputting signals to control the corresponding piezoelectric ceramics according to the position of X, Y in the XYZ three-dimensional precision motion compensator and/or the position of the micro-stage of the Z-axis precision motion compensator.
The measuring component of X, Y and/or Z-axis precision motion compensator can measure the position signal of its micro-stage, if the measuring component is grating ruler, the corresponding are X-axis grating ruler signal, Y-axis grating ruler signal and Z-axis grating ruler signal. At this time, the position signal is input to the industrial personal computer, the industrial personal computer compares the obtained position signal with the target position, and according to the comparison result, the industrial personal computer can output X, Y or Z-axis piezoelectric ceramic control signals shown in fig. 7 to control the piezoelectric ceramic to generate certain thrust, so that the position of the micro-stage is changed, and the rapid vibration reduction or precise compensation positioning function is realized.
The terms "comprises" and "comprising," along with any variations thereof, in the description of the application and in the above-described figures, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed or inherent to such process, method, article, or apparatus.
It should be understood that in the present application, "at least one (item)" means one or more, and "a plurality" means two or more. "and/or" for describing the association relationship of the association object, the representation may have three relationships, for example, "a and/or B" may represent: only a, only B and both a and B are present, wherein a, B may be singular or plural. The character "/" generally indicates that the context-dependent object is an "or" relationship. "at least one of" or the like means any combination of these items, including any combination of single item(s) or plural items(s). For example, at least one (one) of a, b or c may represent: a, b, c, "a and b", "a and c", "b and c", or "a and b and c", wherein a, b, c may be single or plural.
The above embodiments are only for illustrating the technical solution of the present application, and not for limiting the same; although the application has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application.
Claims (3)
1. The XYZ three-dimensional precise motion compensator is characterized by comprising two precise motion compensators, namely an X-axis precise motion compensator and a Y-axis precise motion compensator, wherein the precise motion compensators are provided with a substrate, a micro-stage and a pre-tightening bolt, and the substrate comprises a base and a boss fixedly arranged on the base;
The bottom surface of the micro-motion stage is provided with a piezoelectric side plate and a spring side plate which are oppositely arranged and vertical to the bottom surface;
a pre-tightening compressed spring is arranged between the spring side plate and the first end face of the boss, and piezoelectric ceramic is clamped between the piezoelectric side plate and the second end face of the boss, which is positioned opposite to the first end face;
The substrate is provided with a sliding component, and the micro-stage is connected with the sliding component and can slide along the axial direction of the spring based on the sliding component;
the device also comprises a measuring component for measuring the position of the micro-motion stage;
When the piezoelectric ceramic is acted by the pre-tightening compressed spring, the piezoelectric ceramic is clamped between the piezoelectric side plate and the second end face of the boss and used for limiting the relative position of the micro-motion stage and the boss;
When the pushing force generated by the piezoelectric ceramic acts between the spring side plate of the micro-motion stage and the first end surface of the boss, the spring is compressed, and the spring is used for limiting the position of the micro-motion stage;
The spring side plate is provided with a threaded hole matched with the pre-tightening bolt;
The pre-tightening bolt is connected with the spring side plate through the threaded hole, and the end part of the pre-tightening bolt pre-tightens and compresses the spring on the inner side of the spring side plate, and is particularly used for adjusting the pre-tightening compression amount of the spring;
a spring positioning column matched with the spring is arranged on the first end face;
The sliding component specifically comprises a guide rail and a sliding block;
The guide rail is arranged on the substrate along the axial direction of the spring, the sliding block is sleeved on the guide rail, and the micro-motion stage is connected with the sliding block;
the guide rail is specifically arranged on the base of the substrate;
The measuring part is specifically a grating ruler, and a reading head of the grating ruler is arranged on the base along the axial direction of the spring;
The Y-axis precise motion compensator takes a micro-stage of the X-axis precise motion compensator as a base and is arranged on the X-axis precise motion compensator in a lamination way;
a Z-axis precise motion compensator is arranged on the micro-motion stage of the Y-axis precise motion compensator;
The base of the Z-axis precise motion compensator is a micro-stage of the precise motion Y-axis precise motion compensator;
a Z-axis boss is fixedly arranged on a base of the Z-axis precise motion compensator, a downward stepped hole is formed in the Z-axis boss along the vertical direction, Z-axis piezoelectric ceramics, a Z-axis push rod and a Z-axis spring are sequentially arranged in the stepped hole from bottom to top, and the Z-axis spring is sleeved on the Z-axis push rod for positioning;
The lower hole of the stepped hole is matched with the Z-axis piezoelectric ceramic, and the inner wall of the upper hole of the stepped hole is provided with threads matched with a Z-axis pre-tightening bolt; the Z-axis pre-tightening bolt is connected with the Z-axis boss through the thread, and the end part of the Z-axis pre-tightening bolt pre-tightens and compresses the Z-axis spring;
The Z-axis pre-tightening bolt is arranged in a hollow mode, and the Z-axis micro-motion stage is connected with the Z-axis push rod;
and a Z-axis measuring component for measuring the position of the Z-axis micro-stage.
2. The XYZ three-dimensional precision motion compensator according to claim 1, wherein the Z-axis measuring component is in particular a Z-axis grating scale, and the reading head of the Z-axis grating scale is vertically arranged on the base thereof.
3. An XYZ three-dimensional precision motion compensation system, comprising a host computer and an XYZ three-dimensional precision motion compensator according to any one of claims 1-2;
the upper computer is used for outputting signals to control the corresponding piezoelectric ceramics according to the position of X, Y in the XYZ three-dimensional precision motion compensator and/or the position of a micro-stage of the Z-axis precision motion compensator.
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102324253A (en) * | 2011-06-03 | 2012-01-18 | 中国科学院光电技术研究所 | A parallel micro-positioning platform driven by a piezoelectric ceramic driver and a micro-positioning platform system |
| CN103318839A (en) * | 2013-03-01 | 2013-09-25 | 广东工业大学 | Piezoelectric-ceramics-based high-speed high-precision macro-micro platform and switching method |
| CN105137723A (en) * | 2015-09-27 | 2015-12-09 | 长春工业大学 | Three-dimensional ellipse movement work table for two-photon polymerization processing |
| CN108213992A (en) * | 2018-03-22 | 2018-06-29 | 广东工业大学 | A kind of XY high-precision movement platforms of coplanar decoupling |
| CN108747426A (en) * | 2018-07-16 | 2018-11-06 | 广东工业大学 | A kind of across scale freedom degree parallel connection motion platform of the big stroke of stator altogether |
| CN109129412A (en) * | 2018-10-22 | 2019-01-04 | 广东工业大学 | A kind of two dimension decoupling macro/micromotion platform and its compensation method |
| CN209168747U (en) * | 2019-01-09 | 2019-07-26 | 广东工业大学 | A precision motion compensator, XYZ three-dimensional precision motion compensator and compensation system |
-
2019
- 2019-01-09 CN CN201910020237.9A patent/CN109545271B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102324253A (en) * | 2011-06-03 | 2012-01-18 | 中国科学院光电技术研究所 | A parallel micro-positioning platform driven by a piezoelectric ceramic driver and a micro-positioning platform system |
| CN103318839A (en) * | 2013-03-01 | 2013-09-25 | 广东工业大学 | Piezoelectric-ceramics-based high-speed high-precision macro-micro platform and switching method |
| CN105137723A (en) * | 2015-09-27 | 2015-12-09 | 长春工业大学 | Three-dimensional ellipse movement work table for two-photon polymerization processing |
| CN108213992A (en) * | 2018-03-22 | 2018-06-29 | 广东工业大学 | A kind of XY high-precision movement platforms of coplanar decoupling |
| CN108747426A (en) * | 2018-07-16 | 2018-11-06 | 广东工业大学 | A kind of across scale freedom degree parallel connection motion platform of the big stroke of stator altogether |
| CN109129412A (en) * | 2018-10-22 | 2019-01-04 | 广东工业大学 | A kind of two dimension decoupling macro/micromotion platform and its compensation method |
| CN209168747U (en) * | 2019-01-09 | 2019-07-26 | 广东工业大学 | A precision motion compensator, XYZ three-dimensional precision motion compensator and compensation system |
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