CN109503499A - A kind of Fan get Ta Ni intermediate and preparation method thereof - Google Patents
A kind of Fan get Ta Ni intermediate and preparation method thereof Download PDFInfo
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- CN109503499A CN109503499A CN201811645549.0A CN201811645549A CN109503499A CN 109503499 A CN109503499 A CN 109503499A CN 201811645549 A CN201811645549 A CN 201811645549A CN 109503499 A CN109503499 A CN 109503499A
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- Prior art keywords
- compound
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- sodium
- fan
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- 238000002360 preparation method Methods 0.000 title claims abstract description 36
- 238000006243 chemical reaction Methods 0.000 claims abstract description 82
- 150000001875 compounds Chemical class 0.000 claims abstract description 59
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 25
- 150000002367 halogens Chemical class 0.000 claims abstract description 25
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 21
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 21
- 239000011734 sodium Substances 0.000 claims abstract description 21
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 19
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000011591 potassium Substances 0.000 claims abstract description 17
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 17
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims abstract description 14
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000000694 effects Effects 0.000 claims abstract description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000460 chlorine Substances 0.000 claims abstract description 5
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 4
- 239000011737 fluorine Substances 0.000 claims abstract description 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims abstract description 4
- 230000020477 pH reduction Effects 0.000 claims abstract description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 45
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 36
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 36
- 238000001914 filtration Methods 0.000 claims description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 19
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 18
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 18
- 230000015572 biosynthetic process Effects 0.000 claims description 18
- 238000003786 synthesis reaction Methods 0.000 claims description 18
- 239000002904 solvent Chemical group 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 14
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 14
- 229940126214 compound 3 Drugs 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 12
- 150000001298 alcohols Chemical class 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 12
- 229940125782 compound 2 Drugs 0.000 claims description 11
- 229940125898 compound 5 Drugs 0.000 claims description 11
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 9
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 9
- 230000003197 catalytic effect Effects 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 238000009413 insulation Methods 0.000 claims description 9
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 9
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 claims description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 8
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 claims description 8
- 238000007363 ring formation reaction Methods 0.000 claims description 8
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 8
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 7
- 238000013019 agitation Methods 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 229940125904 compound 1 Drugs 0.000 claims description 7
- 235000019253 formic acid Nutrition 0.000 claims description 7
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910002651 NO3 Inorganic materials 0.000 claims description 6
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- XPOLVIIHTDKJRY-UHFFFAOYSA-N acetic acid;methanimidamide Chemical group NC=N.CC(O)=O XPOLVIIHTDKJRY-UHFFFAOYSA-N 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 6
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 claims description 6
- 150000007530 organic bases Chemical class 0.000 claims description 6
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 6
- -1 surpalite Chemical compound 0.000 claims description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 6
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 5
- PFZOORYCYRPFLK-UHFFFAOYSA-N n-bromo-2-fluoroaniline Chemical compound FC1=CC=CC=C1NBr PFZOORYCYRPFLK-UHFFFAOYSA-N 0.000 claims description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 5
- 125000003944 tolyl group Chemical group 0.000 claims description 5
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 4
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 claims description 3
- WDBQJSCPCGTAFG-QHCPKHFHSA-N 4,4-difluoro-N-[(1S)-3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-pyridin-3-ylpropyl]cyclohexane-1-carboxamide Chemical compound FC1(CCC(CC1)C(=O)N[C@@H](CCN1CCC(CC1)N1C(=NN=C1C)C(C)C)C=1C=NC=CC=1)F WDBQJSCPCGTAFG-QHCPKHFHSA-N 0.000 claims description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 3
- 229910000564 Raney nickel Inorganic materials 0.000 claims description 3
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 claims description 3
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 claims description 3
- 150000007513 acids Chemical class 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 claims description 3
- 229940073608 benzyl chloride Drugs 0.000 claims description 3
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 claims description 3
- 229910000024 caesium carbonate Inorganic materials 0.000 claims description 3
- 239000003153 chemical reaction reagent Substances 0.000 claims description 3
- 239000012320 chlorinating reagent Substances 0.000 claims description 3
- 238000010511 deprotection reaction Methods 0.000 claims description 3
- 239000000428 dust Substances 0.000 claims description 3
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 claims description 3
- RPNNPZHFJPXFQS-UHFFFAOYSA-N methane;rhodium Chemical compound C.[Rh] RPNNPZHFJPXFQS-UHFFFAOYSA-N 0.000 claims description 3
- 230000000802 nitrating effect Effects 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical group ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 claims description 3
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 claims description 3
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004323 potassium nitrate Substances 0.000 claims description 3
- 235000010333 potassium nitrate Nutrition 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 239000004317 sodium nitrate Substances 0.000 claims description 3
- 235000010344 sodium nitrate Nutrition 0.000 claims description 3
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000002585 base Substances 0.000 claims description 2
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- JILPJDVXYVTZDQ-UHFFFAOYSA-N lithium methoxide Chemical compound [Li+].[O-]C JILPJDVXYVTZDQ-UHFFFAOYSA-N 0.000 claims 1
- 150000004702 methyl esters Chemical class 0.000 claims 1
- 125000003431 oxalo group Chemical group 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 235000019441 ethanol Nutrition 0.000 description 9
- 238000010792 warming Methods 0.000 description 9
- 239000000047 product Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000006837 decompression Effects 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 4
- SZUVGFMDDVSKSI-WIFOCOSTSA-N (1s,2s,3s,5r)-1-(carboxymethyl)-3,5-bis[(4-phenoxyphenyl)methyl-propylcarbamoyl]cyclopentane-1,2-dicarboxylic acid Chemical compound O=C([C@@H]1[C@@H]([C@](CC(O)=O)([C@H](C(=O)N(CCC)CC=2C=CC(OC=3C=CC=CC=3)=CC=2)C1)C(O)=O)C(O)=O)N(CCC)CC(C=C1)=CC=C1OC1=CC=CC=C1 SZUVGFMDDVSKSI-WIFOCOSTSA-N 0.000 description 3
- ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 3
- UNILWMWFPHPYOR-KXEYIPSPSA-M 1-[6-[2-[3-[3-[3-[2-[2-[3-[[2-[2-[[(2r)-1-[[2-[[(2r)-1-[3-[2-[2-[3-[[2-(2-amino-2-oxoethoxy)acetyl]amino]propoxy]ethoxy]ethoxy]propylamino]-3-hydroxy-1-oxopropan-2-yl]amino]-2-oxoethyl]amino]-3-[(2r)-2,3-di(hexadecanoyloxy)propyl]sulfanyl-1-oxopropan-2-yl Chemical compound O=C1C(SCCC(=O)NCCCOCCOCCOCCCNC(=O)COCC(=O)N[C@@H](CSC[C@@H](COC(=O)CCCCCCCCCCCCCCC)OC(=O)CCCCCCCCCCCCCCC)C(=O)NCC(=O)N[C@H](CO)C(=O)NCCCOCCOCCOCCCNC(=O)COCC(N)=O)CC(=O)N1CCNC(=O)CCCCCN\1C2=CC=C(S([O-])(=O)=O)C=C2CC/1=C/C=C/C=C/C1=[N+](CC)C2=CC=C(S([O-])(=O)=O)C=C2C1 UNILWMWFPHPYOR-KXEYIPSPSA-M 0.000 description 3
- OJRUSAPKCPIVBY-KQYNXXCUSA-N C1=NC2=C(N=C(N=C2N1[C@H]3[C@@H]([C@@H]([C@H](O3)COP(=O)(CP(=O)(O)O)O)O)O)I)N Chemical compound C1=NC2=C(N=C(N=C2N1[C@H]3[C@@H]([C@@H]([C@H](O3)COP(=O)(CP(=O)(O)O)O)O)O)I)N OJRUSAPKCPIVBY-KQYNXXCUSA-N 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 3
- LNUFLCYMSVYYNW-ZPJMAFJPSA-N [(2r,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[(2r,3r,4s,5r,6r)-6-[[(3s,5s,8r,9s,10s,13r,14s,17r)-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-3-yl]oxy]-4,5-disulfo Chemical compound O([C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1[C@@H](COS(O)(=O)=O)O[C@H]([C@@H]([C@H]1OS(O)(=O)=O)OS(O)(=O)=O)O[C@@H]1C[C@@H]2CC[C@H]3[C@@H]4CC[C@@H]([C@]4(CC[C@@H]3[C@@]2(C)CC1)C)[C@H](C)CCCC(C)C)[C@H]1O[C@H](COS(O)(=O)=O)[C@@H](OS(O)(=O)=O)[C@H](OS(O)(=O)=O)[C@H]1OS(O)(=O)=O LNUFLCYMSVYYNW-ZPJMAFJPSA-N 0.000 description 3
- 229940125773 compound 10 Drugs 0.000 description 3
- 229940126543 compound 14 Drugs 0.000 description 3
- 229940125758 compound 15 Drugs 0.000 description 3
- 229940126142 compound 16 Drugs 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 2
- SWWQQSDRUYSMAR-UHFFFAOYSA-N 1-[(4-hydroxyphenyl)methyl]-1,2,3,4-tetrahydroisoquinoline-6,7-diol;hydrochloride Chemical group Cl.C1=CC(O)=CC=C1CC1C2=CC(O)=C(O)C=C2CCN1 SWWQQSDRUYSMAR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000006278 bromobenzyl group Chemical group 0.000 description 2
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229940125797 compound 12 Drugs 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- BVWTXUYLKBHMOX-UHFFFAOYSA-N methyl vanillate Chemical group COC(=O)C1=CC=C(O)C(OC)=C1 BVWTXUYLKBHMOX-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UHTHHESEBZOYNR-UHFFFAOYSA-N vandetanib Chemical compound COC1=CC(C(/N=CN2)=N/C=3C(=CC(Br)=CC=3)F)=C2C=C1OCC1CCN(C)CC1 UHTHHESEBZOYNR-UHFFFAOYSA-N 0.000 description 2
- 229960000241 vandetanib Drugs 0.000 description 2
- AOSZTAHDEDLTLQ-AZKQZHLXSA-N (1S,2S,4R,8S,9S,11S,12R,13S,19S)-6-[(3-chlorophenyl)methyl]-12,19-difluoro-11-hydroxy-8-(2-hydroxyacetyl)-9,13-dimethyl-6-azapentacyclo[10.8.0.02,9.04,8.013,18]icosa-14,17-dien-16-one Chemical compound C([C@@H]1C[C@H]2[C@H]3[C@]([C@]4(C=CC(=O)C=C4[C@@H](F)C3)C)(F)[C@@H](O)C[C@@]2([C@@]1(C1)C(=O)CO)C)N1CC1=CC=CC(Cl)=C1 AOSZTAHDEDLTLQ-AZKQZHLXSA-N 0.000 description 1
- IWZSHWBGHQBIML-ZGGLMWTQSA-N (3S,8S,10R,13S,14S,17S)-17-isoquinolin-7-yl-N,N,10,13-tetramethyl-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1H-cyclopenta[a]phenanthren-3-amine Chemical compound CN(C)[C@H]1CC[C@]2(C)C3CC[C@@]4(C)[C@@H](CC[C@@H]4c4ccc5ccncc5c4)[C@@H]3CC=C2C1 IWZSHWBGHQBIML-ZGGLMWTQSA-N 0.000 description 1
- NMTGXHFIJPOUOC-UHFFFAOYSA-N CN1CCNCC1.N1=CC=CC=C1 Chemical compound CN1CCNCC1.N1=CC=CC=C1 NMTGXHFIJPOUOC-UHFFFAOYSA-N 0.000 description 1
- 229940126657 Compound 17 Drugs 0.000 description 1
- 239000002118 L01XE12 - Vandetanib Substances 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- XFDJMIHUAHSGKG-UHFFFAOYSA-N chlorethoxyfos Chemical compound CCOP(=S)(OCC)OC(Cl)C(Cl)(Cl)Cl XFDJMIHUAHSGKG-UHFFFAOYSA-N 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 230000017858 demethylation Effects 0.000 description 1
- 238000010520 demethylation reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940043355 kinase inhibitor Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical group [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- REPVNSJSTLRQEQ-UHFFFAOYSA-N n,n-dimethylacetamide;n,n-dimethylformamide Chemical compound CN(C)C=O.CN(C)C(C)=O REPVNSJSTLRQEQ-UHFFFAOYSA-N 0.000 description 1
- 208000002154 non-small cell lung carcinoma Diseases 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000003757 phosphotransferase inhibitor Substances 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- 208000029729 tumor suppressor gene on chromosome 11 Diseases 0.000 description 1
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C201/00—Preparation of esters of nitric or nitrous acid or of compounds containing nitro or nitroso groups bound to a carbon skeleton
- C07C201/06—Preparation of nitro compounds
- C07C201/08—Preparation of nitro compounds by substitution of hydrogen atoms by nitro groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
- C07C205/49—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
- C07C205/57—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C205/59—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton the carbon skeleton being further substituted by singly-bound oxygen atoms
- C07C205/60—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton the carbon skeleton being further substituted by singly-bound oxygen atoms in ortho-position to the carboxyl group, e.g. nitro-salicylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C227/00—Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C227/04—Formation of amino groups in compounds containing carboxyl groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/52—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
- C07C229/54—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring
- C07C229/64—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring the carbon skeleton being further substituted by singly-bound oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/347—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups
- C07C51/367—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups by introduction of functional groups containing oxygen only in singly bound form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C65/00—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
- C07C65/01—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups
- C07C65/03—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/02—Esters of acyclic saturated monocarboxylic acids having the carboxyl group bound to an acyclic carbon atom or to hydrogen
- C07C69/12—Acetic acid esters
- C07C69/14—Acetic acid esters of monohydroxylic compounds
- C07C69/145—Acetic acid esters of monohydroxylic compounds of unsaturated alcohols
- C07C69/157—Acetic acid esters of monohydroxylic compounds of unsaturated alcohols containing six-membered aromatic rings
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- C07D239/00—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
- C07D239/70—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings condensed with carbocyclic rings or ring systems
- C07D239/72—Quinazolines; Hydrogenated quinazolines
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- C07D239/70—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings condensed with carbocyclic rings or ring systems
- C07D239/72—Quinazolines; Hydrogenated quinazolines
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- C07D239/88—Oxygen atoms
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- C07D239/70—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings condensed with carbocyclic rings or ring systems
- C07D239/72—Quinazolines; Hydrogenated quinazolines
- C07D239/86—Quinazolines; Hydrogenated quinazolines with hetero atoms directly attached in position 4
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Abstract
The present invention provides a kind of Fan get Ta Ni intermediate and preparation method thereof, the Fan get Ta Ni intermediate by compound 8 the sodium methoxide or lithium metal, sodium, potassium the effects of under obtain through 9 acidifications:
Description
Technical field:
The present invention relates to a kind of preparation methods of Fan get Ta Ni intermediate, belong to pharmaceutical technology field.
Background technique:
Fan get Ta Ni (vandetanib) chemical name: 4- (4- bromo-2-fluoroanilino) -6- methoxyl group -7- [(1- methyl piperazine
Pyridine -4- base) methoxyl group] quinazoline, it is a kind of oral small molecule multiple target point butyric acid kinase inhibitor, has to non-small cell lung cancer
There is good therapeutic effect, is researched and developed by AstraZeneca pharmaceutical Co. Ltd, Britain (AstraZeneca).Beauty is obtained in April, 2011
State FDA approval listing, trade name Zactima.The synthesis of Fan get Ta Ni is related to key intermediate as shown in structural formula 1:
More publications include patent WO2003039511, WO2005013988, WO2010028254, CN10253217,
CN102070608, CN1876650 and document European Journal of Medicinal Chemistry, 144,740-
750;2018;By Otvagin,Vasilii F.et al,Bioorganic&Medicinal Chemistry Letters,24
(17),4080-4083;2014;By Lim,Chae Jo et al,Jingxi Huagong Zhongjianti,41(6),41-
43;2011;The synthetic route of the reports such as By Li, Long et al all the following steps are included:
Wherein, the synthesis of compound 19 mainly has two lines:
Method one: it connects amine through hydroxyl protection, nitrification, reduction, cyclization, chloro using vanillic acid methyl esters as starting material and is produced
Product 19, as follows:
Starting material vanillic acid methyl esters are expensive in the route, and product cost is high, and there are demethyl impurities in route.
Method two: using vanillic aldehyde as starting material, through hydroxyl protection, aldehyde radical itrile group, nitrification, reduction, with DMF-DMA and
One step cyclization of amine obtains 19, as follows:
When nitro restores in the route can product cyan-hydrolysis impurity, and the step yield is not high, and product cost is high, equally with
Method one can equally have demethyl impurity.
Summary of the invention:
The purpose of the present invention is a kind of preparation method of Fan get Ta Ni intermediate in view of the above problems, reaction conditions
Mildly, yield is higher, and supplementary material is cheap and easy to get, is suitble to industrialized production.
Above-mentioned purpose is realized by following technical scheme:
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein R3For lithium or sodium or potassium.
The preparation method of above-mentioned Fan get Ta Ni intermediate, this method are as follows:
Compound 8 obtains under sodium methoxide or lithium metal, sodium, potassium effect through the acidification of compound 9:
Wherein X is halogen, and R3 is lithium or sodium or potassium;Solvent used in acidization is methanol, and alkali used is first
One or more of lithium alkoxide, sodium methoxide, potassium methoxide or lithium metal, metallic sodium, metallic potassium.
The preparation method of the Fan get Ta Ni intermediate, the compound 8 the preparation method comprises the following steps:
(1) it is thrown in acetic acid with P-hydroxybenzoic acid, hydrobromic acid is added, 20~30 DEG C of dropwise addition hydrogen peroxide drip and finish insulation reaction 6
~10 hours, TLC monitored fully reacting, added water, agitation and filtration, dry compound 1;
(2) 1 benzyl chloride of compound, cylite, iodate benzyl are reacted under acid binding agent effect or are directly reacted with aceticanhydride
To compound 2;
(3) compound 2 obtains compound 3 through nitrification;
(4) compound 3 restores to obtain compound 4 through nitro;
(5) compound 4 obtains compound 5 through cyclization;
(6) compound 5 obtains compound 6 through chloro;
(7) compound 6 connects the bromo- 2- fluoroaniline of 4- and obtains compound 7;
(8) deprotection of compound 7 obtains compound 8;
Specific reaction route is as follows:
Wherein X is the halogens such as fluorine, chlorine, bromine, iodine, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2Or-
CH2C6H5, R2For-CH2C6H5Or-COCH3;
In the synthesis process of compound 2, lower alcohols of the reaction dissolvent selected from C1~C4, acetone, butanone, one in DMF
Kind is a variety of, and 50~150 DEG C of reaction temperature;Acid binding agent used be selected from one of triethylamine, diisopropylethylamine, pyridine or
It is a variety of or be selected from one of sodium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide
Or it is a variety of;
In the synthesis process of compound 3, nitrating agent used is in fuming nitric aicd, concentrated nitric acid, dust technology, nitrate
One or more, wherein nitrate includes lithium nitrate, sodium nitrate, potassium nitrate;Reaction dissolvent used is selected from methylene chloride, acetic acid
One or both of, 20~100 DEG C of reaction temperature;
Non-catalytic hydrogenating reduction system or catalytic hydrogenating reduction system are used in the reaction of the synthesis of compound 4: wherein non-
Catalytic hydrogenating reduction system uses iron powder/hydrochloric acid or vulcanized sodium, hydrazine hydrate reduction agent, and reaction dissolvent used is selected from C1~C4
One of lower alcohols solvent or a variety of;Catalyst used in catalytic hydrogenating reduction system is Raney's nickel, palladium carbon, hydrogen-oxygen
Change palladium/carbon, platinum carbon or rhodium carbon, the pressure limit of hydrogen is in 0.1~1.0MPa, and the dosage of catalyst is 0.1~10%w/w, instead
Answering temperature is 20~60 DEG C, and reaction dissolvent used is selected from one of lower alcohols solvent of C1~C4 or a variety of;
Cyclization reagent is selected from formamidine acetate, formic acid carbonamidine, first formic acid triethyl, Yuan Jia in the reaction of the synthesis of compound 5
One of sour trimethyl is a variety of;Reaction dissolvent be selected from C1~C4 one of lower alcohols, ketone or acids solvent or
It is a variety of or;40~100 DEG C of reaction temperature;
In the reaction of the synthesis of compound 6 chlorinating agent be selected from phosphorus pentachloride, phosphorus trichloride, phosphorus oxychloride, thionyl chloride,
One of oxalyl chloride, phosgene, surpalite, triphosgene are a variety of;It includes DMF, triethylamine, two that catalysts, which are selected from organic base,
One of wopropyl ethyl amine, pyridine etc. are a variety of;Reaction dissolvent is selected from toluene, tetrahydrofuran, acetonitrile, dioxane, acetic acid
One of non-protonic solvents such as ethyl ester are a variety of;Reaction temperature is 20~110 DEG C;
In the reaction of the synthesis of compound 7 catalysts be selected from organic base include DMF, triethylamine, diisopropylethylamine,
One of pyridine etc. is a variety of;It is non-proton that reaction dissolvent is selected from toluene, tetrahydrofuran, acetonitrile, dioxane, ethyl acetate etc.
One of property solvent is a variety of;Reaction temperature is 20~110 DEG C;
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2
Or-CH2C6H5, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2
Or-CH2C6H5, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen.
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein R3For lithium or sodium or potassium.
The utility model has the advantages that
1. the present invention can effectively avoid the side reactions such as demethylation in technical process, be conducive to the control of product quality;
2. the mild condition of preparation I, yield is higher, and supplementary material is cheap and easy to get, is suitble to industrialized production;
3. each step reaction yield of the invention is higher, auxiliary material is less, and overall cost is lower, is suitble to industrialized production;
4. having opened up Fan get Ta Ni important intermediate the present invention provides the intermediate of the new synthesis Fan get Ta Ni of 7 classes
Research field.
Specific embodiment:
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein R3For lithium or sodium or potassium.
The preparation method of above-mentioned Fan get Ta Ni intermediate, this method are as follows:
Compound 8 obtains under sodium methoxide or lithium metal, sodium, potassium effect through the acidification of compound 9:
Wherein X is halogen, and R3 is lithium or sodium or potassium;Solvent used in acidization is methanol, and alkali used is first
One or more of lithium alkoxide, sodium methoxide, potassium methoxide or lithium metal, metallic sodium, metallic potassium.
The preparation method of the Fan get Ta Ni intermediate, the compound 8 the preparation method comprises the following steps:
(1) it is thrown in acetic acid with P-hydroxybenzoic acid, hydrobromic acid is added, 20~30 DEG C of dropwise addition hydrogen peroxide drip and finish insulation reaction 6
~10 hours, TLC monitored fully reacting, added water, agitation and filtration, dry compound 1;
(2) 1 benzyl chloride of compound, cylite, iodate benzyl are reacted under acid binding agent effect or are directly reacted with aceticanhydride
To compound 2;
(3) compound 2 obtains compound 3 through nitrification;
(4) compound 3 restores to obtain compound 4 through nitro;
(5) compound 4 obtains compound 5 through cyclization;
(6) compound 5 obtains compound 6 through chloro;
(7) compound 6 connects the bromo- 2- fluoroaniline of 4- and obtains compound 7;
(8) deprotection of compound 7 obtains compound 8;
Specific reaction route is as follows:
Wherein X is the halogens such as fluorine, chlorine, bromine, iodine, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2Or-
CH2C6H5, R2For-CH2C6H5Or-COCH3;
In the synthesis process of compound 2, lower alcohols of the reaction dissolvent selected from C1~C4, acetone, butanone, one in DMF
Kind is a variety of, and 50~150 DEG C of reaction temperature;Acid binding agent used be selected from one of triethylamine, diisopropylethylamine, pyridine or
It is a variety of or be selected from one of sodium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide
Or it is a variety of;
In the synthesis process of compound 3, nitrating agent used is in fuming nitric aicd, concentrated nitric acid, dust technology, nitrate
One or more, wherein nitrate includes lithium nitrate, sodium nitrate, potassium nitrate;Reaction dissolvent used is selected from methylene chloride, acetic acid
One or both of, 20~100 DEG C of reaction temperature;
Non-catalytic hydrogenating reduction system or catalytic hydrogenating reduction system are used in the reaction of the synthesis of compound 4: wherein non-
Catalytic hydrogenating reduction system uses iron powder/hydrochloric acid or vulcanized sodium, hydrazine hydrate reduction agent, and reaction dissolvent used is selected from C1~C4
One of lower alcohols solvent or a variety of;Catalyst used in catalytic hydrogenating reduction system is Raney's nickel, palladium carbon, hydrogen-oxygen
Change palladium/carbon, platinum carbon or rhodium carbon, the pressure limit of hydrogen is in 0.1~1.0MPa, and the dosage of catalyst is 0.1~10%w/w, instead
Answering temperature is 20~60 DEG C, and reaction dissolvent used is selected from one of lower alcohols solvent of C1~C4 or a variety of;
Cyclization reagent is selected from formamidine acetate, formic acid carbonamidine, first formic acid triethyl, Yuan Jia in the reaction of the synthesis of compound 5
One of sour trimethyl is a variety of;Reaction dissolvent be selected from C1~C4 one of lower alcohols, ketone or acids solvent or
It is a variety of or;40~100 DEG C of reaction temperature;
In the reaction of the synthesis of compound 6 chlorinating agent be selected from phosphorus pentachloride, phosphorus trichloride, phosphorus oxychloride, thionyl chloride,
One of oxalyl chloride, phosgene, surpalite, triphosgene are a variety of;It includes DMF, triethylamine, two that catalysts, which are selected from organic base,
One of wopropyl ethyl amine, pyridine etc. are a variety of;Reaction dissolvent is selected from toluene, tetrahydrofuran, acetonitrile, dioxane, acetic acid
One of non-protonic solvents such as ethyl ester are a variety of;Reaction temperature is 20~110 DEG C;
In the reaction of the synthesis of compound 7 catalysts be selected from organic base include DMF, triethylamine, diisopropylethylamine,
One of pyridine etc. is a variety of;It is non-proton that reaction dissolvent is selected from toluene, tetrahydrofuran, acetonitrile, dioxane, ethyl acetate etc.
One of property solvent is a variety of;Reaction temperature is 20~110 DEG C;
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2
Or-CH2C6H5, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2
Or-CH2C6H5, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein X is halogen.
A kind of Fan get Ta Ni intermediate, structural formula are as follows:
Wherein R3For lithium or sodium or potassium.
The preparation of compound 1:
138g P-hydroxybenzoic acid (1mol) is put into 552ml acetic acid, is added 260ml hydrobromic acid (47%), and temperature control 20~
30% hydrogen peroxide of 30 DEG C of dropwise addition 170g drips and finishes insulation reaction 6~10 hours, and TLC monitors fully reacting, and 500ml water is added, stirs
Mix filtering, dry 182.5g compound 1.
The preparation of compound 2:
80g compound 1 (0.369mol) is put into the DMF of 480ml, 128g (0.928mol) potassium carbonate is added, at room temperature
It is added dropwise 157.6g bromobenzyl (0.922mol), drop, which finishes, is warming up to 80~90 DEG C of reactions 10~12 hours, and TLC monitors fully reacting.It crosses
Filter, filtrate decompression is concentrated to dryness, and is added 500ml water, agitation and filtration, dry 151g compound 2.
The preparation of compound 3:
90g compound 2 (0.227mol) is put into 540ml methylene chloride, 0~10 DEG C of dropwise addition 19.4g fuming nitric aicd of temperature control
(0.296mol) drips and finishes insulation reaction 6~8 hours, and HPLC monitors fully reacting.100ml water, stirring are added into reaction system
Layering, the saturated sodium bicarbonate solution of organic layer 100ml × 2 wash, and anhydrous sodium sulfate is dry, are concentrated to dryness slightly
Product.
Purifying: 300ml ethyl acetate is added into crude product and 200ml petroleum ether, temperature rising reflux container are cooled to 10~20
DEG C, filtering, dry 73.5g compound 3.
The preparation (catalytic hydrogenation system) of compound 4:
60g compound 3 (0.136mol) is added into autoclave, the 5% palladium charcoal of 1.2g, 240ml methanol finishes, will be anti-
It answers kettle nitrogen replacement 2 times, then with after hydrogen displacement 2 times, is reacted at room temperature 6~8 hours after debugging Hydrogen Vapor Pressure to 0.3MPa, TLC
Fully reacting is monitored, palladium charcoal is recovered by filtration in reaction solution, and filtrate decompression is concentrated into small size, is cooled to -10~-5 DEG C, and filtering is done
It is dry to obtain 53.4g compound 4.
The preparation (catalytic hydrogenation system) of compound 4:
40g compound 3 (0.09mol) is put into 240ml methanol, 40ml acetic acid is added, is warming up to 50~60 DEG C, in batches
16g (0.286mol) iron powder is added in secondary temperature control, finishes insulation reaction 8~10 hours, and TLC monitors fully reacting.It filters, filters while hot
Liquid is concentrated to dryness, and 200ml methylene chloride is added, is filtered to remove iron cement, and filtrate decompression is concentrated to dryness, and 40ml methanol is added,
It is cooled to -10~-5 DEG C of agitation and filtrations, dry 35.2g compound 4.
Compound 5 must be prepared:
48g compound 4 (0.117mol) is put into 288ml methanol, is added 24.1g formamidine acetate (0.234mol), is risen
For temperature to back flow reaction 20~24 hours, TLC monitored fully reacting.It is cooled to room temperature, filtering, dry 35.5g compound 5.
The preparation of compound 6:
30g compound 5 (0.09mol) is put into 180ml toluene, 9.2g triethylamine (0.09mol) and 13.9g tri- is added
Chlorethoxyfos (0.09mol) are warming up to 80~90 DEG C and react 4~6 hours, and TLC monitors fully reacting, and reaction product 6 is not taken out, and expect
Liquid is cooled to 50~60 DEG C for use.
The preparation of compound 7:
The bromo- 2- fluoroaniline (0.09mol) of 4- of 17.3g is added in batches into above-mentioned 50~60 DEG C of feed liquid, finishes, protects
Temperature reaction 1 hour is cooled to room temperature and 180ml isopropanol is added, and stirring washes out solid, filtering, dry 37.9g compound 7.
The preparation of compound 8:
35g compound 7 (0.07mol) is put into 350ml acetic acid, 70ml concentrated hydrochloric acid is added, is warming up to back flow reaction 10
~12 hours, TLC monitored fully reacting.It is concentrated under reduced pressure into small size, 350ml water is added, filters to obtain wet product.Wet product is put into
In 200ml ethyl alcohol, triethylamine tune PH to 7~8, filtering, dry 24.6g compound 8 are added dropwise at room temperature.
I preparation:
20g compound 8 (0.048mol) is put into 200ml methanol, 5g methanol is added in batches at 10~20 DEG C of temperature control
Sodium (0.093mol), finishes, and is warming up to 40~50 DEG C and reacts 2~3 hours, TLC monitors fully reacting.It is cooled to 10~20 DEG C of drops
Add hydrochloric acid tune PH to 5~6, filtering, washing, dry 13.1g I.
Embodiment 2 is carried out according to following proposal:
The preparation of compound 9:
50g compound 1 (0.23mol) is put into 300ml methanol, 41g thionyl chloride (0.345mol) is added dropwise at room temperature,
Drop, which finishes, is warming up to back flow reaction 4~6 hours, is concentrated to dryness, and 200ml ice water agitation and filtration, dry 43.3g chemical combination is added
Object 9.
The preparation of compound 10:
By in the DMF of 40g compound 9 (0.173mol) investment 320ml, it is added 35.8g potassium carbonate (0.259mol), room temperature
Lower dropwise addition 35.5g bromobenzyl (0.208mol), drop, which finishes, is warming up to 80~90 DEG C of reactions 10~12 hours, and TLC monitors fully reacting.It crosses
Filter, filtrate decompression is concentrated to dryness, and is added 500ml water, agitation and filtration, dry 48.7g compound 10.
The preparation of compound 11:
40g compound 10 (0.125mol) is put into 540ml methylene chloride, 0~10 DEG C of dropwise addition 12.3g smoke nitre of temperature control
Sour (0.187mol) drips and finishes insulation reaction 6~8 hours, and HPLC monitors fully reacting.100ml water is added into reaction system, stirs
Layering is mixed, the saturated sodium bicarbonate solution of organic layer 100ml × 2 washs, and anhydrous sodium sulfate is dry, is concentrated to dryness
41.8g compound 11.
The preparation of compound 12:
40g compound 11 (0.109mol) is added into autoclave, the 5% palladium charcoal of 0.8g, 240ml methanol finishes, will be anti-
It answers kettle nitrogen replacement 2 times, then with after hydrogen displacement 2 times, is reacted at room temperature 6~8 hours after debugging Hydrogen Vapor Pressure to 0.3MPa, TLC
Fully reacting is monitored, palladium charcoal is recovered by filtration in reaction solution, and filtrate decompression is concentrated into small size, is cooled to -10~-5 DEG C, and filtering is done
It is dry to obtain 31.6g compound 11.
The preparation of compound 5:
30g compound 12 (0.089mol) is put into 180ml methanol, is added 13.8g formamidine acetate (0.134mol), is risen
For temperature to back flow reaction 20~24 hours, TLC monitored fully reacting.It is cooled to room temperature, filtering, dry 26.8g compound 5.
Embodiment 3 is carried out according to following proposal:
The preparation of compound 13:
50g compound 1 (0.23mol) is put into 300ml acetic acid, is added 47g aceticanhydride (0.461mol), is warming up to reflux
Reaction 20~24 hours, TLC detect fully reacting.It is cooled to room temperature, is added 600ml water, filtering, dry 51.4g compound
13。
The preparation of compound 14:
50g compound 13 (0.193mol) is put into 500ml methylene chloride, 0~10 DEG C of dropwise addition 19g fuming nitric aicd of temperature control
(0.29mol) drips and finishes insulation reaction 6~8 hours, and HPLC monitors fully reacting.100ml water, stirring are added into reaction system
Layering, the saturated sodium bicarbonate solution of organic layer 100ml × 2 wash, and anhydrous sodium sulfate is dry, are concentrated to dryness
53.7g compound 14.
The preparation of compound 15:
50g compound 14 (0.164mol) is added into autoclave, the 5% palladium charcoal of 1g, 300ml methanol is finished, will be reacted
Kettle nitrogen replacement 2 times, then with after hydrogen displacement 2 times, reacted at room temperature 6~8 hours after debugging Hydrogen Vapor Pressure to 0.3MPa, TLC prison
Fully reacting is controlled, palladium charcoal is recovered by filtration in reaction solution, and filtrate decompression is concentrated into small size, is cooled to -10~-5 DEG C, filtering, drying
Obtain 42.5g compound 15.
The preparation of compound 16:
40g compound 15 (0.146mol) is put into 240ml methanol, is added 30g formamidine acetate (0.291mol), heating
To back flow reaction 20~24 hours, TLC monitored fully reacting.It is cooled to room temperature, filtering, dry 36.8g compound 16.
The preparation of compound 17:
Will 30g compound 16 (0.106mol) put into 180ml toluene in, be added 10.7g triethylamine (0.106mol) and
16.2g phosphorus oxychloride (0.106mol) is warming up to 80~90 DEG C and reacts 4~6 hours, and TLC monitors fully reacting, reaction product 6
It does not take out, feed liquid is cooled to 50~60 DEG C for use.
The preparation of compound 18:
The bromo- 2- fluoroaniline (0.106mol) of 4- of 20.1g is added in batches into above-mentioned 50~60 DEG C of feed liquid, finishes,
It insulation reaction 1 hour, is cooled to room temperature and 180ml isopropanol is added, stirring washes out solid, filtering, dry 41.8g compound
18。
The preparation of compound 8:
40g compound 18 (0.088mol) is put into 200ml methanol and 200ml water, it is molten that potassium hydroxide is added dropwise at room temperature
Liquid (dissolution of 60ml water is added in 12.3g potassium hydroxide (0.22mol)), drips and finishes room temperature reaction 10~12 hours, TLC detection has been reacted
Entirely.Hydrochloric acid tune PH to 5~6, filtering, dry 31.7g compound 8 are added dropwise at room temperature.
The above is only highly preferred embodiment of the present invention, the method for the present invention includes but be not limited to the above embodiments, the present invention
Unaccomplished matter, belong to the common knowledge of those skilled in the art.
Claims (10)
1. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein R3For lithium or sodium or potassium.
2. a kind of preparation method of Fan get Ta Ni intermediate described in claim 1, it is characterized in that: this method are as follows:
Compound 8 obtains under sodium methoxide or lithium metal, sodium, potassium effect through the acidification of compound 9:
Wherein X is halogen, and R3 is lithium or sodium or potassium;Solvent used in acidization be methanol, alkali used be lithium methoxide,
One or more of sodium methoxide, potassium methoxide or lithium metal, metallic sodium, metallic potassium.
3. the preparation method of Fan get Ta Ni intermediate according to claim 2, it is characterized in that: the preparation of the compound 8
Method are as follows:
(1) it is thrown in acetic acid with P-hydroxybenzoic acid, hydrobromic acid is added, 20~30 DEG C of dropwise addition hydrogen peroxide drip and finish insulation reaction 6~10
Hour, TLC monitors fully reacting, adds water, agitation and filtration, dry compound 1;
(2) 1 benzyl chloride of compound, cylite, iodate benzyl acid binding agent effect under react or directly with aceticanhydride reaction
Close object 2;
(3) compound 2 obtains compound 3 through nitrification;
(4) compound 3 restores to obtain compound 4 through nitro;
(5) compound 4 obtains compound 5 through cyclization;
(6) compound 5 obtains compound 6 through chloro;
(7) compound 6 connects the bromo- 2- fluoroaniline of 4- and obtains compound 7;
(8) deprotection of compound 7 obtains compound 8;
Specific reaction route is as follows:
Wherein X is the halogens such as fluorine, chlorine, bromine, iodine, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2Or-
CH2C6H5, R2For-CH2C6H5Or-COCH3;
In the synthesis process of compound 2, reaction dissolvent be selected from one of the lower alcohols of C1~C4, acetone, butanone, DMF or
It is a variety of, 50~150 DEG C of reaction temperature;Acid binding agent used is selected from one of triethylamine, diisopropylethylamine, pyridine or a variety of
Or it is selected from one of sodium bicarbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide or more
Kind;
In the synthesis process of compound 3, nitrating agent used is selected from one of fuming nitric aicd, concentrated nitric acid, dust technology, nitrate
Or it is a variety of, wherein nitrate includes lithium nitrate, sodium nitrate, potassium nitrate;Reaction dissolvent used is in methylene chloride, acetic acid
One or two, 20~100 DEG C of reaction temperature;
Non-catalytic hydrogenating reduction system or catalytic hydrogenating reduction system are used in the reaction of the synthesis of compound 4: wherein non-catalytic
Hydrogenating reduction system uses iron powder/hydrochloric acid or vulcanized sodium, hydrazine hydrate reduction agent, and reaction dissolvent used is selected from the low of C1~C4
One of grade alcohols solvent is a variety of;Catalyst used in catalytic hydrogenating reduction system is Raney's nickel, palladium carbon, hydroxide
Palladium/carbon, platinum carbon or rhodium carbon, for the pressure limit of hydrogen in 0.1~1.0MPa, the dosage of catalyst is 0.1~10%w/w, reaction
Temperature is 20~60 DEG C, and reaction dissolvent used is selected from one of lower alcohols solvent of C1~C4 or a variety of;
Cyclization reagent is selected from formamidine acetate, formic acid carbonamidine, first formic acid triethyl, first formic acid three in the reaction of the synthesis of compound 5
One of methyl esters is a variety of;Reaction dissolvent is selected from one of lower alcohols, ketone or acids solvent of C1~C4 or a variety of
Or;40~100 DEG C of reaction temperature;
Chlorinating agent is selected from phosphorus pentachloride, phosphorus trichloride, phosphorus oxychloride, thionyl chloride, oxalyl in the reaction of the synthesis of compound 6
One of chlorine, phosgene, surpalite, triphosgene are a variety of;It includes DMF, triethylamine, diisopropyl that catalysts, which are selected from organic base,
One of base ethamine, pyridine etc. are a variety of;Reaction dissolvent is selected from toluene, tetrahydrofuran, acetonitrile, dioxane, ethyl acetate
One of equal non-protonic solvents are a variety of;Reaction temperature is 20~110 DEG C;
It includes DMF, triethylamine, diisopropylethylamine, pyridine that catalysts, which are selected from organic base, in the reaction of the synthesis of compound 7
Deng one of or it is a variety of;It is molten that reaction dissolvent is selected from the aprotics such as toluene, tetrahydrofuran, acetonitrile, dioxane, ethyl acetate
One of agent is a variety of;Reaction temperature is 20~110 DEG C.
4. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2Or-
CH2C6H5, R2For-CH2C6H5Or-COCH3。
5. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein X is halogen, R1For H or-CH3Or-CH2CH3Or-CH2CH2CH3Or-CH (CH3)2Or-
CH2C6H5, R2For-CH2C6H5Or-COCH3。
6. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
7. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
8. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:
Wherein X is halogen, R2For-CH2C6H5Or-COCH3。
9. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:Wherein X is halogen
Element.
10. a kind of Fan get Ta Ni intermediate, it is characterized in that: its structural formula are as follows:Wherein R3For
Lithium or sodium or potassium.
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