CN109374659A - A kind of localization method of short wave length X-ray diffraction test sample - Google Patents
A kind of localization method of short wave length X-ray diffraction test sample Download PDFInfo
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- CN109374659A CN109374659A CN201811546826.2A CN201811546826A CN109374659A CN 109374659 A CN109374659 A CN 109374659A CN 201811546826 A CN201811546826 A CN 201811546826A CN 109374659 A CN109374659 A CN 109374659A
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- 238000012360 testing method Methods 0.000 title claims abstract description 91
- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000002441 X-ray diffraction Methods 0.000 title claims abstract description 37
- 230000004807 localization Effects 0.000 title claims abstract description 9
- 230000005540 biological transmission Effects 0.000 claims abstract description 27
- 239000002356 single layer Substances 0.000 claims abstract description 9
- 238000001228 spectrum Methods 0.000 claims description 29
- 238000005259 measurement Methods 0.000 claims description 19
- 239000013078 crystal Substances 0.000 claims description 16
- 238000009499 grossing Methods 0.000 claims description 15
- 238000013519 translation Methods 0.000 claims description 9
- 239000004576 sand Substances 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims 3
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- 229910001069 Ti alloy Inorganic materials 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000001815 facial effect Effects 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001683 neutron diffraction Methods 0.000 description 2
- 238000009659 non-destructive testing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000005469 synchrotron radiation Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
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Abstract
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CN201711462753 | 2017-12-28 | ||
CN2017114627534 | 2017-12-28 |
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CN109374659A true CN109374659A (en) | 2019-02-22 |
CN109374659B CN109374659B (en) | 2020-12-29 |
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Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110618148A (en) * | 2019-09-19 | 2019-12-27 | 西安交通大学 | Adjusting device and method based on monochromatic X-ray single crystal stress measurement |
CN111664978A (en) * | 2020-05-28 | 2020-09-15 | 哈尔滨工业大学 | Residual stress characterization method for curved surface special-shaped part |
CN112763432A (en) * | 2020-12-25 | 2021-05-07 | 中国科学院上海高等研究院 | Control method for automatically collecting absorption spectrum experimental data |
CN113176285A (en) * | 2021-04-23 | 2021-07-27 | 中国兵器工业第五九研究所 | Nondestructive testing method for residual stress in short-wavelength characteristic X-ray |
CN113310611A (en) * | 2021-07-12 | 2021-08-27 | 中国兵器工业第五九研究所 | Nondestructive testing device and method for internal stress of short-wavelength characteristic X-ray |
CN113533400A (en) * | 2021-07-06 | 2021-10-22 | 合肥工业大学 | A high-speed and accurate X-ray texture testing method for extruded bars |
CN113740366A (en) * | 2020-05-27 | 2021-12-03 | 中国兵器工业第五九研究所 | Method and device for nondestructive detection of crystal orientation difference and crystal boundary defects in single crystal or oriented crystal |
CN115598158A (en) * | 2022-10-11 | 2023-01-13 | 中国航发贵州黎阳航空动力有限公司(Cn) | Method and device for positioning probe of X-ray diffraction method residual stress determinator |
CN115598157A (en) * | 2021-06-25 | 2023-01-13 | 中国兵器工业第五九研究所(Cn) | Short-wavelength characteristic X-ray diffraction device and method based on array detection |
CN118067682A (en) * | 2024-04-16 | 2024-05-24 | 中国人民解放军总医院 | Method for detecting growth differentiation factor 15 gene expression |
CN118566273A (en) * | 2024-04-01 | 2024-08-30 | 深圳市埃芯半导体科技有限公司 | X-ray diffraction spectrum calibration method, device, electronic equipment and storage medium |
CN119224023A (en) * | 2024-12-03 | 2024-12-31 | 邯郸市爱斯特应力技术有限公司 | Residual stress determination method and system |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11248651A (en) * | 1998-03-04 | 1999-09-17 | Canon Inc | Microarea x-ray diffractometer |
EP0962284A1 (en) * | 1998-06-04 | 1999-12-08 | Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft | Method and apparatus for manufacturing a cylindrical single crystal and method for slicing wafers |
CN1588019A (en) * | 2004-07-14 | 2005-03-02 | 西南技术工程研究所 | Short wave length X-ray diffraction measuring device and method |
CN101358938A (en) * | 2008-07-07 | 2009-02-04 | 西南技术工程研究所 | Nondestructive inspection method and device for internal defect of workpieces by x-ray diffraction x scan |
CN102692421A (en) * | 2012-06-18 | 2012-09-26 | 东营市三英精密工程研究中心 | High-precision x-ray microscope sample scanning table with metering rotary shaft |
CN103735282A (en) * | 2014-01-06 | 2014-04-23 | 北京大学 | Device and method for geometric correction of detector of cone-beam CT (computed tomography) system |
CN203704891U (en) * | 2013-12-20 | 2014-07-09 | 上海优特化工有限公司 | Electrical sample stage of X fluorescence thickness gauge |
CN203749433U (en) * | 2014-03-06 | 2014-08-06 | 北京锐视康科技发展有限公司 | Single-hole collimation device for conducting preliminary correction on cone beam CT correction systems |
CN104502385A (en) * | 2014-12-30 | 2015-04-08 | 西南技术工程研究所 | Short-wavelength X-ray diffraction plate-like internal stress fixed-point non-destructive testing method |
CN104865257A (en) * | 2015-04-30 | 2015-08-26 | 中国科学院长春光学精密机械与物理研究所 | Extreme ultraviolet (EUV) multilayer-film carbon pollution experiment device |
CN106204514A (en) * | 2015-04-30 | 2016-12-07 | 中国科学院深圳先进技术研究院 | A kind of liver localization method based on three-dimensional CT image and device |
CN107076956A (en) * | 2014-09-23 | 2017-08-18 | Fmb精密技术有限公司 | For the optical element or the regulating system of sample being aligned in vacuum |
-
2018
- 2018-12-18 CN CN201811546826.2A patent/CN109374659B/en active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11248651A (en) * | 1998-03-04 | 1999-09-17 | Canon Inc | Microarea x-ray diffractometer |
EP0962284A1 (en) * | 1998-06-04 | 1999-12-08 | Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft | Method and apparatus for manufacturing a cylindrical single crystal and method for slicing wafers |
CN1588019A (en) * | 2004-07-14 | 2005-03-02 | 西南技术工程研究所 | Short wave length X-ray diffraction measuring device and method |
CN101358938A (en) * | 2008-07-07 | 2009-02-04 | 西南技术工程研究所 | Nondestructive inspection method and device for internal defect of workpieces by x-ray diffraction x scan |
CN102692421A (en) * | 2012-06-18 | 2012-09-26 | 东营市三英精密工程研究中心 | High-precision x-ray microscope sample scanning table with metering rotary shaft |
CN203704891U (en) * | 2013-12-20 | 2014-07-09 | 上海优特化工有限公司 | Electrical sample stage of X fluorescence thickness gauge |
CN103735282A (en) * | 2014-01-06 | 2014-04-23 | 北京大学 | Device and method for geometric correction of detector of cone-beam CT (computed tomography) system |
CN203749433U (en) * | 2014-03-06 | 2014-08-06 | 北京锐视康科技发展有限公司 | Single-hole collimation device for conducting preliminary correction on cone beam CT correction systems |
CN107076956A (en) * | 2014-09-23 | 2017-08-18 | Fmb精密技术有限公司 | For the optical element or the regulating system of sample being aligned in vacuum |
CN104502385A (en) * | 2014-12-30 | 2015-04-08 | 西南技术工程研究所 | Short-wavelength X-ray diffraction plate-like internal stress fixed-point non-destructive testing method |
CN104865257A (en) * | 2015-04-30 | 2015-08-26 | 中国科学院长春光学精密机械与物理研究所 | Extreme ultraviolet (EUV) multilayer-film carbon pollution experiment device |
CN106204514A (en) * | 2015-04-30 | 2016-12-07 | 中国科学院深圳先进技术研究院 | A kind of liver localization method based on three-dimensional CT image and device |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110618148A (en) * | 2019-09-19 | 2019-12-27 | 西安交通大学 | Adjusting device and method based on monochromatic X-ray single crystal stress measurement |
CN110618148B (en) * | 2019-09-19 | 2021-07-06 | 西安交通大学 | Adjustment device and method based on monochromatic X-ray single crystal stress measurement |
CN113740366A (en) * | 2020-05-27 | 2021-12-03 | 中国兵器工业第五九研究所 | Method and device for nondestructive detection of crystal orientation difference and crystal boundary defects in single crystal or oriented crystal |
CN113740366B (en) * | 2020-05-27 | 2023-11-28 | 中国兵器工业第五九研究所 | Method and device for nondestructively detecting crystal orientation difference and grain boundary defect in monocrystal or directional crystal |
CN111664978B (en) * | 2020-05-28 | 2021-12-07 | 哈尔滨工业大学 | Residual stress characterization method for spherical special-shaped part |
CN111664978A (en) * | 2020-05-28 | 2020-09-15 | 哈尔滨工业大学 | Residual stress characterization method for curved surface special-shaped part |
CN112763432A (en) * | 2020-12-25 | 2021-05-07 | 中国科学院上海高等研究院 | Control method for automatically collecting absorption spectrum experimental data |
CN113176285B (en) * | 2021-04-23 | 2023-12-15 | 中国兵器工业第五九研究所 | Nondestructive testing method for residual stress in short-wavelength characteristic X-ray |
CN113176285A (en) * | 2021-04-23 | 2021-07-27 | 中国兵器工业第五九研究所 | Nondestructive testing method for residual stress in short-wavelength characteristic X-ray |
CN115598157A (en) * | 2021-06-25 | 2023-01-13 | 中国兵器工业第五九研究所(Cn) | Short-wavelength characteristic X-ray diffraction device and method based on array detection |
CN113533400B (en) * | 2021-07-06 | 2024-04-12 | 合肥工业大学 | High-speed and accurate X-ray texture testing method for extruded bar |
CN113533400A (en) * | 2021-07-06 | 2021-10-22 | 合肥工业大学 | A high-speed and accurate X-ray texture testing method for extruded bars |
CN113310611B (en) * | 2021-07-12 | 2023-08-18 | 中国兵器工业第五九研究所 | Nondestructive testing device and method for short-wavelength characteristic X-ray internal stress |
CN113310611A (en) * | 2021-07-12 | 2021-08-27 | 中国兵器工业第五九研究所 | Nondestructive testing device and method for internal stress of short-wavelength characteristic X-ray |
CN115598158A (en) * | 2022-10-11 | 2023-01-13 | 中国航发贵州黎阳航空动力有限公司(Cn) | Method and device for positioning probe of X-ray diffraction method residual stress determinator |
CN118566273A (en) * | 2024-04-01 | 2024-08-30 | 深圳市埃芯半导体科技有限公司 | X-ray diffraction spectrum calibration method, device, electronic equipment and storage medium |
CN118067682A (en) * | 2024-04-16 | 2024-05-24 | 中国人民解放军总医院 | Method for detecting growth differentiation factor 15 gene expression |
CN119224023A (en) * | 2024-12-03 | 2024-12-31 | 邯郸市爱斯特应力技术有限公司 | Residual stress determination method and system |
CN119224023B (en) * | 2024-12-03 | 2025-02-28 | 邯郸市爱斯特应力技术有限公司 | Residual stress determination method and system |
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