CN109328300A - System and method for multiple location interrogation parameters in the sample - Google Patents
System and method for multiple location interrogation parameters in the sample Download PDFInfo
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- CN109328300A CN109328300A CN201780040823.9A CN201780040823A CN109328300A CN 109328300 A CN109328300 A CN 109328300A CN 201780040823 A CN201780040823 A CN 201780040823A CN 109328300 A CN109328300 A CN 109328300A
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
- G01B9/02008—Two or more frequencies or sources used for interferometric measurement by using a frequency comb
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- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/353—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells influencing the transmission properties of an optical fibre
- G01D5/35306—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells influencing the transmission properties of an optical fibre using an interferometer arrangement
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
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Abstract
One kind includes the first and second ultrafast laser sources (102,104), reference unit (110) and detector and processor unit (124,128) for the system (100) of multiple location interrogation parameters in sample (108).First and second ultrafast laser sources (102,104) provide a pulse more than first and second to interact with multiple positions of the sample in sample (108), to provide through handling pulse respectively in picosecond time domain or lower time domain.In addition, the first and second ultrafast laser sources (102 and 104) are configured to provide the comb frequency with the first and second repetitive rates respectively.It will test device unit (124) and be configured to detect at least part, more than second a pulses and the pulse referred to through handling pulse.It is configured to processor unit (128) to handle pulse detected and the measurement of the parameter for multiple positions in sample (108) is provided.
Description
Background technique
The embodiment of this specification is related to the system and method for the distributed measurement for one or more parameters.Specifically
Ground, the system and method are related to the distributed measurement using light technology.
Typically, it in large-scale gas chamber or in light transparent sample, is measured in bulk by making light radiation by sample
The absorption of incident radiation.It is expected that exploitation can provide distribution (such as temperature of gas indoor gas, the concentration of gas of multiple parameters
And/or the pressure of gas) or the light technology of High-Resolution Spectral that is spatially distributed of measurement.
Light frequency pulse generation is the object for being used to encode the information about the transmission across optical fiber cable, determine molecule in sample
Manage characteristic and suchlike smooth technology.Width of the mark of the sample properties of frequency of use pulse based on the pulse in expected frequency
Degree and stability, to obtain the specified resolution of sample.Typically, interferometer measurement is used for the light analysis of sample.However,
Generally, due to pulse-width, the repetitive rate of pulse, spectral limit and suchlike limitation, interferometer measurement cause space and
The resolution ratio of reduction in time.The light frequency pulse generation of transmission for information is relatively wide using each frequency pulse
Bandwidth leads to the overlapping pulses in big transmission range.As it will be realized, as frequency pulse is along optical fiber cable traveling, arteries and veins
Rush width increase.After determining distance, the overlapping (due to the increase of pulse width) of frequency line leads to digital contents
Loss.It is difficult in addition, generating frequency that is multiple and different, closely separating, to limit in light frequency pulse generation
Signal resolution.
Summary of the invention
In one embodiment, it provides and a kind of is for multiple location interrogation one or more parameters in the sample
System.The system comprises be configured to provide a pulse more than first and more than first a pulses respectively in picosecond time domain or lower time domain
The first ultrafast laser source and the second ultrafast source.In addition, being configured to first and second ultrafast laser source to provide tool respectively
There is the comb frequency of the first and second repetitive rates, wherein second repetitive rate is different from first repetitive rate.In addition, described
A pulse more than one and the multiple position of the sample in the sample are interacted to provide through handling pulse.In addition,
The system comprises be configured to provide have variable time delay, variable phase delay, variable pathlength it is poor, or combinations thereof
The reference unit of the pulse of reference.In addition, the system comprises be configured to detect from described in first ultrafast laser source
Through handling at least part of pulse, more than described second from second ultrafast laser source a pulse and the reference
The detector cell of pulse.The system also includes be configured to handle pulse detected and provide in the sample
The processor unit of the measurement of one or more of parameters of the multiple position.
In another embodiment, it provides and a kind of is for multiple location interrogation one or more parameters in the sample
System.The system comprises be configured to provide a pulse more than first and more than first a pulses respectively in picosecond time domain or lower time domain
The first femtosecond laser source and the second femtosecond source.In addition, being configured to first and second femtosecond laser source to provide tool respectively
There is the comb frequency of the first and second repetitive rates, wherein second repetitive rate is different from first repetitive rate.In addition, described
A pulse more than one and the multiple position of the sample in the sample are interacted to provide through handling pulse.The system
System further include be configured to provide have variable time delay, variable phase delay, variable pathlength it is poor, or combinations thereof reference
Pulse reference unit.Further, the system comprises be configured to detect from described in first femtosecond laser source
Through handling at least part of pulse, more than described second from second femtosecond laser source a pulse and the reference
The detector cell of pulse.In addition, the system comprises be configured to handle pulse detected and provide for the sample
In the multiple position one or more of parameters measurement processor unit.
In still another embodiment, a kind of method is included in more than first a arteries and veins of offer in picosecond time domain or lower time domain
Punching and the comb frequency with the first repetitive rate.In addition, the method includes multiple positions in the sample to make more than described first
A part of a pulse is interacted to provide through handling pulse.The method also includes in the another of more than described first a pulses
Introduced in part variable time delay, variable phase delay, variable pathlength it is poor, or combinations thereof to provide the pulse referred to,
And more than second a pulses are provided in picosecond time domain or lower time domain and with second repetitive rate different from the first repetitive rate
Comb frequency.In addition, the method includes detecting at least one through handling pulse from first ultrafast laser source
Partially, more than described second pulses of a pulse and the reference from second ultrafast laser source.The method is also wrapped
Include the measurement for handling one or more parameters of the pulse detected to provide the multiple position being directed in the sample.
Detailed description of the invention
When reference attached drawing reads following specific embodiment, these and other feature of the embodiment of the present invention and side
Face will become better understood, and in the accompanying drawings, similar marker indicates similar portion through attached drawing, in the accompanying drawings:
Fig. 1 is schematically illustrating according to the system of the distributed measurement for sample of the aspect of this specification, and the system is used
In multiple location interrogation one or more parameters in the sample；
Fig. 2 (a)-Fig. 2 is (i) shown according to the figure of the distributed measurement of the system using Fig. 1 of the aspect of this specification；
Fig. 3 is the system according to the long-distance distributed measurement for multiple positions in the sample of the aspect of this specification
It schematically illustrates；And
Fig. 4 is the example flow diagram for the method for the distributed measurement for multiple positions in sample.
Specific embodiment
In some embodiments of this specification, the distributed measurement of one or more parameters for sample is provided
System and method.In certain other embodiments of this specification, absorption, transmission, reflection, phase spectrum or combination can be used
Distributed measurement determines one or more parameter (such as, but not limited to, concentration, pressure with one or more positions in the sample
Power, temperature and chemical component).In addition, in some embodiments, it can be by the system configuration at progress short distance distribution survey
Amount, long-distance distributed measurement, or both.In one example, distributed measurement can be executed in the sample in the sample
Two or more positions determine the chemical component of sample.In another embodiment, practicable distributed measurement is in the sample
Two or more positions determine the temperature of sample.
In some embodiments, the system and method can be used for joining together with the high spatial resolution of wavelength resolution more
Number measurement.For example, the system and method can be used for gas in down hole system, oil, water, or combinations thereof space
Section maps (spatial profiling)；(such as, in gas-turbine exhaust) space gases measurement of concetration；Coating is (all
Such as, but not limited to, the thermal barrier coating in turbo blade) health monitoring.
In certain embodiments, the system of the distributed measurement for sample is provided, is used for more in the sample
A location interrogation detects one or more parameters.The system comprises be configured to provide the comb frequency with the first repetitive rate
First ultrafast laser source.First ultrafast laser source is configured to provide more than first in the time domain for being equal to or less than picosecond time domain
A pulse is interacted with one or more positions in multiple positions with sample to provide through handling pulse.The system is also
Including being configured to provide the second ultrafast laser source of comb frequency with second repetitive rate different from the first repetitive rate.This second is surpassed
Fast laser source is configured to provide more than second a pulses in the time domain for being equal to or less than picosecond time domain.Described first and second is ultrafast
Difference between the repetitive rate of laser source can be based on system parameter.In addition, the repetitive rate of first and second ultrafast laser source it
Between difference determine the spectral limit that can be measured.In an illustrative manner, if the difference in terms of repetitive rate is tested lower than determining value
Measured spectral limit when the comparable difference in terms of repetitive rate of the spectral limit of amount is higher than determining value is narrower.
The system also includes be configured to detect through at least part pulse and more than second a pulses in processing pulse
At least part pulse detector cell.In addition, the system comprises be configured to handle pulse detected and provide
The processor unit of the measurement of one or more parameters corresponding to multiple positions in sample.
In certain embodiments, described method and system can be used to the distributed measurement of multiple parameters to promote to grasp
Make the optimization of (such as, but not limited to operation of gas-turbine).For example, the distributed measurement of multiple parameters promotes mark gas whirlpool
Hot spot in wheel, reduce discharge from gas-turbine, detect material in the thermal barrier coating of turbo blade in impurity and all
Such as such, or combinations thereof.In addition, described method and system can provide for having one or more phase (such as, solid-states, liquid
With gaseous state phase two or more) sample measurement.The system and method are configured to measurement broad-band high-resolution spectrum
And there is application in Environmental Studies, wherein sample can be in one or more phases (such as solid-state, liquid and gaseous state phase).
In addition, described method and system uses the synchronization ultrafast laser source for promoting long-distance distributed measurement.
Fig. 1 shows the example of the system of the distributed measurement for sample, and the system is for more in the sample
A location interrogation one or more parameter.In the illustrated embodiment, system 100 includes interferometer configuration, uses sample arm
And reference arm.Term " sample arm " be used to refer to include the system 100 of sample a part or arm, and term " reference arm " quilt
Be used to refer to include the system 100 of reference unit a part or arm.
In the illustrated embodiment, system 100 includes the first ultrafast laser source 102, the second ultrafast laser source 104 and reference
Device 110.It is configured to provide the first ultrafast laser source 102 and the second ultrafast laser source 104 to a pulse more than first and respectively
A pulse more than two.It is defined by each frequency comb and repetitive rate of the first ultrafast laser source 102 and the second ultrafast laser source 104
First ultrafast laser source 102 and the second ultrafast laser source 104.Reference unit 110 is operatively coupled to first laser source 102
And be configured to provide the pulse of reference, relative to first laser source 102 pulse have time delay, phase delay,
Or optical path length is poor.
In one embodiment, the difference in the frequency of the first ultrafast laser source 102 and the second ultrafast laser source 104 is than super
Any line width to alignment of the frequency comb of fast laser source 102 and 104 is bigger.In addition, the first ultrafast laser source 102 and the second surpassing
Difference in the frequency of fast laser source 104 is smaller than the half of the repetitive rate of ultrafast laser source 102 and 104.
In some instances, ultrafast laser source 102 and 104 can be skin or femtosecond laser source.Advantageously, compared to
Greater than picosecond duration time emit the use of the laser source of light pulse, the skin or femtosecond laser source in system 100 make
With leading to relatively higher spatial resolution.The repetitive rate of first ultrafast laser source 102 and the second ultrafast laser source 104 is different
's.In one example, the repetitive rate of the first ultrafast laser source 102 is referred to as " the first repetitive rate " fr, and second is ultrafast sharp
The repetitive rate of light source 104 is referred to as " the second repetitive rate " (the +/- df of fr).Specifically, the first and second repetitive rates are different.
In the repetitive rate of first ultrafast laser source 102 and the second ultrafast laser source 104 difference by df represented by, wherein df is to indicate to be used for
The ratio of the spatial distribution of the length of the laser pulse of the specific repetitive rate of ultrafast laser source.It can spectral resolution based on expectations
Determine the repetitive rate.In one embodiment, the value of df can be indicated by equation (1) are as follows:
Equation (1)
Wherein, c indicates the light velocity, and fr indicates the repetitive rate of the first ultrafast laser source 102.
It may be noted that can be formed with optical fiber or without optical fiber for from the multiple of ultrafast laser source 102 and 104
The light path of pulse.In one embodiment, optical fiber can carry out operation communication with the first ultrafast laser source 102, so that more than first
At least part of a pulse passes through at least part of optical fiber.In identical or different embodiment, optical fiber can with it is second ultrafast
Laser source 104 carries out operation communication, so that at least part of a pulse more than second passes through at least part of optical fiber.Certain
In embodiment, the application Fig. 1 and Fig. 3 light configuration in, from first, second and/or third ultrafast laser source 302,
The 304 and 306 multiple pulses of first, second, and/or third can be each passed through ambient air (for example, air) or optical fiber.?
In the embodiment that different multiple pulses are crossed using optical fiber, the connecting line between system 100 and 300 various assemblies can be indicated
Optical fiber.
First ultrafast laser source 102 is operatively coupled to reference unit 110.In a non-limiting example, with reference to dress
Setting 110 can be time delay device, such as mirror.For example, other non-limiting examples of reference unit may include phase difference or
Delay generator, path length difference function, liquid crystal, microarray, microelectromechanical-systems (MEMS) are configured within system 100
Light radiation path in introduce any other light knot of time delay, phase delay or phase difference or optical path length difference
Structure.It usually include the reference unit 110 of such as reference mirror by the reference arm that reference label 112 indicates.In addition, usually by reference mark
Numbers 114 sample arms indicated include sample 108 and the light path for leading to sample 108.Reference unit 110 is configured in reference arm
The light pulse advanced in 112 and time delay is provided between the light pulse advanced in sample arm 114, to create two arms 112
Expectation interference between the pulse in 114.
In certain embodiments, reference unit can be configured in more than first provided by the first ultrafast laser source 102
Time delay, phase delay or phase difference are introduced in a part of pulse or optical path length is poor.In addition, the time delay,
Phase delay or optical path length difference can times to time change.Specifically, by reference unit 110 the one of more than first a pulses
The time delay that introduces in part, phase delay, optical path length official post obtains these delays and difference can be according to the sample that will be asked
Position in this and change.In an illustrative manner, in the illustrated embodiment, if reference unit 110 is the time of such as mirror
The mirror can be then configured to along being moved by the light path that reference label 111 indicates, so as to ultrafast from first by deferred mount
Variable time delay is introduced in the path of a part of a pulse more than the first of laser source 102.This part of a pulse more than first
The pulse referred to as referred to.In addition, the speed or rate of the movement of time delay device can sweep speed (samples based on expectations
108 different location needs scanned with it) it adjusts.In addition, adjustable time delay, the phase introduced by reference unit 110
Position delay or path length difference are with the spatial resolution corresponding to sample 108.It may be noted that most for scanned samples 108
Small spatial resolution can be similar to the pulse width of laser source 102 and 104.
System further comprises separator 116 and 117.In a non-limiting example, for example, separator 116 can be 50:
50 separators.Separator 116 is configured to the radiation advanced from the first ultrafast laser source 102 is separated at least 2 parts, so that
The first part of radiation carries out to reference unit 110, and the second part radiated is carried out to sample 108.In addition, reference arm
Collimator 120 and 122 can be used in both 112 and sample arm 114.Collimator 120 and 122 can be with phase each other in function and structure
Seemingly or it can be different.Collimator 120 collimates to reference unit 110 and guides radiation, is received back and is come from by collimator 120
The radiation of the delay of reference unit 110.Similarly, collimator 122 collimates to sample 108 and guides radiation, with promote radiation and
At least part of interaction of sample 108, and to collect the pulse through processing pulse or interaction.
In operation, allow the pulse of the reference from the first ultrafast laser source 102 a part (such as time delay
Pulse), it is interacted with one or more positions in given time and sample.The refractive index of medium based on sample 108
To inquire or detect sample position 130,132,134 and 136.In one example, wherein reference unit 110 is time delay dress
(such as reference mirror) is set, can determine along light path (it is along direction 111) mobile distance by reference mirror and to be introduced in sample arm
Path length difference or the amount of light delay or both.In one embodiment, reference mirror can be coupled to motor (in Fig. 1
It is not shown) to promote the movement of mirror.It, can be to ginseng in the other examples that piezo-electric device or MEMS mirror are used as reference unit 110
Examination device provides electric current to promote the expectation of reference unit 110 mobile, to provide suitable time delay or phase at the specific moment
Position delay.
Allow the pulse of the interaction of the sample 108 in sample arm 114 and the reference from reference arm 112 (such as
Time delay) pulse interfered with the pulse from the second ultrafast laser source 104.It is detected using detector cell 124
This interference of pulse.In one example, detector cell 124 can be high-frequency detector.
In addition, the system uses processor unit 128 for handling in the received combination spoke of detector cell 124
It penetrates.As used in this article, term " processor unit " refers to as being included in computer and controller, microcontroller, micro- meter
Calculation machine, programmable logic controller (PLC) (PLC), specific integrated circuit, application specific processor, digital signal processor (DSP), dedicated collection
At in circuit (ASIC), field programmable gate array (FPGA), and/or any other programmable circuit with integrated circuit
Processing unit.In certain embodiments, processor unit 128 can be coupled to (one or more) memory device (in Fig. 1
It is not shown) or may include (one or more) memory device.(one or more) memory device can generally include (one
Or multiple) memory component comprising but be not limited to computer-readable medium (for example, random-access memory (ram)), calculate
The readable non-volatile media of machine (for example, flash memory), one or more hard disk drives, floppy disk, the read-only storage of compact-disc
Device (CD-ROM), compact-disc read/write (CD-R/W) driver, magneto-optic disk (MOD), digital versatile disc (DVD), flash drive,
CD-ROM drive, solid-state storage device, and/or other suitable memory components.The radiation detected handled by processor unit 128
It can provide the number for indicating the distributed measurement of one or more parameters of the sample such as further described in Fig. 2 (a)-Fig. 2 (h)
According to.In addition, the method that the operation of the system 100 of Fig. 1 will be described relative to Fig. 2 (a)-Fig. 2 (h).
With reference to Fig. 2 (a)-Fig. 2 (h), show from reference arm (for example, reference arm 112 of Fig. 1) and sample arm (for example,
The sample arm 114 of Fig. 1) pulse interference.In Fig. 2 (a)-Fig. 2 (f), ordinate 202 indicates the luminous intensity of pulse.In addition,
In Fig. 2 (a)-Fig. 2 (f), abscissa 204 indicates the time, and in Fig. 2 (g)-Fig. 2 (h), abscissa 206 indicates the frequency of pulse
And the amplitude of the expression pulse of ordinate 208.Specifically, Fig. 2 (a) indicates the pulse (I of referenceR) or from reference arm 112
Pulse.At the time of given, select reference unit 110 site (such as, along direction 111 time delay device position),
So that one or more sample positions in the specific location (or depth) along optical path length are selected.Fig. 2 (b) indicates to correspond to
In in Fig. 1 respectively by reference label 130,132,134 and 136 indicate sample position X1, X2, X3 and X4, come from sample
Pulse (the I of arm 114S).Specifically, the pulse being returned after interacting with sample position X1 130 is by reference label
212 indicate, and are indicated from the pulse that sample position X2 132 is returned by reference label 214.Similarly, from sample position X3
The pulse that 134 and X4 136 is returned is indicated by reference label 216 and 218.It should be noted that sample 108 can have need by
Detection is to be fewer of more than 4 positions for distributed measurement.
Fig. 2 (c) indicates more than second a pulses 210 from the second ultrafast laser source 104.Fig. 2 (d) is indicated in detector list
The pulse from the second ultrafast laser source 104 of member 124 and the assembled pulse from reference unit 110, sample 108.Specifically
Ground, Fig. 2 (d) indicate the pulse (I of the reference from reference arm 112R), more than second a arteries and veins from the second ultrafast laser source 104
Punching and being handled or being interacted from multiple positions (such as, position X1, the X2, X3, X4 130-136 in sample 108)
The summation of pulse is allowed to interfere.In one embodiment, it will test device unit 124 and be configured to execute nonlinear operation to provide
Interferogram signal (ID), as indicated in following equation (2):
ID=ISIRILEquation (2)
Wherein IDIndicate interferogram signal, IRIndicate the pulse of the reference from reference arm, ISIndicate the pulse from sample arm,
And ILIndicate more than second a pulses from the second ultrafast laser source 104.
From different location X1, the pulse of X2, X3, X4 130-136 and from the pulse (I of reference arm 112R) phase
Multiply and the signal in addition to the signal with path length identical with the path length of the pulse from reference arm 112 is caused to reduce
To zero.Therefore, as indicated by Fig. 2 (e), when mobile reference is so that the path length of reference and the signal overlap from X1 130
When, interferogram signal (ID) include position X1 130 in sample 108 signal interference pattern.It is shown in Fig. 2 (f)
For the interferogram signal of X2 132 similarly generated.In addition, by accordingly adjustment reference unit 110(for example, passing through shifting
Dynamic reference mirror) it can get the interferogram signal from other positions X3 134 and X4 136.
Fig. 2 (g)-Fig. 2 (h) shows the Fourier transformation of the interferogram signal corresponding to position X1 130 and X2 132.
Correspondingly, indicate that the Fourier of the signal of position X1 and X2 from sample becomes by the pulse that reference label 230 and 232 indicates
It changes.The Fourier transformation of such as Fourier transformation 230 and 232 is used to form the correspondence sample corresponded to as indicated in Fig. 2 (i)
The absorption profile of the sample 108 of position.Equation (3) will be indicated in the absorption profile of position X2 are as follows:
Equation (3)
Wherein, A(z) indicate in the sample position z place absolute absorption value, (z) expression position z Heavy metal value, and
And (z- Δ z) indicates the Heavy metal value in position z- Δ z, and wherein position n of the position z- Δ z in the path of light pulse is tight
Before.For example, if z indicates that position X2, z- Δ z can indicate position X1.The absorption profile such as indicated in Fig. 2 (i) includes
Peak value 244 and the ordinate 242 with the abscissa 240 for indicating wavelength and expression absorption value.In certain embodiments, it inhales
Height, width and the site for receiving the peak value (such as peak value 244) in section can be used to measurement various parameters, such as, but not limited to
Temperature, pressure, concentration, ingredient and such.In the illustrated example, the height 246 of peak value 244 usually indicates specific kind
The concentration of class or the concentration of sample 108.In addition, to respectively indicate sample 108 specific at this for the width 248 of peak value 244 and site 250
The temperature and pressure of position.Can several positions in the sample with proportional to the pulse width of ultrafast laser source 102 and 104
Spatial resolution carries out distributed measurement.
In some embodiments, system 100 is configured to be used for from about 100 microns to the short distance in the range of several cm
Long range measurements in measurement and the range from about several cm to several km.In addition, in some other embodiments, system 100
About c/fr up or for laser is conduction, and wherein c is the light velocity and fr is the repetitive rate of ultrafast laser source.It is certain its
In its embodiment, the system and method for the application can be configured such as long-distance distributed in oil and gas line to be used for
Measurement.
Fig. 3 shows another example of the system 300 of the distributed measurement for multiple positions in sample.In addition, will
The configuration of system 300 is to be used for long range measurements, such as, but not limited to down hole application；Gas, oil in down hole system,
The special sections of water are mapped；Space gases measurement of concetration in gas-turbine exhaust；And coating (such as, but not limited to, turbine
Thermal barrier coating on blade) health monitoring.System 300 includes be configured to provide more than first, second, and third a pulses the
One, second and third ultrafast laser source 302,304 and 306.In a non-limiting example, the first, second, and third ultrafast laser
Source 302,304 and 306 is femtosecond laser source.In some embodiments, ultrafast laser source 302,304 and 306 can via one or
Multiple optical fiber and other components of system 300 carry out operation communication.In one embodiment, optical fiber can be with the first ultrafast laser source
302 carry out operation communication, so that at least part of a pulse more than first passes through at least part of optical fiber.
In addition, ultrafast laser source 302 and 306 is operatively coupled to reference clock 308 so that two phases of source 302 and 306
For synchronized with each other.In addition, the reference unit of such as phase delay generator 310 is coupled to 302 He of the first ultrafast laser source
A ultrafast laser source in third ultrafast laser source 306.In the example being presently envisaged by, wherein phase delay generator 310
It is coupled to third ultrafast laser source 306, the third for introducing third ultrafast laser source 306 by phase delay generator 310 is more
The phase delay of a pulse introduces phase delay in clock 308 in turn.In addition, more in third by phase delay generator 310
The phase delay introduced in a pulse cause it is relative to more than first a pulses from the first ultrafast laser source 302, in third
The time delay being introduced into multiple pulses.Third ultrafast laser source 306 serves as reference arm together with reference clock 308 to provide ginseng
The pulse examined.
In operation, make more than first a pulses from the first ultrafast laser source 302 by circulator 312, and pass through
A part 315 of a pulse more than the first of circulator 312 is used to inquiry sample 314.Collimator 316 is used to make by circulation
The pulse 315 of device 312 is collimated to sample 314.Various sample position quilts in the direction 326 for carrying out the pulse of autocollimator 316
It is expressed as X1 318, X2 320, X3 322 and X4 324.After being interacted with sample 314, it will be handed over using combiner 328
Mutual pulse is combined with the multiple pulses of third.Then, using another combiner 330 further by combined pulse with
More than second a pulses from the second ultrafast laser source 304 are combined, to form composite pulse.First ultrafast laser source 302
Repetitive rate with third ultrafast laser source 306 is identical.In addition, the first ultrafast laser source 302 and third ultrafast laser source 306
Repetitive rate from the repetitive rate in the second source 304 be relatively different.
Composite pulse is detected by detector cell 332 and is handled using processor unit 334.It can such as monitor
Such as result shown in Fig. 2 (a)-Fig. 2 (i) is shown in the display device 336 of device, touch screen or the like.
Fig. 4 shows the example flow diagram 400 of the method for the distributed measurement for multiple positions in the sample, described
Method is used to detect one or more parameters of sample.In frame 402, the method is by providing in picosecond time domain or lower time domain
More than first a pulses and comb frequency with the first repetitive rate and start.In frame 404, allow a part of more than first a pulses
Multiple positions in the sample are interacted to provide through handling pulse.In frame 406, in another part of pulse a more than first
Introduce variable time delay, variable phase delay, variable pathlength it is poor, or combinations thereof to provide the pulse referred to.In frame
408, provide more than second a pulses in picosecond time domain or lower time domain and the comb frequency with the second repetitive rate.Second repeats
Rate is different from the first repetitive rate.
In frame 410, at least part through handling pulse from the first ultrafast laser source is detected by detector, is come from
The pulse of a pulse more than the second of second ultrafast laser source and reference.In frame 412, pulse detected is processed to provide
For the measurement of one or more parameters of multiple positions in sample.
In some embodiments, the multiple pulses of third can also be provided.It in these embodiments, can be multiple in first or third
Time delay, phase delay or path length difference are introduced in one in pulse.In addition, first and the multiple pulses of third can quilt
It synchronizes.In addition, can will be combined through processing pulse with the multiple pulses of third.
The system 100 and 300 of Fig. 1 and Fig. 3 and Fig. 2 (a)-Fig. 2 are (i) configured with the method for Fig. 4 to be used for multiple types
It determines.In an illustrative manner, when inquiring gaseous state sample, the system and method for the application can be used to deposit to detect in gaseous state sample
Gas with various.Advantageously, the system and method for the application provide high-resolution and faster time of measuring.High-resolution
Sensing while the mark for allowing multiple materials.Also, the system and method for the application promote complete spectrum to determine multiple parameters
Rather than individually measure these parameters.In addition, the broadband of frequency comb and relevant output also promote high s/n ratio.Also, it is ultrafast
The short pulse width of laser provides high spatial resolution.
Although only certain features of the invention have been shown and described herein, those skilled in the art will expect
Many modifications and changes.It will be appreciated, therefore, that appended claims, which are intended to cover, such as falls into owning in scope of the invention
Such modifications and changes.
Claims (17)
1. system (100) of the one kind for multiple location interrogation one or more parameters in sample (108), comprising:
First ultrafast laser source (102), first ultrafast laser source (102) are configured to mention in picosecond time domain or lower time domain
For more than first a pulses, wherein first ultrafast laser source (102) is configured to provide the comb frequency with the first repetitive rate,
And wherein a pulse more than described first is handed over the multiple position of the sample (108) in the sample (108)
Mutually to provide through handling pulse；
Second ultrafast laser source (104), second ultrafast laser source (104) are configured to mention in picosecond time domain or lower time domain
For more than second a pulses, wherein second ultrafast laser source (104), which is configured to provide, to be had with first repetitive rate not
The comb frequency of the second same repetitive rate；
Reference unit (110), the reference unit (110) be configured to provide have variable time delay, variable phase delay, can
Become path length difference, or combinations thereof reference pulse；
Detector cell (124), the detector cell (124) are configured to detection from first ultrafast laser source (102)
It is described through handle pulse at least part, from second ultrafast laser source (104) more than described second a pulses and
The pulse of the reference；And
Processor unit (128), the processor unit (128) are configured to handle pulse detected and provide for described
The measurement of one or more of parameters of the multiple position in sample (108).
2. the system as claimed in claim 1 (100), wherein first ultrafast laser source, second ultrafast laser source or
The two includes femtosecond laser source.
3. the system as claimed in claim 1 (100), wherein the reference unit (110) includes time delay device, phase difference
Generator or path length difference function, or combinations thereof.
4. system (100) as claimed in claim 3, wherein the time delay device is mirror.
It further comprise being configured to provide the thirds of the multiple pulses of third ultrafast to swash 5. the system as claimed in claim 1 (100)
Light source (306).
6. system (100) as claimed in claim 5 further comprises clock (310), the clock (310) is by operatively coupling
Described first and third ultrafast laser source (302,306) are closed, the clock (310) is for making described first and the ultrafast source of third
It synchronizes.
7. system (100) as claimed in claim 6 further comprises being operatively coupled to the third ultrafast laser source
(306) phase difference function.
8. system (100) as claimed in claim 5 further comprises being operatively coupled to first ultrafast laser source
(102) circulator (312), the circulator (312) is used to guide at least part of interacted pulse, so that by being handed over
Mutual pulse is combined with the multiple pulses of the third.
9. the system as claimed in claim 1 (100), further comprises optical fiber, the optical fiber and first ultrafast laser source
(102) operation communication is carried out, so that at least part of a pulse more than described first passes through at least part of the optical fiber.
10. the system as claimed in claim 1 (100), further comprises optical fiber, the optical fiber and second ultrafast laser source
(104) operation communication is carried out, so that at least part of a pulse more than described second passes through at least part of the optical fiber.
11. the system as claimed in claim 1 (100), wherein the reference unit (110) prolongs including being configured to introduce the time
Late, the photo structure of phase delay or optical path length difference, liquid crystal, microarray or microelectromechanical-systems (MEMS).
12. system (100) of the one kind for multiple location interrogation one or more parameters in sample (108), comprising:
First femtosecond laser source (102), first femtosecond laser source (102) are configured to mention in picosecond time domain or lower time domain
For more than first a pulses, wherein first femtosecond laser source (102) is configured to provide the comb frequency with the first repetitive rate；
And wherein a pulse more than described first is handed over the multiple position of the sample (108) in the sample (108)
Mutually to provide through handling pulse；
Second femtosecond laser source (104), second femtosecond laser source (104) are configured to mention in picosecond time domain or lower time domain
For more than second a pulses, wherein second femtosecond laser source (104), which is configured to provide, to be had with first repetitive rate not
The comb frequency of the second same repetitive rate；
Reference unit (110), the reference unit (110) be configured to provide have variable time delay, variable phase delay, can
Become path length difference, or combinations thereof reference pulse；
Detector cell (124), the detector cell (124) are configured to detection from first femtosecond laser source (102)
It is described through handle pulse at least part, from second femtosecond laser source (104) more than described second a pulses and
The pulse of the reference；And
Processor unit (128), the processor unit (128) are configured to handle pulse detected and provide for described
The measurement of one or more of parameters of the multiple position in sample.
13. (100) system as claimed in claim 12 further comprise third femtosecond laser source.
(100) 14. system as claimed in claim 12, wherein the reference unit (110) is operatively coupled to described
One femtosecond laser source.
15. (100) system as claimed in claim 12 further comprise being deployed in first femtosecond laser source and the sample
Collimator between this at least part.
16. (100) system as claimed in claim 12 further comprise optical fiber, the optical fiber and first femtosecond laser
Source carries out operation communication, so that at least part of a pulse more than described first passes through at least part of the optical fiber.
17. a kind of method (400) for multiple location interrogation one or more parameters in the sample, comprising:
More than first a pulses are provided in picosecond time domain or lower time domain, wherein a pulse more than described first includes the first repetitive rate
(402)；
The multiple position in the sample interacts a part of a pulse more than described first to provide through handling pulse
(404)；
Variable time delay, variable phase delay, variable pathlength are introduced in another part of pulse a more than described first
Difference, or combinations thereof with provide reference pulse (406)；
More than second a pulses are provided in picosecond time domain or lower time domain, wherein a pulse more than described second includes and described first
Different the second repetitive rate (408) of repetitive rate；
Detection from first ultrafast laser source it is described through handle pulse at least part, from described second it is ultrafast swash
The pulse (410) of a pulse more than described the second of light source and the reference；And
Pulse detected is handled to provide the one or more of parameters for the multiple position being directed in the sample
It measures (412).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IN201641022596 | 2016-06-30 | ||
| IN201641022596 | 2016-06-30 | ||
| PCT/US2017/040325 WO2018005987A1 (en) | 2016-06-30 | 2017-06-30 | Systems and methods for interrogating parameters at a plurality of locations in a sample |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109328300A true CN109328300A (en) | 2019-02-12 |
Family
ID=59363241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780040823.9A Pending CN109328300A (en) | 2016-06-30 | 2017-06-30 | System and method for multiple location interrogation parameters in the sample |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3479099A1 (en) |
| CN (1) | CN109328300A (en) |
| CA (1) | CA3028758A1 (en) |
| RU (1) | RU2729950C2 (en) |
| WO (1) | WO2018005987A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102022116927A1 (en) | 2022-07-07 | 2024-01-18 | Trumpf Laser Gmbh | Laser processing machine with frequency comb-based distance sensor and associated method with frequency comb-based distance measurement |
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| CN104316180A (en) * | 2014-11-02 | 2015-01-28 | 华东师范大学 | Double-optical frequency comb optical imaging method based on continuous frequency stabilized laser |
| CN104316186A (en) * | 2014-07-07 | 2015-01-28 | 华东师范大学 | Spectral measurement method based on optical frequency combs |
| US20150062586A1 (en) * | 2013-08-30 | 2015-03-05 | Agilent Technologies, Inc. | System for performing optical spectroscopy including interferometer |
| CN105548036A (en) * | 2015-12-08 | 2016-05-04 | 上海理工大学 | Self-adaptive double-light-comb spectrum system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5814820A (en) * | 1996-02-09 | 1998-09-29 | The Board Of Trustees Of The University Of Illinois | Pump probe cross correlation fluorescence frequency domain microscope and microscopy |
| EP1851532A1 (en) * | 2005-02-14 | 2007-11-07 | Board of Trustees of Michigan State University | Ultra-fast laser system |
| RU2384835C1 (en) * | 2008-12-15 | 2010-03-20 | Институт физики полупроводников Сибирского отделения Российской академии наук | Ellipsometre |
| JP5984351B2 (en) * | 2011-09-14 | 2016-09-06 | キヤノン株式会社 | Measuring device |
| US20160153835A1 (en) * | 2014-12-02 | 2016-06-02 | Imra America, Inc. | Comb resolved fourier transform spectroscopy |
-
2017
- 2017-06-30 RU RU2018145350A patent/RU2729950C2/en active
- 2017-06-30 CA CA3028758A patent/CA3028758A1/en not_active Abandoned
- 2017-06-30 EP EP17740541.2A patent/EP3479099A1/en not_active Withdrawn
- 2017-06-30 WO PCT/US2017/040325 patent/WO2018005987A1/en unknown
- 2017-06-30 CN CN201780040823.9A patent/CN109328300A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150062586A1 (en) * | 2013-08-30 | 2015-03-05 | Agilent Technologies, Inc. | System for performing optical spectroscopy including interferometer |
| CN104316186A (en) * | 2014-07-07 | 2015-01-28 | 华东师范大学 | Spectral measurement method based on optical frequency combs |
| CN104316180A (en) * | 2014-11-02 | 2015-01-28 | 华东师范大学 | Double-optical frequency comb optical imaging method based on continuous frequency stabilized laser |
| CN105548036A (en) * | 2015-12-08 | 2016-05-04 | 上海理工大学 | Self-adaptive double-light-comb spectrum system |
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Also Published As
| Publication number | Publication date |
|---|---|
| RU2729950C2 (en) | 2020-08-13 |
| CA3028758A1 (en) | 2018-01-04 |
| WO2018005987A8 (en) | 2019-03-14 |
| EP3479099A1 (en) | 2019-05-08 |
| RU2018145350A (en) | 2020-07-30 |
| WO2018005987A1 (en) | 2018-01-04 |
| RU2018145350A3 (en) | 2020-07-30 |
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