CN108529898B - Device for wide-width plasma treatment of glass - Google Patents

Abstract

The invention relates to a wide-width plasma treatment device for glass, which includes a high-frequency and high-voltage AC plasma power supply, a gas chamber, a high-voltage electrode located at the outer bottom end of the gas chamber, and two dielectric barrier plates located on both sides of the high-voltage electrode. The gas chamber is provided with at least one air inlet hole and at least one air outlet hole. The high-voltage electrode is connected to the high-frequency and high-voltage AC plasma power supply. The outer end of each dielectric barrier plate is connected to a first electrode, and the two first electrodes are both connected. Connected to a resistor, the resistor is connected to the ground electrode. The invention can generate a large-area plasma glow discharge under atmospheric pressure; it can lead the plasma between the first electrodes to a certain width, fully and efficiently perform material surface treatment, and can be applied to industrial production lines. For plasma materials under atmospheric pressure Surface treatment is of great significance; it can effectively improve the water contact angle of quartz glass, significantly increase the hydrophilicity, and is of great significance in changing the hydrophilicity of glass.

Description

Device for wide-width plasma treatment of glass

Technical field

The invention relates to a device for wide-width plasma treatment of glass.

Background technique

With the continuous advancement of scientific development, people's requirements for the materials used are increasing. For example, traditional metal or non-metal materials can no longer meet the needs of current production and life, so a variety of material processing methods have emerged. In recent years, low-temperature plasma material processing has received widespread attention, mainly because low-temperature plasma has important value in material processing. It can not only change the surface structure of materials, but also introduce hydrophilic groups such as hydroxyl groups and amino groups, and improve the properties of materials. Because of its hydrophilicity and adhesiveness, it is widely used to change the surface properties of materials.

The main forms of discharge under atmospheric pressure are: corona discharge, glow discharge, and arc discharge. However, corona and arc cannot be used for most material processing, mainly because the local energy and temperature are too high when the arc is generated, which can easily cause damage to the sample to be processed. , while the corona discharge is weak, the treatment efficiency is too low, and it is extremely uneven. Glow discharge under atmospheric pressure has good uniformity and can generate plasma over a large area for efficient material processing. The method of dielectric barrier discharge is usually used to generate plasma, that is, a non-equilibrium gas discharge in which an insulating medium is inserted into the discharge space. When a high enough AC voltage is applied between the two electrodes, in order to prevent the electrode from being broken down, one needs to be Or the two electrodes are covered with an insulating medium to generate plasma. However, most dielectric barrier discharges have the disadvantage that filamentous discharges are easily generated, which is not conducive to material processing. The quartz glass currently sold on the market has basically no hydrophilicity on its surface. At present, some companies are beginning to pursue quartz glass materials with better hydrophilicity. Improving the hydrophilicity of glass has become one of the current hot research topics.

Contents of the invention

The invention overcomes the shortcomings of the prior art and provides a device for wide-width plasma processing of glass with a simple structure.

In order to achieve the above object, the technical solution adopted by the present invention is: a device for wide-width plasma treatment of glass, including a high-frequency and high-voltage AC plasma power supply, a gas chamber, a high-voltage electrode located at the outer bottom end of the gas chamber, and a high-voltage electrode, respectively. two dielectric barrier plates located on both sides of the high-voltage electrode, the gas chamber is provided with at least one air inlet hole and at least one air outlet hole, the high-voltage electrode is connected to the high-frequency and high-voltage AC plasma power supply, A first electrode is connected to the outer end of each dielectric barrier plate. Both first electrodes are connected to a resistor, and the resistor is connected to a ground electrode.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes a transmission mechanism provided below the high-voltage electrode. The transmission mechanism includes a driving roller, a driven roller, a conveyor belt and two transmission rollers. The driving roller is connected to a sprocket assembly, and a second electrode is provided at the bottom end of the conveyor belt, and the second electrode is connected to the ground electrode.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes that the air inlet hole is circular, and the diameter of the air inlet hole is 6 mm.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes a plurality of air outlets arranged at intervals at the bottom end of the gas chamber, and the distance between adjacent air outlets is 4 mm.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes that the air outlet is in an elliptical shape, and the long diameter of the air outlet is 20 mm and the wide diameter is 4 mm.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes that the high-voltage electrode includes a metal capillary tube and a quartz tube wrapped around the metal capillary tube.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes the quartz tube having an inner diameter of 1 mm, a thickness of 0.5 mm, and a length of 40 mm.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes that the first electrode is a copper tape, and the first electrode is closely adhered to the dielectric barrier plate.

In a preferred embodiment of the present invention, the device for wide-width plasma treatment of glass further includes that the second electrode is a copper tape, and the length of the second electrode is 400 mm and the width is 2 mm.

The present invention solves the defects existing in the background technology and has the following beneficial effects:

(1) Large-area plasma glow discharge can be generated under atmospheric pressure.

(2) The plasma between the first electrodes can be drawn out to a certain width to fully and efficiently perform material surface treatment. It can be applied to industrial production lines and is of great significance for plasma material surface treatment under atmospheric pressure.

(3) It can be used with a speed-adjustable conveyor belt for efficient material processing.

(4) It can effectively improve the water contact angle of quartz glass and significantly increase the hydrophilicity, which is of great significance in changing the hydrophilicity of glass.

Description of the drawings

The present invention will be further described below in conjunction with the accompanying drawings and examples.

Figure 1 is a front view of a preferred embodiment of the present invention without a conveyor belt;

Figure 2 is a side view of a preferred embodiment of the present invention;

Figure 3 is a periodic image of the current and voltage during the discharge period according to the preferred embodiment of the present invention;

Figure 4 is a thermal image during the discharge period of the preferred embodiment of the present invention;

Figure 5 is a comparison diagram of water contact angles before and after treatment of quartz glass according to the preferred embodiment of the present invention;

Figure 6 is a graph showing changes in the water contact angle when the quartz glass according to the preferred embodiment of the present invention is transported on a conveyor belt and is still being processed.

Detailed ways

The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. These drawings are simplified schematic diagrams that only illustrate the basic structure of the present invention in a schematic manner, and therefore only show the structures related to the present invention.

As shown in Figures 1 and 2, a wide-width plasma treatment device for glass includes a high-frequency and high-voltage AC plasma power supply 10, a gas chamber 12, a high-voltage electrode 14 located at the outer bottom of the gas chamber 12, and a high-voltage electrode 14 located at the outer bottom of the gas chamber 12. There are two dielectric barrier plates 16 on both sides of the high-voltage electrode 14. The gas chamber 12 is provided with at least one air inlet 18 and at least one air outlet 20. The high-voltage electrode 14 is connected to the high-frequency and high-voltage AC plasma power supply 10. Each The outer end of the dielectric barrier plate 16 is connected to a first electrode 22 . Both first electrodes 22 are connected to a resistor 24 , and the resistor 24 is connected to the ground electrode 26 .

In the present invention, it is preferred that the gas chamber 12 is made of acrylic material with a thickness of 10 mm and a specification of 500×40×40. In the present invention, it is preferred that the air inlet holes 18 are circular, the diameter of the air inlet holes 18 is 6 mm, and the number of the air inlet holes 18 is two, which are located on the left and right sides of the gas chamber 12 respectively. In the present invention, it is preferred that the air outlet 20 is in an elliptical shape, with a long diameter of 20 mm and a wide diameter of 4 mm. It is further preferred that the bottom end of the gas chamber 12 is provided with a plurality of air outlets 20 at intervals, and the distance between adjacent air outlets 20 is 4 mm.

Preferably, the high-voltage electrode 14 of the present invention includes a metal capillary tube 28 and a quartz tube 30 wrapped around the metal capillary tube 28. Preferably, the quartz tube 30 has an inner diameter of 1 mm, a thickness of 0.5 mm, and a total length of 40 mm, and the output terminal of the high-frequency and high-voltage AC plasma power supply 10 is connected here. In the present invention, it is preferred that the dielectric barrier plate 16 is a quartz dielectric barrier plate, and the distance between the dielectric barrier plate 16 and the quartz tube 30 is 1 mm. It is further preferred that the length of the dielectric barrier plate 16 is 400 mm, the width is 7 mm, and the thickness is 1 mm. In the present invention, it is preferred that the first electrode 22 is a copper tape and is closely adhered to the dielectric barrier plate 16 .

In the present invention, it is preferred that a transmission mechanism is provided below the high-voltage electrode 14. The transmission mechanism includes a driving roller 32, a driven roller 34, a conveyor belt 36 and two transmission rollers 38. The driving roller 32 is connected to a sprocket assembly, and the bottom end of the conveyor belt 36 is provided with a The second electrode 40 is connected to the ground electrode 26 . It is further preferred that the sprocket assembly includes a driving sprocket 42 , a driven sprocket 44 , and a motor 46 connecting the driving sprocket 42 and the driven sprocket 44 . The driven sprocket 44 is fixed to the driving drum 32 . The motor 46 is preferably a speed-adjustable motor capable of adjusting the transmission speed of the conveyor belt 36 to 0.1 m/s. Preferably the conveyor belt 36 is a PVC conveyor belt. Preferably, the second electrode 40 is a copper tape. The length of the second electrode 40 is 400 mm and the width is 5 mm. The second electrode 40 is pasted on the bottom end of the conveyor belt 36 .

In the present invention, it is preferred that the resistor 24 is 2 MΩ, which can make the first electrode 22 have a higher potential than the ground electrode 26 .

The preferred high-frequency and high-voltage AC plasma power supply 10 of the present invention adopts the low-temperature plasma experimental power supply model CTP-2000K produced by Nanjing Suman Plasma Technology Co., Ltd.

When the present invention is in use, the air pressure is increased to 0.1MPa through an air compressor and an air pump, and the air pipe is introduced into the gas chamber 12 through the air inlet 18, and the high-frequency and high-voltage AC plasma power supply 10 is connected. When the voltage peak reaches 12KV, A glow discharge is performed in the area between the high-voltage electrode 14 and the two dielectric barrier plates 16 to generate uniform plasma. At the same time, the first electrodes 22 on both sides are connected in series with 2MΩ 24, causing its potential to be higher than the lower ground electrode 26. In the air flow and Under the action of the potential difference, plasma is drawn from between the two first electrodes 22, and finally a certain width and uniform plasma discharge area 89 is generated below the first electrode 22. The plasma in this plasma discharge area 89 can efficiently process materials. Handling, with 36 speed adjustable conveyor belts, it can meet various material processing needs.

Figure 3 is a periodic image of the current and voltage during the discharge period of the present invention. It can be seen from this image that high-frequency and high-voltage alternating current can be detected on the electrode, and a displacement current can be detected on the ground electrode. The peak value on the current image is near The burr is the discharge channel generated. It can be seen from the waveform that the current peak-to-peak value is large, which is the waveform of glow discharge, rather than the small current waveform of filamentous discharge. This fully proves that the discharge type is glow discharge, which facilitates material processing.

Figure 4 is a thermal image during the discharge period of the present invention. It can be seen from the figure that the temperature at a is 28.02°C, the temperature at b is 29.54°C, and the temperature at c is 29.67°C. The device can produce lower and more uniform temperatures. Plasma can be effectively used for material processing.

Figure 5 is a comparison chart of the water contact angle of quartz glass before and after treatment. It can be seen from the figure that the water contact angle of quartz glass after treatment is significantly improved, so the hydrophilicity is significantly increased.

Figure 6 is a diagram showing the change in water contact angle of quartz glass when it is processed on a conveyor belt at a conveyor speed of 0.1m/s and when it is still and continuously processed. It can be seen from the figure that the treatment is effective once, and the number of treatments and the number of treatments can be increased according to needs. limit.

The above is based on the ideal embodiment of the present invention. Through the above description, relevant personnel can make various changes and modifications without departing from the scope of the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the description, and must be determined based on the scope of the claims.

Claims (5)

1. A device for wide-width plasma treatment of glass, characterized by: comprising a high-frequency and high-voltage AC plasma power supply, a gas chamber, a high-voltage electrode located at the outer bottom end of the gas chamber, and a high-voltage electrode located on both sides of the high-voltage electrode. two dielectric barrier plates, the gas chamber is provided with at least one air inlet and at least one air outlet, the high-voltage electrode is connected to the high-frequency and high-voltage AC plasma power supply, and each of the dielectric barrier plates The outer end of the first electrode is connected to a first electrode, and the two first electrodes are connected to a resistor, and the resistor is connected to the ground electrode; A transmission mechanism is provided below the high-voltage electrode. The transmission mechanism includes a driving roller, a driven roller, a conveyor belt and two transmission rollers. The driving roller is connected to a sprocket assembly, and the bottom end of the conveyor belt is provided with a second An electrode, the second electrode is connected to the ground electrode; The air inlet hole is circular, and the diameter of the air inlet hole is 6mm; The high-voltage electrode includes a metal capillary tube and a quartz tube wrapped around the metal capillary tube; The inner diameter of the quartz tube is 1mm, the thickness is 0.5mm, and the length is 40mm; The first electrode and the dielectric barrier plate are closely adhered; the dielectric barrier plate is a quartz dielectric barrier plate, and the distance between the dielectric barrier plate and the quartz tube is 1mm; the length of the dielectric barrier plate is 400mm, The width is 7mm and the thickness is 1mm. 2. The device for wide-width plasma treatment of glass according to claim 1, characterized in that: the bottom end of the gas chamber is provided with a plurality of air outlets at intervals, and the spacing between adjacent air outlets is is 4mm. 3. The device for wide-width plasma treatment of glass according to claim 1, characterized in that: the air outlet is in an oval shape, and the long diameter of the air outlet is 20 mm and the wide diameter is 4 mm. 4. The device for wide-width plasma treatment of glass according to claim 1, wherein the first electrode is a copper tape. 5. The device for wide-width plasma treatment of glass according to claim 1, characterized in that: the second electrode is a copper tape, and the length of the second electrode is 400 mm and the width is 2 mm.