CN108361553A - A kind of liquid-supplying system and wafer cleaning device - Google Patents
A kind of liquid-supplying system and wafer cleaning device Download PDFInfo
- Publication number
- CN108361553A CN108361553A CN201810069968.8A CN201810069968A CN108361553A CN 108361553 A CN108361553 A CN 108361553A CN 201810069968 A CN201810069968 A CN 201810069968A CN 108361553 A CN108361553 A CN 108361553A
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- China
- Prior art keywords
- liquid
- supplying system
- gas
- testing result
- detection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims abstract description 42
- 238000001514 detection method Methods 0.000 claims abstract description 40
- 230000001105 regulatory effect Effects 0.000 claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims description 47
- 239000012530 fluid Substances 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000002699 waste material Substances 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D1/00—Pipe-line systems
- F17D1/08—Pipe-line systems for liquids or viscous products
- F17D1/12—Conveying liquids or viscous products by pressure of another fluid
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D3/00—Arrangements for supervising or controlling working operations
- F17D3/01—Arrangements for supervising or controlling working operations for controlling, signalling, or supervising the conveyance of a product
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D3/00—Arrangements for supervising or controlling working operations
- F17D3/18—Arrangements for supervising or controlling working operations for measuring the quantity of conveyed product
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Water Supply & Treatment (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a kind of liquid-supplying system and wafer cleaning devices, belong to technical field of manufacturing semiconductors, including feed liquid pipeline；Supercharging device is set on feed liquid pipeline and separately connects a gas pipeline；First detection device is set in the downstream of supercharging device on feed liquid pipeline, to detect the flow of cleaning solution and export the first testing result；Second detection device is set on gas pipeline, to detect the air pressure of pressurization gas and export the second testing result；Regulating device is set on gas pipeline；Control device generates a control instruction to regulating device for analyzing the first testing result and the second testing result, and regulating device is used to adjust the flow of pressurization gas according to control instruction.The advantageous effect of above-mentioned technical proposal is：Motor driving manual modulation valve action is controlled to adjust the flow of cleaning solution according to the real-time traffic of cleaning solution, is avoided waste of human resource caused by manual operation regulating valve, and reduce and adjust valve regulation number, is extended the service life of regulating valve.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors more particularly to a kind of liquid-supplying systems suitable for wafer cleaning device
And wafer cleaning device.
Background technology
In semiconductor manufacturing, its groundwork is that circuit and electronic component (such as capacitance, thyristor) are made on wafer,
Usually one chip of manufacture needs to handle wafer using tens kinds of processing technologys, after some processing technologys (as etched,
Photoetching, chemical mechanical grinding, crystal round fringes cutting etc.), on wafer can retained particulate matter or chemical substance, these residue meetings
Subsequent processing technology is influenced, defect is introduced to device, causes the device reliability generated low, therefore, in above-mentioned processing technology
After need to clean wafer.
In the prior art, usually using being cleaned to the method for wafer cleaning showers liquid to wafer, and by cleaning
High pressure gas is injected in liquid conveyance conduit to be pressurized for cleaning solution, to ensure cleaning performance, needs to control the flow of cleaning solution
System, makes it maintain a standard level.In existing wafer cleaning device, flowmeter is provided on the conveyance conduit of cleaning solution
It is adjusted manually by manual adjustment with manual modulation valve is provided on high pressure gas conveyance conduit when wash liquid stream amount generates fluctuation
Valve is saved to adjust flow.Current flow control direction needs staff to work on the spot, inconvenient for use；In addition, artificial adjust
It is difficult to hold regulated quantity when section, needs that manual modulation valve repeatedly adjust to can be only achieved requirement, increase manual modulation valve
Loss, makes manual modulation valve service life shorten.
Invention content
According to the above-mentioned problems in the prior art, now provide a kind of liquid-supplying system suitable for wafer cleaning device and
Wafer cleaning device controls motor driving manual modulation valve action to adjust the stream of cleaning solution according to the real-time traffic of cleaning solution
Amount, it is intended to solve in the prior art, the waste of human resources caused by manual operation regulating valve, regulating valve service life shortens
Problem.The present invention adopts the following technical scheme that：
A kind of liquid-supplying system is applied in wafer cleaning device, and the liquid-supplying system includes：
Feed liquid pipeline, for conveying cleaning solution；
Supercharging device is set on the feed liquid pipeline, and the supercharging device is also connected with a gas pipeline and uses gas
The pressurization gas of pipeline is pressurized for the cleaning solution；
First detection device is set in the downstream of the supercharging device on the feed liquid pipeline, the first detection dress
It sets the flow for detecting the cleaning solution and exports the first testing result；
Second detection device is set on the gas pipeline, and the second detection device is for detecting the supercharging gas
The air pressure of body simultaneously exports the second testing result；
Regulating device is set between the supercharging device and the second detection device on the gas pipeline；
Control device connects first detection device, second detection device and the regulating device, the control device
A control instruction is generated to the regulating device for analyzing first testing result and second testing result；
The regulating device is used to adjust the flow of the pressurization gas according to the control instruction.
Preferably, in above-mentioned liquid-supplying system, the regulating device includes：
Manual modulation valve is set on the gas pipeline, and the manual modulation valve has an adjusting knob；
Driving device, connects the control device, and the driving device includes an output shaft, described in the output axis connection
Adjusting knob；
The driving device is used to drive the adjusting knob to rotate according to the control instruction, to adjust the supercharging gas
The flow of body.
Preferably, in above-mentioned liquid-supplying system, the driving device is stepper motor.
Preferably, in above-mentioned liquid-supplying system, first detection device is fluid flowmeter.
Further include the first analog-digital commutator preferably, in above-mentioned liquid-supplying system, the control device passes through described first
Analog-digital commutator connects the fluid flowmeter；
First analog-digital commutator is for first testing result that the fluid flowmeter exports to be converted into
Digital signal.
Preferably, in above-mentioned liquid-supplying system, the second detection device is gas gauge.
Further include the second analog-digital commutator preferably, in above-mentioned liquid-supplying system, the control device passes through described second
Analog-digital commutator connects the gas gauge；
Second analog-digital commutator is for second testing result that the gas gauge exports to be converted into
Digital signal.
Preferably, in above-mentioned liquid-supplying system, the pressurization gas is nitrogen.
Preferably, in above-mentioned liquid-supplying system, the cleaning solution is deionized water.
Further include a kind of wafer cleaning device, wherein including the liquid-supplying system described in above-mentioned any one.
The advantageous effect of above-mentioned technical proposal is：It is dynamic that motor driving manual modulation valve is controlled according to the real-time traffic of cleaning solution
Make, to adjust the flow of cleaning solution, to avoid waste of human resource caused by manual operation regulating valve, and reduce regulating valve tune
Number is saved, the service life of regulating valve is extended.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of liquid-supplying system in the preferred embodiment of the present invention.
Specific implementation mode
The invention will be further described in the following with reference to the drawings and specific embodiments, but not as limiting to the invention.
In the preferred embodiment of the present invention, as shown in Figure 1, providing a kind of liquid-supplying system, it is applied to wafer cleaning device
In, liquid-supplying system includes：
Feed liquid pipeline 1, for conveying cleaning solution；
Supercharging device 2 is set on feed liquid pipeline 1, and supercharging device 1 is also connected with a gas pipeline 3 and uses gas pipeline 3
The pressurization gas of conveying is pressurized for cleaning solution；
First detection device 4, is set in the downstream of supercharging device 2 on feed liquid pipeline 1, and the first detection device 4 is for examining
It surveys the flow of cleaning solution and exports the first testing result；
Second detection device 5 is set on gas pipeline 3, and second detection device 5 is used to detect the air pressure of pressurization gas simultaneously
Export the second testing result；
Regulating device 6 is set between supercharging device 2 and second detection device 5 on gas pipeline 3；
Control device 7, the first detection device 4 of connection, second detection device 5 and regulating device 6, control device 7 is for dividing
It analyses the first testing result and the second testing result generates a control instruction to regulating device 6；
Regulating device 6 is used to adjust the flow of pressurization gas according to control instruction.
In the present embodiment, the detection knot of the first detection device 4 and the output of second detection device 5 is obtained using control device 7
Fruit, and the first testing result of processing and the second testing result generate control instruction and export to regulating device 6,6 basis of regulating device
Control instruction adjusts the flow of pressurization gas, to achieve the purpose that adjust cleaning solution flow.
In above-mentioned technical proposal, staff is not needed to Field adjustment cleaning solution flow, avoids manual operation adjusting
Waste of human resource caused by valve, and reduce and adjust valve regulation number, extend the service life of regulating valve.
In the preferred embodiment of the present invention, regulating device 6 includes：
Manual modulation valve 61 is set on gas pipeline 3, and there is manual modulation valve 61 adjusting knob (not show in figure
Go out)；
Driving device 62 connects control device 7, and driving device 62 includes an output shaft (not shown), and output shaft connects
Connect adjusting knob；
Driving device 62 is used to drive adjusting knob rotation according to control instruction, to adjust the flow of pressurization gas.
Since in the prior art, the regulating valve used on gas pipeline 3 is manual modulation valve 61, existing to avoid changing
Pipeline structure in the present embodiment, drives the adjusting knob of manual modulation valve 61 to rotate using a driving device 62, is increased with adjusting
It calms the anger the flow of body, is realizing that the while of automatically adjusting cleaning solution flow reduces the transformation to existing equipment, to reduce cost.
In the preferred embodiment of the present invention, driving device 62 is stepper motor.
In the preferred embodiment of the present invention, the first detection device 4 is fluid flowmeter.
Further include the first analog-digital commutator 8, control device 7 passes through the first modulus in the preferable implementation column of the present invention
Conversion equipment 8 connects fluid flowmeter (the first detection device 4)；
The first testing result that first analog-digital commutator 8 is used to export fluid flowmeter (the first detection device 4) turns
Change digital signal into.
In the present embodiment, the ultrasonic flowmeter that fluid flowmeter (the first detection device 4) uses, output signal 4-
Current signal is converted into corresponding digital signal so that control fills by the current signal of 20mA using the first analog-digital commutator 8
Set processing；Its flow of ultrasonic flowmeter and electric current output are linear, when output signal is 4mA, indicate that flow is 0,
When output signal is 20mA, indicate that flow is the maximum range of ultrasonic flowmeter.
In the preferred embodiment of the present invention, second detection device 5 is gas gauge.
Further include the second analog-digital commutator 9, control device 7 passes through the second modulus in the preferred embodiment of the present invention
Conversion equipment 9 connects gas gauge (second detection device 5)；
The second testing result that second analog-digital commutator 9 is used to export gas gauge (second detection device 5) turns
Change digital signal into.
In the present embodiment, the output signal of gas gauge (second detection device 5) is the voltage signal of 1-5V, uses the
Voltage signal is converted into corresponding digital signal for control device processing by two analog-digital commutators 8；Gas gauge (second
Detection device 5) voltage output and the air pressure of its surveyed gas it is linear, when output signal be 1V when, indicate air pressure be
0, when output signal is 5V, expression air pressure is the maximum range of gas gauge (second detection device 5).
In the preferred embodiment of the present invention, pressurization gas is nitrogen.
In the preferred embodiment of the present invention, cleaning solution is deionized water.
In the present embodiment, control device 7, the first analog-digital commutator 8, the second analog-digital commutator 9 are integrated in an electricity
On the plate of road, and stepper motor (driving device 62) and control device 7 are connected by RS232 interface.
Further include a kind of wafer cleaning device in technical scheme of the present invention, which uses above-mentioned confession
Liquid system.
It these are only preferred embodiments of the present invention, be not intended to limit the implementation manners and the protection scope of the present invention, it is right
For those skilled in the art, it should can appreciate that and all be replaced with being equal made by description of the invention and diagramatic content
It changes and obviously changes obtained scheme, should all be included within the scope of the present invention.
Claims (10)
1. a kind of liquid-supplying system, it is applied in wafer cleaning device, which is characterized in that the liquid-supplying system includes：
Feed liquid pipeline, for conveying cleaning solution；
Supercharging device is set on the feed liquid pipeline, and the supercharging device is also connected with a gas pipeline and uses gas pipeline
The pressurization gas of conveying is pressurized for the cleaning solution；
First detection device is set in the downstream of the supercharging device on the feed liquid pipeline, and first detection device is used
In the flow for detecting the cleaning solution and export the first testing result；
Second detection device is set on the gas pipeline, and the second detection device is for detecting the pressurization gas
Air pressure simultaneously exports the second testing result；
Regulating device is set between the supercharging device and the second detection device on the gas pipeline；
Control device connects first detection device, second detection device and the regulating device, the control device and is used for
It analyzes first testing result and second testing result generates a control instruction to the regulating device；
The regulating device is used to adjust the flow of the pressurization gas according to the control instruction.
2. liquid-supplying system as described in claim 1, which is characterized in that the regulating device includes：
Manual modulation valve is set on the gas pipeline, and the manual modulation valve has an adjusting knob；
Driving device connects the control device, and the driving device includes an output shaft, is adjusted described in the output axis connection
Knob；
The driving device is used to drive the adjusting knob to rotate according to the control instruction, to adjust the pressurization gas
Flow.
3. liquid-supplying system as claimed in claim 2, which is characterized in that the driving device is stepper motor.
4. liquid-supplying system as described in claim 1, which is characterized in that first detection device is fluid flowmeter.
5. liquid-supplying system as claimed in claim 4, which is characterized in that further include the first analog-digital commutator, the control dress
It sets and the fluid flowmeter is connected by first analog-digital commutator；
First analog-digital commutator is used to first testing result that the fluid flowmeter exports being converted into number
Signal.
6. liquid-supplying system as described in claim 1, which is characterized in that the second detection device is gas gauge.
7. liquid-supplying system as claimed in claim 6, which is characterized in that further include the second analog-digital commutator, the control dress
It sets and the gas gauge is connected by second analog-digital commutator；
Second analog-digital commutator is used to second testing result that the gas gauge exports being converted into number
Signal.
8. liquid-supplying system as described in claim 1, which is characterized in that the pressurization gas is nitrogen.
9. liquid-supplying system as described in claim 1, which is characterized in that the cleaning solution is deionized water.
10. a kind of wafer cleaning device, which is characterized in that include the liquid-supplying system as described in any one of claim 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810069968.8A CN108361553A (en) | 2018-01-24 | 2018-01-24 | A kind of liquid-supplying system and wafer cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810069968.8A CN108361553A (en) | 2018-01-24 | 2018-01-24 | A kind of liquid-supplying system and wafer cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108361553A true CN108361553A (en) | 2018-08-03 |
Family
ID=63006770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810069968.8A Pending CN108361553A (en) | 2018-01-24 | 2018-01-24 | A kind of liquid-supplying system and wafer cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108361553A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110976377A (en) * | 2019-12-10 | 2020-04-10 | 谢广钦 | Ultrasonic cleaning device for wafer cleaning |
| CN111734958A (en) * | 2020-06-23 | 2020-10-02 | 安徽威奇电工材料有限公司 | Conveying pipeline supply pressurization system for enameled wire production |
| CN112786499A (en) * | 2021-03-11 | 2021-05-11 | 长江存储科技有限责任公司 | Liquid supply device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040139985A1 (en) * | 2003-01-22 | 2004-07-22 | Applied Materials, Inc. | Rate monitor for wet wafer cleaning |
| KR20100060902A (en) * | 2008-11-28 | 2010-06-07 | 세메스 주식회사 | Method and apparatus for supplying treating liquid |
| CN102909202A (en) * | 2011-08-02 | 2013-02-06 | 采钰科技股份有限公司 | Cleaning system, cleaning device and method for using cleaning device |
| CN103028564A (en) * | 2011-09-30 | 2013-04-10 | 金宝电子（中国）有限公司 | Solution supply unit, cleaning system and cleaning method thereof |
| CN103592979A (en) * | 2012-08-15 | 2014-02-19 | 盛美半导体设备（上海）有限公司 | Cleaning fluid flow control system and control method |
-
2018
- 2018-01-24 CN CN201810069968.8A patent/CN108361553A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040139985A1 (en) * | 2003-01-22 | 2004-07-22 | Applied Materials, Inc. | Rate monitor for wet wafer cleaning |
| KR20100060902A (en) * | 2008-11-28 | 2010-06-07 | 세메스 주식회사 | Method and apparatus for supplying treating liquid |
| CN102909202A (en) * | 2011-08-02 | 2013-02-06 | 采钰科技股份有限公司 | Cleaning system, cleaning device and method for using cleaning device |
| CN103028564A (en) * | 2011-09-30 | 2013-04-10 | 金宝电子（中国）有限公司 | Solution supply unit, cleaning system and cleaning method thereof |
| CN103592979A (en) * | 2012-08-15 | 2014-02-19 | 盛美半导体设备（上海）有限公司 | Cleaning fluid flow control system and control method |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110976377A (en) * | 2019-12-10 | 2020-04-10 | 谢广钦 | Ultrasonic cleaning device for wafer cleaning |
| CN111734958A (en) * | 2020-06-23 | 2020-10-02 | 安徽威奇电工材料有限公司 | Conveying pipeline supply pressurization system for enameled wire production |
| CN111734958B (en) * | 2020-06-23 | 2022-06-07 | 安徽威奇电工材料有限公司 | Conveying pipeline supply pressurization system for enameled wire production |
| CN112786499A (en) * | 2021-03-11 | 2021-05-11 | 长江存储科技有限责任公司 | Liquid supply device |
| CN112786499B (en) * | 2021-03-11 | 2021-12-17 | 长江存储科技有限责任公司 | Liquid supply device |
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Application publication date: 20180803 |
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