CN108321672B - A High Peak Power Holmium Laser System - Google Patents
A High Peak Power Holmium Laser System Download PDFInfo
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- 229910052689 Holmium Inorganic materials 0.000 title claims abstract description 36
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 239000013078 crystal Substances 0.000 claims abstract description 48
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000005086 pumping Methods 0.000 claims abstract description 5
- 229910052681 coesite Inorganic materials 0.000 claims abstract 4
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract 4
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract 4
- 229910052682 stishovite Inorganic materials 0.000 claims abstract 4
- 229910052905 tridymite Inorganic materials 0.000 claims abstract 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims abstract 3
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000002994 raw material Substances 0.000 claims description 12
- 229910052775 Thulium Inorganic materials 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052593 corundum Inorganic materials 0.000 claims description 6
- 239000010431 corundum Substances 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000007858 starting material Substances 0.000 claims description 4
- 239000004809 Teflon Substances 0.000 claims description 3
- 229920006362 Teflon® Polymers 0.000 claims description 3
- 238000001354 calcination Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000011819 refractory material Substances 0.000 claims description 3
- 238000003746 solid phase reaction Methods 0.000 claims description 3
- 229910052724 xenon Inorganic materials 0.000 claims description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- 239000010437 gem Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 238000005303 weighing Methods 0.000 claims 1
- 230000006378 damage Effects 0.000 abstract description 3
- 238000013329 compounding Methods 0.000 abstract 1
- 239000004575 stone Substances 0.000 description 12
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 10
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000008832 photodamage Effects 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 208000009911 Urinary Calculi Diseases 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- -1 thulium ions Chemical group 0.000 description 2
- 210000000626 ureter Anatomy 0.000 description 2
- 150000000922 Holmium Chemical class 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 210000003734 kidney Anatomy 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 230000028161 membrane depolarization Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 210000004877 mucosa Anatomy 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 210000001519 tissue Anatomy 0.000 description 1
- 210000003708 urethra Anatomy 0.000 description 1
- 210000003932 urinary bladder Anatomy 0.000 description 1
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- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10061—Polarization control
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Abstract
Description
技术领域technical field
本发明涉及钬激光系统,具体涉及一种高峰值功率的钬激光系统,该系统采用了特殊的高损伤阈值电光调Q晶体。The invention relates to a holmium laser system, in particular to a holmium laser system with high peak power, which adopts a special electro-optical Q-switched crystal with high damage threshold.
背景技术Background technique
泌尿结石是泌尿外科的常见疾病和多发病,结石可见于肾、膀胱、输尿管和尿道的任何部位,泌尿系结石易并发梗阻与感染,常伴有剧痛症状,给患者带来很大的痛苦。Urinary calculi is a common and frequently-occurring disease in urology. The calculi can be found in any part of the kidney, bladder, ureter and urethra. Urinary calculi are prone to obstruction and infection, often accompanied by severe pain symptoms, which bring great pain to patients. .
钬激光碎石在1995年首次应用于腔内碎石治疗,相对于其它腔内碎石术,其优点明显,例如钬激光能够粉碎各种成分和密度的结石,一次性碎石率高;碎石时结石无移动,且产生的碎屑较小,结石排净日期也明显缩短,减少了住院时间;钬激光碎石时内窥镜视野不被干扰,且产生的冲击波效应很弱,因而不会损伤输尿管黏膜;另外由于钬激光可以同时处理息肉,因此对被息肉包裹住的结石的疗效明显优于其他方法。Holmium laser lithotripsy was first used in intracavitary lithotripsy in 1995. Compared with other intracavitary lithotripsy, it has obvious advantages. For example, holmium laser can crush stones of various compositions and densities, and the one-time lithotripsy rate is high; The stone does not move during lithotripsy, and the generated debris is small, and the date of clearing the stone is also significantly shortened, which reduces the hospitalization time; the endoscope field of view is not disturbed during holmium laser lithotripsy, and the shock wave effect generated is very weak, so it is not possible It will damage the ureteral mucosa; in addition, because the holmium laser can treat polyps at the same time, the curative effect on the stones wrapped by polyps is obviously better than other methods.
目前市面上的钬激光碎石治疗仪,均为自由运转的钬激光系统,其激光输出脉宽在几百微秒量级,其在面对巨大结石、鹿角形结石、输尿管上段结石和特殊成分结石等,往往会显得效果欠佳。根据E.Duco Jansen等人研究,纳秒量级的调Q钬激光,由于其脉宽窄,峰值功率高,其碎石效率相较于自由运转的钬激光来说有非常明显的提升,对于巨大结石、鹿角形结石、特殊成分结石等,使用调Q钬激光进行碎石效果非常好,同时其对生物组织的热损伤较低,降低了手术的副作用。At present, the holmium laser lithotripsy devices on the market are all free-running holmium laser systems. The laser output pulse width is in the order of hundreds of microseconds. It is suitable for huge stones, staghorn stones, upper ureter stones and special components. Stones, etc., often appear ineffective. According to the research of E.Duco Jansen et al., the nanosecond-scale Q-switched holmium laser, due to its narrow pulse width and high peak power, has a very significant improvement in the stone crushing efficiency compared with the free-running holmium laser. For huge stones, staghorn stones, stones with special components, etc., the use of Q-switched holmium laser for lithotripsy is very effective, and at the same time, its thermal damage to biological tissues is low, which reduces the side effects of surgery.
但是,对于高峰值功率、窄脉宽的调Q钬激光技术,目前面临着一些技术障碍。例如在近红外波段(1064nm)处有成熟的、性能优越的电光调Q晶体KD*P,而在中红外波段则缺乏光损伤阈值高、电光性能好的晶体;再者,钬激光属于准三能级结构,在高峰值功率电光调Q运转下,其热透镜效应、热退偏效应将非常明显,不仅会显著降低激光效率使峰值功率大打折扣,也会使光束模式变差,不利于其相关应用。However, there are some technical obstacles for the Q-switched holmium laser technology with high peak power and narrow pulse width. For example, in the near-infrared band (1064nm), there is a mature electro-optical Q-switched crystal KD*P with excellent performance, while in the mid-infrared band, there is a lack of crystals with high light damage threshold and good electro-optical performance; The energy level structure, under the operation of high peak power electro-optical Q-switching, the thermal lens effect and thermal depolarization effect will be very obvious, which will not only significantly reduce the laser efficiency and greatly reduce the peak power, but also deteriorate the beam pattern, which is not conducive to its energy level structure. related applications.
发明内容SUMMARY OF THE INVENTION
针对现有技术中存在的不足之处,以及上述问题或缺陷,本发明的目的在于提供一种高峰值功率的钬激光系统,通过高掺镁的硅酸镓镧晶体来实现高阈值高峰值功率的钬激光输出。In view of the deficiencies existing in the prior art, as well as the above-mentioned problems or defects, the purpose of the present invention is to provide a holmium laser system with high peak power, which realizes high threshold and high peak power through a highly magnesium-doped lanthanum silicate crystal. holmium laser output.
为实现上述技术目的,达到上述技术效果,本发明通过以下技术方案实现,在光路上依次设置有全反装置、激光增益介质、泵浦源、起偏器、电光调Q晶体、输出镜;In order to achieve the above-mentioned technical purpose and achieve the above-mentioned technical effect, the present invention is realized by the following technical solutions, and an all-inversion device, a laser gain medium, a pump source, a polarizer, an electro-optical Q-switching crystal, and an output mirror are sequentially arranged on the optical path;
其中,所述电光调Q晶体为掺杂MgO的La3Ga5SiO14晶体(LGS晶体),制备该电光调Q晶体的原料包括MgO、La2O3、Ga2O3、SiO2,各原料用量的摩尔百分比如下:Wherein, the electro-optical Q-switching crystal is La 3 Ga 5 SiO 14 crystal (LGS crystal) doped with MgO, and the raw materials for preparing the electro-optic Q-switching crystal include MgO, La 2 O 3 , Ga 2 O 3 , SiO 2 , each of which is The molar percentages of the raw materials are as follows:
优选的是,所述制备电光调Q晶体的原料中,La2O3与SiO2两者用量的摩尔比为3∶1。Preferably, in the raw materials for preparing the electro-optical Q-switched crystal, the molar ratio of La 2 O 3 and SiO 2 is 3:1.
优选的是,所述激光增益介质为Cr,Tm,Ho:YAG激光棒,该激光棒两端镀有2090nm波段的增透膜。Preferably, the laser gain medium is a Cr, Tm, Ho: YAG laser rod, and both ends of the laser rod are coated with an anti-reflection film in a wavelength of 2090 nm.
优选的是,所述Cr,Tm,Ho:YAG激光棒的离子掺杂浓度如下:Preferably, the ion doping concentration of the Cr, Tm, Ho:YAG laser rod is as follows:
Cr: 1.3-1.35mol%;Cr: 1.3-1.35mol%;
Tm: 5.8-5.85mol%;Tm: 5.8-5.85mol%;
Ho: 0.4-0.41mol%。Ho: 0.4-0.41 mol%.
优选的是,所述泵浦源为包含聚四氟乙烯紧包腔的氙灯,共同对激光增益介质进行高效率的泵浦。Preferably, the pumping source is a xenon lamp containing a Teflon tight-packed cavity, which together can pump the laser gain medium with high efficiency.
优选的是,所述起偏器为三层平行等距,且与光轴呈布鲁斯特角放置的白宝石片。Preferably, the polarizer is a sapphire sheet with three layers of parallel equidistant and placed at Brewster's angle with the optical axis.
优选的是,所述输出镜镀有2090nm波段半透半反膜,该半透半反膜在2090nm波段透过率为10%-15%。Preferably, the output mirror is coated with a 2090nm waveband transflective film, and the transflective film has a transmittance of 10%-15% in the 2090nm waveband.
优选的是,所述电光调Q晶体的制备方法包括以下步骤:Preferably, the preparation method of the electro-optical Q-switched crystal comprises the following steps:
1)按照规定用量称取MgO、La2O3、Ga2O3、SiO2作为起始原料,其中,Ga2O3选用6N级别;1) Weigh MgO, La 2 O 3 , Ga 2 O 3 , SiO 2 as starting materials according to the prescribed amount, wherein Ga 2 O 3 selects 6N grade for use;
2)将起始原料充分混合均匀后压块,放入铂坩埚中,在900-1200℃下煅烧10-15个小时,由固相反应获得多晶料;2) After fully mixing the starting materials, briquetting them, putting them into a platinum crucible, and calcining them at 900-1200° C. for 10-15 hours to obtain polycrystalline materials by solid-phase reaction;
3)将多晶料放入铱坩埚中,将该铱坩埚置于刚玉坩埚中,在该刚玉坩埚中填充保温耐火材料,炉体密封,充入高纯氮气,并添加2%-5%的氧气;使用射频加热并充分熔化,熔化后在120℃-140℃范围内保温3-5个小时,随后采用提拉法进行生长,得到电光调Q晶体。3) Put the polycrystalline material into the iridium crucible, place the iridium crucible in the corundum crucible, fill the thermal insulation refractory material in the corundum crucible, seal the furnace body, fill with high-purity nitrogen, and add 2%-5% of Oxygen; use radio frequency heating and fully melt, after melting, keep the temperature in the range of 120°C-140°C for 3-5 hours, and then use the pulling method to grow to obtain an electro-optical Q-switched crystal.
本发明的有益效果是:本发明采用掺杂特定比例MgO的La3Ga5SiO14晶体作为电光调Q晶体,解决了目前中红外波段电光调Q晶体光损伤阈值低的问题,从而实现高峰值功率的纳秒级钬激光输出。The beneficial effects of the present invention are as follows: the present invention adopts the La 3 Ga 5 SiO 14 crystal doped with a specific proportion of MgO as the electro-optical Q-switching crystal, which solves the problem of the low light damage threshold of the current mid-infrared band electro-optical Q-switching crystal, thereby achieving a high peak value Power of nanosecond holmium laser output.
附图说明Description of drawings
图1为高峰值功率的钬激光系统结构示意图;Figure 1 is a schematic diagram of the structure of a holmium laser system with high peak power;
图中标号说明:1-全反装置、2-激光增益介质、3-泵浦源、4-起偏器、5-电光调Q晶体、6-输出镜、7-高反膜、8-增透膜、9-半反半透膜、10-输出激光。Description of the labels in the figure: 1- total reflection device, 2-laser gain medium, 3-pump source, 4-polarizer, 5-electro-optical Q-switching crystal, 6-output mirror, 7-high reflection film, 8-increase Permeable membrane, 9-semi-reflective semi-permeable membrane, 10-output laser.
具体实施方式Detailed ways
下面结合附图对本发明做进一步的详细说明,以令本领域技术人员参照说明书文字能够据以实施。The present invention will be further described in detail below with reference to the accompanying drawings, so that those skilled in the art can implement it with reference to the description.
应当理解,本文所使用的诸如“具有”、“包含”以及“包括”术语并不排出一个或多个其它元件或其组合的存在或添加。It should be understood that terms such as "having", "comprising" and "including" as used herein do not exclude the presence or addition of one or more other elements or combinations thereof.
图1示出了根据本发明的一种实现形式,其包括:Fig. 1 shows an implementation form according to the present invention, which includes:
激光谐振腔,其包括中心轴线在激光光路上的全反装置1和输出镜6,该构件用以选择一定频率且沿谐振腔轴线运动的光,并对其进行放大;A laser resonator, which includes an all-inversion device 1 with a central axis on the laser light path and an
其中,全反装置1由一片全反镜组成,镜面镀有2090nm的高反膜7,输出镜6表面镀有2090nm波段透过率为15%的半透半反膜9,在该透过率下能够最高效率的输出调Q钬激光同时保持腔内器件不受损。Among them, the total reflection device 1 is composed of a total reflection mirror, the mirror surface is coated with a 2090 nm high-
激光增益介质2,为一根位于所述激光谐振腔内的Cr,Tm,Ho:YAG激光棒,用以吸收泵浦光输出的2090nm钬激光,其两端镀有2090nm波段的增透膜8;该Cr,Tm,Ho:YAG激光棒的离子掺杂浓度为Cr:1.32mol%、Tm:5.82mol%、Ho:0.4mol%,该掺杂浓度下,临近铥离子之间会发生交叉弛豫(3H4→3F4,3H6→3F4),一个泵浦源光子可以将两个铥离子激发到3F4级,有效提高激光器的效率,同时又可避免因铥离子过高而导致离子团簇的出现,从而获得高效率的钬激光输出。The laser gain medium 2 is a Cr, Tm, Ho:YAG laser rod located in the laser resonator, which is used to absorb the 2090nm holmium laser output by the pump light, and its two ends are coated with an antireflection film 8 in the 2090nm band ; The ion doping concentration of the Cr, Tm, Ho:YAG laser rod is Cr: 1.32 mol%, Tm: 5.82 mol%, Ho: 0.4 mol%, under this doping concentration, cross relaxation will occur between adjacent thulium ions Yu ( 3 H 4 → 3 F 4 , 3 H 6 → 3 F 4 ), one pump source photon can excite two thulium ions to the 3 F 4 level, which can effectively improve the efficiency of the laser and avoid the Too high will lead to the appearance of ion clusters, so as to obtain high-efficiency holmium laser output.
泵浦源3,为一个包含聚四氟乙烯紧包腔的氙灯,共同对激光增益介质2进行高效率的泵浦。The
起偏器4,为三层平行等距,且与光轴呈布鲁斯特角放置的白宝石片。The
电光调Q晶体5,为掺杂特定比例MgO的La3Ga5SiO14晶体,其原料初始配比为:MgO:3.7mol%、La2O3:31.8mol%、Ga2O3:53.9mol%、SiO2:10.6mol%;对于LGS晶体中掺MgO浓度在3.7mol%左右时,晶体中会伴生晶格弛豫,这将引起离子环境的变化,并使晶体的物理性质发生突变,尤其是其光损伤阈值将提升数倍,达到与KD*P相当的水平。同时,掺MgO浓度过高会导致LGS晶体的光透过率迅速下降,故初始原料中3.7mol%的MgO能够保证LGS晶体拥有较高光损伤阈值的前提下,保持优秀的电光性能及光透过率。生长LGS晶体的原始配料中,如若Ga2O3的配比偏低,则可能会有LaGaO3或La2Si2O7等析出,这将在LGS晶体中形成新的晶核,使其电光性能大打折扣,而适当增加Ga2O3的配比则可以避免这种情况的发生并且可以在一定程度上提高晶体的长出量。故而原料初始配比为MgO:3.7mol%、La2O3:31.8mol%、Ga2O3:53.9mol%、SiO2:10.6mol%时,生长出来的LGS晶体将是中红外波段性能优越的电光调Q晶体,能够为实现高峰值功率的纳秒级钬激光输出提供条件。The electro-optical Q-switched
用作电光调Q晶体5的是掺杂特定比例MgO的La3Ga5SiO14晶体,其生长方法,包括以下步骤:The electro-optical Q-switching
1)采用前述配比的高纯MgO、La2O3、Ga2O3、SiO2作为起始原料,其中Ga2O3采用6N级别;1) Using the high-purity MgO, La 2 O 3 , Ga 2 O 3 and SiO 2 of the aforementioned proportions as starting materials, wherein Ga 2 O 3 adopts 6N grade;
2)将原料充分混合均匀后压块,放入铂坩埚中,在1150℃下煅烧15个小时,由固相反应获得多晶料;2) After fully mixing the raw materials, briquetting, putting it into a platinum crucible, calcining at 1150 ° C for 15 hours, and obtaining polycrystalline material by solid-phase reaction;
3)将上述多晶料放入铱坩埚中,将该铱坩埚放置于刚玉坩埚中,在所述刚玉坩埚中填充保温耐火材料,炉体密封,充入高纯氮气,并添加3%的氧气;使用射频加热并充分熔化,熔化后在140℃范围内保温5个小时,随后采用提拉法进行生长,得到最终的掺杂特定比例MgO的La3Ga5SiO14晶体。3) Put the above-mentioned polycrystalline material into the iridium crucible, place the iridium crucible in the corundum crucible, fill the thermal insulation refractory material in the corundum crucible, seal the furnace body, fill with high-purity nitrogen, and add 3% oxygen ; Use radio frequency heating and fully melt, after melting, keep at 140 °C for 5 hours, and then use the pulling method to grow to obtain the final La 3 Ga 5 SiO 14 crystal doped with a specific proportion of MgO.
本发明中LGS晶体作为光学级用于电光调Q应用,对晶体的光学均匀性等光学性能要求很高,采用纯度很高的Ga2O3作为原料可以极大的减少晶体中的散射颗粒,提高光学性能。另外,在生长及退火过程中保持3%左右的氧气分压,能够得到颜色较为透明的LGS晶体,也能提高LGS晶体的光损伤阈值。In the present invention, the LGS crystal is used as an optical grade for electro-optical Q-switching applications, and requires high optical properties such as optical uniformity of the crystal. The use of Ga 2 O 3 with high purity as a raw material can greatly reduce the scattering particles in the crystal. Improve optical performance. In addition, maintaining an oxygen partial pressure of about 3% during the growth and annealing process can obtain a LGS crystal with a relatively transparent color, and can also improve the light damage threshold of the LGS crystal.
尽管本发明的实施方案已公开如上,但其并不仅仅限于说明书和实施方式中所列运用。它完全可以被适用于各种适合本发明的领域。对于熟悉本领域的人员而言,可容易地实现另外的修改。因此在不背离权利要求及等同范围所限定的一般概念下,本发明并不限于特定的细节和这里示出与描述的图例。Although embodiments of the present invention have been disclosed above, they are not limited to the applications set forth in the specification and embodiments. It can be fully adapted to various fields suitable for the present invention. Additional modifications can readily be implemented by those skilled in the art. Therefore, the invention is not to be limited to the specific details and illustrations herein shown and described, without departing from the general concept defined by the appended claims and the scope of equivalents.
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