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CN108250749A - A kind of preparation method of phenyl silsesquioxane/graphene oxide/polyimides three-phase composite film - Google Patents

A kind of preparation method of phenyl silsesquioxane/graphene oxide/polyimides three-phase composite film Download PDF

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CN108250749A
CN108250749A CN201810160083.9A CN201810160083A CN108250749A CN 108250749 A CN108250749 A CN 108250749A CN 201810160083 A CN201810160083 A CN 201810160083A CN 108250749 A CN108250749 A CN 108250749A
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周宏�
汪修权
张航
金立国
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Harbin University of Science and Technology
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Abstract

一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,本发明涉及绝缘材料技术领域,具体涉及一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法。本发明是要解决现有复合薄膜无法兼顾降低介电常数的同时提高其热学性能及力学性能的问题。方法:通过改进的Hummers法制备氧化石墨烯;采用原位聚合法制备苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜。本发明应用于苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相薄膜的制备。

A method for preparing a phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film, the invention relates to the technical field of insulating materials, in particular to a phenylsilsesquioxane/graphene oxide/ A method for preparing a polyimide three-phase composite film. The invention aims to solve the problem that the existing composite film cannot reduce the dielectric constant and improve its thermal performance and mechanical performance at the same time. Methods: Graphene oxide was prepared by improved Hummers method; phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film was prepared by in-situ polymerization. The invention is applied to the preparation of phenylsilsesquioxane/graphene oxide/polyimide three-phase film.

Description

一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的 制备方法A kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film Preparation

技术领域technical field

本发明涉及绝缘材料技术领域,具体涉及一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法。The invention relates to the technical field of insulating materials, in particular to a method for preparing a phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film.

背景技术Background technique

近年来,具有低介电常数的纳米多孔材料在微电子工业中的应用引起了极大的关注。由于良好的力学性能、热性能及电性能,聚酰亚胺已被广泛用于微电子工业中介电材料及包装材料。然而,随着集成电路中芯片的特征尺寸的不断减小,互连寄生的电阻和电容便会引起信号传输的延迟、串扰及能量损耗,这已成为集成电路向高速、高密度、低能耗以及多功能方向发展的新的桎梏。为了达到集成电路高集成度的要求,提高信号的传输速度,封装内的高密度的信号线路要求彼此之间保持电绝缘,应选取介电常数尽可能低的材料作为金属层间的绝缘材料,以确保最小的电交互信号能够正常在相邻的线路中传输。利用空气的低介电常数能明显降低聚酰亚胺的介电常数,一种方法是通过在基体中引入空隙制备低介电材料,另一种方法是以杂化的方式在聚酰亚胺中以引入具有空心结构的单体来降低材料的介电常数。材料中具有纳米尺寸、均匀、封闭的孔隙有利于保持其电学和力学性能。因此,在连接结构材料中引入空气间隙以及在聚合物中引入空气来降低材料的介电常数已经成为一个吸引人的方法。In recent years, the application of nanoporous materials with low dielectric constant in the microelectronics industry has attracted great attention. Due to good mechanical properties, thermal properties and electrical properties, polyimide has been widely used in dielectric materials and packaging materials in the microelectronics industry. However, with the continuous reduction of the feature size of the chip in the integrated circuit, the parasitic resistance and capacitance of the interconnection will cause the delay of signal transmission, crosstalk and energy loss. A new shackle for the development of multifunctional direction. In order to meet the requirements of high integration of integrated circuits and increase the transmission speed of signals, the high-density signal lines in the package are required to be electrically insulated from each other. Materials with a dielectric constant as low as possible should be selected as insulating materials between metal layers. To ensure that the smallest electrical interaction signals can be normally transmitted in adjacent lines. The dielectric constant of polyimide can be significantly reduced by using the low dielectric constant of air. One method is to prepare low dielectric materials by introducing voids in the matrix, and the other method is to hybridize polyimide In order to introduce a monomer with a hollow structure to reduce the dielectric constant of the material. Nano-sized, uniform and closed pores in materials are beneficial to maintain their electrical and mechanical properties. Therefore, it has become an attractive approach to introduce air gaps in joining structural materials and air in polymers to reduce the dielectric constant of materials.

制备低介电常数的聚酰亚胺薄膜,可以通过引入无机组分实现,一类无机-有机组分—苯基低聚倍半硅氧烷是由刚性的立方体二氧化硅[八聚物(R8Si8O12)]核心与尺寸为0.3~0.4nm的孔隙组成。具有介于无机陶瓷和有机桂聚合物的之间的特殊结构,因此这类分子具有杂化性质。基于苯基倍半硅氧烷的聚合物薄膜具有低介电常数性质,制备过程中添加偶联剂改性苯基倍半硅氧烷引入聚酰亚胺,制备的有机-无机纳米复合物具有比原始的聚酰亚胺更低的介电常数。另一类无机组分-氧化石墨烯,与昂贵的富勒烯和碳纳米管相比,氧化石墨烯价格低廉,原料易得,具有好的纳米片层结构,比表面积大,表面丰富的功能基团等使其在水和有机溶剂中有较好的分散性,易与聚合物之间形成化学键或氢键,从而使其在提高聚合物复合材料的各项性能方便具有更大的潜力,尤其是力学性能和热血性能的提高方面,故可用于聚合物纳米复合薄膜的制备。但将苯基倍半硅氧烷与氧化石墨烯同时引入聚酰亚胺基体之中协同改性的研究却相对较少。因此,制备具有低介电常数以及良好综合性能的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜具有非常重要的意义。The preparation of polyimide films with low dielectric constant can be achieved by introducing inorganic components. A class of inorganic-organic components—phenyl oligomeric silsesquioxanes are made of rigid cubic silica [octamer ( R 8 Si 8 O 12 )] core and pores with a size of 0.3-0.4nm. It has a special structure between inorganic ceramics and organic cinnamon polymers, so these molecules have hybrid properties. The polymer film based on phenyl silsesquioxane has a low dielectric constant property. During the preparation process, adding a coupling agent to modify phenyl silsesquioxane into polyimide, the prepared organic-inorganic nanocomposite has Lower dielectric constant than virgin polyimide. Another type of inorganic component - graphene oxide, compared with expensive fullerene and carbon nanotubes, graphene oxide is cheap, easy to obtain raw materials, has a good nanosheet structure, large specific surface area, and rich surface functions Groups, etc. make it have better dispersibility in water and organic solvents, and it is easy to form chemical bonds or hydrogen bonds with polymers, so that it has greater potential in improving the properties of polymer composites. Especially in terms of improving mechanical properties and thermal performance, it can be used in the preparation of polymer nanocomposite films. However, there are relatively few studies on the simultaneous introduction of phenylsilsesquioxane and graphene oxide into the polyimide matrix for synergistic modification. Therefore, it is of great significance to prepare phenylsilsesquioxane/graphene oxide/polyimide three-phase composite films with low dielectric constant and good comprehensive properties.

发明内容Contents of the invention

本发明是要解决现有复合薄膜无法兼顾降低介电常数的同时提高其热学性能及力学性能的问题,而提供一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法。The present invention aims to solve the problem that the existing composite film cannot reduce the dielectric constant while improving its thermal performance and mechanical performance, and provides a three-phase composite film of phenylsilsesquioxane/graphene oxide/polyimide The method of film preparation.

本发明一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法是按以下步骤进行:The preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film of the present invention is to carry out according to the following steps:

一、在冰水浴条件下,采用混酸溶液溶解膨胀石墨,机械搅拌至膨胀石墨完全溶解,然后向其中加入高锰酸钾,机械搅拌至高锰酸钾完全溶解后继续搅拌1~2h,然后转移至温度为35℃的水浴锅中保温1~2h,然后将水浴锅的温度从35℃升温至98℃,在升温过程中采用分液漏斗向其中匀速加入去离子水至温度达到98℃,在温度为98℃的条件下保温1~2h后,加入浓度为30%的过氧化氢溶液至溶液变为亮黄色;对亮黄色溶液进行稀释,过滤反应产物,将得到的液体反复离心至pH值为7,将所得的产物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉体加入去离子水中,超声震荡3h后烘干,得到氧化石墨烯;所述混酸溶液为浓硝酸与浓硫酸按体积比1:3混合得到的;所述膨胀石墨的质量与混酸溶液的体积比为1g:(80~120)mL;所述膨胀石墨与高锰酸钾的质量比为1:(5~7);所述膨胀石墨的质量与升温过程中匀速加入的去离子水的体积比为1g:(180~220)mL;1. Under the condition of ice-water bath, use mixed acid solution to dissolve the expanded graphite, mechanically stir until the expanded graphite is completely dissolved, then add potassium permanganate to it, mechanically stir until the potassium permanganate is completely dissolved, continue stirring for 1-2 hours, and then transfer to Keep warm in a water bath with a temperature of 35°C for 1 to 2 hours, then raise the temperature of the water bath from 35°C to 98°C, and add deionized water to it at a constant rate using a separatory funnel during the heating process until the temperature reaches 98°C. After incubating at 98°C for 1-2 hours, add 30% hydrogen peroxide solution until the solution turns bright yellow; dilute the bright yellow solution, filter the reaction product, and centrifuge the obtained solution repeatedly until the pH value is 7. Dry and grind the obtained product to obtain graphite oxide powder, add the prepared graphite oxide powder into deionized water, and dry it after ultrasonic vibration for 3 hours to obtain graphene oxide; the mixed acid solution is concentrated nitric acid and Concentrated sulfuric acid is obtained by mixing the volume ratio of 1:3; the volume ratio of the quality of the expanded graphite to the mixed acid solution is 1g:(80~120) mL; the mass ratio of the expanded graphite to potassium permanganate is 1:( 5~7); The quality of described expanded graphite and the volume ratio of the deionized water that add in the heating process at a constant speed are 1g:(180~220)mL;

二、向步骤一中得到的氧化石墨烯中加入N,N’-二甲基乙酰胺溶液,超声分散均匀,得到分散液;将分散液转移至恒温水浴锅中,在温度为60℃和氮气保护的条件下向分散液中加入4,4’-二氨基二苯醚Ⅰ,回流搅拌20~28h,然后先向其中加入苯基倍半硅氧烷,超声分散均匀后再加入硅烷偶联剂,继续搅拌至混合均匀后,再次加入4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐,在室温下搅拌12h,得到纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液;氧化石墨烯与4,4’-二氨基二苯醚Ⅰ的质量比为2:3;氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.1%~0.9%;苯基倍半硅氧烷的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%~3%;所述4,4’-二氨基二苯醚Ⅱ的质量与N,N’-二甲基乙酰胺溶液的体积比为1g:12mL;4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐的摩尔比为99:100;2. Add N,N'-dimethylacetamide solution to the graphene oxide obtained in step 1, and ultrasonically disperse evenly to obtain a dispersion liquid; transfer the dispersion liquid to a constant temperature water bath, in a temperature of 60 ° C and nitrogen Add 4,4'-diaminodiphenyl ether I to the dispersion under protected conditions, reflux and stir for 20-28 hours, then first add phenylsilsesquioxane to it, ultrasonically disperse evenly, and then add silane coupling agent , continue to stir until the mixture is uniform, add 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride again, and stir at room temperature for 12 hours to obtain nano-phenylsilsesquioxane/graphene oxide/polymer Amic acid solution; the mass ratio of graphene oxide to 4,4'-diaminodiphenyl ether I is 2:3; the amount of graphene oxide added is 4,4'-diaminodiphenyl ether II and pyromellitic acid 0.1% to 0.9% of the total mass of dianhydride; the amount of phenylsilsesquioxane added is 1% to 3% of the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride; The volume ratio of the mass of 4,4'-diaminodiphenyl ether II to N,N'-dimethylacetamide solution is 1g:12mL; 4,4'-diaminodiphenyl ether II and pyromellitic acid The molar ratio of dianhydride is 99:100;

三、将步骤二得到的纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液转移至温度为50℃的恒温水浴锅中加热降解30min后,进行铺膜处理,然后采用梯度升温的方式加热至300℃进行热亚胺化,冷却至室温,即制得POSS/ODA-GO/PI复合薄膜。3. Transfer the nano-phenyl silsesquioxane/graphene oxide/polyamic acid solution obtained in step 2 to a constant temperature water bath with a temperature of 50°C, heat and degrade it for 30 minutes, then carry out film coating treatment, and then adopt a gradient heating method The POSS/ODA-GO/PI composite film was prepared by heating to 300°C for thermal imidization and cooling to room temperature.

本发明的有益效果是:The beneficial effects of the present invention are:

1、本发明主要应用于微电子领域电子封装材料的使用,采用原位聚合法制备苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜,通过改进的Hummers法制备氧化石墨烯。通过扫描电镜和原子力显微镜表征结果可知,所述的氧化石墨烯片层较薄,单层厚度达0.78nm。1. The present invention is mainly applied to the use of electronic packaging materials in the field of microelectronics. The in-situ polymerization method is used to prepare phenylsilsesquioxane/graphene oxide/polyimide three-phase composite films, and the oxide film is prepared by the improved Hummers method. Graphene. According to the characterization results of scanning electron microscopy and atomic force microscopy, the graphene oxide sheet is relatively thin, with a single layer thickness of 0.78nm.

2、本发明通过将具有刚性中空内核的苯基倍半硅氧烷负载于氧化石墨烯片层上,通过原位聚合法引入到聚酰亚胺基体中制备了一种介电性能、热学性能和力学性能都良好的三相复合材料,可应用于微电子领域中电路板及其封装材料中。2. The present invention prepares a kind of dielectric and thermal properties by loading phenyl silsesquioxane with rigid hollow core on the graphene oxide sheet and introducing it into the polyimide matrix by in-situ polymerization. The three-phase composite material with good mechanical and mechanical properties can be used in circuit boards and packaging materials in the field of microelectronics.

3、本发明的优点在于所采用的苯基倍半硅氧烷处于纳米级,能够充分发挥纳米颗粒对材料的增强效果,所述的氧化石墨烯片层较薄,通过与苯基倍半硅氧烷负载后,能够均匀分散于聚酰亚胺基体中,并且苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合材料具有优异的介电性能、热学性能及力学性能参数等特点;其介电常数为2.5-2.9(1MHz),材料5wt%热分解温度为446~564℃,拉伸强度在81.8~93.5MPa。3. The advantage of the present invention is that the phenyl silsesquioxane used is at the nanoscale, which can give full play to the reinforcing effect of nanoparticles on the material. After the oxane is loaded, it can be uniformly dispersed in the polyimide matrix, and the three-phase composite material of phenylsilsesquioxane/graphene oxide/polyimide has excellent dielectric properties, thermal properties and mechanical properties. and other characteristics; its dielectric constant is 2.5-2.9 (1MHz), the 5wt% thermal decomposition temperature of the material is 446-564°C, and the tensile strength is 81.8-93.5MPa.

4、本发明的纳米级苯基倍半硅氧烷作为一种新型的有机-无机填料,其明显的特征就是,具有中空结构的内核,且整个分子处于纳米级,纳米级的苯基倍半硅氧烷的引入会将更多的空气引入基体,从而使其介电常数明显降低,而且苯基倍半硅氧烷自身的刚性内核赋予了其良好的力学性能,较高的热分解温度也使其具备良好的热学性能,其与聚酰亚胺复合后能够满足高速集成电路对介电材料的要求。4. The nanoscale phenyl silsesquioxane of the present invention is a new type of organic-inorganic filler. Its obvious feature is that it has a hollow core, and the entire molecule is at the nanoscale, and the nanoscale phenyl silsesquioxane The introduction of siloxane will introduce more air into the matrix, thereby significantly reducing its dielectric constant, and the rigid core of phenylsilsesquioxane itself endows it with good mechanical properties, and the higher thermal decomposition temperature also It has good thermal properties, and after compounding with polyimide, it can meet the requirements of high-speed integrated circuits for dielectric materials.

5、本发明的氧化石墨烯是石墨烯的一种重要的衍生物之一,氧化石墨烯因其具有的极高的比表面积,特殊的石墨二维平面结构,以及低加工成本而在提升聚合物的性能方面具有很大的应用前景。氧化石墨烯的基础结构与石墨烯类似,因此使得氧化石墨烯具备良好的物理性能。但在化学结构上却不同于石墨烯,因此具备进一步功能化的潜力。在氧化石墨烯片层的片层表面及周围连接着丰富的含氧基团,如羟基、羧基、环氧基和羰基,这些在氧化石墨烯表面的含氧基团使其具备了良好的介电性能、多个化学官能化基点、更好的兼容性,并使氧化石墨烯能够与聚合物之间通过发生反应形成化学键,增强了氧化石墨烯在聚合物基质中的分散性。通过向聚合物中掺杂氧化石墨烯有利于获得热稳定性能良好,同时具备优异介电性能的复合材料,因此氧化石墨烯在制备综合性能优异的低介电复合材料基材方面发挥着巨大的作用。5. The graphene oxide of the present invention is one of the important derivatives of graphene. Graphene oxide is improving polymerization due to its extremely high specific surface area, special two-dimensional planar structure of graphite, and low processing cost. It has great application prospects in terms of its performance. The basic structure of graphene oxide is similar to that of graphene, so graphene oxide has good physical properties. However, it is different from graphene in chemical structure, so it has the potential for further functionalization. Abundant oxygen-containing groups, such as hydroxyl, carboxyl, epoxy and carbonyl groups, are connected to the surface of the graphene oxide sheet and its surroundings. These oxygen-containing groups on the surface of graphene oxide make it a good medium Electrical properties, multiple chemical functionalization base points, better compatibility, and the ability of graphene oxide to react with polymers to form chemical bonds enhance the dispersion of graphene oxide in polymer matrices. Doping graphene oxide into the polymer is beneficial to obtain a composite material with good thermal stability and excellent dielectric properties, so graphene oxide plays a huge role in the preparation of low-dielectric composite material substrates with excellent comprehensive properties. effect.

6、本发明采用纳米级的苯基倍半硅氧烷,通过硅烷偶联剂与采用改进的Hummers发制备的氧化石墨烯负载,将苯基倍半硅氧烷/氧化石墨烯复合粉体与聚酰胺酸复合,发挥苯基倍半硅氧烷及氧化石墨烯对材料介电性能、热学性能及力学性能的提升作用,经后续处理制备出具有低介电常数、热学及力学性能良好的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合材料。6. The present invention adopts nanoscale phenyl silsesquioxane, through the silane coupling agent and the graphene oxide load prepared by the improved Hummers hair, the phenyl silsesquioxane/graphene oxide composite powder and Polyamic acid composite, play the role of phenylsilsesquioxane and graphene oxide in improving the dielectric properties, thermal properties and mechanical properties of materials, and prepare benzene with low dielectric constant, good thermal and mechanical properties after subsequent treatment. Silsesquioxane/graphene oxide/polyimide three-phase composites.

附图说明Description of drawings

图1为实施例一得到的氧化石墨烯原子力显微镜图;Fig. 1 is the graphene oxide atomic force microscope figure that embodiment one obtains;

图2为实施例一得到的氧化石墨烯的透射电镜图;Fig. 2 is the transmission electron microscope figure of the graphene oxide that embodiment one obtains;

图3为实施例一得到的4,4’-二氨基二苯醚-氧化石墨烯的透射电镜图;Fig. 3 is the transmission electron microscope picture of the 4,4'-diaminodiphenyl ether-graphene oxide that embodiment one obtains;

图4为实施例一中纳米苯基倍半硅氧烷的透射电镜图;Fig. 4 is the transmission electron microscope picture of nanometer phenyl silsesquioxane in embodiment one;

图5为实施例一得到的纳米苯基倍半硅氧烷负载氧化石墨烯的粉体透射电镜图;Fig. 5 is the powder transmission electron microscope picture of the nano-phenyl silsesquioxane supported graphene oxide that embodiment one obtains;

图6为实施例一得到的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺复合材料的扫描电镜图。6 is a scanning electron microscope image of the phenylsilsesquioxane/graphene oxide/polyimide composite material obtained in Example 1.

具体实施方式Detailed ways

具体实施方式一:本实施方式一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法是按以下步骤进行:Specific embodiment one: the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film of this embodiment is to carry out according to the following steps:

一、在冰水浴条件下,采用混酸溶液溶解膨胀石墨,机械搅拌至膨胀石墨完全溶解,然后向其中加入高锰酸钾,机械搅拌至高锰酸钾完全溶解后继续搅拌1~2h,然后转移至温度为35℃的水浴锅中保温1~2h,然后将水浴锅的温度从35℃升温至98℃,在升温过程中采用分液漏斗向其中匀速加入去离子水至温度达到98℃,在温度为98℃的条件下保温1~2h后,加入浓度为30%的过氧化氢溶液至溶液变为亮黄色;对亮黄色溶液进行稀释,过滤反应产物,将得到的液体反复离心至pH值为7,将所得的产物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉体加入去离子水中,超声震荡3h后烘干,得到氧化石墨烯;所述混酸溶液为浓硝酸与浓硫酸按体积比1:3混合得到的;所述膨胀石墨的质量与混酸溶液的体积比为1g:(80~120)mL;所述膨胀石墨与高锰酸钾的质量比为1:(5~7);所述膨胀石墨的质量与升温过程中匀速加入的去离子水的体积比为1g:(180~220)mL;1. Under the condition of ice-water bath, use mixed acid solution to dissolve the expanded graphite, mechanically stir until the expanded graphite is completely dissolved, then add potassium permanganate to it, mechanically stir until the potassium permanganate is completely dissolved, continue stirring for 1-2 hours, and then transfer to Keep warm in a water bath with a temperature of 35°C for 1 to 2 hours, then raise the temperature of the water bath from 35°C to 98°C, and add deionized water to it at a constant rate using a separatory funnel during the heating process until the temperature reaches 98°C. After incubating at 98°C for 1-2 hours, add 30% hydrogen peroxide solution until the solution turns bright yellow; dilute the bright yellow solution, filter the reaction product, and centrifuge the obtained solution repeatedly until the pH value is 7. Dry and grind the obtained product to obtain graphite oxide powder, add the prepared graphite oxide powder into deionized water, and dry it after ultrasonic vibration for 3 hours to obtain graphene oxide; the mixed acid solution is concentrated nitric acid and Concentrated sulfuric acid is obtained by mixing the volume ratio of 1:3; the volume ratio of the quality of the expanded graphite to the mixed acid solution is 1g:(80~120) mL; the mass ratio of the expanded graphite to potassium permanganate is 1:( 5~7); The quality of described expanded graphite and the volume ratio of the deionized water that add in the heating process at a constant speed are 1g:(180~220)mL;

二、向步骤一中得到的氧化石墨烯中加入N,N’-二甲基乙酰胺溶液,超声分散均匀,得到分散液;将分散液转移至恒温水浴锅中,在温度为60℃和氮气保护的条件下向分散液中加入4,4’-二氨基二苯醚Ⅰ,回流搅拌20~28h,然后先向其中加入苯基倍半硅氧烷,超声分散均匀后再加入硅烷偶联剂,继续搅拌至混合均匀后,再次加入4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐,在室温下搅拌12h,得到纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液;氧化石墨烯与4,4’-二氨基二苯醚Ⅰ的质量比为2:3;氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.1%~0.9%;苯基倍半硅氧烷的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%~3%;所述4,4’-二氨基二苯醚Ⅱ的质量与N,N’-二甲基乙酰胺溶液的体积比为1g:12mL;4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐的摩尔比为99:100;2. Add N,N'-dimethylacetamide solution to the graphene oxide obtained in step 1, and ultrasonically disperse evenly to obtain a dispersion liquid; transfer the dispersion liquid to a constant temperature water bath, in a temperature of 60 ° C and nitrogen Add 4,4'-diaminodiphenyl ether I to the dispersion under protected conditions, reflux and stir for 20-28 hours, then first add phenylsilsesquioxane to it, ultrasonically disperse evenly, and then add silane coupling agent , continue to stir until the mixture is uniform, add 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride again, and stir at room temperature for 12 hours to obtain nano-phenylsilsesquioxane/graphene oxide/polymer Amic acid solution; the mass ratio of graphene oxide to 4,4'-diaminodiphenyl ether I is 2:3; the amount of graphene oxide added is 4,4'-diaminodiphenyl ether II and pyromellitic acid 0.1% to 0.9% of the total mass of dianhydride; the amount of phenylsilsesquioxane added is 1% to 3% of the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride; The volume ratio of the mass of 4,4'-diaminodiphenyl ether II to N,N'-dimethylacetamide solution is 1g:12mL; 4,4'-diaminodiphenyl ether II and pyromellitic acid The molar ratio of dianhydride is 99:100;

三、将步骤二得到的纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液转移至温度为50℃的恒温水浴锅中加热降解30min后,进行铺膜处理,然后采用梯度升温的方式加热至300℃进行热亚胺化,冷却至室温,即制得POSS/ODA-GO/PI复合薄膜。3. Transfer the nano-phenyl silsesquioxane/graphene oxide/polyamic acid solution obtained in step 2 to a constant temperature water bath with a temperature of 50°C, heat and degrade it for 30 minutes, then carry out film coating treatment, and then adopt a gradient heating method The POSS/ODA-GO/PI composite film was prepared by heating to 300°C for thermal imidization and cooling to room temperature.

本实施方式通过原位聚合法将苯基倍半硅氧烷与氧化石墨烯均匀分布于聚酰亚胺基体中,氧化石墨烯经4,4’-二氨基二苯醚改性后,氧化石墨烯片层的层间距进一步增加,有利于氧化石墨烯与聚酰亚胺基体之间形成化学键,有利于氧化石墨烯在复合过程中均匀分布,而苯基倍半硅氧烷负载于氧化石墨烯的表面,伴随着氧化石墨烯的均匀分布同样均匀分布于聚酰亚胺基体中,有利于获得均匀分布且性能稳定的三相复合薄膜。所述的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜有助于聚酰亚胺介电常数的降低并保持其热学性能和力学性能。所述的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜可通过调节苯基倍半硅氧烷和氧化石墨烯的添量改变聚酰亚胺复合材料的性能。In this embodiment, phenylsilsesquioxane and graphene oxide are evenly distributed in the polyimide matrix by in-situ polymerization. After graphene oxide is modified by 4,4'-diaminodiphenyl ether, graphite oxide The further increase of the interlayer spacing of the olefin sheet is conducive to the formation of chemical bonds between the graphene oxide and the polyimide matrix, which is conducive to the uniform distribution of the graphene oxide during the composite process, and the phenylsilsesquioxane loaded on the graphene oxide The surface, along with the uniform distribution of graphene oxide, is also uniformly distributed in the polyimide matrix, which is conducive to obtaining a uniformly distributed and stable three-phase composite film. The phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film contributes to the reduction of the dielectric constant of the polyimide and maintains its thermal and mechanical properties. The phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film can change the performance of the polyimide composite material by adjusting the addition of phenylsilsesquioxane and graphene oxide.

本实施方式步骤二中加入4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐后当两者摩尔比例达到等量时,体系粘度急剧增大,出现明显爬杆现象,After adding 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride in step 2 of this embodiment, when the molar ratio of the two reaches the same amount, the viscosity of the system increases sharply, and there is an obvious rod climbing phenomenon.

具体实施方式二:本实施方式与具体实施方式一不同的是:步骤一中所述膨胀石墨的质量与混酸溶液的体积比为1g:100mL。其它与具体实施方式一相同。Embodiment 2: The difference between this embodiment and Embodiment 1 is that the volume ratio of the mass of expanded graphite described in step 1 to the mixed acid solution is 1g:100mL. Others are the same as in the first embodiment.

具体实施方式三:本实施方式与具体实施方式一或二不同的是:步骤一中所述膨胀石墨与高锰酸钾的质量比为1:6。其它与具体实施方式一或二相同。Specific embodiment three: the difference between this embodiment and specific embodiment one or two is: the mass ratio of expanded graphite and potassium permanganate described in step one is 1:6. Others are the same as in the first or second embodiment.

具体实施方式四:本实施方式与具体实施方式一至三不同的是:步骤一中所述高锰酸钾的加入方式如下:将高锰酸钾平均分6次投加,每次间隔10min。其它与具体实施方式一至三相同。Embodiment 4: This embodiment differs from Embodiments 1 to 3 in that: the potassium permanganate described in step 1 is added in the following way: potassium permanganate is added in 6 times on average, with an interval of 10 minutes each time. Others are the same as the specific embodiments 1 to 3.

具体实施方式五:本实施方式与具体实施方式一至四之一不同的是:步骤一中所述膨胀石墨的质量与升温过程中匀速加入的去离子水的体积比为1g:200mL。其它与具体实施方式一至四之一相同。Embodiment 5: This embodiment differs from Embodiment 1 to Embodiment 4 in that the volume ratio of the quality of expanded graphite described in step 1 to the deionized water added at a constant speed during the heating process is 1g:200mL. Others are the same as one of the specific embodiments 1 to 4.

具体实施方式六:本实施方式与具体实施方式一至五之一不同的是:步骤二中所述硅烷偶联剂为3-氨丙基三甲氧基硅烷,每添加4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%苯基倍半硅氧烷,添加5滴硅烷偶联剂。其它与具体实施方式一至五之一相同。Embodiment 6: The difference between this embodiment and one of Embodiments 1 to 5 is that the silane coupling agent described in step 2 is 3-aminopropyltrimethoxysilane, and every time 4,4'-diaminodi 1% phenylsilsesquioxane based on the total mass of phenylene ether II and pyromellitic dianhydride, add 5 drops of silane coupling agent. Others are the same as one of the specific embodiments 1 to 5.

所述硅烷偶联剂采用标准滴定管进行滴定。The silane coupling agent is titrated using a standard burette.

具体实施方式七:本实施方式与具体实施方式一至六之一不同的是:步骤二中所述均苯四甲酸二酐的加入方式如下:将均苯四甲酸二酐平均分6次投加,每次间隔15min。其它与具体实施方式一至六之一相同。Embodiment 7: The difference between this embodiment and one of Embodiments 1 to 6 is that the method of adding pyromellitic dianhydride described in step 2 is as follows: adding pyromellitic dianhydride on average in 6 times, Each interval is 15 minutes. Others are the same as one of the specific embodiments 1 to 6.

具体实施方式八:本实施方式与具体实施方式一至七之一不同的是:步骤二中所述氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.1%~0.9%。其它与具体实施方式一至七之一相同。Embodiment 8: The difference between this embodiment and one of Embodiments 1 to 7 is that the amount of graphene oxide added in Step 2 is 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride 0.1% to 0.9% of the total mass. Others are the same as one of the specific embodiments 1 to 7.

具体实施方式九:本实施方式与具体实施方式一至八之一不同的是:步骤三中所述梯度升温是将温度从50℃升温至80℃,并在温度为80℃的条件下保持0.5h,再将温度由80℃升温至120℃,并在温度为120℃的条件下保持0.5h,然后将温度由120℃升温至150℃,在温度为150℃的条件下保持0.5h,再将温度由150℃升温至180℃,在温度为180℃的条件下保持0.5h,再将温度由180℃升温至200℃,在温度为200℃的条件下保持0.5h。再将温度由200℃升温至250℃,在温度为250℃的条件下保持0.5h。再将温度由250℃升温至300℃,在温度为300℃的条件下保持0.5h。其它与具体实施方式一至八之一相同。Embodiment 9: The difference between this embodiment and one of Embodiments 1 to 8 is that the gradient temperature increase in step 3 is to raise the temperature from 50°C to 80°C, and keep it at 80°C for 0.5h , then raise the temperature from 80°C to 120°C, and keep it at 120°C for 0.5h, then raise the temperature from 120°C to 150°C, keep it at 150°C for 0.5h, and then The temperature was raised from 150°C to 180°C, and kept at 180°C for 0.5h, then raised from 180°C to 200°C, and kept at 200°C for 0.5h. Then the temperature was raised from 200°C to 250°C, and kept at 250°C for 0.5h. Then the temperature was raised from 250°C to 300°C, and kept at 300°C for 0.5h. Others are the same as one of the specific embodiments 1 to 8.

通过以下实施例验证本发明的有益效果:Verify the beneficial effects of the present invention through the following examples:

实施例一:一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法是按以下步骤进行:Embodiment one: a kind of preparation method of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film is to carry out according to the following steps:

一、在冰水浴条件下,采用混酸溶液溶解1g膨胀石墨,机械搅拌至膨胀石墨完全溶解,然后向其中加入6g高锰酸钾,机械搅拌至高锰酸钾完全溶解后继续搅拌1h,然后转移至温度为35℃的水浴锅中保温2h,然后将水浴锅的温度从35℃升温至98℃,在升温过程中采用分液漏斗向其中匀速加入200mL去离子水至温度达到98℃,在温度为98℃的条件下保温1h后,加入浓度为30%的过氧化氢溶液至溶液变为亮黄色;对亮黄色溶液进行稀释,过滤反应产物,将得到的液体反复离心至pH值为7,将所得的产物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉体加入去离子水中,超声震荡3h后烘干,得到氧化石墨烯;所述混酸溶液为25mL浓硝酸与75mL浓硫酸混合得到的;所述高锰酸钾的加入方式如下:将高锰酸钾平均分6次投加,每次间隔10min;1. Under the condition of ice-water bath, use mixed acid solution to dissolve 1g of expanded graphite, mechanically stir until the expanded graphite is completely dissolved, then add 6g of potassium permanganate to it, mechanically stir until the potassium permanganate is completely dissolved, continue stirring for 1h, and then transfer to Keep warm in a water bath at a temperature of 35°C for 2 hours, then raise the temperature of the water bath from 35°C to 98°C, and add 200 mL of deionized water to it at a constant rate using a separatory funnel during the heating process until the temperature reaches 98°C. After incubating at 98°C for 1 hour, add a 30% hydrogen peroxide solution until the solution turns bright yellow; dilute the bright yellow solution, filter the reaction product, and centrifuge the obtained solution repeatedly until the pH value is 7. The obtained product was dried and ground to obtain graphite oxide powder, and the prepared graphite oxide powder was added to deionized water, ultrasonically oscillated for 3 hours and then dried to obtain graphene oxide; the mixed acid solution was 25mL concentrated nitric acid and 75mL concentrated Obtained by mixing sulfuric acid; the addition method of the potassium permanganate is as follows: the potassium permanganate is added in 6 times on average, with an interval of 10 minutes each time;

二、向步骤一中得到的氧化石墨烯中加入N,N’-二甲基乙酰胺溶液,超声分散均匀,得到分散液;将分散液转移至恒温水浴锅中,在温度为60℃和氮气保护的条件下向分散液中加入4,4’-二氨基二苯醚Ⅰ,回流搅拌20~28h,然后先向其中加入苯基倍半硅氧烷,超声分散均匀后再加入硅烷偶联剂,继续搅拌至混合均匀后,再次加入4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐,在室温下搅拌12h,得到纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液;氧化石墨烯与4,4’-二氨基二苯醚Ⅱ的质量比为2:3;氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.1%~0.9%;苯基倍半硅氧烷的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%~3%;所述4,4’-二氨基二苯醚Ⅱ的质量与N,N’-二甲基乙酰胺溶液的体积比为1g:12mL;4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐的摩尔比为99:100;所述均苯四甲酸二酐的加入方式如下:将均苯四甲酸二酐平均分6次投加,每次间隔15min;2. Add N,N'-dimethylacetamide solution to the graphene oxide obtained in step 1, and ultrasonically disperse evenly to obtain a dispersion liquid; transfer the dispersion liquid to a constant temperature water bath, in a temperature of 60 ° C and nitrogen Add 4,4'-diaminodiphenyl ether I to the dispersion under protected conditions, reflux and stir for 20-28 hours, then first add phenylsilsesquioxane to it, ultrasonically disperse evenly, and then add silane coupling agent , continue to stir until the mixture is uniform, add 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride again, and stir at room temperature for 12 hours to obtain nano-phenylsilsesquioxane/graphene oxide/polymer Amic acid solution; the mass ratio of graphene oxide to 4,4'-diaminodiphenyl ether II is 2:3; the amount of graphene oxide added is 4,4'-diaminodiphenyl ether II and pyromellitic acid 0.1% to 0.9% of the total mass of dianhydride; the amount of phenylsilsesquioxane added is 1% to 3% of the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride; The volume ratio of the mass of 4,4'-diaminodiphenyl ether II to N,N'-dimethylacetamide solution is 1g:12mL; 4,4'-diaminodiphenyl ether II and pyromellitic acid The molar ratio of the dianhydride is 99:100; the addition method of the pyromellitic dianhydride is as follows: the pyromellitic dianhydride is added in 6 times on average, with an interval of 15 minutes each time;

三、将步骤二得到的纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液转移至温度为50℃的恒温水浴锅中加热降解30min后,进行铺膜处理,然后采用梯度升温的方式加热至300℃进行热亚胺化,冷却至室温,即制得POSS/ODA-GO/PI复合薄膜;所述梯度升温是将温度从50℃升温至80℃,并在温度为80℃的条件下保持0.5h,再将温度由80℃升温至120℃,并在温度为120℃的条件下保持0.5h,然后将温度由120℃升温至150℃,在温度为150℃的条件下保持0.5h,再将温度由150℃升温至180℃,在温度为180℃的条件下保持0.5h,再将温度由180℃升温至200℃,在温度为200℃的条件下保持0.5h。再将温度由200℃升温至250℃,在温度为250℃的条件下保持0.5h。再将温度由250℃升温至300℃,在温度为300℃的条件下保持0.5h。3. Transfer the nano-phenyl silsesquioxane/graphene oxide/polyamic acid solution obtained in step 2 to a constant temperature water bath with a temperature of 50°C, heat and degrade it for 30 minutes, then carry out film coating treatment, and then adopt a gradient heating method heated to 300°C for thermal imidization, and cooled to room temperature to obtain a POSS/ODA-GO/PI composite film; the gradient temperature was raised from 50°C to 80°C, and the Keep it under the condition for 0.5h, then raise the temperature from 80°C to 120°C, and keep it at 120°C for 0.5h, then raise the temperature from 120°C to 150°C, and keep it at 150°C 0.5h, then raise the temperature from 150°C to 180°C, keep at 180°C for 0.5h, then raise the temperature from 180°C to 200°C, and keep at 200°C for 0.5h. Then the temperature was raised from 200°C to 250°C, and kept at 250°C for 0.5h. Then the temperature was raised from 250°C to 300°C, and kept at 300°C for 0.5h.

图1为实施例一得到的氧化石墨烯原子力显微镜图;图2为实施例一得到的氧化石墨烯的透射电镜图;图3为实施例一得到的4,4’-二氨基二苯醚-氧化石墨烯的透射电镜图;图4为实施例一中纳米苯基倍半硅氧烷的透射电镜图;图5为实施例一得到的纳米苯基倍半硅氧烷负载氧化石墨烯的粉体透射电镜图;图6为实施例一得到的苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺复合材料的扫描电镜图。Fig. 1 is the graphene oxide atomic force microscope figure that embodiment one obtains; Fig. 2 is the transmission electron microscope figure of the graphene oxide that embodiment one obtains; Fig. 3 is the 4,4'-diaminodiphenyl ether that embodiment one obtains- The transmission electron microscope figure of graphene oxide; Fig. 4 is the transmission electron microscope figure of nanometer phenylsilsesquioxane in embodiment one; Fig. 5 is the powder of nanometer phenylsilsesquioxane supported graphene oxide that embodiment one obtains Bulk transmission electron micrograph; Figure 6 is a scanning electron micrograph of the phenylsilsesquioxane/graphene oxide/polyimide composite material obtained in Example 1.

测量图1中两点之间的厚度为0.78nm,说明本发明制备的氧化石墨烯片层较薄,单层达到纳米级别。The thickness between the two points in Figure 1 is measured to be 0.78nm, indicating that the graphene oxide sheet prepared by the present invention is relatively thin, and the single layer reaches the nanometer level.

从图2能看出本发明制备的氧化石墨烯的片层边缘长度为500nm到1μm之间。It can be seen from FIG. 2 that the sheet edge length of the graphene oxide prepared by the present invention is between 500 nm and 1 μm.

从图3能够看出通过4,4’-二氨基二苯醚改性后的氧化石墨烯片层,表面褶皱增加,说明改性成功且片层间距离因改性而增大。It can be seen from Figure 3 that the surface wrinkles of graphene oxide sheets modified by 4,4'-diaminodiphenyl ether increase, indicating that the modification is successful and the distance between sheets increases due to modification.

从图4能够看出本发明采用的苯基倍半硅氧烷填料表面尺寸为边长为10~20nm之间的正方体结构,说明本发明采用的苯基倍半硅氧烷处于纳米尺寸,能够发挥纳米填料对材料的增强效果。From Fig. 4, it can be seen that the surface size of the phenylsilsesquioxane filler used in the present invention is a cube structure with a side length between 10 and 20 nm, indicating that the phenylsilsesquioxane used in the present invention is in nanometer size and can Give full play to the reinforcing effect of nano fillers on materials.

从图5能够看出苯基倍半硅氧烷颗粒负载于氧化石墨烯片层表面及周围,说明伴随着氧化石墨烯均匀分布于聚酰亚胺基体中,苯基倍半硅氧烷也会均匀分布于聚酰亚胺基体中。It can be seen from Figure 5 that phenylsilsesquioxane particles are supported on the surface and surroundings of the graphene oxide sheet, indicating that with graphene oxide uniformly distributed in the polyimide matrix, phenylsilsesquioxane will also Evenly distributed in the polyimide matrix.

从图6能够看出材料断面有明显可见的氧化石墨烯片层,而且明显可见均匀分布的苯基倍半硅氧烷颗粒,说明氧化石墨烯片层与苯基倍半硅氧烷均均匀包覆于聚酰亚胺基体内部,能够充分发挥填料对基体材料的增强效果。It can be seen from Figure 6 that there are clearly visible graphene oxide sheets on the cross section of the material, and evenly distributed phenylsilsesquioxane particles are clearly visible, indicating that the graphene oxide sheets and phenylsilsesquioxane are evenly coated. Covering the inside of the polyimide matrix can give full play to the reinforcing effect of the filler on the matrix material.

Claims (9)

1.一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法是按以下步骤进行:1. A preparation method of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film, characterized in that phenylsilsesquioxane/graphene oxide/polyimide three-phase composite The preparation method of film is to carry out according to the following steps: 一、在冰水浴条件下,采用混酸溶液溶解膨胀石墨,机械搅拌至膨胀石墨完全溶解,然后向其中加入高锰酸钾,机械搅拌至高锰酸钾完全溶解后继续搅拌1~2h,然后转移至温度为35℃的水浴锅中保温1~2h,然后将水浴锅的温度从35℃升温至98℃,在升温过程中采用分液漏斗向其中匀速加入去离子水至温度达到98℃,在温度为98℃的条件下保温1~2h后,加入浓度为30%的过氧化氢溶液至溶液变为亮黄色;对亮黄色溶液进行稀释,过滤反应产物,将得到的液体反复离心至pH值为7,将所得的产物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉体加入去离子水中,超声震荡3h后烘干,得到氧化石墨烯;所述混酸溶液为浓硝酸与浓硫酸按体积比1:3混合得到的;所述膨胀石墨的质量与混酸溶液的体积比为1g:(80~120)mL;所述膨胀石墨与高锰酸钾的质量比为1:(5~7);所述膨胀石墨的质量与升温过程中匀速加入的去离子水的体积比为1g:(180~220)mL;1. Under the condition of ice-water bath, use mixed acid solution to dissolve the expanded graphite, mechanically stir until the expanded graphite is completely dissolved, then add potassium permanganate to it, mechanically stir until the potassium permanganate is completely dissolved, continue stirring for 1-2 hours, and then transfer to Keep warm in a water bath with a temperature of 35°C for 1 to 2 hours, then raise the temperature of the water bath from 35°C to 98°C, and add deionized water to it at a constant rate using a separatory funnel during the heating process until the temperature reaches 98°C. After incubating at 98°C for 1-2 hours, add 30% hydrogen peroxide solution until the solution turns bright yellow; dilute the bright yellow solution, filter the reaction product, and centrifuge the obtained solution repeatedly until the pH value is 7. Dry and grind the obtained product to obtain graphite oxide powder, add the prepared graphite oxide powder into deionized water, and dry it after ultrasonic vibration for 3 hours to obtain graphene oxide; the mixed acid solution is concentrated nitric acid and Concentrated sulfuric acid is obtained by mixing the volume ratio of 1:3; the volume ratio of the quality of the expanded graphite to the mixed acid solution is 1g:(80~120) mL; the mass ratio of the expanded graphite to potassium permanganate is 1:( 5~7); The quality of described expanded graphite and the volume ratio of the deionized water that add in the heating process at a constant speed are 1g:(180~220)mL; 二、向步骤一中得到的氧化石墨烯中加入N,N’-二甲基乙酰胺溶液,超声分散均匀,得到分散液;将分散液转移至恒温水浴锅中,在温度为60℃和氮气保护的条件下向分散液中加入4,4’-二氨基二苯醚Ⅰ,回流搅拌20~28h,然后先向其中加入苯基倍半硅氧烷,超声分散均匀后再加入硅烷偶联剂,继续搅拌至混合均匀后,再次加入4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐,在室温下搅拌12h,得到纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液;氧化石墨烯与4,4’-二氨基二苯醚Ⅰ的质量比为2:3;氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.1%~0.9%;苯基倍半硅氧烷的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%~3%;所述4,4’-二氨基二苯醚Ⅱ的质量与N,N’-二甲基乙酰胺溶液的体积比为1g:12mL;4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐的摩尔比为99:100;2. Add N,N'-dimethylacetamide solution to the graphene oxide obtained in step 1, and ultrasonically disperse evenly to obtain a dispersion liquid; transfer the dispersion liquid to a constant temperature water bath, in a temperature of 60 ° C and nitrogen Add 4,4'-diaminodiphenyl ether I to the dispersion under protected conditions, reflux and stir for 20-28 hours, then first add phenylsilsesquioxane to it, ultrasonically disperse evenly, and then add silane coupling agent , continue to stir until the mixture is uniform, add 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride again, and stir at room temperature for 12 hours to obtain nano-phenylsilsesquioxane/graphene oxide/polymer Amic acid solution; the mass ratio of graphene oxide to 4,4'-diaminodiphenyl ether I is 2:3; the amount of graphene oxide added is 4,4'-diaminodiphenyl ether II and pyromellitic acid 0.1% to 0.9% of the total mass of dianhydride; the amount of phenylsilsesquioxane added is 1% to 3% of the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride; The volume ratio of the mass of 4,4'-diaminodiphenyl ether II to N,N'-dimethylacetamide solution is 1g:12mL; 4,4'-diaminodiphenyl ether II and pyromellitic acid The molar ratio of dianhydride is 99:100; 三、将步骤二得到的纳米苯基倍半硅氧烷/氧化石墨烯/聚酰胺酸溶液转移至温度为50℃的恒温水浴锅中加热降解30min后,进行铺膜处理,然后采用梯度升温的方式加热至300℃进行热亚胺化,冷却至室温,即制得POSS/ODA-GO/PI复合薄膜。3. Transfer the nano-phenyl silsesquioxane/graphene oxide/polyamic acid solution obtained in step 2 to a constant temperature water bath with a temperature of 50°C, heat and degrade it for 30 minutes, then carry out film coating treatment, and then adopt a gradient heating method The POSS/ODA-GO/PI composite film was prepared by heating to 300°C for thermal imidization and cooling to room temperature. 2.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤一中所述膨胀石墨的质量与混酸溶液的体积比为1g:100mL。2. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the quality of expanded graphite described in step 1 and mixed acid solution The volume ratio is 1g:100mL. 3.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤一中所述膨胀石墨与高锰酸钾的质量比为1:6。3. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that described expanded graphite and potassium permanganate in step one The mass ratio is 1:6. 4.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤一中所述高锰酸钾的加入方式如下:将高锰酸钾平均分6次投加,每次间隔10min。4. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the addition mode of potassium permanganate described in step one As follows: Potassium permanganate is added in 6 times on average, with an interval of 10 minutes between each time. 5.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤一中所述膨胀石墨的质量与升温过程中匀速加入的去离子水的体积比为1g:200mL。5. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the quality and heating process of expanded graphite described in step one The volume ratio of deionized water added at a constant speed was 1g:200mL. 6.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤二中所述硅烷偶联剂为3-氨丙基三甲氧基硅烷,每添加4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的1%苯基倍半硅氧烷,添加5滴硅烷偶联剂。6. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the silane coupling agent described in step 2 is 3- For aminopropyltrimethoxysilane, add 5 drops of silane coupling agent for every 1% of phenylsilsesquioxane based on the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride. 7.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤二中所述均苯四甲酸二酐的加入方式如下:将均苯四甲酸二酐平均分6次投加,每次间隔15min。7. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the pyromellitic dianhydride described in step 2 The adding method is as follows: add pyromellitic dianhydride in 6 times on average, with an interval of 15 minutes between each time. 8.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤二中所述氧化石墨烯的添加量为4,4’-二氨基二苯醚Ⅱ和均苯四甲酸二酐总质量的0.5%。8. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1 is characterized in that the addition of graphene oxide described in step 2 is 0.5% of the total mass of 4,4'-diaminodiphenyl ether II and pyromellitic dianhydride. 9.根据权利要求1所述的一种苯基倍半硅氧烷/氧化石墨烯/聚酰亚胺三相复合薄膜的制备方法,其特征在于步骤三中所述梯度升温是将温度从50℃升温至80℃,并在温度为80℃的条件下保持0.5h,再将温度由80℃升温至120℃,并在温度为120℃的条件下保持0.5h,然后将温度由120℃升温至150℃,在温度为150℃的条件下保持0.5h,再将温度由150℃升温至180℃,在温度为180℃的条件下保持0.5h,再将温度由180℃升温至200℃,在温度为200℃的条件下保持0.5h。再将温度由200℃升温至250℃,在温度为250℃的条件下保持0.5h。再将温度由250℃升温至300℃,在温度为300℃的条件下保持0.5h。9. the preparation method of a kind of phenylsilsesquioxane/graphene oxide/polyimide three-phase composite film according to claim 1, it is characterized in that described in step 3 gradient heating is that temperature is from 50 Raise the temperature to 80°C and keep it at 80°C for 0.5h, then raise the temperature from 80°C to 120°C and keep it at 120°C for 0.5h, then raise the temperature from 120°C to 150°C, keep at 150°C for 0.5h, then raise the temperature from 150°C to 180°C, keep at 180°C for 0.5h, then raise the temperature from 180°C to 200°C, Keep at 200°C for 0.5h. Then the temperature was raised from 200°C to 250°C, and kept at 250°C for 0.5h. Then the temperature was raised from 250°C to 300°C, and kept at 300°C for 0.5h.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109456481A (en) * 2018-11-22 2019-03-12 桂林电子科技大学 A kind of preparation method of graphene oxide/polyimides black film
CN110437447A (en) * 2019-08-13 2019-11-12 青岛科技大学 The method that a kind of ring-opening polymerisation of cyclosiloxane original position prepares nano particle silicon rubber composite material
CN112795036A (en) * 2020-12-31 2021-05-14 南京航空航天大学 A kind of preparation method of graphene modified polyimide composite film
CN113549325A (en) * 2021-06-29 2021-10-26 宁波长阳科技股份有限公司 Low-dielectric polyimide film, and preparation method and application thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101372534A (en) * 2007-08-24 2009-02-25 东丽纤维研究所(中国)有限公司 Low dielectric coefficient polyimide/oligomeric silsesquioxane nano hybrid film and preparation thereof
CN105037766A (en) * 2015-09-18 2015-11-11 哈尔滨理工大学 Preparation method of SiO2 hollow sphere/graphene oxide/polyimide composite film
CN105400196A (en) * 2016-01-05 2016-03-16 吉林大学 Method for improving dispersion of octaphenyl cage type silsesquioxane in polyimide base material
CN107556750A (en) * 2017-07-24 2018-01-09 四川大学 High temperature resistant polyetherimide amido composite foam material and preparation method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101372534A (en) * 2007-08-24 2009-02-25 东丽纤维研究所(中国)有限公司 Low dielectric coefficient polyimide/oligomeric silsesquioxane nano hybrid film and preparation thereof
CN105037766A (en) * 2015-09-18 2015-11-11 哈尔滨理工大学 Preparation method of SiO2 hollow sphere/graphene oxide/polyimide composite film
CN105400196A (en) * 2016-01-05 2016-03-16 吉林大学 Method for improving dispersion of octaphenyl cage type silsesquioxane in polyimide base material
CN107556750A (en) * 2017-07-24 2018-01-09 四川大学 High temperature resistant polyetherimide amido composite foam material and preparation method thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
杨大令等: ""低介电常数聚酰亚胺基多孔复合材料的研究进展"", 《材料科学与工程学报》 *
魏东阳: ""SiO2空心球及氧化石墨烯协同改性聚酰亚胺低介电常数复合薄膜的研究"", 《中国优秀硕士学位论文全文数据库.工程科技Ⅰ辑》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109456481A (en) * 2018-11-22 2019-03-12 桂林电子科技大学 A kind of preparation method of graphene oxide/polyimides black film
CN109456481B (en) * 2018-11-22 2021-07-20 桂林电子科技大学 A kind of preparation method of graphene oxide/polyimide black film
CN110437447A (en) * 2019-08-13 2019-11-12 青岛科技大学 The method that a kind of ring-opening polymerisation of cyclosiloxane original position prepares nano particle silicon rubber composite material
CN112795036A (en) * 2020-12-31 2021-05-14 南京航空航天大学 A kind of preparation method of graphene modified polyimide composite film
CN113549325A (en) * 2021-06-29 2021-10-26 宁波长阳科技股份有限公司 Low-dielectric polyimide film, and preparation method and application thereof

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