CN105037766A - Preparation method of SiO2 hollow sphere/graphene oxide/polyimide composite film - Google Patents
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- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 78
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 74
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 229920001721 polyimide Polymers 0.000 title claims abstract description 52
- 239000004642 Polyimide Substances 0.000 title claims abstract description 50
- 239000002131 composite material Substances 0.000 title claims abstract description 40
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title abstract description 12
- 235000012239 silicon dioxide Nutrition 0.000 title abstract description 8
- 229910052681 coesite Inorganic materials 0.000 title abstract description 4
- 229910052906 cristobalite Inorganic materials 0.000 title abstract description 4
- 229910052682 stishovite Inorganic materials 0.000 title abstract description 4
- 229910052905 tridymite Inorganic materials 0.000 title abstract description 4
- 238000000034 method Methods 0.000 claims abstract description 45
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000002135 nanosheet Substances 0.000 claims abstract description 12
- 239000005543 nano-size silicon particle Substances 0.000 claims abstract description 11
- 239000004005 microsphere Substances 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 239000000243 solution Substances 0.000 claims description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 239000008367 deionised water Substances 0.000 claims description 12
- 229910021641 deionized water Inorganic materials 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 11
- 238000003756 stirring Methods 0.000 claims description 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 229920005575 poly(amic acid) Polymers 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000012286 potassium permanganate Substances 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000006185 dispersion Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229920002125 Sokalan® Polymers 0.000 claims description 4
- 229910002804 graphite Inorganic materials 0.000 claims description 4
- 239000010439 graphite Substances 0.000 claims description 4
- 239000004584 polyacrylic acid Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 3
- 230000009194 climbing Effects 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 239000011258 core-shell material Substances 0.000 claims description 3
- 239000000839 emulsion Substances 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 3
- 239000005457 ice water Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 239000000376 reactant Substances 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 6
- 206010013786 Dry skin Diseases 0.000 claims 1
- 241000446313 Lamella Species 0.000 claims 1
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- 229960000935 dehydrated alcohol Drugs 0.000 claims 1
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- 239000012895 dilution Substances 0.000 claims 1
- 239000005357 flat glass Substances 0.000 claims 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010907 mechanical stirring Methods 0.000 claims 1
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- 230000001105 regulatory effect Effects 0.000 claims 1
- 238000005287 template synthesis Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052802 copper Inorganic materials 0.000 abstract description 5
- 239000010949 copper Substances 0.000 abstract description 5
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- 239000000758 substrate Substances 0.000 abstract description 5
- 238000005245 sintering Methods 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 241001415145 Acnistus arborescens Species 0.000 abstract 1
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- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 6
- 239000002105 nanoparticle Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 208000005156 Dehydration Diseases 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
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- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
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- 239000006087 Silane Coupling Agent Substances 0.000 description 1
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- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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Abstract
Description
技术领域:Technical field:
本发明涉及绝缘材料技术领域,具体涉及一种SiOThe invention relates to the technical field of insulating materials, in particular to a SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法。Preparation method of hollow sphere/graphene oxide/polyimide composite film.
背景技术:Background technique:
目前覆铜箔板的基材主要采用覆铜箔聚酰亚胺薄膜,聚酰亚胺具有优异的电绝缘性能、机械性能、耐高温性能、阻燃性能以及耐气候性能等,但是随着电子信息产品向高频高速化发展,集成电路中信号容阻延迟、串扰以及能耗等问题也日益凸显出来,而印制板的信号传输特性受印制板基材介电常数和介电损耗的影响很大,为了满足信号传递的高速化,进一步提高电子线路的功能,亟需开发新型低介电常数材料解决上述问题,因此制备具有低介电常数、高耐热性以及良好综合性能的纳米SiOAt present, the base material of copper clad board mainly adopts copper clad polyimide film. Polyimide has excellent electrical insulation properties, mechanical properties, high temperature resistance, flame retardancy and weather resistance, etc. With the development of high-frequency and high-speed information products, the problems of signal capacitive delay, crosstalk and energy consumption in integrated circuits have become increasingly prominent, and the signal transmission characteristics of printed boards are affected by the dielectric constant and dielectric loss of printed board substrates. In order to meet the high speed of signal transmission and further improve the function of electronic circuits, it is urgent to develop new low dielectric constant materials to solve the above problems, so the preparation of nanometer materials with low dielectric constant, high heat resistance and good comprehensive performance SiO 22 空心球/氧化石墨烯/聚酰亚胺复合材料具有非常重要的意义。Hollow sphere/graphene oxide/polyimide composites are of great significance.
随着大规模集成电路尺寸缩小到亚微米级及电路的复杂化程度和信号传递速度的提高,芯片中的导线密度不断增加,导线宽度和间距不断减小,互联中的电阻和电容所产生的寄生效应越来越明显,为了降低纳米尺度微电子器件的阻容延时所引起的信号延迟,串扰等,则需更低介电常数的聚酰亚胺材料。因此,研究人员着手于对聚酰亚胺进行改性研究,其中被证实比较有效的方法之一就是在聚酰亚胺基体中引入无机纳米粒子,无机纳米粒子比表面积大,表面所含的官能团较多,能与聚酰亚胺基体材料形成新的化学键结构,这种结构有利于赋予聚酰亚胺更好的介电性能以及机械性能等,作为聚酰亚胺改性剂的无机纳米粒子,目前研究较多的有二氧化硅、氧化铝等纳米粒子,通过溶胶-凝胶法制备的聚酰亚胺/二氧化硅纳米复合材料,当二氧化硅含量在一定范围内时,杂化材料的机械性能和热性能明显提高,采用水热法制备纳米氧化铝分散液,进而制备的聚酰亚胺/氧化铝纳米复合材料,其击穿强度和耐电晕性都得到了明显的提升,上述各方面只研究了无机纳米粒子对聚酰亚胺单方面性能的研究,对于聚酰亚胺三相复合材料电性能、热性能和力性能等综合性能的研究少有涉及。As the size of large-scale integrated circuits shrinks to the sub-micron level and the complexity of circuits and the speed of signal transmission increase, the density of wires in chips continues to increase, and the width and spacing of wires continue to decrease. The parasitic effect is becoming more and more obvious. In order to reduce the signal delay and crosstalk caused by the resistance and capacitance delay of nanoscale microelectronic devices, polyimide materials with lower dielectric constants are required. Therefore, researchers set out to modify polyimide. One of the more effective methods is to introduce inorganic nanoparticles into the polyimide matrix. The specific surface area of inorganic nanoparticles is large, and the functional groups contained on the surface More, can form a new chemical bond structure with the polyimide matrix material, this structure is conducive to endowing polyimide with better dielectric properties and mechanical properties, etc., as the inorganic nanoparticles of polyimide modifier At present, there are more nanoparticles such as silica and alumina, and polyimide/silica nanocomposites prepared by sol-gel method. When the silica content is within a certain range, the hybrid The mechanical and thermal properties of the material are significantly improved. The nano-alumina dispersion is prepared by the hydrothermal method, and then the polyimide/alumina nanocomposite material is prepared, and its breakdown strength and corona resistance have been significantly improved. , the above aspects only study the unilateral performance of polyimide by inorganic nanoparticles, and rarely involve the comprehensive performance of polyimide three-phase composite materials such as electrical properties, thermal properties and mechanical properties.
发明内容:Invention content:
本发明的目的是提供一种SiOThe object of the invention is to provide a SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法。Preparation method of hollow sphere/graphene oxide/polyimide composite film.
上述的目的通过以下的技术方案实现:Above-mentioned purpose realizes by following technical scheme:
一种SiOA SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,该方法包括如下步骤:采用模板法制备“核-壳”结构微球,在650℃的条件下烧结3h,制得纳米二氧化硅空心球,并通过改进的Hummers法制备氧化石墨烯纳米片;A method for preparing a hollow sphere/graphene oxide/polyimide composite film, the method includes the following steps: using a template method to prepare "core-shell" structure microspheres, and sintering at 650°C for 3 hours to prepare nano-dioxide Silicon hollow spheres, and the preparation of graphene oxide nanosheets by the improved Hummers method;
(1)室温下,向250mL三口瓶中加入0.60g聚丙烯酸与9mL氨水,震荡混合均匀,随后迅速加入180mL无水乙醇,置于超声仪器中搅拌,分6次向反应体系中加入4.5mL正硅酸乙酯,反应结束后得到白色的乳浊液,经干燥、研磨,650℃煅烧,获得白色纳米二氧化硅空心球;(1) At room temperature, add 0.60g of polyacrylic acid and 9mL of ammonia water into a 250mL three-necked flask, oscillate and mix evenly, then quickly add 180mL of absolute ethanol, stir in an ultrasonic instrument, and add 4.5mL of normal Ethyl silicate, after the reaction, a white emulsion is obtained, dried, ground, and calcined at 650°C to obtain white nano-silica hollow spheres;
(2)向三口瓶中加入75mL浓硫酸和25mL浓硝酸混合溶液,然后加入2g膨胀石墨,分六次缓慢加入12g高锰酸钾,反应1小时,整个过程都是在冰水浴环境下进行,将三口瓶移至35℃恒温水浴锅中继续反应2小时,反应过程中分多次加入适量的去离子水并将水浴锅升至98℃反应1小时,此时溶液变为褐色,反应结束后,加入适量的浓度为30%的过氧化氢溶液,此时溶液变为亮黄色,加入大量去离子水稀释,过滤反应物,去除混合物中未反应的高锰酸钾,将得到的液体反复离心,直至pH值为7,将所得的混合物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉末加入去离子水中,超声震荡3小时后烘干,得到氧化石墨烯纳米片;(2) Add 75mL concentrated sulfuric acid and 25mL concentrated nitric acid mixed solution in the there-necked flask, then add 2g expanded graphite, slowly add 12g potassium permanganate in six times, react for 1 hour, the whole process is carried out under the ice-water bath environment, Move the three-necked bottle to a constant temperature water bath at 35°C and continue to react for 2 hours. During the reaction, add an appropriate amount of deionized water several times and raise the water bath to 98°C for 1 hour. At this time, the solution turns brown. After the reaction, , add an appropriate amount of hydrogen peroxide solution with a concentration of 30%, at this time the solution turns bright yellow, add a large amount of deionized water to dilute, filter the reactant, remove unreacted potassium permanganate in the mixture, and centrifuge the obtained liquid repeatedly , until the pH value is 7, drying and grinding the resulting mixture to obtain graphite oxide powder, adding the prepared graphite oxide powder into deionized water, ultrasonically oscillating for 3 hours and then drying to obtain graphene oxide nanosheets;
(3)取根据复合材料性能要求所需无机物含量,称取所需数量的氧化石墨烯纳米片、N,N’-二甲基乙酰胺加入到三口瓶中,超声振荡,机械搅拌分散,加入适量的4,4’-二氨基二苯醚,氮气保护条件下,60℃,回流12h,加入纳米二氧化硅空心球,超声搅拌1h,然后,60℃回流搅拌12h后加入4,4(3) Take the required inorganic content according to the performance requirements of the composite material, weigh the required amount of graphene oxide nanosheets, N,N'-dimethylacetamide and add them to the three-necked bottle, ultrasonically oscillate, mechanically stir and disperse, Add an appropriate amount of 4,4'-diaminodiphenyl ether, under the condition of nitrogen protection, reflux at 60°C for 12h, add nano-silica hollow spheres, stir ultrasonically for 1h, then add 4,4 ’' -二氨基二苯醚,将适量的均苯四甲酸二酐分6次加入到体系当中,当两者比例达到等当量时,体系粘度急剧上升,出现爬杆现象,制得纳米二氧化硅空心球/氧化石墨烯/聚酰胺酸溶液室温下继续搅拌24h;-Diaminodiphenyl ether, add an appropriate amount of pyromellitic dianhydride into the system in 6 times, when the ratio of the two reaches the equivalent, the viscosity of the system rises sharply, and the rod climbing phenomenon occurs, and the nano-silica hollow The ball/graphene oxide/polyamic acid solution continued to stir for 24 hours at room temperature;
(4)将制得的纳米二氧化硅空心球-氧化石墨烯/聚酰胺酸溶液,经自动铺膜机在玻璃上成膜,置于烘箱中,梯度升温亚胺化,热亚胺化过程温度控制为:80℃、120℃、150℃、180℃、200℃、250℃、300℃各30min;(4) The prepared nano-silica hollow sphere-graphene oxide/polyamic acid solution is formed into a film on glass by an automatic film laying machine, placed in an oven, and the gradient temperature is raised for imidization, and the process of thermal imidization Temperature control: 80°C, 120°C, 150°C, 180°C, 200°C, 250°C, 300°C for 30 minutes each;
(5)待自然冷却,将附有纳米二氧化硅空心球-氧化石墨烯/聚酰亚胺复合薄膜的玻璃板放入去离子水中进行脱膜,晾干后放入干燥箱中进行脱水处理。(5) Wait for natural cooling, put the glass plate with nano-silica hollow sphere-graphene oxide/polyimide composite film into deionized water to remove the film, put it into a drying box after drying and carry out dehydration treatment .
所述的SiOThe SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,将所述的纳米二氧化硅空心球负载到氧化石墨烯中,氧化石墨烯经过4,4’-二氨基二苯醚处理,二者通过化学键链接,使氧化石墨烯微片的层间距进一步增加,有利于所述的二氧化硅空心球进入氧化石墨烯片层之间,进一步发生剥离,不仅使有利于氧化石墨烯分散,更有助于三相材料在复合过程中的均匀分布,此过程需在保护气氛下,氮气保护与氩气保护均可。The preparation method of the hollow sphere/graphene oxide/polyimide composite film, the nano-silica hollow sphere is loaded in the graphene oxide, and the graphene oxide is treated with 4,4'-diaminodiphenyl ether, The two are connected by chemical bonds to further increase the layer spacing of graphene oxide micro-sheets, which is beneficial for the hollow silica spheres to enter between the graphene oxide sheets and further peel off, which not only facilitates the dispersion of graphene oxide, It is more conducive to the uniform distribution of the three-phase material in the composite process. This process needs to be under a protective atmosphere, either nitrogen protection or argon protection.
所述的SiOThe SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,所述的纳米二氧化硅空心球/氧化石墨烯/聚酰亚胺三组分复合有助于降低聚酰亚胺的介电常数并提高其力学性能。The preparation method of hollow sphere/graphene oxide/polyimide composite film, described nano-silica hollow sphere/graphene oxide/polyimide three-component composite helps to reduce the dielectric of polyimide constant and improve its mechanical properties.
所述的SiOThe SiO 22 空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,所述的纳米二氧化硅空心球/氧化石墨烯/聚酰亚胺三组分复合材料中可通过调节二氧化硅空心球与氧化石墨烯的比例改变聚酰亚胺复合材料性能。The preparation method of hollow sphere/graphene oxide/polyimide composite film, in the described nano-silica hollow sphere/graphene oxide/polyimide three-component composite material, can be by adjusting silicon dioxide hollow sphere and The proportion of graphene oxide changes the polyimide composite properties.
有益效果:Beneficial effect:
1.本发明主要应用于高速集成电路挠性覆铜箔板基材中,采用模板法制备纳米二氧化硅微球,在650℃的条件下高温烧结3h,制得纳米二氧化硅空心球,并通过改进的Hummer’s法制备氧化石墨烯纳米片,通过透射电镜表征结果可知,纳米二氧化硅空心球分散良好,没有明显的团聚现象,并且表面光滑、粒径在50-70nm之间,1. The present invention is mainly used in high-speed integrated circuit flexible copper-clad laminate substrates. The template method is used to prepare nano-silica microspheres, which are sintered at a high temperature of 650 ° C for 3 hours to obtain nano-silica hollow spheres. Graphene oxide nanosheets were prepared by the improved Hummer's method. According to the characterization results by transmission electron microscopy, the nano-silica hollow spheres are well dispersed without obvious agglomeration, and the surface is smooth, and the particle size is between 50-70nm.
2.本发明通过改进的Hummers法制备的氧化石墨烯片层较薄,质地均匀,将纳米SiO2. The graphene oxide sheet layer prepared by the improved Hummers method of the present invention is relatively thin, and the texture is uniform, and the nano-SiO 22 空心球负载到氧化石墨烯纳米片上填充到聚酰亚胺基体中制备出一种介电性能、热性能、机械性能良好的复合材料,可广泛适用于高速集成电路挠性覆铜箔板基材中。Hollow spheres are loaded onto graphene oxide nanosheets and filled into polyimide matrix to prepare a composite material with good dielectric properties, thermal properties and mechanical properties, which can be widely used as substrates for high-speed integrated circuit flexible copper clad laminates middle.
本发明的优点在于通过模板法制备的纳米二氧化硅空心球粒径均匀,表面光滑,分散程度高,通过改进的Hummers法制备的氧化石墨烯片层较薄,质地均匀,其与SiOThe present invention has the advantages that the nano-silica hollow spheres prepared by the template method have uniform particle size, smooth surface and high degree of dispersion; the graphene oxide sheet prepared by the improved Hummers method is thinner and has a uniform texture. 22 空心球负载后在聚酰亚胺基体中表现出良好分散性,并且纳米SiOHollow spheres showed good dispersion in polyimide matrix after loading, and nano-SiO 22 空心球/氧化石墨烯/聚酰亚胺复合材料具有优异的介电性能、热稳定性能以及机械性能等特点。Hollow sphere/graphene oxide/polyimide composites have excellent dielectric properties, thermal stability and mechanical properties.
本发明的纳米空心球作为一种新的纳米结构,其一个明显的特征就是具有很大的内部空间及厚度在纳米尺度范围内的壳层,纳米SiONano hollow sphere of the present invention is as a kind of new nanostructure, and one of its obvious features is exactly to have very big interior space and the shell layer that thickness is in nanoscale scope, nano-SiO 22 空心球独特的空心结构(空气的介电常数k≈1)使其介电常数大大降低,而且纳米二氧化硅空心球还具有吸湿率为零,机械性能优异,热稳定性良好等诸多优异特性,其与聚酰亚胺的复合材料能够满足高速集成电路中新技术对于基板材料的要求。The unique hollow structure of the hollow sphere (the dielectric constant of air k≈1) greatly reduces the dielectric constant, and the nano-silica hollow sphere also has many excellent characteristics such as zero moisture absorption rate, excellent mechanical properties, and good thermal stability. , its composite material with polyimide can meet the requirements of new technologies in high-speed integrated circuits for substrate materials.
本发明的氧化石墨烯是一种性能优异的新型碳材料,作为石墨烯的一种重要衍生物,氧化石墨烯与石墨烯的结构大体相同,只是在一层碳原子构成的二维空间无限延伸的基面上连接有大量含氧基团,其平面上含有羟基和环氧基,而在其片层边缘含有羰基和羧基,这些官能团赋予了氧化石墨烯一些独特的性质,易吸水且能在水溶液体系中形成稳定的胶束溶液,由于氧化石墨烯比表面积大,加入后其复合材料的强度和吸附性能得到增强,在改善材料的热学、电学、力学等综合性能方面发挥着非常重要的作用。The graphene oxide of the present invention is a new type of carbon material with excellent performance. As an important derivative of graphene, the structure of graphene oxide and graphene is roughly the same, except that it extends infinitely in a two-dimensional space composed of a layer of carbon atoms. There are a large number of oxygen-containing groups connected to the basal surface, and the plane contains hydroxyl and epoxy groups, while the edge of its sheet contains carbonyl and carboxyl groups. These functional groups endow graphene oxide with some unique properties, such as easy water absorption and ability to absorb water. A stable micellar solution is formed in the aqueous solution system. Due to the large specific surface area of graphene oxide, the strength and adsorption performance of the composite material are enhanced after the addition, and it plays a very important role in improving the thermal, electrical, mechanical and other comprehensive properties of the material. .
本发明以聚丙烯酸在乙醇溶剂中形成的球形聚集体为模板,正硅酸乙酯作为硅源,经烧结制备出纳米二氧化硅空心球,并用硅烷偶联剂将纳米二氧化硅空心球与采用改进的Hummer’s法制备的氧化石墨烯负载,将改性后的纳米SiOIn the present invention, the spherical aggregate formed by polyacrylic acid in ethanol solvent is used as a template, and tetraethyl orthosilicate is used as a silicon source, and nano-silica hollow spheres are prepared by sintering, and the nano-silica hollow spheres are combined with a silane coupling agent. The graphene oxide support prepared by the improved Hummer's method, the modified nano-SiO 22 空心球/氧化石墨烯粉体与聚酰胺酸复合,经过热处理制备出具有良好介电性能、热性能的纳米SiOHollow sphere/graphene oxide powder is combined with polyamic acid, and nano-SiO with good dielectric and thermal properties is prepared after heat treatment. 22 空心球/氧化石墨烯/聚酰亚胺复合材料。Hollow sphere/graphene oxide/polyimide composite.
附图说明:Description of drawings:
附图1是本发明的以膨胀石墨为原料制备的氧化石墨烯粉体X射线衍射图谱。Accompanying drawing 1 is the graphene oxide powder X-ray diffraction spectrum that is prepared as raw material with expanded graphite of the present invention.
附图2是本发明的方法得到的4,4’-二氨基二苯醚-氧化石墨烯的X射线衍射图谱。Accompanying drawing 2 is the X-ray diffraction pattern of the 4,4'-diaminodiphenyl ether-graphene oxide that method of the present invention obtains.
附图3是本发明的方法得到的纳米二氧化硅空心球的X射线衍射图谱。Accompanying drawing 3 is the X-ray diffraction spectrum of the nano-silica hollow sphere that the method of the present invention obtains.
附图4是本发明的方法得到的氧化石墨烯的形貌(透射电镜图)。Accompanying drawing 4 is the morphology (transmission electron microscope picture) of the graphene oxide that the method of the present invention obtains.
附图5是本发明的方法得到的4,4’-二氨基二苯醚-氧化石墨烯的形貌(透射电镜图)。Accompanying drawing 5 is the morphology (transmission electron microscope image) of the 4,4'-diaminodiphenyl ether-graphene oxide obtained by the method of the present invention.
附图6是本发明的方法得到的纳米二氧化硅空心球的形貌(透射电镜图)。Accompanying drawing 6 is the morphology (transmission electron microscope picture) of the nano-silica hollow sphere obtained by the method of the present invention.
附图7是本发明的方法得到的纳米二氧化硅空心球负载氧化石墨烯的纳米SHS-GO粉体的形貌(透射电镜图)。Accompanying drawing 7 is the morphology (transmission electron microscope image) of the nano-scale SHS-GO powder of nano-silica hollow spheres supported graphene oxide obtained by the method of the present invention.
附图8是本发明的方法得到的纳米二氧化硅空心球-氧化石墨烯/聚酰亚胺复合材料的断面貌扫描(扫描电镜图)。Accompanying drawing 8 is the scan (scanning electron micrograph) of the cross-section of the nano-silica hollow sphere-graphene oxide/polyimide composite material obtained by the method of the present invention.
具体实施方式:Detailed ways:
实施例1:Example 1:
一种SiO2空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,该方法包括如下步骤:采用模板法制备“核-壳”结构微球,在650℃的条件下烧结3h,制得纳米二氧化硅空心球,并通过改进的Hummers法制备氧化石墨烯纳米片;A method for preparing a SiO2 hollow sphere/graphene oxide/polyimide composite film, the method comprising the following steps: using a template method to prepare a "core-shell" structure microsphere, and sintering at 650°C for 3 hours to obtain Nano-silica hollow spheres, and graphene oxide nanosheets prepared by the improved Hummers method;
(1)室温下,向250mL三口瓶中加入0.60g聚丙烯酸与9mL氨水,震荡混合均匀,随后迅速加入180mL无水乙醇,置于超声仪器中搅拌,分6次向反应体系中加入4.5mL正硅酸乙酯,反应结束后得到白色的乳浊液,经干燥、研磨,650℃煅烧,获得白色纳米二氧化硅空心球;(1) At room temperature, add 0.60g of polyacrylic acid and 9mL of ammonia water into a 250mL three-necked flask, oscillate and mix evenly, then quickly add 180mL of absolute ethanol, stir in an ultrasonic instrument, and add 4.5mL of normal Ethyl silicate, after the reaction, a white emulsion is obtained, dried, ground, and calcined at 650°C to obtain white nano-silica hollow spheres;
(2)向三口瓶中加入75mL浓硫酸和25mL浓硝酸混合溶液,然后加入2g膨胀石墨,分六次缓慢加入12g高锰酸钾,反应1小时,整个过程都是在冰水浴环境下进行,将三口瓶移至35℃恒温水浴锅中继续反应2小时,反应过程中分多次加入适量的去离子水并将水浴锅升至98℃反应1小时,此时溶液变为褐色,反应结束后,加入适量的浓度为30%的过氧化氢溶液,此时溶液变为亮黄色,加入大量去离子水稀释,过滤反应物,去除混合物中未反应的高锰酸钾,将得到的液体反复离心,直至pH值为7,将所得的混合物烘干并研磨,得到氧化石墨粉体,将制备好的氧化石墨粉末加入去离子水中,超声震荡3小时后烘干,得到氧化石墨烯纳米片;(2) Add 75mL concentrated sulfuric acid and 25mL concentrated nitric acid mixed solution in the there-necked flask, then add 2g expanded graphite, slowly add 12g potassium permanganate in six times, react for 1 hour, the whole process is carried out under the ice-water bath environment, Move the three-necked bottle to a constant temperature water bath at 35°C and continue to react for 2 hours. During the reaction, add an appropriate amount of deionized water several times and raise the water bath to 98°C for 1 hour. At this time, the solution turns brown. After the reaction, , add an appropriate amount of hydrogen peroxide solution with a concentration of 30%, at this time the solution turns bright yellow, add a large amount of deionized water to dilute, filter the reactant, remove unreacted potassium permanganate in the mixture, and centrifuge the obtained liquid repeatedly , until the pH value is 7, drying and grinding the resulting mixture to obtain graphite oxide powder, adding the prepared graphite oxide powder into deionized water, ultrasonically oscillating for 3 hours and then drying to obtain graphene oxide nanosheets;
(3)取根据复合材料性能要求所需无机物含量,称取所需数量的氧化石墨烯纳米片、N,N’-二甲基乙酰胺加入到三口瓶中,超声振荡,机械搅拌分散,加入适量的4,4’-二氨基二苯醚,氮气保护条件下,60℃,回流12h,加入纳米二氧化硅空心球,超声搅拌1h,然后,60℃回流搅拌12h后加入4,4(3) Take the required inorganic content according to the performance requirements of the composite material, weigh the required amount of graphene oxide nanosheets, N,N'-dimethylacetamide and add them to the three-necked bottle, ultrasonically oscillate, mechanically stir and disperse, Add an appropriate amount of 4,4'-diaminodiphenyl ether, under the condition of nitrogen protection, reflux at 60°C for 12h, add nano-silica hollow spheres, stir ultrasonically for 1h, then add 4,4 ’' -二氨基二苯醚,将适量的均苯四甲酸二酐分6次加入到体系当中,当两者比例达到等当量时,体系粘度急剧上升,出现爬杆现象,制得纳米二氧化硅空心球/氧化石墨烯/聚酰胺酸溶液室温下继续搅拌24h;-Diaminodiphenyl ether, add an appropriate amount of pyromellitic dianhydride into the system in 6 times, when the ratio of the two reaches the equivalent, the viscosity of the system rises sharply, and the rod climbing phenomenon occurs, and the nano-silica hollow The ball/graphene oxide/polyamic acid solution continued to stir for 24 hours at room temperature;
(4)将制得的纳米二氧化硅空心球-氧化石墨烯/聚酰胺酸溶液,经自动铺膜机在玻璃上成膜,置于烘箱中,梯度升温亚胺化,热亚胺化过程温度控制为:80℃、120℃、150℃、180℃、200℃、250℃、300℃各30min;(4) The prepared nano-silica hollow sphere-graphene oxide/polyamic acid solution is formed into a film on glass by an automatic film laying machine, placed in an oven, and the gradient temperature is raised for imidization, and the process of thermal imidization Temperature control: 80°C, 120°C, 150°C, 180°C, 200°C, 250°C, 300°C for 30 minutes each;
(5)待自然冷却,将附有纳米二氧化硅空心球-氧化石墨烯/聚酰亚胺复合薄膜的玻璃板放入去离子水中进行脱膜,晾干后放入干燥箱中进行脱水处理。(5) Wait for natural cooling, put the glass plate with nano-silica hollow sphere-graphene oxide/polyimide composite film into deionized water to remove the film, put it into a drying box after drying and carry out dehydration treatment .
实施例2:Example 2:
实施例1所述的SiO2空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,将所述的纳米二氧化硅空心球负载到氧化石墨烯中,氧化石墨烯经过4,4’-二氨基二苯醚处理,二者通过化学键链接,使氧化石墨烯微片的层间距进一步增加,有利于所述的二氧化硅空心球进入氧化石墨烯片层之间,进一步发生剥离,不仅使有利于氧化石墨烯分散,更有助于三相材料在复合过程中的均匀分布,此过程需在保护气氛下,氮气保护与氩气保护均可。SiO described in embodiment 1 The preparation method of hollow sphere/graphene oxide/polyimide composite film, described hollow nano silicon dioxide sphere is loaded in graphene oxide, graphene oxide passes through 4,4 '- Diaminodiphenyl ether treatment, the two are linked by chemical bonds to further increase the interlayer spacing of the graphene oxide microsheets, which is conducive to the entry of the silicon dioxide hollow spheres between the graphene oxide sheets and further peeling off, which not only makes It is conducive to the dispersion of graphene oxide, and it is more conducive to the uniform distribution of three-phase materials in the composite process. This process needs to be under a protective atmosphere, either nitrogen protection or argon protection.
实施例3:Example 3:
实施例1所述的SiO2空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,所述的纳米二氧化硅空心球/氧化石墨烯/聚酰亚胺三组分复合有助于降低聚酰亚胺的介电常数并提高其力学性能。SiO described in embodiment 1 The preparation method of hollow sphere/graphene oxide/polyimide composite film, described nanometer silicon dioxide hollow sphere/graphene oxide/polyimide three-component composite helps to reduce Dielectric constant of polyimide and improve its mechanical properties.
实施例4:Example 4:
实施例1所述的SiO2空心球/氧化石墨烯/聚酰亚胺复合薄膜的制法,所述的纳米二氧化硅空心球/氧化石墨烯/聚酰亚胺三组分复合材料中可通过调节二氧化硅空心球与氧化石墨烯的比例改变聚酰亚胺复合材料性能。SiO described in embodiment 1 The preparation method of hollow sphere/graphene oxide/polyimide composite film, can be passed in the described nanometer silicon dioxide hollow sphere/graphene oxide/polyimide three-component composite material Adjusting the ratio of silica hollow spheres to graphene oxide changes the properties of polyimide composites.
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