CN108191417A - 用于高压陶瓷板的泥料及高压陶瓷板的制备工艺 - Google Patents
用于高压陶瓷板的泥料及高压陶瓷板的制备工艺 Download PDFInfo
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- 239000000919 ceramic Substances 0.000 title claims abstract description 42
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 16
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000292 calcium oxide Substances 0.000 claims abstract description 8
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 8
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 8
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910001950 potassium oxide Inorganic materials 0.000 claims abstract description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 8
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910001948 sodium oxide Inorganic materials 0.000 claims abstract description 8
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 8
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 20
- 230000032683 aging Effects 0.000 claims description 15
- 238000000498 ball milling Methods 0.000 claims description 10
- 238000010304 firing Methods 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 235000015895 biscuits Nutrition 0.000 claims description 8
- DQMUQFUTDWISTM-UHFFFAOYSA-N O.[O-2].[Fe+2].[Fe+2].[O-2] Chemical compound O.[O-2].[Fe+2].[Fe+2].[O-2] DQMUQFUTDWISTM-UHFFFAOYSA-N 0.000 claims description 7
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 5
- 239000002002 slurry Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 230000008676 import Effects 0.000 claims description 4
- 238000007873 sieving Methods 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 230000002829 reductive effect Effects 0.000 claims 1
- 241001391944 Commicarpus scandens Species 0.000 abstract description 3
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium oxide Chemical compound [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000000567 combustion gas Substances 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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Abstract
本发明公开了一种用于高压陶瓷板的泥料及高压陶瓷板的制备工艺,用于高压陶瓷板的泥料含有的组分及各组分的质量份如下:二氧化硅:55~65%;三氧化二铝:20~30%;三氧化二铁:0.05~0.2%;氧化钙:0.2~0.5%;氧化镁:0.5~2%;氧化钾:1~3%;氧化钠:1~3%;二氧化钛:0.1~0.5%;灼烧减量:0~5%;以上组分总计100%。本发明结合性好,不易断裂,支撑力强。
Description
技术领域
本发明涉及一种用于高压陶瓷板的泥料及高压陶瓷板的制备工艺。
背景技术
目前,随着生活水平,室内装饰布置领域发展很快,在瓷板画领域,特别在稳定材料的背景下,优质的陶瓷装饰板成为流行,目前已有120cm×60cm釉下五彩注浆板生产,但生产成品相对稳定性有限,泥料配方不稳定。
发明内容
本发明所要解决的技术问题是克服现有技术的缺陷,提供一种用于高压陶瓷板的泥料,它结合性好,不易断裂,支撑力强。
为了解决上述技术问题,本发明的技术方案是:一种用于高压陶瓷板的泥料,它含有的组分及各组分的质量份如下:
二氧化硅:55~65%;
三氧化二铝:20~30%;
三氧化二铁:0.05~0.2%;
氧化钙:0.2~0.5%;
氧化镁:0.5~2%;
氧化钾:1~3%;
氧化钠:1~3%;
二氧化钛:0.1~0.5%;
灼烧减量:0~5%;
以上组分总计100%。
进一步,用于高压陶瓷板的泥料含有的组分及各组分的质量份如下:
二氧化硅:62.39%;
三氧化二铝:27.19%;
三氧化二铁:0.10%;
氧化钙:0.39%;
氧化镁:0.98%;
氧化钾:2.39%;
氧化钠:1.85%;
二氧化钛:0.02%。
灼烧减量:4.69%。
本发明还提供了一种高压陶瓷板的制备工艺,工艺含有的步骤如下:
S1:采用用于高压陶瓷板的泥料制备板坯;
S2:然后依次经过修坯、上釉、素烧、彩绘、喷保护釉和烧制,得到所需的高压陶瓷板。
在步骤S1中,将泥料依次进行球磨、过筛、除铁、陈腐后出浆,再将浆料导入真空脱泡机,注入模具,沉淀至所需要的坯体厚度后出坯,然后静置处理,再放入烘房烘干,制得板坯。
进一步,球磨的时间为6~12小时,除铁时间为10小时以上,陈腐时间为48小时以上。
进一步,陈腐后出浆的波美度为60波美度以上。
进一步,静置处理的时间为24小时。
进一步,素烧过程中,采用氧化焰烧成至800℃,并退温24小时以上;其中,素烧时间为12~15小时,
进一步,烧制过程中,采用氧化还原焰烧成至1380℃,并退温15小时以上;其中,烧制时间为10小时~13小时。
采用了上述技术方案后,本发明的用于高压陶瓷板的泥料的配方组分及各组分的用量,使得制备得到的高压陶瓷板的稳定性比较好,结合性好,不易断裂,支撑力强。
具体实施方式
为了使本发明的内容更容易被清楚地理解,下面根据具体实施例,对本发明作进一步详细的说明。
实施例一
一种用于高压陶瓷板的泥料,它含有的组分及各组分的质量份如下:
二氧化硅:62.39%;
三氧化二铝:27.19%;
三氧化二铁:0.10%;
氧化钙:0.39%;
氧化镁:0.98%;
氧化钾:2.39%;
氧化钠:1.85%;
二氧化钛:0.02%。
灼烧减量:4.69%。
一种高压陶瓷板的制备工艺,工艺含有的步骤如下:
S1:采用本实施例一的用于高压陶瓷板的泥料制备板坯;
S2:然后依次经过修坯、上釉、素烧、彩绘、喷保护釉和烧制,得到所需的高压陶瓷板;其中,修坯的具体过程为使用刀片切除坯体周边;采用手动淋釉工艺上釉。
在步骤S1中,将泥料依次进行球磨、过筛(200目以上)、除铁、陈腐后出浆,再将浆料导入真空脱泡机,注入模具,沉淀至所需要的坯体厚度后出坯,然后静置处理,再放入烘房烘干,制得板坯;其中,静置时间为24小时,静置处理后放入半自动控制燃气地暖恒温烘房(40度左右),48小时后干燥水分50%以上。
球磨的时间为6小时,除铁时间为10小时,陈腐时间为48小时。
陈腐后出浆的波美度为60波美度以上。
静置处理的时间为24小时。
素烧过程中,采用氧化焰烧成至800℃,并退温24小时以上;其中,素烧时间为12小时,
烧制过程中,采用氧化还原焰烧成至1380℃,并退温15小时以上;其中,烧制时间为10小时。
实施例二
一种用于高压陶瓷板的泥料,它含有的组分及各组分的质量份如下:
二氧化硅:55.8%;
三氧化二铝:30%;
三氧化二铁:0.2%;
氧化钙:0.5%;
氧化镁:2%;
氧化钾:3%;
氧化钠:3%;
二氧化钛:0.5%;
灼烧减量:5%。
一种高压陶瓷板的制备工艺,工艺含有的步骤如下:
S1:采用用于高压陶瓷板的泥料制备板坯;
S2:然后依次经过修坯、上釉、素烧、彩绘、喷保护釉和烧制,得到所需的高压陶瓷板;其中,修坯的具体过程为使用刀片切除坯体周边;采用手动淋釉工艺上釉。
在步骤S1中,将泥料依次进行球磨、过筛(200目以上)、除铁、陈腐后出浆,再将浆料导入真空脱泡机,注入模具,沉淀至所需要的坯体厚度后出坯,然后静置处理,再放入烘房烘干,制得板坯;其中,静置时间为24小时,静置处理后放入半自动控制燃气地暖恒温烘房(40度左右),48小时后干燥水分50%以上。
球磨的时间为12小时,除铁时间为12小时,陈腐时间为50小时。
陈腐后出浆的波美度为60波美度以上。
静置处理的时间为24小时。
素烧过程中,采用氧化焰烧成至800℃,并退温24小时以上;其中,素烧时间为13小时,
烧制过程中,采用氧化还原焰烧成至1380℃,并退温15小时以上;其中,烧制时间为12小时。
实施例三
一种用于高压陶瓷板的泥料,它含有的组分及各组分的质量份如下:
二氧化硅:60%;
三氧化二铝:30%;
三氧化二铁:0.15%;
氧化钙:0.4%;
氧化镁:2%;
氧化钾:2%;
氧化钠:2%;
二氧化钛:0.5%;
灼烧减量:2.95%。
一种高压陶瓷板的制备工艺,工艺含有的步骤如下:
S1:采用如权利要求1或2所述的用于高压陶瓷板的泥料制备板坯;
S2:然后依次经过修坯、上釉、素烧、彩绘、喷保护釉和烧制,得到所需的高压陶瓷板;其中,修坯的具体过程为使用刀片切除坯体周边;采用手动淋釉工艺上釉。
在步骤S1中,将泥料依次进行球磨、过筛(200目以上)、除铁、陈腐后出浆,再将浆料导入真空脱泡机,注入模具,沉淀至所需要的坯体厚度后出坯,然后静置处理,再放入烘房烘干,制得板坯;其中,静置时间为24小时,静置处理后放入半自动控制燃气地暖恒温烘房(40度左右),48小时后干燥水分50%以上。
球磨的时间为10小时,除铁时间为12小时,陈腐时间为50小时。
陈腐后出浆的波美度为60波美度以上。
静置处理的时间为24小时。
素烧过程中,采用氧化焰烧成至800℃,并退温24小时以上;其中,素烧时间为15小时,
烧制过程中,采用氧化还原焰烧成至1380℃,并退温15小时以上;其中,烧制时间为13小时。
以上所述的具体实施例,对本发明解决的技术问题、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。
Claims (9)
1.一种用于高压陶瓷板的泥料,其特征在于它含有的组分及各组分的质量份如下:
二氧化硅:55~65%;
三氧化二铝:20~30%;
三氧化二铁:0.05~0.2%;
氧化钙:0.2~0.5%;
氧化镁:0.5~2%;
氧化钾:1~3%;
氧化钠:1~3%;
二氧化钛:0.1~0.5%;
灼烧减量:0~5%;
以上组分总计100%。
2.根据权利要求1所述的用于高压陶瓷板的泥料,其特征在于:它含有的组分及各组分的质量份如下:
二氧化硅:62.39%;
三氧化二铝:27.19%;
三氧化二铁:0.10%;
氧化钙:0.39%;
氧化镁:0.98%;
氧化钾:2.39%;
氧化钠:1.85%;
二氧化钛:0.02%。
灼烧减量:4.69%。
3.一种高压陶瓷板的制备工艺,其特征在于工艺含有的步骤如下:
S1:采用如权利要求1或2所述的用于高压陶瓷板的泥料制备板坯;
S2:然后依次经过修坯、上釉、素烧、彩绘、喷保护釉和烧制,得到所需的高压陶瓷板。
4.根据权利要求3所述的高压陶瓷板的制备工艺,其特征在于:在步骤S1中,将泥料依次进行球磨、过筛、除铁、陈腐后出浆,再将浆料导入真空脱泡机,注入模具,沉淀至所需要的坯体厚度后出坯,然后静置处理,再放入烘房烘干,制得板坯。
5.根据权利要求4所述的高压陶瓷板的制备工艺,其特征在于:球磨的时间为6~12 小时,除铁时间为10小时以上,陈腐时间为48小时以上。
6.根据权利要求4所述的高压陶瓷板的制备工艺,其特征在于:陈腐后出浆的波美度为60波美度以上。
7.根据权利要求4所述的高压陶瓷板的制备工艺,其特征在于:静置处理的时间为24小时。
8.根据权利要求3所述的高压陶瓷板的制备工艺,其特征在于:素烧过程中,采用氧化焰烧成至800℃,并退温24小时以上;其中,素烧时间为12~15小时。
9.根据权利要求3所述的高压陶瓷板的制备工艺,其特征在于:烧制过程中,采用氧化还原焰烧成至1380℃,并退温15小时以上;其中,烧制时间为10小时~13小时。
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