CN108130570A - A kind of compound trivalent plating chromium process - Google Patents
A kind of compound trivalent plating chromium process Download PDFInfo
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- 238000007747 plating Methods 0.000 title claims abstract description 54
- 239000011651 chromium Substances 0.000 title claims abstract description 46
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 36
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 34
- 150000001875 compounds Chemical class 0.000 title claims description 5
- 238000009713 electroplating Methods 0.000 claims abstract description 94
- 238000000576 coating method Methods 0.000 claims abstract description 41
- 239000011248 coating agent Substances 0.000 claims abstract description 40
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 14
- 239000005543 nano-size silicon particle Substances 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 238000007796 conventional method Methods 0.000 claims abstract 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 238000005554 pickling Methods 0.000 claims description 7
- 235000019253 formic acid Nutrition 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims 2
- 239000007832 Na2SO4 Substances 0.000 claims 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 claims 2
- 239000006185 dispersion Substances 0.000 claims 2
- 239000004615 ingredient Substances 0.000 claims 2
- 229910052938 sodium sulfate Inorganic materials 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 1
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- 230000007797 corrosion Effects 0.000 abstract description 22
- 238000005260 corrosion Methods 0.000 abstract description 22
- 239000002131 composite material Substances 0.000 abstract description 8
- 239000007769 metal material Substances 0.000 abstract description 6
- 239000011148 porous material Substances 0.000 abstract description 3
- 230000008595 infiltration Effects 0.000 abstract description 2
- 238000001764 infiltration Methods 0.000 abstract description 2
- 230000011218 segmentation Effects 0.000 abstract description 2
- 238000012360 testing method Methods 0.000 description 10
- 239000002105 nanoparticle Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 229910001430 chromium ion Inorganic materials 0.000 description 4
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010963 304 stainless steel Substances 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000001132 ultrasonic dispersion Methods 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 208000010201 Exanthema Diseases 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 208000003420 Nasal Septal Perforation Diseases 0.000 description 1
- 206010028765 Nasal septum perforation Diseases 0.000 description 1
- 208000028571 Occupational disease Diseases 0.000 description 1
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- 239000000654 additive Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- 230000003197 catalytic effect Effects 0.000 description 1
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- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
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- 238000004070 electrodeposition Methods 0.000 description 1
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- 230000003628 erosive effect Effects 0.000 description 1
- 201000005884 exanthem Diseases 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
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- 238000012423 maintenance Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
本发明提供一种金属表面复合镀铬工艺及电镀液配方。所述方法采用分段,分槽电镀工艺:首先按常规方法在金属表面镀一层20‑30um的铬层,其次,将镀铬层的金属材料置入另一电镀槽进行二次电镀,二次电镀液中加入了纳米氮化硅。由于纳米氮化硅自身的刚性,在电镀过程可以均匀的分散在镀层,从而提高了镀层的硬度和耐磨性。在镀层中均匀分散的纳米氮化硅一方面可通过填充镀层的孔隙和缠绕覆盖于铬金属晶粒表面以阻止腐蚀液的渗入,另一方面通过与铬金属晶粒构成微型原电池,促进铬的敦化,由此提高了耐蚀性能。金属材料经过两次电镀,形成复合的电镀层,所述电镀层在金属表面发布均匀,硬度达到HV900‑1200,性能优越,具有广泛的应用前景及经济价值。
The invention provides a metal surface composite chrome plating process and an electroplating solution formula. The method adopts segmentation and sub-tank electroplating process: first, a chromium layer of 20-30um is plated on the metal surface according to a conventional method; Nano-silicon nitride is added to the electroplating solution. Due to the rigidity of nano-silicon nitride itself, it can be uniformly dispersed in the coating during the electroplating process, thereby improving the hardness and wear resistance of the coating. Nano-silicon nitride uniformly dispersed in the coating can on the one hand fill the pores of the coating and wrap around the surface of the chromium metal grains to prevent the infiltration of corrosive liquid; Dunhua, thus improving the corrosion resistance. The metal material is electroplated twice to form a composite electroplating layer. The electroplating layer is evenly distributed on the metal surface and has a hardness of HV900‑1200. It has superior performance and has broad application prospects and economic value.
Description
技术领域technical field
本发明属于电镀领域,具体涉及一种提高镀铬层厚度,表面硬度、耐蚀性、耐磨性的电镀工艺。The invention belongs to the field of electroplating, and in particular relates to an electroplating process for improving the thickness, surface hardness, corrosion resistance and wear resistance of a chromium plating layer.
背景技术Background technique
目前,镀铬已经成为电镀行业中应用最广泛的镀种之一。长期以来,镀铬采用的是六价铬电镀工艺,其中作为六价铬离子提供者的铬酸毒性很大,能造成皮肤出现烧灼和溃疡,使操作工人患皮肤斑疹,鼻中隔穿孔等职业病,并对人体有强烈的致癌作用。同时会导致土壤气孔阻塞,破坏土壤结构。这些现象已引起人们的广泛关注,随着人们的不断增强的环保意识,三价电镀铬的研究以及提高镀层表面硬度、耐蚀性、耐磨性的电镀工艺越来越受到人们的青睐。At present, chrome plating has become one of the most widely used plating types in the electroplating industry. For a long time, chrome plating has adopted the hexavalent chromium electroplating process, in which chromic acid as a provider of hexavalent chromium ions is very toxic, which can cause skin burns and ulcers, and cause workers to suffer from skin rashes, nasal septum perforation and other occupational diseases, and It has a strong carcinogenic effect on the human body. At the same time, it will lead to blockage of soil pores and damage the soil structure. These phenomena have aroused people's widespread concern. With people's increasing awareness of environmental protection, the research of trivalent electroplating chromium and the electroplating process to improve the surface hardness, corrosion resistance and wear resistance of the coating are more and more popular.
但是,目前三价铬镀层存在以下问题:However, the current trivalent chromium coating has the following problems:
(1)镀层增厚度困难:目前三价铬镀层的厚度一般只有几个微米,主要原因镀液pH值和温度随着电镀时间的增加而升高,从而引起析氢反应加剧,最终阴极电流完全用于析氢而使铬电沉积停止。(1) It is difficult to increase the thickness of the coating: at present, the thickness of the trivalent chromium coating is generally only a few microns. Chromium electrodeposition stops due to hydrogen evolution.
在电镀过程中三价铬离子在阳极非常容易被氧化成为六价铬而影响三价铬电还原,导致镀层不能继续增厚。During the electroplating process, trivalent chromium ions are easily oxidized to hexavalent chromium at the anode, which affects the electroreduction of trivalent chromium, resulting in the inability to continue to thicken the coating.
(2)镀液成分复杂。目前镀液体系不仅种类繁多,而且都含有大量的添加剂。此外,阳极带入的其他金属杂质等都使镀液的管理维护非常困难,也限制了三价铬电镀的推广应用。(2) The composition of the plating solution is complex. At present, the plating solution system not only has a great variety, but also contains a large amount of additives. In addition, other metal impurities brought in by the anode make the management and maintenance of the plating solution very difficult, and also limit the popularization and application of trivalent chromium plating.
(3)常规的三价电镀铬技术由于其表面硬度、厚度及其耐磨性的制,目前只应用在装饰品上,还没有实现工业应用。(3) The conventional trivalent chromium plating technology is currently only applied to decorations due to its limited surface hardness, thickness and wear resistance, and has not yet achieved industrial application.
采用常规的三价电镀铬技术很难同时提高表面硬度,表面耐磨性和耐腐蚀性。It is difficult to improve the surface hardness, surface wear resistance and corrosion resistance at the same time by conventional trivalent electroplating technology.
发明内容Contents of the invention
针对现有技术的不足,本发明提供一种复合三价电镀铬工艺,所述方法采用分段,分槽电镀形成复合的三价铬镀层。本发明中电镀液中加入了硼酸用以稳定镀液的PH值,以及在电镀槽的下方放置了一个恒温装置用以稳定镀液的温度,减少了析氢反应从而有利于镀层的增厚。Aiming at the deficiencies of the prior art, the present invention provides a composite trivalent chromium plating process. The method adopts segmentation and sub-tank electroplating to form a composite trivalent chromium plating layer. In the present invention, boric acid is added in the electroplating solution to stabilize the pH value of the plating solution, and a thermostat is placed below the electroplating tank to stabilize the temperature of the plating solution, which reduces the hydrogen evolution reaction and is beneficial to the thickening of the coating.
由于钛基涂层阳极具有使用方便,较耐腐蚀,使用寿命较长的优点,在钛基体上涂氧化铱作为电极催化层的涂层阳极,可避免六价铬的形成,并可预防和消除在阳极上形成的泥渣,长时间保持镀液的稳定。Since the titanium-based coating anode has the advantages of convenient use, relatively corrosion resistance, and long service life, coating the titanium base with iridium oxide as the coating anode of the electrode catalytic layer can avoid the formation of hexavalent chromium, and can prevent and eliminate The sludge formed on the anode keeps the bath stable for a long time.
本发明的镀液中还含有纳米氮化硅,由于纳米氮化硅自身的刚性,在电镀过程可以均匀的分散在镀层,从而提高了镀层的硬度和耐磨性;The plating solution of the present invention also contains nano-silicon nitride. Due to the rigidity of the nano-silicon nitride itself, it can be evenly dispersed in the coating during the electroplating process, thereby improving the hardness and wear resistance of the coating;
在镀层中均匀分散的纳米氮化硅一方面可通过填充镀层的孔隙和缠绕覆盖于铬金属晶粒表面以阻止腐蚀液的渗入,另一方面通过与铬金属晶粒构成微型原电池,促进铬的敦化,由此提高了耐蚀性能。使用该电镀铬工艺可以使镀层厚度达到50-70um。镀层表面硬度达到 900HV—1200HV,耐蚀性、耐磨性均达到六价镀层的水平。Nano-silicon nitride uniformly dispersed in the coating can on the one hand fill the pores of the coating and wrap around the surface of the chromium metal grains to prevent the infiltration of corrosive liquid; Dunhua, thus improving the corrosion resistance. The thickness of the coating can reach 50-70um by using the electrochrome plating process. The surface hardness of the coating reaches 900HV-1200HV, and the corrosion resistance and wear resistance both reach the level of the hexavalent coating.
一种复合三价电镀铬工艺,其特征在于以石墨电极为阳极,以需要电镀的金属基体为阴极,电镀步骤如下:A kind of compound trivalent electroplating chromium process, it is characterized in that with graphite electrode as anode, with the metal substrate that needs electroplating as cathode, electroplating steps are as follows:
步骤一:采用本技术领域常规的技术方法对阴极基体进行除油、抛光、水洗、酸洗处理;Step 1: Degreasing, polishing, washing, and pickling the cathode base body using conventional technical methods in this technical field;
步骤二:将电镀液一倒入电解槽一中,将电解槽一的温度升到 30℃,对电镀槽进行通电开始电镀,在金属表面镀上厚度为20-30um 的铬镀层;Step 2: Pour electroplating solution 1 into electrolytic tank 1, raise the temperature of electrolytic tank 1 to 30°C, power on the electroplating tank to start electroplating, and plate a chromium coating with a thickness of 20-30um on the metal surface;
步骤三:二次电镀,将电镀液二倒入电解槽二中,将电镀液二的温度升到30℃,并且在电镀槽二的下面放一个恒温磁力搅拌器;将步骤二中已经镀铬的金属再进行表面清洗,放置入电解槽二中进行二次电镀,并打开恒温磁力搅拌器,在镀层的表面再次形成含有纳米颗粒Si3N4的镀铬层;Step 3: Secondary electroplating, pour the electroplating solution 2 into the electrolytic tank 2, raise the temperature of the electroplating solution 2 to 30°C, and place a constant temperature magnetic stirrer under the electroplating tank 2; The metal surface is cleaned again, placed in the second electrolytic tank for secondary electroplating, and the constant temperature magnetic stirrer is turned on, and a chromium plating layer containing nano-particles Si 3 N 4 is formed again on the surface of the coating;
其中电镀液一的成分为:Cr3+04-0.8mol·dm-3,HCOOH 0.4-1.0mol·dm-3,CH3OH0.2-0.5mol·dm-3,NH4Br 0.2-0.3mol·dm-3, Na2SO4 1.5-2.0mol·dm-3,H3BO3 0.8-1.2mol·dm-3,C12H25SO4Na 0.005mol·dm-3;Among them, the composition of electroplating solution 1 is: Cr 3+ 04-0.8mol·dm -3 , HCOOH 0.4-1.0mol·dm -3 , CH 3 OH 0.2-0.5mol·dm -3 , NH 4 Br 0.2-0.3mol ·dm -3 , Na 2 SO 4 1.5-2.0mol·dm -3 , H 3 BO 3 0.8-1.2mol·dm -3 , C 12 H 25 SO 4 Na 0.005mol·dm -3 ;
电镀液二的成分为:Cr3+04-0.8mol·dm-3,HCOOH 0.4-1.0mol·dm-3,CH3OH 0.2-0.5mol·dm-3,NH4Br 0.2-0.3mol·dm-3,Na2SO41.5-2.0mol·dm-3,H3BO30.8-1.2mol·dm-3,C12H25SO4Na 0.005mol·dm-3、Si3N42-8g·L-1。The composition of electroplating solution 2 is: Cr 3+ 04-0.8mol·dm -3 , HCOOH 0.4-1.0mol·dm -3 , CH 3 OH 0.2-0.5mol·dm -3 , NH 4 Br 0.2-0.3mol·dm -3 , Na 2 SO 4 1.5-2.0mol·dm- 3 , H 3 BO 3 0.8-1.2mol·dm- 3 , C 12 H 25 SO 4 Na 0.005mol·dm- 3 , Si 3 N 4 2-8g ·L- 1 .
进一步地,镀液二中颗粒大小为20-50nm的Si3N4含量为4-8g/L。Further, the content of Si 3 N 4 with a particle size of 20-50 nm in the second plating solution is 4-8 g/L.
进一步地,所述电镀液二的制备方法是:将各原料组分的试剂溶于水中,再将计量所述的纳米氮化硅溶于其中,混合均匀后用超声波分散。所述超声波分散功率为600-1000w,超声波分散的时间为 5—6min。Further, the preparation method of the electroplating solution 2 is as follows: dissolving the reagents of each raw material component in water, then dissolving the metered nano-silicon nitride in it, mixing evenly, and dispersing with ultrasonic waves. The ultrasonic dispersion power is 600-1000w, and the ultrasonic dispersion time is 5-6min.
本发明的一种三价镀铬工艺,以石墨电极为阳极,石墨材料取材方便,价格便宜,电镀效率和电镀效果都非常好,以需要镀铬的材料为阴极,在电镀之前对阴极基体进行除油、抛光、水洗、酸洗等处理。确保电镀时得到的镀层具有足够大的附着力。将非水溶性的纳米固体微粒Si3N4加入到电镀溶液中,在电镀过程中使其与主体金属共沉积在基材上,这些微粒分散在镀层中能有效地细化金属晶粒以提高金属的力学性能和耐腐蚀性能。A trivalent chromium plating process of the present invention uses a graphite electrode as an anode, the graphite material is convenient to obtain, the price is cheap, the electroplating efficiency and the electroplating effect are very good, and the material requiring chrome plating is used as the cathode, and the cathode substrate is degreased before electroplating , polishing, washing, pickling and other treatments. Ensure that the coating obtained during electroplating has sufficient adhesion. Water-insoluble nano-solid particles Si3N4 are added to the electroplating solution, and they are co-deposited with the main metal on the substrate during the electroplating process. These particles are dispersed in the coating and can effectively refine the metal grains to improve the mechanical properties of the metal. performance and corrosion resistance.
本发明三价镀铬反应原理如下:在阴Cr3+的电还原分为两分进行,其中第一步为Cr3+的单电子准可逆反应,具有催化反应的特性,即所生成的Cr2+可被溶液中的H+重新氧化为Cr3+(反应1-1);第二步为Cr2+还原为金属Cr的不可逆反应(反应2-7)。The reaction principle of the trivalent chromium plating of the present invention is as follows: the electroreduction of negative Cr 3+ is divided into two parts, wherein the first step is the single-electron quasi-reversible reaction of Cr 3+ , which has the characteristics of catalytic reaction, that is, the generated Cr 2 + can be re-oxidized to Cr 3+ by H + in the solution (reaction 1-1); the second step is the irreversible reaction of Cr 2+ reduction to metallic Cr (reaction 2-7).
Cr3++e-→Cr2+ (1-1)Cr 3+ +e - → Cr 2+ (1-1)
Cr2++2e-→2Cr (1-2)Cr 2+ +2e - → 2Cr (1-2)
在阳极主要是水放电生成氧气,以及氯离子生成氯气。同时,电解液中的,甲酸、与铬离子络合形成比较稳定的络合离子,使三价铬离子更易放电、促进金属铬的沉积。甲酸盐所提供的HCOO-配体能够与Cr3+形成配合物,从而调节络离子的放电电位。同时,甲酸在镀液中还能起缓冲作用。硼酸使电镀过程中镀液pH值保持在一定的范围内。硫酸盐提高镀液的导电性,降低槽电压。At the anode, mainly water is discharged to generate oxygen, and chlorine ions to generate chlorine gas. At the same time, formic acid in the electrolyte complexes with chromium ions to form relatively stable complex ions, which makes trivalent chromium ions easier to discharge and promotes the deposition of metal chromium. The HCOO - ligands provided by formate are able to form complexes with Cr 3+ , thereby adjusting the discharge potential of complex ions. At the same time, formic acid can also act as a buffer in the plating solution. Boric acid keeps the pH of the plating solution within a certain range during the electroplating process. Sulfates increase the conductivity of the bath and lower the cell voltage.
本发明中复合镀层内纳米氮化硅形成包括两步吸附过程:第一步为弱的可逆物理吸附,即表面携带着离子和溶剂分子的微粒吸附在阴极表面上;第二步为强的不可逆电化学吸附,即随着一部分吸附在表面的离子被还原,微粒与阴极发生强吸附而进入镀层。In the present invention, the formation of nano-silicon nitride in the composite coating includes a two-step adsorption process: the first step is weak reversible physical adsorption, that is, the surface is carrying particles of ions and solvent molecules adsorbed on the cathode surface; the second step is strong irreversible physical adsorption Electrochemical adsorption, that is, as part of the ions adsorbed on the surface are reduced, the particles and the cathode undergo strong adsorption and enter the coating.
通过本发明提供的复合三价电镀铬工艺形成的复合电镀层硬度达到HV900-1200,由于最外面的镀铬层中含有纳米颗粒Si3N4,The hardness of the composite electroplating layer formed by the composite trivalent electroplating chromium plating process provided by the present invention reaches HV900-1200. Since the outermost chromium plating layer contains nano-particles Si 3 N 4 ,
因此,其耐磨性和耐腐蚀性能是常规镀层性能的两倍。物理性能,镀层结构优化,机械性能也得到优化。Therefore, its wear resistance and corrosion resistance are twice that of conventional coatings. Physical properties, coating structure optimization, mechanical properties are also optimized.
本发明镀铬方法步骤二与步骤三的通电步骤按本技术领域常用技术方法进行,正向电流根据工件的表面面积而定,一般采用 25-33A/dm2。正向电流的时间根据镀层的厚度而定。The energization steps of step 2 and step 3 of the chromium plating method of the present invention are carried out according to common technical methods in this technical field, and the forward current is determined according to the surface area of the workpiece, generally 25-33A/dm 2 . The time of forward current depends on the thickness of the coating.
本发明所述的镀铬方法适用于机械工业常用的金属材料,钢材等。The chrome-plating method of the present invention is applicable to metal materials, steel products and the like commonly used in the machinery industry.
附图说明Description of drawings
图1为本发明装置结构图,Fig. 1 is a structural diagram of the device of the present invention,
①吸气装置、②涂有氧化铱的钛基体阳极、③恒温磁力搅拌子、④恒温磁力搅拌器、⑤镀件、⑥直流稳压电源①Suction device, ②Titanium substrate anode coated with iridium oxide, ③Constant temperature magnetic stirrer, ④Constant temperature magnetic stirrer, ⑤Plating parts, ⑥DC stabilized voltage power supply
具体实施方式Detailed ways
实施例一:Embodiment one:
具体操作:Specific operation:
按下列配方配置电镀液一与电镀液二:Configure electroplating solution 1 and electroplating solution 2 according to the following formula:
电镀液一:CrCl3.6H2O 106g/L,CHooH 9.2g/L;Plating solution 1: CrCl 3 .6H 2 O 106g/L, CHooH 9.2g/L;
电镀液二:CrCl3.6H2O 110g/L,CHooH 9.8g/L,Si3N4 6g·L-1。Plating solution two: CrCl 3 .6H 2 O 110g/L, CHooH 9.8g/L, Si 3 N 4 6g·L -1 .
按下列操作步骤对金属材料进行电镀:Follow the steps below to electroplate metal materials:
步骤一:采用本技术领域常规的技术方法对金属表面进行除油、抛光、水洗、酸洗处理,使金属表面活化。Step 1: Degreasing, polishing, water washing and pickling treatment are carried out on the metal surface by adopting conventional technical methods in this technical field, so as to activate the metal surface.
步骤二:将电镀液一倒入电解槽一中,将电解槽一的温度升到 30℃,将步骤一中表面活化的金属放入电解槽一。对电镀槽进行通电开始电镀。电镀5min,在金属表面镀上厚度为20-30um的铬镀层。Step 2: Pour electroplating solution 1 into electrolytic tank 1, raise the temperature of electrolytic tank 1 to 30°C, and put the surface-activated metal in step 1 into electrolytic tank 1. The electroplating tank is energized to start electroplating. After electroplating for 5 minutes, a chromium coating with a thickness of 20-30um is plated on the metal surface.
步骤三:二次电镀,将电镀液二倒入电解槽二中,将电镀液二的温度升到30℃,并且在电镀槽二的下面放一个恒温磁力搅拌器。将步骤二中已经镀铬的金属再进行表面清洗,放置入电解槽二中进行二次电镀,并打开恒温磁力搅拌器,转速保持在200r/min。电镀10min,在镀层的表面再次形成含有纳米颗粒Si3N4的镀铬层。·Step 3: Secondary electroplating, pour the electroplating solution 2 into the electrolytic tank 2, raise the temperature of the electroplating solution 2 to 30°C, and place a constant temperature magnetic stirrer under the electroplating tank 2. Clean the surface of the chrome-plated metal in step 2, place it in the electrolytic tank 2 for secondary electroplating, and turn on the constant temperature magnetic stirrer, and keep the rotating speed at 200r/min. After electroplating for 10 minutes, a chromium plating layer containing nano-particles Si 3 N 4 is formed again on the surface of the plating layer. ·
实施例二:Embodiment two:
具体操作:Specific operation:
按下列配方配置电镀液一与电镀液二:Configure electroplating solution 1 and electroplating solution 2 according to the following formula:
电镀液一:CrCl3.6H2O 106g/L,CHooH 9.2g/L;Plating solution 1: CrCl 3 .6H 2 O 106g/L, CHooH 9.2g/L;
电镀液二:CrCl3.6H2O 110g/L,CHooH 9.8g/L,Si3N4 8g·L-1。Plating solution two: CrCl 3 .6H 2 O 110g/L, CHooH 9.8g/L, Si 3 N 4 8g·L -1 .
按下列操作步骤对金属材料进行电镀:Follow the steps below to electroplate metal materials:
步骤一:采用本技术领域常规的技术方法对45号钢片(3cm×4cm,厚度为2mm)进行除油、抛光、水洗、酸洗处理,使金属表面活化。Step 1: Degreasing, polishing, water washing and pickling treatment are carried out on No. 45 steel sheet (3cm×4cm, thickness 2mm) by using conventional technical methods in this technical field, so as to activate the metal surface.
步骤二:将电镀液一倒入电解槽一中,将电解槽一的温度升到 30℃,将步骤一中表面活化的金属放入电解槽一。对电镀槽进行通电开始电镀。电镀5min,在金属表面镀上厚度为20-30um的铬镀层。Step 2: Pour electroplating solution 1 into electrolytic tank 1, raise the temperature of electrolytic tank 1 to 30°C, and put the surface-activated metal in step 1 into electrolytic tank 1. The electroplating tank is energized to start electroplating. After electroplating for 5 minutes, a chromium coating with a thickness of 20-30um is plated on the metal surface.
步骤三:二次电镀,将电镀液二倒入电解槽二中,将电镀液二的温度升到30℃,并且在电镀槽二的下面放一个恒温磁力搅拌器。将步骤二中已经镀铬的金属再进行表面清洗,放置入电解槽二中进行二次电镀,并打开恒温磁力搅拌器,转速保持在300r/min。电镀10min,在镀层的表面再次形成含有纳米颗粒Si3N4的镀铬层。Step 3: Secondary electroplating, pour the electroplating solution 2 into the electrolytic tank 2, raise the temperature of the electroplating solution 2 to 30°C, and place a constant temperature magnetic stirrer under the electroplating tank 2. Clean the surface of the chrome-plated metal in step 2, place it in the electrolytic tank 2 for secondary electroplating, and turn on the constant temperature magnetic stirrer, and keep the rotating speed at 300r/min. After electroplating for 10 minutes, a chromium plating layer containing nano-particles Si 3 N 4 is formed again on the surface of the plating layer.
实施例三:Embodiment three:
具体操作:Specific operation:
按下列配方配置电镀液一与电镀液二:Configure electroplating solution 1 and electroplating solution 2 according to the following formula:
电镀液一:CrCl3.6H2O 101g/L,CHooH 9.1g/L;Plating solution 1: CrCl 3 .6H 2 O 101g/L, CHooH 9.1g/L;
电镀液二:CrCl3.6H2O 110g/L,CHooH 9.8g/L,Si3N4 6g·L-1。Plating solution two: CrCl 3 .6H 2 O 110g/L, CHooH 9.8g/L, Si 3 N 4 6g·L -1 .
本实施例中采用纯度为99.9%的紫铜板试件,其规格为3cm×4cm,厚度为2mm,对其金属材料进行电镀:In this embodiment, a red copper plate test piece with a purity of 99.9% is used, its specification is 3cm×4cm, and its thickness is 2mm, and its metal material is electroplated:
步骤一:采用本技术领域常规的技术方法对金属表面进行除油、抛光、水洗、酸洗处理,使金属表面活化。Step 1: Degreasing, polishing, water washing and pickling treatment are carried out on the metal surface by adopting conventional technical methods in this technical field, so as to activate the metal surface.
步骤二:将电镀液一倒入电解槽一中,将电解槽一的温度升到 30℃,将步骤一中表面活化的金属放入电解槽一。对电镀槽进行通电开始电镀。电镀5min,在紫铜板表面镀上厚度为20-30um的铬镀层。Step 2: Pour electroplating solution 1 into electrolytic tank 1, raise the temperature of electrolytic tank 1 to 30°C, and put the surface-activated metal in step 1 into electrolytic tank 1. The electroplating tank is energized to start electroplating. After electroplating for 5 minutes, a chromium plating layer with a thickness of 20-30um is plated on the surface of the copper plate.
步骤三:二次电镀,将电镀液二倒入电解槽二中,将电镀液二的温度升到30℃,并且在电镀槽二的下面放一个恒温磁力搅拌器。将步骤二中已经镀铬的金属再进行表面清洗,放置入电解槽二中进行二次电镀,并打开恒温磁力搅拌器,转速保持在400r/min。电镀10min,在镀层的表面再次形成含有纳米颗粒Si3N4的镀铬层。·Step 3: Secondary electroplating, pour the electroplating solution 2 into the electrolytic tank 2, raise the temperature of the electroplating solution 2 to 30°C, and place a constant temperature magnetic stirrer under the electroplating tank 2. Clean the surface of the chrome-plated metal in step 2, place it in the electrolytic tank 2 for secondary electroplating, and turn on the constant temperature magnetic stirrer, and keep the rotating speed at 400r/min. After electroplating for 10 minutes, a chromium plating layer containing nano-particles Si 3 N 4 is formed again on the surface of the plating layer. ·
实施例四:Embodiment four:
具体操作:Specific operation:
按下列配方配置电镀液一与电镀液二:Configure electroplating solution 1 and electroplating solution 2 according to the following formula:
电镀液一:CrCl3.6H2O 110g/L,CHooH 9.6g/L;Plating solution 1: CrCl 3 .6H 2 O 110g/L, CHooH 9.6g/L;
电镀液二:CrCl3.6H2O 110g/L,CHooH 9.6g/L,Si3N4 8g·L-1。Plating solution two: CrCl 3 .6H 2 O 110g/L, CHooH 9.6g/L, Si 3 N 4 8g·L -1 .
按下列操作步骤对304不锈钢金属材料进行电镀:Follow the steps below to electroplate 304 stainless steel metal materials:
步骤一:采用本技术领域常规的技术方法对304不锈钢 (3cm×4cm,厚度为2mm)金属表面进行除油、抛光、水洗、酸洗处理,使金属表面活化。Step 1: Degreasing, polishing, water washing and pickling treatment are carried out on the metal surface of 304 stainless steel (3cm×4cm, thickness 2mm) by adopting conventional technical methods in this technical field, so as to activate the metal surface.
步骤二:将电镀液一倒入电解槽一中,将电解槽一的温度升到 30℃,将步骤一中表面活化的金属放入电解槽一。对电镀槽进行通电开始电镀。电镀5min,在金属表面镀上厚度为20-30um的铬镀层。Step 2: Pour electroplating solution 1 into electrolytic tank 1, raise the temperature of electrolytic tank 1 to 30°C, and put the surface-activated metal in step 1 into electrolytic tank 1. The electroplating tank is energized to start electroplating. After electroplating for 5 minutes, a chromium coating with a thickness of 20-30um is plated on the metal surface.
步骤三:二次电镀,将电镀液二倒入电解槽二中,将电镀液二的温度升到30℃,并且在电镀槽二的下面放一个恒温磁力搅拌器。将步骤二中已经镀铬的金属再进行表面清洗,放置入电解槽二中进行二次电镀,并打开恒温磁力搅拌器,转速保持在600r/min。电镀10min,在镀层的表面再次形成含有纳米颗粒Si3N4的镀铬层。·Step 3: Secondary electroplating, pour the electroplating solution 2 into the electrolytic tank 2, raise the temperature of the electroplating solution 2 to 30°C, and place a constant temperature magnetic stirrer under the electroplating tank 2. Clean the surface of the chrome-plated metal in step 2, place it in the electrolytic tank 2 for secondary electroplating, and turn on the constant temperature magnetic stirrer, and keep the rotating speed at 600r/min. After electroplating for 10 minutes, a chromium plating layer containing nano-particles Si 3 N 4 is formed again on the surface of the plating layer. ·
对比例:Comparative example:
除了镀液中不含氮化硅外,其他条件均与实施例二相同。Except that silicon nitride is not contained in the plating solution, other conditions are the same as in Example 2.
结果分析:Result analysis:
镀层耐腐蚀性测试:Coating corrosion resistance test:
采用维氏硬度计(负荷为100kg),其锥面夹角为136°金刚石四方角锥体压力,注意要保证压头压人深度应小于表面厚度的十分之一,保持15s测定镀层硬度。测试时取上下左右及中间五个点的压痕硬度值,再取平均值。Use a Vickers hardness tester (with a load of 100kg), the angle of the cone surface is 136° to press the diamond square pyramid, pay attention to ensure that the depth of the indenter should be less than one-tenth of the surface thickness, and keep it for 15s to measure the hardness of the coating. During the test, take the indentation hardness values of the top, bottom, left, right and middle points, and then take the average value.
镀层耐腐蚀性测试:Coating corrosion resistance test:
采用全浸泡失重试验方法,把复合镀层试样品分别侵入20%的 NaOH溶液和3.5%的NaCl溶液中,侵蚀试验持续时间分别为240h 和340h,同时保持腐蚀介质温度为30℃,然后对其腐蚀后的失重进行测量,求得腐蚀速率。腐蚀前后样品均经过去离子水冲洗,乙醇超声清洗、真空干燥、称重四个步骤。腐蚀速率按照以下公式计算:腐蚀速率=(腐蚀前质量-腐蚀后质量)/(腐蚀时间×腐蚀表面积)。Using the full immersion weight loss test method, the composite coating samples were respectively immersed in 20% NaOH solution and 3.5% NaCl solution, and the duration of the erosion test was 240h and 340h respectively, while maintaining the temperature of the corrosion medium at 30°C, and then The weight loss after corrosion was measured to obtain the corrosion rate. The samples before and after corrosion were rinsed with deionized water, ultrasonically cleaned with ethanol, vacuum dried, and weighed. The corrosion rate is calculated according to the following formula: corrosion rate=(mass before corrosion-mass after corrosion)/(corrosion time×corrosion surface area).
耐磨性测试:Wear resistance test:
摩擦磨损试验在SRV型磨损试验机上进行,对磨试样是直径 10nm的含铬钢的淬火钢球,洛氏硬度为58-60,钢球表面粗糙度小于0.4um;试验在室温大气环境、无润滑、无磨料条件下进行,淬火钢球在镀铬表面往复滑动,冲程为2mm,频率为30Hz,负荷为60N。The friction and wear test is carried out on the SRV wear testing machine. The grinding sample is a quenched steel ball of chromium-containing steel with a diameter of 10nm. The Rockwell hardness is 58-60, and the surface roughness of the steel ball is less than 0.4um. Under the condition of no lubrication and no abrasive, the quenched steel ball slides back and forth on the chrome-plated surface, the stroke is 2mm, the frequency is 30Hz, and the load is 60N.
镀层厚度测试:Coating Thickness Test:
采用称重法。具体为,将镀件经过打磨,除油、水洗、干燥等过程后称取质量,然后再进行电镀,电镀完后再称取质量,根据以下公式计算厚度:镀层的平均厚度=(镀件电镀后的质量-镀件电镀前的质量)/(镀层所覆盖部分的表面积×镀层金属的密度),表面积的单位为cm2,质量单位为g,镀金属的密度单位为g/ml。Using the weighing method. Specifically, after polishing, degreasing, washing, drying and other processes, the plated parts are weighed, and then electroplated. The mass after - the mass of the plated piece before electroplating)/(the surface area of the part covered by the plating layer × the density of the plated metal), the unit of the surface area is cm 2 , the unit of mass is g, and the unit of the density of the plated metal is g/ml.
实施例一、二以及对比例镀层性能的测试结果如下:Embodiment one, two and the test result of comparative example coating performance are as follows:
由上表可以看出,实施例一,二的镀层厚度和维氏硬度明显高于对比例,其30min磨损量和腐蚀速率明显优于对比例。这说明纳米颗粒氮化硅明显提高了镀层的硬度,耐磨性和耐腐蚀性。As can be seen from the above table, the coating thickness and Vickers hardness of the first and second embodiments are obviously higher than those of the comparative example, and the wear amount and corrosion rate in 30 minutes are obviously better than those of the comparative example. This shows that nano-particle silicon nitride significantly improves the hardness, wear resistance and corrosion resistance of the coating.
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