CN108015661A - A kind of polishing plate clamp for being integrated with temperature control device - Google Patents
A kind of polishing plate clamp for being integrated with temperature control device Download PDFInfo
- Publication number
- CN108015661A CN108015661A CN201711352377.3A CN201711352377A CN108015661A CN 108015661 A CN108015661 A CN 108015661A CN 201711352377 A CN201711352377 A CN 201711352377A CN 108015661 A CN108015661 A CN 108015661A
- Authority
- CN
- China
- Prior art keywords
- polishing
- workpiece
- plate clamp
- control device
- polishing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 65
- 238000010438 heat treatment Methods 0.000 claims abstract description 15
- 238000001179 sorption measurement Methods 0.000 claims description 14
- 238000007789 sealing Methods 0.000 claims description 7
- 238000004026 adhesive bonding Methods 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 13
- 238000001514 detection method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
本发明公开了一种集成有温控装置的抛光盘夹具，包括抛光盘夹具和底座，所述抛光盘夹具中心设有沉头座，所述沉头座底面布置四条同心环槽，每条同心环槽内均设置有与对应同心环槽大小一致且深度相同的加热片；相邻的同心环槽之间的沉头座底面上还设置有多个沿周向分布的小螺纹孔，每个小螺纹孔内安装有尺寸与小螺纹孔的尺寸一致的温度传感器。本发明可以在抛光被加工的工件的过程中实时检测被加工件表面的温度，不需要暂停加工过程；可以在抛光被加工工件的过程中实时对被加工件表面进行加热，不需要暂停加工过程；通过检测温度和局部加热工件，能够使工件加工过程中局部温度得到控制，从而使得被加工件的表面尺寸精度和形状精度得到保证。
The invention discloses a polishing disc fixture integrated with a temperature control device, comprising a polishing disc fixture and a base, a countersunk seat is arranged in the center of the polishing disc fixture, and four concentric ring grooves are arranged on the bottom surface of the countersunk seat, each of which is concentric The ring grooves are equipped with heating fins with the same size and depth as the corresponding concentric ring grooves; the bottom surface of the countersunk seat between adjacent concentric ring grooves is also provided with a plurality of small threaded holes distributed along the circumferential direction, each A temperature sensor whose size is consistent with the size of the small threaded hole is installed in the small threaded hole. The present invention can detect the temperature of the surface of the processed workpiece in real time during the process of polishing the processed workpiece without suspending the processing process; can heat the surface of the processed workpiece in real time during the process of polishing the processed workpiece without suspending the processing process ; By detecting the temperature and locally heating the workpiece, the local temperature can be controlled during the processing of the workpiece, so that the surface dimension accuracy and shape accuracy of the workpiece can be guaranteed.
Description
技术领域technical field
本发明涉及工件表面温控装置领域，更具体的说，尤其涉及一种集成有温控装置的抛光盘The present invention relates to the field of workpiece surface temperature control devices, more specifically, to a polishing disc integrated with a temperature control device
背景技术Background technique
气-液-固三相磨粒流抛光作为磨削的特殊形式，应用于脆硬材料表面的处理中，以提高脆硬材料表面平面度，去除研磨加工留下的损伤和划痕，以获得较好的表面形状要求。气-液-固三相磨粒流抛光温度是加工时由磨削热和磨粒、气泡和液体对流换热所引起的工件温升的一个总称，抛光中温度的控制极其重要，温度分布对流体中能量分布和工件的加工质量影响较大。工件表面的温度分布参数跟被加工工件的尺寸精度和形状精度有紧密的联系。在对单晶硅薄片进行加工时，由于磨粒流与工件接触的不均匀性，导致被加工工件表面温度不一致，被加工工件表面的温度变化导致工件热胀冷缩，影响被加工工件表面尺寸精度和形状精度，从而很容易导致被加工工件不合格，大大增加了加工成本，因此若需要控制被加工工件表面尺寸精度和形状精度趋于一致，就必须要对正在加工过程中的工件表面温度进行检测，然后根据被检测的温度进行加热处理，使工件表面的温度趋于一致，这样加工出来的工件表面尺寸精度和形状精度会大大提高，工件加工质量较高。所以设计出一种集成有温控装置的抛光盘夹具对单晶硅片等光学元件的加工具有重大意义。As a special form of grinding, gas-liquid-solid three-phase abrasive flow polishing is applied to the surface treatment of brittle and hard materials to improve the surface flatness of brittle and hard materials and remove the damage and scratches left by the grinding process to obtain Better surface shape requirements. Gas-liquid-solid three-phase abrasive flow polishing temperature is a general term for the temperature rise of the workpiece caused by grinding heat and convective heat transfer between abrasive particles, bubbles and liquid during processing. The temperature control in polishing is extremely important. The energy distribution in the fluid and the processing quality of the workpiece have a great influence. The temperature distribution parameters on the workpiece surface are closely related to the dimensional accuracy and shape accuracy of the processed workpiece. When processing monocrystalline silicon wafers, due to the inhomogeneity of the contact between the abrasive particle flow and the workpiece, the surface temperature of the processed workpiece is inconsistent, and the temperature change on the surface of the processed workpiece causes thermal expansion and contraction of the workpiece, which affects the surface size of the processed workpiece. Therefore, if it is necessary to control the surface dimensional accuracy and shape accuracy of the processed workpiece to be consistent, it is necessary to control the surface temperature of the workpiece being processed. Carry out detection, and then carry out heating treatment according to the detected temperature, so that the temperature of the workpiece surface tends to be consistent, so that the dimensional accuracy and shape accuracy of the processed workpiece surface will be greatly improved, and the processing quality of the workpiece will be higher. Therefore, it is of great significance to design a polishing disc fixture integrated with a temperature control device for the processing of optical components such as single crystal silicon wafers.
发明内容Contents of the invention
本发明的目的在于解决上述现有技术中的缺陷，提出一种集成有温控装置的抛光盘夹具，能够使工件在被加工的过程中能够保持表面温度的一致，进而保证被加工工件表面尺寸精度和形状精度相同。The purpose of the present invention is to solve the defects in the above-mentioned prior art, and propose a polishing disc fixture integrated with a temperature control device, which can keep the surface temperature of the workpiece consistent during the process of being processed, thereby ensuring the surface size of the processed workpiece Precision is the same as shape precision.
本发明通过以下技术方案来实现上述目的：一种集成有温控装置的抛光盘夹具，包括抛光盘夹具和底座，所述抛光盘夹具中心设有沉头座，沉头座的直径略大于工件的直径，沉头座的深度略小于工件的厚度，需要被加工的工件直接放置在抛光盘夹具中心的沉头座上；所述抛光盘夹具沿着周向开设有多个沉头孔，对应的底座上开设有对应数量的螺纹孔，抛光盘夹具和底座通过穿过沉头孔和螺纹孔的螺钉固定连接；所述沉头座的底面上还设置有多个吸附孔，抛光盘夹具和底座设置有与吸附孔相连通的真空腔，所述真空腔通过设置在底座上的排气孔连接外置真空发生装置；还包括加热片和温度传感器，所述沉头座底面布置四条同心环槽，每条同心环槽内均设置有与对应同心环槽大小一致且深度相同的加热片；相邻的同心环槽之间的沉头座底面上还设置有多个沿周向分布的小螺纹孔，每个小螺纹孔内安装有尺寸与小螺纹孔的尺寸一致的温度传感器。The present invention achieves the above object through the following technical solutions: a polishing disc fixture integrated with a temperature control device, including a polishing disc fixture and a base, a countersunk seat is arranged in the center of the polishing disc fixture, and the diameter of the countersunk seat is slightly larger than the workpiece The diameter of the countersunk seat is slightly smaller than the thickness of the workpiece. The workpiece to be processed is directly placed on the countersunk seat in the center of the polishing disc fixture; the polishing disc fixture is provided with a plurality of countersunk holes along the circumference, corresponding to There are a corresponding number of threaded holes on the base, and the polishing disc fixture and the base are fixedly connected by screws passing through the countersunk holes and the threaded holes; the bottom surface of the countersunk seat is also provided with a plurality of adsorption holes, and the polishing disc fixture and the base are fixedly connected. The base is provided with a vacuum chamber connected to the adsorption hole, and the vacuum chamber is connected to an external vacuum generating device through an exhaust hole arranged on the base; it also includes a heating plate and a temperature sensor, and four concentric rings are arranged on the bottom surface of the countersunk seat. Each of the concentric ring grooves is provided with a heating plate of the same size and depth as the corresponding concentric ring groove; the bottom surface of the countersunk seat between adjacent concentric ring grooves is also provided with a plurality of small circumferentially distributed Threaded holes, a temperature sensor with the same size as the small threaded hole is installed in each small threaded hole.
进一步的，所述加热片通过胶粘或者螺钉连接的方式安装在抛光盘夹具的四条同心环槽内。Further, the heating sheet is installed in four concentric ring grooves of the polishing disk fixture by means of gluing or screwing.
进一步的，所述抛光盘夹具底部设置有凹槽且在其凹槽内设置有环形的凸台，所述底座上设置有凹槽，抛光盘夹具底部的凸台与底座上凹槽过渡配合。Further, the bottom of the polishing disc fixture is provided with a groove and an annular boss is arranged in the groove, the base is provided with a groove, and the boss at the bottom of the polishing disc fixture transitionally fits with the groove on the base.
进一步的，所述抛光盘夹具和底座通过密封圈密封。Further, the polishing disk fixture and the base are sealed by a sealing ring.
进一步的，密封圈安装在抛光盘夹具底部的凹槽内。Further, the sealing ring is installed in the groove at the bottom of the polishing disk fixture.
进一步的，每相邻的同心环槽之间均设置有六个小螺纹孔，且每个小螺纹孔内的温度传感器均通过螺钉固定在小螺纹孔内。Further, six small threaded holes are arranged between every adjacent concentric ring groove, and the temperature sensor in each small threaded hole is fixed in the small threaded hole by screws.
进一步的，相邻两条同心环槽之间的间距均相等。Further, the distances between two adjacent concentric ring grooves are equal.
进一步的，所述吸附孔的直径为1mm，所述吸附孔均匀布满在整个沉头座的底面除了四条同心环槽和所有的小螺纹孔以外的位置。Further, the diameter of the adsorption holes is 1mm, and the adsorption holes are evenly distributed on the bottom surface of the entire countersunk seat except for the four concentric ring grooves and all the small threaded holes.
本发明的有益效果在于：The beneficial effects of the present invention are:
1、本发明可以在抛光被加工的工件的过程中实时检测被加工件表面的温度，不需要暂停加工过程。1. The present invention can detect the temperature of the surface of the processed workpiece in real time during the process of polishing the workpiece without suspending the processing process.
2、本发明可以在抛光被加工工件的过程中实时对被加工件表面进行加热，不需要暂停加工过程。2. The present invention can heat the surface of the workpiece in real time during the process of polishing the workpiece without suspending the processing process.
3、本发明通过检测温度和局部加热工件，能够使工件加工过程中局部温度得到控制，从而使得被加工件的表面尺寸精度和形状精度得到保证。3. The present invention can control the local temperature during the processing of the workpiece by detecting the temperature and locally heating the workpiece, so that the surface dimension accuracy and shape accuracy of the processed workpiece can be guaranteed.
4、本发明可以自动实现工件表面温度检测功能，基于反馈原理实现工件的自动加4. The present invention can automatically realize the detection function of the surface temperature of the workpiece, and realize the automatic processing of the workpiece based on the feedback principle. 热功能，减少人工操作。Heat function, reduce manual operation.
5、本发明的温控装置集成在抛光盘夹具表面，总体结构较简单，制造方便，易于操作。5. The temperature control device of the present invention is integrated on the surface of the polishing disc fixture, the overall structure is relatively simple, convenient to manufacture and easy to operate.
附图说明Description of drawings
图1是本发明一种集成有温控装置的抛光盘夹具轴测图。Fig. 1 is an axonometric view of a polishing disc fixture integrated with a temperature control device according to the present invention.
图2是本发明一种集成有温控装置的抛光盘夹具正视图。Fig. 2 is a front view of a polishing disc fixture integrated with a temperature control device according to the present invention.
图3是本发明一种集成有温控装置的抛光盘夹具剖视图。Fig. 3 is a cross-sectional view of a polishing disc fixture integrated with a temperature control device according to the present invention.
图4是本发明一种集成有温控装置的抛光盘夹具工作原理图。Fig. 4 is a working principle diagram of a polishing disc fixture integrated with a temperature control device according to the present invention.
图中，1-抛光盘夹具，2-沉头孔，3-温度传感器，4-底座，5-加热片，6-吸附孔，7-螺钉，8-密封圈，9-工件，10-排气孔，11-真空腔。In the figure, 1-polishing disk fixture, 2-counterbores, 3-temperature sensor, 4-base, 5-heating sheet, 6-adsorption hole, 7-screw, 8-sealing ring, 9-workpiece, 10-row Air hole, 11-vacuum cavity.
具体实施方式Detailed ways
下面结合附图对本发明作进一步说明：The present invention will be further described below in conjunction with accompanying drawing:
如图1～3所示：一种集成有温控装置的抛光盘夹具，包括抛光盘夹具1和底座4，抛光盘夹具1和底座4均呈现为圆盘状且二者的直径相同。所述抛光盘夹具1中心设有沉头座，沉头座的直径略大于工件9的直径，沉头座的深度略小于工件9的厚度，需要被加工的工件9直接放置在抛光盘夹具1中心的沉头座上；所述沉头座的底面上还设置有多个吸附孔6，所述吸附孔6的直径为1mm，所述吸附孔6均匀布满在整个沉头座的底面除了四条同心环槽和所有的小螺纹孔以外的位置；抛光盘夹具1和底座4设置有与吸附孔6相连通的真空腔11，所述真空腔11通过设置在底座4上的排气孔10连接外置真空发生装置，外置真空发生装置通过排气孔10将真空腔11内吸真空，并通过吸附孔6牢牢的将放置在沉头座上的工件吸附在抛光盘夹具1上。As shown in Figures 1-3: a polishing disc fixture integrated with a temperature control device, including a polishing disc fixture 1 and a base 4, both of which are disc-shaped and have the same diameter. The center of the polishing disc fixture 1 is provided with a countersunk seat, the diameter of the countersunk seat is slightly larger than the diameter of the workpiece 9, the depth of the countersunk seat is slightly smaller than the thickness of the workpiece 9, and the workpiece 9 to be processed is directly placed on the polishing disc fixture 1 On the countersunk seat in the center; the bottom surface of the countersunk seat is also provided with a plurality of adsorption holes 6, the diameter of the adsorption holes 6 is 1mm, and the adsorption holes 6 are uniformly covered on the bottom surface of the entire countersunk seat except Positions other than four concentric ring grooves and all small threaded holes; the polishing disc fixture 1 and the base 4 are provided with a vacuum chamber 11 communicated with the adsorption hole 6, and the vacuum chamber 11 passes through the exhaust hole 10 arranged on the base 4 Connect the external vacuum generating device, the external vacuum generating device will vacuum the vacuum chamber 11 through the exhaust hole 10, and firmly adsorb the workpiece placed on the countersunk seat on the polishing disc fixture 1 through the adsorption hole 6.
所述抛光盘夹具1沿着周向开设有6个沉头孔2，对应的底座4上开设有对应数量的螺纹孔，抛光盘夹具1和底座4通过穿过沉头孔2和螺纹孔的螺钉7固定连接。The polishing disc fixture 1 is provided with six countersunk holes 2 along the circumference, and the corresponding base 4 is provided with a corresponding number of threaded holes, and the polishing disc fixture 1 and the base 4 pass through the countersunk holes 2 and the threaded holes Screw 7 is fixedly connected.
所述沉头座底面布置四条同心环槽，相邻两条同心环槽之间的间距均相等；每条同心环槽内均设置有与对应同心环槽大小一致且深度相同的加热片5；所述加热片5通过胶粘或者螺钉7连接的方式安装在抛光盘夹具1的四条同心环槽内。Four concentric ring grooves are arranged on the bottom surface of the countersunk seat, and the distance between two adjacent concentric ring grooves is equal; each concentric ring groove is provided with a heating plate 5 with the same size and the same depth as the corresponding concentric ring groove; The heating plate 5 is installed in the four concentric ring grooves of the polishing disc fixture 1 by gluing or screwing 7 .
相邻的同心环槽之间的沉头座底面上还设置有多个沿周向分布的小螺纹孔，每个小螺纹孔内安装有尺寸与小螺纹孔的尺寸一致的温度传感器3。每相邻的同心环槽之间均设置有六个小螺纹孔，且每个小螺纹孔内的温度传感器3均通过螺钉7固定在小螺纹孔内。A plurality of small threaded holes distributed along the circumferential direction are also provided on the bottom surface of the countersunk seat between adjacent concentric ring grooves, and a temperature sensor 3 having the same size as the small threaded hole is installed in each small threaded hole. Six small threaded holes are arranged between every adjacent concentric ring groove, and the temperature sensor 3 in each small threaded hole is fixed in the small threaded hole by a screw 7 .
所述抛光盘夹具1底部设置有凹槽且在其凹槽内设置有环形的凸台，所述底座4上设置有凹槽，抛光盘夹具1底部的凸台与底座4上凹槽过渡配合。所述抛光盘夹具1和底座4通过密封圈8密封。密封圈8安装在抛光盘夹具1底部的凹槽内。The bottom of the polishing disc fixture 1 is provided with a groove and an annular boss is arranged in the groove, the base 4 is provided with a groove, and the boss at the bottom of the polishing disc fixture 1 is transitionally fitted with the groove on the base 4 . The polishing disc holder 1 and the base 4 are sealed by a sealing ring 8 . The sealing ring 8 is installed in the groove at the bottom of the polishing disc holder 1 .
本发明的工作过程如图4所示：启动三相磨粒流抛光加工设备，开始进行抛光加工，随着加工时间的增长，磨粒流对工件做功，使得工件表面的温度升高，多个温度传感器3检测到工件表面的温度变化后，温度传感器3将收集到的温度信号传输至处理器中，处理器分析并总结出工件表面是否存在温差，若工件不存在温差，那么加工继续进行，若工件表面存在温差，那么处理器传输信号给驱动器，驱动器控制加热片5工作，加热片5升高至一定的温度并保温一段时间，直至温度传感器3检测到工件表面不存在温差，控制器停止工作；该工作过程在工件加工过程中循环进行，并使得工件表面温度处于一个动态平衡中。The working process of the present invention is as shown in Figure 4: start the three-phase abrasive flow polishing processing equipment, and start polishing processing. With the increase of processing time, the abrasive flow does work on the workpiece, so that the temperature on the surface of the workpiece rises, and multiple After the temperature sensor 3 detects the temperature change on the surface of the workpiece, the temperature sensor 3 transmits the collected temperature signal to the processor, and the processor analyzes and concludes whether there is a temperature difference on the surface of the workpiece. If there is no temperature difference on the workpiece, the processing continues. If there is a temperature difference on the surface of the workpiece, the processor transmits a signal to the driver, and the driver controls the heating plate 5 to work, and the heating plate 5 rises to a certain temperature and keeps it warm for a period of time until the temperature sensor 3 detects that there is no temperature difference on the surface of the workpiece, and the controller stops. Work; the work process is carried out cyclically during the processing of the workpiece, and makes the surface temperature of the workpiece in a dynamic balance.
上述实施例只是本发明的较佳实施例，并不是对本发明技术方案的限制，只要是不经过创造性劳动即可在上述实施例的基础上实现的技术方案，均应视为落入本发明专利的权利保护范围内。The above-described embodiments are only preferred embodiments of the present invention, and are not limitations to the technical solutions of the present invention. As long as they are technical solutions that can be realized on the basis of the above-mentioned embodiments without creative work, they should be regarded as falling into the scope of the patent of the present invention. within the scope of protection of rights.
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711352377.3A CN108015661A (en) | 2017-12-15 | 2017-12-15 | A kind of polishing plate clamp for being integrated with temperature control device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711352377.3A CN108015661A (en) | 2017-12-15 | 2017-12-15 | A kind of polishing plate clamp for being integrated with temperature control device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108015661A true CN108015661A (en) | 2018-05-11 |
Family
ID=62073922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711352377.3A Pending CN108015661A (en) | 2017-12-15 | 2017-12-15 | A kind of polishing plate clamp for being integrated with temperature control device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108015661A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109822401A (en) * | 2019-03-29 | 2019-05-31 | 湖南科技大学 | Actively controlled shearing action and temperature-induced gradient thickening polishing method |
| CN110814636A (en) * | 2019-11-05 | 2020-02-21 | 昌河飞机工业（集团）有限责任公司 | Lug hole heating equipment |
| CN111843828A (en) * | 2020-08-20 | 2020-10-30 | 浙江水利水电学院 | Fluid polishing workpiece fixing device suitable for silicon wafers of different sizes |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544111B1 (en) * | 1998-01-30 | 2003-04-08 | Ebara Corporation | Polishing apparatus and polishing table therefor |
| JP2007245502A (en) * | 2006-03-15 | 2007-09-27 | Fujinon Corp | Adjustment jig of heat caulking device and adjustment method |
| CN203316868U (en) * | 2013-05-27 | 2013-12-04 | 昆山瑞鸿诚自动化设备科技有限公司 | Hot melting disassembly jig |
| CN103419121A (en) * | 2013-08-09 | 2013-12-04 | 厦门大学 | Magnetic suspension polishing device based on monitorable temperature |
| CN204868752U (en) * | 2015-07-22 | 2015-12-16 | 江西联星显示创新体有限公司 | Disassemble tool of flexible circuit board |
| CN105290763A (en) * | 2015-11-19 | 2016-02-03 | 深圳市亿通科技有限公司 | Mobile terminal screen detaching device and detaching method thereof |
| CN105834900A (en) * | 2016-04-28 | 2016-08-10 | 浙江工业大学 | Automatic adjustment device for vacuum clamp for polishing workpieces |
| CN106062933A (en) * | 2014-02-12 | 2016-10-26 | 应用材料公司 | Adjusting eddy current measurements |
| CN207669066U (en) * | 2017-12-15 | 2018-07-31 | 浙江工业大学 | A kind of polishing plate clamp being integrated with reaction type temperature control device |
-
2017
- 2017-12-15 CN CN201711352377.3A patent/CN108015661A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6544111B1 (en) * | 1998-01-30 | 2003-04-08 | Ebara Corporation | Polishing apparatus and polishing table therefor |
| JP2007245502A (en) * | 2006-03-15 | 2007-09-27 | Fujinon Corp | Adjustment jig of heat caulking device and adjustment method |
| CN203316868U (en) * | 2013-05-27 | 2013-12-04 | 昆山瑞鸿诚自动化设备科技有限公司 | Hot melting disassembly jig |
| CN103419121A (en) * | 2013-08-09 | 2013-12-04 | 厦门大学 | Magnetic suspension polishing device based on monitorable temperature |
| CN106062933A (en) * | 2014-02-12 | 2016-10-26 | 应用材料公司 | Adjusting eddy current measurements |
| CN204868752U (en) * | 2015-07-22 | 2015-12-16 | 江西联星显示创新体有限公司 | Disassemble tool of flexible circuit board |
| CN105290763A (en) * | 2015-11-19 | 2016-02-03 | 深圳市亿通科技有限公司 | Mobile terminal screen detaching device and detaching method thereof |
| CN105834900A (en) * | 2016-04-28 | 2016-08-10 | 浙江工业大学 | Automatic adjustment device for vacuum clamp for polishing workpieces |
| CN207669066U (en) * | 2017-12-15 | 2018-07-31 | 浙江工业大学 | A kind of polishing plate clamp being integrated with reaction type temperature control device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109822401A (en) * | 2019-03-29 | 2019-05-31 | 湖南科技大学 | Actively controlled shearing action and temperature-induced gradient thickening polishing method |
| CN109822401B (en) * | 2019-03-29 | 2024-09-10 | 湖南科技大学 | Active control shearing action and temperature induction gradient thickening polishing method |
| CN110814636A (en) * | 2019-11-05 | 2020-02-21 | 昌河飞机工业（集团）有限责任公司 | Lug hole heating equipment |
| CN111843828A (en) * | 2020-08-20 | 2020-10-30 | 浙江水利水电学院 | Fluid polishing workpiece fixing device suitable for silicon wafers of different sizes |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108015661A (en) | A kind of polishing plate clamp for being integrated with temperature control device | |
| KR20170105563A (en) | Support assembly for substrate back fading control | |
| CN104451588B (en) | Large Aperture Lenses coating clamp rotating disk | |
| CN104772657B (en) | A kind of cutting temperature supervising device of Flank machining and method | |
| CN205852447U (en) | Tooling for grinding and polishing of optical components | |
| TWI567857B (en) | Heater apparatus for substrate processing and liquid processing apparatus for substrate comprising the same | |
| CN103273346B (en) | Soft thin-walled revolution workpiece coating machine parts'precise clamping device | |
| CN103341818A (en) | Vacuum adsorption clamp used for aspheric surface machining | |
| EP3871835A1 (en) | Methods and equipment for surface scratch repair | |
| CN207669066U (en) | A kind of polishing plate clamp being integrated with reaction type temperature control device | |
| JP2017069429A (en) | High accuracy wafer processing device | |
| CN201126816Y (en) | Porous Ceramic Stage | |
| CN102172868B (en) | Air floating big-calibre plane optical element polishing clamp | |
| CN118219147B (en) | Polishing bearing table and polishing method | |
| CN211220218U (en) | A double-sided polishing device | |
| CN103480871B (en) | Adjustable for height ultrasonic turning tool clamping device | |
| CN110666722B (en) | A flexible quick-adjustable self-centering fixture and centering method suitable for energetic rotating parts | |
| CN210938923U (en) | Flexible quick-adjustment self-centering suction tool suitable for energy-containing rotary part | |
| KR20160042689A (en) | Temperature measuring apparatus for substrate processing and liquid processing apparatus for substrate comprising the same | |
| CN104347459B (en) | A kind of cover plate, bogey and plasma processing device | |
| JP2014065088A (en) | Polishing device | |
| TWI818573B (en) | Double-sided workpiece polishing method and double-sided workpiece polishing equipment | |
| CN206185640U (en) | A mechanism for optical flat burnishing machine cooling system | |
| KR101829039B1 (en) | Vacuum Chuck | |
| CN102166728B (en) | Magnetic suspension-type polishing tool plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180511 |