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CN107683045B - Housing manufacturing method, housing and electronic device - Google Patents

Housing manufacturing method, housing and electronic device Download PDF

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Publication number
CN107683045B
CN107683045B CN201711036404.6A CN201711036404A CN107683045B CN 107683045 B CN107683045 B CN 107683045B CN 201711036404 A CN201711036404 A CN 201711036404A CN 107683045 B CN107683045 B CN 107683045B
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Prior art keywords
self
cleaning particles
protective layer
housing
substrate
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CN107683045A (en
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杨光明
张涛
孙文峰
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Guangdong Oppo Mobile Telecommunications Corp Ltd
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Guangdong Oppo Mobile Telecommunications Corp Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00Casings, cabinets or drawers for electric apparatus
    • H05K5/02Details
    • H05K5/0217Mechanical details of casings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C03C17/009Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5072Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with oxides or hydroxides not covered by C04B41/5025
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/85Coating or impregnation with inorganic materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Casings For Electric Apparatus (AREA)

Abstract

本申请实施例公开了一种壳体制作方法、壳体及电子设备,通过在基材朝向电子设备外侧的表面上形成保护层,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应,将有机物分解为二氧化碳和水,也即将附着于壳体表面的指纹中的油脂降解,从而达到自动消除指纹的目的。

Figure 201711036404

The embodiments of the present application disclose a method for manufacturing a casing, a casing and an electronic device. By forming a protective layer on the surface of a substrate facing the outside of the electronic device, the protective layer includes self-cleaning particles, and the self-cleaning particles are exposed On the surface of the protective layer, when the self-cleaning particles receive light irradiation, a photocatalytic reaction occurs, and the organic matter is decomposed into carbon dioxide and water, which is about to degrade the grease in the fingerprints attached to the surface of the shell, so as to achieve automatic elimination. Purpose of fingerprints.

Figure 201711036404

Description

壳体制作方法、壳体及电子设备Housing manufacturing method, housing and electronic device

技术领域technical field

本申请涉及电子设备技术领域,具体涉及一种壳体制作方法、壳体及电子设备。The present application relates to the technical field of electronic devices, and in particular, to a method for manufacturing a casing, a casing and an electronic device.

背景技术Background technique

目前,电子设备,譬如手机、平板电脑的壳体外表面容易粘指纹印。At present, the outer surfaces of the casings of electronic devices, such as mobile phones and tablet computers, are prone to stick fingerprints.

发明内容SUMMARY OF THE INVENTION

本申请实施例提供一种壳体制作方法、壳体及电子设备,可以自动清洁壳体外表面的指纹印。Embodiments of the present application provide a method for manufacturing a casing, a casing and an electronic device, which can automatically clean fingerprints on the outer surface of the casing.

本申请实施例提供一种壳体制作方法,所述壳体应用于电子设备,所述壳体制作方法包括:An embodiment of the present application provides a method for manufacturing a casing, where the casing is applied to an electronic device, and the method for manufacturing the casing includes:

提供一基材,所述基材包括第一表面和第二表面,所述第一表面朝向电子设备内侧,第二表面朝向电子设备外侧;以及A substrate is provided, the substrate includes a first surface and a second surface, the first surface faces the inside of the electronic device, and the second surface faces the outside of the electronic device; and

在所述基材的第二表面设置保护层,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应降解有机物。A protective layer is provided on the second surface of the substrate, the protective layer includes self-cleaning particles, the self-cleaning particles are exposed on the surface of the protective layer, and the self-cleaning particles generate light when irradiated by light. Catalytic reactions degrade organic matter.

本申请实施例还提供一种壳体,应用于电子设备,所述壳体包括一基材和一保护层,所述基材包括第一表面和第二表面,所述第一表面朝向电子设备内侧,第二表面朝向电子设备外侧,所述保护层设置于所述基材的第二表面,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应降解有机物。An embodiment of the present application further provides a casing, which is applied to an electronic device. The casing includes a substrate and a protective layer, the substrate includes a first surface and a second surface, and the first surface faces the electronic device. Inside, the second surface faces the outside of the electronic device, the protective layer is disposed on the second surface of the substrate, the protective layer includes self-cleaning particles, and the self-cleaning particles are exposed on the surface of the protective layer, so When the self-cleaning particles receive light irradiation, a photocatalytic reaction occurs to degrade organic matter.

本申请实施例还提供了一种电子设备,包括壳体,所述壳体包括一基材和一保护层,所述基材包括第一表面和第二表面,所述第一表面朝向电子设备内侧,第二表面朝向电子设备外侧,所述保护层设置于所述基材的第二表面,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应降解有机物。An embodiment of the present application further provides an electronic device, including a casing, the casing includes a substrate and a protective layer, the substrate includes a first surface and a second surface, and the first surface faces the electronic device Inside, the second surface faces the outside of the electronic device, the protective layer is disposed on the second surface of the substrate, the protective layer includes self-cleaning particles, and the self-cleaning particles are exposed on the surface of the protective layer, so When the self-cleaning particles receive light irradiation, a photocatalytic reaction occurs to degrade organic matter.

本申请实施例提供的壳体制作方法,通过在基材朝向电子设备外侧的表面上形成保护层,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应,将有机物分解为二氧化碳和水,也即将附着于壳体表面的指纹中的油脂降解,从而达到自动消除指纹的目的。In the case manufacturing method provided by the embodiments of the present application, a protective layer is formed on the surface of the substrate facing the outside of the electronic device, the protective layer includes self-cleaning particles, and the self-cleaning particles are exposed on the surface of the protective layer, When the self-cleaning particles are irradiated with light, a photocatalytic reaction occurs, and the organic matter is decomposed into carbon dioxide and water, that is, the grease in the fingerprints attached to the surface of the shell is degraded, so as to achieve the purpose of automatically eliminating fingerprints.

附图说明Description of drawings

为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions in the embodiments of the present application more clearly, the following briefly introduces the drawings that are used in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, other drawings can also be obtained from these drawings without creative effort.

图1为本申请实施例提供的电子设备的结构示意图。FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application.

图2为本申请实施例提供的壳体的结构示意图。FIG. 2 is a schematic structural diagram of a casing provided by an embodiment of the present application.

图3为本申请实施例提供的后盖的结构示意图。FIG. 3 is a schematic structural diagram of a back cover provided by an embodiment of the present application.

图4为图3在A-A方向的第一种实施方式的剖面图。FIG. 4 is a cross-sectional view of the first embodiment in the direction A-A of FIG. 3 .

图5为图3在A-A方向的第二种实施方式的剖面图。FIG. 5 is a cross-sectional view of the second embodiment in the direction A-A of FIG. 3 .

图6为图3在A-A方向的第三种实施方式的剖面图。FIG. 6 is a cross-sectional view of the third embodiment in the direction A-A of FIG. 3 .

图7为本申请实施例提供的壳体的另一结构示意图。FIG. 7 is another schematic structural diagram of the casing provided by the embodiment of the present application.

图8为本申请实施例提供的后盖的另一结构示意图。FIG. 8 is another schematic structural diagram of the back cover provided by the embodiment of the present application.

图9为本申请实施例提供的电子设备的另一结构示意图。FIG. 9 is another schematic structural diagram of an electronic device provided by an embodiment of the present application.

图10为本申请实施例提供的后盖制作方法的第一种流程示意图。FIG. 10 is a first schematic flow chart of a method for manufacturing a back cover provided by an embodiment of the present application.

图11为本申请实施例提供的后盖制作方法的第二种流程示意图。FIG. 11 is a schematic flow chart of the second type of the method for manufacturing a back cover provided by an embodiment of the present application.

图12为本申请实施例提供的后盖制作方法的第三种流程示意图。FIG. 12 is a third schematic flowchart of the method for manufacturing a back cover provided by an embodiment of the present application.

具体实施方式Detailed ways

下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

在本申请的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc., or The positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, Therefore, it should not be construed as a limitation on this application. In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined as "first", "second" may expressly or implicitly include one or more of said features. In the description of the present application, "plurality" means two or more, unless otherwise expressly and specifically defined.

在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific situations.

在本申请中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In this application, unless otherwise expressly specified and defined, a first feature "on" or "under" a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them. Also, the first feature being "above", "over" and "above" the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature. The first feature is "below", "below" and "below" the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.

下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本申请。此外,本申请可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本申请提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for implementing different structures of the present application. To simplify the disclosure of the present application, the components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the application. Furthermore, this application may repeat reference numerals and/or reference letters in different instances for the purpose of simplicity and clarity, and does not in itself indicate a relationship between the various embodiments and/or arrangements discussed. In addition, this application provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the application of other processes and/or the use of other materials.

本申请实施例提供了一种壳体制作方法、壳体及电子设备。以下将分别进行详细说明。Embodiments of the present application provide a method for manufacturing a casing, a casing, and an electronic device. The detailed descriptions will be given below.

在本实施例中,将从后盖制作方法的角度进行描述,所述壳体制作方法可以形成壳体,所述壳体可以设置在电子设备中,比如手机、平板电脑、掌上电脑(Personal DigitalAssistant,PDA)等。In this embodiment, the description will be made from the perspective of the manufacturing method of the back cover. The manufacturing method of the casing can form a casing, and the casing can be arranged in an electronic device, such as a mobile phone, a tablet computer, a PDA (Personal Digital Assistant , PDA) etc.

请参阅1,图1为本申请实施例提供的电子设备的结构示意图。所述电子设备1包括壳体10、显示屏20、印制电路板30、电池40。Please refer to 1. FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application. The electronic device 1 includes a casing 10 , a display screen 20 , a printed circuit board 30 , and a battery 40 .

请参阅图2,图2为本申请实施例提供的壳体的结构示意图。Please refer to FIG. 2 , which is a schematic structural diagram of a casing provided by an embodiment of the present application.

其中,所述壳体10可以包括盖板11、中框12和后盖13。所述盖板11、所述中框12和所述后盖13相互组合形成所述壳体10。所述壳体10具有通过所述盖板11、所述中框12和所述后盖13形成的一密闭空间,以容纳显示屏20、印制电路板30、电池40等器件。Wherein, the housing 10 may include a cover plate 11 , a middle frame 12 and a rear cover 13 . The cover plate 11 , the middle frame 12 and the rear cover 13 are combined with each other to form the casing 10 . The casing 10 has a closed space formed by the cover plate 11 , the middle frame 12 and the rear cover 13 to accommodate the display screen 20 , the printed circuit board 30 , the battery 40 and other devices.

在一些实施例中,所述盖板11盖设到所述中框12上。所述后盖13盖设到所述中框12上。所述盖板11和后盖13位于所述中框12的相对面。所述盖板11和后盖13相对设置。所述壳体10的密闭空间位于所述盖板11和后盖13之间。In some embodiments, the cover plate 11 is covered on the middle frame 12 . The rear cover 13 is covered on the middle frame 12 . The cover plate 11 and the rear cover 13 are located on opposite sides of the middle frame 12 . The cover plate 11 and the rear cover 13 are disposed opposite to each other. The closed space of the casing 10 is located between the cover plate 11 and the rear cover 13 .

所述盖板11可以为透明玻璃盖板。在一些实施方式中,所述盖板11可以是用诸如蓝宝石等材料制成的玻璃盖板。The cover plate 11 may be a transparent glass cover plate. In some embodiments, the cover plate 11 may be a glass cover plate made of materials such as sapphire.

所述中框12可以为金属壳体,比如铝合金中框12。需要说明的是,本申请实施例中框12的材料并不限于此,还可以采用其它方式,比如:所述中框12可以陶瓷中框、玻璃中框。再比如:所述中框12可以为塑胶中框。还比如:所述中框12可以为金属和塑胶相互配合的结构,可以将塑胶部分和注塑到金属板材上形成。The middle frame 12 may be a metal shell, such as an aluminum alloy middle frame 12 . It should be noted that the material of the frame 12 in the embodiment of the present application is not limited to this, and other methods may also be used, for example, the middle frame 12 may be a ceramic middle frame or a glass middle frame. Another example: the middle frame 12 may be a plastic middle frame. For another example, the middle frame 12 may be a structure in which metal and plastic cooperate with each other, and the plastic part may be formed by injection molding onto a metal plate.

所述后盖13可以金属后盖,比如铝合金后盖,不锈钢后盖。所述后盖13还可以为玻璃后盖或者陶瓷后盖。The back cover 13 may be a metal back cover, such as an aluminum alloy back cover or a stainless steel back cover. The back cover 13 may also be a glass back cover or a ceramic back cover.

请一并参阅图3,图3为本申请实施例提供的后盖的结构示意图。Please also refer to FIG. 3 , which is a schematic structural diagram of a back cover provided by an embodiment of the present application.

所述后盖13可以包括相对设置的内表面131和外表面132。所述后盖13的内表面131靠近中框12及盖板11,构成所述壳体10的内表面的一部分。所述后盖13的外表面132远离中框12及盖板11,构成所述壳体10的外表面的一部分。所述后盖13还可以包括通孔133,所述通孔133可以用于安装摄像头。The back cover 13 may include an inner surface 131 and an outer surface 132 which are disposed opposite to each other. The inner surface 131 of the rear cover 13 is close to the middle frame 12 and the cover plate 11 , and constitutes a part of the inner surface of the casing 10 . The outer surface 132 of the rear cover 13 is away from the middle frame 12 and the cover plate 11 and constitutes a part of the outer surface of the casing 10 . The back cover 13 may further include a through hole 133, and the through hole 133 may be used for installing a camera.

请一并参阅图4,图4为图3在A-A方向的剖面图。Please also refer to FIG. 4 . FIG. 4 is a cross-sectional view of FIG. 3 along the A-A direction.

为便于说明,以下以后盖13为例,对壳体进行说明。For convenience of description, the case is described below by taking the rear cover 13 as an example.

所述后盖13可以包括一基材134和一保护层135。所述保护层135设置于所述后盖13远离盖板11的表面。The back cover 13 may include a substrate 134 and a protective layer 135 . The protective layer 135 is disposed on the surface of the rear cover 13 away from the cover plate 11 .

其中,所述基材134可以采用铝材,比如铝合金,也可以采用不锈钢,还可以采用玻璃、陶瓷等。The base material 134 can be made of aluminum, such as aluminum alloy, stainless steel, glass, ceramics, or the like.

所述基材134包括第一表面1341和第二表面1342。所述第一表面1341朝向电子设备内侧,第二表面1342朝向电子设备外侧。在一种实施例中,所述第一表面1341朝向盖板11和中框12的方向设置。所述第一表面1341可以为后盖13的内表面131。所述第一表面1341为所述壳体11的内表面。所述第二表面1342朝向背离盖板11和中框12的方向设置。所述第二表面1342为所述壳体11的外表面。The substrate 134 includes a first surface 1341 and a second surface 1342 . The first surface 1341 faces the inside of the electronic device, and the second surface 1342 faces the outside of the electronic device. In one embodiment, the first surface 1341 is disposed toward the direction of the cover plate 11 and the middle frame 12 . The first surface 1341 may be the inner surface 131 of the back cover 13 . The first surface 1341 is the inner surface of the casing 11 . The second surface 1342 is disposed in a direction away from the cover plate 11 and the middle frame 12 . The second surface 1342 is the outer surface of the casing 11 .

所述保护层135设置于所述基材134的第二表面1342。所述保护层135中包括自清洁颗粒136,所述自清洁颗粒136暴露于所述保护层135的表面。所述自清洁颗粒136在接收光线照射时,发生光催化反应降解有机物。The protective layer 135 is disposed on the second surface 1342 of the substrate 134 . The protective layer 135 includes self-cleaning particles 136 , and the self-cleaning particles 136 are exposed on the surface of the protective layer 135 . When the self-cleaning particles 136 are irradiated with light, a photocatalytic reaction occurs to degrade organic matter.

所述保护层136可以采用透明油漆。The protective layer 136 can be transparent paint.

在一种实施例中,为了使所述保护层135能够更加牢固地附着于所述基材134的第二表面1342,可以对所述基材134的第二表面1342进行抛光处理,以增加所述基材134的第二表面1342的表面的平整度,从而增加了所述保护层135在所述基材134的第二表面1342的附着力,进而使所述保护层135能够牢固地附着于所述基材134的第二表面1342。In one embodiment, in order to enable the protective layer 135 to be more firmly attached to the second surface 1342 of the substrate 134, the second surface 1342 of the substrate 134 may be polished to increase the The flatness of the surface of the second surface 1342 of the substrate 134 increases, thereby increasing the adhesion of the protective layer 135 on the second surface 1342 of the substrate 134, thereby enabling the protective layer 135 to be firmly attached to the The second surface 1342 of the substrate 134 .

所述自清洁颗粒136可以采用TiO2、SiO2、ZnO、CdS、WO3、Fe2O3等。所述自清洁颗粒136也可以采用金属离子掺杂的TiO2、SiO2、ZnO、CdS、WO3、Fe2O3等。用于掺杂的所述金属离子可以为银离子、铜离子等。The self-cleaning particles 136 can be TiO 2 , SiO 2 , ZnO, CdS, WO 3 , Fe 2 O 3 or the like. The self-cleaning particles 136 can also use metal ion-doped TiO 2 , SiO 2 , ZnO, CdS, WO 3 , Fe 2 O 3 and the like. The metal ions used for doping may be silver ions, copper ions, and the like.

所述自清洁颗粒136可以采用物理气相沉积(PVD)、化学气相沉积(CVD)、溶胶凝胶法或者水热法等方法形成。The self-cleaning particles 136 may be formed by methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD), sol-gel method, or hydrothermal method.

在一种实施例中,当采用化学气相沉积的方法形成所述自清洁颗粒136时,可以采用TiCl4和O2,通过对温度和压力的控制,生成TiO2纳米颗粒,也即形成所述自清洁颗粒136。In one embodiment, when chemical vapor deposition is used to form the self-cleaning particles 136, TiCl 4 and O 2 may be used to generate TiO 2 nanoparticles by controlling temperature and pressure, that is, to form the self-cleaning particles 136 . Self-cleaning particles 136 .

在一种实施例中,当采用溶胶凝胶法形成所述自清洁颗粒136时,可以先制备前驱体溶胶,通过对PH、添加剂和温度等的控制,生成具有一定空间结构的凝胶,在通过对凝胶进行干燥和煅烧,形成纳米颗粒,也即形成所述自清洁颗粒136。In an embodiment, when the self-cleaning particles 136 are formed by a sol-gel method, a precursor sol can be prepared first, and a gel with a certain spatial structure can be generated by controlling pH, additives, and temperature. By drying and calcining the gel, nanoparticles are formed, ie, the self-cleaning particles 136 are formed.

在一种实施例中,可以采用金属醇盐为原料、加入溶剂、水、催化剂等,通过水解和聚合反应得到前驱体溶胶。所述金属醇盐可以采用Ti(OC2H5)4、Ti(OC3H7 i)4、Ti(OC4H9 n)4等。In an embodiment, a metal alkoxide can be used as a raw material, a solvent, water, a catalyst, etc. are added to obtain a precursor sol through hydrolysis and polymerization. The metal alkoxide can be Ti(OC 2 H 5 ) 4 , Ti(OC 3 H 7 i ) 4 , Ti(OC 4 H 9 n ) 4 and the like.

在一种实施例中,当采用水热法形成所述保护层135时,先制备前驱物溶液,通过对温度和压力的控制,生成纳米颗粒,也即形成所述自清洁颗粒136。In one embodiment, when the protective layer 135 is formed by a hydrothermal method, a precursor solution is prepared first, and nanoparticles are formed by controlling the temperature and pressure, that is, the self-cleaning particles 136 are formed.

需要说明的是,请参阅图5-6,在一些实施例中,所述保护层135包括至少两个着色区1351/1352,每个着色区1351/1352的颜色不同,不同颜色的着色区1351/1352采用颜色不同的自清洁颗粒1361/1362。It should be noted that, referring to FIGS. 5-6, in some embodiments, the protective layer 135 includes at least two colored areas 1351/1352, each colored area 1351/1352 has a different color, and the colored areas 1351 of different colors /1352 uses self-cleaning particles 1361/1362 in different colors.

例如,所述保护层135包括第一着色区1351和第二着色区1352。所述第一着色区1351可以采用第一自清洁颗粒1361。所述第一自清洁颗粒1361可以为白色。所述第一自清洁颗粒1361可以采用TiO2、ZnO等。所述第二着色区1352可以采用第二自清洁颗粒1362。所述第二自清洁颗粒1362可以为黄色。所述第二自清洁颗粒1362可以采用CdS、BiVO4等。再例如,所述保护层135还可以包括第三着色区1353。所述第三着色区1353采用第三自清洁颗粒1363。所述第三自清洁颗粒1363可以为红棕色。所述第三自清洁颗粒1363可以采用Fe2O3For example, the protective layer 135 includes a first coloring area 1351 and a second coloring area 1352 . The first coloring area 1351 may use first self-cleaning particles 1361 . The first self-cleaning particles 1361 may be white. The first self-cleaning particles 1361 can be made of TiO 2 , ZnO or the like. The second coloring region 1352 may use second self-cleaning particles 1362 . The second self-cleaning particles 1362 may be yellow. The second self-cleaning particles 1362 can be CdS, BiVO 4 or the like. For another example, the protective layer 135 may further include a third coloring region 1353 . The third coloring area 1353 uses third self-cleaning particles 1363 . The third self-cleaning particles 1363 may be reddish brown. The third self-cleaning particles 1363 may be Fe 2 O 3 .

在一种实施例中,所述保护层135的厚度大于10微米。当所述保护层135的厚度小于10微米时,由于所述保护层135的厚度较小,光透过性高,容易受到基材134自身颜色的干扰,对所述保护层135的自清洁颗粒136自身的颜色的利用率不佳,同时,由于所述保护层135的厚度较小,在抛光过程中容易将保护层135打穿,不利于保护层135的形成。在一种实施方式中,所述保护层135的厚度可以大于100微米。In one embodiment, the thickness of the protective layer 135 is greater than 10 microns. When the thickness of the protective layer 135 is less than 10 microns, because the thickness of the protective layer 135 is small and the light transmittance is high, it is easily interfered by the color of the substrate 134 itself, and the self-cleaning particles of the protective layer 135 are easily disturbed. The utilization rate of the color of the 136 itself is not good, and at the same time, because the thickness of the protective layer 135 is small, the protective layer 135 is easily penetrated during the polishing process, which is not conducive to the formation of the protective layer 135 . In one embodiment, the thickness of the protective layer 135 may be greater than 100 microns.

在一种实施例中,所述自清洁颗粒136的直径小于500纳米,以使得所述自清洁颗粒136具有良好的光催化性,同时,用户在触摸所述壳体时,并不会感受到其表面的自清洁颗粒136。在一种实施例中,所述自清洁颗粒136的直径可以为50纳米-100纳米。当所述自清洁颗粒136的直径小于50nm时,由于所述自清洁颗粒136的直径较小,导致制造成本较高,制造工艺复杂;当所述自清洁颗粒136的直径大于100nm时,由于所述自清洁颗粒136的直径较大,导致所述自清洁颗粒136的光催化性较弱。In one embodiment, the diameter of the self-cleaning particles 136 is less than 500 nanometers, so that the self-cleaning particles 136 have good photocatalytic properties, and at the same time, when the user touches the casing, the user does not feel the Self-cleaning particles 136 on its surface. In one embodiment, the diameter of the self-cleaning particles 136 may be 50 nanometers to 100 nanometers. When the diameter of the self-cleaning particles 136 is less than 50 nm, the manufacturing cost is high and the manufacturing process is complicated due to the small diameter of the self-cleaning particles 136; when the diameter of the self-cleaning particles 136 is greater than 100 nm, due to the The diameter of the self-cleaning particles 136 is relatively large, resulting in weak photocatalytic activity of the self-cleaning particles 136 .

需要说明的是,本申请实施例壳体的结构并不限于此,比如,请参阅图7,图7为本申请实施例提供的壳体的另一结构示意图。It should be noted that the structure of the housing in the embodiment of the present application is not limited to this. For example, please refer to FIG. 7 , which is another schematic structural diagram of the housing provided in the embodiment of the present application.

所述壳体10a包括盖板16和后盖17。在一些实施例中,所述盖板16直接盖设到所述后盖17上。所述盖板16和所述后盖17相互组合形成所述壳体10a。所述壳体10a具有通过所述盖板16和后盖17形成的一密闭空间,以容纳显示屏20、印制电路板30、电池40等器件。The housing 10a includes a cover plate 16 and a rear cover 17 . In some embodiments, the cover plate 16 is directly covered on the rear cover 17 . The cover plate 16 and the rear cover 17 are combined with each other to form the casing 10a. The casing 10a has a closed space formed by the cover plate 16 and the rear cover 17 to accommodate the display screen 20, the printed circuit board 30, the battery 40 and other devices.

相比图2所示的壳体10,图7的所述壳体10a不包括中框,或者说是将图2中的中框12和后盖13一体成型形成一后盖17结构。Compared with the housing 10 shown in FIG. 2 , the housing 10 a in FIG. 7 does not include a middle frame, or in other words, a rear cover 17 is formed by integrally molding the middle frame 12 and the rear cover 13 in FIG. 2 .

具体的,请参阅图8,图8为本申请实施例提供的后盖的另一结构示意图。Specifically, please refer to FIG. 8 , which is another schematic structural diagram of the back cover provided by the embodiment of the present application.

在一些实施例中,后盖17包括内表面171和外表面172,内表面171和外表面172相对设置,形成后盖17的整个表面。所述后盖17的各层结构可以参阅后盖13,在此不再赘述。In some embodiments, the rear cover 17 includes an inner surface 171 and an outer surface 172 , and the inner surface 171 and the outer surface 172 are disposed opposite to each other, forming the entire surface of the rear cover 17 . The structure of each layer of the rear cover 17 can be referred to the rear cover 13 , which will not be repeated here.

所述印制电路板30安装在壳体10中,所述印制电路板30可以为电子设备1的主板,印制电路板30上可以集成有天线、马达、麦克风、摄像头、光线传感器、受话器以及处理器等功能组件。在一些实施例中,所述印制电路板30固定在壳体10内。具体的,所述印制电路板30可以通过螺钉螺接到中框12上,也可以采用卡扣的方式卡配到中框12上。需要说明的是,本申请实施例印制电路板30具体固定到中框12上的方式并不限于此,还可以其它方式,比如通过卡扣和螺钉共同固定的方式。The printed circuit board 30 is installed in the housing 10, the printed circuit board 30 can be the main board of the electronic device 1, and the printed circuit board 30 can be integrated with an antenna, a motor, a microphone, a camera, a light sensor, a receiver and functional components such as processors. In some embodiments, the printed circuit board 30 is fixed within the housing 10 . Specifically, the printed circuit board 30 can be screwed to the middle frame 12 by screws, or can be snapped to the middle frame 12 by means of snaps. It should be noted that, the specific way of fixing the printed circuit board 30 to the middle frame 12 in the embodiment of the present application is not limited to this, and other ways, such as a way of co-fixing by a buckle and a screw, is also possible.

所述电池40安装在壳体10中,电池40与所述印制电路板30进行电连接,以向电子设备1提供电源。壳体10可以作为电池40的电池盖。壳体10覆盖电池40以保护电池40,具体的是后盖13覆盖电池40以保护电池40,减少电池40由于电子设备1的碰撞、跌落等而受到的损坏。The battery 40 is installed in the casing 10 , and the battery 40 is electrically connected to the printed circuit board 30 to provide power to the electronic device 1 . The case 10 may serve as a battery cover for the battery 40 . The casing 10 covers the battery 40 to protect the battery 40 , specifically, the back cover 13 covers the battery 40 to protect the battery 40 , thereby reducing damage to the battery 40 due to collision, drop, etc. of the electronic device 1 .

所述显示屏20安装在壳体10中,同时,所述显示屏20电连接至印制电路板30上,以形成电子设备1的显示面。所述显示屏20包括显示区域14和非显示区域15。所述显示区域14可以用来显示电子设备1的画面或者供用户进行触摸操控等。所述非显示区域15的顶部区域开设供声音、及光线传导的开孔,所述非显示区域15底部上可以设置指纹模组、触控按键等功能组件。其中所述盖板11安装到显示屏20上,以覆盖显示屏20,形成与显示屏20相同的显示区域和非显示区域,具体可以参阅显示屏20的显示区域和非显示区域。The display screen 20 is installed in the housing 10 , and at the same time, the display screen 20 is electrically connected to the printed circuit board 30 to form a display surface of the electronic device 1 . The display screen 20 includes a display area 14 and a non-display area 15 . The display area 14 may be used to display the screen of the electronic device 1 or for the user to perform touch manipulation or the like. The top area of the non-display area 15 is provided with openings for sound and light transmission, and functional components such as fingerprint modules and touch buttons can be arranged on the bottom of the non-display area 15 . The cover plate 11 is installed on the display screen 20 to cover the display screen 20 to form the same display area and non-display area as the display screen 20 . For details, please refer to the display area and non-display area of the display screen 20 .

需要说明的是,所述显示屏20的结构并不限于此。比如,所述显示屏可以为全面屏或异性屏,具体的,请参阅图9,图9为本申请实施例提供的电子设备的另一结构示意图。图9中的电子设备与图1中的电子设备的区别在于:所述非显示区域15a直接形成在显示屏20a上,比如在显示屏20a的非显示区域15a设置成透明结构,以便光信号穿过,或者直接在显示屏20a的非显示区域开设供光线传导的开孔或缺口等结构,可以将前置摄像头、光电感应器等设置于非显示区域位置,以便前置摄像头拍照、光电感应器检测。所述显示区域14a铺满电子设备1a整个表面。需要说明的是,所述电子设备1a中的壳体10、印制电路板30及电池40等器件可以参阅以上内容,在此不再赘述。It should be noted that the structure of the display screen 20 is not limited to this. For example, the display screen may be a full screen or a heterosexual screen. Specifically, please refer to FIG. 9 , which is another schematic structural diagram of an electronic device provided by an embodiment of the present application. The difference between the electronic device in FIG. 9 and the electronic device in FIG. 1 is that the non-display area 15a is directly formed on the display screen 20a, for example, the non-display area 15a of the display screen 20a is set as a transparent structure, so that the light signal can pass through. However, or directly in the non-display area of the display screen 20a to open structures such as openings or gaps for light conduction, the front camera, photoelectric sensor, etc. detection. The display area 14a covers the entire surface of the electronic device 1a. It should be noted that the components such as the casing 10 , the printed circuit board 30 , and the battery 40 in the electronic device 1 a can refer to the above contents, and will not be repeated here.

本发明还提供一种壳体的制作方法。The invention also provides a manufacturing method of the casing.

需要说明的是,以下以后盖为例进行说明,但是本申请实施例壳体制作方法并不限于后盖。It should be noted that the following description takes the back cover as an example, but the manufacturing method of the case in the embodiment of the present application is not limited to the back cover.

请一并参阅图10,图10为本申请实施例提供的后盖制作方法的流程示意图。所述壳体制作方法包括以下步骤:Please also refer to FIG. 10 . FIG. 10 is a schematic flowchart of a method for manufacturing a back cover according to an embodiment of the present application. The shell manufacturing method includes the following steps:

步骤S101,提供一基材134,所述基材134包括第一表面1341和第二表面1342,所述第一表面1341朝向电子设备内侧,第二表面1342朝向电子设备外侧。In step S101, a substrate 134 is provided, the substrate 134 includes a first surface 1341 and a second surface 1342, the first surface 1341 faces the inside of the electronic device, and the second surface 1342 faces the outside of the electronic device.

所述基材134可以为金属材料,比如铝材,进一步的,比如铝合金。需要说明的是,所述基材134可以直接购买得到,也可以对板材加工得到,比如对铝合金板材进行锻压、时效等工艺处理得到。所述基材134还可以采用玻璃、陶瓷等。The base material 134 may be a metal material, such as aluminum material, and further, such as aluminum alloy. It should be noted that the base material 134 can be directly purchased, or can be obtained by processing a plate, such as an aluminum alloy plate by forging, aging and other processes. The substrate 134 can also be made of glass, ceramics, or the like.

所述第一表面1341朝向盖板11和中框12的方向设置。所述第一表面1341可以为后盖13的内表面131。所述第一表面1341为所述壳体11的内表面。所述第二表面1342朝向背离盖板11和中框12的方向设置。所述第二表面1342为所述壳体11的外表面。The first surface 1341 is disposed toward the direction of the cover plate 11 and the middle frame 12 . The first surface 1341 may be the inner surface 131 of the back cover 13 . The first surface 1341 is the inner surface of the casing 11 . The second surface 1342 is disposed in a direction away from the cover plate 11 and the middle frame 12 . The second surface 1342 is the outer surface of the casing 11 .

步骤S102,在所述基材134的第二表面1342设置保护层135,所述保护层135中包括自清洁颗粒136,所述自清洁颗粒136暴露于所述保护层135的表面,所述自清洁颗粒135在接收光线照射时,发生光催化反应降解有机物。Step S102, a protective layer 135 is provided on the second surface 1342 of the substrate 134, the protective layer 135 includes self-cleaning particles 136, the self-cleaning particles 136 are exposed on the surface of the protective layer 135, and the self-cleaning particles 136 are exposed on the surface of the protective layer 135. When the cleaning particles 135 are irradiated with light, a photocatalytic reaction occurs to degrade the organic matter.

在一种实施例中,请参阅图11,所述步骤S102可包括:In an embodiment, referring to FIG. 11 , the step S102 may include:

步骤S1021:对所述基材134的第二表面1342进行抛光处理;以及Step S1021: polishing the second surface 1342 of the substrate 134; and

步骤S1022:在抛光处理过的所述基材134的第二表面1342设置保护层135,所述保护层135中包括自清洁颗粒136,所述自清洁颗粒136暴露于所述保护层135的表面,所述自清洁颗粒135在接收光线照射时,发生光催化反应降解有机物。Step S1022 : disposing a protective layer 135 on the polished second surface 1342 of the substrate 134 , the protective layer 135 includes self-cleaning particles 136 , and the self-cleaning particles 136 are exposed on the surface of the protective layer 135 , when the self-cleaning particles 135 are irradiated with light, a photocatalytic reaction occurs to degrade organic matter.

其中,为了使所述保护层135能够更加牢固地附着于所述基材134的第二表面1342,可以对所述基材134的第二表面1342进行抛光处理,以增加所述基材134的第二表面1342的表面的平整度,从而增加了所述保护层135在所述基材134的第二表面1342的附着力,进而使所述保护层135能够牢固地附着于所述基材134的第二表面1342。Wherein, in order to make the protective layer 135 more firmly attached to the second surface 1342 of the substrate 134 , the second surface 1342 of the substrate 134 may be polished to increase the The flatness of the surface of the second surface 1342 increases the adhesion of the protective layer 135 on the second surface 1342 of the substrate 134 , thereby enabling the protective layer 135 to be firmly attached to the substrate 134 of the second surface 1342.

在一些实施例中,可以采用机械、化学、电化学或超声波等的方式对所述基材134的第二表面1342实现抛光。以使得所述基材134的第二表面1342粗糙度降低,以获得光亮、平整表面的所述基材134的第二表面1342。其中,化学抛光方式是对所述基材134的第二表面1342进行有规则溶解达到光滑平整。其中,电化学抛光方式是将所述基材134的第二表面1342作为阳极、不溶性金属为阴极,两极同时浸入到电解槽内,通直流而产生有选择性的阳极溶液,从而使得所述基材134的第二表面1342光亮度增加大。其中机械抛光的方式是靠切削所述基材134的第二表面1342,使得所述基材134的第二表面1342塑性变形去掉抛光后的凸部而得到平滑面。其中超声波抛光的方式是将所述基材134放入磨料悬浮液中并一起置于超声波场中,依靠超声波的振荡作用,使磨料在所述基材134的第二表面1342磨削抛光。In some embodiments, the second surface 1342 of the substrate 134 may be polished mechanically, chemically, electrochemically, or ultrasonically. In order to reduce the roughness of the second surface 1342 of the substrate 134, the second surface 1342 of the substrate 134 with a bright and flat surface is obtained. The chemical polishing method is to regularly dissolve the second surface 1342 of the substrate 134 to achieve smoothness. In the electrochemical polishing method, the second surface 1342 of the base material 134 is used as the anode and the insoluble metal is used as the cathode, and the two electrodes are immersed in the electrolytic cell at the same time. The brightness of the second surface 1342 of the material 134 increases greatly. The mechanical polishing method is to cut the second surface 1342 of the substrate 134 to plastically deform the second surface 1342 of the substrate 134 to remove the polished convex portion to obtain a smooth surface. The ultrasonic polishing method is to put the substrate 134 in the abrasive suspension and put them together in an ultrasonic field, and rely on the oscillation of the ultrasonic waves to grind and polish the abrasive on the second surface 1342 of the substrate 134 .

在一些实施例中,在对所述基材134的第二表面1342进行抛光处理之前,可以先对所述基材134的第二表面1342进行打磨处理,然后再对打磨处理后的所述基材134的第二表面1342进行抛光处理,使抛光处理效果更佳,使得所述基材134的第二表面1342更加平整。在此,需要说明的是,所述打磨处理可以理解为对抛光处理前的粗加工。即,可以先对后盖外表面进行一次粗打磨,再进行一次细打磨,完成抛光处理。In some embodiments, before polishing the second surface 1342 of the substrate 134, the second surface 1342 of the substrate 134 may be polished first, and then the polished substrate The second surface 1342 of the substrate 134 is polished, so that the polishing effect is better, and the second surface 1342 of the substrate 134 is more flat. Here, it should be noted that the grinding treatment can be understood as rough machining before the polishing treatment. That is, the outer surface of the rear cover may be rough-polished once, and then fine-polished once, to complete the polishing process.

所述保护层136可以采用透明油漆。The protective layer 136 can be transparent paint.

所述自清洁颗粒136可以采用TiO2、SiO2、ZnO、CdS、WO3、Fe2O3等。所述自清洁颗粒136也可以采用金属离子掺杂的TiO2、SiO2、ZnO、CdS、WO3、Fe2O3等。用于掺杂的所述金属离子可以为银离子、铜离子等。The self-cleaning particles 136 can be TiO 2 , SiO 2 , ZnO, CdS, WO 3 , Fe 2 O 3 or the like. The self-cleaning particles 136 can also use metal ion-doped TiO 2 , SiO 2 , ZnO, CdS, WO 3 , Fe 2 O 3 and the like. The metal ions used for doping may be silver ions, copper ions, and the like.

所述自清洁颗粒136可以采用物理气相沉积(PVD)、化学气相沉积(CVD)、溶胶凝胶法或者水热法等方法形成。The self-cleaning particles 136 may be formed by methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD), sol-gel method, or hydrothermal method.

在一种实施例中,当采用化学气相沉积的方法形成所述自清洁颗粒136时,可以采用TiCl4和O2,通过对温度和压力的控制,生成TiO2纳米颗粒,也即形成所述自清洁颗粒136。In one embodiment, when chemical vapor deposition is used to form the self-cleaning particles 136, TiCl 4 and O 2 may be used to generate TiO 2 nanoparticles by controlling temperature and pressure, that is, to form the self-cleaning particles 136 . Self-cleaning particles 136 .

在一种实施例中,当采用溶胶凝胶法形成所述自清洁颗粒136时,可以先制备前驱体溶胶,通过对PH、添加剂和温度等的控制,生成具有一定空间结构的凝胶,在通过对凝胶进行干燥和煅烧,形成纳米颗粒,也即形成所述自清洁颗粒136。In an embodiment, when the self-cleaning particles 136 are formed by a sol-gel method, a precursor sol can be prepared first, and a gel with a certain spatial structure can be generated by controlling pH, additives, and temperature. By drying and calcining the gel, nanoparticles are formed, ie, the self-cleaning particles 136 are formed.

在一种实施例中,可以采用金属醇盐为原料、加入溶剂、水、催化剂等,通过水解和聚合反应得到前驱体溶胶。所述金属醇盐可以采用Ti(OC2H5)4、Ti(OC3H7 i)4、Ti(OC4H9 n)4等。In an embodiment, a metal alkoxide can be used as a raw material, a solvent, water, a catalyst, etc. are added to obtain a precursor sol through hydrolysis and polymerization. The metal alkoxide can be Ti(OC 2 H 5 ) 4 , Ti(OC 3 H 7 i ) 4 , Ti(OC 4 H 9 n ) 4 and the like.

在一种实施例中,当采用水热法形成所述保护层135时,先制备前驱物溶液,通过对温度和压力的控制,生成纳米颗粒,也即形成所述自清洁颗粒136。In one embodiment, when the protective layer 135 is formed by a hydrothermal method, a precursor solution is prepared first, and nanoparticles are formed by controlling the temperature and pressure, that is, the self-cleaning particles 136 are formed.

需要说明的是,在一些实施例中,所述保护层135包括至少两个着色区1351/1352,每个着色区1351/1352的颜色不同,不同颜色的着色区1351/1352采用颜色不同的自清洁颗粒1361/1362。It should be noted that, in some embodiments, the protective layer 135 includes at least two coloring areas 1351/1352, each coloring area 1351/1352 is different in color, and the coloring areas 1351/1352 with different colors are self-contained with different colors. Cleaning particles 1361/1362.

例如,所述保护层135包括第一着色区1351和第二着色区1352。所述第一着色区1351可以采用第一自清洁颗粒1361。所述第一自清洁颗粒1361可以为白色。所述第一自清洁颗粒1361可以采用TiO2、ZnO等。所述第二着色区1352可以采用第二自清洁颗粒1362。所述第二自清洁颗粒1362可以为黄色。所述第二自清洁颗粒1362可以采用CdS、BiVO4等。再例如,所述保护层135还可以包括第三着色区1353。所述第三着色区1353采用第三自清洁颗粒1363。所述第三自清洁颗粒1363可以为红棕色。所述第三自清洁颗粒1363可以采用Fe2O3For example, the protective layer 135 includes a first coloring area 1351 and a second coloring area 1352 . The first coloring area 1351 may use first self-cleaning particles 1361 . The first self-cleaning particles 1361 may be white. The first self-cleaning particles 1361 can be made of TiO 2 , ZnO or the like. The second coloring region 1352 may use second self-cleaning particles 1362 . The second self-cleaning particles 1362 may be yellow. The second self-cleaning particles 1362 can be CdS, BiVO 4 or the like. For another example, the protective layer 135 may further include a third coloring region 1353 . The third coloring area 1353 uses third self-cleaning particles 1363 . The third self-cleaning particles 1363 may be reddish brown. The third self-cleaning particles 1363 may be Fe 2 O 3 .

在一种实施例中,请参阅图12,所述方法还可以包括:In one embodiment, referring to FIG. 12 , the method may further include:

步骤103:将自清洁颗粒136均匀的混合于保护漆中形成前驱物。Step 103 : uniformly mixing the self-cleaning particles 136 in the protective paint to form a precursor.

所述步骤S102还包括:The step S102 further includes:

步骤S102a:将所述前驱物涂覆于所述基材134的第二表面1342;Step S102a: coating the precursor on the second surface 1342 of the substrate 134;

步骤S102b:干燥所述基材134的第二表面1342的前驱物得到前置层;Step S102b: drying the precursor of the second surface 1342 of the substrate 134 to obtain a pre-layer;

步骤S102c:对所述前置层进行喷砂处理,暴露自清洁颗粒136,形成保护层135,所述自清洁颗粒136在接收光线照射时,发生光催化反应降解有机物。Step S102c: Sandblasting the pre-layer to expose the self-cleaning particles 136 to form a protective layer 135. When the self-cleaning particles 136 are irradiated with light, photocatalytic reaction occurs to degrade organic matter.

在一种实施例中,所述步骤101可以在步骤S103之前进行,也可以在步骤S103之后进行,还可以与步骤S103同时进行。所述步骤S101和步骤S103均位于所述步骤S102之前。In an embodiment, the step 101 may be performed before the step S103, may also be performed after the step S103, or may be performed simultaneously with the step S103. Both the step S101 and the step S103 are located before the step S102.

在一种实施例中,所述喷砂处理中所用的磨料的硬度大于所述前置层的硬度,小于所述自清洁颗粒136的硬度。In one embodiment, the hardness of the abrasive used in the sandblasting process is greater than the hardness of the pre-layer and less than the hardness of the self-cleaning particles 136 .

在一种实施例中,所述保护层135的厚度大于10微米。当所述保护层135的厚度小于10微米时,由于所述保护层135的厚度较小,光透过性高,容易受到基材134自身颜色的干扰,对所述保护层135的自清洁颗粒136自身的颜色的利用率不佳,同时,由于所述保护层135的厚度较小,在抛光过程中容易将保护层135打穿,不利于保护层135的形成。在一种实施方式中,所述保护层135的厚度可以大于100微米。In one embodiment, the thickness of the protective layer 135 is greater than 10 microns. When the thickness of the protective layer 135 is less than 10 microns, because the thickness of the protective layer 135 is small and the light transmittance is high, it is easily interfered by the color of the substrate 134 itself, and the self-cleaning particles of the protective layer 135 are easily disturbed. The utilization rate of the color of the 136 itself is not good, and at the same time, because the thickness of the protective layer 135 is small, the protective layer 135 is easily penetrated during the polishing process, which is not conducive to the formation of the protective layer 135 . In one embodiment, the thickness of the protective layer 135 may be greater than 100 microns.

在一种实施例中,所述自清洁颗粒136的直径小于500纳米,以使得所述自清洁颗粒136具有良好的光催化性,同时,用户在触摸所述壳体时,并不会感受到其表面的自清洁颗粒136。在一种实施例中,所述自清洁颗粒136的直径可以为50纳米-100纳米。当所述自清洁颗粒136的直径小于50nm时,由于所述自清洁颗粒136的直径较小,导致制造成本较高,制造工艺复杂;当所述自清洁颗粒136的直径大于100nm时,由于所述自清洁颗粒136的直径较大,导致所述自清洁颗粒136的光催化性较弱。In one embodiment, the diameter of the self-cleaning particles 136 is less than 500 nanometers, so that the self-cleaning particles 136 have good photocatalytic properties, and at the same time, when the user touches the casing, the user does not feel the Self-cleaning particles 136 on its surface. In one embodiment, the diameter of the self-cleaning particles 136 may be 50 nanometers to 100 nanometers. When the diameter of the self-cleaning particles 136 is less than 50 nm, the manufacturing cost is high and the manufacturing process is complicated due to the small diameter of the self-cleaning particles 136; when the diameter of the self-cleaning particles 136 is greater than 100 nm, due to the The diameter of the self-cleaning particles 136 is relatively large, resulting in weak photocatalytic activity of the self-cleaning particles 136 .

综上可知,本申请实施例提供的壳体制作方法,通过在基材朝向电子设备外侧的表面上形成保护层,所述保护层中包括自清洁颗粒,所述自清洁颗粒暴露于所述保护层的表面,所述自清洁颗粒在接收光线照射时,发生光催化反应,将有机物分解为二氧化碳和水,也即将附着于壳体表面的指纹中的油脂降解,从而达到自动消除指纹的目的。To sum up, in the case manufacturing method provided by the embodiments of the present application, a protective layer is formed on the surface of the substrate facing the outside of the electronic device, and the protective layer includes self-cleaning particles, and the self-cleaning particles are exposed to the protective layer. On the surface of the layer, the self-cleaning particles undergo a photocatalytic reaction when irradiated by light, decompose the organic matter into carbon dioxide and water, and degrade the grease in the fingerprints attached to the surface of the shell, so as to achieve the purpose of automatically eliminating fingerprints.

本领域技术人员可以理解,图1中示出的电子设备1的结构并不构成对电子设备1的限定。电子设备1可以包括比图示更多或更少的部件,或者组合某些部件,或者不同的部件布置。电子设备1还可以包括存储器、蓝牙模块等,在此不再赘述。Those skilled in the art can understand that the structure of the electronic device 1 shown in FIG. 1 does not constitute a limitation on the electronic device 1 . The electronic device 1 may comprise more or fewer components than shown, or combine certain components, or a different arrangement of components. The electronic device 1 may further include a memory, a Bluetooth module, and the like, which will not be repeated here.

以上对本申请实施例提供的壳体制作方法、壳体及电子设备进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请。同时,对于本领域的技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The case manufacturing method, the case and the electronic device provided by the embodiments of the present application have been described in detail above. The principles and implementations of the present application are described with specific examples in this paper. The descriptions of the above embodiments are only used to help understanding this application. At the same time, for those skilled in the art, according to the idea of the present application, there will be changes in the specific embodiments and application scope. To sum up, the content of this specification should not be construed as a limitation to the present application.

Claims (9)

1. A shell manufacturing method is applied to electronic equipment, and is characterized by comprising the following steps:
providing a substrate, wherein the substrate comprises a first surface and a second surface, the first surface faces the inner side of the electronic equipment, and the second surface faces the outer side of the electronic equipment;
polishing the second surface of the base material, and then polishing the polished second surface of the base material;
and
arranging a protective layer on the second surface of the base material after polishing treatment, wherein the protective layer comprises self-cleaning particles, and the self-cleaning particles are prepared by the following steps:
metal alkoxide is adopted as a raw material, a solvent, water and a catalyst are added, and precursor sol is obtained through hydrolysis and polymerization reaction;
controlling the pH value, the additive and the temperature of the precursor sol to generate gel with a certain spatial structure;
drying and calcining the gel to form the self-cleaning particles;
uniformly mixing the self-cleaning particles in a protective paint to form a precursor, coating the precursor on the second surface of the base material, drying the precursor on the second surface of the base material to obtain a front layer, and performing sand blasting treatment on the front layer, wherein the self-cleaning particles are exposed on the surface of the protective layer, and when receiving light irradiation, the self-cleaning particles generate a photocatalytic reaction to degrade organic matters;
wherein the protective layer comprises at least two colored regions, each colored region has a different color, and colored regions of different colors employ the self-cleaning particles having different colors.
2. A method of making a housing as claimed in claim 1, wherein: the protective layer has a thickness greater than 10 microns.
3. A method of making a housing as claimed in claim 1, wherein: the diameter of the self-cleaning particles is less than 500 nanometers.
4. A method of making a housing as claimed in claim 1, wherein: the diameter of the self-cleaning particles is 50nm to 100 nm.
5. A shell is applied to electronic equipment, and is characterized in that: the shell comprises a substrate and a protective layer, the substrate comprises a first surface and a second surface, the first surface faces the inner side of the electronic equipment, the second surface faces the outer side of the electronic equipment, the protective layer is arranged on the second surface of the substrate, self-cleaning particles are contained in the protective layer, and the self-cleaning particles are prepared through the following steps:
metal alkoxide is adopted as a raw material, a solvent, water and a catalyst are added, and precursor sol is obtained through hydrolysis and polymerization reaction;
controlling the pH value, the additive and the temperature of the precursor sol to generate gel with a certain spatial structure;
drying and calcining the gel to form the self-cleaning particles;
the self-cleaning particles are exposed on the surface of the protective layer, and when the self-cleaning particles receive light irradiation, a photocatalytic reaction is carried out to degrade organic matters;
wherein the protective layer comprises at least two colored regions, each colored region has a different color, and colored regions of different colors employ the self-cleaning particles having different colors.
6. The housing of claim 5, wherein: the protective layer has a thickness greater than 10 microns.
7. The housing of claim 5, wherein: the diameter of the self-cleaning particles is less than 500 nanometers.
8. The housing of claim 5, wherein: the diameter of the self-cleaning particles is 50nm to 100 nm.
9. An electronic device characterized by comprising a housing as claimed in any one of claims 5 to 8.
CN201711036404.6A 2017-10-30 2017-10-30 Housing manufacturing method, housing and electronic device Expired - Fee Related CN107683045B (en)

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