[go: up one dir, main page]

CN107369632A - A reliability testing method and system for an unpackaged power device chip - Google Patents

A reliability testing method and system for an unpackaged power device chip Download PDF

Info

Publication number
CN107369632A
CN107369632A CN201710564701.1A CN201710564701A CN107369632A CN 107369632 A CN107369632 A CN 107369632A CN 201710564701 A CN201710564701 A CN 201710564701A CN 107369632 A CN107369632 A CN 107369632A
Authority
CN
China
Prior art keywords
power device
unpackaged
unpackaged power
reliability
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710564701.1A
Other languages
Chinese (zh)
Inventor
欧阳慧琳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201710564701.1A priority Critical patent/CN107369632A/en
Publication of CN107369632A publication Critical patent/CN107369632A/en
Pending legal-status Critical Current

Links

Classifications

    • H10P74/207
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • H10P74/27
    • H10P74/273

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

The invention provides a reliability test method and system for an unpackaged power device chip. The reliability test method of the unpackaged power device chip comprises the following steps: the method comprises the following steps: (A) after the power device is manufactured, performing a first performance test on the unpackaged power device; (B) after the first test of the unpackaged power device is qualified, forming a reliability test system through conductive connection; (C) applying voltage to the drain electrode of the unpackaged power device under a first temperature condition, keeping for a preset time, and then carrying out a second performance test on the unpackaged power device under a second temperature condition; (D) and judging whether the unpackaged power device passes the reliability test or not according to the test results of the first performance test and the second performance test. The reliability test method and the system for the unpackaged power device chip can shorten the test time and reduce the test cost.

Description

一种未封装功率器件芯片的可靠性测试方法和系统A reliability testing method and system for an unpackaged power device chip

【技术领域】【Technical field】

本发明涉及半导体芯片测试技术领域,特别地,涉及一种未封装功率器件芯片的可靠性测试方法和系统。The invention relates to the technical field of semiconductor chip testing, in particular to a reliability testing method and system for unpackaged power device chips.

【背景技术】【Background technique】

半导体功率器件的最重要性能就是阻断高压,器件经过设计可以在PN结、金属-半导体接触界面、MOS界面的耗尽层上承受高压;但是,随着外加电压的增大,耗尽层电场强度也会增大,最终超过材料极限出现雪崩击穿。The most important performance of a semiconductor power device is to block high voltage. The device is designed to withstand high voltage on the depletion layer of the PN junction, metal-semiconductor contact interface, and MOS interface; however, as the applied voltage increases, the electric field of the depletion layer Strength also increases, eventually exceeding the material limit with avalanche breakdown.

沟槽型垂直双扩散场效应晶体管(VDMOS)的漏源两极分别在器件的两侧,其可以使电流在器件内部垂直流通,增加了电流密度,改善了额定电流,单位面积的导通电阻也较小,是一种用途非常广泛的功率器件。The drain and source poles of the trench type vertical double diffused field effect transistor (VDMOS) are on both sides of the device, which can make the current flow vertically inside the device, increase the current density, improve the rated current, and the on-resistance per unit area is also improved. Smaller, it is a very versatile power device.

在器件的应用过程中,可动离子迁移和芯片外水汽渗入、电流注入、电势扰动、杂质扩散都会影响器件阻断高压的能力,导致器件失效。因此对器件进行可靠性测试显得尤为重要。During the application process of the device, mobile ion migration, water vapor infiltration outside the chip, current injection, potential disturbance, and impurity diffusion will all affect the ability of the device to block high voltage, resulting in device failure. Therefore, it is particularly important to test the reliability of the device.

目前常用的可靠性测试方法如下:在器件制成后,进行性能测试,测试合格后进行切片和封装步骤。封装完成后,在特定可靠性测试条件下再进行器件性能测试,如果可靠性测试前后的器件性能下降在允许范围之内认为该器件可靠性通过测试。这种方法的缺点是:需要封装后才能进行可靠性测试,封装流程时间长,不能在器件制成后立即进行可靠性测试。并且,封装成本高,增加了器件的开发成本。At present, the commonly used reliability testing methods are as follows: After the device is manufactured, performance testing is performed, and after the test is passed, slicing and packaging steps are performed. After the packaging is completed, the device performance test is carried out under specific reliability test conditions. If the device performance before and after the reliability test drops within the allowable range, the reliability of the device is considered to pass the test. The disadvantage of this method is that the reliability test can only be performed after packaging, the packaging process takes a long time, and the reliability test cannot be performed immediately after the device is manufactured. Moreover, the packaging cost is high, which increases the development cost of the device.

有鉴于此,有必要提供一种未封装功率器件芯片的可靠性测试方法和系统,以解决现有技术存在的上述问题。In view of this, it is necessary to provide a reliability testing method and system for unpackaged power device chips to solve the above-mentioned problems in the prior art.

【发明内容】【Content of invention】

本发明的其中一个目的在于为解决上述问题而提供一种未封装功率器件芯片的可靠性测试方法和系统。One object of the present invention is to provide a reliability testing method and system for unpackaged power device chips to solve the above problems.

本发明提供的未封装功率器件芯片的可靠性测试方法,包括:(A)在功率器件制成之后,对未封装功率器件进行第一次性能测试;(B)在所述未封装功率器件的第一次测试合格之后,通过导电连接形成可靠性测试系统;(C)在第一温度条件下对所述未封装功率器件的漏极加电压,并保持预定时间之后,在第二温度条件下对所述未封装器件进行第二次性能测试;(D)根据所述第一次性能测试和所述第二次性能测试的测试结果,判断所述未封装功率器件是否通过可靠性测试。The method for testing the reliability of an unpackaged power device chip provided by the present invention includes: (A) performing a first performance test on the unpackaged power device after the power device is manufactured; (B) performing a first performance test on the unpackaged power device After the first test is passed, a reliability test system is formed by conductive connection; (C) applying a voltage to the drain of the unpackaged power device under the first temperature condition and keeping it for a predetermined time, then under the second temperature condition Carrying out a second performance test on the unpackaged device; (D) judging whether the unpackaged power device passes the reliability test according to the test results of the first performance test and the second performance test.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述未封装功率器件包括有源区和分压区域;所述有源区位于所述未封装功率器件的中间区域,所述分压区域设置在所述有源区的周围并且包围所述有源区;所述有源区包括栅极、源极和漏极,其中所述栅极和源极设置在所述有源区的正面,而所述漏极设置在所述有源区的背面。As an improvement of the reliability testing method for unpackaged power device chips provided by the present invention, in a preferred embodiment, the unpackaged power device includes an active area and a voltage division area; the active area is located at In the middle area of the unpackaged power device, the voltage division area is arranged around the active area and surrounds the active area; the active area includes a gate, a source, and a drain, wherein the The gate and the source are arranged on the front side of the active area, and the drain is arranged on the back side of the active area.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述未封装功率器件还包括划片道,所述划片道设置在所述未封装功率器件的外围区域。As an improvement of the method for testing the reliability of unpackaged power device chips provided by the present invention, in a preferred embodiment, the unpackaged power device further includes a scribe line, and the scribe line is provided on the unpackaged Peripheral area of power devices.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述步骤(B)包括:所述未封装功率器件的栅极和源极通过金属导电胶相互短接,并利用第一金属导线连接所述金属导电胶;所述未封装功率器件的漏极通过金属导电胶连接到第二金属导线。As an improvement of the reliability testing method of the unpackaged power device chip provided by the present invention, in a preferred embodiment, the step (B) includes: the gate and source of the unpackaged power device pass through The metal conductive adhesives are short-circuited to each other, and the metal conductive adhesives are connected by the first metal wire; the drain of the unpackaged power device is connected to the second metal wire by the metal conductive adhesive.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述步骤(C)包括:在150℃的条件下,通过所述第二金属导线对所述未封装功率器件的漏极施加电压并保持500小时;将所述未封装功率器件降温至20℃左右,然后再对所述未封装功率器件进行第二次性能测试。As an improvement of the reliability testing method for unpackaged power device chips provided by the present invention, in a preferred embodiment, the step (C) includes: passing the second metal Apply a voltage to the drain of the unpackaged power device by wires and keep it for 500 hours; cool down the unpackaged power device to about 20° C., and then perform a second performance test on the unpackaged power device.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述步骤(D)包括:在所述第二次性能测试完成之后,将所述第二次性能测试得到第二性能测试参数与所述第一次性能测试得到的第一性能参数进行比较分析,来判断在可靠性测试前后所述未封装功率器件的性能下降是否超出预设范围。As an improvement of the reliability testing method for unpackaged power device chips provided by the present invention, in a preferred embodiment, the step (D) includes: after the second performance test is completed, the The second performance test parameters obtained from the second performance test are compared and analyzed with the first performance parameters obtained from the first performance test to determine whether the performance degradation of the unpackaged power device before and after the reliability test exceeds the preset scope.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,如果所述未封装功率器件的性能下降未超出所述预设范围,则认为所述未封装功率器件通过可靠性测试,否则,则认为所述未封装功率器件未通过所述可靠性测试。As an improvement of the method for testing the reliability of unpackaged power device chips provided by the present invention, in a preferred embodiment, if the performance degradation of the unpackaged power device does not exceed the preset range, it is considered that the If the unpackaged power device passes the reliability test, otherwise, it is considered that the unpackaged power device fails the reliability test.

本发明提供的未封装功率器件芯片的可靠性测试系统,应用于如上所述的可靠性测试方法,所述可靠性测试系统包括未封装功率器件、第一金属导线和第二金属导线,其中,所述未封装功率器件包括有源区和分压区域;所述分压区域设置在所述有源区的周围;所述有源区包括栅极、源极和漏极,其中所述栅极和源极设置在所述有源区的正面,而所述漏极设置在所述有源区的背面;所述栅极和源极通过金属导电胶相互短接,且所述第一金属导线通过所述金属导电胶连接到所述源极和栅极;所述第二金属导线通过金属导电胶连接到所述漏极。The reliability testing system for unpackaged power device chips provided by the present invention is applied to the reliability testing method as described above, and the reliability testing system includes unpackaged power devices, first metal wires and second metal wires, wherein, The unpackaged power device includes an active area and a voltage division area; the voltage division area is arranged around the active area; the active area includes a gate, a source, and a drain, wherein the gate and the source are arranged on the front of the active region, and the drain is arranged on the back of the active region; the gate and the source are short-circuited with each other through metal conductive glue, and the first metal wire connected to the source and gate through the metal conductive glue; the second metal wire is connected to the drain through the metal conductive glue.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述第一金属导线作为所述未封装功率器件的栅源连接线,所述第二金属导线作为所述未封装功率器件的漏极连接线。As an improvement of the method for testing the reliability of unpackaged power device chips provided by the present invention, in a preferred embodiment, the first metal wire is used as the gate-source connection wire of the unpackaged power device, and the The second metal wire serves as a drain connection wire of the unpackaged power device.

作为在本发明提供的未封装功率器件芯片的可靠性测试方法的一种改进,在一种优选实施例中,所述可靠性连接系统同时包括多个未封装功率器件,且同一列或者同一排的未封装功率器件可以通过金属导电胶连接在同一个栅源连接线。As an improvement of the reliability testing method for unpackaged power device chips provided by the present invention, in a preferred embodiment, the reliability connection system includes multiple unpackaged power devices at the same time, and the same column or row Unpackaged power devices can be connected to the same gate-source connection line through metal conductive glue.

相较于现有技术,本发明提供的未封装功率器件芯片的可靠性测试方法在功率器件芯片处于未封装的状态下通过特殊的导电连接设计来形成可靠性测试系统并进行相应的可靠性测试,从而可以缩短测试时间并且降低测试成本。Compared with the prior art, the reliability testing method of the unpackaged power device chip provided by the present invention forms a reliability testing system through a special conductive connection design when the power device chip is in an unpackaged state and performs corresponding reliability testing , so that the test time can be shortened and the test cost can be reduced.

【附图说明】【Description of drawings】

为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图,其中:In order to illustrate the technical solutions in the embodiments of the present invention more clearly, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For Those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort, wherein:

图1为本发明提供的未封装功率器件芯片的可靠性测试方法一种实施例的流程示意图;Fig. 1 is a schematic flow chart of an embodiment of a reliability testing method for an unpackaged power device chip provided by the present invention;

图2为未封装功率器件芯片的平面结构示意图;2 is a schematic plan view of an unpackaged power device chip;

图3为图2所示的未封装功率器件芯片的剖面结构示意图;Fig. 3 is a schematic cross-sectional structure diagram of the unpackaged power device chip shown in Fig. 2;

图4为本发明提供的未封装功率器件芯片的可靠性测试系统一种实施例的结构示意图。FIG. 4 is a schematic structural diagram of an embodiment of a reliability testing system for unpackaged power device chips provided by the present invention.

【具体实施方式】【detailed description】

下面将对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

为解决现有技术的功率器件芯片需要在封装之后才能进行可靠性测试的问题,本发明提供一种未封装功率器件芯片的可靠性测试方法,其主要是在功率器件芯片处于未封装的状态下通过特殊的导电连接设计来形成可靠性测试系统并进行相应的可靠性测试,从而可以缩短测试时间并且降低测试成本。In order to solve the problem that the power device chip in the prior art needs to be packaged before the reliability test can be performed, the present invention provides a reliability test method for an unpackaged power device chip, which is mainly performed when the power device chip is in an unpackaged state A reliability test system is formed through a special conductive connection design and corresponding reliability tests are performed, thereby shortening test time and reducing test costs.

请参阅图1,其为本发明提供的未封装功率器件芯片的可靠性测试方法一种实施例的流程图。所述未封装功率器件芯片的可靠性测试方法可以应用于功率器件芯片,比如沟槽型垂直双扩散场效应晶体管(VDMOS)的可靠性测试。具体地,所述未封装功率器件芯片的可靠性测试方法主要包括以下步骤:Please refer to FIG. 1 , which is a flowchart of an embodiment of a reliability testing method for an unpackaged power device chip provided by the present invention. The reliability testing method of the unpackaged power device chip can be applied to the reliability test of the power device chip, such as trench type vertical double diffused field effect transistor (VDMOS). Specifically, the reliability testing method of the unpackaged power device chip mainly includes the following steps:

步骤S1,在功率器件制成之后,对未封装功率器件进行第一次性能测试;Step S1, after the power device is manufactured, perform a first performance test on the unpackaged power device;

具体地,请参阅图2和图3,其分别为所述未封装功率器件在制成之后的平面结构示意图。所述未封装功率器件包括有源区、分压区域和划片道;所述有源区位于所述未封装功率器件的中间区域,所述分压区域设置在所述有源区的周围并且包围所述有源区;所述划片道设置在所述功率器件的外围区域。其中,所述有源区包括栅极、源极和漏极,其中所述栅极和源极设置在所述有源区的正面,而所述漏极设置在所述有源区的背面。Specifically, please refer to FIG. 2 and FIG. 3 , which are respectively a schematic plan view of the unpackaged power device after fabrication. The unpackaged power device includes an active area, a voltage dividing area and a scribe lane; the active area is located in the middle area of the unpackaged power device, and the voltage dividing area is arranged around the active area and surrounds The active area; the scribing lanes are arranged in the peripheral area of the power device. Wherein, the active region includes a gate, a source and a drain, wherein the gate and the source are arranged on the front side of the active region, and the drain is arranged on the back side of the active region.

在步骤S1中,对所述未封装功率器件进行第一次性能测试可以按照传统的性能测试方式进行,此处不再赘述;并且,在步骤S1的第一次性能测试完成之后可以得到相应的第一性能测试参数,所述第一新能测试参数可以进行保存以便于后续可靠性测试分析使用。In step S1, the first performance test of the unpackaged power device can be performed according to the traditional performance test method, which will not be repeated here; and, after the first performance test of step S1 is completed, the corresponding The first performance test parameters, the first new performance test parameters may be saved for subsequent reliability test analysis.

步骤S2,在所述未封装功率器件的第一次测试合格之后,通过导电连接形成可靠性测试系统,其中所述未封装功率器件的栅极和源极通过金属导电胶短接并连接第一金属导线,且其漏极通过金属导电胶连接第二金属导线;Step S2, after the unpackaged power device passes the first test, a reliability test system is formed through conductive connection, wherein the gate and source of the unpackaged power device are shorted through metal conductive glue and connected to the first a metal wire, and its drain is connected to a second metal wire through metal conductive glue;

具体地,在步骤S1针对所述未封装功率器件的第一次性能测试合格之后,在所述未封装功率器件的基础上通过导电设计来形成如图4所示的可靠性测试系统。Specifically, after passing the first performance test of the unpackaged power device in step S1, a reliability test system as shown in FIG. 4 is formed on the basis of the unpackaged power device through conductive design.

具体地,首先,通过金属导电胶将所述有源区正面的栅极和漏极相互短接,所述金属导电胶可以具体形成为从所述源极延伸到所述栅极的条形导电胶;接着,通过第一金属导线连接所述金属导电胶,其中所述第一金属导线可以作为所述未封装功率器件的栅源连接线;并且,通过金属导电胶将第二金属导线连接到所述有源区的漏极,其中所述第二金属导线可以作为所述未封装功率器件的漏极连接线。通过上述导电连接,并可以形成如图4所示的可靠性测试系统。Specifically, first, the gate and the drain on the front side of the active region are short-circuited to each other through metal conductive glue, and the metal conductive glue can be specifically formed as a strip-shaped conductive strip extending from the source to the gate. glue; then, connect the metal conductive glue through the first metal wire, wherein the first metal wire can be used as the gate-source connection wire of the unpackaged power device; and, connect the second metal wire to the The drain of the active region, wherein the second metal wire can be used as a drain connection wire of the unpackaged power device. Through the above-mentioned conductive connection, a reliability test system as shown in FIG. 4 can be formed.

需要注意的是,由于所述可靠性测试系统是在所述功率器件制成之后连接形成的,此时还没有对所述功率器件进行切片和封装,因此所述可靠性连接系统可以是同时包括多个未封装功率器件,且同一列(或者同一排)的未封装功率器件可以通过金属导电胶连接在同一个栅源连接线。It should be noted that since the reliability test system is connected after the power device is manufactured, and the power device has not been sliced and packaged at this time, the reliability connection system can also include Multiple unpackaged power devices, and unpackaged power devices in the same column (or row) can be connected to the same gate-source connection line through metal conductive glue.

步骤S3,在第一温度条件下通过所述第二金属导线对所述未封装功率器件的漏极加电压并保持预定时间之后,在第二温度条件下对所述未封装器件进行第二次性能测试;Step S3, after applying a voltage to the drain of the unpackaged power device through the second metal wire under the first temperature condition and keeping it for a predetermined time, performing a second temperature test on the unpackaged device under the second temperature condition. Performance Testing;

具体地,在步骤S3中,所述第一温度条件可以为150℃左右,而所述第二温度条件可以为20℃左右,所述预定时间通常可以为500小时左右。也即是说,在步骤S3中,首先在150℃的条件下,通过所述第二金属导线对所述未封装功率器件的漏极施加电压并保持500小时左右;接着,将所述未封装功率器件降温至20℃左右,然后再对所述未封装功率器件进行第二次性能测试并且得到第二性能测试参数。Specifically, in step S3, the first temperature condition may be about 150°C, the second temperature condition may be about 20°C, and the predetermined time may generally be about 500 hours. That is to say, in step S3, firstly, under the condition of 150°C, a voltage is applied to the drain of the unpackaged power device through the second metal wire and kept for about 500 hours; then, the unpackaged The temperature of the power device is lowered to about 20° C., and then a second performance test is performed on the unpackaged power device and second performance test parameters are obtained.

步骤S4,根据所述第一次性能测试和所述第二次性能测试的测试结果,判断所述未封装功率器件是否通过可靠性测试。Step S4, judging whether the unpackaged power device passes the reliability test according to the test results of the first performance test and the second performance test.

具体而言,在步骤S3的第二次性能测试完成之后,将所述第二性能测试参数与步骤S1得到的第一性能测试参数进行比较分析,来判断所述可靠性测试前后所述未封装功率器件的性能下降是否超出预设范围,比如,性能下降是否超出5%-10%;如果未超出所述预设范围,则认为所述未封装功率器件通过可靠性测试,否则,则认为所述未封装功率器件未通过所述可靠性测试。Specifically, after the second performance test in step S3 is completed, compare and analyze the second performance test parameters with the first performance test parameters obtained in step S1 to determine whether the unpackaged package before and after the reliability test Whether the performance degradation of the power device exceeds the preset range, for example, whether the performance degradation exceeds 5%-10%; if it does not exceed the preset range, it is considered that the unpackaged power device has passed the reliability test; The unpackaged power device fails the reliability test.

相较于现有技术,本发明提供的未封装功率器件芯片的可靠性测试方法在功率器件芯片处于未封装的状态下通过特殊的导电连接设计来形成可靠性测试系统并进行相应的可靠性测试,从而可以缩短测试时间并且降低测试成本。Compared with the prior art, the reliability testing method of the unpackaged power device chip provided by the present invention forms a reliability testing system through a special conductive connection design when the power device chip is in an unpackaged state and performs corresponding reliability testing , so that the test time can be shortened and the test cost can be reduced.

以上所述的仅是本发明的实施方式,在此应当指出,对于本领域的普通技术人员来说,在不脱离本发明创造构思的前提下,还可以做出改进,但这些均属于本发明的保护范围。What has been described above is only the embodiment of the present invention. It should be pointed out that for those of ordinary skill in the art, improvements can be made without departing from the creative concept of the present invention, but these all belong to the present invention. scope of protection.

Claims (10)

1.一种未封装功率器件芯片的可靠性测试方法,其特征在于,包括:1. A reliability testing method for an unpackaged power device chip, characterized in that it comprises: (A)在功率器件制成之后,对未封装功率器件进行第一次性能测试;(A) After the power device is manufactured, perform the first performance test on the unpackaged power device; (B)在所述未封装功率器件的第一次测试合格之后,通过导电连接形成可靠性测试系统;(B) After passing the first test of the unpackaged power device, forming a reliability test system through conductive connection; (C)在第一温度条件下对所述未封装功率器件的漏极加电压,并保持预定时间之后,在第二温度条件下对所述未封装器件进行第二次性能测试;(C) Applying a voltage to the drain of the unpackaged power device under the first temperature condition and keeping it for a predetermined time, performing a second performance test on the unpackaged device under the second temperature condition; (D)根据所述第一次性能测试和所述第二次性能测试的测试结果,判断所述未封装功率器件是否通过可靠性测试。(D) judging whether the unpackaged power device passes the reliability test according to the test results of the first performance test and the second performance test. 2.根据权利要求1所述的未封装功率器件芯片的可靠性测试方法,其特征在于,所述未封装功率器件包括有源区和分压区域;所述有源区位于所述未封装功率器件的中间区域,所述分压区域设置在所述有源区的周围并且包围所述有源区;所述有源区包括栅极、源极和漏极,其中所述栅极和源极设置在所述有源区的正面,而所述漏极设置在所述有源区的背面。2. The reliability testing method of an unpackaged power device chip according to claim 1, wherein the unpackaged power device includes an active area and a voltage division area; In the middle region of the device, the voltage division region is arranged around the active region and surrounds the active region; the active region includes a gate, a source and a drain, wherein the gate and the source The drain is arranged on the front of the active region, and the drain is arranged on the back of the active region. 3.根据权利要求1所述的未封装功率器件芯片的可靠性测试方法,其特征在于,所述未封装功率器件还包括划片道,所述划片道设置在所述未封装功率器件的外围区域。3. The reliability testing method of an unpackaged power device chip according to claim 1, wherein the unpackaged power device further comprises a dicing lane, and the dicing lane is arranged on a peripheral area of the unpackaged power device . 4.根据权利要求2所述的未封装功率器件芯片的可靠性测试方法,其特征在于,所述步骤(B)包括:4. the reliability testing method of unpackaged power device chip according to claim 2, is characterized in that, described step (B) comprises: 所述未封装功率器件的栅极和源极通过金属导电胶相互短接,并利用第一金属导线连接所述金属导电胶;The gate and the source of the unpackaged power device are short-circuited to each other through a metal conductive glue, and the metal conductive glue is connected to the metal conductive glue with a first metal wire; 所述未封装功率器件的漏极通过金属导电胶连接到第二金属导线。The drain of the unpackaged power device is connected to the second metal wire through metal conductive glue. 5.根据权利要求1所述的未封装功率器件芯片的可靠性测试方法,其特征在于,所述步骤(C)包括:5. the reliability testing method of unpackaged power device chip according to claim 1, is characterized in that, described step (c) comprises: 在150℃的条件下,通过所述第二金属导线对所述未封装功率器件的漏极施加电压并保持500小时;Applying a voltage to the drain of the unpackaged power device through the second metal wire under the condition of 150°C and keeping it for 500 hours; 将所述未封装功率器件降温至20℃左右,然后再对所述未封装功率器件进行第二次性能测试。The temperature of the unpackaged power device is lowered to about 20° C., and then a second performance test is performed on the unpackaged power device. 6.根据权利要求1所述的未封装功率器件芯片的可靠性测试方法,其特征在于,所述步骤(D)包括:6. the reliability testing method of unpackaged power device chip according to claim 1, is characterized in that, described step (D) comprises: 在所述第二次性能测试完成之后,将所述第二次性能测试得到第二性能测试参数与所述第一次性能测试得到的第一性能参数进行比较分析,来判断在可靠性测试前后所述未封装功率器件的性能下降是否超出预设范围。After the second performance test is completed, compare and analyze the second performance test parameters obtained from the second performance test with the first performance parameters obtained from the first performance test to determine the reliability before and after the reliability test. Whether the performance degradation of the unpackaged power device exceeds a preset range. 7.根据权利要求6所述的未封装功率器件芯片的可靠性测试方法,其特征在于,如果所述未封装功率器件的性能下降未超出所述预设范围,则认为所述未封装功率器件通过可靠性测试,否则,则认为所述未封装功率器件未通过所述可靠性测试。7. The reliability testing method of an unpackaged power device chip according to claim 6, wherein if the performance degradation of the unpackaged power device does not exceed the preset range, the unpackaged power device is considered to be Pass the reliability test; otherwise, it is considered that the unpackaged power device fails the reliability test. 8.一种未封装功率器件芯片的可靠性测试系统,应用于如权利要求1所述的可靠性测试方法,其特征在于,所述可靠性测试系统包括未封装功率器件、第一金属导线和第二金属导线,其中,所述未封装功率器件包括有源区和分压区域;所述分压区域设置在所述有源区的周围;所述有源区包括栅极、源极和漏极,其中所述栅极和源极设置在所述有源区的正面,而所述漏极设置在所述有源区的背面;所述栅极和源极通过金属导电胶相互短接,且所述第一金属导线通过所述金属导电胶连接到所述源极和栅极;所述第二金属导线通过金属导电胶连接到所述漏极。8. A reliability testing system of an unpackaged power device chip, applied to the reliability testing method as claimed in claim 1, wherein the reliability testing system includes an unpackaged power device, a first metal wire and The second metal wire, wherein the unpackaged power device includes an active area and a voltage division area; the voltage division area is arranged around the active area; the active area includes a gate, a source, and a drain electrode, wherein the gate and source are arranged on the front of the active region, and the drain is arranged on the back of the active region; the gate and the source are short-circuited to each other through metal conductive glue, And the first metal wire is connected to the source and the gate through the metal conductive glue; the second metal wire is connected to the drain through the metal conductive glue. 9.根据权利要求8所述的未封装功率器件芯片的可靠性测试系统,其特征在于,所述第一金属导线作为所述未封装功率器件的栅源连接线,所述第二金属导线作为所述未封装功率器件的漏极连接线。9. The reliability testing system for unpackaged power device chips according to claim 8, wherein the first metal wire is used as a gate-source connecting wire of the unpackaged power device, and the second metal wire is used as a gate-source connection wire of the unpackaged power device. The drain connection wire of the unpackaged power device. 10.根据权利要求9所述的未封装功率器件芯片的可靠性测试系统,其特征在于,所述可靠性连接系统同时包括多个未封装功率器件,且同一列或者同一排的未封装功率器件可以通过金属导电胶连接在同一个栅源连接线。10. The reliability test system for unpackaged power device chips according to claim 9, wherein the reliability connection system includes a plurality of unpackaged power devices at the same time, and unpackaged power devices in the same column or row It can be connected to the same gate-source connection line through metal conductive glue.
CN201710564701.1A 2017-07-12 2017-07-12 A reliability testing method and system for an unpackaged power device chip Pending CN107369632A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710564701.1A CN107369632A (en) 2017-07-12 2017-07-12 A reliability testing method and system for an unpackaged power device chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710564701.1A CN107369632A (en) 2017-07-12 2017-07-12 A reliability testing method and system for an unpackaged power device chip

Publications (1)

Publication Number Publication Date
CN107369632A true CN107369632A (en) 2017-11-21

Family

ID=60308015

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710564701.1A Pending CN107369632A (en) 2017-07-12 2017-07-12 A reliability testing method and system for an unpackaged power device chip

Country Status (1)

Country Link
CN (1) CN107369632A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109406979A (en) * 2018-09-27 2019-03-01 珠海格力电器股份有限公司 Method and device for estimating device reliability
CN109596964A (en) * 2018-12-26 2019-04-09 山东阅芯电子科技有限公司 The method and system of compatible a variety of environmental aging tests
CN112164416A (en) * 2020-09-21 2021-01-01 西安交通大学 A memory testing method, memory chip and memory system

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1165401A (en) * 1996-05-10 1997-11-19 三星电子株式会社 Testing apparatus for non-packaged semiconductor chip
CN1512171A (en) * 2002-12-27 2004-07-14 上海贝岭股份有限公司 Method for detecting package material reliability of plastic package chip carrier device with leads
CN201477168U (en) * 2009-08-18 2010-05-19 中芯国际集成电路制造(上海)有限公司 Wafer grade application and reliability testing device
CN105047578A (en) * 2015-07-17 2015-11-11 北京兆易创新科技股份有限公司 Method for evaluating transistor
CN105789182A (en) * 2016-04-29 2016-07-20 上海华力微电子有限公司 MOS structure used for packaging level reliability test and manufacturing method thereof
CN106019111A (en) * 2016-05-17 2016-10-12 杰华特微电子(杭州)有限公司 Chip testing method
US20170074923A1 (en) * 2012-03-02 2017-03-16 Taiwan Semiconductor Manufacturing Company, Ltd. Reliability testing method
CN106684008A (en) * 2015-11-05 2017-05-17 中芯国际集成电路制造(上海)有限公司 Reliability test structure of semiconductor device and test method thereof

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1165401A (en) * 1996-05-10 1997-11-19 三星电子株式会社 Testing apparatus for non-packaged semiconductor chip
CN1512171A (en) * 2002-12-27 2004-07-14 上海贝岭股份有限公司 Method for detecting package material reliability of plastic package chip carrier device with leads
CN201477168U (en) * 2009-08-18 2010-05-19 中芯国际集成电路制造(上海)有限公司 Wafer grade application and reliability testing device
US20170074923A1 (en) * 2012-03-02 2017-03-16 Taiwan Semiconductor Manufacturing Company, Ltd. Reliability testing method
CN105047578A (en) * 2015-07-17 2015-11-11 北京兆易创新科技股份有限公司 Method for evaluating transistor
CN106684008A (en) * 2015-11-05 2017-05-17 中芯国际集成电路制造(上海)有限公司 Reliability test structure of semiconductor device and test method thereof
CN105789182A (en) * 2016-04-29 2016-07-20 上海华力微电子有限公司 MOS structure used for packaging level reliability test and manufacturing method thereof
CN106019111A (en) * 2016-05-17 2016-10-12 杰华特微电子(杭州)有限公司 Chip testing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109406979A (en) * 2018-09-27 2019-03-01 珠海格力电器股份有限公司 Method and device for estimating device reliability
CN109596964A (en) * 2018-12-26 2019-04-09 山东阅芯电子科技有限公司 The method and system of compatible a variety of environmental aging tests
CN112164416A (en) * 2020-09-21 2021-01-01 西安交通大学 A memory testing method, memory chip and memory system

Similar Documents

Publication Publication Date Title
US9437678B2 (en) Fabrication method of semiconductor device, evaluation method of semiconductor device, and semiconductor device
US10192799B2 (en) Method and apparatus to model and monitor time dependent dielectric breakdown in multi-field plate gallium nitride devices
US20140363906A1 (en) Method of testing semiconductor device
CN107369632A (en) A reliability testing method and system for an unpackaged power device chip
CN106898562A (en) The method of the breakdown voltage of semiconductor structure and test grid oxic horizon
WO2023019659A1 (en) Test method and structure for locating faulty transistor
JP2000022142A (en) Semiconductor device and method of manufacturing semiconductor device
TWI801570B (en) Semiconductor device and manufacturing method thereof
US11222888B2 (en) Anti-static metal oxide semiconductor field effect transistor structure
CN103887194A (en) Parallel test device
US20190237458A1 (en) Semiconductor device having multiple gate pads
JP7508948B2 (en) Testing apparatus, testing method and manufacturing method
CN118969774B (en) Test structure, test method for test structure
US11756954B2 (en) Silicon carbide MOSFET with optional asymmetric gate clamp
CN110676189B (en) Test analysis method for determining failure position of GaN cascode device
CN223693129U (en) Test structure for high-side switching devices
KR101995331B1 (en) Semiconductor Devices and Testing Methods for Transistor's Performance Testing
CN107907743B (en) A test method for the resistance of a device when it is turned on
CN105810733A (en) Semiconductor device
CN104701298A (en) Gate oxide integrity testing structure and gate oxide integrity testing method
CN110783203A (en) Method for reducing threshold voltage of MOSFET after radiation recovery
CN204792800U (en) Power transistors with high-efficiency ESD protection
CN109671766B (en) Power mosfet
CN211507573U (en) Power device chip voltage withstand test structure
JP6971082B2 (en) Semiconductor device inspection method, semiconductor device manufacturing method, and inspection device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20171121

RJ01 Rejection of invention patent application after publication