CN107300727B - Antireflection film lens and preparation method thereof - Google Patents
Antireflection film lens and preparation method thereof Download PDFInfo
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- CN107300727B CN107300727B CN201710661710.2A CN201710661710A CN107300727B CN 107300727 B CN107300727 B CN 107300727B CN 201710661710 A CN201710661710 A CN 201710661710A CN 107300727 B CN107300727 B CN 107300727B
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- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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Abstract
The invention relates to an antireflection film lens, comprising: a substrate; an antireflection film plated on one surface of the base material; the antireflection film is composed of nine material layers from inside to outside; the nine material layers are formed by alternately plating low-refractive-index material layers and high-refractive-index material layers; the nine film layers from inside to outside are respectively: the first low refractive index material layer, the first high refractive index material layer, the second low refractive index material layer, the second high refractive index material layer, the third low refractive index material layer, the third high refractive index material layer, the fourth low refractive index material layer, the fourth high refractive index material layer, and the fifth low refractive index material layer. The antireflection film lens has stable structure, high firmness between film layers and good scratch resistance and mechanical properties.
Description
Technical Field
The invention relates to an antireflection film lens and a preparation method thereof.
Background
Chinese patent 201110434960.5 discloses a high strength anti-reflection film system structure. The antireflection film system structure is suitable for glass substrates such as S-FPL51, S-BSM81, LAK10 and the like, and MgF2 and AL2O3 material layers with medium refractive indexes are plated in the antireflection film. The anti-reflection film system structure is not suitable for plastic lenses, and the scratch resistance and mechanical property of the film layer are not strong enough, so that the requirements of the plastic lenses on the mechanical property of the anti-reflection film plated by the plastic lenses are not met.
The super-hard antireflection film of the P (plastic) lens is mainly applied to the fields of digital imaging and the like such as camera phones, built-in cameras of computers and vehicle cameras. A motion video camera (SDV) optical module.
In order to reduce the number of lenses used in the optical module and achieve the effects of simplifying the structure and saving the cost, the P (plastic) lenses are adopted to replace the spherical glass lenses, but due to the material characteristics of the P lenses: poor high temperature resistance (softening and deforming when the temperature exceeds 120 ℃), and products processed by adopting the existing coating process: the compactness of the film layer is poor, the firmness of the film layer is poor, and the scratch resistance is poor. The performance of the film layer can not meet the use requirement, and the service life is short.
Disclosure of Invention
The invention aims to provide an antireflection film lens which has stable structure, high firmness among film layers and good scratch resistance and mechanical property, and a preparation method of the antireflection film lens.
In order to achieve the above object, the present invention provides an antireflection film lens comprising:
a substrate;
an antireflection film plated on one surface of the base material;
the antireflection film is composed of nine material layers from inside to outside;
the nine material layers are formed by alternately plating low-refractive-index material layers and high-refractive-index material layers;
the nine film layers from inside to outside are respectively: the first low refractive index material layer, the first high refractive index material layer, the second low refractive index material layer, the second high refractive index material layer, the third low refractive index material layer, the third high refractive index material layer, the fourth low refractive index material layer, the fourth high refractive index material layer, and the fifth low refractive index material layer.
According to one aspect of the present invention, the thickness ranges of the first low refractive index material layer, the second high refractive index material layer, the third low refractive index material layer, the fourth high refractive index material layer, the fifth low refractive index material layer, the sixth high refractive index material layer, the seventh low refractive index material layer, the eighth high refractive index material layer, and the ninth low refractive index material layer are respectively: 189.93-193.75nm, 7.84-8nm, 26.4-26.94nm, 15.34-15.65nm, 19.29-19.68nm, 71.73-73.17nm, 10.34-10.54nm, 32.88-33.54nm and 97.51-99.47nm.
According to one aspect of the present invention, the material of the base material is an optical resin material.
According to one aspect of the present invention, the material of the base material is an F52R resin material having a refractive index nd=1.535 and an abbe number vd= 56.072 (-/+0.8%).
According to one aspect of the invention, the material of the low emissivity material layer is silicon dioxide.
According to one aspect of the present invention, the material of the high refractive index material layer is titanium pentoxide.
In order to achieve the above object, the present invention provides a method for preparing an antireflection film lens, comprising the steps of:
(a) Cleaning the substrate by adopting an ion source cleaning process;
(b) Nine low refractive index material layers and high refractive index material layers are plated alternately on one surface of a base material in a vacuum state to form an antireflection film;
(c) And (5) keeping a vacuum state after coating.
According to one aspect of the invention, the initial vacuum degree of the plated anti-reflection film is 2.5-3.0X10 -3 Pa, the temperature is 85-90 ℃, and the constant temperature time is 10-15min.
According to one aspect of the present invention, in the step (a), the ion source cleaning time is 0.5 to 1min.
According to one aspect of the invention, in step (a), the ion source parameters of the ion source cleaning process are set to a value or range of values,
according to one aspect of the present invention, in the step (b), the coating rate of each low refractive index material layer isThe vacuum pressure of the coating is 1.0-1.1X10 -2 Pa；
The coating rate of each high refractive index material layer isThe vacuum pressure of the coating is 1.4-1.5X10 - 2 Pa。
According to one aspect of the present invention, in the step (b), the ion source assisted vacuum coating method is used for coating, the ion source parameters are set to the following values or ranges of values,
according to one aspect of the present invention, in the step (c), the vacuum state is maintained for more than 5 minutes after the coating is completed.
According to the antireflection film lens disclosed by the invention, the glass lens in the prior art is replaced by the plastic lens, and the first low-refractive-index material layer, the first high-refractive-index material layer, the second low-refractive-index material layer, the second high-refractive-index material layer, the third low-refractive-index material layer, the third high-refractive-index material layer, the fourth low-refractive-index material layer, the fourth high-refractive-index material layer and the fifth low-refractive-index material layer with different thicknesses are plated on one surface of the plastic lens in sequence along the direction far away from the plastic lens, so that the structural stability, scratch resistance, mechanical property and firmness of the antireflection film lens are greatly improved compared with those of the prior art.
According to the method for preparing the antireflection film lens in the step (a), the ion source cleaning process is adopted to clean the substrate, so that the substrate is clean and pollution-free, and the antireflection film is plated on the surface of the substrate in the subsequent steps conveniently.
According to the method for preparing the antireflection film lens (b), film coating is carried out in vacuum with the constant temperature of 85-90 degrees, so that the pollution of external pollutants to film layers during film coating is avoided, different film coating rates and film coating pressures are adopted during the process of coating the low refractive index material layer and the high refractive index material layer, the film coating efficiency is improved, the firmness between the film layers is improved, and the strength and scratch resistance of the film layers are also improved.
According to the method for plating the antireflection film, 9 layers of low-refractive-index material layers with different thicknesses are plated on the base material alternately, and the low-refractive-index material layers are plated first, so that the strength of the plated film layer and the firmness between the film layers are greatly enhanced, and the scratch resistance of the film layers is greatly improved. In addition, in the coating process, the ion source with the parameters is adopted to assist in coating and oxygen and argon with different flow rates are filled, so that the coating efficiency is improved, and the firmness and scratch resistance of the film layer are further improved.
Drawings
FIG. 1 is a schematic view schematically showing the structure of an antireflection film lens according to an embodiment of the present invention;
FIG. 2 is a spectral diagram schematically illustrating an F52R resin lens antireflection film according to one embodiment of the present invention;
FIG. 3 is a spectral diagram schematically illustrating an F52R resin lens antireflection film according to another embodiment of the present invention;
fig. 4 is a spectrum characteristic diagram schematically showing an F52R resin lens antireflection film according to a third embodiment of the present invention.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required to be used in the embodiments will be briefly described below. It is apparent that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained from these drawings without inventive effort for a person of ordinary skill in the art.
In describing embodiments of the present invention, the terms "longitudinal," "transverse," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in terms of orientation or positional relationship shown in the drawings for convenience of description and simplicity of description only, and do not denote or imply that the devices or elements in question must have a particular orientation, be constructed and operated in a particular orientation, so that the above terms are not to be construed as limiting the invention.
The present invention will be described in detail below with reference to the drawings and the specific embodiments, which are not described in detail herein, but the embodiments of the present invention are not limited to the following embodiments.
Fig. 1 is a schematic view schematically showing the structure of an antireflection film lens according to an embodiment of the present invention. As shown in fig. 1, an antireflection film lens according to the present invention includes a base material 1 and an antireflection film 2. The antireflection film 2 is plated on one surface of the base material 1, and the material of the base material 1 is made of an optical resin material according to the antireflection film lens of the present invention. In the present embodiment, the material of the base material 1 is an F52R resin material having a refractive index nd=1.535 and an abbe number vd= 56.072 (-/+0.8%). An antireflection film 2 is plated on the upper surface of the base material 1. The antireflection film 2 according to the present invention is composed of 9 material layers, 9 material layers are divided into two kinds of low refractive index material layers and high refractive index material layers, and 9 material layers are composed of low refractive index material layers and high refractive index material layers alternately arranged, and 9 material layers are respectively a first low refractive index material layer 201, a first high refractive index material layer 202, a second low refractive index material layer 203, a second high refractive index material layer 204, a third low refractive index material layer 205, a third high refractive index material layer 206, a fourth low refractive index material layer 207, a fourth high refractive index material layer 208, and a fifth low refractive index material layer 209 in a direction away from the substrate 1, in other words, the antireflection film 2 is formed by plating the first low refractive index material layer 201, the first high refractive index material layer 202, the second low refractive index material layer 203, the second high refractive index material layer 204, the third low refractive index material layer 205, the third high refractive index material layer 206, the fourth low refractive index material layer 207, the fourth high refractive index material layer 208, and the fifth low refractive index material layer 209 in this order on the surface of the substrate 1.
According to the antireflection film 2 of the present invention, it is divided into low refractive index material layers and high refractive index material layers, wherein the materials of all low refractive index material layers are silica, and the materials of all high refractive index material layers are titanium pentoxide. In this embodiment mode, the first low refractive index material layer 201, the first high refractive index material layer 202, the second low refractive index material layer 203, the second high refractive index material layer 204, the third low refractive index material layer 205, the third high refractive index material layer 206, the fourth low refractive index material layer 207, the fourth high refractive index material layer 208, and the fifth low refractive index material layer 209 according to the present invention have thicknesses ranging from 189.93 to 193.75nm, 7.84 to 8nm, 26.4 to 26.94nm, 15.34 to 15.65nm, 19.29 to 19.68nm, 71.73 to 73.17nm, 10.34 to 10.54nm, 32.88 to 33.54nm, and 97.51 to 99.47nm, respectively.
According to the antireflection film lens of the present invention, the glass lens in the prior art is replaced with the base material 1 of the F52R resin material, and the F52R resin lens is softer than the glass lens, has insufficient mechanical strength, has poor scratch resistance on the surface, and does not resist high temperature. In the case of such a material as a lens substrate, according to an embodiment of the present invention, the first low refractive index material layer 201, the first high refractive index material layer 202, the second low refractive index material layer 203, the second high refractive index material layer 204, the third low refractive index material layer 205, the third high refractive index material layer 206, the fourth low refractive index material layer 207, the fourth high refractive index material layer 208 and the fifth low refractive index material layer 209 are sequentially plated on one surface of the substrate 1 in a direction away from the substrate 1, so that the structural stability, scratch resistance and mechanical properties of the antireflection film lens and the firmness between the film layers are greatly improved, the temperature to which the corresponding lens can be subjected are also improved, and the hardness of the surface is higher.
According to the present invention, there is also provided a method for preparing the above antireflection film lens, comprising the steps of:
(a) Cleaning the substrate 1 by adopting an ion source cleaning process;
(b) Nine low refractive index material layers and high refractive index material layers are plated alternately on one surface of the base material 1 in a vacuum state to form an antireflection film;
(c) And after the vacuum state is continued, coating is completed. .
According to one embodiment of the present invention, in the step (a) above, the ion source parameters of the ion source cleaning process are set to the values or ranges of values in table 1 below,
TABLE 1
Table 1 shows ion source parameter setting data for cleaning the substrate 1 in step (a). According to one embodiment of the present invention, the substrate 1 is first placed in a vacuum environment, the parameters of the ion source for the ion beam energy and ion beam distribution density are set to 450V, 450mA, 480V, and 150% ratio, and then gas 1, gas 2, and gas 3 are simultaneously filled into the vacuum environment, wherein gas 1 is 60 seem oxygen, gas 2 is 10 seem argon, and gas 3 is 8 seem argon. The substrate 1 is cleaned for 0.5-1min by adopting an ion source cleaning process, so that the substrate 1 in a vacuum environment is clean and pollution-free, the subsequent step of plating the anti-reflection film 2 is convenient, the cleanliness of the substrate 1 is ensured, and the effect of increasing the adhesiveness of the first low-refractive-index material layer and the substrate 1 can be achieved.
In the present embodiment, after the substrate 1 is cleaned by the ion source cleaning process, the antireflection film 2 is plated on one surface of the substrate 1 by a plating machine. The temperature of the machine is 85-90 ℃ and needs to be kept for 10-15min, when the vacuum degree of the coating vacuum chamber reaches 2.5X10 -3 And starting coating at Pa. When coating, the coating speed of each low refractive index material layer is as followsThe coating pressure is 1.0-1.1×10 -2 Pa, coating rate of each high refractive index material layer is +.>The coating pressure is 1.4-1.5X10 -2 Pa. According to the invention, the coating is carried out in the vacuum with the constant temperature of 85-90 degrees in the step (b), so that the pollution of external pollutants to the film layer during coating is avoided, the low-refractive-index material layer and the high-refractive-index material layer are coated by adopting the parameter setting, the coating efficiency is improved, the firmness between the film layers is improved, and the strength and scratch resistance of the film layers are also improved.
In the present embodiment, the specific step of plating the antireflection film 2 on one surface of the base material 1 in the step (b) is as follows:
1) Plating the first low refractive index material layer 201 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 310s, and the coating thickness is 189.93nm.
2) Plating the first high refractive index material layer 202 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 19s, and the coating thickness is 7.84nm.
3) Plating the second low refractive index material layer 203 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 43s, and the coating thickness is 26.4nm.
4) Plating the second high refractive index material layer 204 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 37s, and the coating thickness is 15.34nm.
5) Plating the third low refractive index material layer 205 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 32s, and the coating thickness is 19.29nm.
6) Plating the third high refractive index material layer 206 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 178s, and the coating thickness is 71.73nm.
7) A fourth low refractive index material layer 207 is plated at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 17s, and the coating thickness is 10.34nm.
8) Plating fourth high refractive index material layer 208 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 82s, and the coating thickness is 32.88nm.
9) Plating a fifth low refractive index material layer 209 at a plating rate ofThe coating pressure is 1.0-1.1X10 -2 Pa, the coating time is 163s, and the coating thickness is 97.51nm.
In addition, in the present embodiment, an ion source bombardment-assisted plating film is also used in the plating process. The ion source parameters are set to the values or ranges of values in table 2 below,
TABLE 2
Table 2 shows the parameter settings of the high energy ion source bombardment-assisted coating. When the vacuum degree of the coating vacuum chamber reaches 2.5 multiplied by 10 -3 High energy ion after Pa starts coating filmThe sub-source starts auxiliary coating. When the first low refractive index material layer 201, the second low refractive index material layer 203, the third low refractive index material layer 205, the fourth low refractive index material layer 207, and the fifth low refractive index material layer 209 are plated, each parameter of the high energy ion source is set to 600V, 600mA, 580V, and 150% ratio. When the first high refractive index material layer 202, the second high refractive index material layer 204, the third high refractive index material layer 206 and the fourth high refractive index material layer 208 are plated, each parameter of the high energy ion source is set to be 850V, 700mA, 620V and 150% in ratio. As can be seen from table 2, the parameters of the high energy ion source are different when the low refractive index material layer is plated and the high refractive index material layer is plated, and the plating within the above set parameter ranges is beneficial to increasing the compactness between the material layers, and also can improve the hardness of the antireflection film 2. In addition, as can be seen from table 2, when the high energy ion source is used to assist in coating, gas 1, gas 2 and gas 3 are simultaneously charged into the coating vacuum chamber, and the charging gas 1, charging gas 2 and charging gas 3 are oxygen, argon and argon, respectively. When plating the low refractive index material layer, 60sccm oxygen and 8sccm argon are simultaneously filled, and when plating the high refractive index material layer, 75sccm oxygen, 10sccm argon and 8sccm argon are simultaneously filled. Meanwhile, the normal starting of the ion source can be ensured by filling oxygen and argon, and the different flow rates of the filled gases are beneficial to ensuring the mechanical properties of the coating film.
According to the method for plating the antireflection film 2, 9 layers of low-refractive-index material layers with different thicknesses are plated on the base material 1 alternately, and the low-refractive-index material layers are plated first, so that the strength and the firmness of the plated film layer are greatly enhanced, and the scratch resistance of the film layer is greatly improved. In addition, in the coating process, the ion source with the parameters is adopted to assist in coating and oxygen and argon with different flow rates are filled, so that the coating efficiency is improved, and the firmness and scratch resistance of the film layer are further improved.
In this embodiment, after the antireflection film 2 is plated on one surface of the substrate 1, at least a vacuum state needs to be maintained for 5 minutes, and after 5 minutes, the machine is inflated, and the inflated gas is air at this time, so that the pressure of the vacuum environment becomes 1 standard atmospheric pressure, and the lens after the plating is conveniently taken out.
Fig. 2 is a spectrum characteristic diagram schematically showing an F52R resin lens antireflection film according to an embodiment of the present invention. In the figure, the horizontal axis represents wavelength (nm) and the vertical axis represents reflectance (R%), and as can be seen from fig. 2, the reflectance of wavelengths 420 to 680nm ranges from 0 to 0.4%, which is less than the required reflectance of 0.6% of the antireflection film lens according to the present invention, that is, the antireflection effect of the antireflection film 2 plated according to the present embodiment meets the specification.
In accordance with another embodiment of the present invention, ion source parameter settings data for substrates cleaned using an ion source cleaning process are shown in table 3.
TABLE 3 Table 3
Table 3 shows ion source parameter setting data for cleaning the substrate 1 in step (a). In this embodiment, firstly, the substrate 1 is placed in a vacuum environment, each parameter of the ion source of the reactive ion beam energy and ion beam distribution density is set to be 550V, 550mA, 520V, and 160% of the ratio, then 65sccm of oxygen, 8sccm of argon and 6sccm of argon are simultaneously filled into the vacuum environment, and the substrate 1 is cleaned for 0.5-1min by adopting an ion source cleaning process, so that the substrate 1 in the vacuum environment is clean and pollution-free, and the subsequent steps of the plating of the antireflection film 2 are facilitated. Ensuring the cleanliness of the substrate 1 and achieving the effect of increasing the adhesiveness between the first low refractive index material layer and the substrate 1.
In the present embodiment, after the substrate 1 is cleaned by the ion source cleaning process, the antireflection film 2 is plated on one surface of the substrate 1 by a plating machine. The temperature of the machine is 85-90 degrees and needs to be kept for 10-15min, when the vacuum degree of the coating vacuum chamber reaches 2.5-3.0X10 -3 And starting coating at Pa. When coating, the coating speed of each low refractive index material layer is as followsThe coating pressure is 1.0-1.1X10 -2 Pa, each high refractionThe coating rate of the material layer is as followsThe coating pressure is 1.4-1.5X10 -2 Pa。
In the present embodiment, the specific step of plating the antireflection film 2 on one surface of the base material 1 in the step (b) is as follows:
1) Plating the first low refractive index material layer 201 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 316s, and the coating thickness is 193.75nm.
2) Plating the first high refractive index material layer 202 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 22s, and the coating thickness is 8.00nm.
3) Plating the second low refractive index material layer 203 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 46s, and the coating thickness is 26.94nm.
4) Plating the second high refractive index material layer 204 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 39s, and the coating thickness is 15.65nm.
5) Plating the third low refractive index material layer 205 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 35s, and the coating thickness is 19.68nm.
6) Plating the third high refractive index material layer 206 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 182s, and the coating thickness is 73.17nm.
7) A fourth low refractive index material layer 207 is plated at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 20s, and the coating thickness is 10.54nm.
8) Plating fourth high refractive index material layer 208 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 85s, and the coating thickness is 33.54nm.
9) Plating a fifth low refractive index material layer 209 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 166s, and the coating thickness is 99.47nm.
In addition, in the present embodiment, an ion source bombardment-assisted coating is also used in the coating process. The ion source parameters are set to the values or ranges of values in table 4 below,
TABLE 4 Table 4
Table 4 shows the parameter settings of the high energy ion source bombardment-assisted coating. When the vacuum degree of the coating vacuum chamber reaches 2.5 multiplied by 10 -3 After Pa starts coating, the high-energy ion source starts auxiliary coating. When the first low refractive index material layer 201, the second low refractive index material layer 203, the third low refractive index material layer 205, the fourth low refractive index material layer 207 and the fifth low refractive index material layer 209 are plated, each parameter of the high energy ion source is set to be 700V, 700mA, 620V and 160% in ratio. Plating the first high refractive index material layer 202, the secondWhen the high refractive index material layer 204, the third high refractive index material layer 206 and the fourth high refractive index material layer 208 are formed, the parameters of the high energy ion source are set to 950V, 750mA, 670V and 160%. Further, as shown in Table 4, when the low refractive index material layer was plated, the vacuum plating chamber was simultaneously filled with 60sccm oxygen gas and 8sccm argon gas, and when the high refractive index material layer was plated, the vacuum plating chamber was simultaneously filled with 75sccm oxygen gas, 10sccm argon gas and 8sccm argon gas. Meanwhile, the normal starting of the ion source can be ensured by filling oxygen and argon, and the different flow rates of the filled gases are beneficial to ensuring the mechanical properties of the coating film. After the antireflection film 2 was plated on one surface of the substrate 1, it was necessary to maintain the vacuum state for at least 5 minutes, and after 5 minutes, air was introduced into the machine to change the vacuum pressure to 1 standard atmospheric pressure.
Fig. 3 is a spectrum characteristic diagram schematically showing an F52R lens antireflection film according to another embodiment of the present invention. In the figure, the vertical axis represents wavelength (nm), the horizontal axis represents reflectance (R%), and as can be seen from fig. 3, the reflectance at wavelengths 420 to 680nm is less than 0.4%, and the antireflection effect of the antireflection film 2 plated according to the present embodiment meets the specification.
Ion source parameter settings data for substrates cleaned using an ion source cleaning process according to a third embodiment of the present invention are shown in table 5.
TABLE 5
Table 5 shows ion source parameter setting data for cleaning the substrate 1 in step (a). In this embodiment, the substrate 1 is first placed in a vacuum environment, the parameters of the ion source for the energy and the distribution density of the ion beam are set to be 500V, 500mA, 500V, and 155% in ratio, and then 62sccm of oxygen, 9sccm of argon and 7sccm of argon are simultaneously filled into the vacuum environment, and the substrate 1 is cleaned for 0.5-1min by adopting an ion source cleaning process, so that the cleanliness of the substrate 1 is ensured, and the effect of increasing the adhesiveness between the first low refractive index material layer and the substrate 1 can be achieved.
In the present embodiment, the ion source cleaning is performedAfter the substrate 1 is cleaned by the washing process, the antireflection film 2 is plated on one surface of the substrate 1 by a film plating machine. The temperature of the machine is 85-90 degrees and needs to be kept for 10-15min, when the vacuum degree of the coating vacuum chamber reaches 2.5-3.0X10 -3 And starting coating at Pa. When coating, the coating speed of each low refractive index material layer is as followsThe coating pressure is 1.0-1.1X10 -2 Pa, coating rate of each high refractive index material layer isThe coating pressure is 1.4-1.5X10 -2 Pa。
In the present embodiment, the specific step of plating the antireflection film 2 on one surface of the base material 1 in the step (b) is as follows:
1) Plating the first low refractive index material layer 201 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 313s, and the coating thickness is 191.83nm.
2) Plating the first high refractive index material layer 202 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 20s, and the coating thickness is 7.92nm.
3) Plating the second low refractive index material layer 203 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 45s, and the coating thickness is 26.67nm.
4) Plating the second high refractive index material layer 204 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 38s, and the coating thickness is 15.49nm。
5) Plating the third low refractive index material layer 205 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 34s, and the coating thickness is 19.48nm.
6) Plating the third high refractive index material layer 206 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 180s, and the coating thickness is 72.45nm.
7) A fourth low refractive index material layer 207 is plated at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 19s, and the coating thickness is 10.44nm.
8) Plating fourth high refractive index material layer 208 at a plating rate ofThe coating pressure is 1.5 multiplied by 10 -2 Pa, the coating time is 83s, and the coating thickness is 33.21nm.
9) Plating a fifth low refractive index material layer 209 at a plating rate ofThe coating pressure is 1.0 multiplied by 10 -2 Pa, the coating time is 165s, and the coating thickness is 98.48nm.
In addition, in the present embodiment, an ion source bombardment-assisted coating is also used in the coating process. The ion source parameters are set to the values or ranges of values in table 6 below,
TABLE 6
Table 6 shows the high energy ion source bombardmentAnd (5) clicking parameter setting data of the auxiliary coating film. When the vacuum degree of the coating vacuum chamber reaches 2.5 multiplied by 10 -3 After Pa starts coating, the high-energy ion source starts auxiliary coating. When the first low refractive index material layer 201, the second low refractive index material layer 203, the third low refractive index material layer 205, the fourth low refractive index material layer 207, and the fifth low refractive index material layer 209 are plated, various parameters of the high energy ion source are set to 650V, 650mA, 600V, and 155% in ratio. When the first high refractive index material layer 202, the second high refractive index material layer 204, the third high refractive index material layer 206 and the fourth high refractive index material layer 208 are plated, each parameter of the high energy ion source is set to 900V, 730mA, 650V and 155%. Further, as shown in Table 6, 62sccm oxygen and 7sccm argon were simultaneously introduced into the vacuum plating chamber during the plating of the low refractive index material layer, and 72sccm oxygen, 9sccm argon and 7sccm argon were simultaneously introduced during the plating of the high refractive index material layer. After the antireflection film 2 is plated on one surface of the substrate 1, it is necessary to keep the vacuum state for at least 5 minutes, and then air is introduced into the machine after 5 minutes.
Fig. 4 is a spectrum characteristic diagram schematically showing an F52R lens antireflection film according to a third embodiment of the present invention. In the figure, the vertical axis represents wavelength (nm), the horizontal axis represents reflectance (R%), and as can be seen from fig. 3, the reflectance at wavelengths 420 to 680nm is less than 0.4%, and the antireflection effect of the antireflection film 2 plated according to the present embodiment meets the specification.
According to the above embodiment of the present invention, the method and criteria for actually measuring the mechanical properties of the antireflection film lens are shown in table 7 below:
TABLE 7
Table 7 is a mechanical property test evaluation table of the antireflection film lens according to the present invention. As shown in table 7, according to the method for preparing an anti-reflection film lens of the present invention, although there are differences in ion source parameter setting, coating process parameter setting and inflation parameter setting, the anti-reflection film lens according to the three embodiments of the present invention is a good product, in which no film falling and no surface scratch phenomenon occurs after the test by the tape method, the wiping method and the pencil hardness test method in table 7. Likewise, the light splitting performance test is carried out on the antireflection film lens according to the three embodiments of the present invention, and all the light splitting performance tests meet the specification. It can be concluded from this that, in order to make the film layer of the antireflection film 2 stronger, stronger and more scratch resistant, the parameter settings of the ion source in steps (a) and (b) should be in the following numerical ranges:
the thickness ranges of the first low refractive index material layer 201, the first high refractive index material layer 202, the second low refractive index material layer 203, the second high refractive index material layer 204, the third low refractive index material layer 205, the third high refractive index material layer 206, the fourth low refractive index material layer 207, the fourth high refractive index material layer 208 and the fifth low refractive index material layer 209 are 189.93-193.75nm, 7.84-8nm, 26.4-26.94nm, 15.34-15.65nm, 19.29-19.68nm, 71.73-73.17nm, 10.34-10.54nm, 32.88-33.54nm and 97.51-99.47nm, respectively.
The foregoing is merely exemplary of embodiments of the present invention and, as for devices and structures not explicitly described herein, it should be understood that they may be implemented using general purpose devices and general purpose methods known in the art.
The above description is only one embodiment of the present invention and is not intended to limit the present invention, and various modifications and variations of the present invention will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (12)
1. An antireflection film lens comprising:
a base material (1);
an antireflection film (2) plated on one surface of the base material (1); it is characterized in that the method comprises the steps of,
the antireflection film (2) is composed of nine material layers from inside to outside;
the nine material layers are formed by alternately plating low-refractive-index material layers and high-refractive-index material layers;
the nine film layers from inside to outside are respectively: a first low refractive index material layer (201), a first high refractive index material layer (202), a second low refractive index material layer (203), a second high refractive index material layer (204), a third low refractive index material layer (205), a third high refractive index material layer (206), a fourth low refractive index material layer (207), a fourth high refractive index material layer (208), and a fifth low refractive index material layer (209);
the thickness ranges of the first low refractive index material layer (201), the first high refractive index material layer (202), the second low refractive index material layer (203), the second high refractive index material layer (204), the third low refractive index material layer (205), the third high refractive index material layer (206), the fourth low refractive index material layer (207), the fourth high refractive index material layer (208) and the fifth low refractive index material layer (209) are respectively: 189.93-193.75nm, 7.84-8nm, 26.4-26.94nm, 15.34-15.65nm, 19.29-19.68nm, 71.73-73.17nm, 10.34-10.54nm, 32.88-33.54nm and 97.51-99.47nm.
2. The antireflection film lens according to claim 1, wherein the material of the base material (1) is an optical resin material.
3. The antireflection film lens according to claim 2, wherein the material of the base material (1) is F52R resin material having a refractive index nd=1.535 and abbe number vd= 56.072 (-/+0.8%).
4. The antireflection film lens of claim 3 wherein the material of the low refractive index material layer is silica.
5. The antireflection film lens of any one of claims 1 to 4 wherein the material of the high refractive index material layer is titanium pentoxide.
6. A method of making an anti-reflection film lens according to any one of claims 1 to 5, comprising the steps of:
(a) Cleaning the substrate (1) by adopting an ion source cleaning process;
(b) Nine low-refractive-index material layers and high-refractive-index material layers are plated on one surface of a base material (1) alternately in a vacuum state to form an antireflection film;
(c) And after the vacuum state is continued, coating is completed.
7. The method of producing an antireflection film lens as claimed in claim 6, wherein the initial vacuum degree of the antireflection film plating is 2.5 to 3.0X10 -3 Pa, the temperature is 85-90 ℃, and the constant temperature time is 10-15min.
8. The method of claim 7, wherein the ion source cleaning time in step (a) is 0.5-1min.
9. The method of plating an antireflection film according to claim 8, wherein in the step (a),
setting the ion source parameters of the ion source cleaning process to the values or the value ranges;
wherein, the gases of the air charge 1, the air charge 2 and the air charge 3 are simultaneously charged into the vacuum coating chamber.
10. The method of claim 6, wherein in step (b), the coating rate of each low refractive index material layer isThe vacuum pressure of the coating is 1.0-1.1X10 -2 Pa；
The coating rate of each high refractive index material layer isThe vacuum pressure of the coating is 1.4-1.5X10 -2 Pa。
11. The method of producing an antireflection film lens as claimed in claim 10, wherein in the step (b),
coating by adopting an ion source assisted vacuum coating method, wherein the ion source parameters are set to be the numerical values or the numerical ranges;
wherein, the gases of the air charge 1, the air charge 2 and the air charge 3 are simultaneously charged into the vacuum coating chamber.
12. The method of claim 6, wherein in step (c), the vacuum state is maintained for 5 minutes or more after the coating is completed.
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| CN107643554A (en) * | 2017-11-01 | 2018-01-30 | 舜宇光学(中山)有限公司 | Antireflective film lens and preparation method thereof |
| CN108318944A (en) * | 2018-02-07 | 2018-07-24 | 无锡奥芬光电科技有限公司 | A kind of resin anti-reflection film and preparation method thereof |
| CN108897077A (en) * | 2018-09-04 | 2018-11-27 | 浙江舜宇光学有限公司 | Film layer structure and camera lens for resin lens |
| CN112305643A (en) * | 2020-11-06 | 2021-02-02 | 深圳惠牛科技有限公司 | Optical element, display module and method for reducing surface reflectivity of optical element |
| CN117826282A (en) * | 2023-12-02 | 2024-04-05 | 苏州晶生新材料有限公司 | Optical coating material and preparation method and application thereof |
| CN118151267B (en) * | 2024-05-09 | 2024-08-16 | 成都五阳致新光电科技有限公司 | Broadband ultra-low reflection AR antireflection film and preparation method thereof |
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