CN107213750B

CN107213750B - H (H) 2 Purification system and gas treatment system

Info

Publication number: CN107213750B
Application number: CN201710558308.1A
Authority: CN
Inventors: 张惊涛; 席向峰
Original assignee: Chengdu Sepmem Sci & Tech Co ltd
Current assignee: Chengdu Sepmem Sci & Tech Co ltd
Priority date: 2017-07-10
Filing date: 2017-07-10
Publication date: 2023-07-18
Anticipated expiration: 2037-07-10
Also published as: CN107213750A

Abstract

H (H) ₂ Purification system and gas treatment system relate to H ₂ The purification technical field. H ₂ The purification system comprises a raw material gas pipeline, a product gas pipeline, a reverse air discharge pipeline, a rotary valve and an adsorption tower. The rotary valve includes a non-rotating member having a first flow path and a rotating member having a second flow path. The rotating piece is rotated to enable the second flow passage to selectively communicate the raw material gas pipeline, the product gas pipeline, the reverse deflating pipeline and the adsorption tower. The gas treatment system comprises the H ₂ A purification system. Both use a rotary valve to control the multiple pipelines, thereby reducing the cost and facilitating the control.

Description

H (H) 2 Purification system and gas treatment system

Technical Field

The invention relates to H ₂ The technical field of purification, in particular to a method for preparing H ₂ Purification system and gas treatment system.

Background

Pressure swing adsorption purification of H ₂ The system comprises a plurality of operation steps, so that the number of the program control valves is very large, the investment cost and the equipment installation cost of the whole device are increased, and the valve frame area occupies a large area, so that the device is not easy to pry.

Pressure swing adsorption purification of H ₂ The system has the advantages that the switching frequency of the program-controlled valve is high due to short circulation time, and the failure probability of each part of the valve is greatly increased. Meanwhile, in the pressure swing adsorption pressure balancing process, the valve core is flushed by high-speed air flow, the sealing surface of the valve is easy to damage, the valve is internally leaked, the operation of the device is affected, the daily maintenance cost and the maintenance difficulty of the device are increased, the production time consumption is prolonged, and the production cost is increased.

Purification of H from current pressure swing adsorption ₂ In terms of the operation condition of the device, the failure of the program control valve or the internal leakage of the sealing surface are the biggest bottlenecks affecting the stable operation of the whole device. Although the service life of the programmable valve can be prolonged by improving the design of the valve and optimizing the structure of the sealing surface, the problems of failure of the programmable valve and internal leakage of the sealing surface cannot be fundamentally avoided.

Typically H ₂ The time of the adsorption operation is short (less than one second), so that the time is short, the programmable valve is required to be capable of responding quickly, the requirement on the programmable valve is very high, and the cost of the programmable valve is greatly increased.

Disclosure of Invention

It is a first object of the present invention to provide a method ofH ₂ The purification system replaces a complicated program control valve in the traditional multi-pipeline process through the rotary valve, achieves the purpose that one rotary valve simultaneously carries out switching control on a plurality of pipelines, remarkably reduces consumable materials of production equipment compared with the traditional program control valve, reduces equipment input cost, simultaneously enables control of the valve to be more convenient, reduces failure rate of the valve, and reduces maintenance cost.

The second object of the present invention is to provide a gas treatment system, which uses a rotary valve to replace a complicated programmable valve in a traditional multi-pipeline process, so as to realize the purpose of switching and controlling a plurality of pipelines by one rotary valve at the same time.

Embodiments of the present invention are implemented as follows:

h (H) ₂ The purification system comprises a raw material gas pipeline, a product gas pipeline, a reverse air discharge pipeline, a rotary valve and at least one adsorption tower. The adsorption tower is provided with a first interface and a second interface which are communicated with the adsorption cavity. The rotary valve comprises a non-rotating part and a rotating part capable of rotating relative to the non-rotating part, wherein the non-rotating part is provided with a first runner penetrating through the side wall of the non-rotating part, the first runner comprises a first sub-runner, a second sub-runner, a third sub-runner, a fourth sub-runner and a fifth sub-runner, and the rotating part is provided with a second runner. The first interface is communicated with the first sub-runner, the second interface is communicated with the second sub-runner, the raw material gas pipeline is communicated with the third sub-runner, the product gas pipeline is communicated with the fourth sub-runner, and the reverse air discharge pipeline is communicated with the fifth sub-runner.

The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during one rotation period of the rotary member: the second runner selectively communicates the first sub runner with the third sub runner, and simultaneously selectively communicates the second sub runner with the fourth sub runner, and for a single adsorption tower, the communication duration of the first sub runner with the third sub runner and the communication duration of the second sub runner with the fourth sub runner are all one fourth of the rotation period; the second flow passage selectively communicates the first sub flow passage with the fifth sub flow passage, and for a single adsorption tower, the communication duration of the first sub flow passage with the fifth sub flow passage occupies one twelfth of the rotation period.

Further, H ₂ The purification system further comprises a flushing gas inlet pipe and a first flushing gas outlet pipe, the first flow passage further comprises a sixth sub flow passage and a seventh sub flow passage, the flushing gas inlet pipe is communicated with the sixth sub flow passage, and the first flushing gas outlet pipe is communicated with the seventh sub flow passage. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the second runner selectively communicates the second sub runner with the sixth sub runner, and simultaneously selectively communicates the first sub runner with the seventh sub runner, and for a single adsorption tower, the communication duration of the second sub runner with the sixth sub runner and the communication duration of the first sub runner with the seventh sub runner are all one twelfth of the rotation period.

Further, H ₂ The purification system further comprises a final air charging pipeline, the first flow passage further comprises an eighth sub-flow passage, and the final air charging pipeline is communicated with the eighth sub-flow passage. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the second flow passage selectively communicates the second sub flow passage with the eighth sub flow passage, and for a single adsorption tower, the communication duration of the second sub flow passage with the eighth sub flow passage occupies twenty-fourth of the rotation period.

Further, H ₂ The purification system further comprises a second purge gas outlet conduit, the first flow passage further comprising a ninth sub-flow passage, the second purge gas outlet conduit being in communication with the ninth sub-flow passage. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the second runner selectively communicates the first sub runner with the ninth sub runner, and for a single adsorption tower, the communication duration of the first sub runner and the ninth sub runner accounts for one sixth of the rotation period.

Further, H ₂ The purification system further comprises a forward-bleed air pipeline, the first flow channel further comprises a tenth sub-flow channel, and the forward-bleed air pipeline is communicated with the tenth sub-flow channel. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the second flow passage willThe second sub-flow passage is selectively communicated with the tenth sub-flow passage, and for a single adsorption tower, the communication duration of the second sub-flow passage and the tenth sub-flow passage is twenty-fourth of the rotation period.

Further, the first connector, the second connector, the raw material gas pipeline, the product gas pipeline and the reverse air discharge pipeline are all connected with the non-rotating part.

Further, the second flow path includes a plurality of annular flow paths and a plurality of inter-layer flow paths; the annular runner is recessed from the outer wall of the rotating piece towards one side far away from the non-rotating piece, the annular runner is arranged along the circumferential direction of the rotating piece and is in a fan ring shape or a ring shape, the circle center of the circumference corresponding to the annular runner is positioned on the rotation axis of the rotating piece, and each interlayer runner is communicated with at least two annular runners. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the annular runner and the interlayer runner selectively communicate the first sub-runner with the third sub-runner, and simultaneously selectively communicate the second sub-runner with the fourth sub-runner; the annular runner and the interlayer runner selectively communicate the first sub-runner with the fifth sub-runner.

Further, the rotating member comprises a plurality of parallel and coaxially arranged unit layers, the axial leads of the unit layers are overlapped with the rotating axial lead of the rotating member, and each unit layer is provided with at least one annular flow channel.

Further, for any one of the sub-runners and one of the annular runners communicated with the sub-runner, along the circumferential direction of the rotating member, the ratio of the sum of the central angle degrees corresponding to the length of the annular runner and the aperture of the sub-runner to the peripheral angle degrees is a first ratio, the ratio of the flow time of the adsorption flow where the sub-runner is communicated with the annular runner and the corresponding adsorption tower is located to the one flow period is a second ratio, and the first ratio is equal to the second ratio.

Further, the adsorption towers are multiple, the first sub-flow channels and the second sub-flow channels are also multiple, each first sub-flow channel is communicated with at least one first interface, and each second sub-flow channel is communicated with at least one second interface; the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that the second flow passages selectively communicate the respective second sub-flow passages.

Further, the number of the adsorption towers, the first sub-runners and the second sub-runners is 12, the first interfaces are communicated with the first sub-runners in a one-to-one correspondence manner, and the second interfaces are communicated with the second sub-runners in a one-to-one correspondence manner. The rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during a rotation period: the annular flow channel and the interlayer flow channel are used for selectively communicating the second interfaces of at least two adsorption towers, and the communication duration of the second interface of one adsorption tower and the second interfaces of other adsorption towers is one third of the rotation period.

A gas treatment system comprising the H ₂ A purification system.

The embodiment of the invention has the beneficial effects that:

h provided by the embodiment of the invention ₂ The purification system replaces a complicated program control valve in the traditional multi-pipeline process by a rotary valve, so that the aim of switching and controlling a plurality of pipelines by one rotary valve is fulfilled. By rotating the rotating part of the rotary valve, the second flow passage can be selectively communicated with each sub-flow passage of the first flow passage, and then the adsorption tower is selectively communicated with each pipeline, so that each flow in the pressure swing adsorption is completed. Compared with the traditional program control valve, the consumable of production equipment is obviously reduced, the equipment input cost and the installation cost are reduced, the equipment installation is simplified, and the time consumption of equipment installation and disassembly is shortened. Meanwhile, the connection mode of the pipeline of the whole system can be controlled and adjusted by rotating the rotating part of the rotary valve, so that the operation burden of the valve during switching is greatly simplified, the control of the valve is more convenient, the failure rate of the valve is reduced, and the maintenance cost is reduced.

H provided by the embodiment of the invention ₂ The purification system can change the connection relation of the whole pipeline by rotating the rotary valve, and can effectively reduce the pressure swing adsorption cycle time by adjusting the rotating speed of a driving motor for driving the rotary valve or adjusting the setting of a timer, so that the operation time of an adsorption operation step is lower than 2 seconds, while the operation time of a conventional pressure swing adsorption program control valve cannot be lower than 2 seconds due to the limitation of the switching time of the program control valve. By reducing pressure swing adsorption cycles The ring time can make the adsorbent quickly perform adsorption work, so as to reduce the filling size of the adsorbent, and reduce the equipment cost investment. In addition, because the pressure swing adsorption cycle time is shortened, the size of the adsorption tower is reduced, the whole device is convenient to pry, and the manufacturing and mounting cost of the device is reduced. Meanwhile, the rotary valve can completely meet the requirement of H ₂ The purification system requires fast switching.

The gas treatment system provided by the embodiment of the invention can replace a complicated program control valve in the traditional multi-pipeline process by using the rotary valve, and simultaneously, the switching control is carried out on a plurality of pipelines.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 shows H provided by an embodiment of the present invention ₂ Schematic diagram of a purification system;

FIG. 2 is H in FIG. 1 ₂ A schematic cross-sectional view of a rotary valve of the purification system;

FIG. 3 is H in FIG. 1 ₂ A schematic plan view of the side wall of the non-rotating part of the rotary valve of the purifying system and the first flow passage after being cut and unfolded along the axial direction of the rotary valve;

FIG. 4 is H in FIG. 1 ₂ A second flow passage of a rotating member of a rotary valve of the purifying system is cut along the axial direction of the rotary valve and is unfolded to form a plan view schematic diagram;

FIG. 5 is H in FIG. 1 ₂ Schematic diagrams of circular arcs corresponding to annular runners and sub-runners of the purification system;

FIG. 6 is H in FIG. 1 ₂ Schematic of a seal for a purification systemA drawing.

Icon: 1000-H ₂ A purification system; 100-rotating the valve; 110-a rotating member; 120-non-rotating member; 130-a first flow channel; 131-a first sub-flow path; 131 a-sub-flow path; 131 b-sub-flow path; 131 c-sub-flow path; 131 d-sub-flow channels; 131 e-sub-flow path; 131 f-sub-flow path; 131 g-sub-flow channels; 131 h-sub-flow channels; 131 i-sub-flow channels; 131 j-sub-flow path; 131 k-sub-flow channels; 131 l-sub-flow channel; 132-a second sub-flow path; 132 a-sub-flow path; 132 b-sub-flow path; 132 c-sub-flow path; 132 d-sub-flow path; 132 e-sub-flow path; 132 f-sub-flow path; 132 g-sub-flow path; 132 h-sub-flow path; 132i—a sub-flow channel; 132 j-sub-flow path; 132 k-sub-flow path; 132 l-sub-flow channel; 133-a third sub-flow path; 134-fourth sub-flow path; 135-fifth sub-flow path; 136-sixth sub-flow path; 137-seventh sub-flow path; 138-eighth sub-flow path; 139-ninth sub-flow path; 1310-tenth sub-runner; 140-a second flow channel; 01-annular flow channel; 02-an annular flow channel; 03-annular flow channel; 04-annular flow channel; 041-annular flow channel; 042-annular flow channel; 043-annular flow channel; 044-annular flow channel; 05-an annular flow channel; 06-an annular flow channel; 07-annular flow channel; 08-annular flow channel; 081-annular flow channels; 082-annular flow channel; 083-annular flow channel; 084-annular flow channel; 085-annular flow channel; 086-annular flow channel; 087-annular flow channel; 088-annular flow channel; 089-annular flow channel; 0810-annular flow passage; 0811-annular flow passage; 0812-annular flow passage; 0813-annular flow passage; 09-annular flow channel; 010-annular flow channel; 001-interlayer flow channels; 002-interlayer flow channels; 003-interlayer flow channels; 004-interlayer flow channels; 005-interlayer flow channels; 006-inter-layer flow channels; 007-inter-layer flow channels; 008-interlayer flow channels; 009-inter-layer flow channels; 0010-interlayer flow channels; 0011-interlayer flow passages; 0012-interlayer flow passages; 0013-interlayer flow passages; 210-an adsorption tower; 210 a-a first interface; 210 b-a second interface; 211-an adsorption tower; 211 a-a first interface; 211 b-a second interface; 212-an adsorption tower; 212 a-a first interface; 212 b-a second interface; 213-adsorption tower; 213 a-a first interface; 213 b-a second interface; 214-an adsorption tower; 214 a-a first interface; 214 b-a second interface; 215-an adsorption column; 215 a-a first interface; 215 b-a second interface; 216-an adsorption tower; 216 a-a first interface; 216 b-a second interface; 217-adsorption column; 217 a-first interface; 217 b-a second interface; 218-an adsorption column; 218 a-a first interface; 218 b-a second interface; 219-an adsorption column; 219 a-a first interface; 219 b-a second interface; 2110-an adsorption tower; 2110 a-first interface; 2110 b-second interface; 2111-adsorption tower; 2111 a-first interface; 2111 b-second interface; 220-a raw material gas pipeline; 230-a product gas line; 240-a reverse bleed line; 250-final inflation line; 260-a purge gas inlet tube; 270 a-a first purge gas outlet conduit; 270 b-a second purge gas outlet conduit; 280-a forward air release pipeline; 290-connecting the tubes; 300-seals.

Detailed Description

For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.

Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.

It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.

The terms "first," "second," "third," and the like are used merely to distinguish between descriptions and are not to be construed as indicating or implying relative importance.

The terms "substantially," "essentially," and the like are intended to be interpreted as referring to the fact that the term is not necessarily to be construed as requiring absolute accuracy, but rather as a deviation.

In the description of the present invention, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.

Examples

Referring to fig. 1, the present embodiment provides an H ₂ Purification System 1000, H ₂ The purification system 1000 includes a rotary valve 100, an adsorption column unit (not shown), a feed gas line 220, a product gas line 230, a reverse bleed gas line 240, a final charge gas line 250, a purge gas inlet line 260, a first purge gas outlet line 270a, a second purge gas outlet line 270b, and a forward bleed gas line 280.

The raw gas line 220, the product gas line 230, the reverse bleed line 240, the final charge line 250, the purge gas inlet line 260, the first purge gas outlet line 270a, the second purge gas outlet line 270b, the forward bleed line 280, and the adsorption tower unit are all connected to the rotary valve 100. It should be noted that fig. 1 only shows the connection relationship between the above-mentioned respective pipes and the respective interfaces of the adsorption tower unit and the rotary valve 100, and fig. 1 is a schematic diagram of the connection relationship, and the connection positions are not limited.

The rotary valve 100 can selectively communicate the raw material gas line 220, the product gas line 230, the reverse bleed gas line 240, the final charge gas line 250, the purge gas inlet line 260, the first purge gas outlet line 270a, the second purge gas outlet line 270b, and the forward bleed gas line 280 with the adsorption tower unit during rotation, and can selectively communicate each adsorption tower in the adsorption tower unit with each other, so that the adsorption tower unit can smoothly complete the whole adsorption process.

H ₂ The purification system 1000 replaces a complicated program control valve in the traditional multi-pipeline process by the rotary valve 100, and achieves the aim of switching and controlling a plurality of pipelines by the rotary valve 100 at the same time. Compared with the traditional program control valve, the valve has the advantages that the consumable of production equipment is obviously reduced, the equipment input cost is reduced, the control on the switching of the valve and the pipeline is more convenient, and the valve is reduced The failure rate reduces the maintenance cost.

Referring to fig. 2, 3 and 4, the rotary valve 100 includes a rotary member 110 and a non-rotary member 120, and the rotary member 110 is rotatably accommodated in the non-rotary member 120. In the present embodiment, the rotating member 110 has a substantially cylindrical shape, the non-rotating member 120 is sleeved on the rotating member 110, the non-rotating member 120 is coaxially disposed with the rotating member 110, and an inner side wall of the non-rotating member 120 abuts against an outer side wall of the rotating member 110. In other embodiments of the present invention, the rotating member 110 may have a substantially cylindrical shape.

Further, the non-rotating member 120 has a first flow path 130, and the first flow path 130 includes a first sub-flow path 131, a second sub-flow path 132, a third sub-flow path 133, a fourth sub-flow path 134, a fifth sub-flow path 135, a sixth sub-flow path 136, a seventh sub-flow path 137, an eighth sub-flow path 138, a ninth sub-flow path 139, and a tenth sub-flow path 1310. The first flow channels 130 each penetrate the sidewall of the non-rotating member 120. The rotating member 110 has a second flow passage 140. The first flow channel 130 is used for communicating with the adsorption tower unit and each pipeline, and the adsorption state of the adsorption tower unit is indirectly controlled by controlling the communication relation between the first flow channel 130 and the second flow channel 140.

Further, the adsorption tower unit includes an adsorption tower 210, an adsorption tower 211, an adsorption tower 212, an adsorption tower 213, an adsorption tower 214, an adsorption tower 215, an adsorption tower 216, an adsorption tower 217, an adsorption tower 218, an adsorption tower 219, an adsorption tower 2110, and an adsorption tower 2111. Wherein the adsorption tower 210 has a first port 210a and a second port 210b in communication with the adsorption chamber thereof; the adsorption tower 211 has a first port 211a and a second port 211b communicating with its adsorption chamber; the adsorption tower 212 has a first interface 212a and a second interface 212b in communication with its adsorption cavity; the adsorption tower 213 has a first port 213a and a second port 213b in communication with the adsorption chamber thereof; the adsorption tower 214 has a first port 214a and a second port 214b in communication with its adsorption cavity; the adsorption tower 215 has a first port 215a and a second port 215b communicating with its adsorption chamber; the adsorption column 216 has a first port 216a and a second port 216b in communication with its adsorption cavity; the adsorption column 217 has a first port 217a and a second port 217b communicating with its adsorption chamber; the adsorption column 218 has a first port 218a and a second port 218b in communication with its adsorption cavity; the adsorption tower 219 has a first port 219a and a second port 219b in communication with its adsorption chamber; the adsorption tower 2110 has a first port 2110a and a second port 2110b communicating with the adsorption chamber thereof; the adsorption tower 2111 has a first port 2111a and a second port 2111b communicating with its adsorption chambers. The raw gas line 220, the product gas line 230, the reverse bleed line 240, the final charge line 250, the purge gas inlet line 260, the first purge gas outlet line 270a, the second purge gas outlet line 270b, the forward bleed line 280, and all the first ports and all the second ports are connected to the outer sidewall of the non-rotating member 120.

Each adsorption tower is filled with an adsorbent for adsorbing the impurity gas in the raw material gas, and hydrogen gas is purified by selective adsorption of the impurity gas by the adsorbent.

In the present embodiment, specifically, the first sub-flow passages 131 and the second sub-flow passages 132 are 12, and the 12 first sub-flow passages 131 and the 12 second sub-flow passages 132 are uniformly spaced along the circumferential direction of the non-rotating member 120.

The 12 first sub-runners 131 are connected and communicated with 12 first interfaces of the adsorption tower unit in a one-to-one correspondence manner; the 12 second sub-flow passages 132 are connected and communicated with 12 second interfaces of the adsorption tower unit in a one-to-one correspondence manner; the raw material gas pipeline 220 is connected and communicated with the third sub-runner 133; the product gas line 230 is connected to and communicates with the fourth sub-flow path 134; the reverse bleed air pipeline 240 is connected and communicated with the fifth sub-runner 135; the final charge line 250 is connected to and communicates with the eighth sub-flow path 138; the purge gas inlet tube 260 is connected to and communicates with the sixth sub-flow passage 136; the first purge gas outlet pipe 270a is connected to and communicates with the seventh sub-flow passage 137; the second purge gas outlet conduit 270b is connected to and communicates with the ninth sub-flow passage 139; the bleed conduit 280 is connected to and communicates with the tenth sub-runner 1310.

By rotating the rotating member 110, the rotating member 110 can rotate relative to the non-rotating member 120, so that the second flow channel 140 rotates relative to the first flow channel 130, thereby changing the communication relationship between the second flow channel 140 and the first flow channel 130, and further changing the whole H ₂ Pipeline connection of purification system 1000Through the relation, the aim of switching between different adsorption stages is fulfilled.

Please refer to fig. 3 and fig. 4. Fig. 3 is a schematic plan view of the side wall of the non-rotary member 120 and the first flow channel 130 after being cut and expanded along the axial direction of the rotary valve 100, and the side facing this is the inner side wall of the non-rotary member 120. Fig. 4 is a schematic plan view of the second flow path 140 of the rotary member 110 after being cut and expanded along the axial direction of the rotary valve 100, and the side facing toward us is the inner side of the rotary member 110.

In fig. 3 and 4, the plan-expanded views of the non-rotating member 120 and the rotating member 110 are partitioned. The planar deployment of the non-rotating member 120 and the rotating member 110 is divided into 24 consecutive small areas, numbered 1-24, along the circumference of the rotary valve 100, wherein the two areas 1 and 24 are connected prior to deployment, for convenience of illustration, the non-rotating member 120 and the rotating member 110 are deployed along the boundary of 1 and 24. Along the axial direction of the rotary valve 100, the rotary member 110 has a plurality of parallel and coaxially arranged unit layers, the axes of the unit layers are all overlapped with the rotation axis of the rotary member 110, and the unit layers respectively represent 10 layered regions, and are respectively numbered a-J. The areas A-J corresponding to the unit layers are arranged at intervals.

In an embodiment of the present invention, the widths of the first and second flow passages 130 and 140 refer to the width along the axial direction of the rotary valve 100, and the lengths of the first and second flow passages 130 and 140 refer to the length along the circumferential direction of the rotary valve 100. The lengths of the small areas numbered 1 to 24 in the circumferential direction of the rotary valve 100 are 1 lattice, and the widths of 10 small areas numbered a to J in the axial direction of the rotary valve 100 are equal.

Specifically, the second flow path 140 includes an annular flow path unit (not shown) and an interlayer flow path unit (not shown). The annular flow passage unit comprises a plurality of annular flow passages, the outer side walls of the rotating members 110 are recessed towards one side far away from the non-rotating members 120, the annular flow passages are all arranged along the circumference of the rotating members 110, the annular flow passages are in a fan ring shape or a ring shape, the circle centers of the circumferences corresponding to the annular flow passages are located on the rotating shaft line of the rotating members 110, and the rotating members 110 are rotated to enable the annular flow passages to be selectively communicated with the first flow passages 130. The annular flow channel is arranged in the area A-J corresponding to the unit layer. The interlayer runner unit comprises a plurality of interlayer runners, and the interlayer runners are used for communicating the two annular runners.

The annular flow passage is used for selectively communicating with the first flow passage 130, and the annular flow passage can be rotated by rotating the rotating member 110, so that the communication relation between the annular flow passage and the first flow passage 130 is changed. The interlayer flow channel is used for communicating the two annular flow channels, and the two sub-flow channels of the first flow channel 130 can be indirectly communicated by utilizing the indirect communication function of the interlayer flow channel, so that the adsorption towers and pipelines are mutually communicated, and the communication relationship between the adsorption towers and the pipelines can be changed by rotating the rotating piece 110, so that the control of H is realized ₂ The purpose of purifying the adsorption state of the system 1000.

It should be noted that, since the inner side wall of the non-rotating member 120 abuts against the outer side wall of the rotating member 110, the non-rotating member 120 has a sealing effect on the annular flow channel, so that the gas entering the annular flow channel cannot escape from between the non-rotating member 120 and the rotating member 110, and the gas in the annular flow channel can smoothly and accurately enter the preset path. In other embodiments of the present invention, the interlayer flow channel may be used to connect three or more annular flow channels, and the two annular flow channels may not necessarily be connected by only one interlayer flow channel, but may be connected by two or more interlayer flow channels.

Further, in the present embodiment, the annular flow passage unit includes an annular flow passage 01, an annular flow passage 02, an annular flow passage 03, an annular flow passage 04, an annular flow passage 05, an annular flow passage 06, an annular flow passage 07, an annular flow passage 08, an annular flow passage 09, and an annular flow passage 010.

More specifically, the annular flow channel 01 corresponds to the whole annular region of J1 to J24, and the annular flow channel 01 is annular. The annular flow channel 02 corresponds to the whole annular area I1-I24, and the annular flow channel 02 is also annular. The annular flow channel 03 corresponds to the whole annular area of H1-H24, and the annular flow channel 03 is also annular.

Annular flow channels 04 include annular flow channels 041, 042, 043, and 044. The annular flow channel 041 is a continuous fan ring shape corresponding to the G20-G1 area, wherein the length of the annular flow channel 041 in the G20 area is half of the length of the whole G20 area, namely the length of the annular flow channel 041 is 5.5 grids. Similarly, unless specified otherwise, it is indicated that the entire corresponding region is occupied. The annular flow channel 042 is a continuous fan ring shape corresponding to the G7-G10 area, wherein the length of the annular flow channel 042 in the G7 area is half of the length of the whole G7 area, namely the length of the annular flow channel 042 is 3.5 grids. The annular flow channel 043 is a continuous fan ring shape corresponding to the G11-G12 areas, wherein the length of the annular flow channel 043 in the G11 area is half of the length of the whole G11 area, namely the length of the annular flow channel 043 is 1.5 lattice. The annular flow channel 044 is a continuous fan ring shape corresponding to the G13-G14 areas, wherein the length of the annular flow channel 044 in the G13 area is half of the length of the whole G13 area, namely the length of the annular flow channel 044 is 1.5 lattice.

The annular flow passage 05 corresponds to the whole annular area of F1-F24, and the annular flow passage 05 is also annular. The annular flow channel 06 corresponds to the whole annular area of E1-E24, and the annular flow channel 06 is also annular. The annular flow channel 07 corresponds to the whole annular region of D1-D24, and the annular flow channel 07 is also annular.

Annular flow channel 08 includes annular flow channel 081, annular flow channel 082, annular flow channel 083, annular flow channel 084, annular flow channel 085, annular flow channel 086, annular flow channel 087, annular flow channel 088, annular flow channel 089, annular flow channel 0810, annular flow channel 0811, annular flow channel 0812 and annular flow channel 0813.

The annular flow channel 081 is a continuous fan ring shape corresponding to the C20-C1 region, wherein the length of the annular flow channel 081 in the C20 region is half of the length of the whole C20 region, namely the length of the annular flow channel 081 is 5.5 grids.

The annular runner 082 is a continuous fan ring shape corresponding to the C2 region, wherein the length of the annular runner 082 in the C2 region is half of the length of the entire C2 region, i.e. the length of the annular runner 082 is 0.5 grid, and the distance between the annular runner 082 and the annular runner 081 is 0.5 grid.

The annular flow channel 083 is a continuous fan ring shape corresponding to the C3 region, wherein the length of the annular flow channel 083 in the C3 region is half of the length of the entire C3 region, that is, the length of the annular flow channel 083 is 0.5 grid, and the distance between the annular flow channel 082 and the annular flow channel 083 is 0.5 grid.

The annular flow channel 084 is a continuous fan ring shape corresponding to the C4 region, wherein the length of the annular flow channel 084 in the C4 region is half of the length of the entire C4 region, that is, the length of the annular flow channel 084 is 0.5 grid, and the distance between the annular flow channel 084 and the annular flow channel 083 is 0.5 grid.

The annular flow channel 085 is a continuous fan ring shape corresponding to the C5 region, wherein the length of the annular flow channel 085 in the C5 region is half of the length of the whole C5 region, that is, the length of the annular flow channel 085 is 0.5 lattice, and the distance between the annular flow channel 085 and the annular flow channel 084 is 0.5 lattice.

The annular flow channel 086 is a continuous fan ring shape corresponding to the C6 region, wherein the length of the annular flow channel 086 in the C6 region is half of the length of the whole C6 region, that is, the length of the annular flow channel 086 is 0.5 grid, and the distance between the annular flow channel 086 and the annular flow channel 085 is 0.5 grid.

The annular flow channel 087 is a continuous fan ring shape corresponding to the C7-C10 area, wherein the length of the annular flow channel 087 in the C7 area is half of the length of the whole C7 area, namely the length of the annular flow channel 087 is 3.5 grids, and the distance between the annular flow channel 087 and the annular flow channel 086 is 0.5 grid.

The annular flow channel 088 is a continuous fan ring shape corresponding to the C11-C12 region, wherein the length of the annular flow channel 088 in the C11 region is half of the length of the whole C11 region, namely the length of the annular flow channel 088 is 1.5 lattice, and the distance between the annular flow channel 088 and the annular flow channel 087 is 0.5 lattice.

The annular flow channel 089 is a continuous fan ring shape corresponding to the C15 region, wherein the length of the annular flow channel 089 in the C15 region is half of the length of the whole C15 region, that is, the length of the annular flow channel 089 is 0.5 lattice, and the distance between the annular flow channel 089 and the annular flow channel 088 is 2.5 lattice.

The annular runner 0810 is a continuous fan ring shape corresponding to the C16 area, wherein the length of the annular runner 0810 in the C16 area is half of the length of the whole C16 area, namely the length of the annular runner 0810 is 0.5 grid, and the distance between the annular runner 089 and the annular runner 0810 is 0.5 grid.

The annular runner 0811 is a continuous fan ring shape corresponding to the C17 area, wherein the length of the annular runner 0811 in the C17 area is half of the length of the whole C17 area, namely, the length of the annular runner 0811 is 0.5 grid, and the distance between the annular runner 0811 and the annular runner 0810 is 0.5 grid.

The annular runner 0812 is a continuous fan ring shape corresponding to the C18 area, wherein the length of the annular runner 0812 in the C18 area is half of the length of the whole C18 area, namely, the length of the annular runner 0812 is 0.5 grid, and the distance between the annular runner 0812 and the annular runner 0811 is 0.5 grid.

The annular runner 0813 is a continuous fan ring shape corresponding to the C19 area, wherein the length of the annular runner 0813 in the C19 area is half of the length of the whole C19 area, namely, the length of the annular runner 0813 is 0.5 grid, and the distance between the annular runner 0812 and the annular runner 0813 is 0.5 grid.

The annular flow passage 09 corresponds to the whole annular area of B1-B24, and the annular flow passage 09 is annular. The annular flow passage 010 corresponds to the whole annular area of A1-A24, and the annular flow passage 010 is annular.

The interlayer runner units include interlayer runner 001, interlayer runner 002, interlayer runner 003, interlayer runner 004, interlayer runner 005, interlayer runner 006, interlayer runner 007, interlayer runner 008, interlayer runner 009, interlayer runner 0010, interlayer runner 0011, interlayer runner 0012, and interlayer runner 0013.

Wherein the interlayer runner 001 communicates the annular runner 01 with the annular runner 041; the interlayer runner 002 communicates the annular runner 02 with the annular runner 044; the interlayer runner 003 communicates the annular runner 03 with the annular runner 043; the interlayer flow channel 004 communicates the annular flow channel 05 with the annular flow channel 042; interlayer flow channel 005 communicates annular flow channel 06 with annular flow channel 088; the interlayer flow channel 006 communicates the annular flow channel 06 with the annular flow channel 087; the interlayer flow path 007 communicates the annular flow path 07 with the annular flow path 089; interlayer runner 008 communicates annular runner 084 with annular runner 0812; interlayer flow channel 009 communicates annular flow channel 085 with annular flow channel 0811; interlayer flow path 0010 connects annular flow path 086 and annular flow path 0810; interlayer runner 0011 communicates annular runner 03 with annular runner 0813; interlayer runner 0012 communicates annular runner 082 with annular runner 09; the interlayer flow path 0013 communicates the annular flow path 081 with the annular flow path 010.

In this embodiment, each interlayer flow channel is a communication pipe provided on the rotating member 110, and each interlayer flow channel is used for communicating two specific annular flow channels, and does not interfere with other annular flow channels or other interlayer flow channels. More preferably, each interlayer flow passage is approximately arc-shaped, so that resistance to gas flow can be reduced, and stability in the gas flow process can be improved. In other embodiments of the present invention, the shape of each of the interlayer flow paths is not particularly limited and specified, and two specific annular flow paths may be connected. In other embodiments of the present invention, each of the interlayer flow paths may be a communication groove formed by recessing a sidewall of the rotating member 110 toward a side away from the non-rotating member 120, but is not limited thereto.

Further, in the present embodiment, the first flow channel 130 is a through hole penetrating the non-rotating member 120 along the radial direction of the non-rotating member 120. In the present embodiment, the interval between each first sub-runner 131 is 1.5 grid, the interval between each second sub-runner 132 is also 1.5 grid, and the length of each first sub-runner 131 and each second sub-runner 132 is 0.5 grid. The 12 first sub-runners 131 are a sub-runner 131a, a sub-runner 131b, a sub-runner 131c, a sub-runner 131d, a sub-runner 131e, a sub-runner 131f, a sub-runner 131g, a sub-runner 131h, a sub-runner 131i, a sub-runner 131j, a sub-runner 131k, and a sub-runner 131l, respectively. The 12 second sub-runners 132 are a sub-runner 132a, a sub-runner 132b, a sub-runner 132c, a sub-runner 132d, a sub-runner 132e, a sub-runner 132f, a sub-runner 132g, a sub-runner 132h, a sub-runner 132i, a sub-runner 132j, a sub-runner 132k, and a sub-runner 132l, respectively. The third sub-runner 133, the fourth sub-runner 134, the fifth sub-runner 135, the sixth sub-runner 136, the seventh sub-runner 137, the eighth sub-runner 138, the ninth sub-runner 139 and the tenth sub-runner 1310 are all one in number and each have a length of 0.5 grid. The sub-flow paths 131a, 132a, 133, 134, 135, 136, 137, 138, 139, and 1310 are arranged substantially linearly in the axial direction of the rotary valve 100.

It should be noted that, in other embodiments of the present invention, the first flow channel 130 may have other shapes, and the shape of the first flow channel 130 is not limited, so long as the first flow channel 130 may connect a specific annular flow channel and an external pipeline.

Specifically, in the present embodiment, the sub-flow passage 131a is located in the G2 region and at one end of the G2 region near the G1 region, and the first sub-flow passage 131 is used to communicate with the annular flow passage 04. The sub-flow passage 132a is located in the C2 region and at an end of the C2 region near the C1 region, and the second sub-flow passage 132 is used for communicating with the annular flow passage 08. The third sub-flow channel 133 is located in the region J2 and at one end of the region J2 near the region J1, and the third sub-flow channel 133 is used for communicating with the annular flow channel 01. The fourth sub-flow passage 134 is located in the area A2 and at one end of the area A2 near the area A1, and the fourth sub-flow passage 134 is used for communicating with the annular flow passage 010. The fifth sub-flow passage 135 is located in the I2 region and at one end of the I2 region near the I1 region, and the fifth sub-flow passage 135 is used for communicating with the annular flow passage 02. The sixth sub-flow passage 136 is located in the E2 region and at an end of the E2 region near the E1 region, and the sixth sub-flow passage 136 is used for communicating with the annular flow passage 06. The seventh sub-flow passage 137 is located in the H2 region and at an end of the H2 region near the H1 region, and the seventh sub-flow passage 137 is configured to communicate with the annular flow passage 03. The eighth sub-flow passage 138 is located in the B2 region and located at one end of the B2 region near the B1 region, and the eighth sub-flow passage 138 is used for communicating with the annular flow passage 09. The ninth sub-flow passage 139 is located in the F2 region and at an end of the F2 region near the F1 region, and the ninth sub-flow passage 139 is configured to communicate with the annular flow passage 05. The tenth sub-runner 1310 is located in the D2 region and is located at an end of the D2 region near the D1 region, and the tenth sub-runner 1310 is used for communicating with the annular runner 07.

It should be noted that, the indirect connection is between the 12 first interfaces and the 12 second interfaces and the non-rotating member 120. The connection tube 290 connects 12 first interfaces and 12 second interfaces to the non-rotating member 120. Namely: the connection pipe 290 connects the first interface 210a, the first interface 211a, the first interface 212a, the first interface 213a, the first interface 214a, the first interface 215a, the first interface 216a, the first interface 217a, the first interface 218a, the first interface 219a, the first interface 2110a, and the first interface 2111a with the sub-runner 131a, the sub-runner 131b, the sub-runner 131c, the sub-runner 131d, the sub-runner 131e, the sub-runner 131f, the sub-runner 131g, the sub-runner 131h, the sub-runner 131i, the sub-runner 131j, the sub-runner 131k, and the sub-runner 131l in a one-to-one correspondence, that is, the first interface 210a is communicated with the sub-runner 131a by the connection pipe 290, the first interface 211a is communicated with the sub-runner 131b by the connection pipe 290, and so on. The connection pipe 290 connects the second port 210b, the second port 211b, the second port 212b, the second port 213b, the second port 214b, the second port 215b, the second port 216b, the second port 217b, the second port 218b, the second port 219b, the second port 2110b, and the second port 2111b to the sub-flow path 132a, the sub-flow path 132b, the sub-flow path 132c, the sub-flow path 132d, the sub-flow path 132e, the sub-flow path 132f, the sub-flow path 132g, the sub-flow path 132h, the sub-flow path 132i, the sub-flow path 132j, the sub-flow path 132k, and the sub-flow path 132l in one-to-one correspondence. That is, the second port 210b communicates with the sub-flow channel 132a via the connecting pipe 290, the second port 211b communicates with the sub-flow channel 132b via the connecting pipe 290, and so on, which will not be described herein.

The following is combined with H ₂ Specific adsorption flow of purification system 1000 to rotary valve 100 and H ₂ Purification system 1000 is described in detail.

H ₂ The operational timing schedule for purification system 1000 is shown in table 1, wherein: a represents adsorption; E1D represents a fall; E2D represents two-step down; E3D represents three-step down; E4D represents four-average drop; PP represents forward release; d represents reverse discharge; p1 represents a first flush; p2 represents a second flush; E4R represents four liters; E3R represents three liters; E2R represents two samming; E1R represents a samming; FR represents the final boost. Each time sequence represents a time period of the same length.

Table 1H ₂ Operation time schedule of purification system 1000

Referring to fig. 3 and 4, an adsorption tower 210 is taken as an example, as shown in table 1As shown, when H ₂ At this point, when the purification system 1000 is about to enter sequence 1, the small area 1 of the rotating member 110 in fig. 4 coincides with the small area 1 of the non-rotating member 120 in fig. 3, and the small area 24 of the rotating member 110 coincides with the small area 24 of the non-rotating member 120. At this time, the annular flow channel 041 is about to communicate with the sub-flow channel 131a, and the annular flow channel 081 is about to communicate with the sub-flow channel 132a, and the adsorption tower 210 is about to enter the adsorption stage. Note that, the present invention is not limited to the above-described embodiments. At H ₂ Throughout the sequence of the purification system 1000, the rotational direction of the rotary member 110 is the direction K along the circumferential direction of the rotary valve 100, and the non-rotary member 120 remains stationary, i.e., the rotary member 110 rotates relative to the non-rotary member 120.

When H is ₂ The purification system 1000 enters sequence 1, the annular runner 041 is communicated with the sub-runner 131a, the annular runner 081 is communicated with the sub-runner 132a, and the adsorption tower 210 enters an adsorption stage.

Raw material gas enters the annular runner 01 through the third sub runner 133 by the raw material gas pipeline 220, then enters the annular runner 041 through the interlayer runner 001, enters the adsorption tower 210 through the sub runner 131a and the first connector 210a, and is adsorbed to obtain product gas H ₂ The second port 210b sequentially passes through the sub-runner 132a, the annular runner 081, the interlayer runner 0013, the annular runner 010 and the fourth sub-runner 134, and then enters the product gas pipeline 230 to be discharged. In the adsorption stage, the impurity gas in the raw material gas is basically adsorbed by the adsorbent, and the product gas contains little impurity gas or even no impurity gas.

Since the sum of the lengths of the annular runner 081 and the sub-runner 132a is 6 grids, and the sum of the lengths of the annular runner 041 and the sub-runner 131a is also 6 grids, the whole adsorption stage of the adsorption tower 210 lasts for a period corresponding to 6 grids, that is, the ratio of the adsorption stage of the adsorption tower 210 to the whole period is 6 grids/24 grids, which is equal to one fourth, and this is consistent with the ratio of the adsorption stage of the adsorption tower 210 to the whole time sequence period in the time sequence table being 6/24. The entire adsorption stage of the adsorption tower 210 lasts for the entire time sequence 1 to the time sequence 6.

It should be noted that the ratio of the lengths of the annular flow channel 041 and the sub flow channel 131a to the entire 24 cells is a first ratio, and the ratio of the lengths of the annular flow channel 081 and the sub flow channel 132a to the entire 24 cells is also a first ratioThe proportion of the adsorption phase to the whole time sequence period is a second proportion. Theoretically, the first ratio and the second ratio should be equal. It should be noted that, as shown in fig. 5, the length of the annular flow channel 041 refers to an arc length L3 corresponding to the annular flow channel 041 along the circumferential direction of the rotary valve 100, the length of the sub flow channel 131a refers to an arc length L2 corresponding to the aperture L1 of the sub flow channel 131a along the circumferential direction of the rotary valve 100, and specifically, the length of the sub flow channel 131a does not refer to the aperture L1 of the sub flow channel 131a, but refers to the arc length L2 corresponding to the aperture L1 of the sub flow channel 131a along the circumferential direction of the rotary valve 100. The length of L2 and L3 and the ratio of the circumference of the rotating member 110 are equal to the ratio of the corresponding phases to the whole time period. The ratio may also be expressed as a ratio of the sum of the degrees of the central angles corresponding to L2 and L3 to the circumferential angle, i.e., the ratio of the sum of the degrees of the central angles corresponding to L2 and L3 to the circumferential angle is equal to the ratio of the corresponding stage to the entire timing cycle. In this embodiment, the length ratio is used for simplicity. However, in the actual production process, the two proportions are difficult to be completely consistent, and a certain error generally exists as long as H is not influenced ₂ Certain errors are acceptable for proper functioning of purification system 1000. Therefore, it is also possible that the first ratio is equal to the second ratio. All annular flow channels and sub-flow channels meet this requirement.

With continued reference to fig. 3 and 4, when the adsorption phase of the adsorption tower 210 is just over and is about to enter a drop, i.e., the adsorption tower 210 is about to enter the timing 7, the small area 1 of the rotating member 110 coincides with the small area 7 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 081, and is about to communicate with the annular flow path 0813; sub-runner 131a has just been disconnected from annular runner 041. When the adsorption tower 210 enters the timing 7, the annular runner 0813 is communicated with the sub-runner 132a, and at this time, the annular runner 083 is communicated with the sub-runner 132e, and the interlayer runner 0011 communicates the annular runner 083 with the annular runner 0813, the adsorption tower 210 is communicated with the adsorption tower 214, the adsorption tower 210 is in a uniform descent stage, and the adsorption tower 214 is in a uniform ascent stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub-runner 132a and the annular runner 0813 is 1 cell, and the sum of the lengths of the sub-runner 132e and the annular runner 083 is also 1 cell, the duration of a ramp-down stage of the adsorption tower 210 and a ramp-up stage of the adsorption tower 214 are each twenty-fourth of the entire timing cycle. A ramp down phase of adsorption column 210 and a ramp up phase of adsorption column 214 continue for the entire time sequence 7.

When the first decreasing stage of the adsorption tower 210 is just finished and two decreasing stages are about to be entered, that is, when the adsorption tower 210 is about to enter the time sequence 8, the small area 1 of the rotating member 110 coincides with the small area 8 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 0813, and is about to communicate with the annular flow path 0812. When the adsorption tower 210 enters the time sequence 8, the annular runner 0812 is communicated with the sub-runner 132a, the annular runner 084 is communicated with the sub-runner 132f, the interlayer runner 008 communicates the annular runner 0812 with the annular runner 084, the adsorption tower 210 is communicated with the adsorption tower 215, the adsorption tower 210 is in a two-level-down stage, and the adsorption tower 215 is in a two-level-up stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub-flow path 132a and the annular flow path 0812 is 1 cell, and the sum of the lengths of the sub-flow path 132f and the annular flow path 084 is also 1 cell, the duration of the two-step-down stage of the adsorption tower 210 and the two-step-up stage of the adsorption tower 215 are each twenty-fourth of the entire timing cycle. The two ramp down phase of the adsorption column 210 and the two ramp up phase of the adsorption column 215 last for the entire time sequence 8.

When the two-step down stage of the adsorption tower 210 is just ended and is about to enter the three-step down stage, that is, when the adsorption tower 210 is about to enter the time sequence 9, the small area 1 of the rotating member 110 coincides with the small area 9 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 0812, and is about to communicate with the annular flow path 0811. When the adsorption tower 210 enters the time sequence 9, the annular runner 0811 is communicated with the sub-runner 132a, the annular runner 085 is communicated with the sub-runner 132g, the interlayer runner 009 communicates the annular runner 0811 with the annular runner 085, the adsorption tower 210 is communicated with the adsorption tower 216, the adsorption tower 210 is in a three-uniform-drop stage, and the adsorption tower 216 is in a three-uniform-rise stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub-flow path 132a and the annular flow path 0811 is 1 cell, and the sum of the lengths of the sub-flow path 132g and the annular flow path 085 is also 1 cell, the duration of the three-average-down stage of the adsorption tower 210 and the three-average-up stage of the adsorption tower 216 are each twenty-fourth of the entire timing cycle. The three-ramp down phase of adsorption column 210 and the three-ramp up phase of adsorption column 216 last for the entire time sequence 9.

When the three-average descending stage of the adsorption tower 210 is just finished and is about to enter the four-average descending stage, that is, when the adsorption tower 210 is about to enter the time sequence 10, the small area 1 of the rotating member 110 coincides with the small area 10 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 0811, and is about to communicate with the annular flow path 0810. When the adsorption tower 210 enters the time sequence 10, the annular runner 0810 is communicated with the sub-runner 132a, the annular runner 086 is communicated with the sub-runner 132h, the interlayer runner 0010 communicates the annular runner 0810 with the annular runner 086, the adsorption tower 210 is communicated with the adsorption tower 217, the adsorption tower 210 is in a four-uniform-drop stage, and the adsorption tower 217 is in a four-uniform-rise stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub-flow path 132a and the annular flow path 0810 is 1 cell, and the sum of the lengths of the sub-flow path 132h and the annular flow path 086 is also 1 cell, the duration of the four-ramp-down stage of the adsorption column 210 and the four-ramp-up stage of the adsorption column 217 are each twenty-fourth of the entire timing cycle. The four ramp down phase of adsorption column 210 and the four ramp up phase of adsorption column 217 last for the entire time sequence 10.

When the four equal reduction stages of the adsorption tower 210 are just finished and are about to enter the forward discharge, that is, the adsorption tower 210 is about to enter the time sequence 11, the small area 1 of the rotating member 110 coincides with the small area 11 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 0810, and is about to communicate with the annular flow path 089. When the adsorption tower 210 enters the time sequence 11, the annular flow channel 089 is communicated with the sub-flow channel 132a, and the adsorption tower 210 is in the forward-discharge stage. While the sub-flow path 131a is in an open state. The forward-air flow is discharged from the forward-air-discharging pipeline 280 after passing through the sub-flow passage 132a, the annular flow passage 089, the interlayer flow passage 007, the annular flow passage 07 and the tenth sub-flow passage 1310 in sequence by the second connector 210 b.

In this stage, since the sum of the lengths of the sub-flow path 132a and the annular flow path 089 is 1 lattice, the duration of the forward-discharge stage of the adsorption tower 210 is twenty-fourth of the entire timing cycle. The forward stage of the adsorption tower 210 continues for the entire time sequence 11.

When the forward discharge stage of the adsorption tower 210 is just ended and the reverse discharge stage is about to be entered, that is, when the adsorption tower 210 is about to enter the timing 12, the small region 1 of the rotating member 110 coincides with the small region 12 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 089; while the sub-runner 131a is about to communicate with the annular runner 044. When the adsorption tower 210 enters the time sequence 12, the sub-runner 131a is communicated with the annular runner 044, the sub-runner 132a is in a disconnected state, and the adsorption tower 210 is in a reverse discharge stage. The reverse deflation is discharged from the reverse deflation pipeline 240 after sequentially passing through the sub-runner 131a, the annular runner 044, the interlayer runner 002, the annular runner 02 and the fifth sub-runner 135 by the first connector 210 a.

In this stage, since the sum of the lengths of the sub-flow path 131a and the annular flow path 044 is 2-cell, the duration of the reverse discharge stage of the adsorption tower 210 is twenty-four times of the entire timing cycle. The reverse discharge stage of the adsorption tower 210 continues for the entire time series 12 and 13.

When the reverse discharge stage of the adsorption tower 210 is just ended and the first flushing stage is about to be entered, that is, when the adsorption tower 210 is about to enter the time sequence 14, the small area 1 of the rotating member 110 coincides with the small area 14 of the non-rotating member 120. At this time, the sub-flow passage 131a is just disconnected from the annular flow passage 044 and is about to communicate with the annular flow passage 043; the sub-flow path 132a is about to communicate with the annular flow path 088. When the adsorption tower 210 enters the time sequence 14, the sub-runner 131a is communicated with the annular runner 043, the sub-runner 132a is communicated with the annular runner 088, and the adsorption tower 210 is in the first flushing stage. The flushing gas sequentially passes through the sixth sub-runner 136, the annular runner 06, the interlayer runner 005, the annular runner 088, the sub-runner 132a and the second interface 210b through the flushing gas inlet pipe 260, then enters the adsorption tower 210 to flush the adsorbent in the adsorption tower 210, and the flushed flushing gas sequentially passes through the sub-runner 131a, the annular runner 043, the interlayer runner 003, the annular runner 03 and the seventh sub-runner 137 through the first interface 210a and then is discharged through the first flushing gas outlet pipe 270 a.

In this stage, since the sum of the lengths of the sub-flow path 131a and the annular flow path 043 is 2 cells and the sum of the lengths of the sub-flow path 132a and the annular flow path 088 is also 2 cells, the duration of the first flushing stage of the adsorption tower 210 is twenty-four times the entire timing cycle. The first flushing stage of the adsorption tower 210 continues from the entire time sequence 14 to the time sequence 15.

When the first rinse phase of the adsorption tower 210 has just ended and is about to enter the second rinse phase, i.e., the adsorption tower 210 is about to enter the timing 16, the small area 1 of the rotating member 110 coincides with the small area 16 of the non-rotating member 120. At this time, the sub-flow passage 131a is just disconnected from the annular flow passage 043 and is about to communicate with the annular flow passage 042; the sub-flow path 132a is also just disconnected from the annular flow path 088 and is about to communicate with the annular flow path 087. When the adsorption tower 210 enters the time sequence 16, the sub-runner 131a is communicated with the annular runner 042, the sub-runner 132a is communicated with the annular runner 087, and the adsorption tower 210 is in the second flushing stage. The flushing gas sequentially passes through the sixth sub-runner 136, the annular runner 06, the interlayer runner 006, the annular runner 087, the sub-runner 132a and the second interface 210b through the flushing gas inlet pipe 260, then enters the adsorption tower 210 to flush the adsorbent in the adsorption tower 210, and the flushed flushing gas sequentially passes through the sub-runner 131a, the annular runner 042, the interlayer runner 004, the annular runner 05 and the ninth sub-runner 139 through the first interface 210a and then is discharged through the second flushing gas outlet pipe 270 b.

In this stage, since the sum of the lengths of the sub flow path 131a and the annular flow path 042 is 4 cells and the sum of the lengths of the sub flow path 132a and the annular flow path 087 is also 4 cells, the duration of the second flushing stage of the adsorption tower 210 is four twentieth of the entire timing cycle. The second rinse phase of the adsorption column 210 continues throughout the sequence 16 to sequence 19.

When the second flushing phase of the adsorption tower 210 has just ended and is about to enter the four-liter phase, i.e., when the adsorption tower 210 is about to enter the time sequence 20, the small area 1 of the rotating member 110 coincides with the small area 20 of the non-rotating member 120. At this time, the sub flow path 131a is just disconnected from the annular flow path 042; the sub-flow path 132a is just disconnected from the annular flow path 087 and is about to communicate with the annular flow path 086. When the adsorption tower 210 enters the timing sequence 20, the annular runner 086 is communicated with the sub-runner 132a, the annular runner 0810 is communicated with the sub-runner 132f, the interlayer runner 0010 communicates the annular runner 086 with the annular runner 0810, the adsorption tower 210 is communicated with the adsorption tower 215, the adsorption tower 210 is in a four-uniform-rise stage, and the adsorption tower 215 is in a four-uniform-drop stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub flow path 132a and the annular flow path 086 is 1 cell, and the sum of the lengths of the sub flow path 132f and the annular flow path 0810 is also 1 cell, the duration of the four-ramp-up stage of the adsorption tower 210 and the four-ramp-down stage of the adsorption tower 215 are each twenty-fourth of the entire timing cycle. The four-ramp-up phase of the adsorption column 210 and the four-ramp-down phase of the adsorption column 215 last for the entire time sequence 20.

When the four-lift phase of the adsorption tower 210 is just ended and the three-lift phase is about to be entered, that is, when the adsorption tower 210 is about to enter the time sequence 21, the small area 1 of the rotating member 110 coincides with the small area 21 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 086, and is about to communicate with the annular flow path 085. When the adsorption tower 210 enters the time sequence 21, the annular runner 085 is communicated with the sub-runner 132a, the annular runner 0811 is communicated with the sub-runner 132g, the interlayer runner 009 communicates the annular runner 085 with the annular runner 0811, the adsorption tower 210 is communicated with the adsorption tower 216, the adsorption tower 210 is in a three-uniform-rise stage, and the adsorption tower 216 is in a three-uniform-drop stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub flow path 132a and the annular flow path 085 is 1 cell, and the sum of the lengths of the sub flow path 132g and the annular flow path 0811 is also 1 cell, the duration of the three-equal-rise stage of the adsorption tower 210 and the three-equal-fall stage of the adsorption tower 216 are each twenty-fourth of the entire timing cycle. The three-ramp-up stage of adsorption column 210 and the three-ramp-down stage of adsorption column 216 continue for the entire time sequence 21.

When the three-ramp-up phase of the adsorption tower 210 is just ended and the two-ramp-up phase is about to be entered, that is, when the adsorption tower 210 is about to enter the timing sequence 22, the small area 1 of the rotating member 110 coincides with the small area 22 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 085, and is about to communicate with the annular flow path 084. When the adsorption tower 210 enters the time sequence 22, the annular runner 084 is communicated with the sub-runner 132a, the annular runner 0812 is communicated with the sub-runner 132h, the interlayer runner 008 is used for communicating the annular runner 084 with the annular runner 0812, the adsorption tower 210 is communicated with the adsorption tower 217, the adsorption tower 210 is in a two-uniform-rise stage, and the adsorption tower 217 is in a two-uniform-drop stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub flow path 132a and the annular flow path 084 is 1 cell and the sum of the lengths of the sub flow path 132h and the annular flow path 0812 is also 1 cell, the duration of the two-ramp-up stage of the adsorption tower 210 and the two-ramp-down stage of the adsorption tower 217 are each twenty-fourth of the entire timing cycle. The two-average rising stage of the adsorption column 210 and the two-average falling stage of the adsorption column 217 last for the entire time sequence 22.

When the two-lift phase of the adsorption tower 210 is just finished and the one-lift phase is about to be entered, that is, the adsorption tower 210 is about to enter the time sequence 23, the small area 1 of the rotating member 110 coincides with the small area 23 of the non-rotating member 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 084, and is about to communicate with the annular flow path 083. When the adsorption tower 210 enters the timing sequence 23, the annular runner 083 is communicated with the sub-runner 132a, the annular runner 0813 is communicated with the sub-runner 132i, the interlayer runner 0011 communicates the annular runner 083 with the annular runner 0813, the adsorption tower 210 is communicated with the adsorption tower 218, the adsorption tower 210 is in a uniform rise stage, and the adsorption tower 218 is in a uniform fall stage. While the sub-flow path 131a is in an open state.

In this stage, since the sum of the lengths of the sub-runner 132a and the annular runner 083 is 1 cell, and the sum of the lengths of the sub-runner 132i and the annular runner 0813 is also 1 cell, the duration of a ramp-up stage of the adsorption tower 210 and a ramp-down stage of the adsorption tower 218 is twenty-fourth of the entire timing cycle. An ramp-up phase of adsorption column 210 and a ramp-down phase of adsorption column 218 continue for the entire time sequence 23.

When a ramp-up phase of the adsorption column 210 has just ended and is about to enter the final ramp-up phase, i.e., when the adsorption column 210 is about to enter the timing 24, the small region 1 of the rotor 110 coincides with the small region 24 of the non-rotor 120. At this time, the sub flow path 132a is just disconnected from the annular flow path 083, and is about to communicate with the annular flow path 082. When the adsorption tower 210 enters the timing 24, the annular runner 082 is communicated with the sub-runner 132a, and the adsorption tower 210 is in the final pressure increasing stage. The sub-flow path 131a is still in an open state. The final inflation enters the adsorption tower 210 through the second interface 210b to perform final pressure boosting treatment on the adsorption tower 210 after sequentially passing through the eighth sub-runner 138, the annular runner 09, the interlayer runner 0012, the annular runner 082 and the sub-runner 132a by the final inflation pipeline 250.

In this stage, since the sum of the lengths of the sub-flow channels 132a and the annular flow channel 082 is 1 lattice, the duration of the final pressure-increasing stage of the adsorption tower 210 is twenty-fourth of the entire timing cycle. The final boost phase of the adsorption column 210 continues for the entire time sequence 24.

Thus, the adsorption tower 210 completes one time sequence period, and if the operation is continued, the adsorption tower 210 circulates according to the above-described flow. The timing of the other adsorption columns is similar to that of the adsorption column 210, and it can be derived from table 1 that the other adsorption columns are in different stages of timing, and the connection state and connection relation of the first flow path 130, the second flow path 140 and the entire piping. Please refer to fig. 3 and fig. 4 in conjunction with table 1, and details thereof are omitted herein.

From this, it can be derived that: h ₂ The purification system 1000 replaces the complicated program control valves in the traditional multi-pipeline process by the rotary valve 100, so that a plurality of program control valves are successfully replaced by one rotary valve 100, and the whole H is realized by one rotary valve 100 ₂ The purification system 1000 performs switching control. By rotating the rotary member 110 of the rotary valve 100, the second flow path 140 selectively communicates the sub-flow paths of the first flow path 130, and thus selectively communicates the adsorption towers with the pipelines, thereby completing the processes in the pressure swing adsorption.

Compared with the traditional program control valve, the material consumption of production equipment is obviously reduced, and the equipment investment cost and the installation cost are greatly reduced. And the equipment installation is simplified, and the time consumption for equipment installation and disassembly is shortened. At the same time, the whole H can be realized by only rotating the rotating member 110 of the rotary valve 100 ₂ Control and adjustment of connection relationship between each adsorption tower and each pipeline of purification system 1000 greatly simplifies H ₂ The purification system 1000 is configured to switch the adsorption state between H and H by the workload and operation load ₂ Control of purification system 1000 is furtherThe addition is convenient, and the production efficiency is greatly improved. Because the number of the valves is reduced to 1, the valve failure rate is greatly reduced, and H is improved ₂ The overall stability and safety of the purification system 1000 reduces maintenance costs and time loss.

H ₂ The purification system 1000 can change the connection relation of the whole system by rotating the rotary valve 100, and can effectively reduce the cycle time of the time sequence period by adjusting the rotation speed of the driving motor for driving the rotary valve 100 or adjusting the timer setting, so that the operation time of the adsorption operation step is possible to be lower than 2 seconds. For a conventional pressure swing adsorption programmable valve, the operation time of the operation steps cannot be lower than 2 seconds due to the limitation of the switching time of the programmable valve. And utilize H ₂ The purification system 1000 can make the adsorbent rapidly adsorb and desorb by reducing the cycle time of the time sequence period, thereby reducing the loading size of the adsorbent. Thus, the volume of the adsorption tower can be greatly reduced, and the equipment cost investment can be reduced. In addition, because the time sequence period cycle time is shortened, the volume of the adsorption tower is reduced, and the whole H is convenient ₂ Purification system 1000 is prized to reduce manufacturing and installation costs.

In other embodiments of the present invention, H ₂ The structure of the purification system may be different, and any one of the final air charging pipeline 250, the forward air discharging pipeline 280, the flushing air inlet pipe 260, the first flushing air outlet pipe 270a or the second flushing air outlet pipe 270b and the corresponding time sequence stage thereof can be used as a selectable item to be selectively added to H ₂ In a purification system. The number of the adsorption towers, the first flow channels and the second flow channels are correspondingly changed and deleted, and the time schedule is also different. These variations may be derived from a combination of the foregoing and are not further described herein.

Further, in other embodiments of the present invention, a pre-adsorption process may be added to H ₂ In the purification system, the times of pressure equalizing rise and pressure equalizing drop can be adjusted according to actual production needs. Correspondingly, the structures and the time schedule of the first flow channel and the second flow channel after the flow is added are correspondingly changed, and the changes can be according to the aboveThe adsorption flow principle of the adsorption tower 210 is described and is obtained in combination with table 1, fig. 3 and fig. 4, and will not be described again here.

Further, in the present embodiment, in order to improve the sealing effect between the rotating member 110 and the non-rotating member 120, one end of each annular flow passage of the rotating member 110, which is close to the non-rotating member 120, is provided with a sealing member 300 for improving the sealing effect, as shown in fig. 6. The sealing element 300 is arranged around each annular flow passage, the sealing element 300 is simultaneously propped against the rotating element 110 and the non-rotating element 120 in interference fit, the sealing element 300 is connected to the rotating element 110, and the sealing element 300 rotates along with the rotating element 110 relative to the non-rotating element 120. The sealing member 300 can further improve the sealing effect, prevent gas from escaping from between the fingers of the rotating member 110 and the non-rotating member 120, further prevent the gas in different flow channels from mixing, and ensure the purity of the gas. Specifically, in the present embodiment, the seal 300 is an elastic seal ring. It should be noted that, in other embodiments of the present invention, the sealing member 300 may also be disposed around an end of the first flow channel 130 near the rotating member 110.

In other embodiments of the present invention, the number of adsorption towers may be different, the first interfaces of the adsorption towers may also be in communication with the same first sub-flow channel, and the second interfaces of the adsorption towers may also be in communication with the same second sub-flow channel. At this time, the plurality of adsorption towers are at the same stage at the same timing. In other embodiments of the present invention, the first port of the same adsorption column may also be in communication with a plurality of first sub-channels simultaneously, and the second port of the same adsorption column may also be in communication with a plurality of second sub-channels simultaneously. At this time, the plurality of first flow passages and the plurality of second flow passages are both used for transporting the gas of the same adsorption tower at the same time.

In still other embodiments of the present invention, the rotary valve may be different in that the rotary member 110 of the rotary valve is fixed and non-rotatable, and the non-rotary member 120 may rotate relative to the rotary member 110. The second flow channel 140 is disposed on the inner side wall of the non-rotating member 120, and the first flow channel is disposed on the rotating member 110, which is different from the first flow channel 130, and enters the rotating member 110 from the end of the rotating member 110 and passes through the first flow channelThe side wall of the rotating member 110 penetrates the rotating member 110. In this case, the rotation of the non-rotating member 120 can realize the rotation of H ₂ Control of the purification system.

In still other embodiments of the present invention, the rotating member is cylindrical, and the non-rotating member is disposed at an end of the rotating member, and the rotating member is rotatable relative to the non-rotating member. At this time, the second flow passage is provided at an end of the rotating member near the non-rotating member, and the first flow passage penetrates the non-rotating member. In this case, the rotation member can also realize the rotation of H ₂ Control of the purification system. Similar variations are not listed here.

In still other embodiments of the present invention, the annular flow passage is not necessarily fan-shaped or annular, and may be other shapes as long as the corresponding function is achieved.

It should be noted that, in the embodiment of the present invention, the timing chart is not unique, and the timing chart may be formulated and adjusted according to actual production needs. After the timing schedule is modified, the first flow channel and the second flow channel are correspondingly adjusted. The structures of the first flow channel and the second flow channel are required to be corresponding to the corresponding time schedule, and the matching mode of the first flow channel and the second flow channel with the time schedule can be obtained by combining the above, which is not repeated here. In addition, in other embodiments of the present invention, the flushing in table 1 may be replaced by evacuation, and the second flow channel and the first flow channel also need to be changed in structure correspondingly, and the specific embodiment of the evacuation flow channel structure may be obtained by referring to the above description, which is not repeated herein.

On the other hand, in the embodiment of the invention, the positions and the arrangement order of each interlayer runner and each annular runner are not fixed, and the positions and the order of each interlayer runner and each annular runner can be flexibly adjusted according to actual needs. In addition, the positions of the respective sub-channels of the first channel 130 are not fixed, and may be changed and adjusted according to actual situations, so long as it is ensured that a specific sub-channel can communicate with a specific annular channel at a specific time. And these changes and adjustments may be made according to the actual timing schedule.

It is also possible to combine at least two H' s ₂ Purification system 1000 is arranged in series to form H ₂ The multi-stage purification system can further improve the product gas H ₂ Is a pure product of (a). And can also combine H ₂ And (3) backfilling desorption gas generated by a rear-stage system in the multi-stage purification system to a front-stage system for re-adsorption treatment so as to improve the recovery rate of effective gas and the purity of product gas.

In general, in the present embodiment, H ₂ The purification system 1000 replaces a complicated program control valve in the traditional multi-pipeline process by the rotary valve 100, and achieves the aim of switching and controlling a plurality of pipelines by one rotary valve 100. The cost is reduced, the failure rate is reduced, and the operation and control are more convenient.

The embodiment also provides a gas treatment system including H ₂ Purification system 1000. The gas treatment system utilizes the rotary valve to replace a complicated program control valve in the traditional multi-pipeline process, and simultaneously carries out switching control on a plurality of pipelines, compared with the traditional program control valve, the method has the advantages that the consumable of production equipment is obviously reduced, the equipment input cost is reduced, the control is more convenient, the fault rate is reduced, and the maintenance cost is reduced.

The embodiment also provides an H ₂ The purification method. The H is ₂ The purification method comprises rotating H ₂ The rotating member of the purification system such that during one rotation period of the rotating member: at least one time period during which the second flow passage communicates the at least one first sub-flow passage with the third sub-flow passage and simultaneously communicates the at least one second sub-flow passage with the fourth sub-flow passage. There is at least another time period during which the second flow passage communicates the at least one first sub-flow passage with the fifth sub-flow passage.

Further, H ₂ The purification method further comprises rotating the rotating member such that during the rotation period: at least one time period during which the second flow passage communicates the at least one second sub-flow passage with the sixth sub-flow passage and simultaneously communicates the at least one first sub-flow passage with the seventh sub-flow passage.

Further toGround, H ₂ The purification method further comprises rotating the rotating member such that during the rotation period: at least one time period during which the second flow passage communicates the at least one second sub-flow passage with the eighth sub-flow passage.

Further, H ₂ The purification method further comprises rotating the rotating member such that during the rotation period: at least one time period during which the second flow passage communicates the at least one first sub-flow passage with the ninth sub-flow passage.

Further, H ₂ The purification method further comprises rotating the rotating member such that during the rotation period: at least one time period during which the second flow passage communicates the at least one second sub-flow passage with the tenth sub-flow passage.

H provided in the present embodiment ₂ The purification method is convenient to implement and simple to operate, the connection mode of the pipeline of the whole system can be controlled and adjusted by rotating the rotating piece of the rotary valve, the operation burden of the valve during switching is greatly simplified, the control of the valve is more convenient, and the operation burden caused by simultaneously controlling a large-range control valve is avoided.

The above description is only of the preferred embodiments of the present invention and is not intended to limit the present invention, but various modifications and variations can be made to the present invention by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. H (H) ₂ The purification system is characterized by comprising a raw material gas pipeline, a product gas pipeline, a reverse bleed gas pipeline, a rotary valve and at least one adsorption tower; the adsorption tower is provided with a first interface and a second interface which are communicated with the adsorption cavity of the adsorption tower; the rotary valve comprises a non-rotating part and a rotating part capable of rotating relative to the non-rotating part, the non-rotating part is provided with a first runner penetrating through the side wall of the non-rotating part, the first runner comprises a first sub-runner, a second sub-runner, a third sub-runner, a fourth sub-runner and a fifth sub-runner, the rotating part is provided with a second runner, and the first interface and the first sub-runnerThe second interface is communicated with the second sub-runner, the raw material gas pipeline is communicated with the third sub-runner, the product gas pipeline is communicated with the fourth sub-runner, and the reverse deflating pipeline is communicated with the fifth sub-runner;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during one rotation cycle of the rotary member: the second runner selectively communicates the first sub-runner with the third sub-runner and simultaneously selectively communicates the second sub-runner with the fourth sub-runner, and for a single adsorption tower, the communication duration of the first sub-runner with the third sub-runner and the communication duration of the second sub-runner with the fourth sub-runner are all one quarter of the rotation period; the second flow passage selectively communicates the first sub flow passage with the fifth sub flow passage, and for a single adsorption tower, the communication duration of the first sub flow passage with the fifth sub flow passage accounts for one twelfth of the rotation period;

The adsorption towers are multiple, the first sub-flow channels and the second sub-flow channels are also multiple, each first sub-flow channel is communicated with at least one first interface, and each second sub-flow channel is communicated with at least one second interface; the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that the second flow passage selectively communicates the respective second sub-flow passages;

the second flow passage comprises a plurality of annular flow passages and a plurality of interlayer flow passages; the annular flow channel is recessed from the outer wall of the rotating piece towards one side far away from the non-rotating piece, the annular flow channel is arranged along the circumferential direction of the rotating piece and is in a fan ring shape or a ring shape, the circle center of the circumference corresponding to the annular flow channel is positioned on the rotating axial lead of the rotating piece, and each interlayer flow channel is communicated with at least two annular flow channels;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the annular runner and the interlayer runner selectively communicate the first sub-runner with the third sub-runner and simultaneously selectively communicate the second sub-runner with the fourth sub-runner; the annular runner and the interlayer runner selectively communicate the first sub-runner with the fifth sub-runner;

The rotating piece comprises a plurality of parallel and coaxially arranged unit layers, the axial leads of the unit layers are overlapped with the rotating axial lead of the rotating piece, and each unit layer is provided with at least one annular flow channel;

the H is ₂ The purification system further comprises a final air charging pipeline, the first flow channel further comprises an eighth sub-flow channel, and the final air charging pipeline is communicated with the eighth sub-flow channel;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the second flow passage selectively communicates the second sub flow passage with the eighth sub flow passage, and for a single adsorption tower, the communication duration of the second sub flow passage with the eighth sub flow passage is twenty-fourth of the rotation period.

2. H according to claim 1 ₂ Purification system, characterized in that the H ₂ The purification system further comprises a flushing gas inlet pipe and a first flushing gas outlet pipe, wherein the first flow passage further comprises a sixth sub-flow passage and a seventh sub-flow passage, the flushing gas inlet pipe is communicated with the sixth sub-flow passage, and the first flushing gas outlet pipe is communicated with the seventh sub-flow passage;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the second runner selectively communicates the second sub-runner with the sixth sub-runner, and simultaneously selectively communicates the first sub-runner with the seventh sub-runner, and for a single adsorption tower, the communication duration of the second sub-runner with the sixth sub-runner and the communication duration of the first sub-runner with the seventh sub-runner are all one-tenth of the rotation period.

3. According to claim 2Said H ₂ Purification system, characterized in that the H ₂ The purification system further comprises a second purge gas outlet conduit, the first flow path further comprising a ninth sub-flow path, the second purge gas outlet conduit in communication with the ninth sub-flow path;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the second flow passage selectively communicates the first sub flow passage with the ninth sub flow passage, and for a single adsorption tower, the communication duration of the first sub flow passage with the ninth sub flow passage is one sixth of the rotation period.

4. H according to claim 1 or 2 ₂ Purification system, characterized in that the H ₂ The purification system further comprises a forward-bleed air pipeline, the first flow channel further comprises a tenth sub-flow channel, and the forward-bleed air pipeline is communicated with the tenth sub-flow channel;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the second flow passage selectively communicates the second sub flow passage with the tenth sub flow passage, and for a single adsorption tower, the communication duration of the second sub flow passage with the tenth sub flow passage is twenty-fourth of the rotation period.

5. H according to claim 1 ₂ The purification system is characterized in that the first interface, the second interface, the raw material gas pipeline, the product gas pipeline and the reverse air discharge pipeline are all connected with the non-rotating piece.

6. H according to claim 1 ₂ A purification system, characterized in that, for any one of the sub-runners and one of the annular runners communicating with the sub-runner, the ratio of the sum of the numbers of central angles corresponding to the length of the annular runner and the aperture of the sub-runner to the number of peripheral angles is a first ratio along the circumferential direction of the rotating member, and the sub-runner is sucked correspondingly when communicating with the annular runnerThe ratio of the flow time of the adsorption flow in which the auxiliary tower is positioned to occupy one flow period is a second ratio, and the first ratio is equal to the second ratio.

7. H according to claim 1 ₂ The purification system is characterized in that the number of the adsorption towers, the number of the first sub-runners and the number of the second sub-runners are 12, the first interfaces are communicated with the first sub-runners in a one-to-one correspondence manner, and the second interfaces are communicated with the second sub-runners in a one-to-one correspondence manner;

the rotary member of the rotary valve is configured to rotate relative to the non-rotary member such that during the rotation period: the annular flow channel is selectively communicated with the second interfaces of at least two adsorption towers through the interlayer flow channel, and the communication duration of the second interface of one adsorption tower and the second interfaces of other adsorption towers is one third of the rotation period.

8. A gas treatment system comprising H as claimed in any one of claims 1 to 7 ₂ A purification system.