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CN106893975B - AlC/AlCN multilayer coating tool and its preparation process - Google Patents

AlC/AlCN multilayer coating tool and its preparation process Download PDF

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Publication number
CN106893975B
CN106893975B CN201710289472.7A CN201710289472A CN106893975B CN 106893975 B CN106893975 B CN 106893975B CN 201710289472 A CN201710289472 A CN 201710289472A CN 106893975 B CN106893975 B CN 106893975B
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coating
alcn
alc
depositing
electric arc
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CN106893975A (en
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宋文龙
王首军
周珂
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Xuzhou Geili Magnetic Industry Co ltd
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Jining University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635Carbides
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664Carbonitrides
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/341Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers

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  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The invention belongs to machine-building cutting tool fields, more particularly to a kind of AlC/AlCN laminated coating cutter and its preparation process.AlC/AlCN laminated coating cutter is prepared using non-balance magnetically controlled sputter+electric arc plating composite film coating method, tool matrix surface is AlCN coating, there is Ti transition zone between AlCN coating and tool matrix, is AlC coating and the alternate composite laminate coating structure of AlCN coating between AlCN coating and Ti transition zone.Preparation process depositing temperature control of the present invention is at 300 DEG C hereinafter, can prepare on more extensive tool matrix.AlC/AlCN laminated coating cutter obtained by the present invention combines the advantages of AlC coating and AlCN coating, with superior chemical stability and oxidation-resistance property, the friction and wear behavior of coated cutting tool can be significantly improved, improve working durability and the processing efficiency of cutter, the interface layer of the laminated composite structure can prevent the growth of coating column crystal simultaneously, the extension for hindering crackle and defect, improves the hardness, toughness and impact resistance of coating.

Description

AlC/AlCN laminated coating cutter and its preparation process
Technical field
The invention belongs to machine-building metal cutting tool fields, more particularly to a kind of AlC/AlCN laminated coating cutter And its preparation process.
Background technique
Carrying out coating treatment to cutter is to improve one of the important channel of cutting performance.Coated cutting tool is by tool matrix and firmly Matter coating combines, and greatly improves cutting performance.TiC and TiN coating is the coating applied on tool surface earliest.So And with the development of Machining Technology for Cutting and the popularization of High-speed Machining Technology, binary nitride hard coating is relatively weak Toughness and wearability limit its application.Document (ActaMaterials.2011,59 (1): 68-74) reports TiN hard conating The mechanism of action and service performance when Tool in Cutting is processed, but this hard conating is used due to relatively high coefficient of friction It is restricted.Coating by preparing multiple elements design structure can significantly improve the toughness, intensity and impact resistance etc. of coating Comprehensive performance, the multiple elements design structure of coating have become the important development direction of coated cutting tool.TiCN is most to make extensively at present Ternary carboritride coating, TiCN coating are significantly improved due to having both the high rigidity of TiC and the excellent toughness of TiN Its friction and wear behavior (JinlongLi, ShihongZhang, MingxiLi.InfluenceoftheC2H2flowrateong radientTiCNfilmsdepositedby multi-arcionplating[J].AppliedSurfaceScience,2013 (283): 134-144. it), is widely used to the processing of milling, tapping, punching press, molding and gear hobbing, in high-speed cutting than general The wearability of logical hard alloy cutter is 5-8 times high.But TiCN coating haves the shortcomings that thermal stability is poor, at high temperature coating hardness Decline too fast (red hardness is poor) and coefficient of friction increase, and limit its pushing away during high-speed cutting and green DRY CUTTING Wide application.
The carboritrides such as TiCN mainly pass through the preparation of the technologies such as chemical vapour deposition technique (CVD) at present, that is, pass through TiCl4(or Ti target), CH4(or C2H2) and N2Equal gas reactions generate, and depositing temperature is usually more than 400 DEG C, generate to matrix Adverse effect, while gaseous carbon sources are easy to pollute coating apparatus, constrain its extensive use.Chinese patent " steam turbine Rotor wheel slot cutter surface TiCN multi-layer composite coatings preparation process " (patent No. 201510564738.5) uses Ti, nitrogen (N2) and acetylene gas (C2H2) TiCN coating milling cutter is prepared under 450 DEG C of depositing temperatures, solve 26NiCrMov145 material Rotor machining problem.
Laminar composite has been developed in recent years Material reinforcement toughening new technology, and this structure is by imitating shellfish Shell, therefore it is called bionical laminated composite materials.The nacre of shell is a kind of natural layer structure material in nature, Its fracture toughness is but higher by 3000 times or more than common single homogeneous texture.Therefore, pass through mimic biology material structure form Interlayer design, the lamination composite coating prepared can significantly improve the toughness of current carboritride coating, stability and subtract The comprehensive performances such as wearability of rubbing.
Summary of the invention
For existing ternary carboritride coated cutting tool performance and the deficiency of preparation method, it is an object of that present invention to provide A kind of AlC/AlCN laminated coating cutter and its preparation process.
AlC/AlCN laminated coating cutter of the present invention, tool matrix outermost layer be AlCN coating, AlCN coating with There is Ti transition zone between tool matrix, is AlC and the alternate composite lamainated structure of AlCN between AlCN coating and Ti transition zone.
The preparation process of AlC/AlCN laminated coating cutter of the present invention, depositional mode are to be splashed using non-equilibrium magnetic controlled + composite film coating the method for electric arc plating is penetrated, electric arc plated deposition Ti transition zone is used first on tool matrix, 2 are used when deposition Electric arc Ti target, then using non-balance magnetically controlled sputter alternating deposit AlC and AlCN composite laminate, when deposition, uses 2 compound AlC Non-balance magnetically controlled sputter target, outermost layer are AlCN coating;Wherein, it is comprising weight fraction in AlC non-balance magnetically controlled sputter target The C of the Al and 15%-25t% of 75%-85%.
The material of tool matrix is high-speed steel, tool steel, mould steel, hard alloy, ceramics, diamond or cubic boron nitride One of.
The preparation process of the AlC/AlCN laminated coating cutter, the specific steps are as follows:
(1) to tool matrix surface pretreatment;
(2) tool matrix surface ion is cleaned;
(3) tool surface depositing Ti transition zone is plated in using electric arc;
(4) non-balance magnetically controlled sputter depositing Al C coating on Ti transition zone is used;
(5) non-balance magnetically controlled sputter depositing Al CN coating on AlC coating is used;
(6) non-balance magnetically controlled sputter depositing Al C coating on AlCN coating is used;
(7) (5), (6), (5) ... (5) are repeated, alternating deposit AlC coating, the total 100min of AlCN coating, last surface is AlCN coating;
(8) it post-processes: closing each power supply, ion source and gas source, coating terminates.
Wherein:
Tool matrix surface polishing first, is then sequentially placed into alcohol and acetone in step (1), and ultrasonic cleaning is each 40min, the impurity such as removal tool surface greasy dirt, rusty stain, is put into coating machine after dry, is evacuated to 6.0 × 10-3Pa is heated to 300 DEG C, keep the temperature 35~40min.
Lead to Ar gas in step (2) into coating machine, control pressure is 1.6Pa, opens grid bias power supply, voltage 800V, duty Than 0.4, Glow Discharge Cleaning 15min;Reduction is biased into 600V, opens ion source Ion Cleaning 10min, opens electric arc Ti target electricity Source, Ti target current 50A, bias 300V, 1~2min of ion bombardment.
0.5~0.6Pa of Ar air pressure is adjusted in step (3), bias is down to 200V, Ti target current 70A, 250 DEG C of depositing temperature, electric 5~7min of arc plated deposition Ti transition zone.
0.5~0.6Pa of Ar air pressure is adjusted in step (4), bias is adjusted to 250V, closes electric arc Ti target, non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating.
Step first turns on N in (5)2, N2Air pressure is 1.2Pa, Ar air pressure 0.5Pa, bias 200V, non-balance magnetically controlled sputter AlC target current 35A, 280 DEG C of depositing temperature, depositing Al CN 4~5min of coating, deposition closes N after the completion2
0.5~0.6Pa of Ar air pressure is adjusted in step (6), bias is adjusted to 250V, adjusts non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating.
AlC non-balance magnetically controlled sputter target of the present invention is prepared using vacuum hot-pressing, i.e., Al powder, C powder will be housed The mold of mixed powder is placed in vacuum hotpressing stove, the obtained by molding after hot pressed sintering.
The present invention is using AlC/AlCN laminated coating obtained by non-balance magnetically controlled sputter+electric arc plating composite film coating method Cutter, tool surface are AlCN coating, and tool matrix and painting interlayer have Ti transition zone, be between AlCN coating and Ti transition zone The alternate composite laminate coating structure of AlC and AlCN.Ti transition zone main function on matrix is slowed down because coating composition is mutated Caused by inter-laminar stress, improve the binding performance between coating and tool matrix.Al in coating not only plays solution strengthening effect, Fine and close Al can also be formed combined with oxygen2O3Protective film can improve the high temperature oxidation resistance of coating.The laminated composite structure simultaneously Interface layer can prevent the growth of coating column crystal, hinder the extension of crackle and defect, improve the hardness of coating, toughness and resistance to Impact.
Compared with prior art, the present invention having the advantages that.
The present invention using the plating of non-balance magnetically controlled sputter+electric arc composite film coating method, depositing temperature control 300 DEG C with Under, it can be prepared on more extensive tool matrix.Obtained AlC/AlCN laminated coating cutter combines superhard carbon nitridation The advantages of closing object coating, carbide coating and laminated construction, can obviously improve the physical mechanical property of conventional Ti CN coated cutting tool, The binding force between coating is set to improve 20%, the intensity and toughness of coating improve 15%, and stability and impact resistance improve 20- 30%, the high temperature oxidation resistance of coating improves 40%, reduces by 10% or more friction between cutter and chip, and cutter uses the longevity Life and cutting ability improve 30% or more.In addition, laminated construction passes through different materials structure and can at the interface layer being grouped as To slow down the too early extension peeled off with crackle of coating.Obtained AlC/AlCN laminated coating cutter can be widely applied to various The high-speed cutting processing of ferrous metal and non-ferrous metal has expanded the use scope of coated cutting tool.
Detailed description of the invention
The coating structure schematic diagram of Fig. 1, AlC/AlCN laminated coating cutter of the invention.
In figure: 1, tool matrix 2, Ti transition zone 3, AlC coating 4, AlCN coating 5, AlC coating and AlCN coating are alternate Laminated construction.
Specific embodiment
Highly preferred embodiment of the present invention is given below:
Embodiment 1
A kind of AlC/AlCN laminated coating cutter, the cutter are common cutter blade, basis material are as follows: hard alloy YG8, tool matrix outermost layer are AlCN coating, there is Ti transition zone, AlCN coating and Ti mistake between AlCN coating and tool matrix It crosses between layer as AlC coating and the alternate composite lamainated structure of AlCN coating.Depositional mode of the present invention is using non-equilibrium magnetic controlled The composite film coating method of sputtering+electric arc plating, uses electric arc plated deposition Ti transition zone first on tool matrix, and when deposition uses 2 A electric arc Ti target, then using non-balance magnetically controlled sputter alternating deposit AlC and AlCN composite laminate, when deposition, is compound using 2 AlC non-balance magnetically controlled sputter target, outermost layer are AlCN coating;Wherein, it is comprising weight fraction in AlC non-balance magnetically controlled sputter target The C of 75% Al and 25%.
Its specific preparation process are as follows:
(1) to tool matrix surface pretreatment: by tool matrix surface polishing, removing the impurity such as surface and oil contaminant, rusty stain, so After be sequentially placed into alcohol and acetone, be cleaned by ultrasonic each 40min, remove tool surface greasy dirt and other attachments, hair dryer is dry It is dry sufficiently after be put into coating machine rapidly, be evacuated to 6.0 × 10-3Pa is heated to 300 DEG C, keeps the temperature 35~40min;
(2) tool matrix surface ion is cleaned: logical Ar gas, pressure 1.6Pa, unlatching grid bias power supply, voltage 800V, Duty ratio 0.4, Glow Discharge Cleaning 15min;Reduction is biased into 600V, opens ion source Ion Cleaning 10min, opens electric arc Ti Target power supply, Ti target current 50A, bias 300V, 1~2min of ion bombardment;
(3) be plated in tool surface depositing Ti transition zone using electric arc: Ar 0.5~0.6Pa of air pressure, bias are down to 200V, Ti Target current 70A, 250 DEG C of depositing temperature, electric arc plates 5~7min of Ti transition zone;
(4) non-balance magnetically controlled sputter depositing Al C coating on Ti transition zone: Ar 0.5~0.6Pa of air pressure, bias tune is used To 250V, electric arc Ti target power supply is closed, opens non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating;
(5) it uses non-balance magnetically controlled sputter depositing Al CN coating on AlC coating: opening N2, N2Air pressure is 1.2Pa, Ar gas 0.5Pa is pressed, bias 200V, AlC target current 35A, 280 DEG C of depositing temperature, composite deposition AlCN 4~5min of coating, deposition is completed After close N2
(6) non-balance magnetically controlled sputter depositing Al C coating on AlCN coating: Ar 0.5~0.6Pa of air pressure, bias tune is used To 250V, non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating are adjusted;
(7) (5), (6), (5) ... (5), alternating deposit AlC coating, the total 100min of AlCN coating are repeated, outermost layer is AlCN coating;
(8) it post-processes: closing each power supply, ion source and gas source, coating terminates.
Embodiment 2
A kind of AlC/AlCN laminated coating cutter and preparation method thereof, the cutter are common fluted drill, tool matrix material Material are as follows: high speed steel W18Cr4V, tool matrix outermost layer are AlCN coating, there is Ti transition zone between AlCN coating and tool matrix, It is AlC coating and the alternate composite lamainated structure of AlCN coating between AlCN coating and Ti transition zone.Depositional mode of the present invention is Using non-balance magnetically controlled sputter+electric arc plating composite film coating method, the Ti transition of electric arc plated deposition is used first on tool matrix Layer uses 2 electric arc Ti targets when deposition, then using non-balance magnetically controlled sputter alternating deposit AlC and AlCN composite laminate, deposition Shi Caiyong 2 compound AlC non-balance magnetically controlled sputter targets, outermost layer are AlCN coating;Wherein, in AlC non-balance magnetically controlled sputter target C comprising the Al and 15% that weight fraction is 85%.
(1) tool matrix surface pretreatment: by tool matrix surface polishing, the impurity such as surface and oil contaminant, rusty stain are removed, then It is sequentially placed into alcohol and acetone, is cleaned by ultrasonic each 40min, remove tool surface greasy dirt and other attachments, hair dryer is dry It is put into coating machine rapidly after sufficiently, is evacuated to 6.0 × 10-3Pa is heated to 300 DEG C, keeps the temperature 35~40min;
(2) tool matrix surface ion cleans: logical Ar gas, pressure 1.6Pa open grid bias power supply, and voltage 800V is accounted for Empty ratio 0.4, Glow Discharge Cleaning 15min;Reduction is biased into 600V, opens ion source Ion Cleaning 10min, opens electric arc Ti target Power supply, Ti target current 50A, bias 300V, 1~2min of ion bombardment;
(3) be plated in tool surface depositing Ti transition zone using electric arc: Ar 0.5~0.6Pa of air pressure, bias are down to 200V, Ti Target current 70A, 250 DEG C of depositing temperature, electric arc plates 5~7min of Ti transition zone;
(4) non-balance magnetically controlled sputter depositing Al C coating on Ti transition zone: Ar 0.5~0.6Pa of air pressure, bias tune is used To 250V, electric arc Ti target power supply is closed, opens non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating;
(5) it uses non-balance magnetically controlled sputter depositing Al CN coating on AlC coating: opening N2, N2Air pressure is 1.2Pa, Ar gas Press 0.5Pa, bias 200V, non-balance magnetically controlled sputter AlC target current 35A, 280 DEG C of depositing temperature, composite deposition AlCN coating 4~ 5min, deposition close N after the completion2
(6) non-balance magnetically controlled sputter depositing Al C coating on AlCN coating: Ar 0.5~0.6Pa of air pressure, bias tune is used To 250V, non-balance magnetically controlled sputter AlC target current 30A, 4~5min of depositing Al C coating are adjusted;
(7) (5), (6), (5) ... (5) are repeated, alternating deposit AlC coating, the total 100min of AlCN coating, last surface is AlCN coating;
(8) it post-processes: closing each power supply, ion source and gas source, coating terminates.

Claims (1)

1. a kind of preparation process of AlC/AlCN laminated coating cutter, it is characterised in that: the material of tool matrix is high-speed steel, work Have one of steel, mould steel, hard alloy, ceramics, cutter outermost layer is AlCN coating, between AlCN coating and tool matrix There is Ti transition zone, is AlC coating and the alternate composite lamainated structure of AlCN coating between AlCN coating and Ti transition zone;Deposition side Formula is that electric arc plated deposition Ti is used first on tool matrix using non-balance magnetically controlled sputter+electric arc plating composite film coating method Transition zone uses 2 electric arc Ti targets when deposition, then using non-balance magnetically controlled sputter alternating deposit AlC coating and AlCN coating Composite laminate, 2 compound AlC non-balance magnetically controlled sputter targets are used when deposition, outermost layer is AlCN coating;Wherein, AlC is non-flat C comprising Al and 15%-25% that weight fraction is 75%-85% in weighing apparatus magnetic controlled sputtering target;The preparation process specifically includes following Step:
(1) pre-treatment: by tool matrix surface polishing, the impurity such as surface and oil contaminant, rusty stain is removed, alcohol and third are then sequentially placed into In ketone, it is cleaned by ultrasonic each 40 min, removes tool surface greasy dirt and other attachments, be put into plating rapidly after hair dryer drying sufficiently Film machine, is evacuated to 6.0 × 10-3Pa is heated to 300 DEG C, keeps the temperature 35 ~ 40 min;
(2) Ion Cleaning: logical Ar gas, pressure are 1.6 Pa, open grid bias power supply, 800 V of voltage, duty ratio 0.4, aura is put 15 min of electricity cleaning;Reduction is biased into 600 V, opens 10 min of ion source Ion Cleaning, opens electric arc Ti target power supply, Ti target electricity Flow 50 A, 300 V of bias, 1 ~ 2 min of ion bombardment;
(3) depositing Ti transition zone: 0.5 ~ 0.6 Pa of Ar air pressure, bias are down to 200 V, 70 A of Ti target current, depositing temperature 250 DEG C, electric arc plates 5 ~ 7 min of Ti transition zone;
(4) 0.5 ~ 0.6 Pa of depositing Al C layers: Ar air pressure, bias are adjusted to 250 V, close electric arc Ti target power supply, open magnetron sputtering 4 ~ 5 min of 30 A of AlC target current, depositing Al C layer;
(5) depositing Al CN layers: opening N2, N2Air pressure be 1.2 Pa, 0.5 Pa of Ar air pressure, 200 V of bias, 35 A of AlC target current, 280 DEG C of depositing temperature, 4 ~ 5 min of composite deposition AlCN layer;
(6) depositing Al C layers: closing N2, repeat (4);
(7) depositing Al CN layers: opening N2, repeat (5);
(8) (6), (7), alternating deposit AlC layers of (6) ..., AlCN layers, AlC layers ... AlCN layers of total 100min are repeated;
(9) it post-processes: closing each power supply, ion source and gas source, coating terminates.
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