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CN105887024B - TiCrN & MoS2/ Cr/Ti laminated coatings cutter and its preparation process - Google Patents

TiCrN & MoS2/ Cr/Ti laminated coatings cutter and its preparation process Download PDF

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CN105887024B
CN105887024B CN201610429654.5A CN201610429654A CN105887024B CN 105887024 B CN105887024 B CN 105887024B CN 201610429654 A CN201610429654 A CN 201610429654A CN 105887024 B CN105887024 B CN 105887024B
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coating
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CN105887024A (en
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宋文龙
邓建新
郭宗新
周珂
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Anhui Jinpeng Textile Co ltd
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Jining University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623Sulfides, selenides or tellurides
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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  • Inorganic Chemistry (AREA)
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  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

本发明属于机械制造金属切削刀具领域,特别是涉及一种TiCrN&MoS2/Cr/Ti叠层涂层刀具及其制备工艺。该刀具基体材料为高速钢、硬质合金、立方氮化硼或金刚石,刀具表面为MoS2/Ti/Cr润滑涂层,且由基体到涂层表面依次为:Ti过渡层、Ti/Cr过渡层、TiCrN硬质涂层和MoS2/Ti/Cr润滑涂层交替的复合叠层结构。该刀具综合了TiCrN多元硬质涂层、MoS2/Ti/Cr润滑涂层及叠层结构的优点,既具有较高的硬度,又具有润滑作用和较低的摩擦系数,使涂层刀具的性能有了显著地提高。

The invention belongs to the field of mechanically manufacturing metal cutting tools, and in particular relates to a TiCrN&MoS 2 /Cr/Ti laminated coating tool and a preparation process thereof. The base material of the tool is high-speed steel, hard alloy, cubic boron nitride or diamond, and the surface of the tool is MoS 2 /Ti/Cr lubricating coating, and the order from the base to the coating surface is: Ti transition layer, Ti/Cr transition layer, TiCrN hard coating and MoS 2 /Ti/Cr lubricating coating alternate composite laminated structure. The tool combines the advantages of TiCrN multi-component hard coating, MoS 2 /Ti/Cr lubricating coating and laminated structure. It not only has high hardness, but also has lubricating effect and low friction coefficient. Performance has been significantly improved.

Description

TiCrN&MoS2/Cr/Ti叠层涂层刀具及其制备工艺TiCrN&MoS2/Cr/Ti laminated coating tool and its preparation process

技术领域technical field

本发明属于机械制造金属切削刀具领域,特别是涉及一种TiCrN&MoS2/Cr/Ti叠层涂层刀具及其制备工艺。The invention belongs to the field of mechanically manufacturing metal cutting tools, and in particular relates to a TiCrN&MoS 2 /Cr/Ti laminated coating tool and a preparation process thereof.

背景技术Background technique

根据涂层材料的性质,涂层刀具可分为两大类,即:“高硬度”涂层刀具和“润滑”涂层刀具。“高硬度”涂层刀具其主要优点是硬度高、耐磨性能好,典型的“高硬度”涂层材料有TiN、 TiCN、TiAlN和类金刚石等。“润滑”涂层刀具追求的目标是低摩擦系数,典型的“润滑”涂层材料为具有低摩擦系数的固体润滑材料(如:MoS2、WS2、TaS2等硫化物)。当前刀具涂层的发展趋势是:涂层成分趋于多元化和复合化。复合涂层可综合单涂层的优点,复合多涂层及其相关技术的出现,既可提高涂层与基体的结合强度,又兼顾多种单涂层的综合性能,使涂层刀具的性能显著提高。According to the nature of the coating material, coated tools can be divided into two categories, namely: "hard" coated tools and "lubricated" coated tools. The main advantages of "high hardness" coating tools are high hardness and good wear resistance. Typical "high hardness" coating materials include TiN, TiCN, TiAlN and diamond-like carbon. The goal of "lubricating" coated tools is low friction coefficient. Typical "lubricating" coating materials are solid lubricating materials with low friction coefficient (such as: MoS 2 , WS 2 , TaS 2 and other sulfides). The current development trend of tool coatings is: coating components tend to be diversified and compounded. Composite coatings can combine the advantages of single coatings. The emergence of composite multi-coatings and related technologies can not only improve the bonding strength between coatings and substrates, but also take into account the comprehensive performance of various single coatings, so that the performance of coated tools can be improved. Significantly increased.

中国专利(专利号ZL 2006 1 0068975.3)报道了“自润滑复合软涂层刀具及其制备方法”,它是采用中频磁控+多弧法镀膜方法制备的MoS2/Zr复合涂层刀具,刀具表面为MoS2层,MoS2层与刀具基体之间具有Ti过渡层。该刀具在无切削液冷却、润滑的切削过程中,能够在刀具表面能形成具有润滑作用的润滑膜,从而实现刀具自身的润滑功能,但是这种润滑涂层硬度较低而导致刀具涂层尤其是后刀面涂层的使用寿命不长。文献(ActaMaterials.2011,59(1): 68-74)报道了TiN硬涂层刀具切削加工时的作用机理及使用性能,但是这种硬涂层由于相对较高的摩擦系数,限制了其广泛使用。中国专利TiN+MoS2/Zr组合涂层刀具(专利号ZL 201110081977.7)采用中频磁控溅射与电弧镀复合镀膜方法制备的TiN+MoS2/Zr组合涂层刀具,但该组合涂层在干切削超硬材料时刀具使用寿命仍无法满足实际使用需要。中国专利梯度叠层涂层刀具及其制备方法(专利号ZL201110214393.2)制备的ZrTiN复合涂层刀具有较高的硬度和强度、优异的抗磨损和抗腐蚀性能,但是在切削有色金属材料时其表面摩擦系数较高,刀具使用寿命无法满足使用需要。Chinese patent (Patent No. ZL 2006 1 0068975.3) reports "Self-lubricating Composite Soft Coated Cutting Tool and Its Preparation Method", which is a MoS 2 /Zr composite coated cutting tool prepared by medium frequency magnetron + multi-arc coating method, cutting tool The surface is a MoS 2 layer, and there is a Ti transition layer between the MoS 2 layer and the tool substrate. During the cutting process without cutting fluid cooling and lubrication, the tool can form a lubricating lubricating film on the surface of the tool, thereby realizing the lubricating function of the tool itself, but the hardness of this lubricating coating is low, which leads to the tool coating especially The service life of the flank coating is not long. The literature (ActaMaterials.2011, 59(1): 68-74) reported the mechanism and performance of TiN hard coating tools during cutting, but this hard coating is limited due to its relatively high coefficient of friction. use. The Chinese patent TiN+MoS 2 /Zr combined coating tool (Patent No. ZL 201110081977.7) adopts the method of intermediate frequency magnetron sputtering and arc plating to prepare the TiN+MoS 2 /Zr combined coating tool, but the combined coating is dry When cutting superhard materials, the service life of the tool still cannot meet the needs of actual use. The ZrTiN composite coating knife prepared by the Chinese patent gradient laminated coating tool and its preparation method (Patent No. ZL201110214393.2) has high hardness and strength, excellent wear resistance and corrosion resistance, but when cutting non-ferrous metal materials Its surface friction coefficient is high, and the service life of the tool cannot meet the needs of use.

层状复合材料是近几年发展起来的材料增强增韧新技术,这种结构是通过模仿贝壳而来,因此又叫仿生叠层复合材料。自然界中贝壳的珍珠层是一种天然的层状结构材料,其断裂韧性却比普通单一均质结构高出3000倍以上。因此,通过模仿生物材料结构形式的层间设计,制备出的叠层复合涂层可以显著提高涂层的韧性、结合强度及减摩耐磨性等综合性能。Layered composite material is a new material reinforcement and toughening technology developed in recent years. This structure is derived by imitating shells, so it is also called bionic laminated composite material. The nacre of shells in nature is a natural layered structure material, but its fracture toughness is more than 3000 times higher than that of ordinary single homogeneous structure. Therefore, by imitating the interlayer design of the structure of biological materials, the prepared laminated composite coating can significantly improve the comprehensive properties of the coating, such as toughness, bonding strength, anti-friction and wear resistance.

发明内容Contents of the invention

本发明的目的在于克服上述现有涂层刀具技术的不足,结合多元硬质涂层、润滑涂层、多层结构的优点,提供一种TiCrN&MoS2/Cr/Ti叠层涂层刀具及其制备工艺。The purpose of the present invention is to overcome the deficiencies of the above-mentioned existing coating tool technology, combined with the advantages of multi-component hard coating, lubricating coating and multi-layer structure, to provide a TiCrN&MoS 2 /Cr/Ti laminated coating tool and its preparation craft.

本发明是通过以下方式实现的:The present invention is achieved in the following ways:

TiCrN&MoS2/Cr/Ti叠层涂层刀具,刀具基体材料为高速钢、硬质合金、立方氮化硼或金刚石,刀具表面为MoS2/Ti/Cr润滑涂层,且由基体到涂层表面依次为:Ti过渡层、Ti/Cr过渡层、TiCrN硬质涂层和MoS2/Ti/Cr润滑涂层交替的复合叠层结构。TiCrN&MoS 2 /Cr/Ti laminated coating tool, the tool base material is high speed steel, cemented carbide, cubic boron nitride or diamond, the tool surface is MoS 2 /Ti/Cr lubricating coating, and from the base to the coating surface The order is: Ti transition layer, Ti/Cr transition layer, TiCrN hard coating and MoS 2 /Ti/Cr lubricating coating alternate composite laminated structure.

所述TiCrN&MoS2/Cr/Ti叠层涂层刀具的制备工艺,沉积方式为采用电弧镀与中频磁控溅射复合镀膜方法制备组合涂层,包括1个Ti靶电弧靶,一个Cr靶电弧靶,2个MoS2磁控溅射靶:电弧离子镀沉积Ti过渡层、Ti/Cr过渡层各4-5min,然后交替沉积厚度约为30~40nm 的TiCrN硬质涂层(电弧离子镀)和厚度约为15~25nm的MoS2/Ti/Cr润滑涂层(磁控溅射+ 电弧离子镀),最后表面为MoS2/Ti/Cr润滑涂层。The preparation process of the TiCrN&MoS 2 /Cr/Ti laminated coating tool, the deposition method is to use arc plating and intermediate frequency magnetron sputtering composite coating method to prepare a combined coating, including a Ti target arc target, a Cr target arc target , 2 MoS 2 magnetron sputtering targets: arc ion plating deposits Ti transition layer and Ti/Cr transition layer for 4-5 minutes each, and then alternately deposits TiCrN hard coating (arc ion plating) and A MoS 2 /Ti/Cr lubricating coating with a thickness of about 15-25nm (magnetron sputtering + arc ion plating), and the final surface is a MoS 2 /Ti/Cr lubricating coating.

具体包括以下步骤:Specifically include the following steps:

(1)前处理:将刀具基体表面抛光,去除杂质,然后依次放入酒精和丙酮中,超声清洗,经干燥后迅速放入镀膜机,抽真空至7.5×10-3Pa,加热至280℃,保温35~40min;(1) Pretreatment: Polish the surface of the tool substrate to remove impurities, then put it in alcohol and acetone in turn, clean it ultrasonically, put it into a coating machine after drying, vacuumize to 7.5×10 -3 Pa, and heat to 280°C , keep warm for 35-40 minutes;

(2)离子清洗:通Ar气,其压力为1.5Pa,开启偏压电源,电压600V,占空比0.2,辉光放电清洗15min;降低偏压至400V,开启离子源离子清洗15min,开启Ti靶的电弧源,偏压300V,靶电流60A,离子轰击Ti靶2min;(2) Ion cleaning: pass Ar gas, the pressure is 1.5Pa, turn on the bias power supply, voltage 600V, duty cycle 0.2, glow discharge cleaning for 15min; reduce the bias voltage to 400V, turn on the ion source ion cleaning for 15min, turn on Ti The arc source of the target, the bias voltage is 300V, the target current is 60A, and the ions bombard the Ti target for 2min;

(3)沉积Ti过渡层:Ar气压0.5~0.6Pa,偏压降至250V,Ti靶电流70A,沉积温度250℃,电弧镀Ti过渡层3~5min;(3) Deposit Ti transition layer: Ar pressure 0.5-0.6Pa, bias voltage down to 250V, Ti target current 70A, deposition temperature 250°C, arc plating Ti transition layer for 3-5min;

(4)沉积Ti/Cr过渡层:Ar气压0.5~0.6Pa,偏压250V,Ti靶电流80A,Cr靶电流50A,电弧镀Ti/Cr过渡层4~5min;(4) Deposition of Ti/Cr transition layer: Ar pressure 0.5-0.6Pa, bias voltage 250V, Ti target current 80A, Cr target current 50A, arc plating Ti/Cr transition layer 4-5min;

(5)沉积TiCrN硬质涂层:开启N2,Ar气压0.5Pa,偏压220V,Ti靶的靶电流90A, Cr靶电流70A,N2气压为1.2Pa,沉积温度200~230℃,电弧镀TiCrN硬质涂层3~4min;(5) Deposit TiCrN hard coating: turn on N 2 , Ar pressure 0.5Pa, bias voltage 220V, Ti target target current 90A, Cr target current 70A, N 2 pressure 1.2Pa, deposition temperature 200-230°C, arc Plating TiCrN hard coating for 3 to 4 minutes;

(6)沉积MoS2/Ti/Cr润滑涂层:关闭N2,Ti靶电流70A,Cr靶电流60A,开启MoS2靶磁控溅射电源,电流2.0A,偏压调至200V,沉积温度230~260℃,复合沉积MoS2/Ti/Cr 润滑涂层3~4min;(6) Deposit MoS 2 /Ti/Cr lubricating coating: turn off N 2 , Ti target current 70A, Cr target current 60A, turn on MoS 2 target magnetron sputtering power supply, current 2.0A, bias voltage to 200V, deposition temperature 230~260℃, compound deposited MoS 2 /Ti/Cr lubricating coating for 3~4min;

(7)沉积TiCrN硬质涂层:重复(5);(7) deposit TiCrN hard coating: repeat (5);

(8)沉积MoS2/Ti/Cr润滑涂层:重复(6);(8) deposit MoS 2 /Ti/Cr lubricating coating: repeat (6);

(9)重复(5)、(6)、(5)···:交替沉积TiCrN、MoS2/Ti/Cr···TiCrN涂层共100min;(9) Repeat (5), (6), (5)...: alternately deposit TiCrN, MoS 2 /Ti/Cr...TiCrN coatings for a total of 100 min;

(10)沉积表层MoS2/Ti/Cr润滑涂层:重复(6);(10) deposit surface layer MoS 2 /Ti/Cr lubricating coating: repeat (6);

(11)后处理:关闭各电源、离子源及气体源,涂层结束。(11) Post-processing: all power supplies, ion sources and gas sources are turned off, and the coating is finished.

与现有技术相比,本发明具有如下优异效果:Compared with the prior art, the present invention has the following excellent effects:

本发明采用电弧镀与磁控溅射复合镀膜方法制备了TiCrN&MoS2/Cr/Ti复合叠层涂层刀具,涂层是多层结构,其中基体上的Ti过渡层和Ti/Cr过渡层主要是提高涂层与刀具基体间的结合性能。该刀具综合了TiCrN多元硬质涂层、MoS2/Ti/Cr润滑涂层及叠层结构的优点,既具有较高的硬度,又具有润滑作用和较低的摩擦系数,使涂层刀具的性能有了显著地提高。同时,叠层结构可使涂层刀具在涂层使用寿命周期中始终保持良好的减摩润滑性,延长润滑涂层的使用周期。另外,叠层结构通过不同材料结构和成分组成的层间界面可以减缓涂层的过早剥落和裂纹的扩展。该涂层刀具进行切削时,由于表面MoS2/Ti/Cr涂层本身具有润滑作用,可以减小刀具与切屑之间的摩擦,从而降低切削力和切削温度;同时,TiCrN高硬度涂层可提高MoS2/Ti/Cr润滑涂层的整体强度,减缓由于MoS2/Ti/Cr涂层本身硬度较低而造成的刀具涂层过早磨损。与TiN+MoS2/Zr涂层刀具(专利号ZL 201110081977.7)相比,耐磨性提高了30-35%,涂层刀具使用寿命提高了25%以上;与ZrTiN复合涂层刀具(专利号 201110214393.2)相比,表面摩擦系数降低30%以上,减摩耐磨性提高30-35%,涂层刀具使用寿命提高20-30%,且提高了涂层刀具的使用范围,可更广泛应用于包括有色金属在内的各种材料的切削加工。The present invention adopts arc plating and magnetron sputtering composite coating method to prepare TiCrN&MoS 2 /Cr/Ti composite laminate coating tool, the coating is a multi-layer structure, wherein the Ti transition layer and Ti/Cr transition layer on the substrate are mainly Improve the bonding performance between the coating and the tool substrate. The tool combines the advantages of TiCrN multi-component hard coating, MoS 2 /Ti/Cr lubricating coating and laminated structure. It not only has high hardness, but also has lubricating effect and low friction coefficient. Performance has been significantly improved. At the same time, the laminated structure can make the coated tool maintain good anti-friction and lubricity throughout the service life of the coating, prolonging the service life of the lubricating coating. In addition, the laminated structure can slow down the premature peeling of the coating and the propagation of cracks through the interlayer interface of different material structures and composition. When the coated tool is cutting, because the surface MoS 2 /Ti/Cr coating itself has a lubricating effect, it can reduce the friction between the tool and the chip, thereby reducing the cutting force and cutting temperature; at the same time, the TiCrN high hardness coating can Improve the overall strength of the MoS 2 /Ti/Cr lubricating coating and slow down the premature wear of the tool coating due to the low hardness of the MoS 2 /Ti/Cr coating itself. Compared with TiN+MoS 2 /Zr coated tool (Patent No. ZL 201110081977.7), the wear resistance is increased by 30-35%, and the service life of the coated tool is increased by more than 25%; with ZrTiN composite coated tool (Patent No. 201110214393.2 ), the surface friction coefficient is reduced by more than 30%, the anti-friction and wear resistance is increased by 30-35%, the service life of the coated tool is increased by 20-30%, and the scope of use of the coated tool is improved, which can be more widely used including Cutting of various materials including non-ferrous metals.

附图说明Description of drawings

图1为本发明的TiCrN&MoS2/Ti/Cr复合叠层涂层刀具的涂层结构示意图。Fig. 1 is a schematic diagram of the coating structure of the TiCrN&MoS 2 /Ti/Cr composite laminated coating tool of the present invention.

图中:1为刀具基体、2为Ti过渡层、3为Ti/Cr过渡层、4为TiCrN硬质涂层、5为MoS2/Ti/Cr 润滑涂层、6为TiCrN与MoS2/Ti/Cr交替的涂层。In the figure: 1 is the tool matrix, 2 is the Ti transition layer, 3 is the Ti/Cr transition layer, 4 is the TiCrN hard coating, 5 is the MoS 2 /Ti/Cr lubricating coating, 6 is TiCrN and MoS 2 /Ti /Cr alternating coating.

具体实施方式Detailed ways

下面给出本发明的最佳实施例:The preferred embodiment of the present invention is given below:

实施例一Embodiment one

一种TiCrN&MoS2/Ti/Cr复合叠层涂层刀具,该刀具为普通的铣刀片,其基体材料为:硬质合金YT15。沉积方式为采用电弧镀与中频磁控溅射复合镀膜方法制备组合涂层,包括1个 Ti靶电弧靶,一个Cr靶电弧靶,2个MoS2磁控溅射靶:电弧离子镀沉积Ti过渡层、Ti/Cr 过渡层各4-5min,然后交替沉积厚度约为30~40nm的TiCrN涂层(电弧离子镀)和厚度约为15~25nm的MoS2/Ti/Cr涂层(磁控溅射+电弧离子镀),最后表面为MoS2/Ti/Cr润滑涂层,其制备工艺为:A TiCrN&MoS 2 /Ti/Cr composite laminated coating tool is an ordinary milling insert, and its base material is hard alloy YT15. The deposition method is to prepare a combined coating by arc plating and intermediate frequency magnetron sputtering composite coating method, including 1 Ti target arc target, a Cr target arc target, and 2 MoS 2 magnetron sputtering targets: arc ion plating deposits Ti transition layer and Ti/Cr transition layer for 4-5 minutes each, and then alternately deposit a TiCrN coating (arc ion plating) with a thickness of about 30-40 nm and a MoS 2 /Ti/Cr coating (magnetron sputtering) with a thickness of about 15-25 nm. Spray + arc ion plating), the final surface is MoS 2 /Ti/Cr lubricating coating, the preparation process is:

(1)前处理:将刀具基体表面抛光,去除表面油污、锈迹等杂质,然后依次放入酒精和丙酮中,超声清洗各40min,去除刀具表面油污和其它附着物,电吹风干燥充分后迅速放入镀膜机,抽真空至7.5×10-3Pa,加热至280℃,保温35~40min;(1) Pretreatment: Polish the surface of the tool base to remove surface oil, rust and other impurities, then place them in alcohol and acetone in turn, and ultrasonically clean them for 40 minutes each to remove oil and other attachments on the surface of the tool, and dry them quickly with a hair dryer. Put it into the coating machine, evacuate to 7.5×10 -3 Pa, heat to 280°C, and keep it warm for 35-40min;

(2)离子清洗:通Ar气,其压力为1.5Pa,开启偏压电源,电压600V,占空比0.2,辉光放电清洗15min;降低偏压至400V,开启离子源离子清洗15min,开启Ti靶的电弧源,偏压300V,靶电流60A,离子轰击Ti靶2min;(2) Ion cleaning: pass Ar gas, the pressure is 1.5Pa, turn on the bias power supply, voltage 600V, duty cycle 0.2, glow discharge cleaning for 15min; reduce the bias voltage to 400V, turn on the ion source ion cleaning for 15min, turn on Ti The arc source of the target, the bias voltage is 300V, the target current is 60A, and the ions bombard the Ti target for 2min;

(3)沉积Ti过渡层:Ar气压0.5~0.6Pa,偏压降至250V,Ti靶电流70A,沉积温度250℃,电弧镀Ti过渡层3~5min;(3) Deposit Ti transition layer: Ar pressure 0.5-0.6Pa, bias voltage down to 250V, Ti target current 70A, deposition temperature 250°C, arc plating Ti transition layer for 3-5min;

(4)沉积Ti/Cr过渡层:Ar气压0.5~0.6Pa,偏压250V,Ti靶电流80A,Cr靶电流50A,电弧镀Ti/Cr过渡层4~5min;(4) Deposition of Ti/Cr transition layer: Ar pressure 0.5-0.6Pa, bias voltage 250V, Ti target current 80A, Cr target current 50A, arc plating Ti/Cr transition layer 4-5min;

(5)沉积TiCrN层:开启N2,Ar气压0.5Pa,偏压220V,Ti靶的靶电流90A,Cr靶电流70A,N2气压为1.2Pa,沉积温度200~230℃,电弧镀TiCrN层3~4min;(5) Deposit TiCrN layer: turn on N 2 , Ar pressure 0.5Pa, bias voltage 220V, Ti target current 90A, Cr target current 70A, N 2 pressure 1.2Pa, deposition temperature 200-230°C, arc plating TiCrN layer 3~4min;

(6)沉积MoS2/Ti/Cr层:关闭N2,Ti靶电流70A,Cr靶电流60A,开启MoS2靶磁控溅射电源,电流2.0A,偏压调至200V,沉积温度230~260℃,复合沉积MoS2/Ti/Cr 3~4min;(6) Deposit MoS 2 /Ti/Cr layer: turn off N 2 , Ti target current 70A, Cr target current 60A, turn on MoS 2 target magnetron sputtering power supply, current 2.0A, bias voltage to 200V, deposition temperature 230~ 260°C, composite deposition of MoS 2 /Ti/Cr for 3~4min;

(7)沉积TiCrN层:重复(5);(7) deposit TiCrN layer: repeat (5);

(8)沉积MoS2/Ti/Cr层:重复(6);(8) deposit MoS 2 /Ti/Cr layer: repeat (6);

(9)重复(5)、(6)、(5)···:交替沉积TiCrN、MoS2/Ti/Cr···TiCrN涂层共100min;(9) Repeat (5), (6), (5)...: alternately deposit TiCrN, MoS 2 /Ti/Cr...TiCrN coatings for a total of 100 min;

(10)沉积表层MoS2/Ti/Cr层:重复(6);(10) Deposit the surface MoS 2 /Ti/Cr layer: repeat (6);

(11)后处理:关闭各电源、离子源及气体源,涂层结束。(11) Post-processing: all power supplies, ion sources and gas sources are turned off, and the coating is finished.

实施例二Embodiment two

一种TiCrN&MoS2/Cr/Ti叠层涂层刀具,该刀具为普通麻花钻,其刀具基体材料为:高速钢W18Cr4V。沉积方式为采用电弧镀与中频磁控溅射复合镀膜方法制备组合涂层,包括1个 Ti靶电弧靶,一个Cr靶电弧靶,2个MoS2磁控溅射靶:电弧离子镀沉积Ti过渡层、Ti/Cr过渡层各4-5min,然后交替沉积厚度约为30~40nm的TiCrN涂层(电弧离子镀)和厚度约为15~25nm的MoS2/Ti/Cr涂层(磁控溅射+电弧离子镀),最后表面为MoS2/Ti/Cr润滑涂层,其制备工艺为:A TiCrN&MoS 2 /Cr/Ti laminated coating cutting tool is an ordinary twist drill, and the cutting tool base material is high-speed steel W18Cr4V. The deposition method is to prepare a combined coating by arc plating and intermediate frequency magnetron sputtering composite coating method, including 1 Ti target arc target, a Cr target arc target, and 2 MoS 2 magnetron sputtering targets: arc ion plating deposits Ti transition layer and Ti/Cr transition layer for 4-5 minutes each, and then alternately deposit a TiCrN coating (arc ion plating) with a thickness of about 30-40 nm and a MoS 2 /Ti/Cr coating (magnetron sputtering) with a thickness of about 15-25 nm Spray + arc ion plating), the final surface is MoS 2 /Ti/Cr lubricating coating, the preparation process is:

(1)前处理:将刀具基体表面抛光,去除表面油污、锈迹等杂质,然后依次放入酒精和丙酮中,超声清洗各40min,去除刀具表面油污和其它附着物,电吹风干燥充分后迅速放入镀膜机,抽真空至7.5×10-3Pa,加热至280℃,保温35~40min;(1) Pretreatment: Polish the surface of the tool base to remove surface oil, rust and other impurities, then place them in alcohol and acetone in turn, and ultrasonically clean them for 40 minutes each to remove oil and other attachments on the surface of the tool, and dry them quickly with a hair dryer. Put it into the coating machine, evacuate to 7.5×10 -3 Pa, heat to 280°C, and keep it warm for 35-40min;

(2)离子清洗:通Ar气,其压力为1.5Pa,开启偏压电源,电压600V,占空比0.2,辉光放电清洗15min;降低偏压至400V,开启离子源离子清洗15min,开启Ti靶的电弧源,偏压300V,靶电流60A,离子轰击Ti靶2min;(2) Ion cleaning: pass Ar gas, the pressure is 1.5Pa, turn on the bias power supply, voltage 600V, duty cycle 0.2, glow discharge cleaning for 15min; reduce the bias voltage to 400V, turn on the ion source ion cleaning for 15min, turn on Ti The arc source of the target, the bias voltage is 300V, the target current is 60A, and the ions bombard the Ti target for 2min;

(3)沉积Ti过渡层:Ar气压0.5~0.6Pa,偏压降至250V,Ti靶电流70A,沉积温度250℃,电弧镀Ti过渡层3~5min;(3) Deposit Ti transition layer: Ar pressure 0.5-0.6Pa, bias voltage down to 250V, Ti target current 70A, deposition temperature 250°C, arc plating Ti transition layer for 3-5min;

(4)沉积Ti/Cr过渡层:Ar气压0.5~0.6Pa,偏压250V,Ti靶电流80A,Cr靶电流50A,电弧镀Ti/Cr过渡层4~5min;(4) Deposition of Ti/Cr transition layer: Ar pressure 0.5-0.6Pa, bias voltage 250V, Ti target current 80A, Cr target current 50A, arc plating Ti/Cr transition layer 4-5min;

(5)沉积TiCrN层:开启N2,Ar气压0.5Pa,偏压220V,Ti靶的靶电流90A,Cr靶电流70A,N2气压为1.2Pa,沉积温度200~230℃,电弧镀TiCrN层3~4min;(5) Deposit TiCrN layer: turn on N 2 , Ar pressure 0.5Pa, bias voltage 220V, Ti target current 90A, Cr target current 70A, N 2 pressure 1.2Pa, deposition temperature 200-230°C, arc plating TiCrN layer 3~4min;

(6)沉积MoS2/Ti/Cr层:关闭N2,Ti靶电流70A,Cr靶电流60A,开启MoS2靶磁控溅射电源,电流2.0A,偏压调至200V,沉积温度230~260℃,复合沉积MoS2/Ti/Cr 3~4min;(6) Deposit MoS 2 /Ti/Cr layer: turn off N 2 , Ti target current 70A, Cr target current 60A, turn on MoS 2 target magnetron sputtering power supply, current 2.0A, bias voltage to 200V, deposition temperature 230~ 260°C, composite deposition of MoS 2 /Ti/Cr for 3~4min;

(7)沉积TiCrN层:重复(5);(7) deposit TiCrN layer: repeat (5);

(8)沉积MoS2/Ti/Cr层:重复(6);(8) deposit MoS 2 /Ti/Cr layer: repeat (6);

(9)重复(5)、(6)、(5)···:交替沉积TiCrN、MoS2/Ti/Cr···TiCrN涂层共100min;(9) Repeat (5), (6), (5)...: alternately deposit TiCrN, MoS 2 /Ti/Cr...TiCrN coatings for a total of 100 min;

(10)沉积表层MoS2/Ti/Cr层:重复(6);(10) Deposit the surface MoS 2 /Ti/Cr layer: repeat (6);

(11)后处理:关闭各电源、离子源及气体源,涂层结束。(11) Post-processing: all power supplies, ion sources and gas sources are turned off, and the coating is finished.

Claims (2)

1.TiCrN&MoS2/ Cr/Ti laminated coating cutters, tool matrix material be high-speed steel, hard alloy, cubic boron nitride or Diamond, which is characterized in that tool surface MoS2/ Ti/Cr lubricant coatings, and be followed successively by coating surface by matrix:Ti mistakes Cross layer, Ti/Cr transition zones, TiCrN hard coats and MoS2The alternate composite lamainated structure of/Ti/Cr lubricant coatings;The coating knife Tool depositional mode is plated using electric arc and combines coating, including 1 Ti target electric arc target with the preparation of medium frequency magnetron sputtering composite film coating method, One Cr target electric arc target, 2 MoS2Magnetic controlled sputtering target:Electric arc ion-plating deposition Ti transition zones, each 4-5min of Ti/Cr transition zones, Then the MoS that the TiCrN hard coats and thickness that alternating deposit thickness is 30~40nm are 15~25nm2/ Ti/Cr lubrications apply Layer, the TiCrN hard coats use electric arc ion-plating deposition, the MoS2/ Ti/Cr lubricant coatings are using magnetron sputtering and electricity Arc ion plating composite deposition, last surface are MoS2/ Ti/Cr lubricant coatings;Specifically include following steps:
(1) pre-treatment:Tool matrix surface is polished, impurity is removed, is then sequentially placed into alcohol and acetone, is cleaned by ultrasonic, It is put into coating machine rapidly after drying, is evacuated to 7.5 × 10-3Pa is heated to 280 DEG C, keeps the temperature 35~40min;
(2) Ion Cleaning:Logical Ar gas, pressure 1.5Pa open grid bias power supply, voltage 600V, duty ratio 0.2, glow discharge Clean 15min;Reduction is biased into 400V, opens ion source Ion Cleaning 15min, opens the arc source of Ti targets, bias 300V, target Electric current 60A, ion bombardment Ti targets 2min;
(3) depositing Ti transition zone:Ar 0.5~0.6Pa of air pressure, bias are down to 250V, Ti target current 70A, 250 DEG C of depositing temperature, Electric arc plates 3~5min of Ti transition zones;
(4) depositing Ti/Cr transition zones:Ar 0.5~0.6Pa of air pressure, bias 250V, Ti target current 80A, Cr target current 50A, electric arc Plate 4~5min of Ti/Cr transition zones;
(5) depositing Ti CrN hard coats:Open N2, Ar air pressure 0.5Pa, target current 90A, the Cr target current of bias 220V, Ti target 70A, N2Air pressure is 1.2Pa, 200~230 DEG C of depositing temperature, 3~4min of electric arc plating TiCrN hard coats;
(6) MoS is deposited2/ Ti/Cr lubricant coatings:Close N2, Ti target currents 70A, Cr target current 60A, unlatching MoS2Target magnetic control splashes Radio source, electric current 2.0A, bias are adjusted to 200V, 230~260 DEG C of depositing temperature, composite deposition MoS2/ Ti/Cr lubricant coatings 3~ 4min;
(7) depositing Ti CrN hard coats:It repeats (5);
(8) MoS is deposited2/ Ti/Cr lubricant coatings:It repeats (6);
(9) (5), (6), (5) are repeated:Alternating deposit TiCrN, MoS2The total 100min of/Ti/CrTiCrN coatings;
(10) surface layer MoS is deposited2/ Ti/Cr lubricant coatings:It repeats (6);
(11) it post-processes:Each power supply, ion source and gas source are closed, coating terminates.
2. TiCrN&MoS as described in claim 12The preparation process of/Cr/Ti laminated coating cutters, which is characterized in that deposition side Formula is to combine coating, including 1 Ti target electric arc target, a Cr with the preparation of medium frequency magnetron sputtering composite film coating method using electric arc plating Target electric arc target, 2 MoS2Magnetic controlled sputtering target:Electric arc ion-plating deposition Ti transition zones, each 4-5min of Ti/Cr transition zones, are then handed over For deposition thickness be 30~40nm TiCrN hard coats and thickness be 15~25nm MoS2/ Ti/Cr lubricant coatings, it is described TiCrN hard coats use electric arc ion-plating deposition, the MoS2/ Ti/Cr lubricant coatings use magnetron sputtering and arc ions Composite deposition is plated, last surface is MoS2/ Ti/Cr lubricant coatings, specifically include following steps:
(1) pre-treatment:Tool matrix surface is polished, impurity is removed, is then sequentially placed into alcohol and acetone, is cleaned by ultrasonic, It is put into coating machine rapidly after drying, is evacuated to 7.5 × 10-3Pa is heated to 280 DEG C, keeps the temperature 35~40min;
(2) Ion Cleaning:Logical Ar gas, pressure 1.5Pa open grid bias power supply, voltage 600V, duty ratio 0.2, glow discharge Clean 15min;Reduction is biased into 400V, opens ion source Ion Cleaning 15min, opens the arc source of Ti targets, bias 300V, target Electric current 60A, ion bombardment Ti targets 2min;
(3) depositing Ti transition zone:Ar 0.5~0.6Pa of air pressure, bias are down to 250V, Ti target current 70A, 250 DEG C of depositing temperature, Electric arc plates 3~5min of Ti transition zones;
(4) depositing Ti/Cr transition zones:Ar 0.5~0.6Pa of air pressure, bias 250V, Ti target current 80A, Cr target current 50A, electric arc Plate 4~5min of Ti/Cr transition zones;
(5) depositing Ti CrN hard coats:Open N2, Ar air pressure 0.5Pa, target current 90A, the Cr target current of bias 220V, Ti target 70A, N2Air pressure is 1.2Pa, 200~230 DEG C of depositing temperature, 3~4min of electric arc plating TiCrN hard coats;
(6) MoS is deposited2/ Ti/Cr lubricant coatings:Close N2, Ti target currents 70A, Cr target current 60A, unlatching MoS2Target magnetic control splashes Radio source, electric current 2.0A, bias are adjusted to 200V, 230~260 DEG C of depositing temperature, composite deposition MoS2/ Ti/Cr lubricant coatings 3~ 4min;
(7) depositing Ti CrN hard coats:It repeats (5);
(8) MoS is deposited2/ Ti/Cr lubricant coatings:It repeats (6);
(9) (5), (6), (5) are repeated:Alternating deposit TiCrN, MoS2The total 100min of/Ti/CrTiCrN coatings;
(10) surface layer MoS is deposited2/ Ti/Cr lubricant coatings:It repeats (6);
(11) it post-processes:Each power supply, ion source and gas source are closed, coating terminates.
CN201610429654.5A 2016-06-15 2016-06-15 TiCrN & MoS2/ Cr/Ti laminated coatings cutter and its preparation process Expired - Fee Related CN105887024B (en)

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