CN106835036B - A method for preparing AlCrN coating by modulated high-power pulsed magnetron sputtering - Google Patents
A method for preparing AlCrN coating by modulated high-power pulsed magnetron sputtering Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 85
- 239000011248 coating agent Substances 0.000 title claims abstract description 83
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 10
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 28
- 230000008021 deposition Effects 0.000 claims description 16
- 238000004140 cleaning Methods 0.000 claims description 10
- 239000011159 matrix material Substances 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 6
- 239000013077 target material Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 238000007872 degassing Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 26
- 238000005520 cutting process Methods 0.000 abstract description 21
- 238000005516 engineering process Methods 0.000 abstract description 16
- 230000008569 process Effects 0.000 abstract description 2
- 238000003801 milling Methods 0.000 description 28
- 238000007733 ion plating Methods 0.000 description 17
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 229910000760 Hardened steel Inorganic materials 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000994 depressogenic effect Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010792 warming Methods 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 210000001367 artery Anatomy 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 210000003462 vein Anatomy 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910010037 TiAlN Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007542 hardness measurement Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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Abstract
本发明提供一种调制高功率脉冲磁控溅射制备AlCrN涂层的方法，属于真空技术领域。具体地说，是利用调制高功率脉冲磁控溅射技术，通过优化工艺参数，反应磁控溅射制备AlCrN涂层，与现有制备技术相比，该技术能够获得组织致密、表面光滑、优异力学性能、高温热稳定性、具有优异高速切削性能的AlCrN涂层，是一种具有良好应用前景的高性能硬质涂层制备技术。
The invention provides a method for preparing AlCrN coating by modulating high-power pulsed magnetron sputtering, belonging to the technical field of vacuum. Specifically, the modulated high-power pulsed magnetron sputtering technology is used to prepare the AlCrN coating by optimizing the process parameters and reactive magnetron sputtering. Compared with the existing preparation technology, this technology can obtain dense, smooth surface, excellent AlCrN coating with mechanical properties, high temperature thermal stability and excellent high-speed cutting performance is a high-performance hard coating preparation technology with good application prospects.
Description
Technical field
The present invention relates to a kind of methods that modulation high-power impulse magnetron sputtering prepares AlCrN coating, belong to vacuum technique
Field.
Background technique
As modern manufacturing processes high efficiency, high quality, the proposition of the requirements such as Green Machining, difficult-to-machine material to material
The machining condition of (such as hardened steel) is more and more harsher.Also promote cutting tool coating material and coating technology constantly to develop simultaneously to come
Coating quality is improved, to meet the needs of increasingly harsh.The performance for improving cutter coat can mainly be improved by two aspects:
First is that new chemical element is added in the coating, second is that passing through the selection of coating technology and the parameter optimization of deposition.
TiAlN and AlTiN is physical vapour deposition (PVD) (PVD) cutter coat for forming Al element deposition into TiN.So far
Until the present, by increasing the aluminium content in TiAlN, AlTiN coating, thus enhance the high temperature resistance and hardness of cutter coat,
The always important technical project of Tool Manufacturer and Coatings Corporation's concern.Due to being limited by coating structure stability,
Aluminium content in AlTiN coating is practical to have reached maximum value (about 65%).In TiN base coating, aluminium content is excessively high to be caused to apply
Layer crystal structure by cubic lattice is converted into hexagoinal lattice: and in CrN base coating, aluminium content can be further improved without
Cause the crystal structure of AlCrN coating to change, there is higher red hardness and inoxidizability, be considered being more suitably applied to
Dry cutting is now emerging high-performance rigid coating.
In addition to coating composition, coating performance largely additionally depends on the technology of preparing of coating, the painting of different technologies preparation
Layer performance difference is very big.PVD technique has no adverse effect easily controllable coating composition and structure etc. to environment since depositing temperature is low
Advantage has become prepares the at most widest method of cutter application hard coat at present.The wherein PVD for hard coat deposition
Technology is mainly two class of magnetron sputtering and arc ion plating.Traditional arc ion plating (aip) ionization level is high, can obtain close
90% ionization level and faster deposition rate have excellent film-substrate cohesion, are the mainstreams for preparing cutter coat at this stage
Technology has the advantages that ionization level is high, is suitble to industrialization large area production, and under back bias voltage acceleration, depositional coating binding force is good,
Dense structure, deposition rate is high, has been widely used for Tool in Cutting hard wear-resistant coating and high-temperature protection coating at present.But it applies
The drop bulky grain of layer surface greatly influences the service life of coating performance and coated cutting tool.
High-power impulse magnetron sputtering technology (the High Power Impulse Magnetron to grow up in recent years
Sputtering, HIPIMS) compactness and film-substrate cohesion that deposition film can be improved, especially for complex-shaped workpieces
Deposition, control, the depositing coating to different zones of reaction etc. it is significant.But relative to traditional magnetically controlled DC sputtering and
For multi sphere ion plating technology, HIPIMS still has deposition rate lower, and discharge stability, the deficiencies of controllability is to be improved deposit
?.To improve the above problem, high-power impulse magnetron sputtering (MPP or HIPIMS are modulated+) technology by micropulse regulates and controls pulse
Position shape, using segmented pulse, low-voltage section is ignited plasma, and high voltage section can be than conventional high power pulsed sputter arteries and veins
Rush it is much lower in the case where obtain higher plasma density and ionization level, reduce peak point current and peak power about one amount
Grade, and pulse width is widened to ms grades, maximum up to 3ms, duty ratio is up to 28%, so that voltage keeps permanent in pulse operating time
It is fixed, improve the stability and controllability of high-power impulse magnetron sputtering.
Summary of the invention
In view of this, the purpose of the present invention is to provide a kind of modulation high-power impulse magnetron sputterings to prepare AlCrN coating
Method, the method have good process repeatability, industrialized production easy to accomplish, the AlCrN coating prepared have table
The advantages that face is smooth, dense structure, excellent mechanical performance, high high-temp stability, excellent high-speed cutting performance, depositing coating knife
Tool is suitable for the characteristics of glass hard steel material machining under high-speed condition.
The purpose of the present invention is what is be achieved through the following technical solutions.
A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating, the specific steps of the method are as follows:
By the matrix after cleaning, for clamping on work rest, work rest revolving speed keeps 2~5rpm, starts to vacuumize, works as vacuum
Degree is higher than 1~5 × 10-3When Pa, degasification is begun to warm up, temperature is controlled at 200~500 DEG C.When vacuum degree reaches 1~8 × 10- 3When Pa, it is passed through Ar gas, vacuum is maintained at 0.3~0.9Pa.Pre-sputter cleaning is carried out to remove AlCr target table to AlCr target
The gas and impurity of face absorption, while matrix surface is carried out plasma clean 10~30 minutes using plasma source, increase
Add matrix surface cleanliness, enhances matrix surface chemical activity, to improve binding performance between coating and matrix, plasma source function
Rate is 3~10kW.Logical N2100~300sccm of throughput opens modulation high-power impulse magnetron sputtering AlCr target, AlCr target
Ingredient are as follows: Al60~70at.%, Cr are surplus, modulate high power pulsed source mean power 10kW, and charge average voltage 350
~650V, wherein 350~500V be light current press section, 500~650V be strong voltage section, single voltage pulse time be 500~
1500 μ s, light current press 200~800 μ s of section, strong voltage section 300~700 μ s, 30~300Hz of frequency, and pulse peak power 50~
300kW, 430~850V of crest voltage, 130~400A of peak point current.30~200V of matrix plus back bias voltage, depositing Al CrN are applied
Layer 60~180 minutes, deposition rate are 0.5~1.5 μm/h.Natural cooling after coating is deposited, when temperature drops to 80 DEG C or less
When, obtain the matrix that there is a kind of modulation high-power impulse magnetron sputtering to prepare AlCrN coating.
Beneficial effect
(1) using the AlCrN coating of modulation high-power impulse magnetron sputtering method preparation provided by the invention relative to use
Magnetron sputtering or the AlCrN coating of arc ion plating preparation, have hardness high, without bulky grain, binding force is strong on surface, coefficient of friction
And the advantage that cutting force is small, so that the hard alloy and high-speed steel tool that are deposited with the AlCrN coating are suitable under high-speed condition
Glass hard steel material machining.Experiment test shows deposited parameter optimization, and it is more than the hard of 30GPa that AlCrN coating, which has,
The milling cutter service life of degree, the AlCrN coating with modulation high-power impulse magnetron sputtering method preparation provided by the invention about has
2 times of the milling cutter service life of the AlCrN coating of arc ion plating preparation, cutting force are significantly lower than with arc ion plating preparation
The milling cutter of AlCrN coating.
(2) cutter of the AlCrN coating with modulation high-power impulse magnetron sputtering method preparation provided by the invention, resists
Mechanical wear performance and high temperature oxidation resistance are improved largely, and can satisfy High-speed machining to the more preferable performance of cutter material
Demand, have huge market potential and use value.
Detailed description of the invention
Fig. 1 (a), (b) are respectively to modulate high power pulse magnetic in conventional arc ion plating and embodiment 2 in comparative example
The surface topography map of the AlCrN coating of control sputtering preparation.
Fig. 2 is conventional arc ion plating in comparative example, the modulation high-power impulse magnetron sputtering technology preparation of embodiment 2
AlCrN coating milling cutter and non-coating milling cutter cutting of hardened steel when cutting force compare figure.
Fig. 3 is conventional arc ion plating in comparative example, the modulation high-power impulse magnetron sputtering preparation of embodiment 2
The milling cutter cutting of hardened steel service life of the milling cutter of AlCrN coating and non-coating compares figure.
Specific embodiment
The present invention is described in detail combined with specific embodiments below, but not limited to this.
Embodiment 1
Carbide chip is cleaned with alcohol and acetone, is placed on the work rest of vacuum chamber with air gun drying, adjusts work
Part frame revolving speed is 2rpm, is evacuated to 1 × 10-3Pa opens heater, is warming up to 200 DEG C；When vacuum degree reaches 1 × 10-3Pa
When, Ar throughput valve is opened, vacuum is maintained at 0.3Pa, carries out pre-sputter cleaning to AlCr target, while utilizing plasma source
Plasma clean is carried out to carbide chip surface, scavenging period is 10 minutes, plasma source power 10kW.Logical N2
Flow 200sccm opens modulation high-power impulse magnetron sputtering AlCr target, AlCr target material composition are as follows: Al 70at.%, Cr are remaining
Amount；High power pulsed source mean power 10kW is modulated, charge average voltage 350V, wherein 350~500V is that light current presses section,
500~650V is strong voltage section, and single voltage pulse time is 500 μ s, and wherein light current presses 200 μ s of section, 300 μ s of strong voltage section,
Frequency 30Hz, pulse peak power 50kW, crest voltage 430V, peak point current 150A.Add back bias voltage in carbide cutter tool on piece
30V, depositing Al CrN coating 60 minutes, natural cooling after about 0.5~1.5 μm/h. depositing coating of deposition rate, when temperature drops to
At 80 DEG C or less, the carbide cutter tool of the AlCrN coating with modulation high-power impulse magnetron sputtering method preparation obtained is taken out
Piece.
The NHTS/N060146 type nano hardness measurement that the coating is produced using Austrian Anton Paar Co., Ltd (CSM)
Amount, test condition are load 20mN, loading speed 20mN/min, and measuring the coating hardness is 33.4Gpa.
Embodiment 2
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, uses air gun
Drying is placed on the work rest of vacuum chamber, and adjusting work rest revolving speed is 3rpm, is evacuated to 5 × 10-3Pa opens heater,
400 DEG C are warming up to, when vacuum degree reaches 5 × 10-3When Pa, Ar throughput valve is opened, vacuum is maintained at 0.5Pa, to AlCr target
Pre-sputter cleaning is carried out, while using plasma source to carbide end mill surface progress plasma clean, when cleaning
Between be 20 minutes, plasma source power 5kW.Logical N2Flow 250sccm opens modulation high-power impulse magnetron sputtering AlCr target
Material, AlCr target material composition are as follows: Al 65at.%, Cr are surplus；High power pulsed source mean power 10kW is modulated, charging is average
Voltage 450V, wherein 350~500V is that light current presses section, 500~650V is strong voltage section, and single voltage pulse time is 1000 μ
S, wherein light current presses 500 μ s of section, strong voltage section 500 μ s, frequency 150Hz, pulse peak power 200kW, crest voltage 600V, peak
It is worth electric current 300A.To carbide end mill plus back bias voltage 100V, depositing Al CrN coating 120 minutes, deposition rate about 0.5~
1.5μm/h.Natural cooling after depositing coating is taken out obtained with modulation high power pulse when temperature drops to 80 DEG C or less
The carbide end mill of the AlCrN coating of magnetron sputtering method preparation.
For the coating using the NHTS/N060146 type nanoindenter measurement of CSM production, test condition is load 20mN,
Loading speed 20mN/min, measuring the coating hardness is 30.7Gpa.
Embodiment 3
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, uses air gun
Drying is placed on the work rest of vacuum chamber, and adjusting work rest revolving speed is 5rpm, is evacuated to 3 × 10~3Pa opens heater,
500 DEG C are warming up to, when vacuum degree reaches 8 × 10-3When Pa, Ar throughput valve is opened, vacuum is maintained at 0.9Pa, to AlCr target
Pre-sputter cleaning is carried out, while using plasma source to carbide end mill surface progress plasma clean, when cleaning
Between be 30 minutes, plasma source power 3kW.Logical N2Flow 300sccm opens modulation high-power impulse magnetron sputtering AlCr target
Material, AlCr target material composition are as follows: Al 60at.%, Cr are surplus；High power pulsed source mean power 10kW is modulated, charging is average
Voltage 650V, wherein 350~500V is that light current presses section, 500~650V is strong voltage section, and single voltage pulse time is 1500 μ
S, wherein light current presses 800 μ s of section, strong voltage section 700 μ s, frequency 300Hz, pulse peak power 300kW, crest voltage 850V, peak
It is worth electric current 400A.Add back bias voltage 200V, depositing Al CrN coating 180 minutes, deposition rate about 0.5 on carbide end mill
~1.5 μm/h.Natural cooling after depositing coating is taken out obtained with modulation high power arteries and veins when temperature drops to 80 DEG C or less
Rush the carbide end mill of the AlCrN coating of magnetron sputtering method preparation.
The NHTS/N060146 type nano hardness measurement that the coating is produced using Austrian Anton Paar Co., Ltd (CSM)
Amount, test condition are load 20mN, loading speed 20mN/min, and measuring the coating hardness is 32.1Gpa.
Comparative example
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, uses air gun
Drying is placed on the work rest of vacuum chamber, and adjusting work rest revolving speed is 5rpm, is evacuated to 3 × 10~3Pa opens heater,
400 DEG C are warming up to, when vacuum degree reaches 4 × 10-3When Pa, Ar throughput valve is opened, vacuum is maintained at 1.5Pa, in hard alloy
On slotting cutter plus back bias voltage 1000V carries out aura and cleans 30min, is then turned on Cr (atomic ratio 99.99%) target, electric current is
60A, the negative bias reduced on carbide end mill are depressed into 900V, icon bombardment cleaning carbide end mill surface 6min.So
Lead to N afterwards2Flow 300sccm makes vacuum be maintained at 2.0Pa, reduces carbide end mill negative bias and is depressed into 200V, deposits the bottom CrN
Layer 4min.Throttle valve is adjusted, vacuum is made to be maintained at 2.5Pa, later on AlCr target, it is vertical to reduce hard alloy by target current 80A
Negative bias is depressed into 100V, time 4min on milling cutter, prepares AlCrN-CrN transition zone, finally closes Cr target arc source, and vacuum is kept
In 2.5Pa, AlCr target current is 80A, and the negative bias reduced on carbide end mill is depressed into 80V, depositing Al CrN coating 60min.
After film layer preparation finishes, sample is cooling under vacuum condition in furnace, with arc ion plating preparation made from taking-up
The carbide end mill of AlCrN coating.
Fig. 1 (a), (b) are respectively to modulate high-power impulse magnetron sputtering in conventional arc ion plating and embodiment 1 to prepare
The surface topography map of AlCrN coating.The AlCrN coating surface of new type of modulation high-power impulse magnetron sputtering technology deposition is without big
Grain, surface are obviously more smooth.And coating is finer and close.
Fig. 2 is to apply with the AlCrN for modulating high-power impulse magnetron sputtering preparation in conventional arc ion plating, embodiment 1
Layer milling cutter and non-coating milling cutter cutting of hardened steel when cutting force compare figure.Abscissa Cutting Length is cutting length
Degree, ordinate Cutting Force are cutting force.Arc-AlCrN indicates the milling of the AlCrN coating with arc ion plating preparation
Knife, Hipims-AlCrN indicate the milling cutter of the AlCrN coating with modulation high-power impulse magnetron sputtering preparation, Uncoated table
Show the milling cutter of non-coating.Milling parameter are as follows: Milling Speed v=200m/min (revolving speed n=10616rpm), feed engagement f=
0.05mm/z, milling depth ap=2mm, milling width ae=0.1mm.The milling of AlCrN coating with preparation described in embodiment 1
Knife cutting force is significantly lower than the milling cutter of the AlCrN coating with conventional arc ion plating preparation.This is because modulation high power arteries and veins
The AlCrN coating surface for rushing magnetron sputtering technique deposition is more smooth, and skin-friction coefficient is smaller, causes cutting force smaller.
Fig. 3 is to apply with the AlCrN for modulating high-power impulse magnetron sputtering preparation in conventional arc ion plating, embodiment 1
The milling cutter of layer and the milling cutter cutting of hardened steel service life of non-coating compare figure.Abscissa Cutting Length is length of cut, is indulged
Coordinate Frank Wear is abrasion loss.Arc-AlCrN indicates the milling cutter of the AlCrN coating with arc ion plating preparation,
Hipims-AlCrN indicates that the milling cutter of the AlCrN coating with modulation high-power impulse magnetron sputtering preparation, Uncoated indicate
The milling cutter of non-coating.300um is blunt standard.Milling parameter are as follows: Milling Speed v=200m/min (revolving speed n=10616rpm),
Feed engagement f=0.05mm/z, milling depth ap=2mm, milling width ae=0.1mm.With preparation described in embodiment 1
The milling cutter service life of AlCrN coating is about 2 times of the milling cutter service life for the AlCrN coating that there is conventional arc ion plating to prepare, this is
Because the AlCrN coating surface for modulating high-power impulse magnetron sputtering technology deposition is more smooth, mechanical property is more preferable, high-temperature behavior
More excellent, wearability is more preferably to longer life expectancy.
The present invention includes but is not limited to above embodiments, it is all carried out under the principle of spirit of that invention it is any equivalent
Replacement or local improvement, all will be regarded as within protection scope of the present invention.
Claims (1)
1. a kind of modulation high-power impulse magnetron sputtering method for preparing AlCrN coating, it is characterised in that: the method it is specific
Step are as follows:
By the matrix after cleaning, for clamping on work rest, work rest revolving speed keeps 2~5rpm, starts to vacuumize, when vacuum degree height
In 1~5 × 10-3When Pa, degasification is begun to warm up, temperature is controlled at 200~500 DEG C, when vacuum degree reaches 1~8 × 10-3When Pa,
It is passed through Ar gas, vacuum is maintained at 0.3~0.9Pa, carries out pre-sputter cleaning to AlCr target, while using plasma source to base
Body surface face carries out plasma clean 10~30 minutes, leads to N2100~300sccm of throughput opens modulation high power pulse magnetic control
AlCr target is sputtered, to 30~200V of matrix plus back bias voltage, depositing Al CrN coating 60~180 minutes, deposition rate is 0.5~
1.5 μm/h, natural cooling after coating has been deposited, when temperature drops to 80 DEG C or less, has obtained that there is a kind of modulation high power
Pulsed magnetron sputtering prepares the matrix of AlCrN coating；
The AlCr target material composition are as follows: Al 60~70at.%, Cr are surplus；When the plasma clean, plasma source
Power is 3~10kW；The modulation high power pulsed source mean power 10kW, charge 350~650V of average voltage, wherein
350~500V is that light current presses section, and 500~650V is strong voltage section, and single voltage pulse time is 500~1500 μ s, wherein weak
200~800 μ s of voltage section, strong voltage section 300~700 μ s, 30~300Hz of frequency, 50~300kW of pulse peak power, peak value
430~850V of voltage, 130~400A of peak point current.
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