CN106706660A - Detecting method and device for foreign matters on substrate and optical concentration - Google Patents
Detecting method and device for foreign matters on substrate and optical concentration Download PDFInfo
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- CN106706660A CN106706660A CN201710063951.7A CN201710063951A CN106706660A CN 106706660 A CN106706660 A CN 106706660A CN 201710063951 A CN201710063951 A CN 201710063951A CN 106706660 A CN106706660 A CN 106706660A
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- 239000000758 substrate Substances 0.000 title claims abstract description 131
- 230000003287 optical effect Effects 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title abstract description 7
- 230000005540 biological transmission Effects 0.000 claims abstract description 38
- 238000005259 measurement Methods 0.000 claims abstract description 25
- 239000011159 matrix material Substances 0.000 claims abstract description 19
- 238000009826 distribution Methods 0.000 claims abstract description 18
- 238000012545 processing Methods 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 10
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 8
- 238000001514 detection method Methods 0.000 claims description 42
- 230000002159 abnormal effect Effects 0.000 claims description 3
- 238000007689 inspection Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012372 quality testing Methods 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
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- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N2021/558—Measuring reflectivity and transmission
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention discloses a detecting device for foreign matters on a substrate and optical concentration. The detecting device comprises a light transmitting unit, a reflected light receiving unit, a transmission light receiving unit and a processing unit, wherein the light transmitting unit is arranged above the substrate and is used for transmitting light beams to the surface of the substrate; the substrate is a glass substrate after gluing and before exposure for a black matrix; the reflected light receiving unit is used for receiving reflected light on the surface of the substrate; the transmission light receiving unit is arranged under the substrate and is used for receiving transmitting light penetrating through the substrate; and the processing unit is respectively connected with the reflected light receiving unit and the transmitting-light receiving unit and is used for capturing light beam information and respectively calculating to obtain distribution information of the foreign matters on the surface of the substrate and optical concentration values of corresponding coordinate positions. The invention also provides a detecting method for the foreign matters on the substrate and optical concentration. By implementation of the technical scheme provided by the invention, simultaneous, fast and accurate measurement for the foreign matters on the substrate coated with the black matrix and the optical concentration can be realized, the equipment structure can be simplified, and the production quality and efficiency of the substrate can be improved.
Description
Technical field
The present invention relates to element manufacturing procedure field, more particularly to a kind of substrate foreign matter and optical concentration detection side
Method and device.
Background technology
With the development of Display Technique, the plane such as liquid crystal display (Liquid Crystal Display, abbreviation LCD) shows
Mobile phone, TV, personal digital assistant, number are widely used in showing device is because having the advantages that high image quality, power saving, fuselage is thin
The various consumption electronic products such as word camera, notebook computer, desktop computer, as the main flow in display device.In display
In the manufacturing process of device, proximity printing machine is widely used in display neck because of its exposure accuracy higher and relatively low price
Domain.To carry out optical concentration in the prior art after black matrix" (Black Matrix, abbreviation BM) gluing, before exposure
The detection of (Optical Density, abbreviation OD) value and Superficial Foreign Body.BM plays shaded effect in being used primarily in display production,
Prevent two form and aspect from mixing, promote color contrast.
In liquid crystal display panel, black matrix" is first pattern of color film (Color Filter, abbreviation CF) substrate
Processing procedure, will carry out management and control to its thickness aborning.The OD values of same black-matrix material increase with the increase of thickness, if
Its thickness is excessively thin, and OD values decline, and causes shaded effect decrease, color contrast to decline；If its thickness is too thick, OD values become big, meeting
Increase the consumption of material, and harmful effect is produced to successive process.OD values are related to thickness, therefore measure it achievable to film
Thick monitoring.On the other hand, the mask plate of proximity printing machine is closer with the distance between substrate, and adhesion is on the surface of the substrate
Foreign particles be possible to be come in contact with mask plate, cause mask plate pollution scratch in addition scrap.Therefore, OD values and surface
The detection monitoring of foreign matter is particularly significant to the production of BM.But the testing equipment unitary function of prior art, take up room it is big, to applying
The detection efficiency for being covered with the substrate of BM is relatively low.
The content of the invention
The technical problems to be solved by the invention are to provide the detection technique scheme of a kind of substrate foreign matter and optical concentration,
Detected while for the Superficial Foreign Body and black matrix" optical concentration of realizing the substrate to being coated with black matrix", reduce equipment
Take up room and detection time, improve the quality of production and efficiency of substrate, shorten production line length.
To solve above technical problem, on the one hand, the present invention provides the detection means of a kind of substrate foreign matter and optical concentration,
Including：
The Optical Transmit Unit of surface is arranged on, for launching light beam to the substrate surface；The substrate is to black
Colour moment battle array carries out the glass substrate after gluing and before exposure；
The reflection light receiving unit of the surface is arranged on, the reflected light for receiving the substrate surface；
The transmission light receiving unit below the substrate is arranged on, is oppositely arranged with the Optical Transmit Unit, for receiving
Through the transmitted light of the substrate；
The processing unit being connected respectively with the reflection light receiving unit and the transmission light receiving unit, for catching light
Beam information, calculates the optical concentration value of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter respectively.
Further, the beam information includes reflective information；The reflective information includes that the Luminance Distribution of reflected light is believed
Breath；The processing unit, is processed for the Luminance Distribution information to the reflected light, obtains the size and distribution number of foreign matter
Amount.
Further, the beam information includes transmission information；The transmission information includes transmission brightness values and its survey
Measure the coordinate position of point；
The processing unit, for the coordinate position according to the transmission brightness values and its measurement point, calculates substrate
In the optical concentration value OD of the coordinate position of the measurement point：
OD=-log10(T)；
Wherein, parameter T is the transmitance of the coordinate position of current measurement point of the source emissioning light beam on substrate.
Preferably, the light source that the Optical Transmit Unit is used is list structure light source；The list structure light source is sent out
The beam orthogonal for going out is evenly radiated into the substrate surface, and its range of exposures more than or equal to the area of the substrate.
Preferably, the reflection light receiving unit includes some camera lenses of CCD side by side or strip photodetector.
Preferably, the transmission light receiving unit includes guide rail and several photodetectors；The photodetector edge
The guide rail to be moved to the direction of the Optical Transmit Unit, obtain the transmission optical information of the substrate corresponding coordinate position.
Further, the detection means of the substrate foreign matter and optical concentration also includes display judging unit, alarm unit
And buffer unit；
The display judging unit is connected with the processing unit, for showing that the processing unit calculates the base for obtaining
Plate surface foreign matter size, distributed quantity and optical concentration value, and be compared with default standard value, show judged result；
The alarm unit, for when the judged result is for exception, sending alarm signal, and abnormal substrate is deposited
To the buffer unit.
On the other hand, present invention also offers a kind of substrate foreign matter and the detection method of optical concentration, including：
Launch light beam to substrate surface；The substrate is that the glass base after gluing and before exposure is carried out to black matrix"
Plate；
The reflected light and transmitted light of the substrate surface are received respectively；
Beam information is caught, the light of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter is calculated respectively
Learn concentration value.
Further, the beam information includes reflective information；The reflective information includes that the Luminance Distribution of reflected light is believed
Breath；The detection method also includes：Luminance Distribution information to the reflected light is processed, and obtains size and the distribution of foreign matter
Quantity.
Further, the beam information includes transmission information；The transmission information includes transmission brightness values and its survey
Measure the coordinate position of point；The detection method also includes：
According to the transmission brightness values and its coordinate position of measurement point, coordinate of the substrate in the measurement point is calculated
The optical concentration value OD of position：
OD=-log10(T)；
Wherein, parameter T is the transmitance of the coordinate position of current measurement point of the source emissioning light beam on substrate.
The detection technique scheme of substrate foreign matter provided in an embodiment of the present invention and optical concentration, for being coated with black square
The quality testing before exposure of the glass substrate of battle array, light beam is launched by substrate to be detected, then catches the reflected beams
Information and transmitted light beam information, calculate the optics of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter respectively
Concentration value, so as to detect the size distribution of foreign matter on black matrix substrate, it is therefore prevented that large scale foreign matter pollutes to mask plate and damages
Wound, and measurement by optical concentration value can be monitored to thickness online, realize black matrix substrate foreign matter and optics
While concentration, quick, accurate measurement, simplify the structure of testing equipment, reduce equipment occupation space, improve the production matter of substrate
Amount and efficiency.
Brief description of the drawings
Fig. 1 is the structural representation of one embodiment of the detection means of the substrate foreign matter that the present invention is provided and optical concentration
Figure.
The step of Fig. 2 is one embodiment of the detection method of the substrate foreign matter that the present invention is provided and optical concentration flow
Figure.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described.Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
It is the structure of one embodiment of the detection means of the substrate foreign matter and optical concentration of present invention offer referring to Fig. 1
Schematic diagram.
In the present embodiment, described substrate foreign matter and the detection means of optical concentration mainly include：
The Optical Transmit Unit 10 of surface is arranged on, for launching light beam to the substrate surface；The substrate is right
Black matrix" carries out the glass substrate after gluing and before exposure；
The reflection light receiving unit 20 of the surface is arranged on, the reflected light for receiving the substrate surface；
The transmission light receiving unit 30 below the substrate is arranged on, is oppositely arranged with the Optical Transmit Unit 10, be used for
Receive the transmitted light through the substrate；
The processing unit 40 being connected respectively with the reflection light receiving unit 20 and the transmission light receiving unit 30, is used for
Beam information is caught, the optical concentration of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter is calculated respectively
Value.
In specific implementation process, on the one hand, the beam information includes reflective information；The reflective information includes reflected light
Luminance Distribution information；The processing unit 40, is processed for the Luminance Distribution information to the reflected light, obtains foreign matter
Size and distributed quantity.
On the other hand, the beam information includes transmission information；The transmission information includes transmission brightness values and its survey
Measure the coordinate position of point；The processing unit 40, for the coordinate position according to the transmission brightness values and its measurement point, leads to
Cross below equation (1) and calculate optical concentration value OD of the substrate in the coordinate position of the measurement point：
OD=-log10(T) (1)
Wherein, parameter T is the transmitance of the coordinate position of current measurement point of the source emissioning light beam on substrate.
Preferably, in the present embodiment, the light source that the Optical Transmit Unit 10 is used is list structure light source；The bar
The beam orthogonal that shape structure light source is sent is evenly radiated into the substrate surface, and its range of exposures more than or equal to described
The area of substrate.
Further, the reflection light receiving unit 20 includes some CCD side by side (Charge Coupled Device, electricity
Lotus coupled apparatus) camera lens or strip photodetector.
In a kind of attainable mode, the transmission light receiving unit 30 includes guide rail 31 and several photodetectors
(not shown in figure 1).
The photodetector is moved along the guide rail 31 to the direction of the Optical Transmit Unit 10, obtains the substrate
The transmission optical information of corresponding coordinate position.
Further, the detection means of the substrate foreign matter and optical concentration also includes display judging unit 50, and alarm is single
Unit 60 and buffer unit 70.
The display judging unit 50 is connected with the processing unit 40, is obtained for showing that the processing unit 40 is calculated
Substrate surface foreign matter size, distributed quantity and the optical concentration value for obtaining, and be compared with default standard value, display judges knot
Really；
The alarm unit 60, for when the judged result is for exception, sending alarm signal, and abnormal substrate is deposited
Put to the caching (Buffer) unit 70.During specific implementation, display judging unit 50 and alarm unit 60 can be integrated into one
Body device, while being used as display and alarm unit, reduces hold facility volume.Alarm unit 60 obtains display and judges single
Foreign substance information transmitted by unit 50 is compared the result of judgement with optical concentration information and preset standard.When the size of foreign matter surpasses
Go out threshold value or optical concentration value not in critical field, judge substrate situation exception, alarm unit 60 finds alarm signal, to inspection
Observe and predict alert substrate to be detained, the Buffer units 70 of automatic storage to equipment wait operating personnel to further confirm that and place
Reason, postorder substrate to be checked goes successively to testing equipment detection；When foreign matter size without departing from threshold value and optical concentration value in standard
In the range of when, judge that substrate situation is normal, the alarm free signal of alarm unit 60 automatically flows into next system after the completion of substrate detection
Journey.
Implement the detection means of substrate foreign matter provided in an embodiment of the present invention and optical concentration, can be used for being coated with black
The quality testing before exposure of the glass substrate of matrix.Launch light beam by substrate to be detected, then catch reflected light
Beam information and transmitted light beam information, calculate the light of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter respectively
Concentration value is learned, so as to realize carrying out BM thickness on-line monitoring by the measurement of OD values, and foreign matter on substrate is capable of detecting when
Size distribution, it is therefore prevented that large scale foreign matter pollutes to mask plate and damages, realizes black matrix substrate foreign matter with optical concentration
Measurement is integrated, taking up room for equipment, improve production efficiency is reduced.
On the other hand, the present invention still further provides the detection method of a kind of substrate foreign matter and optical concentration.
Referring to Fig. 2, the step of be one embodiment of detection method of substrate foreign matter that the present invention is provided and optical concentration
Flow chart.
In the present embodiment, the detection method of a kind of substrate foreign matter and optical concentration, is provided using Fig. 1 embodiments
The detection means of substrate foreign matter and optical concentration, realizes to being coated with the quality inspection before exposure of the glass substrate of black matrix"
Survey, key step includes：
Step S101：Launch light beam to substrate surface；The substrate is black matrix" to be carried out after gluing and expose it
Preceding glass substrate；
Step S102：The reflected light and transmitted light of the substrate surface are received respectively；
Step S103：Beam information is caught, the distributed intelligence and corresponding seat for obtaining the substrate surface foreign matter are calculated respectively
The optical concentration value of cursor position.
Preferably, the beam information includes reflective information；The reflective information includes the Luminance Distribution information of reflected light；
Then specifically also include in S103 the step of the detection method of the substrate foreign matter and optical concentration：To the bright of the reflected light
Degree distributed intelligence is processed, and obtains the size and distributed quantity of foreign matter.
Further, the beam information includes transmission information；The transmission information includes transmission brightness values and its survey
Measure the coordinate position of point；In the step of detection method S103, specifically also include：According to transmission brightness values and its survey
The coordinate position of point is measured, optical concentration value OD of the substrate in the coordinate position of the measurement point is calculated according to the equation (1).
The substrate foreign matter that the substrate foreign matter and the detection method of optical concentration that Fig. 2 embodiments are provided are provided with Fig. 1 embodiments
It is corresponding with the operation principle of the detection means of optical concentration identical, will not be repeated here.
Implement the detection technique scheme of substrate foreign matter provided in an embodiment of the present invention and optical concentration, by to be detected
Substrate launches light beam, then catches the reflected beams information and transmitted light beam information, on the one hand detects different on black matrix substrate
The size distribution of thing, it is therefore prevented that large scale foreign matter pollutes to mask plate and damages；On the other hand by the measurement energy of optical concentration value
It is enough thickness is monitored online, it is simple while realizing black matrix substrate foreign matter with optical concentration, quick, accurate measurement
Change the structure of testing equipment, reduce equipment occupation space, improve the quality of production and efficiency of substrate.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (10)
1. the detection means of a kind of substrate foreign matter and optical concentration, it is characterised in that including：
The Optical Transmit Unit of surface is arranged on, for launching light beam to the substrate surface；The substrate is to black square
Battle array carries out the glass substrate after gluing and before exposure；
The reflection light receiving unit of the surface is arranged on, the reflected light for receiving the substrate surface；
The transmission light receiving unit below the substrate is arranged on, is oppositely arranged with the Optical Transmit Unit, passed through for receiving
The transmitted light of the substrate；
The processing unit being connected respectively with the reflection light receiving unit and the transmission light receiving unit, for catching light beam letter
Breath, calculates the optical concentration value of the distributed intelligence and corresponding coordinate position that obtain the substrate surface foreign matter respectively.
2. the detection means of substrate foreign matter as claimed in claim 1 and optical concentration, it is characterised in that the beam information includes
Reflective information；The reflective information includes the Luminance Distribution information of reflected light；
The processing unit, is processed for the Luminance Distribution information to the reflected light, obtains size and the distribution of foreign matter
Quantity.
3. the detection means of substrate foreign matter as claimed in claim 1 and optical concentration, it is characterised in that the beam information includes
Transmission information；The transmission information includes the coordinate position of transmission brightness values and its measurement point；
The processing unit, for the coordinate position according to the transmission brightness values and its measurement point, calculates substrate in institute
State the optical concentration value OD of the coordinate position of measurement point：
OD=-log10(T)；
Wherein, parameter T is the transmitance of the coordinate position of current measurement point of the source emissioning light beam on substrate.
4. the detection means of substrate foreign matter as claimed in claim 1 and optical concentration, it is characterised in that the Optical Transmit Unit institute
The light source for using is list structure light source；The beam orthogonal that the list structure light source is sent is evenly radiated into the substrate
Surface, and its range of exposures is more than or equal to the area of the substrate.
5. the detection means of substrate foreign matter as claimed in claim 1 and optical concentration, it is characterised in that the reflection light-receiving list
Unit includes some camera lenses of CCD side by side or strip photodetector.
6. the detection means of substrate foreign matter as claimed in claim 1 and optical concentration, it is characterised in that the transmission light-receiving list
Unit includes guide rail and several photodetectors；
The photodetector is moved along the guide rail to the direction of the Optical Transmit Unit, obtains the substrate corresponding coordinate
The transmission optical information of position.
7. as described in any one of claim 1~6 substrate foreign matter and optical concentration detection means, it is characterised in that the inspection
Surveying device also includes display judging unit, alarm unit and buffer unit；
The display judging unit is connected with the processing unit, for showing that the processing unit calculates the substrate table for obtaining
Face foreign matter size, distributed quantity and optical concentration value, and be compared with default standard value, show judged result；
The alarm unit, for when the judged result is for exception, sending alarm signal, and abnormal substrate is deposited to institute
State buffer unit.
8. the detection method of a kind of substrate foreign matter and optical concentration, it is characterised in that including：
Launch light beam to substrate surface；The substrate is that the glass substrate after gluing and before exposure is carried out to black matrix"；
The reflected light and transmitted light of the substrate surface are received respectively；
Beam information is caught, the optics that the distributed intelligence and corresponding coordinate position for obtaining the substrate surface foreign matter is calculated respectively is dense
Angle value.
9. the detection method of substrate foreign matter as claimed in claim 8 and optical concentration, it is characterised in that the beam information bag
Include reflective information；The reflective information includes the Luminance Distribution information of reflected light；The detection method also includes：
Luminance Distribution information to the reflected light is processed, and obtains the size and distributed quantity of foreign matter.
10. the detection method of substrate foreign matter as claimed in claim 8 and optical concentration, it is characterised in that the beam information
Including transmission information；The transmission information includes the coordinate position of transmission brightness values and its measurement point；The detection method is also
Including：
According to the transmission brightness values and its coordinate position of measurement point, coordinate position of the substrate in the measurement point is calculated
Optical concentration value OD：
OD=-log10(T)；
Wherein, parameter T is the transmitance of the coordinate position of current measurement point of the source emissioning light beam on substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201710063951.7A CN106706660A (en) | 2017-02-04 | 2017-02-04 | Detecting method and device for foreign matters on substrate and optical concentration |
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| CN201710063951.7A CN106706660A (en) | 2017-02-04 | 2017-02-04 | Detecting method and device for foreign matters on substrate and optical concentration |
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Cited By (8)
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| CN107917918A (en) * | 2017-11-17 | 2018-04-17 | 南京大学 | A kind of detection method of the discriminating ultrathin transparent plate surface flaw based on mirror-reflection |
| CN108459031A (en) * | 2017-12-30 | 2018-08-28 | 北京奥博泰科技有限公司 | Device and method for measuring hollow glass entirety transmittance, reflectivity and color |
| CN108732140A (en) * | 2018-05-23 | 2018-11-02 | 南京德阳科技有限公司 | A kind of optical path for building glass transmittance reflectivity |
| CN108802057A (en) * | 2018-06-15 | 2018-11-13 | 于婷婷 | A kind of neatness test device of glass production |
| CN108982362A (en) * | 2018-06-27 | 2018-12-11 | 南京中电熊猫液晶显示科技有限公司 | A kind of substrate detection support device and its detection method |
| CN111474599A (en) * | 2020-05-19 | 2020-07-31 | 深圳市华星光电半导体显示技术有限公司 | Foreign matter detection device for glass substrate and detection method thereof |
| CN112739488A (en) * | 2018-08-22 | 2021-04-30 | 奥托立夫开发公司 | Device and method for detecting laser welding protective glass |
| CN113751450A (en) * | 2021-07-29 | 2021-12-07 | 蚌埠高华电子股份有限公司 | Integrated system device and method for detecting and processing polishing residues on surface of glass substrate |
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