CN106299036A - A kind of SnZnO cushion for solaode - Google Patents
A kind of SnZnO cushion for solaode Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 64
- 238000003756 stirring Methods 0.000 claims abstract description 45
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 33
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000005273 aeration Methods 0.000 claims abstract description 28
- 239000004246 zinc acetate Substances 0.000 claims abstract description 28
- 239000000243 solution Substances 0.000 claims abstract description 26
- 239000011259 mixed solution Substances 0.000 claims abstract description 18
- 238000001816 cooling Methods 0.000 claims abstract description 16
- 239000002270 dispersing agent Substances 0.000 claims abstract description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims abstract description 12
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims abstract description 12
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims abstract description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims abstract description 11
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000002360 preparation method Methods 0.000 claims abstract description 7
- 230000032683 aging Effects 0.000 claims abstract description 6
- 238000004821 distillation Methods 0.000 claims description 20
- 238000005245 sintering Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 claims description 6
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 239000012141 concentrate Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 claims description 3
- PWEVMPIIOJUPRI-UHFFFAOYSA-N dimethyltin Chemical compound C[Sn]C PWEVMPIIOJUPRI-UHFFFAOYSA-N 0.000 claims description 3
- HGQSXVKHVMGQRG-UHFFFAOYSA-N dioctyltin Chemical compound CCCCCCCC[Sn]CCCCCCCC HGQSXVKHVMGQRG-UHFFFAOYSA-N 0.000 claims description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 3
- CRHIAMBJMSSNNM-UHFFFAOYSA-N tetraphenylstannane Chemical compound C1=CC=CC=C1[Sn](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 CRHIAMBJMSSNNM-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 9
- 238000005215 recombination Methods 0.000 abstract description 4
- 230000006798 recombination Effects 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 3
- 230000008439 repair process Effects 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 2
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
本发明公开了一种用于太阳能电池的SnZnO缓冲层,其制备步骤如下:步骤1,将醋酸锌加入至无水乙醇中,搅拌均匀后,滴加醋酸,搅拌均匀形成醋酸锌溶液;步骤2,将二乙醇胺加入醋酸锌溶液,同时加入有机锡盐,搅拌形成锌锡混合液;步骤3,将锌锡混合液放入反应釜中,加入EDTA,搅拌均匀后进行曝气反应3‑5h;步骤4,将曝气反应后的混合液进行蒸馏反应2‑4h,得到混合浓缩液;步骤5,将混合浓缩液加入分散剂进行低温搅拌,静置陈化3‑8h;步骤6,将混合浓缩液涂覆在基材上,进行高温烧结2‑4h;步骤7,将烧结后基材放入乙二胺气体氛围进行高温高压反应,冷却后即可得到缓冲层。本发明有效提高缓冲层致密性,修复了缓冲层薄膜的缺陷问题,有效减少载流子复合,从而显著提高电池短路电流密度和填充因子,实现电池能量转换效率。The invention discloses a SnZnO buffer layer for solar cells. The preparation steps are as follows: step 1, adding zinc acetate to absolute ethanol, stirring evenly, adding acetic acid dropwise, stirring evenly to form a zinc acetate solution; step 2 , adding diethanolamine to the zinc acetate solution, and adding organic tin salt at the same time, stirring to form a zinc-tin mixed solution; step 3, putting the zinc-tin mixed solution into the reaction kettle, adding EDTA, stirring evenly, and performing an aeration reaction for 3-5h; Step 4, distilling the mixed solution after the aeration reaction for 2-4 hours to obtain a mixed concentrated solution; Step 5, adding the mixed concentrated solution to a dispersant for low-temperature stirring, and standing and aging for 3-8 hours; Step 6, mixing the mixed solution The concentrated solution is coated on the base material and sintered at high temperature for 2-4 hours; step 7, the sintered base material is placed in an ethylenediamine gas atmosphere for high-temperature and high-pressure reaction, and the buffer layer can be obtained after cooling. The invention effectively improves the compactness of the buffer layer, repairs the defect problem of the buffer layer film, effectively reduces carrier recombination, thereby significantly improving the short-circuit current density and filling factor of the battery, and realizing the energy conversion efficiency of the battery.
Description
技术领域technical field
本发明属于太阳能技术领域,具体涉及一种用于太阳能电池的SnZnO缓冲层。The invention belongs to the technical field of solar energy, and in particular relates to a SnZnO buffer layer used in solar cells.
背景技术Background technique
铜铟镓硒(CIGS)薄膜太阳能电池具有成本低、转化效率高、稳定性好的特点,是目前太阳能电池领域研究的热点之一。2013年,瑞士联邦材料科学与技术实验室(EmPa)宣布,其研发的柔性衬底CIGS太阳能光伏电池已凭借20.4%的高转换效率刷新世界记录。CIGS薄膜太阳能电池传统的结构为Basis/Mo/CIGS/CdS/ZnO/AZO,其中CdS为缓冲层,采用CdS作为缓冲层存在以下的缺点:首先,CdS是有毒化学物质;其次,制备CdS缓冲层的常用方法是化学水浴法(CBD),而薄膜太阳能电池的其它各层通常在真空中用干法制备。因此,若采用干法和湿法混合工艺的生产线,则提高了工艺的复杂性。此外,由于CdS薄膜的禁带宽度在2.3~2.4eV之间,因此太阳光谱中只有蓝光波长以下的光谱范围才能被电池所吸收,限制了薄膜太阳能电池效率的进一步提升。Copper Indium Gallium Selenide (CIGS) thin-film solar cells have the characteristics of low cost, high conversion efficiency and good stability, and are one of the hot research topics in the field of solar cells. In 2013, the Swiss Federal Laboratory for Materials Science and Technology (EmPa) announced that its flexible substrate CIGS solar photovoltaic cell had set a new world record with a high conversion efficiency of 20.4%. The traditional structure of CIGS thin-film solar cells is Basis/Mo/CIGS/CdS/ZnO/AZO, in which CdS is the buffer layer, and the use of CdS as the buffer layer has the following disadvantages: first, CdS is a toxic chemical substance; second, the preparation of CdS buffer layer The commonly used method is the chemical bath method (CBD), while the other layers of thin-film solar cells are usually prepared by dry method in vacuum. Therefore, if a production line of dry and wet mixing processes is used, the complexity of the process will be increased. In addition, since the bandgap of CdS thin films is between 2.3 and 2.4 eV, only the spectral range below the blue light wavelength in the solar spectrum can be absorbed by the cells, which limits the further improvement of the efficiency of thin-film solar cells.
正是在这种情形下,近一二十年来人们一直在努力寻找可以替代CdS作为缓冲层的材料,目前已经取得了一些成果。主要包括用ZnS、ZnSe、ZnO、In2Se3、InZnSex等薄膜材料取代CdS做缓冲层。其中ZnO是一种多功能的n型Ⅱ-Ⅵ族化合物半导体材料,其可见光范围内的平均透光率可达85%以上,激子束缚能达60meV,因此ZnO已成为取代CdS作为缓冲层的理想材料之一。Delahoy和Platzer-bjorkman等人分别于2000年和2003年提出直接用ZnO薄膜替代CdS薄膜作为缓冲层材料,实验结果说明了用ZnO替代CdS作为缓冲层材料能够取得比较理想的光电性能,且ZnO/CIGS异质结的短路电流还要优于CdS/CIGS异质结。It is in this situation that people have been working hard to find materials that can replace CdS as a buffer layer in the past ten or twenty years, and some results have been achieved so far. It mainly includes replacing CdS with thin film materials such as ZnS, ZnSe, ZnO, In 2 Se 3 , InZnSex as the buffer layer. Among them, ZnO is a multifunctional n-type II-VI compound semiconductor material. Its average light transmittance in the visible light range can reach more than 85%, and the exciton binding energy can reach 60meV. Therefore, ZnO has become an alternative to CdS as a buffer layer. One of the ideal materials. In 2000 and 2003, Delahoy and Platzer-bjorkman proposed to replace CdS film directly with ZnO film as the buffer layer material, and the experimental results showed that using ZnO instead of CdS as the buffer layer material can achieve relatively ideal photoelectric performance, and ZnO/ The short-circuit current of the CIGS heterojunction is even better than that of the CdS/CIGS heterojunction.
现有的制备ZnO缓冲层的方法有溶胶-凝胶法、微波水热法,但是存在制备的薄膜结晶性差,有空洞,薄膜的厚度不易控制等技术性问题。The existing methods for preparing ZnO buffer layer include sol-gel method and microwave hydrothermal method, but there are technical problems such as poor crystallinity of the prepared film, voids, and difficulty in controlling the thickness of the film.
发明内容Contents of the invention
本发明的目的是提供一种用于太阳能电池的SnZnO缓冲层,本发明有效提高缓冲层致密性,修复了缓冲层薄膜的缺陷问题,有效减少载流子复合,从而显著提高电池短路电流密度和填充因子,实现电池能量转换效率。The purpose of the present invention is to provide a SnZnO buffer layer for solar cells. The present invention effectively improves the compactness of the buffer layer, repairs the defect problem of the buffer layer film, effectively reduces carrier recombination, thereby significantly improving the battery short-circuit current density and Fill factor to achieve battery energy conversion efficiency.
一种用于太阳能电池的SnZnO缓冲层,其制备步骤如下:A kind of SnZnO buffer layer for solar cells, its preparation steps are as follows:
步骤1,将醋酸锌加入至无水乙醇中,搅拌均匀后,滴加醋酸,搅拌均匀形成醋酸锌溶液;Step 1, adding zinc acetate to absolute ethanol, after stirring evenly, adding acetic acid dropwise, stirring evenly to form a zinc acetate solution;
步骤2,将二乙醇胺加入醋酸锌溶液,同时加入有机锡盐,搅拌形成锌锡混合液;Step 2, adding diethanolamine to zinc acetate solution, adding organic tin salt at the same time, stirring to form zinc-tin mixed solution;
步骤3,将锌锡混合液放入反应釜中,加入EDTA,搅拌均匀后进行曝气反应3-5h;Step 3, put the zinc-tin mixture into the reaction kettle, add EDTA, stir evenly, and carry out aeration reaction for 3-5 hours;
步骤4,将曝气反应后的混合液进行蒸馏反应2-4h,得到混合浓缩液;Step 4, distilling the mixed solution after the aeration reaction for 2-4 hours to obtain a mixed concentrated solution;
步骤5,将混合浓缩液加入分散剂进行低温搅拌,静置陈化3-8h;Step 5, adding the mixed concentrate to the dispersant, stirring at low temperature, and standing for 3-8 hours;
步骤6,将混合浓缩液涂覆在基材上,进行高温烧结2-4h;Step 6, coating the mixed concentrated solution on the substrate, and performing high-temperature sintering for 2-4 hours;
步骤7,将烧结后基材放入乙二胺气体氛围进行高温高压反应,冷却后即可得到缓冲层。In step 7, the sintered substrate is placed in an ethylenediamine gas atmosphere for high-temperature and high-pressure reaction, and the buffer layer can be obtained after cooling.
所述缓冲层的配方如下:The formula of described buffer layer is as follows:
醋酸锌15-20份、无水乙醇30-50份、醋酸0.3-0.7份、二乙醇胺2-4份、有机锡盐15-20份、EDTA20-40份、分散剂3-7份。15-20 parts of zinc acetate, 30-50 parts of absolute ethanol, 0.3-0.7 parts of acetic acid, 2-4 parts of diethanolamine, 15-20 parts of organic tin salt, 20-40 parts of EDTA, 3-7 parts of dispersant.
所述有机锡盐采用二甲基锡、二辛基锡或四苯基锡中的一种。The organotin salt is one of dimethyltin, dioctyltin or tetraphenyltin.
所述分散剂采用聚乙烯吡咯烷酮、苄基三乙基氯化铵或苄基三甲基氯化铵中的一种。The dispersant is one of polyvinylpyrrolidone, benzyltriethylammonium chloride or benzyltrimethylammonium chloride.
所述步骤1和步骤2中的搅拌速度为500-1200r/min。The stirring speed in the step 1 and step 2 is 500-1200r/min.
所述步骤3中的曝气反应气体为氨气,所述曝气气体的流速为30-50mL/min,所述曝气反应温度为60-80℃。The aeration reaction gas in the step 3 is ammonia, the flow rate of the aeration gas is 30-50mL/min, and the aeration reaction temperature is 60-80°C.
所述步骤4中的蒸馏反应采用水浴蒸馏法,所述蒸馏反应的温度为80-95℃,所述蒸馏后体积为混合液的40-70%。The distillation reaction in step 4 adopts a water-bath distillation method, the temperature of the distillation reaction is 80-95° C., and the volume after the distillation is 40-70% of the mixed solution.
所述步骤5中的搅拌温度为20-30℃,所述搅拌速度为1000-1500r/min,所述陈化温度为5-10℃。The stirring temperature in the step 5 is 20-30°C, the stirring speed is 1000-1500r/min, and the aging temperature is 5-10°C.
所述步骤6中的涂覆面积为1-1.5mL/cm2,所述烧结温度为200-350℃,所述烧结反应的压力为0.2-0.8MPa。The coating area in step 6 is 1-1.5mL/cm 2 , the sintering temperature is 200-350°C, and the sintering reaction pressure is 0.2-0.8MPa.
所述步骤7中的乙二胺的量是醋酸锌的7-10倍,所述高温高压反应的温度为150-180℃,压力为1.1-2.3MPa,所述高温高压反应的时间为2-4h,所述冷却反应的温度为自然冷却。The amount of ethylenediamine in the step 7 is 7-10 times that of zinc acetate, the temperature of the high temperature and high pressure reaction is 150-180°C, the pressure is 1.1-2.3MPa, and the time of the high temperature and high pressure reaction is 2-2. 4h, the temperature of the cooling reaction is natural cooling.
与现有技术相比,本发明具有以下有益效果:Compared with the prior art, the present invention has the following beneficial effects:
1、本发明有效提高缓冲层致密性,修复了缓冲层薄膜的缺陷问题,有效减少载流子复合,从而显著提高电池短路电流密度和填充因子,实现电池能量转换效率。1. The present invention effectively improves the compactness of the buffer layer, repairs the defects of the buffer layer film, effectively reduces carrier recombination, thereby significantly improving the short-circuit current density and fill factor of the battery, and realizing the energy conversion efficiency of the battery.
2、本发明改善了缓冲层表面平整度,减少了缓冲层表面絮状物,减少额载流子在缓冲层/窗口层界面的复合,提高薄膜太阳能电池的短路电流密度1.0-2.0mA/cm2,提高电池转换效率绝对值1-3%。2. The present invention improves the smoothness of the surface of the buffer layer, reduces the flocs on the surface of the buffer layer, reduces the recombination of frontal carriers at the buffer layer/window layer interface, and improves the short-circuit current density of thin-film solar cells by 1.0-2.0mA/cm 2. Improve the absolute value of battery conversion efficiency by 1-3%.
3、本发明采用的曝气气体和蒸馏液体均可以重复使用,工艺成本低,符合环保要求,同时设备简单可靠、操作安全、适用于工业化生产。3. Both the aeration gas and the distilled liquid used in the present invention can be reused, the process cost is low, and the requirements of environmental protection are met. At the same time, the equipment is simple and reliable, the operation is safe, and it is suitable for industrial production.
具体实施方式detailed description
下面结合实施例对本发明做进一步描述:The present invention will be further described below in conjunction with embodiment:
实施例1Example 1
一种用于太阳能电池的SnZnO缓冲层,其制备步骤如下:A kind of SnZnO buffer layer for solar cells, its preparation steps are as follows:
步骤1,将醋酸锌加入至无水乙醇中,搅拌均匀后,滴加醋酸,搅拌均匀形成醋酸锌溶液;Step 1, adding zinc acetate to absolute ethanol, after stirring evenly, adding acetic acid dropwise, stirring evenly to form a zinc acetate solution;
步骤2,将二乙醇胺加入醋酸锌溶液,同时加入有机锡盐,搅拌形成锌锡混合液;Step 2, adding diethanolamine to zinc acetate solution, adding organic tin salt at the same time, stirring to form zinc-tin mixed solution;
步骤3,将锌锡混合液放入反应釜中,加入EDTA,搅拌均匀后进行曝气反应3-5h;Step 3, put the zinc-tin mixture into the reaction kettle, add EDTA, stir evenly, and carry out aeration reaction for 3-5 hours;
步骤4,将曝气反应后的混合液进行蒸馏反应2h,得到混合浓缩液;Step 4, distilling the mixed solution after the aeration reaction for 2 hours to obtain a mixed concentrated solution;
步骤5,将混合浓缩液加入分散剂进行低温搅拌,静置陈化3h;Step 5, adding the mixed concentrate to the dispersant, stirring at low temperature, and standing for 3 hours;
步骤6,将混合浓缩液涂覆在基材上,进行高温烧结2h;Step 6, coating the mixed concentrated solution on the substrate, and performing high-temperature sintering for 2 hours;
步骤7,将烧结后基材放入乙二胺气体氛围进行高温高压反应,冷却后即可得到缓冲层。In step 7, the sintered substrate is placed in an ethylenediamine gas atmosphere for high-temperature and high-pressure reaction, and the buffer layer can be obtained after cooling.
所述缓冲层的配方如下:The formula of described buffer layer is as follows:
醋酸锌15份、无水乙醇30份、醋酸0.3份、二乙醇胺2份、有机锡盐15份、EDTA20份、分散剂3份。15 parts of zinc acetate, 30 parts of absolute ethanol, 0.3 parts of acetic acid, 2 parts of diethanolamine, 15 parts of organic tin salt, 20 parts of EDTA, and 3 parts of dispersant.
所述有机锡盐采用二甲基锡。The organic tin salt adopts dimethyl tin.
所述分散剂采用聚乙烯吡咯烷酮。The dispersant adopts polyvinylpyrrolidone.
所述步骤1和步骤2中的搅拌速度为500r/min。The stirring speed in said step 1 and step 2 is 500r/min.
所述步骤3中的曝气反应气体为氨气,所述曝气气体的流速为30mL/min,所述曝气反应温度为60℃。The aeration reaction gas in the step 3 is ammonia, the flow rate of the aeration gas is 30mL/min, and the aeration reaction temperature is 60°C.
所述步骤4中的蒸馏反应采用水浴蒸馏法,所述蒸馏反应的温度为80℃,所述蒸馏后体积为混合液的40%。The distillation reaction in step 4 adopts a water-bath distillation method, the temperature of the distillation reaction is 80° C., and the volume after the distillation is 40% of the mixed solution.
所述步骤5中的搅拌温度为20℃,所述搅拌速度为1000r/min,所述陈化温度为5℃。The stirring temperature in the step 5 is 20°C, the stirring speed is 1000r/min, and the aging temperature is 5°C.
所述步骤6中的涂覆面积为1mL/cm2,所述烧结温度为200℃,所述烧结反应的压力为0.2MPa。The coating area in step 6 is 1 mL/cm 2 , the sintering temperature is 200° C., and the pressure of the sintering reaction is 0.2 MPa.
所述步骤7中的乙二胺的量是醋酸锌的7倍,所述高温高压反应的温度为150℃,压力为1.1MPa,所述高温高压反应的时间为2h,所述冷却反应的温度为自然冷却。The amount of ethylenediamine in the step 7 is 7 times that of zinc acetate, the temperature of the high temperature and high pressure reaction is 150°C, the pressure is 1.1MPa, the time of the high temperature and high pressure reaction is 2h, and the temperature of the cooling reaction for natural cooling.
实施例2Example 2
一种用于太阳能电池的SnZnO缓冲层,其制备步骤如下:A kind of SnZnO buffer layer for solar cells, its preparation steps are as follows:
步骤1,将醋酸锌加入至无水乙醇中,搅拌均匀后,滴加醋酸,搅拌均匀形成醋酸锌溶液;Step 1, adding zinc acetate to absolute ethanol, after stirring evenly, adding acetic acid dropwise, stirring evenly to form a zinc acetate solution;
步骤2,将二乙醇胺加入醋酸锌溶液,同时加入有机锡盐,搅拌形成锌锡混合液;Step 2, adding diethanolamine to zinc acetate solution, adding organic tin salt at the same time, stirring to form zinc-tin mixed solution;
步骤3,将锌锡混合液放入反应釜中,加入EDTA,搅拌均匀后进行曝气反应5h;Step 3, put the zinc-tin mixture into the reactor, add EDTA, stir evenly, and carry out aeration reaction for 5 hours;
步骤4,将曝气反应后的混合液进行蒸馏反应4h,得到混合浓缩液;Step 4, distilling the mixed solution after the aeration reaction for 4 hours to obtain a mixed concentrated solution;
步骤5,将混合浓缩液加入分散剂进行低温搅拌,静置陈化8h;Step 5, adding the mixed concentrate to the dispersant, stirring at low temperature, and standing for 8 hours;
步骤6,将混合浓缩液涂覆在基材上,进行高温烧结4h;Step 6, coating the mixed concentrated solution on the substrate, and performing high-temperature sintering for 4 hours;
步骤7,将烧结后基材放入乙二胺气体氛围进行高温高压反应,冷却后即可得到缓冲层。In step 7, the sintered substrate is placed in an ethylenediamine gas atmosphere for high-temperature and high-pressure reaction, and the buffer layer can be obtained after cooling.
所述缓冲层的配方如下:The formula of described buffer layer is as follows:
醋酸锌20份、无水乙醇50份、醋酸0.7份、二乙醇胺4份、有机锡盐20份、EDTA40份、分散剂7份。20 parts of zinc acetate, 50 parts of absolute ethanol, 0.7 parts of acetic acid, 4 parts of diethanolamine, 20 parts of organic tin salt, 40 parts of EDTA, and 7 parts of dispersant.
所述有机锡盐采用二辛基锡。The organotin salt adopts dioctyltin.
所述分散剂采用苄基三乙基氯化铵。The dispersant adopts benzyltriethylammonium chloride.
所述步骤1和步骤2中的搅拌速度为1200r/min。The stirring speed in the step 1 and step 2 is 1200r/min.
所述步骤3中的曝气反应气体为氨气,所述曝气气体的流速为50mL/min,所述曝气反应温度为80℃。The aeration reaction gas in the step 3 is ammonia, the flow rate of the aeration gas is 50mL/min, and the aeration reaction temperature is 80°C.
所述步骤4中的蒸馏反应采用水浴蒸馏法,所述蒸馏反应的温度为95℃,所述蒸馏后体积为混合液的70%。The distillation reaction in step 4 adopts a water-bath distillation method, the temperature of the distillation reaction is 95° C., and the volume after the distillation is 70% of the mixed solution.
所述步骤5中的搅拌温度为30℃,所述搅拌速度为1500r/min,所述陈化温度为10℃。The stirring temperature in the step 5 is 30°C, the stirring speed is 1500r/min, and the aging temperature is 10°C.
所述步骤6中的涂覆面积为1.5mL/cm2,所述烧结温度为350℃,所述烧结反应的压力为0.8MPa。The coating area in step 6 is 1.5 mL/cm 2 , the sintering temperature is 350° C., and the pressure of the sintering reaction is 0.8 MPa.
所述步骤7中的乙二胺的量是醋酸锌的10倍,所述高温高压反应的温度为180℃,压力为2.3MPa,所述高温高压反应的时间为4h,所述冷却反应的温度为自然冷却。The amount of ethylenediamine in the step 7 is 10 times that of zinc acetate, the temperature of the high temperature and high pressure reaction is 180°C, the pressure is 2.3MPa, the time of the high temperature and high pressure reaction is 4h, and the temperature of the cooling reaction for natural cooling.
实施例3Example 3
一种用于太阳能电池的SnZnO缓冲层,其制备步骤如下:A kind of SnZnO buffer layer for solar cells, its preparation steps are as follows:
步骤1,将醋酸锌加入至无水乙醇中,搅拌均匀后,滴加醋酸,搅拌均匀形成醋酸锌溶液;Step 1, adding zinc acetate to absolute ethanol, after stirring evenly, adding acetic acid dropwise, stirring evenly to form a zinc acetate solution;
步骤2,将二乙醇胺加入醋酸锌溶液,同时加入有机锡盐,搅拌形成锌锡混合液;Step 2, adding diethanolamine to zinc acetate solution, adding organic tin salt at the same time, stirring to form zinc-tin mixed solution;
步骤3,将锌锡混合液放入反应釜中,加入EDTA,搅拌均匀后进行曝气反应4h;Step 3, put the zinc-tin mixture into the reaction kettle, add EDTA, stir evenly, and carry out aeration reaction for 4 hours;
步骤4,将曝气反应后的混合液进行蒸馏反应3h,得到混合浓缩液;Step 4, distilling the mixed solution after the aeration reaction for 3 hours to obtain a mixed concentrated solution;
步骤5,将混合浓缩液加入分散剂进行低温搅拌,静置陈化5h;Step 5, adding the mixed concentrate to the dispersant, stirring at low temperature, and standing for 5 hours;
步骤6,将混合浓缩液涂覆在基材上,进行高温烧结3h;Step 6, coating the mixed concentrated solution on the substrate, and performing high-temperature sintering for 3 hours;
步骤7,将烧结后基材放入乙二胺气体氛围进行高温高压反应,冷却后即可得到缓冲层。In step 7, the sintered substrate is placed in an ethylenediamine gas atmosphere for high-temperature and high-pressure reaction, and the buffer layer can be obtained after cooling.
所述缓冲层的配方如下:The formula of described buffer layer is as follows:
醋酸锌18份、无水乙醇40份、醋酸0.4份、二乙醇胺3份、有机锡盐18份、EDTA35份、分散剂5份。18 parts of zinc acetate, 40 parts of absolute ethanol, 0.4 parts of acetic acid, 3 parts of diethanolamine, 18 parts of organic tin salt, 35 parts of EDTA, and 5 parts of dispersant.
所述有机锡盐采用四苯基锡。The organotin salt adopts tetraphenyltin.
所述分散剂采用苄基三甲基氯化铵。The dispersant adopts benzyltrimethylammonium chloride.
所述步骤1和步骤2中的搅拌速度为800r/min。The stirring speed in said step 1 and step 2 is 800r/min.
所述步骤3中的曝气反应气体为氨气,所述曝气气体的流速为40mL/min,所述曝气反应温度为70℃。The aeration reaction gas in the step 3 is ammonia, the flow rate of the aeration gas is 40mL/min, and the aeration reaction temperature is 70°C.
所述步骤4中的蒸馏反应采用水浴蒸馏法,所述蒸馏反应的温度为90℃,所述蒸馏后体积为混合液的60%。The distillation reaction in step 4 adopts a water-bath distillation method, the temperature of the distillation reaction is 90° C., and the volume after the distillation is 60% of the mixed solution.
所述步骤5中的搅拌温度为25℃,所述搅拌速度为1300r/min,所述陈化温度为8℃。The stirring temperature in the step 5 is 25°C, the stirring speed is 1300r/min, and the aging temperature is 8°C.
所述步骤6中的涂覆面积为1.3mL/cm2,所述烧结温度为250℃,所述烧结反应的压力为0.5MPa。The coating area in step 6 is 1.3 mL/cm 2 , the sintering temperature is 250° C., and the sintering reaction pressure is 0.5 MPa.
所述步骤7中的乙二胺的量是醋酸锌的9倍,所述高温高压反应的温度为170℃,压力为1.8MPa,所述高温高压反应的时间为3h,所述冷却反应的温度为自然冷却。The amount of ethylenediamine in the step 7 is 9 times that of zinc acetate, the temperature of the high temperature and high pressure reaction is 170°C, the pressure is 1.8MPa, the time of the high temperature and high pressure reaction is 3h, and the temperature of the cooling reaction for natural cooling.
实施例1-3的性能检测效果如下:The performance detection effect of embodiment 1-3 is as follows:
以上所述仅为本发明的一实施例,并不限制本发明,凡采用等同替换或等效变换的方式所获得的技术方案,均落在本发明的保护范围内。The above description is only an embodiment of the present invention, and does not limit the present invention. All technical solutions obtained by means of equivalent replacement or equivalent transformation fall within the protection scope of the present invention.
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DE10003491A1 (en) * | 2000-01-27 | 2001-08-02 | Midwest Res Inst Kansas City | Preparation of thin film semiconductor layer on photovoltaic device for solar cell comprises forming cadmium stannate layer on substrate, forming zinc stannate layer, semiconducting window layer and second semiconducting layer and heating |
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