CN106149039B - Electroplating apparatus - Google Patents
Electroplating apparatus Download PDFInfo
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Abstract
本发明公开一种电镀设备,包括主电源供应器、多个移动挂架组及第一阳极导电件。多个移动挂架组用以带动多个被镀物连续移动,各移动挂架组包括挂架及电性连接主电源供应器的分流电源供应器,挂架包括接触部及用以夹持被镀物的夹持部,其中分流电源供应器以阴极连接夹持部,且以阳极连接接触部;第一阳极导电件电性连接多个电镀材料,各移动挂架组藉由接触部与第一阳极导电件保持电性连接并沿着第一阳极导电件移动。其中多个被镀物藉由各分流电源供应器分配到相同的阴极电流,且多个电镀材料藉由第一阳极导电件共用各分流电源供应器的阳极。
The present invention discloses an electroplating device, including a main power supply, a plurality of movable rack groups and a first anode conductive member. The plurality of movable rack groups are used to drive a plurality of objects to be plated to move continuously, each movable rack group includes a rack and a shunt power supply electrically connected to the main power supply, the rack includes a contact portion and a clamping portion for clamping the object to be plated, wherein the shunt power supply is connected to the clamping portion with a cathode, and to the contact portion with an anode; the first anode conductive member is electrically connected to a plurality of electroplating materials, each movable rack group is electrically connected to the first anode conductive member through the contact portion and moves along the first anode conductive member. The plurality of objects to be plated are distributed to the same cathode current through each shunt power supply, and the plurality of electroplating materials share the anode of each shunt power supply through the first anode conductive member.
Description
技术领域technical field
本发明涉及一种电镀设备,特别是一种对每一个被镀物提供独立阴极电流的电镀设备。The invention relates to an electroplating equipment, in particular to an electroplating equipment which provides independent cathode current for each object to be plated.
背景技术Background technique
在印刷电路板的制造过程中,需要经由电镀制程形成基板之间的导电通路,再进行后续表面处理,以使印刷电路板得以成型。如图1所示,一般印刷电路板的固定式电镀设备80,在设计上是将连接电源供应器81阳极的电镀材料B设置在电镀槽82的两侧,并将连接电源供应器81阴极的被镀物A置入电镀槽82内的两侧电镀材料B之间,使被镀物A保持固定状态;之后藉由控制电源供应器81的电流输出状态,使得来自电镀材料B的金属离子能沉积在被镀物A上。In the manufacturing process of the printed circuit board, it is necessary to form a conductive path between the substrates through an electroplating process, and then perform subsequent surface treatment to shape the printed circuit board. As shown in Figure 1, the fixed electroplating equipment 80 of general printed circuit board is designed to connect the electroplating material B of the anode of the power supply 81 to be arranged on both sides of the electroplating tank 82, and to connect the electroplating material B of the anode of the power supply 81. The object to be plated A is placed between the electroplating materials B on both sides of the electroplating tank 82, so that the object to be plated A remains in a fixed state; then by controlling the current output state of the power supply 81, the metal ions from the electroplating material B can be Deposited on the object to be plated A.
而针对此固定式电镀设备80的电源供应器81的基本设置,是将所有被镀物A固定在同一支已连接阴极的导电铜排83,而将所有电镀材料B固定在同一支并连接至相同阳极的导电铜排84,再由电源供应器81控制电流输出功率以执行电镀制程。For the basic setting of the power supply 81 of this fixed electroplating equipment 80, all the objects to be plated A are fixed on the same conductive copper bar 83 connected to the cathode, and all electroplating materials B are fixed on the same branch and connected to The conductive copper bar 84 with the same anode is then controlled by the power supply 81 to execute the electroplating process.
另一种连续移动式电镀设备90,如图2及图3所示,在设计上与前述固定式电镀设备相似,差异在于连续移动式电镀设备90是将被镀物A于电镀槽92中能相对于电镀材料B连续移动。各个夹持被镀物A的移动件93能藉由滑动部931沿着导电铜排94滑动,而移动件93电性连接电源供应器91的阴极,使得被镀物A及导电铜排94都带阴极电。多个电镀材料B则是分为不同区域,各区域分别电性连接电源供应器91的不同阳极。Another kind of continuous mobile electroplating equipment 90, as shown in Figure 2 and Figure 3, is similar to the aforementioned fixed electroplating equipment in design, and the difference is that the continuous mobile electroplating equipment 90 is that the object A to be plated can be placed in the electroplating tank 92. Continuous movement relative to plating material B. Each moving part 93 holding the object to be plated A can slide along the conductive copper bar 94 through the sliding part 931, and the moving part 93 is electrically connected to the cathode of the power supply 91, so that the object to be plated A and the conductive copper bar 94 are both With cathode electricity. The plurality of electroplating materials B are divided into different areas, and each area is electrically connected to different anodes of the power supply 91 .
而针对此连续移动式电镀设备90的电源供应器91的设置,是将所有被镀物A藉由导电铜排94连接相同的阴极并使其于电镀槽92中沿一方向连续移动,而将所有电镀材料B固定但连接不同的阳极,再由电源供应器91控制电流输出功率以执行电镀制程。And for the setting of the power supply 91 of the continuous mobile electroplating equipment 90, all the objects to be plated A are connected to the same cathode through the conductive copper bar 94 and make it move continuously along one direction in the electroplating tank 92, and the All the electroplating materials B are fixed but connected to different anodes, and then the power supply 91 controls the current output power to execute the electroplating process.
而不论前述任一种控制方式,所有被镀物都是共用相同的阴极,如此当被镀物本身导电性有差异时,不同被镀物会相互抢电而导致被镀物之间受电不平均,影响被镀物上镀膜厚度的均匀性。Regardless of any of the aforementioned control methods, all the objects to be plated share the same cathode, so when the electrical conductivity of the objects to be plated is different, different objects to be plated will compete with each other for electricity, resulting in insufficient power receiving between the objects to be plated. On average, it affects the uniformity of the coating thickness on the object to be plated.
发明内容Contents of the invention
本发明的主要目的是提供一种对每一个被电镀物提供独立阴极电流的电镀设备,以解决习知共用阴极电流的电镀设备容易对被镀物产生镀层厚度不均的缺点。The main purpose of the present invention is to provide an electroplating device that provides an independent cathode current for each object to be plated, so as to solve the shortcoming that the conventional electroplating equipment that shares the cathode current tends to produce uneven coating thickness on the object to be plated.
为达到上述的目的,电镀设备包括主电源供应器、多个移动挂架组及第一阳极导电件。多个移动挂架组用以带动多个被镀物连续移动,各移动挂架组包括挂架及结合挂架的分流电源供应器,挂架包括接触部及用以夹持被镀物的夹持部,且分流电源供应器电性连接主电源供应器;其中分流电源供应器以阴极连接夹持部,且以阳极连接接触部。第一阳极导电件电性连接多个电镀材料,其中各移动挂架组藉由接触部与第一阳极导电件保持电性连接并沿着第一阳极导电件移动。其中多个被镀物藉由多个移动挂架组的各分流电源供应器分配到相同的阴极电流,且多个电镀材料藉由第一阳极导电件共用各分流电源供应器的阳极。To achieve the above purpose, the electroplating equipment includes a main power supply, a plurality of mobile hanger groups and a first anode conductor. A plurality of mobile hanger groups are used to drive multiple objects to be plated to move continuously. Each mobile hanger group includes a hanger and a shunt power supply combined with the hanger. The hanger includes a contact part and a clamp for holding the object to be plated. The holding part, and the shunt power supply is electrically connected to the main power supply; wherein the shunt power supply connects the holding part with the cathode, and connects the contact part with the anode. The first anode conductive member is electrically connected to a plurality of electroplating materials, wherein each mobile hanger group maintains electrical connection with the first anode conductive member through the contact portion and moves along the first anode conductive member. The plurality of objects to be plated are distributed to the same cathode current by each shunt power supply of the plurality of moving hanger groups, and a plurality of electroplating materials share the anode of each shunt power supply through the first anode conductive member.
更包括至少一第二阳极导电件,至少一第二阳极导电件用以设置多个电镀材料,且各电镀材料藉由至少一第二阳极导电件电性连接第一阳极导电件。It further includes at least one second anode conductive element, the at least one second anode conductive element is used to set a plurality of electroplating materials, and each electroplating material is electrically connected to the first anode conductive element through the at least one second anode conductive element.
分流电源供应器包括无线控制模组,用以接受无线控制信号以控制电源输出。The shunt power supply includes a wireless control module for receiving wireless control signals to control power output.
电镀设备更包括导电组件,主电源供应器藉由导电组件电性连接至各分流电源供应器,用以将直流电源经导电组件传输至各分流电源供应器。The electroplating equipment further includes a conductive component, and the main power supply is electrically connected to each branch power supply through the conductive component, so as to transmit DC power to each branch power supply through the conductive component.
各分流电源供应器更包括滑动部,滑动部与导电组件形成可滑动地连接。Each shunt power supply further includes a sliding part, and the sliding part forms a slidable connection with the conductive component.
接触部为至少一滑动组件。The contact part is at least one sliding component.
主电源供应器的输出电压大于各分流电源供应器的输出电压。The output voltage of the main power supply is greater than the output voltages of each of the shunt power supplies.
藉此设计,每个被镀物都能由独立的分流电源供应器单独控制,使得每个被镀物具有相同阴极电流,提高被镀物的镀膜均匀性。With this design, each object to be plated can be individually controlled by an independent shunt power supply, so that each object to be plated has the same cathode current, which improves the uniformity of the coating of the object to be plated.
附图说明Description of drawings
图1是习知固定式电镀设备的侧剖视图。Fig. 1 is a side sectional view of a conventional stationary electroplating equipment.
图2是习知连续式电镀设备的侧剖视图。Fig. 2 is a side sectional view of a conventional continuous electroplating equipment.
图3是习知连续式电镀设备的俯视图。Fig. 3 is a top view of conventional continuous electroplating equipment.
图4是电镀设备的主电源供应器与多个移动挂架组的组成示意图。Fig. 4 is a schematic diagram of the main power supply of the electroplating equipment and a plurality of mobile hanger groups.
图5是电镀设备的侧剖视图。Fig. 5 is a side sectional view of an electroplating apparatus.
图6是电镀设备的俯视图。Fig. 6 is a plan view of the electroplating equipment.
符号说明:Symbol Description:
电镀设备 1Plating Equipment 1
主电源供应器 10main power supply 10
移动挂架组 20Mobile hanger set 20
挂架 21hanger 21
接触部 211Contact 211
夹持部 212Clamping part 212
分流电源供应器 22Shunt Power Supplies 22
无线控制模组 221Wireless Control Module 221
阴极 222Cathode 222
阳极 223Anode 223
滑动部 224sliding part 224
第一阳极导电件 30First anode conductor 30
第二阳极导电件 40Second anode conductor 40
电镀槽 50Plating tank 50
导电组件 60Conductive components 60
被镀物 ATo be plated A
电镀材料 BPlating material B
设定方向 LSet direction L
(习知技术)(known technology)
固定式电镀设备 80Stationary electroplating equipment 80
电源供应器 81power supply 81
电镀槽 82Plating tank 82
导电铜排 83Conductive copper bar 83
导电铜排 84Conductive copper bar 84
连续移动式电镀设备 90Continuous mobile electroplating equipment 90
电源供应器 91power supply 91
电镀槽 92Plating tank 92
移动件 93Moving parts 93
滑动部 931sliding part 931
导电铜排 94Conductive copper bar 94
被镀物 ATo be plated A
电镀材料 BPlating material B
设定方向 LSet direction L
具体实施方式detailed description
为让本申请的上述和其他目的、特征和优点能更明显易懂,下文特举出本发明的具体实施例,并配合所附图式,作详细说明如下。In order to make the above and other objects, features and advantages of the present application more comprehensible, specific embodiments of the present invention are listed below and described in detail in conjunction with the accompanying drawings.
以下请先参考图4。如图4所示,电镀设备1包括主电源供应器10及多个移动挂架组20。主电源供应器10用以将交流电源转换成直流电源,并将直流电源输出至多个移动挂架组20以供后续应用。多个移动挂架组20依序排列,且能够被驱动装置(例如马达等,图未示)带动以沿着一个设定方向L连续移动。Please refer to Figure 4 below. As shown in FIG. 4 , the electroplating equipment 1 includes a main power supply 10 and a plurality of mobile hanger groups 20 . The main power supply 10 is used to convert AC power into DC power, and output the DC power to a plurality of mobile hanger sets 20 for subsequent use. A plurality of mobile hanger groups 20 are arranged in sequence, and can be driven by a driving device (such as a motor, etc., not shown in the figure) to move continuously along a set direction L. As shown in FIG.
各移动挂架组20包括挂架21及分流电源供应器22,且分流电源供应器22结合于挂架21。主电源供应器10电性连接各移动挂架组20的分流电源供应器22,以藉由各分流电源供应器22取得较小的输出电流。在本发明的一实施例中,主电源供应器10能够将高电压的交流电源转换成较低电压的直流电源,再经输出分配至各分流电源供应器22,以使各分流电源供应器22取得较小的输出直流电源,但前述直流电源设计不以本实施例为限。Each mobile hanger set 20 includes a hanger 21 and a shunt power supply 22 , and the shunt power supply 22 is combined with the hanger 21 . The main power supply 10 is electrically connected to the shunt power supplies 22 of each mobile hanger set 20 so as to obtain a smaller output current through each shunt power supply 22 . In one embodiment of the present invention, the main power supply 10 can convert the high-voltage AC power into a lower voltage DC power, and then distribute it to each branch power supply 22 through the output, so that each branch power supply 22 A smaller output DC power supply is obtained, but the design of the aforementioned DC power supply is not limited to this embodiment.
需注意的是,移动挂架组20的数量视电镀需求及设备大小而增减;而当移动挂架组20的数量较多时,在电镀设备1的设置上也能视情况增加主电源供应器10的数量,以因应分配输出电源至多个移动挂架组20的分流电源供应器22。It should be noted that the number of mobile hanger groups 20 increases or decreases depending on the electroplating requirements and the size of the equipment; and when the number of mobile hanger groups 20 is large, the setting of the electroplating equipment 1 can also increase the main power supply according to the situation The quantity is 10 to deal with the split power supply 22 that distributes the output power to a plurality of mobile hanger groups 20 .
在本实施例中,分流电源供应器22包括无线控制模组221。无线控制模组221用以接受来自外界的无线控制信号,并依据该无线控制信号以控制本身电源输出。此处无线控制模组221能采用蓝芽模组、红外线模组、Wi-Fi模组、3G/4G网路通讯模组或其他具无线信号传输功能的无线控制模组。因此,使用者藉由遥控器、手机、电脑等控制装置,就能在远端控制各移动挂架组20的分流电源供应器22的电源输出,达到即时控制的效果,并增加操作便利性。In this embodiment, the shunt power supply 22 includes a wireless control module 221 . The wireless control module 221 is used to receive a wireless control signal from the outside, and control its own power output according to the wireless control signal. Here, the wireless control module 221 can adopt a Bluetooth module, an infrared module, a Wi-Fi module, a 3G/4G network communication module or other wireless control modules with wireless signal transmission functions. Therefore, the user can remotely control the power output of the shunt power supply 22 of each mobile hanger set 20 by using control devices such as a remote control, a mobile phone, and a computer, so as to achieve real-time control and increase operational convenience.
以下请一并参考图5及图6。如图5及图6所示,电镀设备1更包括第一阳极导电件30,且第一阳极导电件30电性连接多个电镀材料B。各移动挂架组20的挂架21包括接触部211及夹持部212。接触部211用以与第一阳极导电件30保持电性连接,并使挂架21能沿着第一阳极导电件30移动。在本实施例中,第一阳极导电件30是采用一支阳极铜排,接触部211是采用至少一滑动组件,例如滚轮组等,藉由滑动组件与阳极铜排可滑动地结合,使得挂架21藉由接触部211不但能较稳定且平顺地沿着第一阳极导电件30移动,又能确保接触部211与第一阳极导电件30的电性连接,但接触部211的设计不以此为限。Please refer to FIG. 5 and FIG. 6 together below. As shown in FIG. 5 and FIG. 6 , the electroplating equipment 1 further includes a first anode conductive member 30 , and the first anode conductive member 30 is electrically connected to a plurality of electroplating materials B. As shown in FIG. The hanger 21 of each mobile hanger set 20 includes a contact portion 211 and a clamping portion 212 . The contact portion 211 is used to maintain electrical connection with the first anode conductive member 30 and enable the hanger 21 to move along the first anode conductive member 30 . In this embodiment, the first anode conductor 30 uses an anode copper bar, and the contact part 211 uses at least one sliding component, such as a roller set, etc., and the sliding component is slidably combined with the anode copper bar, so that the hanging The frame 21 can not only move stably and smoothly along the first anode conductor 30 through the contact portion 211, but also ensure the electrical connection between the contact portion 211 and the first anode conductor 30, but the design of the contact portion 211 is not based on This is the limit.
夹持部212用以夹持被镀物A,使得移动挂架组20移动时,能带动被镀物A一并移动。在本实施例中,夹持部212是采用至少一夹固件,例如金属夹等,藉由手动或电动方式夹持或松脱被镀物A。The clamping portion 212 is used for clamping the object to be plated A, so that when the moving hanger set 20 moves, the object to be plated A can be moved together. In this embodiment, the clamping part 212 uses at least one clamping member, such as a metal clip, to clamp or release the object A to be plated manually or electrically.
各移动挂架组20的分流电源供应器22包括阴极222及阳极223。其中分流电源供应器22的阴极222电性连接夹持部212,且分流电源供应器22的阳极223连接接触部211。藉此,分流电源供应器22的阴极222能输出阴极电流至夹持部212所夹持的被镀物A,使得被镀物A带阴极电荷;而分流电源供应器22的阳极223则藉由接触部211电性连接至第一阳极导电件30,使得电镀材料B带阳极电荷。The shunt power supply 22 of each mobile hanger set 20 includes a cathode 222 and an anode 223 . The cathode 222 of the shunt power supply 22 is electrically connected to the clamping portion 212 , and the anode 223 of the shunt power supply 22 is connected to the contact portion 211 . Thereby, the cathode 222 of the shunt power supply 22 can output the cathode current to the object to be plated A clamped by the clamping portion 212, so that the object to be plated A is charged with cathode; and the anode 223 of the shunt power supply 22 is passed The contact portion 211 is electrically connected to the first anode conductive member 30 , so that the electroplating material B is anodically charged.
在本发明的一实施例中,电镀设备1更包括至少一第二阳极导电件40,用以做为第一阳极导电件30及多个电镀材料B之间的电性连接媒介。也就是说,至少一第二阳极导电件40能用以设置多个电镀材料B,且各电镀材料B也能藉由至少一第二阳极导电件40电性连接第一阳极导电件30。此处至少一第二阳极导电件40是采用两支阳极铜排,分别设置在电镀槽50的两侧,而每支阳极铜排均供设置多个电镀材料B。需注意的是,至少一第二阳极导电件40的设置数量及型式不以此为限。In an embodiment of the present invention, the electroplating equipment 1 further includes at least one second anode conductive member 40 used as an electrical connection medium between the first anode conductive member 30 and the plurality of electroplating materials B. As shown in FIG. That is to say, at least one second anode conductive element 40 can be used to arrange a plurality of electroplating materials B, and each electroplating material B can also be electrically connected to the first anode conductive element 30 through the at least one second anode conductive element 40 . Here, at least one second anode conductor 40 adopts two anode copper bars, which are arranged on both sides of the electroplating tank 50 respectively, and each anode copper bar is provided with a plurality of electroplating materials B. It should be noted that the number and type of the at least one second anode conductive member 40 are not limited thereto.
藉此,各分流电源供应器22的阴极222能独立输出阴极电流至夹持部212所对应夹持的被镀物A,也就是说,每个被镀物A都会对应到一个独立的分流电源供应器22;而各分流电源供应器22的阳极223则藉由接触部211电性连接至第一阳极导电件30,形成各阳极223并联的效果,以使阳极223形成共阳回路。In this way, the cathode 222 of each shunt power supply 22 can independently output the cathode current to the object to be plated A held by the clamping portion 212, that is, each object to be plated A will correspond to an independent shunt power supply and the anodes 223 of each shunt power supply 22 are electrically connected to the first anode conductive member 30 through the contact portion 211 to form the effect of parallel connection of each anode 223 so that the anodes 223 form a common anode circuit.
如图5及图6所示,在本实施例中,电镀设备1更包括导电组件60。此导电组件60是做为主电源供应器10与各移动挂架组20的分流电源供应器22之间的导电媒介,以便于各移动挂架组20相对于主电源供应器10移动时仍能与主电源供应器10保持电性连接。主电源供应器10藉由导电组件60电性连接至各分流电源供应器22,用以将主电源供应器10所输出的直流电源经导电组件60传输至各分流电源供应器22。As shown in FIGS. 5 and 6 , in this embodiment, the electroplating equipment 1 further includes a conductive component 60 . This conductive component 60 is used as the conductive medium between the main power supply 10 and the shunt power supply 22 of each mobile hanger group 20, so that each mobile hanger group 20 can still move relative to the main power supply 10. It is electrically connected with the main power supply 10 . The main power supply 10 is electrically connected to each of the split power supplies 22 through the conductive component 60 for transmitting the DC power outputted by the main power supply 10 to each of the split power supplies 22 through the conductive component 60 .
在设计上,导电组件60包括二支导电铜排,分别连接主电源供应器10的阳极DC端子及阴极RTN端子;而各分流电源供应器22更包括滑动部224,滑动部224能以套环、卡勾或其他可导电的滑动结构等分别与二支导电铜排形成可滑动地连接,使得各移动挂架组20在移动过程中仍然能与主电源供应器10保持电性连接,但本发明不以此为限。In terms of design, the conductive component 60 includes two conductive copper bars, which are respectively connected to the anode DC terminal and the cathode RTN terminal of the main power supply 10; and each shunt power supply 22 further includes a sliding part 224, which can be connected with a collar , hooks or other conductive sliding structures are slidably connected to the two conductive copper bars, so that each mobile hanger group 20 can still be electrically connected to the main power supply 10 during the movement process, but this The invention is not limited thereto.
在实际执行电镀制程时,电镀设备1会驱动多个移动挂架组20沿着第一阳极导电件30朝设定方向L连续移动;此时各移动挂架组20所夹持的各多个被镀物A会被带动,并于电镀槽50两侧的多个电镀材料B之间连续移动。当然,各分流电源供应器22也会被各移动挂架组20带动而随的连续移动。藉由各分流电源供应器22的电源输出,各电镀材料B会成为阳极,而各被镀物A会成为阴极。When actually performing the electroplating process, the electroplating equipment 1 will drive a plurality of mobile hanger groups 20 to move continuously along the first anode conductive member 30 toward the set direction L; The object to be plated A will be driven and continuously move among the plurality of electroplating materials B on both sides of the electroplating tank 50 . Of course, each split power supply 22 will also be driven by each mobile hanger set 20 to move continuously. With the power output of each shunt power supply 22 , each electroplating material B will become an anode, and each object A to be plated will become a cathode.
由于各移动挂架组20均有独立的分流电源供应器22,使得各被镀物A都能藉由对应分流电源供应器22单独控制,使其能分配到相同且稳定的阴极电流,不会因为被镀物A之间可能具有导电性差异而造成受电不平均;而多个电镀材料B则藉由第一阳极导电件30共用各分流电源供应器22的阳极,形成同一阳极回路。Since each mobile hanger group 20 has an independent shunt power supply 22, each object A to be plated can be independently controlled by the corresponding shunt power supply 22, so that it can be distributed to the same and stable cathode current, and will not Due to the difference in electrical conductivity between the objects A to be plated, uneven power reception is caused; while a plurality of electroplating materials B share the anodes of the shunt power supplies 22 through the first anode conductive member 30 to form the same anode loop.
藉此,由于各被镀物A所分配到的阴极电流相同,在执行电镀时即能保持其镀层膜厚的均匀性,大幅改良了习知电镀设备的缺点。使用者也能藉由遥控装置即时监控电镀设备的状态,以确保电镀制程的良率及效果。Thereby, since the cathodic current distributed to each object A to be plated is the same, the uniformity of the coating film thickness can be maintained during electroplating, which greatly improves the shortcomings of conventional electroplating equipment. Users can also monitor the status of the electroplating equipment in real time through the remote control device to ensure the yield and effect of the electroplating process.
综上所陈,本发明无论就目的、手段及功效,均显示其迥异于习知技术的特征。惟应注意的是,上述诸多实施例仅为了便于说明而举例而已,本发明所主张的权利范围自应以权利要求书所述为准,而非仅限于上述实施例。To sum up, the present invention shows its characteristics that are very different from the prior art in terms of purpose, means and efficacy. However, it should be noted that the above-mentioned embodiments are only examples for the convenience of description, and the scope of rights claimed by the present invention should be determined by the claims, rather than limited to the above-mentioned embodiments.
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5494561A (en) * | 1993-01-22 | 1996-02-27 | Societe Anonyme Dite Regie Nationale Des Usines Renault | Apparatus for surface treatment by cataphoresis of metal parts, particularly of motor vehicle bodies |
JP2006037134A (en) * | 2004-07-23 | 2006-02-09 | Chuo Seisakusho Ltd | Current control method for continuous plating device of carrier system |
CN101423969A (en) * | 2007-11-01 | 2009-05-06 | Almexpe株式会社 | Continuous plating apparatus |
KR20100115955A (en) * | 2009-04-21 | 2010-10-29 | 주식회사 티케이씨 | Serial plating system machine rectifeer an electrode plate system |
CN103031588A (en) * | 2011-09-29 | 2013-04-10 | Almexpe株式会社 | Serial plating system |
CN204714932U (en) * | 2015-04-08 | 2015-10-21 | 亚硕企业股份有限公司 | Plating equipment |
-
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5494561A (en) * | 1993-01-22 | 1996-02-27 | Societe Anonyme Dite Regie Nationale Des Usines Renault | Apparatus for surface treatment by cataphoresis of metal parts, particularly of motor vehicle bodies |
JP2006037134A (en) * | 2004-07-23 | 2006-02-09 | Chuo Seisakusho Ltd | Current control method for continuous plating device of carrier system |
CN101423969A (en) * | 2007-11-01 | 2009-05-06 | Almexpe株式会社 | Continuous plating apparatus |
KR20100115955A (en) * | 2009-04-21 | 2010-10-29 | 주식회사 티케이씨 | Serial plating system machine rectifeer an electrode plate system |
CN103031588A (en) * | 2011-09-29 | 2013-04-10 | Almexpe株式会社 | Serial plating system |
CN204714932U (en) * | 2015-04-08 | 2015-10-21 | 亚硕企业股份有限公司 | Plating equipment |
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