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CN106032036B - cutting device - Google Patents

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Publication number
CN106032036B
CN106032036B CN201510103242.8A CN201510103242A CN106032036B CN 106032036 B CN106032036 B CN 106032036B CN 201510103242 A CN201510103242 A CN 201510103242A CN 106032036 B CN106032036 B CN 106032036B
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wafer
cutting
dicing tape
ultraviolet
ultraviolet rays
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CN106032036A (en
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关家一马
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Disco Corp
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Disco Corp
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Abstract

本发明提供切削装置,其紧凑地构成了紫外线照射构件,紫外线照射构件对晶片照射紫外线来赋予亲水性,可防止切削时产生的切削屑附着于晶片表面,并且能够在晶片被分割为一个个器件后对切割带照射紫外线以降低粘接力。切削装置具备对晶片的表面照射紫外线以赋予亲水性并对切割带照射紫外线以使粘接力降低的紫外线照射构件。紫外线照射构件具备:紫外线照射灯,其照射紫外线,紫外线包含对晶片的表面照射而生成臭氧并生成活性氧的波长、和对切割带照射而使粘接力降低的波长;第1框架支承构件,其配设在紫外线照射灯下侧,对借助切割带支承晶片的环状框架进行支承;和第2框架支承构件,其配设在紫外线照射灯的上侧,对借助切割带支承晶片的环状框架进行支承。

The present invention provides a cutting device, which compactly constitutes an ultraviolet irradiating member that irradiates a wafer with ultraviolet rays to impart hydrophilicity, prevents chips generated during cutting from adhering to the surface of the wafer, and can be divided into individual parts after the wafer is divided. UV rays are irradiated to the dicing tape after the device to reduce the adhesive force. The cutting device includes an ultraviolet irradiation member that irradiates the surface of the wafer with ultraviolet rays to impart hydrophilicity and irradiates the dicing tape with ultraviolet rays to reduce the adhesive force. The ultraviolet irradiation member includes: an ultraviolet irradiation lamp, which irradiates ultraviolet rays, and the ultraviolet rays include wavelengths that irradiate the surface of the wafer to generate ozone and generate active oxygen, and wavelengths that irradiate the dicing tape to reduce the adhesive force; the first frame support member, It is arranged on the lower side of the ultraviolet irradiation lamp, and supports the annular frame supporting the wafer by the dicing tape; The frame supports it.

Description

切削装置cutting device

技术领域technical field

本发明涉及用于对半导体晶片等晶片进行切削加工的切削装置。The present invention relates to a cutting device for cutting wafers such as semiconductor wafers.

背景技术Background technique

在半导体器件的制造工序中,在大致圆板形状的半导体晶片的表面,通过呈格子状排列形成的分割预定线划分出多个区域,在该划分出的区域中形成IC(IntegratedCircuit:集成电路)、LSI(Large-scale Integration:大规模集成电路)等器件。然后,通过沿分割预定线将半导体晶片切断,由此分割形成有器件的区域,制造出一个个的器件。另外,对于在蓝宝石基板的表面层叠有氮化镓系化合物半导体等而成的光器件晶片,也通过沿分割预定线进行切断而分割出一个个发光二极管、激光二极管等光器件,广泛应用于电子设备中。In the manufacturing process of semiconductor devices, on the surface of a substantially disc-shaped semiconductor wafer, a plurality of regions are divided by dividing lines arranged in a grid pattern, and ICs (Integrated Circuits) are formed in the divided regions. , LSI (Large-scale Integration: large-scale integrated circuits) and other devices. Then, the semiconductor wafer is cut along planned dividing lines, thereby dividing the region where the device is formed, and manufacturing individual devices. In addition, optical devices such as light-emitting diodes and laser diodes are divided into individual optical devices such as light-emitting diodes and laser diodes by cutting along the planned dividing line for optical device wafers formed by laminating gallium nitride-based compound semiconductors on the surface of the sapphire substrate. in the device.

上述的沿着半导体晶片或光器件晶片等的分割预定线进行的切断通常利用被称作切片机的切削装置来进行。该切削装置具备:保持构件,其保持半导体晶片等晶片;切削构件,其具备切削刀具,该切削刀具对保持于该保持构件上的被加工物进行切削;切削进给构件,其使保持构件和切削构件沿切削进给方向相对地移动;分度进给构件,其使保持构件和切削构件沿与切削进给方向垂直的分度进给方向相对地移动;盒载置机构,其具备盒载置台,所述盒载置台载置收纳有晶片的盒,所述晶片粘贴在由于紫外线的照射而使得粘接力降低的切割带上,并通过该切割带支承于环状框架;搬出构件,其将收纳于载置在该盒载置台上的该盒中的晶片搬出至临时放置区域;以及搬送构件,其将被搬出至该临时放置区域的晶片搬送至保持构件。切削构件包括主轴单元,该主轴单元具备旋转主轴和驱动机构,该驱动机构驱动安装于该主轴上的切削刀具及旋转主轴旋转,在切削时,一边向切削刀具的切削部供给切削液一边进行切削。The above-mentioned cutting along the planned dividing line of the semiconductor wafer or the optical device wafer is usually performed by a cutting device called a slicer. This cutting device includes: a holding member that holds wafers such as semiconductor wafers; a cutting member that includes a cutting tool that cuts a workpiece held on the holding member; and a cutting feed member that makes the holding member and The cutting member relatively moves along the cutting feed direction; the index feed member moves the holding member and the cutting member relatively along the index feed direction perpendicular to the cutting feed direction; The cassette mounting table mounts the cassette containing the wafer, the wafer is stuck on the dicing tape whose adhesive force is reduced due to the irradiation of ultraviolet rays, and is supported on the ring frame by the dicing tape; the unloading member includes The wafers stored in the cassette placed on the cassette mounting table are carried out to the temporary storage area; and the transfer member transfers the wafers carried out to the temporary storage area to the holding member. The cutting unit includes a spindle unit including a rotating spindle and a drive mechanism that drives a cutting tool mounted on the spindle and the rotating spindle to rotate, and performs cutting while supplying a cutting fluid to a cutting portion of the cutting tool during cutting. .

可是,在上述切削装置中,存在这样的问题:在利用切削刀具对晶片进行切削时产生的切削屑混入切削液中并漂浮在晶片的表面上,由此导致切削屑附着于晶片的表面而造成污染。即,由于切削晶片而产生的切削屑在混入切削液而漂浮在晶片的表面上时附着于晶片的表面,并且,当切削液消失而干燥时,切削屑会牢固地附着于晶片的表面。However, in the above-mentioned cutting device, there is a problem that chips generated when the wafer is cut by the cutting tool are mixed in the cutting fluid and float on the surface of the wafer, thereby causing the chips to adhere to the surface of the wafer and cause Pollution. That is, chips generated by cutting a wafer adhere to the surface of the wafer when mixed with the cutting fluid and float on the surface of the wafer, and when the cutting fluid disappears and dries, the chips adhere firmly to the surface of the wafer.

为了解决这样的问题,在下述专利文献1中公开了一种切削装置,该切削装置具备第1紫外线照射构件和第2紫外线照射构件,所述第1紫外线照射构件配置在上述盒载置台的下侧,对晶片照射紫外线来赋予亲水性,所述第2紫外线照射构件对切割带照射紫外线而使其粘接力降低,在切削晶片之前对晶片的表面照射紫外线而生成臭氧,并且生成活性氧而对切削面赋予亲水性,从而防止在切削时产生的切削屑附着于晶片的表面,并且,晶片被分割为一个个器件之后,对切割带照射紫外线而使其粘接力降低,使得接下来的拾取工序变得容易。In order to solve such a problem, Patent Document 1 below discloses a cutting device including a first ultraviolet irradiating member and a second ultraviolet irradiating member, and the first ultraviolet irradiating member is arranged under the above-mentioned cartridge mounting table. On the side, the wafer is irradiated with ultraviolet rays to impart hydrophilicity, the second ultraviolet irradiation member irradiates ultraviolet rays to the dicing tape to reduce its adhesive force, and before cutting the wafer, the surface of the wafer is irradiated with ultraviolet rays to generate ozone and active oxygen The cutting surface is given hydrophilicity to prevent the chips generated during cutting from adhering to the surface of the wafer, and after the wafer is divided into individual devices, the dicing tape is irradiated with ultraviolet rays to reduce its adhesive force, making the bonding The next pick-up process becomes easy.

专利文献1:日本特开2006-295050号公报Patent Document 1: Japanese Patent Laid-Open No. 2006-295050

并且,在上述的切削装置中,对晶片照射紫外线来赋予亲水性的第1紫外线照射构件和对切割带照射紫外线来使粘接力降低的第2紫外线照射构件分别独立地配置,装置内的空间受到制约从而成为阻碍装置小型化的原因。In addition, in the cutting apparatus described above, the first ultraviolet irradiation member for imparting hydrophilicity by irradiating ultraviolet rays to the wafer and the second ultraviolet irradiation member for reducing the adhesive force by irradiating ultraviolet rays to the dicing tape are separately arranged, and the Space is restricted, which hinders miniaturization of the device.

发明内容Contents of the invention

本发明是鉴于上述情况而完成的,其主要的技术课题在于提供一种紧凑地构成有紫外线照射构件的切削装置,所述紫外线照射构件对晶片照射紫外线以赋予亲水性,从而能够防止在切削时产生的切削屑附着于晶片的表面,并且,所述紫外线照射构件能够在晶片被分割为一个个器件之后对切割带照射紫外线以使其粘接力降低。The present invention has been made in view of the above circumstances, and its main technical problem is to provide a cutting device that is compactly configured with an ultraviolet ray irradiation member that irradiates ultraviolet rays to the wafer to impart hydrophilicity, thereby preventing damage to the wafer during cutting. Chips generated during the process adhere to the surface of the wafer, and the ultraviolet irradiation member can irradiate ultraviolet rays to the dicing tape after the wafer is divided into individual devices to reduce its adhesive force.

为了解决上述主要的技术课题,根据本发明,提供一种切削装置,所述切削装置具备:保持构件,其保持晶片;切削构件,其具备对由该保持构件保持的晶片进行切削的切削刀具;切削进给构件,其使该保持构件和该切削构件沿切削进给方向相对移动;分度进给构件,其使该保持构件和该切削构件沿着与切削进给方向垂直的分度进给方向相对移动;盒载置机构,其具备盒载置台,该盒载置台载置收纳有晶片的盒,所述晶片被粘贴在由于紫外线的照射而使得粘接力降低的切割带上,并借助该切割带被支承于环状的框架;搬出构件,其将在载置于该盒载置台上的该盒中收纳的晶片搬出至临时放置区域;以及搬送构件,其将被搬出至该临时放置区域的晶片搬送至该保持构件,所述切削装置的特征在于,所述切削装置具备紫外线照射构件,所述紫外线照射构件向被该搬出构件搬出的晶片的表面照射紫外线以赋予亲水性,并且向该切割带照射紫外线以使粘接力降低,该紫外线照射构件具备:紫外线照射灯,其照射紫外线,所述紫外线包含对晶片的表面进行照射而生成臭氧并且生成活性氧的波长、和对该切割带进行照射而使粘接力降低的波长;第1框架支承构件,其配设在该紫外线照射灯下侧,对借助该切割带支承晶片的该环状的框架进行支承;和第2框架支承构件,其配设在该紫外线照射灯的上侧,对借助该切割带支承晶片的该环状的框架进行支承,在对晶片的表面照射紫外线来赋予亲水性时,利用该第1框架支承构件对借助该切割带支承晶片的该环状的框架进行支承,在对该切割带照射紫外线以使粘接力降低时,利用该第2框架支承构件对借助该切割带支承晶片的该环状的框架进行支承。In order to solve the above-mentioned main technical problems, according to the present invention, there is provided a cutting device including: a holding member that holds a wafer; a cutting member that includes a cutting tool for cutting the wafer held by the holding member; Cutting feed member, which makes the holding member and the cutting member relatively move along the cutting feeding direction; index feeding member, which makes the holding member and the cutting member move along the indexing feed perpendicular to the cutting feeding direction Direction relative movement; Cassette loading mechanism, which has a cassette loading table, the cassette loading table is loaded with a cassette containing a wafer, the wafer is pasted on the dicing tape whose adhesive force is reduced due to the irradiation of ultraviolet rays, and by means of The dicing tape is supported by a ring-shaped frame; an unloading member that unloads the wafers stored in the cassette placed on the pod mounting table to a temporary storage area; The wafer in the region is conveyed to the holding member, and the cutting device is characterized in that the cutting device includes an ultraviolet ray irradiation member that irradiates ultraviolet rays to the surface of the wafer carried out by the carrying out member to impart hydrophilicity, and The dicing tape is irradiated with ultraviolet rays to reduce the adhesive force, and the ultraviolet irradiation member includes: an ultraviolet irradiation lamp that irradiates ultraviolet rays including wavelengths that irradiate the surface of the wafer to generate ozone and generate active oxygen, and a wavelength at which the dicing tape is irradiated to reduce the adhesive force; a first frame support member is disposed on the lower side of the ultraviolet irradiation lamp, and supports the ring-shaped frame that supports the wafer via the dicing tape; and a second frame A support member is disposed above the ultraviolet irradiation lamp, supports the ring-shaped frame that supports the wafer via the dicing tape, and uses the first frame when irradiating ultraviolet rays to the surface of the wafer to impart hydrophilicity. The support member supports the ring-shaped frame that supports the wafer via the dicing tape, and when the dicing tape is irradiated with ultraviolet rays to reduce the adhesive force, the second frame support member supports the ring that supports the wafer via the dicing tape. shaped frame for support.

上述紫外线照射灯优选为低压水银灯。The above-mentioned ultraviolet irradiation lamp is preferably a low-pressure mercury lamp.

在本发明的切削装置中,紫外线照射构件向被搬出构件搬出的晶片的表面照射紫外线以赋予亲水性,并对切割带照射紫外线以使其粘接力降低,该紫外线照射构件具备:紫外线照射灯,其照射紫外线,所述紫外线包含对晶片的表面进行照射而生成臭氧并生成活性氧的波长、和对切割带进行照射而使其粘接力降低的波长;第1框架支承构件,其配设在紫外线照射灯下侧,对借助切割带支承晶片的环状的框架进行支承;和第2框架支承构件,其配设在紫外线照射灯的上侧,对借助切割带支承晶片的环状的框架进行支承,在对晶片的表面照射紫外线来赋予亲水性时,利用第1框架支承构件对借助切割带支承晶片的环状的框架进行支承,在对切割带照射紫外线以使其粘接力降低时,利用第2框架支承构件对借助切割带支承晶片的环状的框架进行支承,因此,能够利用1个紫外线照射灯来实施将对晶片的表面照射紫外线以赋予亲水性的亲水性赋予工序、和对切割带照射紫外线以使粘接力降低的粘接力降低工序。因此,无需配设用于赋予亲水性的紫外线照射灯和用于降低粘接力的紫外线照射灯,因此,切削装置内的空间的限制得到缓和,能够实现装置的小型化。In the cutting device of the present invention, the ultraviolet irradiation member irradiates ultraviolet rays to the surface of the wafer carried out by the carrying-out member to impart hydrophilicity, and irradiates ultraviolet rays to the dicing tape to reduce its adhesive force, and the ultraviolet irradiation member includes: a lamp for irradiating ultraviolet rays including wavelengths that irradiate the surface of the wafer to generate ozone and generate active oxygen, and wavelengths that irradiate the dicing tape to reduce its adhesive force; the first frame supporting member is equipped with Provided on the lower side of the ultraviolet irradiation lamp, supporting the ring-shaped frame that supports the wafer through the dicing tape; The frame is supported, and when the surface of the wafer is irradiated with ultraviolet rays to impart hydrophilicity, the ring-shaped frame that supports the wafer through the dicing tape is supported by the first frame supporting member, and the adhesive force is increased when the dicing tape is irradiated with ultraviolet rays. When lowering, the ring-shaped frame that supports the wafer through the dicing tape is supported by the second frame support member, so a single ultraviolet irradiation lamp can be used to implement the hydrophilicity of irradiating ultraviolet rays to the surface of the wafer to impart hydrophilicity. The application process and the adhesive force reduction process which irradiate ultraviolet-ray to a dicing tape and reduce adhesive force. Therefore, since there is no need to arrange an ultraviolet irradiation lamp for imparting hydrophilicity and an ultraviolet irradiation lamp for reducing adhesive force, the limitation of the space in the cutting device is eased, and the size of the device can be reduced.

附图说明Description of drawings

图1是根据本发明构成的切削装置的立体图。Figure 1 is a perspective view of a cutting device constructed in accordance with the present invention.

图2是在图1所示的切削装置中装备的盒载置机构的立体图。Fig. 2 is a perspective view of a cartridge mounting mechanism included in the cutting device shown in Fig. 1 .

图3是示出将盒载置台定位于第1搬出搬入位置的状态的说明图,所述盒载置台构成了在图1所示的切削装置中装备的盒载置机构。3 is an explanatory view showing a state where a cassette mounting table constituting a cassette loading mechanism equipped in the cutting device shown in FIG. 1 is positioned at a first loading/unloading position.

图4是示出将盒载置台定位于第2搬出搬入位置的状态的说明图,所述盒载置台构成了在图1所示的切削装置中装备的盒载置机构。4 is an explanatory view showing a state where a cassette mounting table constituting a cassette loading mechanism equipped in the cutting device shown in FIG. 1 is positioned at a second loading and unloading position.

图5是示出将盒载置台定位于第3搬出搬入位置的状态的说明图,所述盒载置台构成了在图1所示的切削装置中装备的盒载置机构。5 is an explanatory view showing a state where a cassette mounting table constituting a cassette loading mechanism equipped in the cutting device shown in FIG. 1 is positioned at a third carrying-in/out position.

标号说明Label description

2:装置壳体;2: device housing;

3:保持构件;3: Hold the component;

4:主轴单元;4: Spindle unit;

43:切削刀具;43: cutting tool;

44:切削液供给喷嘴;44: cutting fluid supply nozzle;

5:摄像构件;5: camera components;

6:显示构件;6: display components;

7:盒载置机构;7: Box loading mechanism;

71:盒载置台;71: box loading table;

72:升降构件;72: Lifting member;

8:紫外线照射构件;8: UV irradiation components;

81:壳体;81: shell;

811:紫外线照射室;811: Ultraviolet irradiation room;

82:紫外线照射灯;82: Ultraviolet irradiation lamp;

83:第1框架支承构件;83: the first frame support member;

84:第2框架支承构件;84: the second frame supporting member;

10:盒;10: box;

11:晶片;11: chip;

12:环状的框架;12: ring frame;

13:切割带;13: cutting belt;

15:搬出搬入构件;15: Move in and out components;

16:第1搬送构件;16: the first conveying member;

17:清洗构件;17: cleaning components;

18:第2搬送构件。18: The second conveying member.

具体实施方式Detailed ways

以下,对于本发明的晶片的切削方法和切削装置的优选实施方式,参照附图详细地进行说明。Hereinafter, preferred embodiments of the wafer cutting method and cutting apparatus according to the present invention will be described in detail with reference to the drawings.

在图1中,示出了根据本发明构成的切削装置的立体图。In FIG. 1 , a perspective view of a cutting device constructed according to the invention is shown.

图示的实施方式中的切削装置具备大致长方体形状的装置壳体2。保持作为被加工物的晶片的保持构件3以能够沿着作为切削进给方向的箭头X所示的切削进给方向移动的方式配设在该装置壳体2内。保持构件3具备吸附卡盘支承座31和安装于该吸附卡盘支承座31上的吸附卡盘32,利用未图示的抽吸构件将作为被加工物的例如圆板状的晶片保持在该吸附卡盘32的表面即保持面上。另外,保持构件3构成为能够借助未图示的旋转机构转动。The cutting device in the illustrated embodiment includes a substantially rectangular parallelepiped-shaped device case 2 . A holding member 3 for holding a wafer as a workpiece is disposed in the apparatus case 2 so as to be movable in a cutting feed direction indicated by an arrow X that is a cutting feed direction. The holding member 3 includes a suction chuck support base 31 and a suction chuck 32 attached to the suction chuck support base 31, and holds, for example, a disk-shaped wafer as a workpiece on the suction chuck support base 31 by a suction member not shown. The surface of the suction chuck 32 is the holding surface. In addition, the holding member 3 is configured to be rotatable by a rotation mechanism not shown.

图示的实施方式中的切削装置具备作为切削构件的主轴单元4。主轴单元4具备:主轴壳体41,其安装在未图示的移动基座上,并且沿着与箭头X所示的切削进给方向垂直的由箭头Y所示的分度方向、和与吸附卡盘32的表面即保持面垂直的由箭头Z所示的切入方向进行移动调整;旋转主轴42,其被旋转自如地支承于该主轴壳体41,并被未图示的旋转驱动机构旋转驱动;和切削刀具43,其被安装于该旋转主轴42上。在该切削刀具43的两侧配设有与未图示的切削液供给源连接的切削液供给喷嘴44。The cutting device in the illustrated embodiment includes a spindle unit 4 as a cutting member. The spindle unit 4 is provided with: a spindle housing 41, which is mounted on an unillustrated mobile base, and along the indexing direction shown by the arrow Y perpendicular to the cutting feed direction shown by the arrow X, and with the suction The surface of the chuck 32, that is, the holding surface is vertically moved and adjusted in the cutting direction indicated by the arrow Z; the rotating spindle 42 is rotatably supported on the spindle housing 41, and is rotationally driven by a rotary drive mechanism not shown. and a cutting tool 43 mounted on the rotating spindle 42 . Cutting fluid supply nozzles 44 connected to a cutting fluid supply source (not shown) are disposed on both sides of the cutting blade 43 .

图示的实施方式中的切削装置具备摄像构件5,该摄像构件5用于对保持在构成上述保持构件3的吸附卡盘32的表面上的晶片的表面进行拍摄,并检测应通过上述切削刀具43切削的区域、或者确认切削槽的状态。该摄像构件5由显微镜或CCD相机等光学构件构成。另外,图示的实施方式中的切削装置具备用于显示由摄像构件5拍摄的图像的显示构件6。The cutting device in the illustrated embodiment includes an imaging member 5 for photographing the surface of the wafer held on the surface of the suction chuck 32 constituting the above-mentioned holding member 3, and detecting the surface of the wafer that should pass through the above-mentioned cutting tool. 43 cutting area, or confirm the state of the cutting groove. The imaging means 5 is constituted by an optical means such as a microscope or a CCD camera. In addition, the cutting device in the illustrated embodiment includes a display unit 6 for displaying an image captured by the imaging unit 5 .

图示的实施方式中的切削装置具备收纳作为被加工物的晶片的盒10。盒10具备用于供作为被加工物的晶片进出的被加工物搬出搬入开口101,用于载置晶片的多个载置架102在上下方向上对置地设于盒10的两侧壁的内表面上。如图1所示,收纳于盒10中的作为被加工物的晶片11形成为圆板形状,在由形成为格子状的分割预定线111在其表面上划分出的多个区域中形成有IC、LSI等器件112。这样形成的晶片11粘贴在被安装于环状的框架12上的切割带13的表面上。切割带13使用了下述这样的所谓UV带:切割带13的粘合层由于照射规定的波长的紫外线而使得粘接力下降。收纳有晶片11的盒10被以被加工物搬出搬入开口101朝向临时放置区域14的方式载置于盒载置机构7的盒载置台71上。在盒载置台71的上表面设有用于在载置盒10时进行定位的定位部件711。另外,对于盒载置机构7,在后面详细进行说明。The cutting apparatus in the illustrated embodiment includes a cassette 10 for storing wafers as workpieces. The cassette 10 is provided with a workpiece loading and unloading opening 101 for carrying in and out wafers as workpieces, and a plurality of mounting racks 102 for mounting wafers are provided in both side walls of the cassette 10 so as to face each other in the vertical direction. On the surface. As shown in FIG. 1 , a wafer 11 as a workpiece accommodated in a cassette 10 is formed in a disk shape, and ICs are formed in a plurality of regions on the surface divided by planned dividing lines 111 formed in a lattice shape. , LSI and other devices 112 . Wafer 11 formed in this way is pasted on the surface of dicing tape 13 attached to ring-shaped frame 12 . The dicing tape 13 uses a so-called UV tape in which the adhesive force of the adhesive layer of the dicing tape 13 is lowered by irradiation with ultraviolet rays of a predetermined wavelength. The cassette 10 containing the wafer 11 is placed on the cassette mounting table 71 of the cassette mounting mechanism 7 so that the workpiece is directed from the loading/unloading opening 101 to the temporary storage area 14 . A positioning member 711 for positioning when the cassette 10 is mounted is provided on the upper surface of the cassette mounting table 71 . In addition, the cassette mounting mechanism 7 will be described in detail later.

图示的实施方式中的切削装置具备:搬出搬入构件15,其将收纳在盒10中的作为被加工物的晶片11搬出至临时放置区域14,并且将切削加工后的晶片11搬入盒10中;第1搬送构件16,其将被该搬出搬入构件15搬出的晶片11搬送至上述保持构件3上;清洗构件17,其对在保持构件3上切削加工后的晶片11进行清洗;和第2搬送构件18,其将在保持构件3上切削加工后的晶片11搬送至清洗构件17。The cutting apparatus in the illustrated embodiment includes a carry-out member 15 for carrying out the wafer 11 as a workpiece stored in the cassette 10 to the temporary storage area 14 and carrying the chipped wafer 11 into the cassette 10 ; the first conveying member 16, which conveys the wafer 11 carried out by the carrying-out member 15 onto the above-mentioned holding member 3; the cleaning member 17, which cleans the wafer 11 after cutting on the holding member 3; and the second The transfer member 18 transfers the wafer 11 cut on the holding member 3 to the cleaning member 17 .

接下来,参照图2及图3对盒载置机构7进行说明。Next, the cartridge mounting mechanism 7 will be described with reference to FIGS. 2 and 3 .

图示的实施方式中的盒载置机构7具备:配设在上述盒载置台71的下侧的紫外线照射构件8;和用于使盒载置台71沿上下方向移动的升降构件72。The cassette mounting mechanism 7 in the illustrated embodiment includes: an ultraviolet irradiation member 8 disposed below the cassette mounting table 71; and an elevating member 72 for vertically moving the cassette mounting table 71.

紫外线照射构件8具备由盒载置台71构成上壁的壳体81。如图2和图3所示,壳体81具备紫外线照射室811,该紫外线照射室811在搬出搬入构件15侧(在图3中为右侧)形成有开口811a。在壳体81的紫外线照射室811的上下方向中间部配设有紫外线照射灯82,该紫外线照射灯82照射包括下述波长的紫外线:对晶片11的表面进行照射而生成臭氧并生成活性氧的波长;和对切割带13进行照射而使粘接力降低的波长。该紫外线照射灯82由照射波长为150nm~400nm的紫外线的低压水银灯构成。另外,在形成于壳体81的紫外线照射室811中,在紫外线照射灯82的下侧配设有用于支承环状的框架12的第1框架支承构件83,所述环状的框架12通过切割带13支承晶片11,并且,在紫外线照射灯82的上侧配设有用于支承环状的框架12的第2框架支承构件84,所述环状的框架12通过切割带13支承晶片11。第1框架支承构件83由一对支承架831、831构成,所述一对支承架831、831在紫外线照射灯82的下侧对置地分别设置在构成壳体81的侧壁812、813的内表面上,第2框架支承构件84由一对支承架841、841构成,所述一对支承架841、841在紫外线照射灯82的上侧对置地分别设置在构成壳体81的侧壁812、813的内表面上。The ultraviolet irradiation unit 8 includes a case 81 whose upper wall is constituted by the cartridge mounting table 71 . As shown in FIGS. 2 and 3 , the housing 81 includes an ultraviolet irradiation chamber 811 having an opening 811 a formed on the loading/unloading member 15 side (right side in FIG. 3 ). An ultraviolet irradiation lamp 82 is disposed in the middle part of the ultraviolet irradiation chamber 811 of the casing 81 in the vertical direction, and the ultraviolet irradiation lamp 82 irradiates ultraviolet rays having wavelengths that irradiate the surface of the wafer 11 to generate ozone and generate active oxygen. wavelength; and a wavelength at which the adhesive force is reduced by irradiating the dicing tape 13 . The ultraviolet irradiation lamp 82 is constituted by a low-pressure mercury lamp that irradiates ultraviolet rays having a wavelength of 150 nm to 400 nm. In addition, in the ultraviolet irradiation chamber 811 formed in the housing 81, the first frame support member 83 for supporting the ring-shaped frame 12 that is cut by cutting is provided on the lower side of the ultraviolet irradiation lamp 82. The belt 13 supports the wafer 11 , and a second frame support member 84 for supporting the ring-shaped frame 12 supporting the wafer 11 via the dicing belt 13 is disposed above the ultraviolet irradiation lamp 82 . The first frame support member 83 is constituted by a pair of support frames 831, 831, which are respectively provided inside the side walls 812, 813 constituting the casing 81 so as to face each other under the ultraviolet irradiation lamp 82. On the surface, the second frame support member 84 is composed of a pair of support frames 841, 841, which are respectively provided on the side wall 812, 813 on the inner surface.

如图2和图3所示,关于构成上述紫外线照射构件8的壳体81,在后壁814上还安装有借助升降构件72进行升降的移动块73和被引导部件74。As shown in FIGS. 2 and 3 , with respect to the casing 81 constituting the above-mentioned ultraviolet irradiation member 8 , a moving block 73 and a guided member 74 that are raised and lowered by a lifting member 72 are mounted on a rear wall 814 .

如图2所示,图示的实施方式中的升降构件72由以下部分构成:沿上下方向配设的引导构件721;和使上述移动块73沿该引导构件721移动的移动构件722。引导构件721具备一对导轨721a、721a,这一对导轨721a、721a相互平行地配设,并且以能够滑动的方式与设置在被引导部件74上的一对被引导槽741、741嵌合。移动构件722由以下部分构成:外螺纹杆722a,其沿上下方向配设在构成引导构件721的一对导轨721a与721a之间,且上端部以能够旋转的方式被安装在引导构件721上的轴承721b支承;和能够正转及反转的脉冲马达722b,其使该外螺纹杆722a旋转,如图3所示,外螺纹杆722a螺合于在移动块73上设置的内螺纹孔731中。因此,如果驱动脉冲马达722b向一个方向旋转,则移动块73和被引导部件74沿外螺纹杆722a和一对导轨721a、721a上升,如果驱动脉冲马达722b向另一个方向旋转,则移动块73和被引导部件74沿外螺纹杆722a和一对导轨721a、721a下降。像这样升降的移动块73和被引导部件74被定位于第1搬出搬入位置、第2搬出搬入位置以及第3搬出搬入位置,在该第1搬出搬入位置,如图3所示,载置于盒载置台71上的盒10与上述搬出搬入构件15对置,在该第2搬出搬入位置,如图4所示,配设在紫外线照射构件8的壳体81上第2框架支承构件84与搬出搬入构件15对置,在该第3搬出搬入位置,如图5所示,配设在紫外线照射构件8的壳体81上的第1框架支承构件83与搬出搬入构件15对置。另外,在第1搬出搬入位置,对应于在载置于盒载置台71上的盒10中收纳的晶片的收纳位置,对升降构件72进行位置调整。As shown in FIG. 2 , the lifting member 72 in the illustrated embodiment includes: a guide member 721 arranged in the vertical direction; and a moving member 722 that moves the moving block 73 along the guide member 721 . The guide member 721 includes a pair of guide rails 721 a , 721 a arranged parallel to each other and slidably fitted into a pair of guided grooves 741 , 741 provided in the guided member 74 . The moving member 722 is composed of an externally threaded rod 722a arranged vertically between a pair of guide rails 721a and 721a constituting the guide member 721, and having an upper end portion rotatably attached to the guide member 721. The bearing 721b is supported; and the pulse motor 722b capable of forward rotation and reverse rotation, which makes the externally threaded rod 722a rotate, as shown in Figure 3, the externally threaded rod 722a is screwed in the internally threaded hole 731 provided on the moving block 73 . Therefore, if the pulse motor 722b is driven to rotate in one direction, the moving block 73 and the guided member 74 rise along the external threaded rod 722a and a pair of guide rails 721a, 721a, and if the pulse motor 722b is rotated in the other direction, the moving block 73 And the guided member 74 descends along the externally threaded rod 722a and a pair of guide rails 721a, 721a. The moving block 73 and the guided member 74 raised and lowered in this way are positioned at the first unloading and loading position, the second unloading and loading position, and the third unloading and loading position, and at the first unloading and loading position, as shown in FIG. The cassette 10 on the cassette mounting table 71 is opposed to the above-mentioned unloading and loading member 15, and at the second unloading and loading position, as shown in FIG. The loading/unloading member 15 faces, and at the third loading/unloading position, as shown in FIG. In addition, at the first loading/unloading position, the position of the elevating member 72 is adjusted in accordance with the housing position of the wafers stored in the cassette 10 placed on the cassette mounting table 71 .

图示的实施方式中的切削装置如上述那样构成,下面,对其作用进行说明。The cutting device in the illustrated embodiment is configured as described above, and its operation will be described below.

在进行晶片11的切削时,将收纳有晶片11的盒10载置于盒载置机构7的盒载置台71上的规定的位置。另外,在将盒10载置于盒载置台71的情况下,盒载置台71如图3所示这样被定位于第1搬出搬入位置。通过如图3所示这样在第1搬出搬入位置将盒10载置于盒载置台71上的规定的位置,由此完成了收纳于盒10中的晶片11的切削作业的准备。When cutting the wafer 11 , the cassette 10 containing the wafer 11 is placed at a predetermined position on the cassette mounting table 71 of the cassette mounting mechanism 7 . In addition, when the cassette 10 is placed on the cassette mounting table 71, the cassette mounting table 71 is positioned at the first loading/unloading position as shown in FIG. 3 . By placing the cassette 10 at a predetermined position on the cassette mounting table 71 at the first loading/unloading position as shown in FIG. 3 , preparations for the chipping operation of the wafer 11 stored in the cassette 10 are completed.

如果如上所述那样完成了切削作业的准备,则当接通切削加工开始开关(未图示)时,使盒载置机构7的升降构件72动作从而将载置于盒载置台71上的盒10的规定的位置定位于图3所示的第1搬出搬入位置。在盒10被定位于图3所示的第1搬出搬入位置后,使搬出搬入构件15动作来把持环状的框架12,所述环状的框架12载置于盒10的规定的架上,借助切割带13支承晶片11。在像这样利用搬出搬入构件15把持住借助切割带13支承晶片11的环状的框架12后,将搬出搬入构件15定位于在图3中由双点划线表示的位置。Once the preparations for the cutting operation are completed as described above, when the cutting start switch (not shown) is turned on, the lifting member 72 of the cartridge loading mechanism 7 is operated to move the cassette placed on the cassette mounting table 71. The predetermined position of 10 is positioned at the first carrying-in/out position shown in FIG. 3 . After the cassette 10 is positioned at the first loading/unloading position shown in FIG. The wafer 11 is supported by means of a dicing tape 13 . After the ring-shaped frame 12 supporting the wafer 11 via the dicing tape 13 is held by the unloading member 15 in this way, the unloading member 15 is positioned at the position indicated by the two-dot chain line in FIG. 3 .

接下来,使盒载置机构7的升降构件72动作,将配设在盒载置台71的下侧的紫外线照射构件8定位于图5所示的第3搬出搬入位置。当紫外线照射构件8被定位于图5所示的第3搬出搬入位置时,配设在紫外线照射构件8的壳体81上的第1框架支承构件83处于与搬出搬入构件15对置的位置。当紫外线照射构件8被定位于图5所示的第3搬出搬入位置后,使搬出搬入构件15动作,使借助切割带13支承晶片11的环状的框架12通过开口811a,将晶片11插入紫外线照射室811内,并将环状的框架12载置于构成第1框架支承构件83的一对支承架831、831上。因此,借助切割带13被支承在载置于一对支承架831、831的环状的框架12上的晶片11被定位成表面与紫外线照射灯82对置。这样,在将借助切割带13支承着晶片11的环状的框架12载置于构成第1框架支承构件83的一对支承架831、831上后,将搬出搬入构件15定位于在图5中由双点划线表示的位置。Next, the elevating member 72 of the cartridge mounting mechanism 7 is operated to position the ultraviolet irradiation member 8 disposed below the cartridge mounting table 71 at the third loading and unloading position shown in FIG. 5 . When the ultraviolet irradiating member 8 is positioned at the third loading/unloading position shown in FIG. After the ultraviolet ray irradiation member 8 is positioned at the 3rd carrying-in position shown in FIG. The inside of the irradiation chamber 811 is irradiated, and the ring-shaped frame 12 is placed on a pair of support frames 831 and 831 constituting the first frame support member 83 . Therefore, the wafer 11 supported by the dicing tape 13 on the ring-shaped frame 12 placed on the pair of support frames 831 , 831 is positioned so that its surface faces the ultraviolet irradiation lamp 82 . In this way, after placing the ring-shaped frame 12 supporting the wafer 11 via the dicing tape 13 on the pair of supporting frames 831, 831 constituting the first frame supporting member 83, the loading and unloading member 15 is positioned as shown in FIG. The location indicated by the dash-dotted line.

如上所述,如果已将借助切割带13支承有晶片11的环状的框架12载置于构成第1框架支承构件83的一对支承架831、831上,并将搬出搬入构件15定位于在图5中由双点划线表示的位置,则使配设在紫外线照射室811中的紫外线照射灯82点亮,向载置于支承架831上的晶片11照射波长为150nm~400nm的紫外线。其结果是,利用波长为184.9nm的紫外线来分解氧分子而生成臭氧(O3),并利用波长为253.7nm的紫外线来分解臭氧(O3)而生成高能的活性氧。像这样生成的活性氧作用于晶片11的表面,由此,晶片11的表面的亲水性得到提高(亲水性赋予工序)。像这样实施了亲水性赋予工序后,使紫外线照射灯82熄灭。As described above, if the ring-shaped frame 12 supporting the wafer 11 via the dicing tape 13 is placed on the pair of support frames 831, 831 constituting the first frame support member 83, and the unloading and loading member 15 is positioned on the 5, the ultraviolet irradiation lamp 82 disposed in the ultraviolet irradiation chamber 811 is turned on to irradiate the wafer 11 mounted on the support frame 831 with ultraviolet rays having a wavelength of 150 nm to 400 nm. As a result, the ultraviolet rays with a wavelength of 184.9 nm decompose oxygen molecules to generate ozone (O 3 ), and the ultraviolet rays with a wavelength of 253.7 nm decompose ozone (O 3 ) to generate high-energy active oxygen. The active oxygen generated in this way acts on the surface of the wafer 11, thereby improving the hydrophilicity of the surface of the wafer 11 (hydrophilicity imparting step). After implementing the hydrophilicity imparting step in this way, the ultraviolet irradiation lamp 82 is turned off.

在实施了上述亲水性赋予工序后,使搬出搬入构件15动作,来把持环状的框架12,所述环状的框架12被支承在构成第1框架支承构件83的一对支承架831、831上,且借助切割带13支承晶片11。像这样把持着借助切割带13支承晶片11的环状的框架12的搬出搬入构件15将晶片11(以下,仅将使晶片11借助切割带13支承在环状的框架12上的状态下的晶片11称作晶片11)搬出至临时放置区域14。通过第1搬送构件16的回转动作将搬出至临时放置区域14的晶片11搬送至构成上述保持构件3的吸附卡盘32的保持面上,将该晶片11抽吸保持于该吸附卡盘32上。使像这样抽吸保持着晶片11的保持构件3移动至摄像构件5的正下方。在保持构件3被定位于摄像构件5的正下方时,通过摄像构件5检测出形成在晶片11上的分割预定线111,并沿主轴单元4的分度方向即箭头Y方向移动并调节,进行精密的位置对准作业。After the above-mentioned hydrophilicity imparting process is carried out, the unloading and loading member 15 is operated to hold the ring-shaped frame 12 supported by the pair of support frames 831, 831, and 831, and support the wafer 11 with the dicing tape 13. In this way, the unloading and loading member 15 of the ring-shaped frame 12 that supports the wafer 11 through the dicing tape 13 is held, and the wafer 11 (hereinafter, only the wafer 11 under the state that the wafer 11 is supported on the ring-shaped frame 12 through the dicing tape 13 11 is referred to as a wafer 11) and carried out to the temporary storage area 14. The wafer 11 carried out to the temporary storage area 14 is transferred to the holding surface of the suction chuck 32 constituting the above-mentioned holding member 3 by the turning operation of the first transfer member 16, and the wafer 11 is sucked and held on the suction chuck 32. . The holding member 3 holding the wafer 11 by suction in this way is moved to directly below the imaging member 5 . When the holding member 3 is positioned directly below the imaging member 5, the planned dividing line 111 formed on the wafer 11 is detected by the imaging member 5, and is moved and adjusted along the indexing direction of the spindle unit 4, that is, the arrow Y direction, to perform Precise position alignment work.

然后,通过使抽吸保持着晶片11的保持构件3沿着作为切削进给方向的以箭头X所示的方向(与切削刀具43的旋转轴垂直的方向)移动,由此利用切削刀具43沿规定的分割预定线111将保持在保持构件3上的晶片11切断(切削工序)。即,由于切削刀具43被安装于主轴单元4上,并被驱动而旋转,所述主轴单元4沿着作为分度方向的以箭头Y所示的方向和作为切入方向的以箭头Z所示的方向进行了移动调整而被定位,因此,通过使保持构件3沿切削刀具43的下侧在箭头X所示的切削进给方向上移动,由此,保持在保持构件3上的晶片11被切削刀具43沿着规定的分割预定线111切断。通过这样将晶片11沿分割预定线111切断,从而将晶片11分割为一个个的器件。分割后的器件由于切割带13的作用不会变得散乱,而是维持着借助切割带13被支承在环状的框架12上的晶片11的状态。Then, by moving the holding member 3 holding the wafer 11 by suction in the direction indicated by the arrow X (the direction perpendicular to the rotation axis of the cutting blade 43 ) as the cutting feed direction, the cutting blade 43 moves along the The predetermined dividing line 111 cuts the wafer 11 held on the holding member 3 (cutting step). That is, since the cutting tool 43 is installed on the spindle unit 4 and is driven to rotate, the spindle unit 4 moves along the direction shown by the arrow Y as the indexing direction and the direction shown by the arrow Z as the cutting direction. The direction is moved and adjusted and positioned. Therefore, by moving the holding member 3 in the cutting feed direction shown by the arrow X along the lower side of the cutting tool 43, the wafer 11 held on the holding member 3 is cut. The cutter 43 cuts along a predetermined dividing line 111 . By cutting the wafer 11 along the planned dividing line 111 in this way, the wafer 11 is divided into individual devices. The divided devices do not become scattered due to the action of the dicing tape 13 , but maintain the state of the wafer 11 supported by the ring-shaped frame 12 via the dicing tape 13 .

在上述切削工序中,从切削液供给喷嘴44向切削刀具43切削晶片11的切削部供给切削液。因此,由于切削刀具43的切削而生成的切削屑混入切削液中而漂浮在晶片11的表面即切削面上。可是,由于晶片11的表面即切削面通过上述的亲水性赋予工序而提高了亲水性,维持着润湿的状态,因此,切削屑不会牢固地附着于晶片11的表面即切削面上。In the cutting step described above, the cutting fluid is supplied from the cutting fluid supply nozzle 44 to the cutting portion of the cutting blade 43 that cuts the wafer 11 . Therefore, chips generated by cutting by the cutting tool 43 are mixed in the cutting fluid and float on the surface of the wafer 11 , that is, the cutting surface. However, since the surface of the wafer 11, i.e., the cutting surface, has increased hydrophilicity through the above-mentioned hydrophilicity-imparting step, and maintains a wet state, chips are not firmly attached to the surface of the wafer 11, i.e., the cutting surface. .

在如上述这样结束了切削工序后,使借助切割带13支承在环状的框架12上的分割出的器件(以下,称作切削加工后的晶片11)返回最初抽吸保持晶片11的位置,在此,解除对切削后的晶片11的抽吸保持。接下来,借助第2搬送构件18将切削加工后的晶片11搬送至清洗构件17处,在此,清洗并去除在上述切削时生成的切削屑(清洗工序)。在该清洗工序中,如上所述,由于对晶片11的上表面即切削面赋予了亲水性,在切削时生成的切削屑没有牢固地附着于晶片11的上表面即切削面上,因此,能够容易地去除切削屑。像这样进行了清洗的切削加工后的晶片11被第1搬送构件16搬送至临时放置区域14。After the cutting process is completed as described above, the divided devices supported on the annular frame 12 via the dicing tape 13 (hereinafter referred to as the wafer 11 after cutting) are returned to the position where the wafer 11 was initially sucked and held, Here, the suction holding of the chipped wafer 11 is released. Next, the chipped wafer 11 is transported by the second transport member 18 to the cleaning unit 17, where chips generated during the cutting are cleaned and removed (cleaning step). In this cleaning step, as described above, since the upper surface of the wafer 11, that is, the cut surface, is given hydrophilicity, chips generated during cutting do not firmly adhere to the upper surface of the wafer 11, that is, the cut surface. Cutting chips can be easily removed. The chipped wafer 11 cleaned in this way is transported to the temporary storage area 14 by the first transport member 16 .

另一方面,盒载置机构7将紫外线照射构件8定位于图4所示的第2搬出搬入位置。并且,然后,使搬出搬入构件15动作,使借助切割带13支承着如上述那样被搬送至临时放置区域14的切削加工后的晶片11的环状的框架12通过开口811a插入紫外线照射室811内,并将环状的框架12载置于构成第2框架支承构件84的一对支承架841、841上。因此,在载置于一对支承架841、841上的环状的框架12上安装的切割带13的背面被定位成与紫外线照射灯82对置。这样,在将借助切割带13支承着切削加工后的晶片11的环状的框架12载置于构成第2框架支承构件84的一对支承架841、841上后,将搬出搬入构件15定位于图4中由双点划线表示的位置,并使配设在紫外线照射室811中的紫外线照射灯82点亮,朝粘贴有切削加工后的晶片11的切割带13照射波长为150nm~400nm的紫外线。其结果是,通过对切割带13照射的波长为300~400nm的紫外线,使切割带13的粘接力降低(粘接力降低工序)。通过像这样实施粘接力降低工序,由此,在作为接下来的工序的拾取工序中,由于将分割成一个个的器件从切割带13剥离,因此,拾取变得容易。On the other hand, the cassette placement mechanism 7 positions the ultraviolet irradiation member 8 at the second loading and unloading position shown in FIG. 4 . Then, the loading/unloading member 15 is operated, and the ring-shaped frame 12 supporting the cut wafer 11 transported to the temporary storage area 14 through the dicing belt 13 is inserted into the ultraviolet irradiation chamber 811 through the opening 811a. , and place the ring-shaped frame 12 on a pair of support frames 841 and 841 constituting the second frame support member 84 . Therefore, the back surface of the dicing tape 13 attached to the ring-shaped frame 12 mounted on the pair of support frames 841 and 841 is positioned so as to face the ultraviolet irradiation lamp 82 . In this way, after placing the ring-shaped frame 12 supporting the diced wafer 11 via the dicing tape 13 on the pair of support frames 841, 841 constituting the second frame support member 84, the unloading and loading member 15 is positioned on the In the position indicated by the dashed-two dotted line in FIG. 4 , the ultraviolet irradiation lamp 82 arranged in the ultraviolet irradiation chamber 811 is turned on, and the dicing tape 13 on which the cut wafer 11 is pasted is irradiated with ultraviolet rays having a wavelength of 150 nm to 400 nm. ultraviolet light. As a result, the adhesive strength of the dicing tape 13 is lowered by irradiating the dicing tape 13 with ultraviolet light having a wavelength of 300 to 400 nm (adhesive strength reducing step). By performing the adhesive force reducing step in this way, in the pick-up step that is the next step, since the individual devices are separated from the dicing tape 13 , pick-up becomes easy.

在如上述那样对粘贴有被搬送至紫外线照射构件8处的切削加工后的晶片11的切割带13照射紫外线后,熄灭紫外线照射灯82。接下来,使搬出搬入构件15动作,将在因实施上述粘接力降低工序而使得粘接力降低的切割带13上粘贴的、切削加工后的晶片11搬出。然后,在使盒载置机构7的升降构件72动作而将盒10定位于图3所示的第1搬出搬入位置后,再次使搬出搬入构件15动作,将切削加工后的晶片11收纳于被定位在第1搬出搬入位置处的盒10的规定的位置。这样,在将切削加工后的晶片11收纳于盒10的规定的位置后,使搬出搬入构件15动作,将接下来应进行切削的晶片从盒10搬出,并重复实施上述切削作业。After irradiating ultraviolet rays to the dicing tape 13 on which the diced wafer 11 carried to the ultraviolet irradiation member 8 is attached with ultraviolet rays as described above, the ultraviolet irradiation lamp 82 is turned off. Next, the carry-out/carry-in member 15 is operated to carry out the diced wafer 11 stuck on the dicing tape 13 whose adhesive force has been reduced by performing the above-mentioned adhesive force reducing step. Then, after the lifting member 72 of the cassette loading mechanism 7 is operated to position the cassette 10 at the first loading and unloading position shown in FIG. The predetermined position of the cassette 10 positioned at the first carrying-in/out position. In this way, after storing the diced wafer 11 in a predetermined position of the cassette 10, the unloading and loading member 15 is operated to unload the wafer to be diced next from the cassette 10, and the above-mentioned slicing operation is repeated.

并且,在上述的切削作业中,在对实施了亲水性赋予工序后的晶片11实施切削工序的期间,将接下来应进行切削的晶片11从盒10搬出并实施亲水性赋予工序,并使被赋予了亲水性的晶片11返回盒10中预先进行准备,由此能够提高作业效率。In addition, in the cutting work described above, while the wafer 11 that has undergone the hydrophilicity imparting step is subjected to the cutting step, the wafer 11 to be cut next is carried out from the cassette 10 and the hydrophilicity imparting step is performed, and Returning the hydrophilically imparted wafer 11 to the cassette 10 for preparation in advance can improve work efficiency.

如上所述,图示的实施方式中的紫外线照射构件8具备:紫外线照射灯82,其配设在壳体81的紫外线照射室811中,由照射波长为150nm~400nm的紫外线的低压水银灯构成;第1框架支承构件83,其配设在紫外线照射灯82下侧,用于对借助切割带13支承晶片11的环状的框架12进行支承;和第2框架支承构件84,其配设在紫外线照射灯82的上侧,用于对借助切割带13支承晶片11的环状的框架12进行支承,在对晶片11的表面照射紫外线来赋予亲水性时,利用第1框架支承构件83对借助切割带13支承晶片11的环状的框架12进行支承,在对切割带13照射紫外线来使粘接力降低时,利用第2框架支承构件84对借助切割带13支承晶片11的环状的框架12进行支承,因此,能够利用1个紫外线照射灯82来实施向晶片的表面照射紫外线以赋予亲水性的亲水性赋予工序、和向切割带照射紫外线以使粘接力降低的粘接力降低工序。因此,无需配设用于赋予亲水性的紫外线照射灯和用于降低粘接力的紫外线照射灯,因此,切削装置内的空间的限制得到缓解,能够实现装置的小型化。As described above, the ultraviolet irradiation member 8 in the illustrated embodiment includes: an ultraviolet irradiation lamp 82 disposed in the ultraviolet irradiation chamber 811 of the casing 81, and composed of a low-pressure mercury lamp that irradiates ultraviolet rays with a wavelength of 150 nm to 400 nm; The first frame support member 83, which is arranged on the lower side of the ultraviolet irradiation lamp 82, is used to support the ring-shaped frame 12 supporting the wafer 11 through the dicing tape 13; and the second frame support member 84, which is arranged on the ultraviolet ray The upper side of the irradiation lamp 82 is used to support the ring-shaped frame 12 that supports the wafer 11 via the dicing tape 13. The dicing tape 13 supports the ring-shaped frame 12 supporting the wafer 11. When the dicing tape 13 is irradiated with ultraviolet light to reduce the adhesive force, the ring-shaped frame supporting the wafer 11 via the dicing tape 13 is supported by the second frame support member 84. 12, therefore, one ultraviolet irradiation lamp 82 can be used to implement the hydrophilicity imparting process of irradiating ultraviolet rays to the surface of the wafer to impart hydrophilicity, and the adhesive force of irradiating ultraviolet rays to the dicing tape to reduce the adhesive force. Reduce process. Therefore, since there is no need to arrange an ultraviolet irradiation lamp for imparting hydrophilicity and an ultraviolet irradiation lamp for reducing adhesive force, the limitation of the space in the cutting device is eased, and the size of the device can be reduced.

以上,基于图示的实施方式对本发明进行了说明,但本发明并不仅仅限定于实施方式。在图示的实施方式中,示出了通过在切削装置中装备的紫外线照射构件8来实施亲水性赋予工序的例子,但也可以通过与切削装置相邻地配置的紫外线照射构件来实施亲水性赋予工序。As mentioned above, although this invention was demonstrated based on illustrated embodiment, this invention is not limited only to embodiment. In the illustrated embodiment, the example in which the hydrophilicity imparting process is implemented by the ultraviolet irradiation member 8 equipped in the cutting device is shown, but the hydrophilicity may be implemented by the ultraviolet irradiation member arranged adjacent to the cutting device. Aqueous imparting process.

Claims (2)

1.一种切削装置,所述切削装置具备:保持构件,其保持晶片;切削构件,其具备对由该保持构件保持的晶片进行切削的切削刀具;切削进给构件,其使该保持构件和该切削构件沿切削进给方向相对移动;分度进给构件,其使该保持构件和该切削构件沿着与切削进给方向垂直的分度进给方向相对移动;盒载置机构,其具备盒载置台,该盒载置台载置收纳有晶片的盒,所述晶片被粘贴在由于紫外线的照射而使得粘接力降低的切割带上,并借助该切割带被支承于环状的框架;搬出构件,其将在载置于该盒载置台上的该盒中收纳的晶片搬出至临时放置区域;以及搬送构件,其将被搬出至该临时放置区域的晶片搬送至该保持构件,1. A cutting device comprising: a holding member that holds a wafer; a cutting member that is provided with a cutting tool that cuts the wafer held by the holding member; and a cutting feed member that makes the holding member and The cutting member relatively moves along the cutting feeding direction; the indexing feeding member moves the holding member and the cutting member relative to the indexing feeding direction perpendicular to the cutting feeding direction; the box loading mechanism has a cassette mounting table on which a cassette containing a wafer attached to a dicing tape whose adhesive force is reduced by irradiation of ultraviolet rays and supported on a ring-shaped frame by the dicing tape is mounted; a carry-out member for carrying out the wafer stored in the cassette placed on the cassette mounting table to the temporary storage area; and a transport member for transporting the wafer carried out to the temporary storage area to the holding member, 所述切削装置的特征在于,The cutting device is characterized in that, 所述切削装置具备紫外线照射构件,所述紫外线照射构件向被该搬出构件搬出的晶片的表面照射紫外线以赋予亲水性,并且向该切割带照射紫外线以使粘接力降低,The cutting device includes an ultraviolet irradiating member that irradiates ultraviolet rays to the surface of the wafer carried out by the carrying out member to impart hydrophilicity, and irradiates the dicing tape with ultraviolet rays to reduce the adhesive force, 该紫外线照射构件具备:紫外线照射灯,其照射紫外线,所述紫外线包含对晶片的表面进行照射而生成臭氧并且生成活性氧的波长、和对该切割带进行照射而使粘接力降低的波长;第1框架支承构件,其配设在该紫外线照射灯的下侧,对借助该切割带支承晶片的该环状的框架进行支承;和第2框架支承构件,其配设在该紫外线照射灯的上侧,对借助该切割带支承晶片的该环状的框架进行支承,The ultraviolet irradiating member includes: an ultraviolet irradiating lamp that irradiates ultraviolet rays including wavelengths that irradiate the surface of the wafer to generate ozone and generate active oxygen, and wavelengths that irradiate the dicing tape to reduce adhesive force; A first frame support member, which is arranged on the lower side of the ultraviolet irradiation lamp, supports the ring-shaped frame that supports the wafer through the dicing tape; and a second frame support member, which is arranged on the bottom of the ultraviolet irradiation lamp On the upper side, the ring-shaped frame supporting the wafer by the dicing tape is supported, 在对晶片的表面照射紫外线来赋予亲水性时,利用该第1框架支承构件对借助该切割带支承晶片的该环状的框架进行支承,在对该切割带照射紫外线以使粘接力降低时,利用该第2框架支承构件对借助该切割带支承晶片的该环状的框架进行支承,When the surface of the wafer is irradiated with ultraviolet rays to impart hydrophilicity, the ring-shaped frame that supports the wafer via the dicing tape is supported by the first frame support member, and the adhesive force is reduced by irradiating the dicing tape with ultraviolet rays. When using the second frame support member to support the ring-shaped frame that supports the wafer via the dicing tape, 能够利用1个所述紫外线照射灯来实施对晶片的表面照射紫外线以赋予亲水性的亲水性赋予工序、和对切割带照射紫外线以使粘接力降低的粘接力降低工序。The hydrophilicity imparting step of irradiating the surface of the wafer with ultraviolet rays to impart hydrophilicity and the step of reducing the adhesive force of irradiating the dicing tape with ultraviolet rays to reduce the adhesive force can be carried out with one ultraviolet irradiation lamp. 2.根据权利要求1所述的切削装置,其中,2. The cutting device of claim 1, wherein: 该紫外线照射灯为低压水银灯。The ultraviolet irradiation lamp is a low-pressure mercury lamp.
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