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CN105970262B - A kind of the wear-and corrosion-resistant material and its preparation process of band Ni-P-Ce-B4C@Cu composite deposites - Google Patents

A kind of the wear-and corrosion-resistant material and its preparation process of band Ni-P-Ce-B4C@Cu composite deposites Download PDF

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CN105970262B
CN105970262B CN201610548085.6A CN201610548085A CN105970262B CN 105970262 B CN105970262 B CN 105970262B CN 201610548085 A CN201610548085 A CN 201610548085A CN 105970262 B CN105970262 B CN 105970262B
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coating
solution
plating
resistant
brush
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CN105970262A (en
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周宏明
胡建红
胡雪仪
刘亚雄
简帅
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Changsha Crown Machinery Manufacturing Co Ltd
Central South University
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Changsha Crown Machinery Manufacturing Co Ltd
Central South University
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04Electroplating with moving electrodes
    • C25D5/06Brush or pad plating

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
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  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)

Abstract

本发明公开了一种带Ni‑P‑Ce‑B4C(Cu)复合镀层的耐磨耐蚀材料及其制备工艺,本发明的制备工艺简单,所制备产品性能优越,适于工业化生产。所得材料的硬度以及耐磨耐蚀性大大提高。The invention discloses a wear-resistant and corrosion-resistant material with a Ni-P-Ce-B4C (Cu) composite coating and a preparation process thereof. The preparation process of the invention is simple, and the prepared product has superior performance and is suitable for industrial production. The hardness and wear resistance and corrosion resistance of the obtained material are greatly improved.

Description

一种带Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料及其制备 工艺A wear-resistant and corrosion-resistant material with Ni-P-Ce-B4C@Cu composite coating and its preparation craft

技术领域technical field

本发明涉及一种耐磨抗腐蚀镀层及其制备方法,具体涉及一种带 Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料及其制备工艺。The invention relates to a wear-resistant and corrosion-resistant coating and a preparation method thereof, in particular to a wear-resistant and corrosion-resistant material with a Ni-P-Ce-B 4 C@Cu composite coating and a preparation process thereof.

背景技术Background technique

上世纪八十年代开始,人们采用电刷镀技术获得复合镀层,针对镀层硬度、耐磨和耐腐蚀性能的提高,目前主要通过向Ni-P镀层掺入第二相微粒或金属,利用电镀或化学镀方法使金属或固溶微粒共沉积来制备三元复合镀层。第二相微粒主要有SiC,WC,立方B4C,Al2O3,Si3N4等以提高硬度和耐磨性为目的复合微粒,以及CuF2,(CF)n,PTFE,MoS2等为提高镀层自润滑性的复合微粒。Since the 1980s, people have used brush plating technology to obtain composite coatings. For the improvement of coating hardness, wear resistance and corrosion resistance, at present, the Ni-P coating is mainly mixed with second-phase particles or metals, using electroplating or The electroless plating method co-deposits metal or solid solution particles to prepare a ternary composite coating. The second phase particles mainly include SiC, WC, cubic B 4 C, Al 2 O 3 , Si 3 N 4 and other composite particles for the purpose of improving hardness and wear resistance, as well as CuF 2 , (CF) n , PTFE, MoS 2 etc. are composite particles that improve the self-lubricating properties of the coating.

传统复合电刷镀镀层中,第二相不溶性颗粒与合金的键结合差异,界面润湿性能差,会容易产生第二相不溶性颗粒,易脱落,导致镀层表面孔隙率增加,最终造成耐蚀性能的降低。In the traditional composite brush plating coating, the bond between the second-phase insoluble particles and the alloy is different, and the interface wettability is poor, which will easily produce the second-phase insoluble particles, which are easy to fall off, resulting in an increase in the surface porosity of the coating, and ultimately resulting in corrosion resistance. decrease.

纳米B4C粉末是一种不导电材料,在传统的电刷镀沉积过程中,其主要是靠基质金属生长过程中的机械捕获作用进入镀层,得到的复合镀层中纳米粉的含量低,且纳米粉在镀层中分布不均匀。Nano-B 4 C powder is a kind of non-conductive material. In the traditional brush plating deposition process, it mainly enters the coating by mechanical capture during the growth of the matrix metal. The content of nano-powder in the obtained composite coating is low, and The distribution of nanopowder in the coating is uneven.

且现有的制备电刷镀Ni-Cu-P镀层中,配制的刷镀镀液很复杂,为获得好的刷镀效果,镀液中各成分比例很难把握,而且操作工艺也很难控制。And in the existing preparation brush plating Ni-Cu-P coating, the brush plating bath of preparation is very complicated, in order to obtain good brush plating effect, it is difficult to grasp each component ratio in the plating bath, and operation process is also difficult to control .

现有的含复合镀层的耐磨耐蚀材料总体存在硬度不够高、耐磨耐蚀性能不佳的缺陷,不能满足越来越高的耐磨耐蚀等要求。The existing wear-resistant and corrosion-resistant materials containing composite coatings generally have the defects of insufficient hardness and poor wear-resistant and corrosion-resistant performance, and cannot meet the increasingly higher requirements for wear-resistant and corrosion-resistant.

发明内容Contents of the invention

本发明的目的在于针对现有技术的不足,提供一种高硬度、耐磨抗腐蚀大大改善的带Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料。The purpose of the present invention is to provide a wear-resistant and corrosion-resistant material with Ni-P-Ce-B 4 C@Cu composite coating which has high hardness and greatly improved wear resistance and corrosion resistance.

本发明的另一目的在于提供一种制备方法简单、得到的材料硬度和耐磨抗蚀性得到很大程度改善的带Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料的制备工艺。Another object of the present invention is to provide a wear-resistant and corrosion-resistant material with a Ni-P-Ce-B 4 C@Cu composite coating that has a simple preparation method and greatly improved hardness and wear resistance of the obtained material preparation process.

本发明提供了一种带Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料,所述耐磨耐蚀材料从里到外依次包括基材、第一Ni镀层、Ni-P-Ce镀层、第二Ni镀层、 Ni-P-Ce-B4C@Cu镀层。The invention provides a wear-resistant and corrosion-resistant material with a Ni-P-Ce-B 4 C@Cu composite coating. The wear-resistant and corrosion-resistant material sequentially includes a substrate, a first Ni coating, a Ni- P-Ce coating, second Ni coating, Ni-P-Ce-B 4 C@Cu coating.

本发明进一步包括以下优选的方案:The present invention further comprises following preferred scheme:

优选的方案中,所述第一Ni镀层、第二Ni镀层的厚度均为0.5-1.5μm。优选为0.5-1.0μm,进一步优选0.5μm。In a preferred solution, the thicknesses of the first Ni coating layer and the second Ni coating layer are both 0.5-1.5 μm. Preferably it is 0.5-1.0 μm, more preferably 0.5 μm.

优选的方案中,所述Ni-P-Ce镀层的厚度为5.0-7.0μm,优选为5.0-6.0μm,进一步优选为5.0μm。In a preferred scheme, the thickness of the Ni-P-Ce coating is 5.0-7.0 μm, preferably 5.0-6.0 μm, more preferably 5.0 μm.

优选的方案中,所述Ni-P-Ce-B4C@Cu镀层的厚度为6.0-8.0μm,优选为 6.0-7.0μm,进一步优选为7.0μm。In a preferred scheme, the thickness of the Ni-P-Ce-B 4 C@Cu coating is 6.0-8.0 μm, preferably 6.0-7.0 μm, more preferably 7.0 μm.

本发明进一步涉及一种带Ni-P-Ce-B4C@Cu耐磨耐蚀复合镀层的制备工艺,基材表面预处理后依次刷镀第一Ni镀层、Ni-P-Ce镀层、第二Ni镀层、 Ni-P-Ce-B4C@Cu镀层。The present invention further relates to a preparation process of a wear-resistant and corrosion-resistant composite coating with Ni-P-Ce-B 4 C@Cu. After the substrate surface is pretreated, the first Ni coating, Ni-P-Ce coating, and the Two Ni coatings, Ni-P-Ce-B 4 C@Cu coatings.

优选的方案中,所述制备工艺包括以下工艺步骤:In a preferred scheme, the preparation process includes the following process steps:

步骤一:step one:

在40-50℃条件下,将活化处理后表面干净的基材使用含镍镀液进行镍的刷镀,得到基材/第一Ni镀层;Under the condition of 40-50°C, the substrate with a clean surface after activation treatment is brush-plated with nickel using a nickel-containing plating solution to obtain the substrate/first Ni coating;

步骤二:Step two:

将基材/第一Ni镀层试样用水清洗,进行镀液A-1的刷镀,得到基材/第一 Ni镀层/Ni-P-Ce镀层试样,用水清洗后再次使用含镍镀液进行镍的刷镀,得到基材/第一Ni镀层/Ni-P-Ce镀层/第二Ni镀层;将Cu包覆B4C颗粒加入镀液A-1 中,控制Cu包覆B4C在镀液A-1中浓度为35-75g/L,进行超声分散,搅拌,得到镀液A-2,随后使用镀液A-2实施刷镀,得到基材/第一Ni镀层/Ni-P-Ce镀层/ 第二Ni镀层/Ni-P-Ce-B4C@Cu镀层试样;The substrate/the first Ni coating sample is cleaned with water, and the brush plating of the plating solution A-1 is carried out to obtain the substrate/the first Ni coating/Ni-P-Ce coating sample, and the nickel-containing plating solution is used again after cleaning with water Carry out the brush plating of nickel, obtain substrate/the first Ni plating layer/Ni-P-Ce plating layer/the second Ni plating layer; Add Cu-coated B4C particles in the plating solution A-1, control Cu-coated B 4 C in the plating The concentration in solution A-1 is 35-75g/L, carry out ultrasonic dispersion, stir, obtain plating solution A-2, then use plating solution A-2 to carry out brush plating, obtain substrate/the first Ni plating layer/Ni-P- Ce coating/second Ni coating/Ni-P-Ce-B 4 C@Cu coating sample;

所述含镍镀液包括以下组分:六水合硫酸镍320-350g/L,柠檬酸60-80g/L,硼酸15-30g/L,施镀时,含镍镀液pH为1-3;The nickel-containing plating solution includes the following components: 320-350 g/L of nickel sulfate hexahydrate, 60-80 g/L of citric acid, and 15-30 g/L of boric acid. During plating, the pH of the nickel-containing plating solution is 1-3;

所述刷镀液A-1包括以下组分:硫酸镍240g/L-280g/L,次亚磷酸钠15-25g/L,柠檬酸20-30g/L,柠檬酸三钠15-25g/L,硫酸钠15-20g/L,冰乙酸20-30ml/L,十二烷基硫酸钠0.1-0.3g/L,硝酸铈25-45g/L;The brush plating solution A-1 includes the following components: nickel sulfate 240g/L-280g/L, sodium hypophosphite 15-25g/L, citric acid 20-30g/L, trisodium citrate 15-25g/L , sodium sulfate 15-20g/L, glacial acetic acid 20-30ml/L, sodium lauryl sulfate 0.1-0.3g/L, cerium nitrate 25-45g/L;

施镀时,镀液A-1的pH值控制在:3.0-5.0。During plating, the pH value of plating solution A-1 is controlled at: 3.0-5.0.

优选的方案中,所述Cu包覆B4C颗粒的粒度为100-350nm。In a preferred solution, the particle size of the Cu-coated B 4 C particles is 100-350 nm.

优选的方案中,所述Cu包覆B4C颗粒通过将纳米B4C粉末浸入浓度为 8-12wt%的NH4F溶液中粗化处理后,固液分离再加入10-11g/L SnCl2和4-5g/L HCl溶液中敏化,固液分离,加入0.4-0.6g/L PdCl2和20-22ml/L HCl活化液中活化,固液分离,并烘干后加入次亚磷酸钠水溶液中搅拌形成悬浮液,加入改性液中,搅拌反应后,固液分离得到;In a preferred solution, the Cu-coated B 4 C particles are roughened by immersing the nano-B 4 C powder in an NH 4 F solution with a concentration of 8-12 wt%, and then adding 10-11g/L SnCl for solid-liquid separation 2 and 4-5g/L HCl solution for sensitization, solid-liquid separation, adding 0.4-0.6g/L PdCl 2 and 20-22ml/L HCl activation solution for activation, solid-liquid separation, and adding hypophosphorous acid after drying Stir in the sodium aqueous solution to form a suspension, add it to the modified solution, stir and react, and separate the solid and liquid to obtain;

其中,改性液组成:硫酸铜7.5g/L-15g/L,甲醛15ml/L-25ml/L,酒石酸钾钠20-30g/L,2,2一联吡啶10mg-20mg/L,镍氰化钾50mg/L-100mg/L,氢氧化钠6-9/L;Among them, the composition of the modified liquid: copper sulfate 7.5g/L-15g/L, formaldehyde 15ml/L-25ml/L, potassium sodium tartrate 20-30g/L, 2,2-bipyridine 10mg-20mg/L, nickel cyanide Potassium chloride 50mg/L-100mg/L, sodium hydroxide 6-9/L;

改性液的pH为11.5-12.5,装载量为2-4g/min,温度为45-60℃。The pH of the modification solution is 11.5-12.5, the loading amount is 2-4g/min, and the temperature is 45-60°C.

所述装载量是指电刷镀一平方分米表面面积需要电镀溶液的容量。The loading capacity refers to the capacity of the electroplating solution required for brush plating a surface area of one decimeter squared.

通过以上包覆不仅解决了粉粒在镀层中共沉积并均匀分布的问题,而且Cu 的包覆也可改善镀层由于纳米颗粒的加入而导致的腐蚀性能下降的问题。The above coating not only solves the problem of co-deposition and uniform distribution of powder particles in the coating, but also Cu coating can also improve the corrosion performance of the coating due to the addition of nanoparticles.

改善了纳米B4C颗粒在溶液中的团聚问题,Cu在镀层中的沉积不仅可以在结构上细化镀层胞状组织,Cu在盐溶液体系中还表现出优先腐蚀机制,从而对 Ni合金提供了阴极保护作用,整个镀层表现为由大量Ni-Cu微观腐蚀单元均匀的二维分布所构成的电化学系统,弥补了由于粒子的加入导致增多界面及孔隙,使得镀层出现更多的微观缺陷,最终造成局部腐蚀原电池数量增加而导致的腐蚀性能下降。The problem of agglomeration of nano-B 4 C particles in the solution is improved. The deposition of Cu in the coating can not only refine the cell structure of the coating in structure, but Cu also exhibits a preferential corrosion mechanism in the salt solution system, thus providing a good protection for the Ni alloy. Cathodic protection, the entire coating is an electrochemical system composed of a large number of uniform two-dimensional distribution of Ni-Cu microscopic corrosion units, which makes up for the increase in interfaces and pores caused by the addition of particles, resulting in more microscopic defects in the coating, and finally The corrosion performance decreases due to the increase in the number of localized corrosion primary cells.

优选的方案中,制备镍层时,控制刷镀时间为50s-90s。In a preferred solution, when preparing the nickel layer, the brush plating time is controlled to be 50s-90s.

优选的方案中,制备Ni-P-Ce镀层时,控制刷镀时间为3-4min。In a preferred scheme, when preparing the Ni-P-Ce coating, the brush plating time is controlled to be 3-4min.

优选的方案中,制备Ni-P-Ce-B4C@Cu镀层时,控制刷镀时间为4-5min。In a preferred solution, when preparing the Ni-P-Ce-B 4 C@Cu coating, the brush plating time is controlled to be 4-5 minutes.

优选的方案中,将刷镀完成后的镀件在400-430℃,恒温处理0.5h-1.5h后,取出样品空冷,得到成品。In a preferred solution, after the brush plating is completed, the plated piece is treated at a constant temperature of 400-430° C. for 0.5h-1.5h, and then the sample is taken out and air-cooled to obtain a finished product.

优选的方案中,进行镀液A-1的刷镀时控制电压为11V,采用正接法,刷镀速度为50-80mm/s。In the preferred scheme, the control voltage is 11V when performing brush plating of the plating solution A-1, and the positive connection method is adopted, and the brush plating speed is 50-80mm/s.

优选的方案中,刷镀镍时控制电压为12V,采用正接法,刷镀速度为 40-80mm/s。In the preferred scheme, the control voltage is 12V during nickel brush plating, the positive connection method is adopted, and the brush plating speed is 40-80mm/s.

优选的方案中,刷镀镍时控制刷镀时间为50s-90s。In a preferred solution, the brush plating time is controlled to be 50s-90s during brush nickel plating.

优选的方案中,将Cu包覆B4C加入镀余液B中的搅拌过程中,控制转速为 200-300r/min。In a preferred scheme, during the stirring process of adding Cu-coated B 4 C into the remaining plating solution B, the rotational speed is controlled to be 200-300 r/min.

优选的方案中,刷镀Ni-P-Ce-B4C@Cu镀层时,控制电压为11V,采用正接法,刷镀速度为40-80mm/s。In a preferred solution, when brush-plating Ni-P-Ce-B 4 C@Cu coating, the control voltage is 11V, the positive connection method is adopted, and the brush-plating speed is 40-80mm/s.

优选的方案中,基材活化处理的过程为:In the preferred scheme, the process of substrate activation treatment is:

1)对基材擦拭有机溶剂丙酮进行手动除油,时间为20-60s。1) Manually degrease the substrate by wiping the organic solvent acetone for 20-60s.

2)电净除油,采用正接法,调节电压为12V,用镀笔浸蘸电净液对基材进行刷镀,刷镀速度为60-100mm/s,时间为15s-30s。刷镀完后,用去离子水清洗。2) Electric degreasing, using the positive connection method, adjust the voltage to 12V, use a plating pen dipped in the electro-cleaning solution to brush-plate the substrate, the brush-plating speed is 60-100mm/s, and the time is 15s-30s. After brush plating, rinse with deionized water.

3)活化液活化:一号活化液活化调节电压为12V,采用反接法,刷镀速度为90-130mm/s,时间为20s-30s。三号活化液活化时需调节电压12V,采用反接法,刷镀速度为90-130mm/s,时间为50s-90s。3) Activation by activating solution: The activation adjustment voltage of No. 1 activating solution is 12V, the reverse connection method is adopted, the brush plating speed is 90-130mm/s, and the time is 20s-30s. When the No. 3 activation solution is activated, the voltage needs to be adjusted to 12V, and the reverse connection method is adopted. The brush plating speed is 90-130mm/s, and the time is 50s-90s.

一号活化液组成为:98%浓硫酸44.6ml/L,硫酸铵110.9g/l,pH=0.4;三号活化液组成为柠檬酸94.2g/L,柠檬酸三钠141.2g/L,氯化镍3g/L,pH=4。The No. 1 activation solution consists of: 98% concentrated sulfuric acid 44.6ml/L, ammonium sulfate 110.9g/l, pH=0.4; the No. 3 activation solution consists of citric acid 94.2g/L, trisodium citrate 141.2g/L, chlorine Nickel 3g/L, pH=4.

电净液的组成为氢氧化钠25g/L,碳酸钠21.6g/L,磷酸钠50g/L,氯化钠2.4g/L,pH=13。The composition of the electrocleaning liquid is sodium hydroxide 25g/L, sodium carbonate 21.6g/L, sodium phosphate 50g/L, sodium chloride 2.4g/L, pH=13.

优选的方案中,所述镀液A-1是通过下述方案制备的:In a preferred scheme, the plating solution A-1 is prepared by the following scheme:

优选的方案中,根据所设计的镀液A-1的组分和浓度以及实际生产过程中所需镀液A-1的体积配取硫酸镍、次亚磷酸钠、柠檬酸、柠檬酸三钠、冰乙酸、硫酸钠、十二烷基硫酸钠、硝酸铈;接着分别用少量去离子水溶解所配取的硫酸镍、次亚磷酸钠、柠檬酸、柠檬酸三钠、硫酸钠,得到硫酸镍溶液、次亚磷酸钠溶液、柠檬酸溶液、柠檬酸三钠溶液、硫酸钠溶液;然后将配得的柠檬酸溶液、柠檬酸三钠溶液和冰乙酸混合,搅拌均匀得到络合剂溶液;再将络合剂溶液与硫酸镍溶液混合均匀,得到溶液A;接着依次将硝酸铈、硫酸钠溶液加入溶液A中搅拌均匀,得到溶液B。之后在快速搅拌下,将次亚磷酸钠溶液加入溶液B中,最后用15%稀氨水将溶液B的pH值调节至3.0-4.0,得到镀液A-1。In the preferred scheme, nickel sulfate, sodium hypophosphite, citric acid, trisodium citrate are prepared according to the composition and concentration of the designed plating solution A-1 and the volume of the required plating solution A-1 in the actual production process. , glacial acetic acid, sodium sulfate, sodium lauryl sulfate, cerium nitrate; then dissolve nickel sulfate, sodium hypophosphite, citric acid, trisodium citrate, and sodium sulfate with a small amount of deionized water respectively to obtain sulfuric acid Nickel solution, sodium hypophosphite solution, citric acid solution, trisodium citrate solution, sodium sulfate solution; then mix the obtained citric acid solution, trisodium citrate solution and glacial acetic acid, and stir to obtain a complexing agent solution; Then the complexing agent solution and the nickel sulfate solution are uniformly mixed to obtain a solution A; then the cerium nitrate and sodium sulfate solutions are added to the solution A and stirred evenly to obtain a solution B. Then, under rapid stirring, sodium hypophosphite solution was added to solution B, and finally the pH value of solution B was adjusted to 3.0-4.0 with 15% dilute ammonia water to obtain plating solution A-1.

优选的方案中,所述基材为油墨刮刀,基材长度为35.0cm。In a preferred solution, the substrate is an ink scraper, and the length of the substrate is 35.0 cm.

在刷镀过程中一般根据刷镀样品的长度来控制时间最终控制所施镀镀层的厚度。In the brush plating process, the time is generally controlled according to the length of the brush plating sample to finally control the thickness of the applied coating.

本发明的有益效果Beneficial effects of the present invention

本发明的材料不仅能大大提高了镀层的硬度,且能同时在很大程度上提高耐磨耐蚀材料的耐磨性。The material of the invention can not only greatly improve the hardness of the plating layer, but also can greatly improve the wear resistance of the wear-resistant and corrosion-resistant materials.

本发明的电流效率高、合金沉积加速,无机颗粒从产生强吸附到被机制捕获的时间缩短,已被掩埋的颗粒遭受外部冲击和发生脱落的机率减小,更有利于无机颗粒在合金基体中的沉积。The present invention has high current efficiency, accelerated alloy deposition, shortens the time from strong adsorption of inorganic particles to being captured by the mechanism, and reduces the probability of buried particles suffering from external impact and falling off, which is more conducive to inorganic particles in the alloy matrix deposition.

得到的耐磨耐蚀材料的晶界、位错、缺位等缺陷减少,镀层的耐蚀性和结合强度提高。很大程度提高本发明的材料的整体性能。Defects such as grain boundaries, dislocations, and vacancies of the obtained wear-resistant and corrosion-resistant material are reduced, and the corrosion resistance and bonding strength of the coating are improved. The overall performance of the material of the present invention is greatly improved.

本发明组分合理、制备工艺简单,有效改善了第二相不溶颗粒在镀液中分散不均匀的问题,促进Ni-P合金的非晶化,晶界、位错、缺位等缺陷减少,耐腐蚀性增加,弥补了由于纳米颗粒的添加而导致耐腐蚀性降低的缺陷。得到的材料的表面硬度及耐磨性能俱优,适于工业化生产,拓展了其应用领域。The invention has reasonable components and simple preparation process, effectively improves the problem of uneven dispersion of second-phase insoluble particles in the plating solution, promotes the amorphization of Ni-P alloys, and reduces defects such as grain boundaries, dislocations, and vacancies. The corrosion resistance is increased, making up for the defect that the corrosion resistance is reduced due to the addition of nanoparticles. The obtained material has excellent surface hardness and wear resistance, is suitable for industrial production, and expands its application field.

附图说明Description of drawings

图1为多层Ni-P-Ce-B4C@Cu复合镀层电刷镀的工艺流程图的示例。Fig. 1 is an example of the process flow chart of multi-layer Ni-P-Ce-B 4 C@Cu composite coating brush plating.

具体实施方式Detailed ways

下面结合具体实施例对本发明进行详细说明,而不是对本发明进行限制,本发明的精神和权利要求保护范围内,对本发明做出的任何修改或改变,都落入本发明的保护范围。The present invention will be described in detail below in conjunction with specific embodiments, rather than limiting the present invention, within the spirit of the present invention and the scope of claims, any amendments or changes made to the present invention will fall within the protection scope of the present invention.

实施例1Example 1

按照镀液A-1的组分和浓度要求以及实际生产过程中所需镀液A-1的体积分别用去离子水溶解240g硫酸镍、15g次亚磷酸钠、20g柠檬酸、20g柠檬酸三钠、18g硫酸钠、0.1g十二烷基硫酸钠、25g硝酸铈,配取20ml冰乙酸;然后将配得的柠檬酸溶液、柠檬酸三钠溶液和冰乙酸搅拌6min得到络合剂溶液;再将络合剂溶液与硫酸镍溶液混合均匀10min,得到溶液A;接着依次将硝酸铈、硫酸钠溶液加入溶液A中搅拌5min,得到溶液B。之后在快速搅拌下,将次亚磷酸钠溶液缓慢加入溶液B中,搅拌20min。最后用pH调节剂调节溶液pH=3.0,定容1L。其中pH调节剂为15%稀氨水,配制得到镀液A-1。Dissolve 240g of nickel sulfate, 15g of sodium hypophosphite, 20g of citric acid, and 20g of citric acid tris in deionized water according to the composition and concentration requirements of plating solution A-1 and the volume of plating solution A-1 required in the actual production process. Sodium, 18g of sodium sulfate, 0.1g of sodium lauryl sulfate, 25g of cerium nitrate, and 20ml of glacial acetic acid were prepared; then the obtained citric acid solution, trisodium citrate solution and glacial acetic acid were stirred for 6 minutes to obtain a complexing agent solution; Then mix the complexing agent solution and nickel sulfate solution evenly for 10 minutes to obtain solution A; then add cerium nitrate and sodium sulfate solution to solution A and stir for 5 minutes to obtain solution B. Then, under rapid stirring, the sodium hypophosphite solution was slowly added to solution B, and stirred for 20 minutes. Finally, the pH of the solution was adjusted to 3.0 with a pH regulator, and the volume was adjusted to 1 L. Wherein the pH regulator is 15% dilute ammonia water, and the plating solution A-1 is prepared.

B4C纳米粉末(粒径为50nm)经过10wt%的NH4F溶液粗化20min、10g/L SnCl2和4g/LHCl溶液中敏化3min以及在0.5g/L PdCl2和22ml/L HCl活化液中活化3min后,离心分离烘干,置入改性液进行Cu包覆,改性液组分为:硫酸铜10g/L,甲醛25ml/L,酒石酸钾钠25g/L,2,2一联吡啶10mg/L,镍氰化钾 50mg/L,氢氧化钠7g/L,pH为12.5,装载量为2g/L,温度为40℃,搅拌反应后,固液分离,得到包覆Cu的B4C颗粒;所述包覆Cu的B4C颗粒的粒径为100nm。B 4 C nanopowder (particle size is 50nm) was roughened by 10wt% NH 4 F solution for 20min, sensitized in 10g/L SnCl 2 and 4g/L HCl solution for 3min, and in 0.5g /L PdCl2 and 22ml/L HCl After activating in the activation solution for 3 minutes, centrifuge and dry, then put into the modification solution for Cu coating. The modification solution components are: copper sulfate 10g/L, formaldehyde 25ml/L, potassium sodium tartrate 25g/L, 2,2 Bipyridyl 10mg/L, potassium nickel cyanide 50mg/L, sodium hydroxide 7g/L, pH 12.5, loading capacity 2g/L, temperature 40°C, after stirring reaction, solid-liquid separation to obtain coated Cu B 4 C particles; the particle size of the Cu-coated B 4 C particles is 100 nm.

在油墨刮刀表面进行工件表面预处理,先用脱脂棉蘸取丙酮擦拭基材表面手动除油,时间为20s;电净除油,采用正接法,调节电压为12V,用镀笔浸蘸电净液对基材进行擦拭,擦拭速度为60mm/s,时间为30s。刷完后,用去离子水清洗;活化液活化:用镀笔浸蘸1号活化液对基材进行擦拭,调节电压为12V,采用反接法,刷镀速度为90mm/s,时间为30s;3号活化液活化时需调节电压 12V,采用反接法,刷镀速度为90mm/s,时间为90s。Pre-treat the surface of the workpiece on the surface of the ink scraper, first use absorbent cotton dipped in acetone to wipe the surface of the substrate to manually degrease, the time is 20s; for electric degreasing, use the positive connection method, adjust the voltage to 12V, use a plating pen to dip in the electric cleaner Wipe the substrate with liquid at a wiping speed of 60mm/s for 30s. After brushing, wash with deionized water; activation of activation solution: dip a plating pen into No. 1 activation solution to wipe the substrate, adjust the voltage to 12V, use the reverse connection method, brush plating speed of 90mm/s, and time of 30s ; When the No. 3 activation solution is activated, the voltage needs to be adjusted to 12V, the reverse connection method is adopted, the brush plating speed is 90mm/s, and the time is 90s.

将35g改性后的B4C颗粒加入镀液A-1中,进行超声震荡10min,然后进行机械搅拌15min,控制转速为200r/min,得到镀液A-2。Add 35g of the modified B 4 C particles into the plating solution A-1, perform ultrasonic vibration for 10 minutes, then perform mechanical stirring for 15 minutes, and control the rotation speed at 200r/min to obtain the plating solution A-2.

将活化后的基材用去离子水清洗后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度40mm/s,时间为50s,得到基材/第一 Ni层试样(其中第一Ni层厚度为0.5μm),以11V电压,采用正接法,用镀笔浸蘸镀液A-1对试样进行刷镀,刷镀时速度为40mm/s,时间为3min,得到基材 /第一Ni层/Ni-P-Ce试样(其中Ni-P-Ce镀层厚度为5μm);用去离子水清洗试样表面后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度40mm/s,时间为50s,得到基材/Ni/Ni-P-Ce/Ni试样(其中特殊镍夹心层的厚度为0.5μm);用去离子水清洗试样表面后,以11V电压,用镀笔浸蘸镀液A-2对试样进行刷镀,采用正接法,刷镀时速度为40mm/s,时间为4min,得到基材/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu试样(其中刷镀Ni-P-Ce-B4C@Cu厚度为6μm)。将制备的Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu多层复合镀层在400℃下,恒温处理1.5h,取出空冷,制得最终镀层试样。After cleaning the activated substrate with deionized water, use a voltage of 12V and adopt the positive connection method to dip the plating pen into the nickel-containing plating solution to brush-plate the substrate. The speed of brush-plating is 40mm/s, and the time is 50s. Obtain the base material/the first Ni layer sample (wherein the first Ni layer thickness is 0.5 μ m), with 11V voltage, adopt positive connection method, dip in the plating solution A-1 with the plating pen and carry out brush plating to the sample, brush plating The hourly speed is 40mm/s, and the time is 3min, obtains substrate/the first Ni layer/Ni-P-Ce sample (wherein the thickness of Ni-P-Ce plating layer is 5 μm); After cleaning the sample surface with deionized water, With a voltage of 12V, using the positive connection method, use a plating pen to dip into the nickel-containing plating solution to brush-plate the substrate. The speed of brush-plating is 40mm/s, and the time is 50s to obtain the substrate/Ni/Ni-P-Ce/Ni The sample (the thickness of the special nickel sandwich layer is 0.5 μm); after cleaning the surface of the sample with deionized water, brush-plate the sample with a plating pen dipped in the plating solution A-2 at a voltage of 11V, and adopt the positive connection method , the brush-plating speed was 40mm/s, and the time was 4min to obtain the substrate/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu sample (wherein brush-plating Ni-P-Ce -B 4 C@Cu with a thickness of 6 μm). The prepared Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu multilayer composite coating was treated at 400°C for 1.5 hours at a constant temperature, and then cooled in air to obtain the final coating sample.

成品的性能检测值如下:The performance test value of the finished product is as follows:

截面显微硬度为1053HV,自腐蚀电流密度为3.85μA,自腐蚀电位为-213mV。The cross-sectional microhardness is 1053HV, the self-corrosion current density is 3.85μA, and the self-corrosion potential is -213mV.

实施例2Example 2

按照镀液A-1的组分和浓度要求以及实际生产过程中所需镀液A-1的体积分别用去离子水溶解260g硫酸镍、20g次亚磷酸钠、20g柠檬酸、20g柠檬酸三钠、18g硫酸钠、0.1g十二烷基硫酸钠、35g硝酸铈,配取20ml冰乙酸;然后将配得的柠檬酸溶液、柠檬酸三钠溶液和冰乙酸搅拌6min得到络合剂溶液;再将络合剂溶液与硫酸镍溶液混合均匀10min,得到溶液A;接着依次将硝酸铈、硫酸钠溶液加入溶液A中搅拌5min,得到溶液B。之后在快速搅拌下,将次亚磷酸钠溶液缓慢加入溶液B中,搅拌20min。最后用pH调节剂调整溶液pH=4.0,定容1L。其中pH调节剂为15%稀氨水,此时镀液A-1配制完毕。Dissolve 260g of nickel sulfate, 20g of sodium hypophosphite, 20g of citric acid, and 20g of citric acid tris in deionized water according to the composition and concentration requirements of plating solution A-1 and the volume of plating solution A-1 required in the actual production process. Sodium, 18g of sodium sulfate, 0.1g of sodium lauryl sulfate, 35g of cerium nitrate, and 20ml of glacial acetic acid were prepared; then the obtained citric acid solution, trisodium citrate solution and glacial acetic acid were stirred for 6 minutes to obtain a complexing agent solution; Then mix the complexing agent solution and nickel sulfate solution evenly for 10 minutes to obtain solution A; then add cerium nitrate and sodium sulfate solution to solution A and stir for 5 minutes to obtain solution B. Then, under rapid stirring, the sodium hypophosphite solution was slowly added to solution B, and stirred for 20 minutes. Finally, the pH of the solution was adjusted to 4.0 with a pH regulator, and the volume was adjusted to 1 L. Wherein the pH adjuster is 15% dilute ammonia water, and the preparation of plating solution A-1 is completed at this time.

B4C粉末经过0wt%的NH4F溶液粗化25min、10g/L SnCl2和4g/L HCl溶液中敏化5min以及在0.5g/L PdCl2和22ml/L HCl活化液中活化5min后离心分离烘干,置入改性液进行铜包覆,改性液组分为:硫酸铜12g/L,甲醛20ml/L,酒石酸钾钠25g/L,2,2一联吡啶15mg/L,镍氰化钾75mg/L,氢氧化钠7g/L,pH为 11,装载量3g/L,温度为50℃,搅拌反应后,固液分离,得到包覆有Cu的B4C 颗粒;所述包覆有Cu的B4C颗粒的粒径为200nm。After B 4 C powder was coarsened with 0wt% NH 4 F solution for 25min, sensitized in 10g/L SnCl 2 and 4g/L HCl solution for 5min, and activated in 0.5g/L PdC 12 and 22ml/L HCl activation solution for 5min Centrifugal separation and drying, put into the modification solution for copper coating, the modification solution components are: copper sulfate 12g/L, formaldehyde 20ml/L, potassium sodium tartrate 25g/L, 2,2-bipyridine 15mg/L, Nickel potassium cyanide 75mg/L, sodium hydroxide 7g/L, pH 11, loading capacity 3g/L, temperature 50°C, after stirring reaction, solid-liquid separation, to obtain B 4 C particles coated with Cu; The particle size of the Cu-coated B 4 C particles is 200 nm.

将55g改性后的B4C颗粒加入镀液A-1中,进行超声震荡10min,然后进行机械搅拌15min,控制转速为250r/min,得到镀液A-2。55g of the modified B 4 C particles were added into the plating solution A-1, subjected to ultrasonic vibration for 10 minutes, then mechanically stirred for 15 minutes, and the rotational speed was controlled at 250r/min to obtain the plating solution A-2.

在油墨刮刀表面进行工件表面预处理,先用脱脂棉蘸取丙酮擦拭基材表面手动除油40s;电净除油,采用正接法,调节电压为12V,用镀笔浸蘸电净液对基材进行擦拭,擦拭速度为80mm/s,时间为25s。刷完后,用去离子水清洗;活化液活化:用镀笔浸蘸1号活化液对基材进行擦拭,调节电压为12V,采用反接法,刷镀速度为110mm/s,时间为25s;3号活化液活化时需调节电压12V,采用反接法,刷镀速度为110mm/s,时间为70s。Pre-treat the surface of the workpiece on the surface of the ink scraper, first use absorbent cotton dipped in acetone to wipe the surface of the substrate and manually degrease for 40 seconds; for electric degreasing, use the positive connection method, adjust the voltage to 12V, and use a plating pen dipped in electro-cleaning liquid to clean the substrate. Wipe the material, the wiping speed is 80mm/s, and the time is 25s. After brushing, wash with deionized water; activation of activation solution: dip a plating pen into No. 1 activation solution to wipe the substrate, adjust the voltage to 12V, use the reverse connection method, brush plating speed is 110mm/s, and the time is 25s ; When the No. 3 activation solution is activated, the voltage needs to be adjusted to 12V, the reverse connection method is adopted, the brush plating speed is 110mm/s, and the time is 70s.

将活化后的基材用去离子水清洗后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度50mm/s,时间为50s,得到基材/Ni层试样(其中特殊镍厚度为1.0μm);,以11V电压,采用正接法,用镀笔浸蘸镀液A-1对试样进行刷镀,刷镀时速度为60mm/s,时间为3.5min,得到基材 /Ni/Ni-P-Ce试样(其中Ni-P-Ce镀层厚度为6μm);用去离子水清洗试样表面后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度60mm/s,时间为70s,得到基材/Ni/Ni-P-Ce/Ni试样(其中特殊镍夹心层的厚度为1.0μm);用去离子水清洗试样表面后,以11V电压,用镀笔浸蘸镀液A-2对试样进行刷镀,采用正接法,刷镀时速度为60mm/s,时间为4.5min,得到基材/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu试样(其中刷镀Ni-P-Ce-B4C@Cu厚度为 7.0μm)。将制备的Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu多层复合镀层在415℃下,恒温处理1.0h,取出空冷,制得最终镀层试样。After the activated substrate is cleaned with deionized water, use a voltage of 12V and adopt the positive connection method to dip the plating pen into the nickel-containing plating solution to perform brush plating on the substrate. The speed of brush plating is 50mm/s, and the time is 50s. Obtain base material/Ni layer sample (wherein special nickel thickness is 1.0 μ m); With 11V voltage, adopt positive connection method, dip in plating solution A-1 with plating pen and dip in plating solution A-1 sample is carried out brush-plating, speed during brush-plating is 60mm/s, the time is 3.5min, to obtain the substrate/Ni/Ni-P-Ce sample (the Ni-P-Ce coating thickness is 6μm); after cleaning the sample surface with deionized water, with 12V voltage, use In the positive connection method, the base material is brush-plated with a plating pen dipped in the nickel-containing plating solution. The brush-plating speed is 60mm/s and the time is 70s to obtain the base material/Ni/Ni-P-Ce/Ni sample (including special The thickness of the nickel sandwich layer is 1.0 μm); after the surface of the sample is cleaned with deionized water, the sample is brush-plated with a plating pen dipped in the plating solution A-2 with a voltage of 11V, and the positive connection method is adopted. is 60mm/s, and the time is 4.5min, to obtain substrate/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu sample (where Ni-P-Ce-B 4 C @Cu thickness is 7.0 μm). The prepared Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu multilayer composite coating was treated at 415°C for 1.0 h at a constant temperature, and then cooled in air to obtain the final coating sample.

成品的性能检测值如下:The performance test value of the finished product is as follows:

截面显微硬度为1052HV,自腐蚀电流密度为3.79μA,自腐蚀电位为-214mV。The cross-sectional microhardness is 1052HV, the self-corrosion current density is 3.79μA, and the self-corrosion potential is -214mV.

实施例3Example 3

按照镀液A的组分和浓度要求以及实际生产过程中所需镀液A-1的体积分别用去离子水溶解280g硫酸镍、25g次亚磷酸钠、20g柠檬酸、20g柠檬酸三钠、 18g硫酸钠、0.1g十二烷基硫酸钠、45g硝酸铈,配取20ml冰乙酸;然后将配得的柠檬酸溶液、柠檬酸三钠溶液和冰乙酸搅拌6min得到络合剂溶液;再将络合剂溶液与硫酸镍溶液混合均匀10min,得到溶液A;接着依次将硝酸铈、硫酸钠溶液加入溶液A中搅拌5min,得到溶液B。之后在快速搅拌下,将次亚磷酸钠溶液缓慢加入溶液B中,搅拌20min。最后用pH调节剂调整溶液pH=5.0,定容1L。其中调节剂为15%稀氨水,此时镀液A-1配制完毕。Dissolve 280g nickel sulfate, 25g sodium hypophosphite, 20g citric acid, 20g trisodium citrate, 18g of sodium sulfate, 0.1g of sodium lauryl sulfate, 45g of cerium nitrate, and 20ml of glacial acetic acid; then the obtained citric acid solution, trisodium citrate solution and glacial acetic acid were stirred for 6 minutes to obtain a complexing agent solution; The complexing agent solution and nickel sulfate solution were mixed evenly for 10 minutes to obtain solution A; then cerium nitrate and sodium sulfate solutions were added to solution A and stirred for 5 minutes to obtain solution B. Then, under rapid stirring, the sodium hypophosphite solution was slowly added to solution B, and stirred for 20 minutes. Finally, the pH of the solution was adjusted to 5.0 with a pH regulator, and the volume was adjusted to 1 L. The regulator is 15% dilute ammonia water, and the plating solution A-1 is prepared at this time.

B4C粉末经过10%的NH4F溶液粗化30min、10g/L SnCl2和4g/L HCl溶液中敏化8min以及在0.5g/L PdCl2和22ml/L HCl活化液中活化8min后,离心分离烘干,置入改性液进行铜包覆,改性液组分为:硫酸铜10g/L,甲醛15ml/L,酒石酸钾钠25g/L,2,2一联吡啶20mg/L,镍氰化钾100mg/L,氢氧化钠7g/L, pH11,装载量4g/min,温度为60℃,搅拌反应后,固液分离,得到包覆有Cu 的B4C颗粒;所述包覆有Cu的B4C颗粒的粒径为200nm。B 4 C powder was roughened with 10% NH4F solution for 30min, sensitized in 10g/L SnCl2 and 4g/L HCl solution for 8min, and activated in 0.5g/L PdCl2 and 22ml/L HCl activation solution for 8min, then centrifuged and dried Dry, put into the modification solution for copper coating, the modification solution components are: copper sulfate 10g/L, formaldehyde 15ml/L, potassium sodium tartrate 25g/L, 2,2-bipyridine 20mg/L, nickel cyanide Potassium 100mg/L, sodium hydroxide 7g/L, pH 11, loading capacity 4g/min, temperature 60°C, after stirring reaction, solid-liquid separation, to obtain B 4 C particles coated with Cu; The particle size of the B 4 C particles is 200nm.

将75g改性后的B4C颗粒加入镀液A-1中,进行超声震荡10min,然后进行机械搅拌15min,控制转速为300r/min,得到镀液A-2。Add 75g of the modified B 4 C particles into the plating solution A-1, perform ultrasonic vibration for 10 minutes, then perform mechanical stirring for 15 minutes, and control the rotation speed at 300r/min to obtain the plating solution A-2.

在油墨刮刀表面进行工件表面预处理,先用脱脂棉蘸取丙酮擦拭基材表面手动除油60s;电净除油,采用正接法,调节电压为12V,用镀笔浸蘸电净液对基材进行擦拭,擦拭速度为100mm/s,时间为20s。刷完后,用去离子水清洗;活化液活化:用镀笔浸蘸1号活化液对基材进行擦拭,调节电压为12V,采用反接法,刷镀速度为130mm/s,时间为20s;3号活化液活化时需调节电压12V,采用反接法,刷镀速度为130mm/s,时间为50s。Pre-treat the surface of the workpiece on the surface of the ink scraper, first use absorbent cotton dipped in acetone to wipe the surface of the substrate and manually degrease for 60 seconds; for electric degreasing, use the positive connection method, adjust the voltage to 12V, and use a plating pen dipped in electro-cleaning liquid to clean the substrate. Wipe the material, the wiping speed is 100mm/s, and the time is 20s. After brushing, wash with deionized water; activation of activation solution: dip a plating pen into No. 1 activation solution to wipe the substrate, adjust the voltage to 12V, use the reverse connection method, brush plating speed of 130mm/s, and time of 20s ; When the No. 3 activation solution is activated, the voltage needs to be adjusted to 12V, the reverse connection method is adopted, the brush plating speed is 130mm/s, and the time is 50s.

将活化后的基材用去离子水清洗后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度50mm/s,时间为90s,得到基材/Ni层试样(其中特殊镍厚度为1.5μm);,以11V电压,采用正接法,用镀笔浸蘸镀液A-1对试样进行刷镀,刷镀时速度为80mm/s,时间为4min,得到基材 /Ni/Ni-P-Ce试样(其中Ni-P-Ce镀层厚度为7.0μm);用去离子水清洗试样表面后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度80mm/s,时间为90s,得到基材/Ni/Ni-P-Ce/Ni试样(其中特殊镍夹心层的厚度为1.5μm);用去离子水清洗试样表面后,以11V电压,用镀笔浸蘸镀液 A-2对试样进行刷镀,采用正接法,刷镀时速度为80mm/s,时间为5min,得到基材/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu试样(其中刷镀Ni-P-Ce-B4C@Cu厚度为 8.0μm)。将制备的Ni/Ni-P-Ce/Ni/Ni-P-Ce-B4C@Cu多层复合镀层在430℃下,恒温处理0.5h,取出空冷,制得最终镀层试样。After cleaning the activated substrate with deionized water, use a voltage of 12V and adopt the positive connection method to dip the plating pen into the nickel-containing plating solution to brush-plate the substrate. The speed of brush-plating is 50mm/s, and the time is 90s. Obtain base material/Ni layer sample (wherein special nickel thickness is 1.5 μ m); With 11V voltage, adopt positive connection method, dip in plating solution A-1 with plating pen and dip in plating solution A-1 sample is carried out brush-plating, speed during brush-plating is 80mm/s, the time is 4min, to obtain the substrate/Ni/Ni-P-Ce sample (the Ni-P-Ce coating thickness is 7.0μm); after cleaning the sample surface with deionized water, with 12V voltage, use In the positive connection method, the substrate is brush-plated with a plating pen dipped in a nickel-containing plating solution. The brush-plating speed is 80mm/s and the time is 90s to obtain the substrate/Ni/Ni-P-Ce/Ni sample (including special The thickness of the nickel sandwich layer is 1.5 μm); after cleaning the surface of the sample with deionized water, with a voltage of 11V, use a plating pen dipped in the plating solution A-2 to brush-plate the sample, adopt the positive connection method, and the speed of brush-plating is 80mm/s, and the time is 5min, the substrate/Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu sample (wherein Ni-P-Ce-B 4 C@ Cu thickness is 8.0 μm). The prepared Ni/Ni-P-Ce/Ni/Ni-P-Ce-B 4 C@Cu multilayer composite coating was treated at 430° C. for 0.5 h at a constant temperature, and then air-cooled to obtain the final coating sample.

产品的性能检测值如下:The performance test value of the product is as follows:

截面显微硬度为1033HV,自腐蚀电流密度为3.87μA,自腐蚀电位为-201mV。The cross-sectional microhardness is 1033HV, the self-corrosion current density is 3.87μA, and the self-corrosion potential is -201mV.

对比例1Comparative example 1

用去离子水溶解280g硫酸镍、25g次亚磷酸钠、20g柠檬酸、20g柠檬酸三钠、18g硫酸钠、0.1g十二烷基硫酸钠、45g硝酸铈,配取20ml冰乙酸;然后将配得的柠檬酸溶液、柠檬酸三钠溶液和冰乙酸搅拌6min得到络合剂溶液;再将络合剂溶液与硫酸镍溶液混合均匀10min,得到溶液A;之后在快速搅拌下,将次亚磷酸钠溶液缓慢加入溶液B中,搅拌20min。最后用pH计调剂溶液pH=5.0,定容1L。其中调节剂为15%稀氨水,此时镀液A配制完毕。Dissolve 280g of nickel sulfate, 25g of sodium hypophosphite, 20g of citric acid, 20g of trisodium citrate, 18g of sodium sulfate, 0.1g of sodium lauryl sulfate, and 45g of cerium nitrate in deionized water, and prepare 20ml of glacial acetic acid; The obtained citric acid solution, trisodium citrate solution and glacial acetic acid were stirred for 6 minutes to obtain a complexing agent solution; then the complexing agent solution and nickel sulfate solution were mixed uniformly for 10 minutes to obtain solution A; Sodium phosphate solution was slowly added to solution B and stirred for 20 min. Finally, adjust the pH of the solution to 5.0 with a pH meter, and set the volume to 1 L. The regulator is 15% dilute ammonia water, and the plating solution A is prepared at this time.

在油墨刮刀表面进行工件表面预处理,先用脱脂棉蘸取丙酮擦拭基材表面手动除油60s;电净除油,采用正接法,调节电压为12V,用镀笔浸蘸电净液对基材进行擦拭,擦拭速度为100mm/s,时间为20s。刷完后,用去离子水清洗;活化液活化:用镀笔浸蘸1号活化液对基材进行擦拭,调节电压为12V,采用反接法,刷镀速度为130mm/s,时间为20s;3号活化液活化时需调节电压12V,采用反接法,刷镀速度为130mm/s,时间为50s。将活化后的基材用去离子水清洗后,以12V电压,采用正接法,用镀笔浸蘸含镍镀液对基材进行刷镀,刷镀时速度50mm/s,时间为90s,得到基材/Ni层试样(其中特殊镍厚度为1.5μm);,以11V电压,采用正接法,用镀笔浸蘸镀液A对试样进行刷镀,刷镀时速度为 80mm/s,时间为4min,得到基材/Ni/Ni-P试样。将制备的Ni/Ni-P复合镀层在 400℃下,恒温处理0.5h,取出空冷,制得最终镀层试样。Pre-treat the surface of the workpiece on the surface of the ink scraper, first use absorbent cotton dipped in acetone to wipe the surface of the substrate and manually degrease for 60 seconds; for degreasing by electric cleaning, use the positive connection method, adjust the voltage to 12V, use a plating pen dipped in the electro-cleaning liquid to clean the substrate Wipe the material, the wiping speed is 100mm/s, and the time is 20s. After brushing, wash with deionized water; activation of activation solution: dip a plating pen into No. 1 activation solution to wipe the substrate, adjust the voltage to 12V, use the reverse connection method, brush plating speed of 130mm/s, and time of 20s ; When the No. 3 activation solution is activated, the voltage needs to be adjusted to 12V, the reverse connection method is adopted, the brush plating speed is 130mm/s, and the time is 50s. After cleaning the activated substrate with deionized water, use a voltage of 12V and adopt the positive connection method to dip the plating pen into the nickel-containing plating solution to brush-plate the substrate. The speed of brush-plating is 50mm/s, and the time is 90s. Obtain base material/Ni layer sample (wherein special nickel thickness is 1.5 μ m); With 11V voltage, adopt positive connection method, dip in plating solution A with plating pen and dip in plating solution A and carry out brush plating to sample, speed during brush plating is 80mm/ s, the time is 4min, and the substrate/Ni/Ni-P sample is obtained. Treat the prepared Ni/Ni-P composite coating at 400°C for 0.5h at a constant temperature, take it out and cool it in air to obtain the final coating sample.

成品的性能检测值如下:The performance test value of the finished product is as follows:

截面显微硬度为780HV,自腐蚀电流密度为7.81μA,自腐蚀电位为-311.8mV。The cross-sectional microhardness is 780HV, the self-corrosion current density is 7.81μA, and the self-corrosion potential is -311.8mV.

Claims (9)

1.一种带Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料,其特征在于,所述耐磨耐蚀材料从里到外依次包括基材、第一Ni镀层、Ni-P-Ce镀层、第二Ni镀层、Ni-P-Ce-B4C@Cu镀层;1. A wear-resistant and corrosion-resistant material with Ni-P-Ce-B 4 C@Cu composite coating, it is characterized in that, described wear-resistant and corrosion-resistant material comprises base material, first Ni coating, Ni-P-Ce coating, second Ni coating, Ni-P-Ce-B 4 C@Cu coating; 所述带 Ni-P-Ce-B4C@Cu复合镀层的耐磨耐蚀材料的制备工艺为;基材表面经预处理后依次刷镀第一Ni镀层、Ni-P-Ce镀层、第二Ni镀层、 Ni-P-Ce-B4C@Cu镀层。The preparation process of the wear-resistant and corrosion-resistant material with Ni-P-Ce-B 4 C@Cu composite coating is as follows: after the substrate surface is pretreated, the first Ni coating, Ni-P-Ce coating, and the second coating are sequentially brushed. Two Ni coatings, Ni-P-Ce-B 4 C@Cu coatings. 2.根据权利要求1所述的耐磨耐蚀材料,其特征在于,所述第一Ni镀层、第二Ni镀层的厚度均为0.5-1.5μm。2 . The wear-resistant and corrosion-resistant material according to claim 1 , wherein the thicknesses of the first Ni coating and the second Ni coating are both 0.5-1.5 μm. 3.根据权利要求1或2所述的耐磨耐蚀材料,其特征在于,所述Ni-P-Ce镀层的厚度5.0-7.0μm。3. The wear-resistant and corrosion-resistant material according to claim 1 or 2, characterized in that, the thickness of the Ni-P-Ce coating is 5.0-7.0 μm. 4.根据权利要求3所述的耐磨耐蚀材料,其特征在于,所述Ni-P-Ce-B4C@Cu镀层的厚度为6.0-8.0μm。4 . The wear-resistant and corrosion-resistant material according to claim 3 , wherein the thickness of the Ni-P-Ce-B 4 C@Cu coating is 6.0-8.0 μm. 5.一种带Ni-P-Ce-B4C@Cu耐磨耐蚀复合镀层的耐磨耐蚀材料的制备工艺,其特征在于,包括以下工艺步骤:5. A preparation process of a wear-resistant and corrosion-resistant material with Ni-P-Ce-B 4 C@Cu wear-resistant and corrosion-resistant composite coating, characterized in that it comprises the following process steps: 步骤一:step one: 在40-50℃条件下,将活化处理后表面干净的基材使用含镍镀液进行镍的刷镀,得到基材/第一Ni镀层;Under the condition of 40-50°C, the substrate with a clean surface after activation treatment is brush-plated with nickel using a nickel-containing plating solution to obtain the substrate/first Ni coating; 步骤二:Step two: 将基材/第一Ni镀层试样用水清洗,进行镀液A-1的刷镀,得到基材/第一Ni镀层/Ni-P-Ce镀层试样,用水清洗后再次使用含镍镀液进行镍的刷镀,得到基材/第一Ni镀层/Ni-P-Ce镀层/第二Ni镀层;将Cu包覆B4C颗粒加入镀液A-1中,控制Cu包覆B4C在镀液A-1中浓度为35-75g/L,进行超声分散,搅拌,得到镀液A-2,随后使用镀液A-2实施刷镀,得到基材/第一Ni镀层/Ni-P-Ce镀层/第二Ni镀层/Ni-P-Ce-B4C@Cu镀层试样;The substrate/the first Ni coating sample is cleaned with water, and the brush plating of the plating solution A-1 is carried out to obtain the substrate/the first Ni coating/Ni-P-Ce coating sample, and the nickel-containing plating solution is used again after cleaning with water Perform nickel brush plating to obtain substrate/first Ni coating/Ni-P-Ce coating/second Ni coating; add Cu-coated B 4 C particles to plating solution A-1 to control Cu-coated B 4 C In the plating solution A-1, the concentration is 35-75g/L, ultrasonically dispersed and stirred to obtain the plating solution A-2, and then use the plating solution A-2 to perform brush plating to obtain the substrate/the first Ni coating layer/Ni- P-Ce coating/second Ni coating/Ni-P-Ce-B 4 C@Cu coating sample; 所述含镍镀液包括以下组分:六水合硫酸镍320-350g/L,柠檬酸60-80g/L,硼酸15-30g/L,施镀时,含镍镀液pH为1-3;The nickel-containing plating solution includes the following components: 320-350 g/L of nickel sulfate hexahydrate, 60-80 g/L of citric acid, and 15-30 g/L of boric acid. During plating, the pH of the nickel-containing plating solution is 1-3; 所述刷镀液A-1包括以下组分:硫酸镍240g/L-280g/L,次亚磷酸钠 15-25g/L,柠檬酸20-30g/L,柠檬酸三钠 15-25g/L,硫酸钠 15-20g/L,冰乙酸 20-30ml/L,十二烷基硫酸钠0.1-0.3g/L,硝酸铈 25-45g/L;The brush plating solution A-1 includes the following components: nickel sulfate 240g/L-280g/L, sodium hypophosphite 15-25g/L, citric acid 20-30g/L, trisodium citrate 15-25g/L , sodium sulfate 15-20g/L, glacial acetic acid 20-30ml/L, sodium lauryl sulfate 0.1-0.3g/L, cerium nitrate 25-45g/L; 施镀时,镀液A-1的pH值控制在:3.0-5.0。During plating, the pH value of plating solution A-1 is controlled at: 3.0-5.0. 6.根据权利要求5所述的制备工艺,其特征在于,所述Cu包覆B4C颗粒的粒度为100-350nm。6 . The preparation process according to claim 5 , wherein the particle size of the Cu-coated B 4 C particles is 100-350 nm. 7.根据权利要求5或6所述的制备工艺,其特征在于,所述Cu包覆B4C颗粒通过将纳米B4C粉末浸入浓度为8-12wt%的NH4F溶液中粗化处理后,固液分离再加入10-11g/L SnCl2和4-5g/L HCl溶液中敏化,固液分离,加入0.4-0.6g/L PdCl2和20-22ml/L HCl活化液中活化,固液分离,并烘干后加入次亚磷酸钠水溶液中搅拌形成悬浮液,加入改性液中,搅拌反应后,固液分离得到;7. The preparation process according to claim 5 or 6, characterized in that the Cu-coated B4C particles are roughened by immersing nano -B4C powder in an NH4F solution with a concentration of 8-12wt% After solid-liquid separation, add 10-11g/L SnCl 2 and 4-5g/L HCl solution for sensitization, solid-liquid separation, add 0.4-0.6g/L PdCl 2 and 20-22ml/L HCl activation solution for activation , solid-liquid separation, and after drying, add it to the sodium hypophosphite aqueous solution and stir to form a suspension, add it to the modified liquid, and after stirring and reacting, the solid-liquid separation is obtained; 其中,改性液组成:硫酸铜 7.5g/L-15g/L,甲醛15ml/L-25ml/L,酒石酸钾钠20-30g/L,2,2一联吡啶10mg-20mg/L,镍氰化钾50mg/L-100mg/L,氢氧化钠6-9/L;Among them, the composition of the modified liquid: copper sulfate 7.5g/L-15g/L, formaldehyde 15ml/L-25ml/L, potassium sodium tartrate 20-30g/L, 2,2-bipyridine 10mg-20mg/L, nickel cyanide Potassium chloride 50mg/L-100mg/L, sodium hydroxide 6-9/L; 改性液的pH为11.5-12.5,装载量为2-4 g/L,温度为45-60℃。The pH of the modification solution is 11.5-12.5, the loading amount is 2-4 g/L, and the temperature is 45-60°C. 8.根据权利要求7所述的制备工艺,其特征在于,制备镍层时,控制刷镀时间为50s-90s;8. The preparation process according to claim 7, characterized in that, when preparing the nickel layer, the control brush plating time is 50s-90s; 制备Ni-P-Ce镀层时,控制刷镀时间为3-4min;When preparing the Ni-P-Ce coating, control the brush plating time to 3-4min; 制备Ni-P-Ce-B4C@Cu镀层时,控制刷镀时间为4-5min。When preparing the Ni-P-Ce-B 4 C@Cu coating, the brush plating time is controlled to be 4-5 min. 9.根据权利要求5或8所述的制备工艺,其特征在于,将刷镀完成后的镀件在400-430℃,恒温处理0.5h-1.5h后,空冷,得到成品。9 . The preparation process according to claim 5 or 8 , characterized in that, after the brush-plating is completed, the plated piece is treated at 400-430° C. for 0.5h-1.5h at a constant temperature, and then air-cooled to obtain the finished product.
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