CN105879600A - Energy-saving type dielectric barrier discharge plasma nox reduction device - Google Patents
Energy-saving type dielectric barrier discharge plasma nox reduction device Download PDFInfo
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- CN105879600A CN105879600A CN201510861067.9A CN201510861067A CN105879600A CN 105879600 A CN105879600 A CN 105879600A CN 201510861067 A CN201510861067 A CN 201510861067A CN 105879600 A CN105879600 A CN 105879600A
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- Prior art keywords
- plasma
- nitrogen oxides
- dielectric barrier
- energy
- barrier discharge
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- 230000009467 reduction Effects 0.000 title claims abstract description 29
- 230000004888 barrier function Effects 0.000 title claims abstract description 26
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 197
- 238000002485 combustion reaction Methods 0.000 claims abstract description 31
- 238000007254 oxidation reaction Methods 0.000 claims description 61
- 230000003647 oxidation Effects 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 46
- 239000007789 gas Substances 0.000 claims description 38
- 238000006722 reduction reaction Methods 0.000 claims description 30
- 230000008569 process Effects 0.000 claims description 29
- 238000012545 processing Methods 0.000 claims description 28
- 239000003792 electrolyte Substances 0.000 claims description 23
- 239000002912 waste gas Substances 0.000 claims description 18
- 238000007599 discharging Methods 0.000 claims description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000007751 thermal spraying Methods 0.000 claims description 5
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 abstract description 2
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000005611 electricity Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 208000035985 Body Odor Diseases 0.000 description 2
- 206010055000 Bromhidrosis Diseases 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000003916 acid precipitation Methods 0.000 description 2
- 239000000809 air pollutant Substances 0.000 description 2
- 231100001243 air pollutant Toxicity 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- -1 nitrogen oxides Compound Chemical class 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 241000127225 Enceliopsis nudicaulis Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- 208000018569 Respiratory Tract disease Diseases 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- VDQVEACBQKUUSU-UHFFFAOYSA-M disodium;sulfanide Chemical compound [Na+].[Na+].[SH-] VDQVEACBQKUUSU-UHFFFAOYSA-M 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000006213 oxygenation reaction Methods 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 208000029257 vision disease Diseases 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/02—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust
- F01N3/04—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust using liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/06—Spray cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/12—Washers with plural different washing sections
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/26—Drying gases or vapours
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/75—Multi-step processes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
- F01N13/009—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 having two or more separate purifying devices arranged in series
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/40—Nitrogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
- F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2570/00—Exhaust treating apparatus eliminating, absorbing or adsorbing specific elements or compounds
- F01N2570/14—Nitrogen oxides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/10—Treatment of gases
- H05H2245/15—Ambient air; Ozonisers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E20/00—Combustion technologies with mitigation potential
- Y02E20/12—Heat utilisation in combustion or incineration of waste
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/10—Internal combustion engine [ICE] based vehicles
- Y02T10/12—Improving ICE efficiencies
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Biomedical Technology (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Treating Waste Gases (AREA)
- Exhaust Gas After Treatment (AREA)
Abstract
Disclosed is a nitrogen oxide reduction device using dielectric barrier discharge plasma. The plasma nitrogen oxide reduction device may limitedly emit nitrogen oxide with a form of NO2 at a final outlet of the plasma nitrogen oxide reduction device by arranging a combustion unit, a wet treatment unit, and a plasma oxidizing unit in a housing. The emitted nitrogen oxide is finally treated in a wet scrubber operated as a reducer at a final exhaust end.
Description
Technical field
The present invention relates to exhaust-gas treatment field, relate to one in more detail and can effectively process containing nitrogen oxidation
Energy-saving dielectric barrier discharge (the Dielectric Barrier of the waste gas of thing (NOx) and other pollutant
Discharge) plasma oxynitride emission reduction device.
Background technology
Along with industrialized fast development, meet the industrial activity of human's demand using energy basic means as
Basis.But, along with the increase of utilization of energy, do not only result in the generation of environmental pollution, and, pollute journey
Spend increasingly severe.Occupy the Fossil fuels such as the most oil of energy resources, coal, natural gas in combustion
During burning, necessarily discharging Air Pollutants, therefore, for sustainable development from now on, the mankind are necessary
Economic growth to be realized and the coordination of environmental conservation.
Because of the atmospheric pollution using the energy to bring, it is roughly divided into local dirt according to involving scope with corresponding scope
Dye and international pollution.Sulfur and nitrogen oxides etc. are for acid rain, vegeto-animal damaging range ratio
Relatively locality, but, carbon dioxide, NOx isothermal chamber gas become the world about global warming phenomenon
Dispute object.
Immoderate to develop into the economical operation of purpose, cause around domestic metropolis and industrial occupancy is big
Gas pollutes and has reached to jeopardize state, and, the income brought along with economic development improves, about preventing
Domestic atmospheric pollution, global concern perform the proposition of the methodology of the global warming of various regulations and because utilizing
The Air Pollutants prospect of the energy is referred to as important topic.
At present, along with the increase of the demand for quasiconductor display screen, fluoride is increasingly widely used,
Here, for because processing a large amount of of 2 polluters (NOx) occurring after semiconductor process gases
The total amount of discharge specify the technology of correspondence problem and current process NOx, mainly uses catalysis process, but
Overuse in operation the energy, accordingly it is desirable to guarantee replacement technology, it is therefore desirable to be able to solve existing
The replacement technology of problem.
[look-ahead technique document]
[patent documentation]
(patent documentation 1) Korean Patent Publication 10-2011-0065985
Summary of the invention
The problem that invention is to be solved
The technical problem to be solved in the present invention is, it is provided that a kind of at plasma oxynitride emission reduction device
Combustion section, wet processed portion and plasma oxidation portion is sequentially configured, with by final outlet in shell
The form of nitrogen oxides is with NO2Limit ground to discharge, thus, it is possible to effectively process the nitrogen oxygen of nitrogen oxides
Compound reduction of discharging type plasma oxygen gasifying device.
The technical scheme of solution problem
In order to solve the problems referred to above, the present invention provides a kind of energy-saving dielectric barrier discharge etc. processing waste gas
Gas ions nitrogen oxides emission reduction device, including: combustion section, burn processing is carried out for described waste gas；Wet
Formula process portion, receives the gas of burn processing, carries out wet processed from described combustion section；Plasma oxygen
Change portion, puts into the plasma for processing the nitrogen oxides comprised in the gas by described wet processed portion
Bromhidrosis body.
Described energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include shell, and
And, described combustion section, described wet processed portion and described plasma oxidation portion are configured in described shell
In.
Described energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device may also include main discharge
Pipe, its described nitrogen oxides being used for carry out processing by described plasma gas is outside described shell
Portion discharge, and, described plasma oxidation portion can in described shell be connected to described main discharge
Interface channel connect install.
Described plasma gas can be to be given birth to by the plasma discharge in described plasma oxidation portion
The O become3Gas.
Described nitrogen oxides can be with the O generated from described plasma oxidation portion3Produce oxidation reaction, become
It is changed to NO2。
The NO of described discharge2Reduction reaction can be passed through in the wet processed technique of subsequent treatment process
Processed.
Described plasma oxidation portion, it may include: internal electrode, it is rod shape；Electrolyte, it encloses
Around described internal electrode；And outer electrode, its outside described electrolyte with loop shape insert install,
Further, can be applied for producing the alternating current of plasma to described internal electrode and described outer electrode
Source.
Described external electrode surface can be applied by thermal spraying.
Identical height can be formed with outside described outer electrode outside described electrolyte.
Described plasma oxidation portion can utilize dielectric barrier discharge (Dielectric Barrier
Discharge, DBD) plasma and produce plasma.
The effect of invention
According to the present invention, plasma oxynitride emission reduction device will be for processing at by combustion section and wet type
The nitrogen oxides that comprises in the gas in reason portion and put into plasma gas plasma oxidation portion together
It is configured in shell, thus, it is possible to the final outlet at plasma oxide emission reduction device makes nitrogen
Oxide form is with NO2Limit and discharge.And, it is not necessary to add other equipment, and discharge by coil form electricity
The dielectric barrier discharge plasma in the plasma oxidation portion that pole is formed, processes nitrogen oxides,
Thus, it is possible to save the energy to supply of equipment.
This type of plasma oxidation portion, including internal electrode, around the electrolyte of internal electrode and is situated between at electricity
Insert the outer electrode installed outside matter with loop shape, external electrode surface is applied by thermal spraying,
Outside electrolyte with outer electrode outside height be identically formed, thus, it is possible to prevent dust adhesion in
Between electrode, and can solve the problem that the gap between electrolyte and electrode heating occurs or asking of electric arc occurs
Topic.
The technique effect of the present invention is not limited to above-mentioned content, and those skilled in the art passes through
The description below is to be understood that other technique effect NM.
Accompanying drawing explanation
Fig. 1 is the accompanying drawing that schematic diagram is suitable for the gas purge system in the plasma oxidation portion of the present invention.
Fig. 2 is the plasma oxynitride emission reduction device representing the plasma oxidation portion being suitable for the present invention
Accompanying drawing.
Fig. 3 is the sectional view in the plasma oxidation portion for the present invention is described.
Fig. 4 is the sectional view in the plasma oxidation portion for the present invention is described.
Fig. 5 is the expanded view in the plasma oxidation portion for the present invention is described.
Description of reference numerals
300: plasma oxynitride emission reduction device
301: shell 310: combustion section
320: wet processed portion 330: plasma oxidation portion
331: internal electrode 332: electrolyte
333: outer electrode 334: outside electrolyte
335: outside outer electrode 336: reacting gas intake
337: plasma gas outlet 340: alternating current power supply supply department
Detailed description of the invention
The present invention can carry out various change, and carries out various embodiment, in the accompanying drawings illustrations specific embodiments,
And be described in detail in the detailed description.But, it will be appreciated that this is not intended to limit the present invention
In particular implementation form, but all conversion in the thought including belonging to the present invention and technical scope, all
Deng thing and sub.As when the present invention is described, it is judged that can for the detailed description about known technology
When obscuring idea of the invention, then description is omitted.
Hereinafter, it is explained in detail with reference to the accompanying drawings according to embodiments of the invention, and, it is being described with reference to
Time, identical or corresponding element gives identical reference numeral, and omits its repeat specification.
It is said that in general, nitrogen oxides is because of the mobile occurring source of fixing occurring source and the automobiles etc. such as thermal power plant
Occurring, the nitrogen oxides occurred in semiconductor processing is safety before discharging various harmful gass to air
Ground process during scrubber's combustion process of process, because high temperature nitrogen during burning and oxygen produce
React and generate.
NO is to airborne release, by the O in air3、O2, moisture etc. and be oxidized to NO2、NO3、
N2O4Deng, wherein most is NO2, it is fused into suspended particulates state in atmosphere, and becomes acid rain
Or form photochemical fog by sunray.Its harm is very extensive, and human body mainly causes respiratory tract disease
Disease, stimulates eyes, causes visual disorder, or corrosion metal material, and plant growing also produces bigger shadow
Ring.
The SiH used in semiconductor processing as process4、NF3Etc. the technique of harmful gas, use heat
Processing means, the kind of this type of annealing device has fuel type, electric heater formula, plasma type.This type of
Mode, in processing procedure, passes through O2、H2O etc. and N2Reaction, occur substantial amounts of nitrogen oxides (NO,
NO2) etc..Especially, in the case of fuel type and plasma type, because of the characteristic that operation temperature is high,
In nitrogen oxides, the occurrence rate of NO is higher.
As another occurring source, NH in the gas used in semiconductor technology3And NF3, decompose or
In chemical reaction process, from NH3And NF3The nitrogen factor (N+) decomposed and the O in air2Or H2O is anti-
Should, and produce nitrogen oxides (major part NO) in a large number.
Fig. 1 is the accompanying drawing that schematic diagram is suitable for the gas purge system in the plasma oxidation portion of the present invention；
Fig. 2 is that expression is suitable for the attached of the plasma oxynitride emission reduction device in the plasma oxidation portion of the present invention
Figure.
With reference to Fig. 1 and Fig. 2, for processing the gas purge system of the waste gas containing nitrogen oxides, including such as
Lower processing procedure: the waste gas used in main processing equipment 100 is passed through vacuum pump 200 to applicable plasma
The plasma oxynitride emission reduction device 300 of body oxidation section 330 introduces, and the waste gas of introducing passes through plasma
After body nitrogen oxides emission reduction device 300 processes, through subsequent technique i.e. wet scrubber 400, pass through
Fan 500 is to airborne release.
Here, the plasma oxynitride being suitable for the plasma oxidation portion 330 according to the present invention reduces discharging
Device 300, can be in order to process waste gas and normally used annealing device i.e. uses point (POU, Point
Of Use) scrubber.Combustion section 310 and wet processed portion 320 can be comprised in conventional POU scrubber,
But the plasma oxynitride emission reduction device 300 according to the present invention, except combustion section in shell 301
310 and wet processed portion 320 outside, configurable plasma oxidation portion 330, it is used for processing for input
The plasma gas of the nitrogen oxides comprised in the gas by wet processed portion 320.
As in figure 2 it is shown, the combustion section 310 of the plasma oxynitride emission reduction device 300 according to the present invention
Connecting on top and have inflow pipe 311, the waste gas used in semiconductor manufacturing etc. is outside by this inflow pipe 311
Flow in shell 301.The waste gas flowed in shell 301 is carried out burn processing, warp by combustion section 310
Cross the waste gas of burn processing by amassing, in combustion section 310 lower section, the discharge pipe formed with becoming narrow gradually
312 discharge to wet processed portion 320.
Combustion section 310 use make the waste gas of harmful components by the way of processing waste gas between flame, and
And, in order to improve efficiency of combustion, O2And CH4Inject by being configured at the burning gases on combustion section 301 top
Mouth 313 is injected into.
But, in processing procedure, because of O2、H2O etc. and N2Reaction and produce substantial amounts of nitrogen oxides
(NO、NO2) etc., especially, in combustion, because of the characteristic that operation temperature during burning is high, nitrogen oxygen
In compound, the ratio of NO increases.
Combustion section 310 process waste gas, in order to process the deposition of 2 by-products, water-soluble gas molten
The cooling of the burning gases of solution and high temperature, by wet processed portion 320.
Wet processed portion 320 in order to receive the gas of burn processing from combustion section 310 and carry out wet processed,
Can include the 1st nozzle the 321, the 2nd nozzle 322, wet type tank 323, flow adjuster 324, pump 325,
Water supply comb 326.
In wet processed portion 320, adsorbed by the spraying of nozzle 321,322 and be dissolved in combustion section 310
The water solublity waste gas of interior generation and silicon dioxide (SiO2) powder etc., utilize wet type tank 323 store from
Treated substance that combustion section 310 and nozzle 321,322 are discharged also is discharged.Preferably, the 1st nozzle 321 He
2nd nozzle 322 is configured at wet type tank 323 top.
1st nozzle the 321 and the 2nd nozzle 322 can be connected with water supply comb 326, in order to from wet type tank 323
Receive the water of supply, and, pump 325 can be installed between wet type tank 323 and water supply comb 326,
So that by the nozzle 321 of the water supply of the wet type tank 323 of bottom that is configured in shell 301 to top,
322.Further, between wet type tank 323 and pump 325, it is configurable to adjust nozzle 321,322 spray
The flow adjuster 324 of the water yield penetrated.
As above-mentioned, in wet processed portion 320, wet type tank 323, flow adjuster 324, pump 325
And water supply comb 326 pull together cooperation, to play the function of water recursive device so that the water of fixed temperature exists
Persistent loop in wet processed portion 320.
The rear end in wet processed portion 320 may also include main discharge 327, and the waste gas being used for processing is to shell
301 outside discharges so that discharge to the device for aftertreatment technology.
Main discharge 327 extends from shell 301 interior and is formed, and is formed in main discharge 327
Main discharge 327 within shell 301, can be with by the interface channel 328 that is connected with main discharge 327
Plasma oxidation portion 330 connects.That is, according to the plasma oxidation portion 330 of the present invention, at plasma
In the shell 301 of body nitrogen oxides emission reduction device 300, together join with combustion section 310 and wet processed portion 320
Put, and form overall scrubber's equipment.
Further, the bottom in plasma oxidation portion 330 may also include and applies to plasma oxidation portion 330
The alternating current power supply supply department 340 of alternating current power supply.
As described above, plasma oxidation portion 330 is configured at plasma oxynitride emission reduction device 300
Interior rearmost end i.e. main discharge 327, and can make eventually through main discharge 327 outside to shell 301
Nitrogen oxides (NO) form discharged is with NO2Limit and discharge.
That is, the O generated by plasma discharge in plasma oxidation portion 3303With in combustion process
The nitrogen oxides (NO) occurred during middle burning occurs oxidation reaction to be transformed to NO2, the NO of change2
By main discharge to the outside discharge of shell 301, to the outside NO discharged of shell 3012Pass through subsequent treatment
The technique i.e. reduction reaction of wet processed technique, it is possible to effectively process nitrogen oxides.
Fig. 3 is the sectional view in the plasma oxidation portion for the present invention is described；Fig. 4 is for being used for this is described
The sectional view in bright plasma oxidation portion；Fig. 5 is the plasma oxidation portion for the present invention is described
Expanded view.
With reference to Fig. 3 to Fig. 5, the plasma oxidation portion 330 of the present invention can include that internal electrode 331, electricity are situated between
Matter 332, outer electrode 333.
Internal electrode 331 can have internal empty rod shape, and, electric conductor material formed, in order to
Electric current passes through.Discharge gas for plasma discharge can be by the reacting gas of internal electrode 331 bottom
Intake 336 introduces, and the plasma gas generated by plasma discharge can pass through internal electrode
Plasma gas outlet (337) discharge on 331 tops.Preferably, putting for plasma discharge
Electrically body can be O2, the plasma gas generated by plasma discharge can be O3。
Electrolyte 332 is around both set a distances of internal electrode 331 one end to both set a distances of the other end, and has
There is the rod shape identical with internal electrode 331.Electrolyte 332 is configured at internal electrode 331 and outer electrode
Between 333, for preventing the electric arc etc. produced in-between the electrodes by putting on the high voltage of electrode.
Outer electrode 333 can form the coil form electrode structure formed with loop shape, and insertion is installed on
Outside electrolyte 332.Can be by being set to same intervals and insert between coil, cutting of coil
Face be prevented from when being formed such that and coil is inserted in electrolyte 332 being formed at the groove of electrolyte 332 with
Origination interval between coil, and, so that outside electrolyte 334 and outer electrode outside 335 height
Degree configures in the same manner, and can have square shape.But, the form of coil section can be entered according to user
The various changes of row.
Internally electrode 331 and outer electrode 333 are by being installed on the bottom in plasma oxidation portion 330
Alternating current power supply supply department 340 applies alternating current power supply.For example, it is possible to internally electrode 331 applies voltage, outward
Portion's electrode 333 is grounded, or changes internal electrode 331 and the polarity of outer electrode 333, and, according to
Alternating current power supply supply department 340 can all apply high voltage to two electrodes.That is, internal electrode 331 and external electrical
In pole 333, can apply to certain side high voltage (±), by opposite side ground connection, or internal electrode 331
With in outer electrode 333 during certain side applying+electrode ,-electrode can be applied to opposite side.
Further, internal electrode 331 and outer electrode 333 are the conductive material comprising metal, can be by anti-corrosion
Aluminum (Al) that property is stronger, rustless steel (STS), titanium (Ti), nickel (Ni), chromium (Cr), copper
(Cu), a certain material in tungsten (W), platinum (Pt) or its alloy and formed.Preferably,
Kazakhstan (Hastelloy) alloy with the preferable nickel of processability and corrosion resistance as main component can be suitable for.
Pottery i.e. MgO, the Al of the oxide series that the applicable dielectric constant of electrolyte 332 is higher2O3、
TiO2、SiO2In a certain material.
Can be applied by thermal spraying, to electricity with the electrode surface of the outer electrode 333 of loop shape formation
The outside insertion of medium 332 is installed.Further, it is inserted in outside the outer electrode of electrolyte 332 335 to be situated between with electricity
Outside matter, 334 formation are identical highly configures.
As above-mentioned, outer electrode 333 surface is applied by thermal spraying, and makes outside outer electrode 335
Highly configure with outside electrolyte, 334 formation are identical such that it is able to prevent between dust adhesion electrode,
Further, it is possible to the heating of the gap generation solved between electrolyte 332 and electrode or the problem of electric arc.
Plasma oxidation portion 330 can embody with all size according to user, preferred according to the present invention
The size of internal electrode 331, be 1.5m from one end to the height of the other end, one end of electrolyte 332 is extremely
The height of the other end is 1.2m.Further, one end started from coil of the outer electrode 333 of loop shape
The height of the other end to coil end is 0.95m.Coil and the thickness of electrolyte 332, as shown in Figure 4,
It is respectively 2mm and 7mm.
Utilize this type of coil form electrode structure dielectric barrier discharge (Dielectric Barrier Discharge,
DBD) plasma device, the electric field occurred between electrodes at applying altofrequency, high voltage
(Electric field), is additionally formed by Faraday's law of induction (Faraday's Law of Induction)
Induction field, and make the intensity maximum of electric field, thus, significantly reduce power consumption, and produce
The plasma of good characteristic.
As above-mentioned, according to the plasma oxidation portion 330 of the present invention, utilize dielectric barrier discharge plasma
Body generation plasma, is occurred by this type of plasma, by O2It is transformed to O3, by interface channel 328
O is discharged to main discharge 3273.The O discharged to main discharge 327 as described above3To at main discharge 327
The internal polluter existed carries out aoxidizing and ionizing process.Such as, NO with CO oxidation processes is become
NO2And CO2, THC is oxidized and ionizing, HF or dust are by coarsening.
Thus, by from according to the present invention plasma oxidation portion 330 occur plasma, to
In plasma oxynitride emission reduction device 300 combustion process occur nitrogen oxides with pass through plasma
The O that body electric discharge occurs3Carry out oxidation reaction process, thus, enabling plasma oxynitride reduces discharging
The nitrogen oxides form of the final outlet of device 300 is with NO2Limit and discharge.
Nitrogen oxides is as follows by the reaction mechanism of the above-mentioned oxidized process in plasma oxidation portion 330.
NO+O3=> NO2-+O2
By the oxidized process in plasma oxidation portion 330, by main discharge 327 with NO2The nitrogen discharged
Oxide, as it is shown in figure 1, logical in the subsequent treatment process i.e. wet processed technique of wet scrubber 400
Cross reduction reaction to be eventually processed.Further, wet scrubber 400 in addition to nitric oxides, also processes
At the absorption of the ionized THC of pretreatment process, the remaining O of pretreatment process3Reduction, HF etc..
The dominant response mechanism being carried out reduction treatment by above-mentioned wet scrubber 400 is as follows.
NO2+(Na2S+ α)=N2+Na2SO4
As described above, by by means of the oxidizing process in plasma oxidation portion 330 and wet scrubber 400
Reduction process, it is possible in the combustion process in plasma nitrogen oxides emission reduction device 300 occur
Nitrogen oxides processes effectively.
<experimental example 1>
In order to evaluate the nitrogen oxides treatment performance of the equipment in the plasma oxidation portion being provided with the present invention,
Carry out nitrogen oxides and be converted into NO by the plasma discharge in this plasma oxidation portion2Conversion effect
Rate is tested.
The testing data that the equipment in the Tables 1 and 2 plasma oxidation portion to being provided with the present invention is carried out.
According to the condition of this experimental example 1, by the plasma O of oxidation stage (Stage)3Concentration is set as
40ppm, is set as 2CMM by benchmark air quantity.Superficial linear velocity in a column 1m/s, during holdup time 2sec condition,
The NO of nitrogen oxides during plasma OFF and during plasma ON2Conversion efficiency is as shown in table 1, root
According to the time, the oxygenation efficiency experimental result of change is as shown in table 2.
[table 1]
| Plasma OFF (ppm) | Plasma ON (ppm) | Efficiency | ||
| NO | 45 | NO | 7 | 84% |
| NO2 | 22 | NO2 | 55 | |
| NOx | 67 | NOx | 62 | |
| O3 | 40 | O3 | 1.4 |
[table 2]
Understood by Tables 1 and 2 and be effectively converted into NO by the energy nitrogen oxides of applying plasma2。
<experimental example 2>
At experimental example 2, aoxidize to evaluate the nitrogen of the equipment in the plasma oxidation portion being provided with the present invention
Thing process performance, has carried out after starting 80 minutes continuously, and nitrogen oxides passes through this plasma oxidation portion
Plasma discharge be converted into NO2Conversion efficiency test.
Table 3 to table 6 is the experimental example 2 that the equipment to the plasma oxidation portion being provided with the present invention is carried out
Testing data.
According to the condition of this experimental example 2, identically with the condition of experimental example 1 by the plasma of oxidation stage
O3Concentration is set as that 40ppm, benchmark air quantity are set as 2CMM, and, superficial linear velocity in a column is set as 1m/s,
The change holdup time, detected with the method identical with experimental example 1.
<table 3>
<table 4>
<table 5>
<table 6>
As shown in table 3 to table 6, can confirm that all have more than 95% from the measurement result of holdup time 0.5～2sec
Treatment effeciency.
As described above, plasma oxynitride emission reduction device 300, the combustion of burn processing waste gas will be used for
Burning portion 310, receive the gas of burn processing from combustion section 310 and carry out the wet processed portion of wet processed
320 and put into plasma to process the nitrogen oxides comprised in the gas by wet processed portion 320
The plasma oxidation portion 330 of bromhidrosis body is together configured in shell 301, thus, it is possible at plasma
The final outlet of nitrogen oxides emission reduction device 300 makes nitrogen oxides form with NO2Limit and discharge.Further,
Without adding other equipment, the medium resistance in the plasma oxidation portion 330 that release is formed by coil form electrode
Gear discharge plasma, processes nitrogen oxides, thus, it is possible to save the energy to supply of equipment.
Further, disclosed embodiments of the invention are intended merely to contribute to understanding in the present description and drawings
And pointed out particular case, and and non-limiting the scope of the present invention.The those skilled in the art of the present invention
It is to be understood that in addition to embodiment provided herein, also can implement its of technological thought based on the present invention
His variation.
Claims (10)
1. an energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device, as processing waste gas
Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device, it is characterised in that including:
Combustion section, carries out burn processing for described waste gas；
Wet processed portion, receives the gas of burn processing, carries out wet processed from described combustion section；
Plasma oxidation portion, puts into for processing the nitrogen comprised in the gas by described wet processed portion
The plasma gas of oxide.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress
Put, it is characterised in that
Also include shell,
Further, described combustion section, described wet processed portion and described plasma oxidation portion are configured at described
In shell.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 2 reduces discharging dress
Put, it is characterised in that
Also including main discharge, it is for the described nitrogen oxygen that will carry out processing by described plasma gas
Compound is discharged to described housing exterior,
Further, described plasma oxidation portion in described shell be connected to the connection of described main discharge
Passage connects to be installed.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress
Put, it is characterised in that
Described plasma gas is to be generated by the plasma discharge in described plasma oxidation portion
O3Gas.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 4 reduces discharging dress
Put, it is characterised in that
Described nitrogen oxides and the O generated from described plasma oxidation portion3Produce oxidation reaction, be transformed to
NO2。
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 5 reduces discharging dress
Put, it is characterised in that
The NO of described conversion2The wet processed technique of subsequent treatment process is located by reduction reaction
Reason.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging dress
Put, it is characterised in that
Described plasma oxidation portion, including:
Internal electrode, it is rod shape；
Electrolyte, it is around described internal electrode；And
Outer electrode, its outside described electrolyte with loop shape insert install,
Further, it is applied for producing the alternating current of plasma to described internal electrode and described outer electrode
Source.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 7 reduces discharging dress
Put, it is characterised in that
Described external electrode surface is applied by thermal spraying.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 7 reduces discharging dress
Put, it is characterised in that
Identical height is formed with outside described outer electrode outside described electrolyte.
Energy-saving dielectric barrier discharge plasma nitrogen oxides the most according to claim 1 reduces discharging
Device, it is characterised in that
Described plasma oxidation portion utilizes dielectric barrier discharge plasma to produce plasma.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2015-0023940 | 2015-02-17 | ||
| KR20150023940 | 2015-02-17 | ||
| KR10-2015-0035697 | 2015-03-16 | ||
| KR1020150035697A KR101514195B1 (en) | 2015-02-17 | 2015-03-16 | Energy-Saving Type Dielectric Barrier Discharge Plasma NOx Reduction Equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105879600A true CN105879600A (en) | 2016-08-24 |
| CN105879600B CN105879600B (en) | 2019-05-07 |
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| CN201510861067.9A Active CN105879600B (en) | 2015-02-17 | 2015-11-30 | Energy-saving dielectric barrier discharge plasma nitrogen oxides emission reduction device |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20160237869A1 (en) |
| KR (1) | KR101514195B1 (en) |
| CN (1) | CN105879600B (en) |
| TW (1) | TWI615543B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110404382A (en) * | 2018-04-27 | 2019-11-05 | (株)因努彼亚 | Exhaust gas apparatus for processing plasma and exhaust gas plasma process system including it |
| CN114688522A (en) * | 2022-04-15 | 2022-07-01 | 安徽理工大学 | Central electrode structure dielectric barrier discharge synergistically enhanced coal and ammonia combustion device |
| CN116220880A (en) * | 2023-03-10 | 2023-06-06 | 潍柴动力股份有限公司 | A kind of LNG engine tail gas treatment device and LNG engine |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108026809B (en) * | 2015-09-10 | 2020-11-27 | 三星重工业株式会社 | Pollutant reduction device |
| CN105457470A (en) * | 2015-12-24 | 2016-04-06 | 华北电力大学 | Device and method for removing nitrogen oxide by combining magnetic field with single-medium barrier discharge |
| KR101809626B1 (en) * | 2017-03-02 | 2017-12-15 | (주)엔노피아 | System for Treat Complex Pollutant |
| KR102089599B1 (en) * | 2019-07-12 | 2020-03-16 | 성진엔지니어링(주) | Waste gas treatment device for semiconductor |
| KR102708095B1 (en) * | 2021-11-23 | 2024-09-19 | 한국핵융합에너지연구원 | High-purity no2 gas generator and high-concentration activated water and fertilizer water manufacturing device based on nitrate using plasma |
| KR102498090B1 (en) * | 2022-03-25 | 2023-02-10 | 주식회사 영원이엔지 | Apparatus of atmospheric pressure plasma for harmful gas decomposition of pipe |
| KR102768199B1 (en) * | 2022-10-31 | 2025-02-13 | 한국핵융합에너지연구원 | Nitrogen oxide dissolved water production system and nitrogen oxide dissolved water production process using the same |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1359310A (en) * | 1999-05-07 | 2002-07-17 | 高级技术材料公司 | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US20050031503A1 (en) * | 2003-08-05 | 2005-02-10 | Fox Michael T. | Air ionization control |
| CN101573467A (en) * | 2006-07-31 | 2009-11-04 | 泰克纳等离子系统公司 | Plasma surface treatment using dielectric barrier discharges |
| CN103501890A (en) * | 2011-03-18 | 2014-01-08 | 加拿大派罗杰尼斯有限公司 | Steam plasma arc hydrolysis of ozone depleting substances |
| US20140326428A1 (en) * | 2011-11-17 | 2014-11-06 | Enverid Systems, Inc. | Method and System for Conditioning Air in an Enclosed Environment with Distributed Air Circulation Systems |
| CN204073809U (en) * | 2014-09-28 | 2015-01-07 | 福州闽创环保科技有限公司 | Low-temperature plasma industrial |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61263621A (en) * | 1985-05-16 | 1986-11-21 | Kikuchi:Kk | Adjusting method for gas concentration |
| JP2003010638A (en) * | 2001-06-29 | 2003-01-14 | Kanken Techno Co Ltd | Plasma exhaust gas treatment method, exhaust gas discharge treatment tower using the method, and exhaust gas treatment apparatus equipped with the plasma exhaust gas treatment tower |
| KR100623723B1 (en) * | 2005-04-22 | 2006-09-13 | 범아정밀(주) | Low Temperature Plasma-Catalyst Denitrification System and Denitrification Method |
| JP5307556B2 (en) * | 2007-01-30 | 2013-10-02 | カンケンテクノ株式会社 | Gas processing equipment |
| CN102170974A (en) * | 2008-09-25 | 2011-08-31 | 松下电工株式会社 | Reduced water mist generating device and electrical equipment |
| KR20110017800A (en) * | 2009-08-14 | 2011-02-22 | 윤장식 | Centrifugal Type Clean Horizontal Air Conditioners |
| JP5807855B2 (en) * | 2010-12-15 | 2015-11-10 | 公立大学法人大阪府立大学 | Exhaust gas treatment method, treatment apparatus, and boiler system including the same |
| KR101482654B1 (en) * | 2014-08-07 | 2015-01-16 | 주식회사 지스코 | Exhaust gas treating device and waste heat recovery system |
-
2015
- 2015-03-16 KR KR1020150035697A patent/KR101514195B1/en active Active
- 2015-11-25 US US14/951,983 patent/US20160237869A1/en not_active Abandoned
- 2015-11-26 TW TW104139285A patent/TWI615543B/en active
- 2015-11-30 CN CN201510861067.9A patent/CN105879600B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1359310A (en) * | 1999-05-07 | 2002-07-17 | 高级技术材料公司 | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US20050031503A1 (en) * | 2003-08-05 | 2005-02-10 | Fox Michael T. | Air ionization control |
| CN101573467A (en) * | 2006-07-31 | 2009-11-04 | 泰克纳等离子系统公司 | Plasma surface treatment using dielectric barrier discharges |
| CN103501890A (en) * | 2011-03-18 | 2014-01-08 | 加拿大派罗杰尼斯有限公司 | Steam plasma arc hydrolysis of ozone depleting substances |
| US20140326428A1 (en) * | 2011-11-17 | 2014-11-06 | Enverid Systems, Inc. | Method and System for Conditioning Air in an Enclosed Environment with Distributed Air Circulation Systems |
| CN204073809U (en) * | 2014-09-28 | 2015-01-07 | 福州闽创环保科技有限公司 | Low-temperature plasma industrial |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110404382A (en) * | 2018-04-27 | 2019-11-05 | (株)因努彼亚 | Exhaust gas apparatus for processing plasma and exhaust gas plasma process system including it |
| CN114688522A (en) * | 2022-04-15 | 2022-07-01 | 安徽理工大学 | Central electrode structure dielectric barrier discharge synergistically enhanced coal and ammonia combustion device |
| CN116220880A (en) * | 2023-03-10 | 2023-06-06 | 潍柴动力股份有限公司 | A kind of LNG engine tail gas treatment device and LNG engine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105879600B (en) | 2019-05-07 |
| TW201702474A (en) | 2017-01-16 |
| US20160237869A1 (en) | 2016-08-18 |
| KR101514195B1 (en) | 2015-04-23 |
| TWI615543B (en) | 2018-02-21 |
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