[go: up one dir, main page]

CN105466263B - Temperature equalizing plate structure - Google Patents

Temperature equalizing plate structure Download PDF

Info

Publication number
CN105466263B
CN105466263B CN201410444381.2A CN201410444381A CN105466263B CN 105466263 B CN105466263 B CN 105466263B CN 201410444381 A CN201410444381 A CN 201410444381A CN 105466263 B CN105466263 B CN 105466263B
Authority
CN
China
Prior art keywords
plate
shaped connecting
connecting body
vapor chamber
structure according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410444381.2A
Other languages
Chinese (zh)
Other versions
CN105466263A (en
Inventor
林胜煌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asia Vital Components Co Ltd
Original Assignee
Asia Vital Components Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asia Vital Components Co Ltd filed Critical Asia Vital Components Co Ltd
Priority to CN201410444381.2A priority Critical patent/CN105466263B/en
Publication of CN105466263A publication Critical patent/CN105466263A/en
Application granted granted Critical
Publication of CN105466263B publication Critical patent/CN105466263B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

一种均温板结构,包含:一本体具有一腔室,该腔室具有一第一侧及一第二侧及一连接体,该连接体轴向两端分别连接该第一、二侧,所述连接体径向外侧周缘设有一第一毛细结构层,所述腔室内具有工作液体,透过本发明之连接体设置可防止本体受热变形及达到增加热传导效率功效。

A temperature equalizing plate structure comprises: a main body having a chamber, the chamber having a first side, a second side and a connector, the axial ends of the connector are respectively connected to the first and second sides, a first capillary structure layer is provided on the radial outer periphery of the connector, and working liquid is contained in the chamber. The connector of the present invention can prevent the main body from being deformed by heat and achieve the effect of increasing the heat conduction efficiency.

Description

均温板结构Vapor chamber structure

【技术领域】【Technical field】

一种均温板结构,尤指一种可提升均温板支撑度及热传导效率的均温板结构。A temperature-spreading plate structure, especially a temperature-spreading plate structure that can improve the support degree and heat conduction efficiency of the temperature-spreading plate.

【背景技术】【Background technique】

现行行动装置、个人电脑、伺服器、通信机箱皆因运算效能提升而内部计算单元所产生之热量亦随着提升,则相对的更加需要散热单元来辅助其散热,绝大多数业者选用散热器、热管、均温板等散热元件搭配风扇进行辅助散热,并当遇到需大面积进行散热时则选用均温板吸热并搭配散热器及散热风扇进行强制散热,由于各散热元件间需紧密贴合防止热阻现象之发生,而均温板为一扁平状板体,并内部设置一提供汽液循环的腔室进行热传导,并因为了防止扁平状之均温板受压力或受热后产生膨胀或变形,则腔室内设置有复数根支撑柱体做为支撑均温板之腔室使用。The current mobile devices, personal computers, servers, and communication cases are all due to the improvement of computing performance, and the heat generated by the internal computing unit is also increased, so relatively more heat dissipation units are needed to assist their heat dissipation. Most manufacturers choose radiators, Heat-dissipating elements such as heat pipes and vapor chambers are used with fans for auxiliary heat dissipation, and when large areas are required for heat dissipation, the vapor chamber is used to absorb heat and is matched with radiators and cooling fans for forced heat dissipation. In order to prevent the occurrence of thermal resistance, the vapor chamber is a flat plate body, and a chamber for vapor-liquid circulation is provided inside for heat conduction. In order to prevent the flat vapor chamber from expanding after being pressurized or heated Or deformed, a plurality of support cylinders are arranged in the chamber to serve as the chamber for supporting the temperature equalizing plate.

均温板为一种面与面之热量传递,并且前述说明中为了防止均温板受热膨胀或受外力压扁变形设置有复数支撑柱体,但于制程上则需额外增加制造工时及制造成本(支撑柱体),且若选用复数铜柱外部组合烧结环,铜柱作为支撑作用,烧结环仅作为回流循环,其底部平面度控制不易,或使用多沟槽铜柱,该多沟槽之铜柱同作为支撑与回流循环作用,其底部平面度亦相同控制不易。The vapor chamber is a surface-to-surface heat transfer, and in the above description, in order to prevent the vapor chamber from being thermally expanded or compressed and deformed by external forces, a plurality of support cylinders are provided, but additional manufacturing time and manufacturing costs are required in the manufacturing process. (support column), and if a plurality of copper columns are used to combine sintering rings, the copper columns are used as support, and the sintering ring is only used as a reflow cycle, and its bottom flatness is not easy to control, or if a multi-groove copper column is used, the The copper column also acts as a support and a reflow cycle, and the flatness of the bottom is also difficult to control.

原先技术虽解决变形等问题但却增加了制造工时及成本以及底部平面度控制不易等问题,故仍须针对如何降低制造成本此项问题进行深讨。Although the original technology solves problems such as deformation, it increases the manufacturing man-hours and costs, and it is difficult to control the flatness of the bottom. Therefore, it is still necessary to conduct in-depth discussions on how to reduce the manufacturing cost.

【发明内容】[Content of the invention]

为有效解决上述的问题,本发明之主要目的,提供一种均温板结构,包含:一本体,具有一腔室,该腔室具有一第一侧及一第二侧及一板状连接体,该板状连接体轴向两端分别连接该第一、二侧,所述板状连接体径向外侧周缘设有一第一毛细结构层,所述腔室内具有工作液体。In order to effectively solve the above problems, the main purpose of the present invention is to provide a vapor chamber structure, comprising: a body having a chamber, the chamber having a first side and a second side and a plate-shaped connecting body The axial ends of the plate-shaped connecting body are respectively connected to the first side and the second side, a first capillary structure layer is provided on the radially outer peripheral edge of the plate-shaped connecting body, and the chamber has a working liquid.

所述本体更具有一第一板体及一第二板体,所述第一、二板体对应盖合共同界定前述腔室。The main body further has a first plate body and a second plate body, and the first and second plate bodies correspond to cover and jointly define the cavity.

所述板状连接体为一金属板体。The plate-shaped connecting body is a metal plate body.

所述板状连接体为一铜材质或一铝材质或导热良导体其中任一。The plate-shaped connecting body is any one of a copper material, an aluminum material or a good thermal conductor.

所述第一毛细结构层为一烧结粉末体或沟槽其中任一。The first capillary structure layer is either a sintered powder body or a groove.

所述连接体呈正方形或矩形或梯形或圆形等几何形状其中任一。The connecting body is in any of geometric shapes such as square, rectangle, trapezoid or circle.

更具有一受热区凹设于前述第一、二侧其中任一,所述板状连接体设置于该受热区,所述第一、二侧更设有一第二毛细结构层,并该受热区之第二毛细结构层较其他非受热区之区域厚度厚。Furthermore, a heat receiving area is recessed on either of the first and second sides, the plate-shaped connecting body is disposed in the heat receiving area, a second capillary structure layer is further provided on the first and second sides, and the heat receiving area is further provided with a second capillary structure layer. The thickness of the second capillary structure layer is thicker than that of other non-heated regions.

所述板状连接体外缘更具有复数凹槽。The outer edge of the plate-shaped connecting body further has a plurality of grooves.

所述第一毛细结构层呈正方形或矩形或梯形或圆形等几何形状其中任一。The first capillary structure layer is in any of geometric shapes such as square, rectangle, trapezoid or circle.

所述第一毛细结构层更具有一倾角。The first capillary structure layer has an inclination angle.

透过本发明均温板结构除可解决习知均温板受热膨胀变形或受压力压缩变形以及支撑体底部平面度不易控制等问题外,亦具有达到节省制造工时及提升热传效率等优点者。The vapor chamber structure of the present invention can not only solve the problems of thermal expansion deformation or pressure compression deformation of the conventional vapor chamber, and the difficulty in controlling the flatness of the bottom of the support body, but also has the advantages of saving manufacturing time and improving heat transfer efficiency. .

【图式简单说明】[Simple description of the diagram]

图1为本发明之均温板结构之第一实施例之立体分解图;FIG. 1 is an exploded perspective view of the first embodiment of the vapor chamber structure of the present invention;

图2为本发明之均温板结构之第一实施例之组合图剖视图;2 is a cross-sectional view of a composite view of the first embodiment of the vapor chamber structure of the present invention;

图3为本发明之均温板结构之第二实施例之组合图剖视图;3 is a cross-sectional view of a composite view of a second embodiment of the vapor chamber structure of the present invention;

图4为本发明之均温板结构之第三实施例之组合图剖视图;4 is a cross-sectional view of a combination view of a third embodiment of the vapor chamber structure of the present invention;

图5为本发明之均温板结构之第四实施例之组合图剖视图;5 is a cross-sectional view of a composite view of a fourth embodiment of the vapor chamber structure of the present invention;

图6为本发明之均温板结构示意图。FIG. 6 is a schematic diagram of the structure of the vapor chamber of the present invention.

图中各附图标记对应的构件名称为:The names of the components corresponding to the reference numerals in the figure are:

本体1Body 1

第一板体1aThe first plate body 1a

第二板体1bThe second plate body 1b

腔室11chamber 11

第一侧111first side 111

第二侧112second side 112

板状连接体12Plate connector 12

凹槽121Groove 121

第一毛细结构层13The first capillary structure layer 13

倾角131Inclination 131

受热区14Heated area 14

第二毛细结构层15The second capillary structure layer 15

工作液体2working fluid 2

汽态之工作流体21Vaporous working fluid 21

液态之工作流体22Liquid working fluid 22

热源3Heat source 3

【具体实施方式】【Detailed ways】

本发明之上述目的及其结构与功能上的特性,将依据所附图式之较佳实施例予以说明。The above-mentioned objects of the present invention and their structural and functional characteristics will be described with reference to the preferred embodiments of the accompanying drawings.

如图1、2所示,为本发明之均温板结构之第一实施例之立体分解及组合图剖视图,如图所示,所述均温板结构,具有一本体1;As shown in Figures 1 and 2, it is a three-dimensional exploded and combined cross-sectional view of the first embodiment of the vapor chamber structure of the present invention. As shown in the figures, the vapor chamber structure has a main body 1;

所述本体1具有一腔室11,该腔室11具有一第一侧111及一第二侧112及一板状连接体12,该板状连接体12轴向两端分别连接该第一、二侧111、112,所述板状连接体12径向外侧周缘设有一第一毛细结构层13,所述腔室11内具有工作液体2,所述第一毛细结构层13为一烧结粉末体。The body 1 has a cavity 11, the cavity 11 has a first side 111 and a second side 112 and a plate-shaped connecting body 12, and the two axial ends of the plate-shaped connecting body 12 are respectively connected to the first and second sides. On the two sides 111 and 112 , a first capillary structure layer 13 is provided on the radially outer peripheral edge of the plate-shaped connecting body 12 , the chamber 11 contains the working liquid 2 , and the first capillary structure layer 13 is a sintered powder body .

所述本体1更具有一第一板体1a及一第二板体1b,所述第一、二板体1a、1b对应盖合共同界定前述腔室11。The main body 1 further has a first plate body 1a and a second plate body 1b, and the first and second plate bodies 1a and 1b correspond to each other to define the cavity 11 .

所述板状连接体12为一金属板体,并所述板状连接体12为一铜材质或一铝材质或导热良导体其中任一,本实施例以铜材质作为说明实施例,但不引以为限。The plate-shaped connecting body 12 is a metal plate body, and the plate-shaped connecting body 12 is any one of a copper material, an aluminum material or a good thermal conductor. be limited.

所述板状连接体12呈正方形或矩形或梯形或圆形等几何形状其中任一,本实施例以正方形作为说明实施例,但并不引以为限。The plate-shaped connecting body 12 has any geometric shape such as a square, a rectangle, a trapezoid or a circle. In this embodiment, a square is used as an illustrative embodiment, but it is not limited thereto.

如图3所示,为本发明之均温板结构之第二实施例之组合图剖视图,如图所示,本实施例部分结构与前述第一实施例相同,故在此将不再赘述,惟本实施例与前述第一实施例之不同处为该本体1更具有一受热区14凹设于前述第一、二侧111、112其中任一,本实施例之受热区14凹设于该第一侧111,所述板状连接体12设置于该受热区14,所述第一、二侧111、112更设有一第二毛细结构层15,并该受热区14之第二毛细结构层15较其他非受热区14之区域厚度厚。As shown in FIG. 3 , it is a cross-sectional view of a combined view of the second embodiment of the vapor chamber structure of the present invention. As shown in the figure, part of the structure of this embodiment is the same as that of the aforementioned first embodiment, so it will not be repeated here. However, the difference between this embodiment and the aforementioned first embodiment is that the body 1 further has a heat-receiving area 14 recessed on either of the aforementioned first and second sides 111 and 112 , and the heat-receiving area 14 of this embodiment is recessed on the first and second sides 111 and 112 . On the first side 111 , the plate-shaped connecting body 12 is disposed in the heated area 14 , the first and second sides 111 , 112 are further provided with a second capillary structure layer 15 , and the second capillary structure layer in the heated area 14 15 is thicker than other non-heated areas 14 in thickness.

如图4所示,为本发明之均温板结构之第三实施例之立体分解图,如图所示,本实施例部分结构与前述第一实施例相同,故在此将不再赘述,惟本实施例与前述第二实施例之不同处为所述板状连接体12外缘更具有复数凹槽121。As shown in FIG. 4 , it is an exploded perspective view of the third embodiment of the vapor chamber structure of the present invention. As shown in the figure, part of the structure of this embodiment is the same as that of the aforementioned first embodiment, so it will not be repeated here. However, the difference between this embodiment and the aforementioned second embodiment is that the outer edge of the plate-shaped connecting body 12 further has a plurality of grooves 121 .

如图5所示,为本发明之均温板结构之第四实施例之组合图剖视图,如图所示,本实施例部分结构与前述第一实施例相同,故在此将不再赘述,本实施例与前述第一实施例之不同处为所述第一毛细结构层13更具有一倾角131,有助于汽态之工作流体进行发散。As shown in FIG. 5 , it is a cross-sectional view of a composite view of the fourth embodiment of the vapor chamber structure of the present invention. As shown in the figure, part of the structure of this embodiment is the same as that of the aforementioned first embodiment, so it will not be repeated here. The difference between this embodiment and the aforementioned first embodiment is that the first capillary structure layer 13 has an inclination angle 131 , which is helpful for the dispersion of the working fluid in the vapor state.

如图6所示,为本发明之均温板结构示意图,所述本体1与至少一热源3接触,并选择将本体1设置有板状连接体12之处作为与该热源3主要接触之部位,该本体1设置有板状连接体12之处,该板状连接体12作为支撑使用,主要可避免两者紧密贴合时本体1产生变形。As shown in FIG. 6 , which is a schematic diagram of the structure of the vapor chamber of the present invention, the main body 1 is in contact with at least one heat source 3 , and the part where the main body 1 is provided with the plate-shaped connecting body 12 is selected as the main contact part with the heat source 3 , the main body 1 is provided with a plate-shaped connecting body 12, the plate-shaped connecting body 12 is used as a support, which can mainly avoid the deformation of the main body 1 when the two are closely attached.

再者,当该本体1与热源3进行热传导时,该第一板体1a将热量直接传递给该板状连接体12及在辅以腔室11内之工作流体2搭配产生汽液循环,主要热量由该板状连接体12作为传递,而受蒸发后之汽态之工作流体21及该液态之工作流体22可由该第一毛细结构层13蒸发发散以及回流,藉以达到极佳的散热效果。Furthermore, when the main body 1 and the heat source 3 conduct heat conduction, the first plate body 1a directly transfers the heat to the plate-shaped connecting body 12 and the working fluid 2 in the auxiliary chamber 11 to generate a vapor-liquid circulation, mainly The heat is transmitted by the plate-shaped connecting body 12 , and the vaporized working fluid 21 and the liquid working fluid 22 can be evaporated and returned by the first capillary structure layer 13 , so as to achieve excellent heat dissipation effect.

Claims (10)

1.一种均温板结构,包含:一本体,具有一腔室,该腔室具有一第一侧及一第二侧及一板状连接体,该板状连接体轴向两端分别连接该第一、二侧,所述板状连接体径向外侧周缘设有一第一毛细结构层,所述腔室内具有工作液体,该板状连接体为位于该腔室中部的板体并选择将本体设置有板状连接体之处作为与热源主要接触之部位,其特征在于,更具有一受热区凹设于前述第一、二侧其中任一,所述板状连接体设置于该受热区,所述第一、二侧更设有一第二毛细结构层,并该受热区之第二毛细结构层较其他非受热区之区域厚度厚。1. A temperature equalizing plate structure, comprising: a body with a chamber, the chamber has a first side and a second side and a plate-shaped connecting body, the two axial ends of the plate-shaped connecting body are connected respectively On the first and second sides, a first capillary structure layer is provided on the radial outer peripheral edge of the plate-shaped connecting body, and the chamber has working liquid. The plate-shaped connecting body is a plate body located in the middle of the chamber and is selected to be The main body is provided with a plate-shaped connecting body as the part that is mainly in contact with the heat source. It is characterized in that there is a heat-receiving area recessed on either of the first and second sides, and the plate-shaped connecting body is disposed in the heat-receiving area. , the first and second sides are further provided with a second capillary structure layer, and the thickness of the second capillary structure layer of the heated area is thicker than that of other non-heated areas. 2.根据权利要求1所述之均温板结构,其特征在于,所述本体更具有一第一板体及一第二板体,所述第一、二板体对应盖合共同界定前述腔室。2 . The vapor chamber structure according to claim 1 , wherein the main body further has a first plate body and a second plate body, and the first and second plate bodies correspondingly cover and jointly define the cavity. 3 . room. 3.根据权利要求1所述之均温板结构,其特征在于,所述板状连接体为一金属板体。3 . The vapor chamber structure according to claim 1 , wherein the plate-shaped connecting body is a metal plate body. 4 . 4.根据权利要求3所述之均温板结构,其特征在于,所述板状连接体为任一导热良导体。4 . The vapor chamber structure according to claim 3 , wherein the plate-shaped connecting body is any conductor with good thermal conductivity. 5 . 5.根据权利要求4所述之均温板结构,其特征在于,所述板状连接体为一铜材质或一铝材质。5 . The vapor chamber structure according to claim 4 , wherein the plate-shaped connecting body is made of a copper material or an aluminum material. 6 . 6.根据权利要求1所述之均温板结构,其特征在于,所述第一毛细结构层为一烧结粉末体或沟槽其中任一。6 . The vapor chamber structure of claim 1 , wherein the first capillary structure layer is either a sintered powder body or a groove. 7 . 7.根据权利要求1所述之均温板结构,其特征在于,所述连接体呈正方形或矩形或梯形或圆形几何形状其中任一。7 . The vapor chamber structure according to claim 1 , wherein the connecting body is in any one of square, rectangular, trapezoidal or circular geometric shapes. 8 . 8.根据权利要求1所述之均温板结构,其中所述板状连接体外缘更具有复数凹槽。8. The vapor chamber structure according to claim 1, wherein the outer edge of the plate-shaped connecting body further has a plurality of grooves. 9.根据权利要求1所述之均温板结构,其特征在于,所述第一毛细结构层呈正方形或矩形或梯形或圆形几何形状其中任一。9 . The vapor chamber structure according to claim 1 , wherein the first capillary structure layer is in any one of square, rectangular, trapezoidal or circular geometric shapes. 10 . 10.根据权利要求1所述之均温板结构,其特征在于,所述第一毛细结构层更具有一倾角。10 . The vapor chamber structure according to claim 1 , wherein the first capillary structure layer has an inclination angle. 11 .
CN201410444381.2A 2014-09-03 2014-09-03 Temperature equalizing plate structure Active CN105466263B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410444381.2A CN105466263B (en) 2014-09-03 2014-09-03 Temperature equalizing plate structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410444381.2A CN105466263B (en) 2014-09-03 2014-09-03 Temperature equalizing plate structure

Publications (2)

Publication Number Publication Date
CN105466263A CN105466263A (en) 2016-04-06
CN105466263B true CN105466263B (en) 2019-08-02

Family

ID=55604226

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410444381.2A Active CN105466263B (en) 2014-09-03 2014-09-03 Temperature equalizing plate structure

Country Status (1)

Country Link
CN (1) CN105466263B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111336849A (en) * 2018-12-18 2020-06-26 亚浩电子五金塑胶(惠州)有限公司 Temperature equalizing plate and plate assembly
CN112771344B (en) * 2019-06-21 2022-11-11 株式会社村田制作所 Vapor chamber
CN111595187A (en) * 2020-05-11 2020-08-28 奇鋐科技股份有限公司 Vapor chamber composite capillary structure
CN116718051A (en) * 2023-06-19 2023-09-08 瑞泰精密科技(沭阳)有限公司 Temperature equalization plate and manufacturing method thereof

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201229543Y (en) * 2008-06-27 2009-04-29 索士亚科技股份有限公司 Temperature equalizing plate and supporting structure thereof
CN101754656A (en) * 2008-12-10 2010-06-23 富准精密工业(深圳)有限公司 Uniform temperature plate
CN202307864U (en) * 2011-09-21 2012-07-04 奇鋐科技股份有限公司 Vapor structure
CN202511667U (en) * 2012-02-07 2012-10-31 深圳市万景华科技有限公司 Temperature homogenizing plate
CN102878844A (en) * 2011-07-15 2013-01-16 奇鋐科技股份有限公司 Vapor structure and manufacturing method thereof
CN102956583A (en) * 2011-08-29 2013-03-06 奇鋐科技股份有限公司 Vapor structure and manufacturing method thereof
CN103196242A (en) * 2013-03-27 2013-07-10 中国石油大学(华东) Glass-cover-free tubular solar thermal collector
CN203432427U (en) * 2013-07-08 2014-02-12 奇鋐科技股份有限公司 Vapor structure
CN203657579U (en) * 2013-12-24 2014-06-18 讯强电子(惠州)有限公司 Temperature homogenizing plate
CN103929924A (en) * 2013-01-11 2014-07-16 奇鋐科技股份有限公司 Vapor structure
CN204085274U (en) * 2014-09-03 2015-01-07 奇鋐科技股份有限公司 Vapor structure

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100554853C (en) * 2006-01-21 2009-10-28 富准精密工业(深圳)有限公司 Plate heat pipe
CN101927426A (en) * 2009-06-24 2010-12-29 富准精密工业(深圳)有限公司 Uniform-temperature panel and manufacturing method thereof
US20140138057A1 (en) * 2012-11-18 2014-05-22 Chin-Hsing Horng Structure of low-profile heat pipe

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201229543Y (en) * 2008-06-27 2009-04-29 索士亚科技股份有限公司 Temperature equalizing plate and supporting structure thereof
CN101754656A (en) * 2008-12-10 2010-06-23 富准精密工业(深圳)有限公司 Uniform temperature plate
CN102878844A (en) * 2011-07-15 2013-01-16 奇鋐科技股份有限公司 Vapor structure and manufacturing method thereof
CN102956583A (en) * 2011-08-29 2013-03-06 奇鋐科技股份有限公司 Vapor structure and manufacturing method thereof
CN202307864U (en) * 2011-09-21 2012-07-04 奇鋐科技股份有限公司 Vapor structure
CN202511667U (en) * 2012-02-07 2012-10-31 深圳市万景华科技有限公司 Temperature homogenizing plate
CN103929924A (en) * 2013-01-11 2014-07-16 奇鋐科技股份有限公司 Vapor structure
CN103196242A (en) * 2013-03-27 2013-07-10 中国石油大学(华东) Glass-cover-free tubular solar thermal collector
CN203432427U (en) * 2013-07-08 2014-02-12 奇鋐科技股份有限公司 Vapor structure
CN203657579U (en) * 2013-12-24 2014-06-18 讯强电子(惠州)有限公司 Temperature homogenizing plate
CN204085274U (en) * 2014-09-03 2015-01-07 奇鋐科技股份有限公司 Vapor structure

Also Published As

Publication number Publication date
CN105466263A (en) 2016-04-06

Similar Documents

Publication Publication Date Title
CN105722372A (en) Support structure of vapor chamber
US11397057B2 (en) Vapor chamber structure
CN103096685B (en) Vapor capillary structure and its forming method
TWI407071B (en) Thin heat pipe structure and manufacturing method thereof
CN105466263B (en) Temperature equalizing plate structure
US9664458B2 (en) Supporting structure for vapor chamber
CN204335252U (en) Vapor support structure
JP3196200U (en) Soaking plate support structure
CN105517406A (en) Electronic device and radiating casing thereof
CN204404871U (en) Flat heat pipe structure
CN107289800A (en) Temperature equalizing plate structure and manufacturing method thereof
TWI702372B (en) Vapor chamber and manufacturing method for the same
TWI541487B (en) Mean temperature plate support structure
US10112272B2 (en) Manufacturing method of vapor chamber
CN102646651B (en) Thin thermal plate structure
TWM501091U (en) Structure of support for temperature-equalisation plate
TWI582366B (en) Vapor chamber structure
CN204085274U (en) Vapor structure
TWI747305B (en) Temperature-uniformizing board structure
CN203224159U (en) Heat pipe structure
CN104006689A (en) Plate heat pipe and manufacturing method thereof
JP3194454U (en) Structure of the vapor chamber
TWM495711U (en) Heat-spreading board structure
US9879920B2 (en) Vapor chamber structure
CN104034192B (en) Heat pipe structure

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant