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CN105441944A - Bactericidal wearable instrument panel or camera window and manufacturing method for bactericidal wearable instrument - Google Patents

Bactericidal wearable instrument panel or camera window and manufacturing method for bactericidal wearable instrument Download PDF

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Publication number
CN105441944A
CN105441944A CN201511028775.0A CN201511028775A CN105441944A CN 105441944 A CN105441944 A CN 105441944A CN 201511028775 A CN201511028775 A CN 201511028775A CN 105441944 A CN105441944 A CN 105441944A
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CN
China
Prior art keywords
rete
substrate
layer
film material
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201511028775.0A
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Chinese (zh)
Inventor
吴晓彤
方俊勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ott Road (zhangzhou) Optical Technology Co Ltd
Original Assignee
Ott Road (zhangzhou) Optical Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Ott Road (zhangzhou) Optical Technology Co Ltd filed Critical Ott Road (zhangzhou) Optical Technology Co Ltd
Priority to CN201511028775.0A priority Critical patent/CN105441944A/en
Publication of CN105441944A publication Critical patent/CN105441944A/en
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a bactericidal instrument panel or camera window and a manufacturing method for the wearable instrument panel or camera window. The bactericidal instrument panel or camera window comprises a substrate, wherein the outer surface of the substrate is sequentially provided with a first film layer, a second film layer and a third film layer from inside to outside; the first film layer is a nano silver layer with a thickness of 5-20nm; and the second film layer is a hard-hardness layer with a thickness of 10-50nm. According to the technical scheme, the first film layer is the nano sliver layer which has strong inhibiting and killing effects on ten pathogenic microorganisms such as escherichia coli, gonococci, chlamydia trachomatis and the like without generating drug tolerance; the thickness of the first film layer is 5-20nm, so that enough bactericidal ability of the instrument panel or camera window is guaranteed; the second film layer is the high-hardness layer, so that the instrument panel or camera window has the wearable effect; and the thickness of the second film layer is 10-50nm, so that enough wear resistance of the instrument panel or camera window is guaranteed. The bactericidal instrument panel or camera window is reasonable design and high in practicability.

Description

A kind of wear resistant instrument dial plate of sterilization or camera views and manufacture method thereof
Technical field
The present invention relates to a kind of wear resistant instrument dial plate of sterilization or camera views and manufacture method thereof.
Background technology
Existing panel board or camera views are in use easy to scratched or rub flower, affect attractive in appearance.In addition, existing panel board or the rarer sterilizing function of camera views, the needs that people in use pass through to touch are easily from bacterial infection panel board or camera views, or bring panel board or camera views outside surface bacterium, cause cross infection to human body, affect user physically and mentally healthy.
In addition, people are easy to when instrumentation dish or camera views be scratched or rub flower, affect attractive in appearance, result of use and work-ing life.
So research and development one can sterilization, and panel board wear-resisting again or camera views just seem extremely important simultaneously.
Summary of the invention
In order to solve deficiency of the prior art, the object of the present invention is to provide the wear resistant instrument dial plate of the sterilization of a kind of surface band stenlizing layer and high rigidity layer or camera views and manufacture method thereof.
For achieving the above object, the present invention is by the following technical solutions:
The wear resistant instrument dial plate of sterilization or a camera views, comprise substrate, and the outside surface of described substrate is sequentially provided with the first rete, the second rete from the inside to surface, and described first rete is nano-silver layer, and the thickness of the first rete is 5-20nm; Described second rete is high rigidity layer, and the thickness of the second rete is 10-50nm.
The film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation.
The oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
The film material of described high rigidity layer is aluminium sesquioxide, zirconium white, silica crystals or silicon monoxide crystal, and shaping by electron beam gun evaporation.
Described substrate is glass or resin forming.
When the substrate of described panel board or camera views is resin forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide layer, zirconia layer, silica crystals layer or silicon monoxide crystal.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 3 minutes of ion gun bombardment substrate.
When the substrate of described panel board or camera views is glass ware forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide, zirconium white, silica crystals or silicon monoxide crystal.
In described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts above technical scheme, first rete is nano-silver layer, has strong suppression and killing action, and can not produce resistance to tens of kinds of pathogenic microorganisms such as intestinal bacteria, gonococcus, chlamydia trachomatises, the film material of the first rete is the oxide compound of silver, as Ag 2o, AgO or Ag 2o 3, the oxide compound of silver is separated through electron beam gun evaporate process oxonium ion and obtains nanometer silver from the oxide compound of silver, and nanometer silver forms thin layer at substrate surface; The thickness of the first rete is 5-20nm, ensure that panel board or the enough sterilizing ability of camera views; Second rete is high rigidity layer, and make panel board or camera views have wear-resisting effect, the second thicknesses of layers is 10-50nm, ensure that panel board or camera views have enough strong wear resistance.The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by electron gun with high temperature bombardment by high purity films material, the nano molecular be evaporated makes it move to substrate along certain direction and the final method depositing film forming on substrate.The trajectory of electron motion that this invention combine with technique utilizes the special distribution in magnetic field to control in electric field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and the rete compactness of preparation is good, strong adhesion.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the decomposition texture schematic diagram of sterilization wear resistant instrument dial plate of the present invention or camera views.
Embodiment
As shown in Figure 1, a kind of wear resistant instrument dial plate of sterilization or camera views, comprise substrate 1, and the outside surface of described substrate 1 is sequentially provided with the first rete 2, second rete 3 from the inside to surface, and described first rete 2 is nano-silver layer, and the thickness of the first rete 2 is 5-20nm; Described second rete 3 is high rigidity layer, and the thickness of the second rete 3 is 10-50nm.
The film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation.
The oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
The film material of described high rigidity layer is aluminium sesquioxide, zirconium white, silica crystals or silicon monoxide crystal, and shaping by electron beam gun evaporation.
Described substrate is glass or resin forming.
When the substrate 1 of described panel board or camera views is resin forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate 1 is cleaned;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete 3:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide layer, zirconia layer, silica crystals layer or silicon monoxide crystal.
In described step 1), the concrete grammar cleaned substrate 1 is as follows: be placed in vacuum chamber by substrate 1, with the outside surface 3 minutes of ion gun bombardment substrate 1.
When the substrate 1 of described panel board or camera views is glass ware forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate 1 is cleaned;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete 3:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide layer, zirconia layer, silica crystals layer or silicon monoxide crystal.
In described step 1), the concrete grammar cleaned substrate 1 is as follows: be placed in vacuum chamber by substrate 1, with the outside surface 5-10 minute of ion gun bombardment substrate 1.
When the base material 1 of the panel board obtained by aforesaid method or camera views is with glass ware forming, the sticking power of each rete subzero 20 DEG C time is 6-9hrs, and the sticking power 80 DEG C time is 6-9hrs; When the base material 1 of panel board or camera views is with resin forming, the sticking power of each rete subzero 20 DEG C time is 2-4hrs, and the sticking power 80 DEG C time is 2-4hrs, has very strong adhesive ability, simultaneously good, the strong adhesion of the compactness of each rete.

Claims (9)

1. the wear resistant instrument dial plate of sterilization or a camera views, comprise substrate, it is characterized in that: the outside surface of described substrate is sequentially provided with the first rete, the second rete from the inside to surface, and described first rete is nano-silver layer, the thickness of the first rete is 5-20nm; Described second rete is high rigidity layer, and the thickness of the second rete is 10-50nm.
2. the wear resistant instrument dial plate of a kind of sterilization according to claim 1 or camera views, is characterized in that: the film material of described nano-silver layer is the oxide compound of silver, and shaping by electron beam gun evaporation.
3. the wear resistant instrument dial plate of a kind of sterilization according to claim 2 or camera views, is characterized in that: the oxide compound of described silver is Ag 2o, AgO or Ag 2o 3.
4. the wear resistant instrument dial plate of a kind of sterilization according to claim 1 or camera views, is characterized in that: the film material of described high rigidity layer is aluminium sesquioxide, zirconium white, silica crystals or silicon monoxide crystal, and shaping by electron beam gun evaporation.
5. the wear resistant instrument dial plate of a kind of sterilization according to claim 1 or camera views, is characterized in that: described substrate is glass or resin forming.
6. the wear resistant instrument dial plate of a kind of sterilization according to claim 5 or the manufacture method of camera views, it is characterized in that: when the substrate of described panel board or camera views is resin forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 50-70 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 50-70 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide layer, zirconia layer, silica crystals layer or silicon monoxide crystal.
7. the wear resistant instrument dial plate of a kind of sterilization according to claim 6 or the manufacture method of camera views, it is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 3 minutes of ion gun bombardment substrate.
8. the wear resistant instrument dial plate of a kind of sterilization according to claim 5 or the manufacture method of camera views, it is characterized in that: when the substrate of described panel board or camera views is glass ware forming, described manufacture method specifically comprises the following steps:
1) outside surface of substrate is cleaned;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Force value in vacuum plating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum plating cabin is 200-300 DEG C, electron beam gun is adopted to bombard the oxide compound of the film material silver of the first rete, decompose after the oxide compound evaporation of the film material silver of the first rete, thin layer is formed at the outside surface of substrate with nanometer silver form, the speed simultaneously controlling the first rete evaporation is 1/S, and the thickness after the first rete is finally formed is 5-20nm;
B, plate the second rete:
Keep the force value in vacuum plating cabin to be adjusted to and be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum plating cabin to be 200-300 DEG C simultaneously, electron beam gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, thickness after second rete is finally formed is 10-50nm, and wherein the film material of the second rete is aluminium sesquioxide layer, zirconia layer, silica crystals layer or silicon monoxide crystal.
9. the wear resistant instrument dial plate of a kind of sterilization according to claim 8 or the manufacture method of camera views, it is characterized in that: in described step 1), as follows to the concrete grammar of base-plate cleaning: substrate to be placed in vacuum chamber, with the outside surface 5-10 minute of ion gun bombardment substrate.
CN201511028775.0A 2015-12-31 2015-12-31 Bactericidal wearable instrument panel or camera window and manufacturing method for bactericidal wearable instrument Pending CN105441944A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106086791A (en) * 2016-06-04 2016-11-09 浙江星星科技股份有限公司 A kind of manufacture method of the windows be protected panel with AG+AR+AF plated film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multilayer Optically Coated Structures with Antimicrobial Coatings

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104339749A (en) * 2013-08-06 2015-02-11 三星显示有限公司 Multilayer Optically Coated Structures with Antimicrobial Coatings
CN103984120A (en) * 2014-05-30 2014-08-13 奥特路（漳州）光学科技有限公司 Method for manufacturing blue light-resistant optical lens

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106086791A (en) * 2016-06-04 2016-11-09 浙江星星科技股份有限公司 A kind of manufacture method of the windows be protected panel with AG+AR+AF plated film
CN106086791B (en) * 2016-06-04 2018-08-10 浙江星星科技股份有限公司 A kind of manufacturing method of the windows be protected panel with AG+AR+AF plated films

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Application publication date: 20160330